1
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Lee S, Song MK, Zhang X, Suh JM, Ryu JE, Kim J. Mixed-Dimensional Integration of 3D-on-2D Heterostructures for Advanced Electronics. NANO LETTERS 2024. [PMID: 39037750 DOI: 10.1021/acs.nanolett.4c02663] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/23/2024]
Abstract
Two-dimensional (2D) materials have garnered significant attention due to their exceptional properties requisite for next-generation electronics, including ultrahigh carrier mobility, superior mechanical flexibility, and unusual optical characteristics. Despite their great potential, one of the major technical difficulties toward lab-to-fab transition exists in the seamless integration of 2D materials with classic material systems, typically composed of three-dimensional (3D) materials. Owing to the self-passivated nature of 2D surfaces, it is particularly challenging to achieve well-defined interfaces when forming 3D materials on 2D materials (3D-on-2D) heterostructures. Here, we comprehensively review recent progress in 3D-on-2D incorporation strategies, ranging from direct-growth- to layer-transfer-based approaches and from non-epitaxial to epitaxial integration methods. Their technological advances and obstacles are rigorously discussed to explore optimal, yet viable, integration strategies of 3D-on-2D heterostructures. We conclude with an outlook on mixed-dimensional integration processes, identifying key challenges in state-of-the-art technology and suggesting potential opportunities for future innovation.
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Affiliation(s)
- Sangho Lee
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Min-Kyu Song
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Xinyuan Zhang
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Jun Min Suh
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Jung-El Ryu
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Jeehwan Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
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2
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Xu B, Ma L, Wang W, Zhu H, Zhang Y, Liang C, Zhou L, Wang L, Zhang Y, Chen L, Zhang C, Wei W. Orderly Arranged Dipoles Regulate Anion-Derived Solid-Electrolyte Interphase for Stable Lithium Metal Chemistry. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2311938. [PMID: 38294074 DOI: 10.1002/adma.202311938] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/10/2023] [Revised: 01/19/2024] [Indexed: 02/01/2024]
Abstract
Lithium (Li) metal batteries are considered the most promising high-energy-density electrochemical energy storage devices of the next generation. However, the unstable solid-electrolyte interphase (SEI) derived from electrolytes usually leads to high impedance, Li dendrites growth, and poor cyclability. Herein, the ferroelectric BaTiO3 with orderly arranged dipoles (BTOV) is integrated into the polypropylene separator as a functional layer. Detailed characterizations and theoretical calculations indicate that surface oxygen vacancies drive the phase transition of BaTiO3 materials and promote the ordered arrangement of dipoles. The strong dipole moments in BTOV can adsorb TFSI- and NO3 - anions selectively and promote their preferential reduction to form a SEI film enriched with inorganic LiF and LiNxOy species, thus facilitating the rapid transfer of Li+ and restraining the growth of Li dendrites. As a result, the Li-Li cell with the BTOV functional layer exhibits enhanced Li plating/stripping cycling with an ultra-long life of over 7000 h at 0.5 mA cm-2/1.0 mAh cm-2. The LiFePO4 || Li (50 µm) full cells display excellent cycling performance exceeding 1760 cycles and superior rate performance. This work provides a new perspective for regulating SEI chemistry by introducing ordered dipoles to control the distribution and reaction of anions.
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Affiliation(s)
- Baolei Xu
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Li Ma
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Wenran Wang
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Hai Zhu
- Hunan Key Laboratory of Applied Environmental Photocatalysis, Changsha University, Changsha, Hunan, 410022, P. R. China
| | - Youquan Zhang
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Chaoping Liang
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Liangjun Zhou
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Li Wang
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Yan Zhang
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Libao Chen
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Chunxiao Zhang
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
| | - Weifeng Wei
- State Key Laboratory of Powder Metallurgy, Central South University, Changsha, Hunan, 410083, P. R. China
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Park BI, Kim J, Lu K, Zhang X, Lee S, Suh JM, Kim DH, Kim H, Kim J. Remote Epitaxy: Fundamentals, Challenges, and Opportunities. NANO LETTERS 2024; 24:2939-2952. [PMID: 38477054 DOI: 10.1021/acs.nanolett.3c04465] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 03/14/2024]
Abstract
Advanced heterogeneous integration technologies are pivotal for next-generation electronics. Single-crystalline materials are one of the key building blocks for heterogeneous integration, although it is challenging to produce and integrate these materials. Remote epitaxy is recently introduced as a solution for growing single-crystalline thin films that can be exfoliated from host wafers and then transferred onto foreign platforms. This technology has quickly gained attention, as it can be applied to a wide variety of materials and can realize new functionalities and novel application platforms. Nevertheless, remote epitaxy is a delicate process, and thus, successful execution of remote epitaxy is often challenging. Here, we elucidate the mechanisms of remote epitaxy, summarize recent breakthroughs, and discuss the challenges and solutions in the remote epitaxy of various material systems. We also provide a vision for the future of remote epitaxy for studying fundamental materials science, as well as for functional applications.
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Affiliation(s)
- Bo-In Park
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Jekyung Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Kuangye Lu
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Xinyuan Zhang
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Sangho Lee
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Jun Min Suh
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Dong-Hwan Kim
- School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon 16419, Republic of Korea
- Biomedical Institute for Convergence at SKKU (BICS), Sungkyunkwan University (SKKU), Suwon 16419, Republic of Korea
| | - Hyunseok Kim
- Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
- Nick Holonyak, Jr. Micro and Nanotechnology Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Jeehwan Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
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4
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Meng Y, Wang Y, Liu C, Yan P, Sun K, Wang Y, Tian R, Cao R, Zhu J, Do H, Lu J, Ge Z. Epitaxial Growth of α-FAPbI 3 at a Well-Matched Heterointerface for Efficient Perovskite Solar Cells and Solar Modules. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2309208. [PMID: 38009812 DOI: 10.1002/adma.202309208] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/07/2023] [Revised: 11/17/2023] [Indexed: 11/29/2023]
Abstract
Although the FAPbI3 perovskite system exhibits an impressive optoelectronic characteristic and thermal stability because of its energetically unstable black phase at room temperature, it is considerably challenging to attain a controllable and oriented nucleation of α-FAPbI3 . To overcome this challenge, a 2D perovskite with a released inorganic octahedral distortion designed by weakening the hydrogen interactions between the organic interlayer and [PbI6 ]4- octahedron is presented in this study. A highly matched heterointerface can be formed between the (002) facet of the 2D structure and the (100) crystal plane of the cubic α-FAPbI3 , thereby lowering the crystallization energy and inducing a heterogeneous nucleation of α-FAPbI3 . This "epitaxial growth" mechanism results form the highly preferred crystallographic orientation of the (100) facets, improved crystal quality and film uniformity, substantially increased charge transporting characteristics, and suppressed nonradiative recombination losses. An impressive power conversion efficiency (PCE) of 25.4% (certified 25.2%) is achieved using target PSCs, which demonstrates outstanding ambient and operational stability. The feasibility of this strategy is proved for the scalable deposition of homogeneous and high-quality perovskite thin films by demonstrating the remarkably increased PCE of the large-area perovskite solar module, from 18.2% to 20.1%.
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Affiliation(s)
- Yuanyuan Meng
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Yulong Wang
- State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan, 430070, China
| | - Chang Liu
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Pengyu Yan
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Kexuan Sun
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Yaohua Wang
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Ruijia Tian
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Ruikun Cao
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
| | - Jintao Zhu
- Department of Chemical and Environmental Engineering, University of Nottingham Ningbo China, Ningbo, 315100, China
| | - Hainam Do
- Department of Chemical and Environmental Engineering, University of Nottingham Ningbo China, Ningbo, 315100, China
| | - Jianfeng Lu
- State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan, 430070, China
| | - Ziyi Ge
- Zhejiang Provincial Engineering Research Center of Energy Optoelectronic Materials and Devices, Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Sciences, Ningbo, 315201, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
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5
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Li Z, Yun H, Yan Y, Yuan M, Zhao Y, Zhao F. Electro-Responsive Breathing Transition of Conductive Hydrogel for Broadband Kinetic Energy Harvesting. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2305837. [PMID: 37539740 DOI: 10.1002/adma.202305837] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/16/2023] [Revised: 07/26/2023] [Indexed: 08/05/2023]
Abstract
Reclaiming kinetic energy from vibrating machines holds great promise for sustainable energy harvesting technologies. Nevertheless, the impulsive current induced by vibrations is incompatible with conventional energy storage devices. The energy-management system necessitates novel designs of soft materials for lightweight, miniaturized, and integrated high-frequency electrochemical devices. Here, this work develops a conductive hydrogel with an electro-responsive polymeric network. The electro-responsive breathing transition of the crosslinking points facilitates the expeditious formation of a localized electrolyte layer. This layer features an exceedingly high local charge density, surpassing that of a saturated electrolyte solution by an order of magnitude, and thus enabling rapid charge transport under the influence of an applied voltage. The micro-capacitor based on the gel exhibits record-high capacitance of ≈2 mF cm-2 when the frequency of energy input reaches up to 104 Hz. This work also demonstrates a prototype battery charger that harvests energy from a running car engine. This study presents a feasible strategy for waste energy recycling using integrated electrochemical devices, opening a new avenue for ambient energy management.
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Affiliation(s)
- Zhou Li
- Key Laboratory of Cluster Science, Ministry of Education of China, Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing, 100081, P. R. China
| | - Huiru Yun
- Key Laboratory of Cluster Science, Ministry of Education of China, Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing, 100081, P. R. China
| | - Yuke Yan
- Key Laboratory of Cluster Science, Ministry of Education of China, Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing, 100081, P. R. China
| | - Man Yuan
- Key Laboratory of Cluster Science, Ministry of Education of China, Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing, 100081, P. R. China
| | - Yang Zhao
- Key Laboratory of Cluster Science, Ministry of Education of China, Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing, 100081, P. R. China
| | - Fei Zhao
- Key Laboratory of Cluster Science, Ministry of Education of China, Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing, 100081, P. R. China
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6
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Choi J, Jeong J, Zhu X, Kim J, Kang BK, Wang Q, Park BI, Lee S, Kim J, Kim H, Yoo J, Yi GC, Lee DS, Kim J, Hong S, Kim MJ, Hong YJ. Exceptional Thermochemical Stability of Graphene on N-Polar GaN for Remote Epitaxy. ACS NANO 2023; 17:21678-21689. [PMID: 37843425 DOI: 10.1021/acsnano.3c06828] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/17/2023]
Abstract
In this study, we investigate the thermochemical stability of graphene on the GaN substrate for metal-organic chemical vapor deposition (MOCVD)-based remote epitaxy. Despite excellent physical properties of GaN, making it a compelling choice for high-performance electronic and light-emitting device applications, the challenge of thermochemical decomposition of graphene on a GaN substrate at high temperatures has obstructed the achievement of remote homoepitaxy via MOCVD. Our research uncovers an unexpected stability of graphene on N-polar GaN, thereby enabling the MOCVD-based remote homoepitaxy of N-polar GaN. Our comparative analysis of N- and Ga-polar GaN substrates reveals markedly different outcomes: while a graphene/N-polar GaN substrate produces releasable microcrystals (μCs), a graphene/Ga-polar GaN substrate yields nonreleasable thin films. We attribute this discrepancy to the polarity-dependent thermochemical stability of graphene on the GaN substrate and its subsequent reaction with hydrogen. Evidence obtained from Raman spectroscopy, electron microscopic analyses, and overlayer delamination points to a pronounced thermochemical stability of graphene on N-polar GaN during MOCVD-based remote homoepitaxy. Molecular dynamics simulations, corroborated by experimental data, further substantiate that the thermochemical stability of graphene is reliant on the polarity of GaN, due to different reactions with hydrogen at high temperatures. Based on the N-polar remote homoepitaxy of μCs, the practical application of our findings was demonstrated in fabrication of flexible light-emitting diodes composed of p-n junction μCs with InGaN heterostructures.
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Affiliation(s)
- Joonghoon Choi
- Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Republic of Korea
- GRI-TPC International Research Center, Sejong University, Seoul 05006, Republic of Korea
| | - Junseok Jeong
- Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Republic of Korea
- GRI-TPC International Research Center, Sejong University, Seoul 05006, Republic of Korea
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Xiangyu Zhu
- Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States
| | - Junghwan Kim
- GRI-TPC International Research Center, Sejong University, Seoul 05006, Republic of Korea
- Graphene Research Institute, Department of Physics, Sejong University, Seoul 05006, Republic of Korea
| | - Bong Kyun Kang
- Department of Display Materials Engineering, Soonchunhyang University, Asan, Chungnam 31538, Republic of Korea
| | - Qingxiao Wang
- Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States
| | - Bo-In Park
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Seokje Lee
- Science Research Center (SRC) for Novel Epitaxial Quantum Architectures, Institute of Applied Physics, Department of Physics and Astronomy, Seoul National University, Seoul 08826, Republic of Korea
| | - Jekyung Kim
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Hyunseok Kim
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Jinkyoung Yoo
- Center for Integrated Nanotechnologies (CINT), Los Alamos National Laboratory, Los Alamos, New Mexico 87545, United States
| | - Gyu-Chul Yi
- Science Research Center (SRC) for Novel Epitaxial Quantum Architectures, Institute of Applied Physics, Department of Physics and Astronomy, Seoul National University, Seoul 08826, Republic of Korea
| | - Dong-Seon Lee
- School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea
| | - Jeehwan Kim
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Suklyun Hong
- GRI-TPC International Research Center, Sejong University, Seoul 05006, Republic of Korea
- Graphene Research Institute, Department of Physics, Sejong University, Seoul 05006, Republic of Korea
| | - Moon J Kim
- GRI-TPC International Research Center, Sejong University, Seoul 05006, Republic of Korea
- Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States
| | - Young Joon Hong
- Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Republic of Korea
- GRI-TPC International Research Center, Sejong University, Seoul 05006, Republic of Korea
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7
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Ho HC, Smiljanić M, Jovanović Z, Čekada M, Kovač J, Koster G, Hlinka J, Hodnik N, Spreitzer M. Robust SrTiO 3 Passivation of Silicon Photocathode by Reduced Graphene Oxide for Solar Water Splitting. ACS APPLIED MATERIALS & INTERFACES 2023; 15:44482-44492. [PMID: 37695941 PMCID: PMC10520914 DOI: 10.1021/acsami.3c07747] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/30/2023] [Accepted: 08/30/2023] [Indexed: 09/13/2023]
Abstract
Development of a robust photocathode using low-cost and high-performing materials, e.g., p-Si, to produce clean fuel hydrogen has remained challenging since the semiconductor substrate is easily susceptible to (photo)corrosion under photoelectrochemical (PEC) operational conditions. A protective layer over the substrate to simultaneously provide corrosion resistance and maintain efficient charge transfer across the device is therefore needed. To this end, in the present work, we utilized pulsed laser deposition (PLD) to prepare a high-quality SrTiO3 (STO) layer to passivate the p-Si substrate using a buffer layer of reduced graphene oxide (rGO). Specifically, a very thin (3.9 nm ∼10 unit cells) STO layer epitaxially overgrown on rGO-buffered Si showed the highest onset potential (0.326 V vs RHE) in comparison to the counterparts with thicker and/or nonepitaxial STO. The photovoltage, flat-band potential, and electrochemical impedance spectroscopy measurements revealed that the epitaxial photocathode was more beneficial for charge separation, charge transfer, and targeted redox reaction than the nonepitaxial one. The STO/rGO/Si with a smooth and highly epitaxial STO layer outperforming the directly contacted STO/Si with a textured and polycrystalline STO layer showed the importance of having a well-defined passivation layer. In addition, the numerous pinholes formed in the directly contacted STO/Si led to the rapid degradation of the photocathode during the PEC measurements. The stability tests demonstrated the soundness of the epitaxial STO layer in passivating Si against corrosion. This study provided a facile approach for preparing a robust protection layer over a photoelectrode substrate in realizing an efficient and, at the same time, durable PEC device.
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Affiliation(s)
- Hsin-Chia Ho
- Advanced
Materials Department, Jožef Stefan
Institute, 1000 Ljubljana, Slovenia
| | - Milutin Smiljanić
- Department
of Materials Chemistry, National Institute
of Chemistry, 1000 Ljubljana, Slovenia
| | - Zoran Jovanović
- Advanced
Materials Department, Jožef Stefan
Institute, 1000 Ljubljana, Slovenia
- Laboratory
of Physics, Vinča Institute of Nuclear Sciences—National
Institute of the Republic of Serbia, University
of Belgrade, 11351 Belgrade, Serbia
| | - Miha Čekada
- Department
of Thin Films and Surfaces, Jožef
Stefan Institute, 1000 Ljubljana, Slovenia
| | - Janez Kovač
- Department
of Surface Engineering, Jožef Stefan
Institute, 1000 Ljubljana, Slovenia
| | - Gertjan Koster
- MESA+
Institute for Nanotechnology, University
of Twente, Enschede 7522, NB, The Netherlands
| | - Jiří Hlinka
- Department
of Dielectrics, Institute of Physics of
the Czech Academy of Sciences, 182 00 Prague, Czech
Republic
| | - Nejc Hodnik
- Department
of Materials Chemistry, National Institute
of Chemistry, 1000 Ljubljana, Slovenia
| | - Matjaž Spreitzer
- Advanced
Materials Department, Jožef Stefan
Institute, 1000 Ljubljana, Slovenia
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8
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Yang AJ, Wu L, Liu Y, Zhang X, Han K, Huang Y, Li S, Loh XJ, Zhu Q, Su R, Nan CW, Renshaw Wang X. Multifunctional Magnetic Oxide-MoS 2 Heterostructures on Silicon. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2302620. [PMID: 37227936 DOI: 10.1002/adma.202302620] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/21/2023] [Revised: 05/12/2023] [Indexed: 05/27/2023]
Abstract
Correlated oxides and related heterostructures are intriguing for developing future multifunctional devices by exploiting their exotic properties, but their integration with other materials, especially on Si-based platforms, is challenging. Here, van der Waals heterostructures of La0.7 Sr0.3 MnO3 (LSMO) , a correlated manganite perovskite, and MoS2 are demonstrated on Si substrates with multiple functions. To overcome the problems due to the incompatible growth process, technologies involving freestanding LSMO membranes and van der Waals force-mediated transfer are used to fabricate the LSMO-MoS2 heterostructures. The LSMO-MoS2 heterostructures exhibit a gate-tunable rectifying behavior, based on which metal-semiconductor field-effect transistors (MESFETs) with on-off ratios of over 104 can be achieved. The LSMO-MoS2 heterostructures can function as photodiodes displaying considerable open-circuit voltages and photocurrents. In addition, the colossal magnetoresistance of LSMO endows the LSMO-MoS2 heterostructures with an electrically tunable magnetoresponse at room temperature. This work not only proves the applicability of the LSMO-MoS2 heterostructure devices on Si-based platform but also demonstrates a paradigm to create multifunctional heterostructures from materials with disparate properties.
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Affiliation(s)
- Allen Jian Yang
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore
| | - Liang Wu
- Faculty of Material Science and Engineering, Kunming University of Science and Technology, Kunming, Yunnan, 650093, China
| | - Yanran Liu
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore
| | - Xinyu Zhang
- Faculty of Material Science and Engineering, Kunming University of Science and Technology, Kunming, Yunnan, 650093, China
| | - Kun Han
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, China
| | - Ying Huang
- State Key Laboratory of Environment-friendly Energy Materials, Southwest University of Science and Technology, Mianyang, 621010, China
| | - Shengyao Li
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore
| | - Xian Jun Loh
- Institute of Materials Research and Engineering (IMRE), A*STAR, 2 Fusionopolis Way, Innovis, Singapore, 138634, Singapore
| | - Qiang Zhu
- Institute of Materials Research and Engineering (IMRE), A*STAR, 2 Fusionopolis Way, Innovis, Singapore, 138634, Singapore
- School of Chemistry, Chemical Engineering and Biotechnology, Nanyang Technological University, 21 Nanyang Link, Singapore, 637371, Singapore
| | - Rui Su
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore
- School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 637371, Singapore
- MajuLab, International Joint Research Unit UMI 3654, CNRS, Université Côte d'Azur, Sorbonne Université, National University of Singapore, Nanyang Technological University, Singapore, 637371, Singapore
| | - Ce-Wen Nan
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Xiao Renshaw Wang
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore
- School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 637371, Singapore
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Roh I, Goh SH, Meng Y, Kim JS, Han S, Xu Z, Lee HE, Kim Y, Bae SH. Applications of remote epitaxy and van der Waals epitaxy. NANO CONVERGENCE 2023; 10:20. [PMID: 37120780 PMCID: PMC10149550 DOI: 10.1186/s40580-023-00369-3] [Citation(s) in RCA: 4] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/07/2023] [Accepted: 04/09/2023] [Indexed: 05/03/2023]
Abstract
Epitaxy technology produces high-quality material building blocks that underpin various fields of applications. However, fundamental limitations exist for conventional epitaxy, such as the lattice matching constraints that have greatly narrowed down the choices of available epitaxial material combinations. Recent emerging epitaxy techniques such as remote and van der Waals epitaxy have shown exciting perspectives to overcome these limitations and provide freestanding nanomembranes for massive novel applications. Here, we review the mechanism and fundamentals for van der Waals and remote epitaxy to produce freestanding nanomembranes. Key benefits that are exclusive to these two growth strategies are comprehensively summarized. A number of original applications have also been discussed, highlighting the advantages of these freestanding films-based designs. Finally, we discuss the current limitations with possible solutions and potential future directions towards nanomembranes-based advanced heterogeneous integration.
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Affiliation(s)
- Ilpyo Roh
- Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA
- R&D CENTER, M.O.P Co., Ltd, Seoul, 07281, South Korea
| | - Seok Hyeon Goh
- Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea
| | - Yuan Meng
- Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA
| | - Justin S Kim
- The Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA
| | - Sangmoon Han
- Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA
| | - Zhihao Xu
- The Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA
| | - Han Eol Lee
- Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea.
| | - Yeongin Kim
- Department of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, OH, 45221, USA.
| | - Sang-Hoon Bae
- Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
- The Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA.
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Huang J, Chen W. Flexible Strategy of Epitaxial Oxide Thin Films. iScience 2022; 25:105041. [PMID: 36157575 PMCID: PMC9489952 DOI: 10.1016/j.isci.2022.105041] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/03/2022] Open
Abstract
Applying functional oxide thin films to flexible devices is of great interests within the rapid development of information technology. The challenges involve the contradiction between the high-temperature growth of high-quality oxide films and low melting point of the flexible supports. This review summarizes the developed methods to fabricate high-quality flexible oxide thin films with novel functionalities and applications. We start from the fabrication methods, e.g. direct growth on flexible buffered metal foils and layered mica, etching and transfer approach, as well as remote epitaxy technique. Then, various functionalities in flexible oxide films will be introduced, specifically, owing to the mechanical flexibility, some unique properties can be induced in flexible oxide films. Taking the advantages of the excellent physical properties, the flexible oxide films have been employed in various devices. Finally, future perspectives in this research field will be proposed to further develop this field from fabrication, functionality to device. Different methods to fabricate flexible oxide thin films have been introduced Physical functionalities of flexible oxide thin films have been demonstrated Various applications of flexible oxide thin films have been discussed Future perspectives of flexible oxide thin films have been proposed
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