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Ding G, Li H, Zhao J, Zhou K, Zhai Y, Lv Z, Zhang M, Yan Y, Han ST, Zhou Y. Nanomaterials for Flexible Neuromorphics. Chem Rev 2024. [PMID: 39499851 DOI: 10.1021/acs.chemrev.4c00369] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/07/2024]
Abstract
The quest to imbue machines with intelligence akin to that of humans, through the development of adaptable neuromorphic devices and the creation of artificial neural systems, has long stood as a pivotal goal in both scientific inquiry and industrial advancement. Recent advancements in flexible neuromorphic electronics primarily rely on nanomaterials and polymers owing to their inherent uniformity, superior mechanical and electrical capabilities, and versatile functionalities. However, this field is still in its nascent stage, necessitating continuous efforts in materials innovation and device/system design. Therefore, it is imperative to conduct an extensive and comprehensive analysis to summarize current progress. This review highlights the advancements and applications of flexible neuromorphics, involving inorganic nanomaterials (zero-/one-/two-dimensional, and heterostructure), carbon-based nanomaterials such as carbon nanotubes (CNTs) and graphene, and polymers. Additionally, a comprehensive comparison and summary of the structural compositions, design strategies, key performance, and significant applications of these devices are provided. Furthermore, the challenges and future directions pertaining to materials/devices/systems associated with flexible neuromorphics are also addressed. The aim of this review is to shed light on the rapidly growing field of flexible neuromorphics, attract experts from diverse disciplines (e.g., electronics, materials science, neurobiology), and foster further innovation for its accelerated development.
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Affiliation(s)
- Guanglong Ding
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Hang Li
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
| | - JiYu Zhao
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
- State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, Dalian University of Technology, Dalian 116024, China
| | - Kui Zhou
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
- The Construction Quality Supervision and Inspection Station of Zhuhai, Zhuhai 519000, PR China
| | - Yongbiao Zhai
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Ziyu Lv
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Meng Zhang
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Yan Yan
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen 518060, PR China
| | - Su-Ting Han
- Department of Applied Biology and Chemical Technology, The Hong Kong Polytechnic University, Hung Hom 999077, Hong Kong SAR PR China
| | - Ye Zhou
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shenzhen University, Shenzhen 518060, PR China
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, PR China
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Abidi IH, Bhoriya A, Vashishtha P, Giridhar SP, Mayes ELH, Sehrawat M, Verma AK, Aggarwal V, Gupta T, Singh HK, Ahmed T, Dilawar Sharma N, Walia S. Oxidation-induced modulation of photoresponsivity in monolayer MoS 2 with sulfur vacancies. NANOSCALE 2024; 16:19834-19843. [PMID: 39373317 DOI: 10.1039/d4nr02518k] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/08/2024]
Abstract
Two-dimensional transition metal dichalcogenides (TMDs), such as MoS2, hold great promise for next-generation electronics and optoelectronics due to their unique properties. However, the ultrathin nature of these materials renders them vulnerable to structural defects and environmental factors, which significantly impact their performance. Sulfur vacancies (VS) are the most common intrinsic defects in MoS2, and their impact on device performance in oxidising environments remains understudied. This study investigates the impact of VS defects on the photoresponsivity of CVD-grown monolayer MoS2 devices, when exposed to oxidising environments at high temperatures. Our findings reveal a dynamic process of defect generation and healing through oxygen passivation, leading to a significant difference in photocurrent between environments. Temperature-dependent analysis shows defect healing and a notable reduction in defect density upon cooling. This study provides crucial insights into the stability and performance of 2D materials-based devices under varying environmental conditions, essential for designing and controlling the performance of TMD-based devices. Our results pave the way for the development of robust and reliable 2D materials-based electronics and optoelectronics.
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Affiliation(s)
- Irfan H Abidi
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
| | - Ankit Bhoriya
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
- CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India
- Academy of Scientific & Innovative Research (AcSIR), Ghaziabad, 201002, India
| | - Pargam Vashishtha
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
- CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India
- Academy of Scientific & Innovative Research (AcSIR), Ghaziabad, 201002, India
| | - Sindhu Priya Giridhar
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
| | - Edwin L H Mayes
- RMIT Microscopy and Microanalysis Facility, RMIT University, Melbourne 3000, Australia
| | - Manoj Sehrawat
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
- CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India
- Academy of Scientific & Innovative Research (AcSIR), Ghaziabad, 201002, India
| | - Ajay Kumar Verma
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
- CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India
- Academy of Scientific & Innovative Research (AcSIR), Ghaziabad, 201002, India
| | - Vishnu Aggarwal
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
- CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India
- Academy of Scientific & Innovative Research (AcSIR), Ghaziabad, 201002, India
| | - Tanish Gupta
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
| | - H K Singh
- CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India
- Academy of Scientific & Innovative Research (AcSIR), Ghaziabad, 201002, India
| | - Taimur Ahmed
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
- School of Computing, Pak-Austria Fachhochschule, Institute of Applied Sciences and Technology, Haripur, 22620, Pakistan
- RMIT Microscopy and Microanalysis Facility, RMIT University, Melbourne 3000, Australia
| | - Nita Dilawar Sharma
- CSIR-National Physical Laboratory, Dr K.S. Krishnan Marg, New Delhi 110012, India
- Academy of Scientific & Innovative Research (AcSIR), Ghaziabad, 201002, India
| | - Sumeet Walia
- School of Engineering, RMIT University, 124 La Trobe Street, Melbourne, Victoria 3001, Australia.
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Shen M, Shen S, Jia Y, Liu Y, Zhang P, Xie M, Wei J, Yang R. One-Selector-One-Resistor Integrated Memory Cells Based on Two-Dimensional Heterojunction Memory Selectors. ACS NANO 2024; 18:28292-28300. [PMID: 39364669 DOI: 10.1021/acsnano.4c09421] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/05/2024]
Abstract
Selectors are critical components for reducing the sneak path leakage currents in emerging resistive random-access memory (RRAM) arrays. Two-dimensional (2D) materials provide a rich choice of materials with van der Waals stacking to form the heterostructure selectors with controllable energy barriers. Here, we experimentally demonstrate 2D-material-based heterostructure selectors with exponential current-voltage (I-V) relationships and integrate them with hafnium oxide (HfOx)-based RRAMs, forming one-selector-one-resistor (1S1R) cells. The multilayer graphene (MG)/tungsten disulfide (WS2)/platinum (Pt) selector contains two asymmetric heterojunctions with different Schottky barriers, which lead to highly nonlinear and asymmetric I-V characteristics. The 2D selectors in 1S1R cells can successfully drive RRAMs, reduce sneak path leakage current by more than 100 times, and provide the set compliance current. The 1S1R cells are further modeled and integrated into both planar and 3D memory arrays, with circuit-level simulations demonstrating that the presence of 2D selectors in large memory arrays can reduce the power consumption by up to 86%, improve the read/write margin by up to 31%, and avoid write failure. Such a platform holds high potential for constructing 3D high-density memories and performing in-memory computing.
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Affiliation(s)
- Minliang Shen
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Sheng Shen
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Yueyang Jia
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Yuzhuo Liu
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Pengcheng Zhang
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Maosong Xie
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Jianyong Wei
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Rui Yang
- University of Michigan─Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai 200240, China
- School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shanghai Jiao Tong University, Shanghai 200240, China
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4
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Gao R, Ye X, Hu C, Zhang Z, Ji X, Zhang Y, Meng X, Yang H, Zhu X, Li RW. Nanoionics enabled atomic point contact construction and quantum conductance effects. MATERIALS HORIZONS 2024. [PMID: 39359178 DOI: 10.1039/d4mh00916a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/04/2024]
Abstract
The miniaturization of electronic devices is important for the development of high-density and function-integrated information devices. Atomic-point-contact (APC) structures refer to narrow contact areas formed by one or more atoms between two conductive electrodes that produce quantum conductance effects when the electrons pass through the APC channel, providing a new development path for the miniaturization of information devices. Recently, nanoionics has enabled the electric field reconfiguration of APC structures in solid-state electrolytes, offering new approaches to controlling the quantum conductance states, which may lead to the development of emerging information technologies with low power consumption, high speed, and high density. This review provides an overview of APC structures with a focus on the fabrication methods enabled by nanoionics technology. In particular, the advantages of electric field-driven nanoionics in the construction of APC structures are summarized, and the influence of external fields on quantum conductance effects is discussed. Recent studies on electric field regulation of APC structures to achieve precise control of quantum conductance states are also reviewed. The potential applications of quantum conductance effects in memory, computing, and encryption-related information technologies are further explored. Finally, the challenges and future prospects of quantum conductance effects in APC structures are discussed.
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Affiliation(s)
- Runsheng Gao
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
| | - Xiaoyu Ye
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
| | - Cong Hu
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
| | - Ziyi Zhang
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Xinhui Ji
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Yanyu Zhang
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Xiaohan Meng
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
- School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
| | - Huali Yang
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Xiaojian Zhu
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Run-Wei Li
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.
- Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
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5
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Huang Y, Penev ES, Yakobson BI. Mechanisms of Defect-Mediated Memristive Behavior in MoS 2 Monolayer. NANO LETTERS 2024. [PMID: 39361515 DOI: 10.1021/acs.nanolett.4c03792] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/05/2024]
Abstract
The switching dynamics of a Au∥VS2@MoS2 atomristor is explored by first-principles computations of the atomic-configuration energy and electron transport. It is found that external bias can reduce the energy barrier between the two (high- and low-) conduction states, to achieve nonvolatile resistive switching. We find that the force acting on the switching atom is a combination of electrostatic force (while its charge is induced both electrostatically and chemically) and also by electron-wind, whose effect may hinder the writing process at larger bias. The analysis uncovers how the writing and reading processes of the atomristor depend on several factors: (i) atomic structure details of the Au tip; (ii) the space-gap distance between the tip and MoS2 layer; and (iii) tip metal choice. The fundamental understanding of switching events provides useful guidance for memristor design and possible limitations.
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Affiliation(s)
- Yuefei Huang
- Department of Materials Science and NanoEngineering, Rice University, Houston, Texas 77005, United States
| | - Evgeni S Penev
- Department of Materials Science and NanoEngineering, Rice University, Houston, Texas 77005, United States
| | - Boris I Yakobson
- Department of Materials Science and NanoEngineering, Rice University, Houston, Texas 77005, United States
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6
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Xue G, Qin B, Ma C, Yin P, Liu C, Liu K. Large-Area Epitaxial Growth of Transition Metal Dichalcogenides. Chem Rev 2024; 124:9785-9865. [PMID: 39132950 DOI: 10.1021/acs.chemrev.3c00851] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 08/13/2024]
Abstract
Over the past decade, research on atomically thin two-dimensional (2D) transition metal dichalcogenides (TMDs) has expanded rapidly due to their unique properties such as high carrier mobility, significant excitonic effects, and strong spin-orbit couplings. Considerable attention from both scientific and industrial communities has fully fueled the exploration of TMDs toward practical applications. Proposed scenarios, such as ultrascaled transistors, on-chip photonics, flexible optoelectronics, and efficient electrocatalysis, critically depend on the scalable production of large-area TMD films. Correspondingly, substantial efforts have been devoted to refining the synthesizing methodology of 2D TMDs, which brought the field to a stage that necessitates a comprehensive summary. In this Review, we give a systematic overview of the basic designs and significant advancements in large-area epitaxial growth of TMDs. We first sketch out their fundamental structures and diverse properties. Subsequent discussion encompasses the state-of-the-art wafer-scale production designs, single-crystal epitaxial strategies, and techniques for structure modification and postprocessing. Additionally, we highlight the future directions for application-driven material fabrication and persistent challenges, aiming to inspire ongoing exploration along a revolution in the modern semiconductor industry.
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Affiliation(s)
- Guodong Xue
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing 100871, China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
| | - Biao Qin
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing 100871, China
| | - Chaojie Ma
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing 100871, China
| | - Peng Yin
- Key Laboratory of Quantum State Construction and Manipulation (Ministry of Education), Department of Physics, Renmin University of China, Beijing 100872, China
| | - Can Liu
- Key Laboratory of Quantum State Construction and Manipulation (Ministry of Education), Department of Physics, Renmin University of China, Beijing 100872, China
| | - Kaihui Liu
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing 100871, China
- International Centre for Quantum Materials, Collaborative Innovation Centre of Quantum Matter, Peking University, Beijing 100871, China
- Songshan Lake Materials Laboratory, Dongguan 523808, China
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7
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Yoo J, Nam CY, Bussmann E. Atomic Precision Processing of Two-Dimensional Materials for Next-Generation Microelectronics. ACS NANO 2024; 18:21614-21622. [PMID: 39105703 DOI: 10.1021/acsnano.4c04908] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/07/2024]
Abstract
The growth of the information era economy is driving the pursuit of advanced materials for microelectronics, spurred by exploration into "Beyond CMOS" and "More than Moore" paradigms. Atomically thin 2D materials, such as transition metal dichalcogenides (TMDCs), show great potential for next-generation microelectronics due to their properties and defect engineering capabilities. This perspective delves into atomic precision processing (APP) techniques like atomic layer deposition (ALD), epitaxy, atomic layer etching (ALE), and atomic precision advanced manufacturing (APAM) for the fabrication and modification of 2D materials, essential for future semiconductor devices. Additive APP methods like ALD and epitaxy provide precise control over composition, crystallinity, and thickness at the atomic scale, facilitating high-performance device integration. Subtractive APP techniques, such as ALE, focus on atomic-scale etching control for 2D material functionality and manufacturing. In APAM, modification techniques aim at atomic-scale defect control, offering tailored device functions and improved performance. Achieving optimal performance and energy efficiency in 2D material-based microelectronics requires a comprehensive approach encompassing fundamental understanding, process modeling, and high-throughput metrology. The outlook for APP in 2D materials is promising, with ongoing developments poised to impact manufacturing and fundamental materials science. Integration with advanced metrology and codesign frameworks will accelerate the realization of next-generation microelectronics enabled by 2D materials.
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Affiliation(s)
- Jinkyoung Yoo
- Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, United States
| | - Chang-Yong Nam
- Center for Functional Materials, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Ezra Bussmann
- Center for Integrated Nanotechnologies, Sandia National Laboratories, Albuquerque, New Mexico 87185, United States
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Lee S, Huang Y, Chang YF, Baik S, Lee JC, Koo M. Enhancing simulation feasibility for multi-layer 2D MoS 2 RRAM devices: reliability performance learnings from a passive network model. Phys Chem Chem Phys 2024; 26:20962-20970. [PMID: 39046422 DOI: 10.1039/d4cp02669a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 07/25/2024]
Abstract
While two-dimensional (2D) MoS2 has recently shown promise as a material for resistive random-access memory (RRAM) devices due to its demonstrated resistive switching (RS) characteristics, its practical application faces a significant challenge in industry regarding its limited yield and endurance. Our earlier work introduced an effective switching layer model to understand RS behavior in both mono- and multi-layered MoS2. However, functioning as a phenomenological percolation modeling tool, it lacks the capability to accurately simulate the intricate current-voltage (I-V) characteristics of the device, thereby hindering its practical applicability in 2D RRAM research. In contrast to the established conductive filament model for oxide-based RRAM, the RS mechanism in 2D RRAM remains elusive. This paper presents a novel simulator aimed at providing an intuitive, visual representation of the stochastic behaviors involved in the RS process of multi-layer 2D MoS2 RRAM devices. Building upon the previously proposed phenomenological simulator for 2D RRAM, users can now simulate both the I-V characteristics and the resistive switching behaviors of the RRAM devices. Through comparison with experimental data, it was observed that yield and endurance characteristics are linked to defect distributions in MoS2.
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Affiliation(s)
- Seonjeong Lee
- School of Electrical and Computer Engineering, University of Seoul, Seoul 02504, South Korea
| | - Yifu Huang
- Department of Electrical and Computer Engineering, University of Texas at Austin, 10100 Burnet Road, 78758 Austin, TX, USA
| | - Yao-Feng Chang
- Intel Corporation, 2501 NE Century Road, 97124 Hillsboro, OR, USA
| | - Seungjae Baik
- Semiconductor Research and Development Center, Samsung Electronics, Hwaseong-si 18448, South Korea
| | - Jack C Lee
- Department of Electrical and Computer Engineering, University of Texas at Austin, 10100 Burnet Road, 78758 Austin, TX, USA
| | - Minsuk Koo
- Department of Computer Science and Engineering, Incheon National University, Incheon 22012, South Korea.
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9
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Nachawaty A, Chen T, Ibrahim F, Wang Y, Hao Y, Dalla Francesca K, Tyagi P, Da Costa A, Ferri A, Liu C, Li X, Chshiev M, Migot S, Badie L, Jahjah W, Desfeux R, Le Breton JC, Schieffer P, Le Pottier A, Gries T, Devaux X, Lu Y. Voltage-Driven Fluorine Motion for Novel Organic Spintronic Memristor. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2401611. [PMID: 38848668 DOI: 10.1002/adma.202401611] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/30/2024] [Revised: 05/04/2024] [Indexed: 06/09/2024]
Abstract
Integrating tunneling magnetoresistance (TMR) effect in memristors is a long-term aspiration because it allows to realize multifunctional devices, such as multi-state memory and tunable plasticity for synaptic function. However, the reported TMR in different multiferroic tunnel junctions is limited to 100%. This work demonstrates a giant TMR of -266% in La0.6Sr0.4MnO3(LSMO)/poly(vinylidene fluoride)(PVDF)/Co memristor with thin organic barrier. Different from the ferroelectricity-based memristors, this work discovers that the voltage-driven florine (F) motion in the junction generates a huge reversible resistivity change up to 106% with nanosecond (ns) timescale. Removing F from PVDF layer suppresses the dipole field in the tunneling barrier, thereby significantly enhances the TMR. Furthermore, the TMR can be tuned by different polarizing voltage due to the strong modification of spin-polarization at the LSMO/PVDF interface upon F doping. Combining of high TMR in the organic memristor paves the way to develop high-performance multifunctional devices for storage and neuromorphic applications.
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Affiliation(s)
- Abir Nachawaty
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Tongxin Chen
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Fatima Ibrahim
- Univ. Grenoble Alpes, CEA, CNRS, Spintec, Grenoble, 38000, France
| | - Yuchen Wang
- Hefei National Research Center for Physical Sciences at the Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, China
| | - Yafei Hao
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
- Physics Department, Zhejiang Normal University, Jinhua, 321004, China
| | - Kevin Dalla Francesca
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | - Priyanka Tyagi
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Antonio Da Costa
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | - Anthony Ferri
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | - Chuanchuan Liu
- Hefei National Research Center for Physical Sciences at the Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, China
| | - Xiaoguang Li
- Hefei National Research Center for Physical Sciences at the Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, China
| | - Mairbek Chshiev
- Univ. Grenoble Alpes, CEA, CNRS, Spintec, Grenoble, 38000, France
- Institut Universitaire de France, Paris, 75231, France
| | - Sylvie Migot
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Laurent Badie
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Walaa Jahjah
- Univ. Rennes-CNRS, IPR (Institut de Physique de Rennes)-UMR 6251, Rennes, F-35000, France
| | - Rachel Desfeux
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | | | - Philippe Schieffer
- Univ. Rennes-CNRS, IPR (Institut de Physique de Rennes)-UMR 6251, Rennes, F-35000, France
| | - Arnaud Le Pottier
- Univ. Rennes-CNRS, IPR (Institut de Physique de Rennes)-UMR 6251, Rennes, F-35000, France
| | - Thomas Gries
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Xavier Devaux
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Yuan Lu
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
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10
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Ma Y, Guan Q, Cui J, Jiang T, Zhu Y, Zhang F, Ma G. Synthesis and Characterizations of MoS 2 Nanoflowers and Spectroscopic Study of their Interaction with Bovine Serum Albumin. Chem Biodivers 2024; 21:e202400634. [PMID: 38726746 DOI: 10.1002/cbdv.202400634] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/18/2024] [Accepted: 05/10/2024] [Indexed: 06/28/2024]
Abstract
Molybdenum disulfide nanoflowers (MoS2 NFs) were prepared by hydrothermal method. The prepared MoS2 NFs was characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), specific surface areas, Raman and X-ray photoelectron spectroscopy (XPS). The characterization results show that the flower-like spherical MoS2 is composed of many ultra-thin nanosheets with an average diameter of about 300-400 nm. MoS2 NFs also exhibits excellent UV-vis absorption and high fluorescence intensity. In order to explore the biological behavior of MoS2 NFs, the interaction between MoS2 NFs and bovine serum albumin (BSA) was studied by UV-Vis absorption, fluorescence, synchronous fluorescence spectra, and cyclic voltammetry. The results of absorption and fluorescence show that MoS2 NFs and BSA interact strongly through the formation of complexes in the ground state, and the static quenching is the main mechanism. The Stern-Volmer constant and the quenching constant was calculated about 3.79×107 L mol-1 and 3.79×1015 L mol-1 s-1, respectively. The synchronous fluorescence implied that MoS2 in the complex may mainly bind to tryptophan residues of BSA. The cyclic voltammograms indicated that the addition of BSA makes electron reduction of MoS2 NFs more difficult than the corresponding free state. The results show that hydrophobic forces play a major role in the binding interaction between BSA and MoS2 NFs.
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Affiliation(s)
- Yongshan Ma
- School of Municipal and Environmental Engineering, Shandong Jianzhu University, Jinan, 250101, P. R. China
| | - Qingxiang Guan
- School of Municipal and Environmental Engineering, Shandong Jianzhu University, Jinan, 250101, P. R. China
| | - Jingcheng Cui
- School of Municipal and Environmental Engineering, Shandong Jianzhu University, Jinan, 250101, P. R. China
| | - Tianyi Jiang
- School of Municipal and Environmental Engineering, Shandong Jianzhu University, Jinan, 250101, P. R. China
| | - Yanyan Zhu
- School of Municipal and Environmental Engineering, Shandong Jianzhu University, Jinan, 250101, P. R. China
| | - Fengxia Zhang
- School of Municipal and Environmental Engineering, Shandong Jianzhu University, Jinan, 250101, P. R. China
| | - Guangxiang Ma
- Shandong Wolan Environmental Technologies Co., Ltd, Jinan, 250101, P. R. China
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11
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Lee Y, Huang Y, Chang YF, Yang SJ, Ignacio ND, Kutagulla S, Mohan S, Kim S, Lee J, Akinwande D, Kim S. Programmable Retention Characteristics in MoS 2-Based Atomristors for Neuromorphic and Reservoir Computing Systems. ACS NANO 2024; 18:14327-14338. [PMID: 38767980 DOI: 10.1021/acsnano.4c00333] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/22/2024]
Abstract
In this study, we investigate the coexistence of short- and long-term memory effects owing to the programmable retention characteristics of a two-dimensional Au/MoS2/Au atomristor device and determine the impact of these effects on synaptic properties. This device is constructed using bilayer MoS2 in a crossbar structure. The presence of both short- and long-term memory characteristics is proposed by using a filament model within the bilayer transition-metal dichalcogenide. Short- and long-term properties are validated based on programmable multilevel retention tests. Moreover, we confirm various synaptic characteristics of the device, demonstrating its potential use as a synaptic device in a neuromorphic system. Excitatory postsynaptic current, paired-pulse facilitation, spike-rate-dependent plasticity, and spike-number-dependent plasticity synaptic applications are implemented by operating the device at a low-conductance level. Furthermore, long-term potentiation and depression exhibit symmetrical properties at high-conductance levels. Synaptic learning and forgetting characteristics are emulated using programmable retention properties and composite synaptic plasticity. The learning process of artificial neural networks is used to achieve high pattern recognition accuracy, thereby demonstrating the suitability of the use of the device in a neuromorphic system. Finally, the device is used as a physical reservoir with time-dependent inputs to realize reservoir computing by using short-term memory properties. Our study reveals that the proposed device can be applied in artificial intelligence-based computing applications by utilizing its programmable retention properties.
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Affiliation(s)
- Yoonseok Lee
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul, Seoul 04620, Korea
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Yifu Huang
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Yao-Feng Chang
- Intel Corporation, Hillsboro, Oregon 97124, United States
| | - Sung Jin Yang
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Nicholas D Ignacio
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Shanmukh Kutagulla
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Sivasakthya Mohan
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Sunghun Kim
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul, Seoul 04620, Korea
| | - Jungwoo Lee
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul, Seoul 04620, Korea
| | - Deji Akinwande
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Sungjun Kim
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul, Seoul 04620, Korea
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12
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Wang X, Qiao R, Lu H, He W, Liu Y, Zhou T, Wan D, Wang Q, Liu Y, Guo W. 2D Memory Selectors with Giant Nonlinearity Enabled by Van der Waals Heterostructures. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2310158. [PMID: 38573962 DOI: 10.1002/smll.202310158] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/07/2023] [Revised: 03/15/2024] [Indexed: 04/06/2024]
Abstract
The integration of one-selector-one-resistor crossbar arrays requires the selectors featured with high nonlinearity and bipolarity to prevent leakage currents and any crosstalk among distinct cells. However, a selector with sufficient nonlinearity especially in the frame of device miniaturization remains scarce, restricting the advance of high-density storage devices. Herein, a high-performance memory selector is reported by constructing a graphene/hBN/WSe2 heterostructure. Within the temperature range of 300-80 K, the nonlinearity of this selector varies from ≈103 - ≈104 under forward bias, and increases from ≈300 - ≈105 under reverse bias, the highest reported nonlinearity among 2D selectors. This improvement is ascribed to direct tunneling at low bias and Fowler-Nordheim tunneling at high bias. The tunneling current versus voltage curves exhibit excellent bipolarity behavior because of the comparable hole and electron tunneling barriers, and the charge transport polarity can be effectively tuned from N-type or P-type to bipolar by simply changing source-drain bias. In addition, the conceptual memory selector exhibits no sign of deterioration after 70 000 switching cycles, paving the way for assembling 2D selectors into modern memory devices.
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Affiliation(s)
- Xiaofan Wang
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
| | - Ruixi Qiao
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
| | - Huan Lu
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
| | - Weiwei He
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
| | - Ying Liu
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
| | - Tao Zhou
- School of Physics, Southeast University, Nanjing, 211189, China
| | - Dongyang Wan
- School of Physics, Southeast University, Nanjing, 211189, China
| | - Qin Wang
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
| | - Yanpeng Liu
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
| | - Wanlin Guo
- Key Laboratory for Intelligent Nano Materials and Devices of Ministry of Education, State Key Laboratory of Mechanics and Control of Mechanical Structures, and Institute for Frontier Science, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China
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13
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Su S, Zhao J, Ly TH. Scanning Probe Microscopies for Characterizations of 2D Materials. SMALL METHODS 2024:e2400211. [PMID: 38766949 DOI: 10.1002/smtd.202400211] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/09/2024] [Revised: 04/12/2024] [Indexed: 05/22/2024]
Abstract
2D materials are intriguing due to their remarkably thin and flat structure. This unique configuration allows the majority of their constituent atoms to be accessible on the surface, facilitating easier electron tunneling while generating weak surface forces. To decipher the subtle signals inherent in these materials, the application of techniques that offer atomic resolution (horizontal) and sub-Angstrom (z-height vertical) sensitivity is crucial. Scanning probe microscopy (SPM) emerges as the quintessential tool in this regard, owing to its atomic-level spatial precision, ability to detect unitary charges, responsiveness to pico-newton-scale forces, and capability to discern pico-ampere currents. Furthermore, the versatility of SPM to operate under varying environmental conditions, such as different temperatures and in the presence of various gases or liquids, opens up the possibility of studying the stability and reactivity of 2D materials in situ. The characteristic flatness, surface accessibility, ultra-thinness, and weak signal strengths of 2D materials align perfectly with the capabilities of SPM technologies, enabling researchers to uncover the nuanced behaviors and properties of these advanced materials at the nanoscale and even the atomic scale.
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Affiliation(s)
- Shaoqiang Su
- Department of Chemistry and Center of Super-Diamond & Advanced Films (COSDAF), City University of Hong Kong, Kowloon, 999077, China
| | - Jiong Zhao
- Department of Applied Physics, The Hong Kong Polytechnic University, Kowloon, Hong Kong, 999077, P. R. China
- The Hong Kong Polytechnic University Shenzhen Research Institute, Shenzhen, 518057, China
| | - Thuc Hue Ly
- Department of Chemistry and Center of Super-Diamond & Advanced Films (COSDAF), City University of Hong Kong, Kowloon, 999077, China
- Department of Chemistry and State Key Laboratory of Marine Pollution, City University of Hong Kong, Hong Kong, 999077, China
- City University of Hong Kong Shenzhen Research Institute, Shenzhen, 518057, China
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14
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Yadav R, Poudyal S, Rajarapu R, Biswal B, Barman PK, Kasiviswanathan S, Novoselov KS, Misra A. Low Power Volatile and Nonvolatile Memristive Devices from 1D MoO 2-MoS 2 Core-Shell Heterostructures for Future Bio-Inspired Computing. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2309163. [PMID: 38150637 DOI: 10.1002/smll.202309163] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/11/2023] [Revised: 12/05/2023] [Indexed: 12/29/2023]
Abstract
Memristors-based integrated circuits for emerging bio-inspired computing paradigms require an integrated approach utilizing both volatile and nonvolatile memristive devices. Here, an innovative architecture comprising of 1D CVD-grown core-shell heterostructures (CSHSs) of MoO2-MoS2 is employed as memristors manifesting both volatile switching (with high selectivity of 107 and steep slope of 0.6 mV decade-1) and nonvolatile switching phenomena (with Ion/Ioff ≈103 and switching speed of 60 ns). In these CSHSs, the metallic core MoO2 with high current carrying capacity provides a conformal and immaculate interface with semiconducting MoS2 shells and therefore it acts as a bottom electrode for the memristors. The power consumption in volatile devices is as low as 50 pW per set transition and 0.1 fW in standby mode. Voltage-driven current spikes are observed for volatile devices while with nonvolatile memristors, key features of a biological synapse such as short/long-term plasticity and paired pulse facilitation are emulated suggesting their potential for the development of neuromorphic circuits. These CSHSs offer an unprecedented solution for the interfacial issues between metallic electrodes and the layered materials-based switching element with the prospects of developing smaller footprint memristive devices for future integrated circuits.
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Affiliation(s)
- Renu Yadav
- Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India
- Centre for 2D Materials Research and Innovation, Indian Institute of Technology Madras, Chennai, 600036, India
| | - Saroj Poudyal
- Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India
- Centre for 2D Materials Research and Innovation, Indian Institute of Technology Madras, Chennai, 600036, India
| | - Ramesh Rajarapu
- Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India
- Centre for 2D Materials Research and Innovation, Indian Institute of Technology Madras, Chennai, 600036, India
| | - Bubunu Biswal
- Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India
- Centre for 2D Materials Research and Innovation, Indian Institute of Technology Madras, Chennai, 600036, India
| | - Prahalad Kanti Barman
- Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India
- Centre for 2D Materials Research and Innovation, Indian Institute of Technology Madras, Chennai, 600036, India
| | - S Kasiviswanathan
- Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India
| | - Kostya S Novoselov
- Institute for Functional Intelligent Materials, National University of Singapore, Singapore, 117544, Singapore
| | - Abhishek Misra
- Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India
- Centre for 2D Materials Research and Innovation, Indian Institute of Technology Madras, Chennai, 600036, India
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15
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Yang C, Wang H, Cao Z, Chen X, Zhou G, Zhao H, Wu Z, Zhao Y, Sun B. Memristor-Based Bionic Tactile Devices: Opening the Door for Next-Generation Artificial Intelligence. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2308918. [PMID: 38149504 DOI: 10.1002/smll.202308918] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/06/2023] [Revised: 11/13/2023] [Indexed: 12/28/2023]
Abstract
Bioinspired tactile devices can effectively mimic and reproduce the functions of the human tactile system, presenting significant potential in the field of next-generation wearable electronics. In particular, memristor-based bionic tactile devices have attracted considerable attention due to their exceptional characteristics of high flexibility, low power consumption, and adaptability. These devices provide advanced wearability and high-precision tactile sensing capabilities, thus emerging as an important research area within bioinspired electronics. This paper delves into the integration of memristors with other sensing and controlling systems and offers a comprehensive analysis of the recent research advancements in memristor-based bionic tactile devices. These advancements incorporate artificial nociceptors and flexible electronic skin (e-skin) into the category of bio-inspired sensors equipped with capabilities for sensing, processing, and responding to stimuli, which are expected to catalyze revolutionary changes in human-computer interaction. Finally, this review discusses the challenges faced by memristor-based bionic tactile devices in terms of material selection, structural design, and sensor signal processing for the development of artificial intelligence. Additionally, it also outlines future research directions and application prospects of these devices, while proposing feasible solutions to address the identified challenges.
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Affiliation(s)
- Chuan Yang
- School of Physical Science and Technology, Key Laboratory of Advanced Technology of Materials, Southwest Jiaotong University, Chengdu, Sichuan, 610031, China
| | - Hongyan Wang
- School of Physical Science and Technology, Key Laboratory of Advanced Technology of Materials, Southwest Jiaotong University, Chengdu, Sichuan, 610031, China
| | - Zelin Cao
- Frontier Institute of Science and Technology (FIST), Xi'an Jiaotong University, Xi'an, Shaanxi, 710049, China
| | - Xiaoliang Chen
- Frontier Institute of Science and Technology (FIST), Xi'an Jiaotong University, Xi'an, Shaanxi, 710049, China
| | - Guangdong Zhou
- College of Artificial Intelligence, Brain-inspired Computing & Intelligent Control of Chongqing Key Lab, Southwest University, Chongqing, 400715, China
| | - Hongbin Zhao
- State Key Laboratory of Advanced Materials for Smart Sensing, General Research Institute for Nonferrous Metals, Beijing, 100088, China
| | - Zhenhua Wu
- School of Mechanical Engineering, Shanghai Jiao Tong University, 800 DongChuan Rd, Shanghai, 200240, China
| | - Yong Zhao
- School of Physical Science and Technology, Key Laboratory of Advanced Technology of Materials, Southwest Jiaotong University, Chengdu, Sichuan, 610031, China
- Fujian Provincial Collaborative Innovation Center for Advanced High-Field Superconducting Materials and Engineering, Fujian Normal University, Fuzhou, Fujian, 350117, China
| | - Bai Sun
- Frontier Institute of Science and Technology (FIST), Xi'an Jiaotong University, Xi'an, Shaanxi, 710049, China
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16
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Song S, Rahaman M, Jariwala D. Can 2D Semiconductors Be Game-Changers for Nanoelectronics and Photonics? ACS NANO 2024; 18:10955-10978. [PMID: 38625032 DOI: 10.1021/acsnano.3c12938] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/17/2024]
Abstract
2D semiconductors have interesting physical and chemical attributes that have led them to become one of the most intensely investigated semiconductor families in recent history. They may play a crucial role in the next technological revolution in electronics as well as optoelectronics or photonics. In this Perspective, we explore the fundamental principles and significant advancements in electronic and photonic devices comprising 2D semiconductors. We focus on strategies aimed at enhancing the performance of conventional devices and exploiting important properties of 2D semiconductors that allow fundamentally interesting device functionalities for future applications. Approaches for the realization of emerging logic transistors and memory devices as well as photovoltaics, photodetectors, electro-optical modulators, and nonlinear optics based on 2D semiconductors are discussed. We also provide a forward-looking perspective on critical remaining challenges and opportunities for basic science and technology level applications of 2D semiconductors.
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Affiliation(s)
- Seunguk Song
- Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Mahfujur Rahaman
- Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Deep Jariwala
- Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
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17
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Li XD, Chen NK, Wang BQ, Niu M, Xu M, Miao X, Li XB. Resistive Memory Devices at the Thinnest Limit: Progress and Challenges. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2307951. [PMID: 38197585 DOI: 10.1002/adma.202307951] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/07/2023] [Revised: 12/28/2023] [Indexed: 01/11/2024]
Abstract
The Si-based integrated circuits industry has been developing for more than half a century, by focusing on the scaling-down of transistor. However, the miniaturization of transistors will soon reach its physical limits, thereby requiring novel material and device technologies. Resistive memory is a promising candidate for in-memory computing and energy-efficient synaptic devices that can satisfy the computational demands of the future applications. However, poor cycle-to-cycle and device-to-device uniformities hinder its mass production. 2D materials, as a new type of semiconductor, is successfully employed in various micro/nanoelectronic devices and have the potential to drive future innovation in resistive memory technology. This review evaluates the potential of using the thinnest advanced materials, that is, monolayer 2D materials, for memristor or memtransistor applications, including resistive switching behavior and atomic mechanism, high-frequency device performances, and in-memory computing/neuromorphic computing applications. The scaling-down advantages of promising monolayer 2D materials including graphene, transition metal dichalcogenides, and hexagonal boron nitride are presented. Finally, the technical challenges of these atomic devices for practical applications are elaborately discussed. The study of monolayer-2D-material-based resistive memory is expected to play a positive role in the exploration of beyond-Si electronic technologies.
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Affiliation(s)
- Xiao-Dong Li
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Nian-Ke Chen
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Bai-Qian Wang
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Meng Niu
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
| | - Ming Xu
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430074, China
| | - Xiangshui Miao
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430074, China
| | - Xian-Bin Li
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, 130012, China
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18
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He L, Lang S, Zhang W, Song S, Lyu J, Gong J. First-Principles Prediction of High and Low Resistance States in Ta/h-BN/Ta Atomristor. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:612. [PMID: 38607146 PMCID: PMC11013407 DOI: 10.3390/nano14070612] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/13/2024] [Revised: 03/13/2024] [Accepted: 03/20/2024] [Indexed: 04/13/2024]
Abstract
Two-dimensional (2D) materials have received significant attention for their potential use in next-generation electronics, particularly in nonvolatile memory and neuromorphic computing. This is due to their simple metal-insulator-metal (MIM) sandwiched structure, excellent switching performance, high-density capability, and low power consumption. In this work, using comprehensive material simulations and device modeling, the thinnest monolayer hexagonal boron nitride (h-BN) atomristor is studied by using a MIM configuration with Ta electrodes. Our first-principles calculations predicted both a high resistance state (HRS) and a low resistance state (LRS) in this device. We observed that the presence of van der Waals (vdW) gaps between the Ta electrodes and monolayer h-BN with a boron vacancy (VB) contributes to the HRS. The combination of metal electrode contact and the adsorption of Ta atoms onto a single VB defect (TaB) can alter the interface barrier between the electrode and dielectric layer, as well as create band gap states within the band gap of monolayer h-BN. These band gap states can shorten the effective tunneling path for electron transport from the left electrode to the right electrode, resulting in an increase in the current transmission coefficient of the LRS. This resistive switching mechanism in monolayer h-BN atomristors can serve as a theoretical reference for device design and optimization, making them promising for the development of atomristor technology with ultra-high integration density and ultra-low power consumption.
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Affiliation(s)
- Lan He
- School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China
| | - Shuai Lang
- School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China
| | - Wei Zhang
- School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China
| | - Shun Song
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
| | - Juan Lyu
- School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China
| | - Jian Gong
- School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China
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19
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Naik BR, Arya N, Balakrishnan V. Paper based flexible MoS 2-CNT hybrid memristors. NANOTECHNOLOGY 2024; 35:215201. [PMID: 38364265 DOI: 10.1088/1361-6528/ad2a01] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/09/2023] [Accepted: 02/16/2024] [Indexed: 02/18/2024]
Abstract
We report for the first time MoS2/CNT hybrid nanostructures for memristor applications on flexible and bio-degradable cellulose paper. In our approach, we varied two different weight percentages (10% and 20%) of CNT's in MoS2to improve the MoS2conductivity and investigate the memristor device characteristics. The device with 10% CNT shows a lowVSETvoltage of 2.5 V, which is comparatively small for planar devices geometries. The device exhibits a long data retention time and cyclic current-voltage stability of ∼104s and 102cycles, making it a potential candidate in flexible painted electronics. Along with good electrical performance, it also demonstrates a high mechanical stability for 1000 bending cycles. The conduction mechanism in the MoS2-CNT hybrid structure is corroborated by percolation and defect-induced filament formation. Additionally, the device displays synaptic plasticity performance, simulating potentiation and depression processes. Furthermore, such flexible and biodegradable cellulose-based paper electronics may pave the way to address the environmental pollution caused by electronic waste in the near future.
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Affiliation(s)
- B Raju Naik
- School of Mechanical and Materials Engineering, Indian Institute of Technology, Mandi, Himachal Pradesh-175075, India
| | - Nitika Arya
- School of Mechanical and Materials Engineering, Indian Institute of Technology, Mandi, Himachal Pradesh-175075, India
| | - Viswanath Balakrishnan
- School of Mechanical and Materials Engineering, Indian Institute of Technology, Mandi, Himachal Pradesh-175075, India
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20
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Xie J, Patoary MN, Rahman Laskar MA, Ignacio ND, Zhan X, Celano U, Akinwande D, Sanchez Esqueda I. Quantum Conductance in Vertical Hexagonal Boron Nitride Memristors with Graphene-Edge Contacts. NANO LETTERS 2024; 24:2473-2480. [PMID: 38252466 DOI: 10.1021/acs.nanolett.3c04057] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/23/2024]
Abstract
Two-dimensional materials (2DMs) have gained significant interest for resistive-switching memory toward neuromorphic and in-memory computing (IMC). To achieve atomic-level miniaturization, we introduce vertical hexagonal boron nitride (h-BN) memristors with graphene edge contacts. In addition to enabling three-dimensional (3D) integration (i.e., vertical stacking) for ultimate scalability, the proposed structure delivers ultralow power by isolating single conductive nanofilaments (CNFs) in ultrasmall active areas with negligible leakage thanks to atomically thin (∼0.3 nm) graphene edge contacts. Moreover, it facilitates studying fundamental resistive-switching behavior of single CNFs in CVD-grown 2DMs that was previously unattainable with planar devices. This way, we studied their programming characteristics and observed a consistent single quantum step in conductance attributed to unique atomically constrained nanofilament behavior in CVD-grown 2DMs. This resistive-switching property was previously suggested for h-BN memristors and linked to potential improvements in stability (robustness of CNFs), and now we show experimental evidence including superior retention of quantized conductance.
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Affiliation(s)
- Jing Xie
- Arizona State University, School of Electrical, Computer, and Energy Engineering, Tempe Arizona 85281, United States
| | - Md Naim Patoary
- Arizona State University, School of Electrical, Computer, and Energy Engineering, Tempe Arizona 85281, United States
| | - Md Ashiqur Rahman Laskar
- Arizona State University, School of Electrical, Computer, and Energy Engineering, Tempe Arizona 85281, United States
| | - Nicholas D Ignacio
- The University of Texas at Austin, Texas Materials Institute, Austin Texas 78712, United States
| | - Xun Zhan
- The University of Texas at Austin, Texas Materials Institute, Austin Texas 78712, United States
| | - Umberto Celano
- Arizona State University, School of Electrical, Computer, and Energy Engineering, Tempe Arizona 85281, United States
| | - Deji Akinwande
- The University of Texas at Austin, Texas Materials Institute, Austin Texas 78712, United States
- The University of Texas at Austin, Chandra Department of Electrical and Computer Engineering, Austin Texas 78712, United States
| | - Ivan Sanchez Esqueda
- Arizona State University, School of Electrical, Computer, and Energy Engineering, Tempe Arizona 85281, United States
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21
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Liu A, Zhang X, Liu Z, Li Y, Peng X, Li X, Qin Y, Hu C, Qiu Y, Jiang H, Wang Y, Li Y, Tang J, Liu J, Guo H, Deng T, Peng S, Tian H, Ren TL. The Roadmap of 2D Materials and Devices Toward Chips. NANO-MICRO LETTERS 2024; 16:119. [PMID: 38363512 PMCID: PMC10873265 DOI: 10.1007/s40820-023-01273-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/30/2023] [Accepted: 10/30/2023] [Indexed: 02/17/2024]
Abstract
Due to the constraints imposed by physical effects and performance degradation, silicon-based chip technology is facing certain limitations in sustaining the advancement of Moore's law. Two-dimensional (2D) materials have emerged as highly promising candidates for the post-Moore era, offering significant potential in domains such as integrated circuits and next-generation computing. Here, in this review, the progress of 2D semiconductors in process engineering and various electronic applications are summarized. A careful introduction of material synthesis, transistor engineering focused on device configuration, dielectric engineering, contact engineering, and material integration are given first. Then 2D transistors for certain electronic applications including digital and analog circuits, heterogeneous integration chips, and sensing circuits are discussed. Moreover, several promising applications (artificial intelligence chips and quantum chips) based on specific mechanism devices are introduced. Finally, the challenges for 2D materials encountered in achieving circuit-level or system-level applications are analyzed, and potential development pathways or roadmaps are further speculated and outlooked.
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Affiliation(s)
- Anhan Liu
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China
| | - Xiaowei Zhang
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China
| | - Ziyu Liu
- School of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Yuning Li
- School of Electronic and Information Engineering, Beijing Jiaotong University, Beijing, 100044, People's Republic of China
| | - Xueyang Peng
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China
- School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Xin Li
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Yue Qin
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Chen Hu
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China
- School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Yanqing Qiu
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China
- School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Han Jiang
- School of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Yang Wang
- School of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Yifan Li
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China
| | - Jun Tang
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Jun Liu
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Hao Guo
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China.
| | - Tao Deng
- School of Electronic and Information Engineering, Beijing Jiaotong University, Beijing, 100044, People's Republic of China.
| | - Songang Peng
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China.
- IMECAS-HKUST-Joint Laboratory of Microelectronics, Beijing, 100029, People's Republic of China.
| | - He Tian
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China.
| | - Tian-Ling Ren
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China.
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22
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Hurley N, Bhandari B, Kamau S, Gonzalez Rodriguez R, Squires B, Kaul AB, Cui J, Lin Y. Selective CW Laser Synthesis of MoS 2 and Mixture of MoS 2 and MoO 2 from (NH 4) 2MoS 4 Film. MICROMACHINES 2024; 15:258. [PMID: 38398986 PMCID: PMC10892590 DOI: 10.3390/mi15020258] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/16/2024] [Revised: 02/04/2024] [Accepted: 02/07/2024] [Indexed: 02/25/2024]
Abstract
Very recently, the synthesis of 2D MoS2 and WS2 through pulsed laser-directed thermolysis can achieve wafer-scale and large-area structures, in ambient conditions. In this paper, we report the synthesis of MoS2 and MoS2 oxides from (NH4)2MoS4 film using a visible continuous-wave (CW) laser at 532 nm, instead of the infrared pulsed laser for the laser-directed thermolysis. The (NH4)2MoS4 film is prepared by dissolving its crystal powder in DI water, sonicating the solution, and dip-coating onto a glass slide. We observed a laser intensity threshold for the laser synthesis of MoS2, however, it occurred in a narrow laser intensity range. Above that range, a mixture of MoS2 and MoO2 is formed, which can be used for a memristor device, as demonstrated by other research groups. We did not observe a mixture of MoS2 and MoO3 in the laser thermolysis of (NH4)2MoS4. The laser synthesis of MoS2 in a line pattern is also achieved through laser scanning. Due to of the ease of CW beam steering and the fine control of laser intensities, this study can lead toward the CW laser-directed thermolysis of (NH4)2MoS4 film for the fast, non-vacuum, patternable, and wafer-scale synthesis of 2D MoS2.
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Affiliation(s)
- Noah Hurley
- Department of Physics, University of North Texas, Denton, TX 76203, USA; (N.H.); (B.B.); (S.K.); (R.G.R.); (B.S.); (J.C.)
| | - Bhojraj Bhandari
- Department of Physics, University of North Texas, Denton, TX 76203, USA; (N.H.); (B.B.); (S.K.); (R.G.R.); (B.S.); (J.C.)
| | - Steve Kamau
- Department of Physics, University of North Texas, Denton, TX 76203, USA; (N.H.); (B.B.); (S.K.); (R.G.R.); (B.S.); (J.C.)
| | - Roberto Gonzalez Rodriguez
- Department of Physics, University of North Texas, Denton, TX 76203, USA; (N.H.); (B.B.); (S.K.); (R.G.R.); (B.S.); (J.C.)
| | - Brian Squires
- Department of Physics, University of North Texas, Denton, TX 76203, USA; (N.H.); (B.B.); (S.K.); (R.G.R.); (B.S.); (J.C.)
| | - Anupama B. Kaul
- Department of Materials Science and Engineering, University of North Texas, Denton, TX 76203, USA;
- Department of Electrical Engineering, University of North Texas, Denton, TX 76203, USA
| | - Jingbiao Cui
- Department of Physics, University of North Texas, Denton, TX 76203, USA; (N.H.); (B.B.); (S.K.); (R.G.R.); (B.S.); (J.C.)
| | - Yuankun Lin
- Department of Physics, University of North Texas, Denton, TX 76203, USA; (N.H.); (B.B.); (S.K.); (R.G.R.); (B.S.); (J.C.)
- Department of Electrical Engineering, University of North Texas, Denton, TX 76203, USA
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23
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Chen L, Xi J, Tekelenburg EK, Tran K, Portale G, Brabec CJ, Loi MA. Quasi-2D Lead-Tin Perovskite Memory Devices Fabricated by Blade Coating. SMALL METHODS 2024; 8:e2300040. [PMID: 37287443 DOI: 10.1002/smtd.202300040] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/09/2023] [Revised: 04/24/2023] [Indexed: 06/09/2023]
Abstract
Two terminal passive devices are regarded as one of the promising candidates to solve the processor-memory bottleneck in the Von Neumann computing architectures. Many different materials are used to fabricate memory devices, which have the potential to act as synapses in future neuromorphic electronics. Metal halide perovskites are attractive for memory devices as they display high density of defects with a low migration barrier. However, to become promising for a future neuromorphic technology, attention should be paid on non-toxic materials and scalable deposition processes. Herein, it is reported for the first time the successful fabrication of resistive memory devices using quasi-2D tin-lead perovskite of composition (BA)2 MA4 (Pb0.5 Sn0.5 )5 I16 by blade coating. The devices show typical memory characteristics with excellent endurance (2000 cycles), retention (105 s), and storage stability (3 months). Importantly, the memory devices successfully emulate synaptic behaviors such as spike-timing-dependent plasticity, paired-pulse facilitation, short-term potentiation, and long-term potentiation. A mix of slow (ionic) transport and fast (electronic) transport (charge trapping and de-trapping) is proven to be responsible for the observed resistive switching behavior.
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Affiliation(s)
- Lijun Chen
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, Groningen, 9747 AG, The Netherlands
| | - Jun Xi
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, Groningen, 9747 AG, The Netherlands
- Key Laboratory for Physical Electronics and Devices of the Ministry of Education & Shaanxi Key Lab of Information Photonic Technique, School of Electronic Science and Engineering, Xi'an Jiaotong University, No.28, Xianning West Road, Xi'an, 710049, China
| | - Eelco Kinsa Tekelenburg
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, Groningen, 9747 AG, The Netherlands
| | - Karolina Tran
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, Groningen, 9747 AG, The Netherlands
| | - Giuseppe Portale
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, Groningen, 9747 AG, The Netherlands
| | - Christoph J Brabec
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, Groningen, 9747 AG, The Netherlands
- Institute of Materials for Electronics and Energy Technology (i-MEET), Department of Materials Science and Engineering, Friedrich-Alexander-University Erlangen-Nürnberg, Martensstrasse 7, 91058, Erlangen, Germany
- Helmholtz-Institute Erlangen-Nürnberg (HI ERN), Immerwahrstraße 2, 91058, Erlangen, Germany
| | - Maria Antonietta Loi
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, Groningen, 9747 AG, The Netherlands
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24
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Yang SJ, Liang L, Lee Y, Gu Y, Fatheema J, Kutagulla S, Kim D, Kim M, Kim S, Akinwande D. Volatile and Nonvolatile Resistive Switching Coexistence in Conductive Point Hexagonal Boron Nitride Monolayer. ACS NANO 2024; 18:3313-3322. [PMID: 38226861 DOI: 10.1021/acsnano.3c10068] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/17/2024]
Abstract
Recently, we demonstrated the nonvolatile resistive switching effects of metal-insulator-metal (MIM) atomristor structures based on two-dimensional (2D) monolayers. However, there are many remaining combinations between 2D monolayers and metal electrodes; hence, there is a need to further explore 2D resistance switching devices from material selections to future perspectives. This study investigated the volatile and nonvolatile switching coexistence of monolayer hexagonal boron nitride (h-BN) atomristors using top and bottom silver (Ag) metal electrodes. Utilizing an h-BN monolayer and Ag electrodes, we found that the transition between volatile and nonvolatile switching is attributed to the thickness/stiffness of chain-like conductive bridges between h-BN and Ag surfaces based on the current compliance and atomristor area. Computations indicate a "weak" bridge is responsible for volatile switching, while a "strong" bridge is formed for nonvolatile switching. The current compliance determines the number of Ag atoms that undergo dissociation at the electrode, while the atomristor area determines the degree of electric field localization that forms more stable conductive bridges. The findings of this study suggest that the h-BN atomristor using Ag electrodes shows promise as a potential solution to integrate both volatile neurons and nonvolatile synapses in a single neuromorphic crossbar array structure through electrical and dimensional designs.
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Affiliation(s)
- Sung Jin Yang
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Liangbo Liang
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States
| | - Yoonseok Lee
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, South Korea
| | - Yuqian Gu
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Jameela Fatheema
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Shanmukh Kutagulla
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Dahyeon Kim
- Department of Electrical and Computer Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, South Korea
| | - Myungsoo Kim
- Department of Electrical and Computer Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, South Korea
| | - Sungjun Kim
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, South Korea
| | - Deji Akinwande
- Microelectronics Research Center, The University of Texas at Austin, Austin, Texas 78758, United States
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25
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Saha P, Sahad E M, Sathyanarayana S, Das BC. Solution-Processed Robust Multifunctional Memristor of 2D Layered Material Thin Film. ACS NANO 2024; 18:1137-1148. [PMID: 38127715 DOI: 10.1021/acsnano.3c10775] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/23/2023]
Abstract
Memristors have gained significant attention recently due to their unique ability to exhibit functionalities for brain-inspired neuromorphic computing. Here, we demonstrate a high-performance multifunctional memristor using a thin film of liquid-phase exfoliated (LPE) 2D MoS2 pinched between two electrodes. Nanoscale inspection of a solution-processed MoS2 thin film using scanning electron and scanning probe microscopies revealed the high-quality and defect-free nature. Systematic current-voltage (I-V) characterizations depict a facile, nonvolatile resistive switching behavior of our 2D MoS2 thin film device with a current On/Off ratio of 103 and energy cost of only a few picojoules. Excellent performance metrics, including at least 103 cycle endurance, 104 s retention, and switching speed down to a few nanoseconds, reflect robust high-performance data storage capability. Charge carriers trapping and detrapping at the sulfur vacancy defect sites in MoS2 nanosheets mainly display the resistive switching property, supported by the impedance analysis and theoretical fitting results. Multifunctionality is leveraged through implementing two-input logic gate operations, edge computation, and crucial adaptive learning via a Pavlov's dogs experiment. Overall, our solution-processed MoS2 memristor has the potential for tremendous future opportunities in integrated circuits and different computing paradigms, including energy-efficient neuromorphic computing hardware in artificial intelligence.
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Affiliation(s)
- Puranjay Saha
- eNDR Laboratory, School of Physics, IISER Thiruvananthapuram, Trivandrum 695551, Kerala, India
| | - Muhammed Sahad E
- eNDR Laboratory, School of Physics, IISER Thiruvananthapuram, Trivandrum 695551, Kerala, India
| | - Sandaap Sathyanarayana
- eNDR Laboratory, School of Physics, IISER Thiruvananthapuram, Trivandrum 695551, Kerala, India
| | - Bikas C Das
- eNDR Laboratory, School of Physics, IISER Thiruvananthapuram, Trivandrum 695551, Kerala, India
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26
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Ogunkunle SA, Bouzid A, Hinsch JJ, Allen OJ, White JJ, Bernard S, Wu Z, Zhu Y, Wang Y. Defect engineering of 1T' MX2( M= Mo, W and X= S, Se) transition metal dichalcogenide-based electrocatalyst for alkaline hydrogen evolution reaction. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2024; 36:145002. [PMID: 38157553 DOI: 10.1088/1361-648x/ad19a4] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/18/2023] [Accepted: 12/28/2023] [Indexed: 01/03/2024]
Abstract
The alkaline electrolyzer (AEL) is a promising device for green hydrogen production. However, their energy conversion efficiency is currently limited by the low performance of the electrocatalysts for the hydrogen evolution reaction (HER). As such, the electrocatalyst design for the high-performance HER becomes essential for the advancement of AELs. In this work, we used both hydrogen (H) and hydroxyl (OH) adsorption Gibbs free energy changes as the descriptors to investigate the catalytic HER performance of 1T' transition metal dichalcogenides (TMDs) in an alkaline solution. Our results reveal that the pristine sulfides showed better alkaline HER performance than their selenide counterparts. However, the activities of all pristine 1T' TMDs are too low to dissociate water. To improve the performance of these materials, defect engineering techniques were used to design TMD-based electrocatalysts for effective HER activity. Our density functional theory results demonstrate that introducing single S/Se vacancy defects can improve the reactivities of TMD materials. Yet, the desorption of OH becomes the rate-determining step. Doping defective MoS2with late 3d transition metal (TM) atoms, especially Cu, Ni, and Co, can regulate the reactivity of active sites for optimal OH desorption. As a result, the TM-doped defective 1T' MoS2can significantly enhance the alkaline HER performance. These findings highlight the potential of defect engineering technologies for the design of TMD-based alkaline HER electrocatalysts.
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Affiliation(s)
- Samuel Akinlolu Ogunkunle
- Centre for Clean Environment and Energy, School of Environment and Science, Griffith University, Gold Coast Campus, Southport 4222, Australia
| | - Assil Bouzid
- Institut de Recherche sur les Céramiques (IRCER), UMR CNRS 7315-Université de Limoges, Limoges 87068, France
| | - Jack Jon Hinsch
- Centre for Clean Environment and Energy, School of Environment and Science, Griffith University, Gold Coast Campus, Southport 4222, Australia
| | - Oscar J Allen
- Centre for Clean Environment and Energy, School of Environment and Science, Griffith University, Gold Coast Campus, Southport 4222, Australia
| | - Jessica Jein White
- Centre for Clean Environment and Energy, School of Environment and Science, Griffith University, Gold Coast Campus, Southport 4222, Australia
| | - Samuel Bernard
- Institut de Recherche sur les Céramiques (IRCER), UMR CNRS 7315-Université de Limoges, Limoges 87068, France
| | - Zhenzhen Wu
- Centre for Clean Environment and Energy, School of Environment and Science, Griffith University, Gold Coast Campus, Southport 4222, Australia
| | - Yong Zhu
- School of Engineering and Built Environment, Griffith University, Gold Coast Campus, Southport 4222, Australia
| | - Yun Wang
- Centre for Clean Environment and Energy, School of Environment and Science, Griffith University, Gold Coast Campus, Southport 4222, Australia
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27
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Kutagulla S, Le NH, Caldino Bohn IT, Stacy BJ, Favela CS, Slack JJ, Baker AM, Kim H, Shin HS, Korgel BA, Akinwande D. Comparative Studies of Atomically Thin Proton Conductive Films to Reduce Crossover in Hydrogen Fuel Cells. ACS APPLIED MATERIALS & INTERFACES 2023; 15:59358-59369. [PMID: 38103256 DOI: 10.1021/acsami.3c12650] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/18/2023]
Abstract
Hydrogen fuel cells based on proton exchange membrane fuel cell (PEMFC) technology are promising as a source of clean energy to power a decarbonized future. However, PEMFCs are limited by a number of major inefficiencies; one of the most significant is hydrogen crossover. In this work, we comprehensively study the effects of two-dimensional (2D) materials applied to the anode side of the membrane as H2 barrier coatings on Nafion to reduce crossover effects on hydrogen fuel cells, while studying adverse effects on conductivity and catalyst performance in the beginning of life testing. The barrier layers studied include graphene, hexagonal boron nitride (hBN), amorphous boron nitride (aBN), and varying thicknesses of molybdenum disulfide (MoS2), all chosen due to their expected stability in a fuel cell environment. Crossover mitigation in the materials studied ranges from 4.4% (1 nm MoS2) to 46.1% (graphene) as compared to Nafion 211. Effects on proton conductivity are also studied, suggesting high areal proton transport in materials previously thought to be effectively nonconductive, such as 2 nm MoS2 and amorphous boron nitride under the conditions studied. The results indicate that a number of 2D materials are able to improve crossover effects, with those coated with 8 nm MoS2 and 1 L graphene able to achieve greater crossover reduction while minimizing conductivity penalty.
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Affiliation(s)
- Shanmukh Kutagulla
- Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Nam Hoang Le
- Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78758, United States
- Mc Ketta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Isabel Terry Caldino Bohn
- Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78758, United States
- Mc Ketta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Benjamin J Stacy
- Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78758, United States
- Mc Ketta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Christopher S Favela
- Mc Ketta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78758, United States
| | - John J Slack
- Nikola Corporation, Phoenix, Arizona 85040-8803, United States
| | - Andrew M Baker
- Nikola Corporation, Phoenix, Arizona 85040-8803, United States
| | - Hyeongjoon Kim
- Department of Chemistry and Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science & Technology, Ulsan 44919, Republic of Korea
| | - Hyeon Suk Shin
- Department of Chemistry and Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science & Technology, Ulsan 44919, Republic of Korea
| | - Brian A Korgel
- Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78758, United States
- Mc Ketta Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78758, United States
| | - Deji Akinwande
- Texas Materials Institute, The University of Texas at Austin, Austin, Texas 78758, United States
- Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin, Texas 78758, United States
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28
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Tugchin BN, Doolaard N, Barreda AI, Zhang Z, Romashkina A, Fasold S, Staude I, Eilenberger F, Pertsch T. Photoluminescence Enhancement of Monolayer WS 2 by n-Doping with an Optically Excited Gold Disk. NANO LETTERS 2023; 23:10848-10855. [PMID: 37967849 PMCID: PMC10723068 DOI: 10.1021/acs.nanolett.3c03053] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/14/2023] [Revised: 10/08/2023] [Indexed: 11/17/2023]
Abstract
In nanophotonics and quantum optics, we aim to control and manipulate light with tailored nanoscale structures. Hybrid systems of nanostructures and atomically thin materials are of interest here, as they offer rich physics and versatility due to the interaction between photons, plasmons, phonons, and excitons. In this study, we explore the optical and electronic properties of a hybrid system, a naturally n-doped monolayer WS2 covering a gold disk. We demonstrate that the nonresonant excitation of the gold disk in the high absorption regime efficiently generates hot carriers via localized surface plasmon excitation, which n-dope the monolayer WS2 and enhance the photoluminescence emission by regulating the multiexciton population and stabilizing the neutral exciton emission. The results are relevant to the further development of nanotransistors in photonic circuits and optoelectronic applications.
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Affiliation(s)
- Bayarjargal N. Tugchin
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
| | - Nathan Doolaard
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
| | - Angela I. Barreda
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
- Institute
of Solid State Physics, Friedrich Schiller
University Jena, Max-Wien-Platz 1, 07743 Jena, Germany
- Group
of Displays and Photonics Applications, Carlos III University of Madrid, Avda. de la Universidad, 30, Leganés, 28911 Madrid, Spain
| | - Zifei Zhang
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
| | - Anastasia Romashkina
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
| | - Stefan Fasold
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
- Vistec
Electron Beam GmbH, 07743 Jena, Germany
| | - Isabelle Staude
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
- Institute
of Solid State Physics, Friedrich Schiller
University Jena, Max-Wien-Platz 1, 07743 Jena, Germany
| | - Falk Eilenberger
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
- Fraunhofer-Institute
for Applied Optics and Precision Engineering IOF, Albert-Einstein-Straße 7, 07745 Jena, Germany
| | - Thomas Pertsch
- Institute
of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 6, 07745 Jena, Germany
- Fraunhofer-Institute
for Applied Optics and Precision Engineering IOF, Albert-Einstein-Straße 7, 07745 Jena, Germany
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29
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Xu M, Chen X, Guo Y, Wang Y, Qiu D, Du X, Cui Y, Wang X, Xiong J. Reconfigurable Neuromorphic Computing: Materials, Devices, and Integration. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2301063. [PMID: 37285592 DOI: 10.1002/adma.202301063] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/03/2023] [Revised: 05/15/2023] [Indexed: 06/09/2023]
Abstract
Neuromorphic computing has been attracting ever-increasing attention due to superior energy efficiency, with great promise to promote the next wave of artificial general intelligence in the post-Moore era. Current approaches are, however, broadly designed for stationary and unitary assignments, thus encountering reluctant interconnections, power consumption, and data-intensive computing in that domain. Reconfigurable neuromorphic computing, an on-demand paradigm inspired by the inherent programmability of brain, can maximally reallocate finite resources to perform the proliferation of reproducibly brain-inspired functions, highlighting a disruptive framework for bridging the gap between different primitives. Although relevant research has flourished in diverse materials and devices with novel mechanisms and architectures, a precise overview remains blank and urgently desirable. Herein, the recent strides along this pursuit are systematically reviewed from material, device, and integration perspectives. At the material and device level, one comprehensively conclude the dominant mechanisms for reconfigurability, categorized into ion migration, carrier migration, phase transition, spintronics, and photonics. Integration-level developments for reconfigurable neuromorphic computing are also exhibited. Finally, a perspective on the future challenges for reconfigurable neuromorphic computing is discussed, definitely expanding its horizon for scientific communities.
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Affiliation(s)
- Minyi Xu
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Xinrui Chen
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Yehao Guo
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Yang Wang
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Dong Qiu
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Xinchuan Du
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Yi Cui
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Xianfu Wang
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
| | - Jie Xiong
- State Key Laboratory of Electronic Thin Film and Integrated Devices, School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China
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30
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Tong W, Wei W, Zhang X, Ding S, Lu Z, Liu L, Li W, Pan C, Kong L, Wang Y, Zhu M, Liang SJ, Miao F, Liu Y. Highly Stable HfO 2 Memristors through van der Waals Electrode Lamination and Delamination. NANO LETTERS 2023; 23:9928-9935. [PMID: 37862098 DOI: 10.1021/acs.nanolett.3c02888] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/21/2023]
Abstract
Memristors have attracted considerable attention in the past decade, holding great promise for future neuromorphic computing. However, the intrinsic poor stability and large device variability remain key limitations for practical application. Here, we report a simple method to directly visualize the origin of poor stability. By mechanically removing the top electrodes of memristors operated at different states (such as SET or RESET), the memristive layer could be exposed and directly characterized through conductive atomic force microscopy, providing two-dimensional area information within memristors. Based on this technique, we observed the existence of multiple conducting filaments during the formation process and built up a physical model between filament numbers and the cycle-to-cycle variation. Furthermore, by improving the interface quality through the van der Waals top electrode, we could reduce the filament number down to a single filament during all switching cycles, leading to much controlled switching behavior and reliable device operation.
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Affiliation(s)
- Wei Tong
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Wei Wei
- National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China
| | - Xiangzhe Zhang
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
| | - Shuimei Ding
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Zheyi Lu
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Liting Liu
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Wanying Li
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Chen Pan
- Institute of Interdisciplinary of Physical Sciences, School of Science, Nanjing University of Science and Technology, Nanjing 210094, China
| | - Lingan Kong
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Yiliu Wang
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Mengjian Zhu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
| | - Shi-Jun Liang
- National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China
| | - Feng Miao
- National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China
| | - Yuan Liu
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
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31
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Pucher T, Bastante P, Parenti F, Xie Y, Dimaggio E, Fiori G, Castellanos-Gomez A. Biodegradable albumen dielectrics for high-mobility MoS 2 phototransistors. NPJ 2D MATERIALS AND APPLICATIONS 2023; 7:73. [PMID: 38665485 PMCID: PMC11041700 DOI: 10.1038/s41699-023-00436-7] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/09/2023] [Accepted: 10/30/2023] [Indexed: 04/28/2024]
Abstract
This work demonstrates the fabrication and characterization of single-layer MoS2 field-effect transistors using biodegradable albumen (chicken eggwhite) as gate dielectric. By introducing albumen as an insulator for MoS2 transistors high carrier mobilities (up to ~90 cm2 V-1 s-1) are observed, which is remarkably superior to that obtained with commonly used SiO2 dielectric which we attribute to ionic gating due to the formation of an electric double layer in the albumen MoS2 interface. In addition, the investigated devices are characterized upon illumination, observing responsivities of 4.5 AW-1 (operated in photogating regime) and rise times as low as 52 ms (operated in photoconductivity regime). The presented study reveals the combination of albumen with van der Waals materials for prospective biodegradable and biocompatible optoelectronic device applications. Furthermore, the demonstrated universal fabrication process can be easily adopted to fabricate albumen-based devices with any other van der Waals material.
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Affiliation(s)
- Thomas Pucher
- Materials Science Factory. Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid, 28049 Spain
| | - Pablo Bastante
- Departamento de Física de la Materia Condensada, Universidad Autónoma de Madrid, 28049 Madrid, Spain
| | - Federico Parenti
- Dipartimento di Ingegneria dell’Informazione, Via Caruso 16, 56122 Pisa, Italy
| | - Yong Xie
- Materials Science Factory. Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid, 28049 Spain
- School of Advanced Materials and Nanotechnology, Xidian University, 710071 Xi’an, China
| | - Elisabetta Dimaggio
- Dipartimento di Ingegneria dell’Informazione, Via Caruso 16, 56122 Pisa, Italy
| | - Gianluca Fiori
- Dipartimento di Ingegneria dell’Informazione, Via Caruso 16, 56122 Pisa, Italy
| | - Andres Castellanos-Gomez
- Materials Science Factory. Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Madrid, 28049 Spain
- Unidad Asociada UCM/CSIC, “Laboratorio de Heteroestructuras con aplicación en spintrónica”, Madrid, Spain
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32
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Niu Y, Li L, Qi Z, Aung HH, Han X, Tenne R, Yao Y, Zak A, Guo Y. 0D van der Waals interfacial ferroelectricity. Nat Commun 2023; 14:5578. [PMID: 37907466 PMCID: PMC10618478 DOI: 10.1038/s41467-023-41045-8] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/26/2023] [Accepted: 08/21/2023] [Indexed: 11/02/2023] Open
Abstract
The dimensional limit of ferroelectricity has been long explored. The critical contravention is that the downscaling of ferroelectricity leads to a loss of polarization. This work demonstrates a zero-dimensional ferroelectricity by the atomic sliding at the restrained van der Waals interface of crossed tungsten disufilde nanotubes. The developed zero-dimensional ferroelectric diode in this work presents not only non-volatile resistive memory, but also the programmable photovoltaic effect at the visible band. Benefiting from the intrinsic dimensional limitation, the zero-dimensional ferroelectric diode allows electrical operation at an ultra-low current. By breaking through the critical size of depolarization, this work demonstrates the ultimately downscaled interfacial ferroelectricity of zero-dimensional, and contributes to a branch of devices that integrates zero-dimensional ferroelectric memory, nano electro-mechanical system, and programmable photovoltaics in one.
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Affiliation(s)
- Yue Niu
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, 100081, Beijing, China
- Beijing Key Lab of Nanophotonics & Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, 100081, Beijing, China
| | - Lei Li
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, 100081, Beijing, China
- Beijing Key Lab of Nanophotonics & Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, 100081, Beijing, China
| | - Zhiying Qi
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, 100081, Beijing, China
- Beijing Key Lab of Nanophotonics & Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, 100081, Beijing, China
| | - Hein Htet Aung
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, 100081, Beijing, China
- Beijing Key Lab of Nanophotonics & Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, 100081, Beijing, China
| | - Xinyi Han
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, 100081, Beijing, China
- Beijing Key Lab of Nanophotonics & Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, 100081, Beijing, China
| | - Reshef Tenne
- Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, 7610001, Rehovot, Israel
| | - Yugui Yao
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, 100081, Beijing, China
- Beijing Key Lab of Nanophotonics & Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, 100081, Beijing, China
| | - Alla Zak
- Faculty of Sciences, Holon Institute of Technology, 52 Golomb Street, 5810201, Holon, Israel
| | - Yao Guo
- Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, 100081, Beijing, China.
- Beijing Key Lab of Nanophotonics & Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, 100081, Beijing, China.
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33
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Pushkarna I, Pásztor Á, Renner C. Twist-Angle-Dependent Electronic Properties of Exfoliated Single Layer MoS 2 on Au(111). NANO LETTERS 2023; 23:9406-9412. [PMID: 37844067 PMCID: PMC10603799 DOI: 10.1021/acs.nanolett.3c02804] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/26/2023] [Revised: 09/29/2023] [Indexed: 10/18/2023]
Abstract
Synthetic materials and heterostructures obtained by the controlled stacking of exfoliated monolayers are emerging as attractive functional materials owing to their highly tunable properties. We present a detailed scanning tunneling microscopy and spectroscopy study of single layer MoS2-on-gold heterostructures as a function of the twist angle. We find that their electronic properties are determined by the hybridization of the constituent layers and are modulated at the moiré period. The hybridization depends on the layer alignment, and the modulation amplitude vanishes with increasing twist angle. We explain our observations in terms of a hybridization between the nearest sulfur and gold atoms, which becomes spatially more homogeneous and weaker as the moiré periodicity decreases with increasing twist angle, unveiling the possibility of tunable hybridization of electronic states via twist angle engineering.
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Affiliation(s)
| | | | - Christoph Renner
- Department of Quantum Matter
Physics, Université de Genève, 24 Quai Ernest Ansermet, CH-1211 Geneva, Switzerland
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34
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Ding G, Zhao J, Zhou K, Zheng Q, Han ST, Peng X, Zhou Y. Porous crystalline materials for memories and neuromorphic computing systems. Chem Soc Rev 2023; 52:7071-7136. [PMID: 37755573 DOI: 10.1039/d3cs00259d] [Citation(s) in RCA: 14] [Impact Index Per Article: 14.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 09/28/2023]
Abstract
Porous crystalline materials usually include metal-organic frameworks (MOFs), covalent organic frameworks (COFs), hydrogen-bonded organic frameworks (HOFs) and zeolites, which exhibit exceptional porosity and structural/composition designability, promoting the increasing attention in memory and neuromorphic computing systems in the last decade. From both the perspective of materials and devices, it is crucial to provide a comprehensive and timely summary of the applications of porous crystalline materials in memory and neuromorphic computing systems to guide future research endeavors. Moreover, the utilization of porous crystalline materials in electronics necessitates a shift from powder synthesis to high-quality film preparation to ensure high device performance. This review highlights the strategies for preparing porous crystalline materials films and discusses their advancements in memory and neuromorphic electronics. It also provides a detailed comparative analysis and presents the existing challenges and future research directions, which can attract the experts from various fields (e.g., materials scientists, chemists, and engineers) with the aim of promoting the applications of porous crystalline materials in memory and neuromorphic computing systems.
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Affiliation(s)
- Guanglong Ding
- Institute for Advanced Study, Shenzhen University, Shenzhen, China.
| | - JiYu Zhao
- Institute for Advanced Study, Shenzhen University, Shenzhen, China.
- State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, Dalian University of Technology, Dalian 116024, China
- State Key Laboratory of Fine Chemicals, College of Materials Science and Engineering, Shenzhen University, Shenzhen 518060, China
| | - Kui Zhou
- Institute for Advanced Study, Shenzhen University, Shenzhen, China.
| | - Qi Zheng
- Institute for Advanced Study, Shenzhen University, Shenzhen, China.
| | - Su-Ting Han
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Xiaojun Peng
- State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials, Dalian University of Technology, Dalian 116024, China
- State Key Laboratory of Fine Chemicals, College of Materials Science and Engineering, Shenzhen University, Shenzhen 518060, China
| | - Ye Zhou
- Institute for Advanced Study, Shenzhen University, Shenzhen, China.
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35
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Xie M, Jia Y, Nie C, Liu Z, Tang A, Fan S, Liang X, Jiang L, He Z, Yang R. Monolithic 3D integration of 2D transistors and vertical RRAMs in 1T-4R structure for high-density memory. Nat Commun 2023; 14:5952. [PMID: 37741834 PMCID: PMC10517937 DOI: 10.1038/s41467-023-41736-2] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/19/2022] [Accepted: 09/12/2023] [Indexed: 09/25/2023] Open
Abstract
Emerging data-intensive computation has driven the advanced packaging and vertical stacking of integrated circuits, for minimized latency and energy consumption. Yet a monolithic three-dimensional (3D) integrated structure with interleaved logic and high-density memory layers has been difficult to achieve due to challenges in managing the thermal budget. Here we experimentally demonstrate a monolithic 3D integration of atomically-thin molybdenum disulfide (MoS2) transistors and 3D vertical resistive random-access memories (VRRAMs), with the MoS2 transistors stacked between the bottom-plane and top-plane VRRAMs. The whole fabrication process is integration-friendly (below 300 °C), and the measurement results confirm that the top-plane fabrication does not affect the bottom-plane devices. The MoS2 transistor can drive each layer of VRRAM into four resistance states. Circuit-level modeling of the monolithic 3D structure demonstrates smaller area, faster data transfer, and lower energy consumption than a planar memory. Such platform holds a high potential for energy-efficient 3D on-chip memory systems.
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Affiliation(s)
- Maosong Xie
- University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai, China
| | - Yueyang Jia
- University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai, China
| | - Chen Nie
- School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, China
| | - Zuheng Liu
- University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai, China
| | - Alvin Tang
- Department of Electrical Engineering, Stanford University, Stanford, California, USA
| | - Shiquan Fan
- School of Microelectronics, Xi'an Jiaotong University, Xi'an, Shaanxi, China
| | - Xiaoyao Liang
- School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, China
| | - Li Jiang
- School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, China
- MoE Key Lab of Artificial Intelligence, Shanghai Jiao Tong University, Shanghai, China
- Shanghai Qi Zhi Institute, Shanghai, China
| | - Zhezhi He
- School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, China.
| | - Rui Yang
- University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai, China.
- School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, China.
- State Key Laboratory of Radio Frequency Heterogeneous Integration, Shanghai Jiao Tong University, Shanghai, China.
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36
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Ra HS, Kim TW, Taylor DA, Lee JJ, Song S, Ahn J, Jang J, Taniguchi T, Watanabe K, Shim JW, Lee JS, Hwang DK. Probing Optical Multi-Level Memory Effects in Single Core-Shell Quantum Dots and Application Through 2D-0D Hybrid Inverters. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2303664. [PMID: 37465946 DOI: 10.1002/adma.202303664] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/19/2023] [Revised: 07/14/2023] [Accepted: 07/17/2023] [Indexed: 07/20/2023]
Abstract
Challenges in the development of a multi-level memory (MM) device for multinary arithmetic computers have posed an obstacle to low-power, ultra-high-speed operation. For the effective transfer of a huge amount of data between arithmetic and storage devices, optical communication technology represents a compelling solution. Here, by replicating a floating gate architecture with CdSe/ZnS type-I core/shell quantum dots (QDs), a 2D-0D hybrid optical multi-level memory (OMM) device operated is demonstrated by laser pulses. In the device, laser pulses create linear optically trapped currents with MM characteristics, while conversely, voltage pulses reset all the trapped currents at once. Assuming electron transfer via the energy band alignment between MoS2 and CdSe, the study also establishes the mechanism of the OMM effect. Analysis of the designed device led to a new hypothesis that charge transfer is difficult for laterally adjacent QDs facing a double ZnS shell, which is tested by separately stimulating different positions on the 2D-0D hybrid structure with finely focused laser pulses. Results indicate that each laser pulse induced independent MM characteristics in the 2D-0D hybrid architecture. Based on this phenomenon, we propose a MM inverter to produce MM effects, such as programming and erasing, solely through the use of laser pulses. Finally, the feasibility of a fully optically-controlled intelligent system based on the proposed OMM inverters is evaluated through a CIFAR-10 pattern recognition task using a convolutional neural network.
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Affiliation(s)
- Hyun-Soo Ra
- Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea
| | - Tae Wook Kim
- Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea
- School of Electrical Engineering, Korea University, Seoul, 02841, Republic of Korea
| | - Derrick Allan Taylor
- Department of Energy Science and Engineering, Daegu Gyeongbuk Institute of Science and Technology (DGIST), Daegu, 42988, Republic of Korea
| | - Je-Jun Lee
- Center for Spintronics, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea
| | - Seungho Song
- Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea
| | - Jongtae Ahn
- Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea
| | - Jisu Jang
- Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea
| | - Takashi Taniguchi
- Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba, 305-0044, Japan
| | - Kenji Watanabe
- Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba, 305-0044, Japan
| | - Jae Won Shim
- School of Electrical Engineering, Korea University, Seoul, 02841, Republic of Korea
| | - Jong-Soo Lee
- Department of Energy Science and Engineering, Daegu Gyeongbuk Institute of Science and Technology (DGIST), Daegu, 42988, Republic of Korea
| | - Do Kyung Hwang
- Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea
- Division of Nanoscience & Technology, KIST School, University of Science and Technology (UST), Seoul, 02792, Republic of Korea
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul, 02841, Republic of Korea
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37
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Vu NTT, Loh L, Chen Y, Wu Q, Verzhbitskiy IA, Watanabe K, Taniguchi T, Bosman M, Ang YS, Ang LK, Trushin M, Eda G. Single Atomic Defect Conductivity for Selective Dilute Impurity Imaging in 2D Semiconductors. ACS NANO 2023; 17:15648-15655. [PMID: 37565985 DOI: 10.1021/acsnano.3c02758] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/12/2023]
Abstract
Precisely controlled impurity doping is of fundamental significance in modern semiconductor technologies. Desired physical properties are often achieved at impurity concentrations well below parts per million level. For emergent two-dimensional semiconductors, development of reliable doping strategies is hindered by the inherent difficulty in identifying and quantifying impurities in such a dilute limit where the absolute number of atoms to be detected is insufficient for common analytical techniques. Here we report rapid high-contrast imaging of dilute single atomic impurities by using conductive atomic force microscopy. We show that the local conductivity is enhanced by more than 100-fold by a single impurity atom due to resonance-assisted tunneling. Unlike the closely related scanning tunneling microscopy, the local conductivity sensitively depends on the impurity energy level, allowing minority defects to be selectively imaged. We further demonstrate subsurface impurity detection with single monolayer depth resolution in multilayer materials.
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Affiliation(s)
- Nam Thanh Trung Vu
- Physics Department, National University of Singapore, Singapore 117551, Singapore
| | - Leyi Loh
- Physics Department, National University of Singapore, Singapore 117551, Singapore
- Department of Materials Science and Engineering, National University of Singapore, 9 Engineering Drive 1, Singapore 117575, Singapore
| | - Yuan Chen
- Chemistry Department, National University of Singapore, Singapore 117543, Singapore
| | - Qingyun Wu
- Science, Mathematics, and Technology, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore
| | - Ivan A Verzhbitskiy
- Physics Department, National University of Singapore, Singapore 117551, Singapore
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Singapore
| | - Kenji Watanabe
- Research Centre for Functional Materials, National Institute for Materials Science, Tsukuba 305-0047, Japan
| | - Takashi Taniguchi
- International Centre for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba 305-0047, Japan
| | - Michel Bosman
- Department of Materials Science and Engineering, National University of Singapore, 9 Engineering Drive 1, Singapore 117575, Singapore
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Singapore
| | - Yee Sin Ang
- Science, Mathematics, and Technology, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore
| | - Lay Kee Ang
- Science, Mathematics, and Technology, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore
| | - Maxim Trushin
- Department of Materials Science and Engineering, National University of Singapore, 9 Engineering Drive 1, Singapore 117575, Singapore
- Centre for Advanced 2D Materials, National University of Singapore, Singapore 117546, Singapore
- Institute for Functional Intelligent Materials, National University of Singapore, Singapore 117544, Singapore
| | - Goki Eda
- Physics Department, National University of Singapore, Singapore 117551, Singapore
- Chemistry Department, National University of Singapore, Singapore 117543, Singapore
- Centre for Advanced 2D Materials, National University of Singapore, Singapore 117546, Singapore
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Boschetto G, Carapezzi S, Todri-Sanial A. Non-volatile resistive switching mechanism in single-layer MoS 2 memristors: insights from ab initio modelling of Au and MoS 2 interfaces. NANOSCALE ADVANCES 2023; 5:4203-4212. [PMID: 37560426 PMCID: PMC10408618 DOI: 10.1039/d3na00045a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/19/2023] [Accepted: 07/18/2023] [Indexed: 08/11/2023]
Abstract
Non-volatile memristive devices based on two-dimensional (2D) layered materials provide an attractive alternative to conventional flash memory chips. Single-layer semiconductors, such as monolayer molybdenum disulphide (ML-MoS2), enable the aggressive downscaling of devices towards greater system integration density. The "atomristor", the most compact device to date, has been shown to undergo a resistive switching between its high-resistance (HRS) and low-resistance (LRS) states of several orders of magnitude. The main hypothesis behind its working mechanism relies on the migration of sulphur vacancies in the proximity of the metal contact during device operation, thus inducing the variation of the Schottky barrier at the metal-semiconductor interface. However, the interface physics is not yet fully understood: other hypotheses were proposed, involving the migration of metal atoms from the electrode. In this work, we aim to elucidate the mechanism of the resistive switching in the atomristor. We carry out density functional theory (DFT) simulations on model Au and ML-MoS2 interfaces with and without the presence of point defects, either vacancies or substitutions. To construct realistic interfaces, we combine DFT with Green's function surface simulations. Our findings reveal that it is not the mere presence of S vacancies but rather the migration of Au atoms from the electrode to MoS2 that modulate the interface barrier. Indeed, Au atoms act as conductive "bridges", thus facilitating the flow of charge between the two materials.
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Affiliation(s)
- Gabriele Boschetto
- Laboratory of Computer Science, Robotics, and Microelectronics, University of Montpellier, CNRS 161 Rue Ada 34095 Montpellier France
| | - Stefania Carapezzi
- Laboratory of Computer Science, Robotics, and Microelectronics, University of Montpellier, CNRS 161 Rue Ada 34095 Montpellier France
| | - Aida Todri-Sanial
- Laboratory of Computer Science, Robotics, and Microelectronics, University of Montpellier, CNRS 161 Rue Ada 34095 Montpellier France
- Department of Electrical Engineering, Eindhoven University of Technology Groene Loper 3 5612 AE Eindhoven Netherlands
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Liu Y, Zhou X, Yan H, Shi X, Chen K, Zhou J, Meng J, Wang T, Ai Y, Wu J, Chen J, Zeng K, Chen L, Peng Y, Sun X, Chen P, Peng H. Highly Reliable Textile-Type Memristor by Designing Aligned Nanochannels. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2301321. [PMID: 37154271 DOI: 10.1002/adma.202301321] [Citation(s) in RCA: 5] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/10/2023] [Revised: 05/02/2023] [Indexed: 05/10/2023]
Abstract
Information-processing devices are the core components of modern electronics. Integrating them into textiles is the indispensable demand for electronic textiles to form close-loop functional systems. Memristors with crossbar configuration are regarded as promising building blocks to design woven information-processing devices that seamlessly unify with textiles. However, the memristors always suffer from severe temporal and spatial variations due to the random growth of conductive filaments during filamentary switching processes. Here, inspired by the ion nanochannels across synaptic membranes, a highly reliable textile-type memristor made of Pt/CuZnS memristive fiber with aligned nanochannels, showing small set voltage variation (<5.6%) under ultralow set voltage (≈0.089 V), high on/off ratio (≈106 ), and low power consumption (0.1 nW), is reported. Experimental evidence indicate that nanochannels with abundant active S defects can anchor silver ions and confine their migrations to form orderly and efficient conductive filaments. Such memristive performances enable the resultant textile-type memristor array to have high device-to-device uniformity and process complex physiological data like brainwave signals with high recognition accuracy (95%). The textile-type memristor arrays are mechanically durable to withstand hundreds of bending and sliding deformations, and seamlessly unified with sensing, power-supplying, and displaying textiles/fibers to form all-textile integrated electronic systems for new generation human-machine interactions.
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Affiliation(s)
- Yue Liu
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Xufeng Zhou
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Hui Yan
- School of Electronic and Information Engineering, Beijing Jiaotong University, Beijing, 100044, China
| | - Xiang Shi
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Ke Chen
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Jinyang Zhou
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Jialin Meng
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China
| | - Tianyu Wang
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China
| | - Yulu Ai
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Jingxia Wu
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Jiaxin Chen
- Department of Materials Science, Fudan University, Shanghai, 200433, China
| | - Kaiwen Zeng
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Lin Chen
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai, 200433, China
| | - Yahui Peng
- School of Electronic and Information Engineering, Beijing Jiaotong University, Beijing, 100044, China
| | - Xuemei Sun
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Peining Chen
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
| | - Huisheng Peng
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science and Laboratory of Advanced Materials, Fudan University, Shanghai, 200438, China
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Lin YC, Torsi R, Younas R, Hinkle CL, Rigosi AF, Hill HM, Zhang K, Huang S, Shuck CE, Chen C, Lin YH, Maldonado-Lopez D, Mendoza-Cortes JL, Ferrier J, Kar S, Nayir N, Rajabpour S, van Duin ACT, Liu X, Jariwala D, Jiang J, Shi J, Mortelmans W, Jaramillo R, Lopes JMJ, Engel-Herbert R, Trofe A, Ignatova T, Lee SH, Mao Z, Damian L, Wang Y, Steves MA, Knappenberger KL, Wang Z, Law S, Bepete G, Zhou D, Lin JX, Scheurer MS, Li J, Wang P, Yu G, Wu S, Akinwande D, Redwing JM, Terrones M, Robinson JA. Recent Advances in 2D Material Theory, Synthesis, Properties, and Applications. ACS NANO 2023; 17:9694-9747. [PMID: 37219929 PMCID: PMC10324635 DOI: 10.1021/acsnano.2c12759] [Citation(s) in RCA: 23] [Impact Index Per Article: 23.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/24/2023]
Abstract
Two-dimensional (2D) material research is rapidly evolving to broaden the spectrum of emergent 2D systems. Here, we review recent advances in the theory, synthesis, characterization, device, and quantum physics of 2D materials and their heterostructures. First, we shed insight into modeling of defects and intercalants, focusing on their formation pathways and strategic functionalities. We also review machine learning for synthesis and sensing applications of 2D materials. In addition, we highlight important development in the synthesis, processing, and characterization of various 2D materials (e.g., MXnenes, magnetic compounds, epitaxial layers, low-symmetry crystals, etc.) and discuss oxidation and strain gradient engineering in 2D materials. Next, we discuss the optical and phonon properties of 2D materials controlled by material inhomogeneity and give examples of multidimensional imaging and biosensing equipped with machine learning analysis based on 2D platforms. We then provide updates on mix-dimensional heterostructures using 2D building blocks for next-generation logic/memory devices and the quantum anomalous Hall devices of high-quality magnetic topological insulators, followed by advances in small twist-angle homojunctions and their exciting quantum transport. Finally, we provide the perspectives and future work on several topics mentioned in this review.
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Affiliation(s)
- Yu-Chuan Lin
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 300, Taiwan
| | - Riccardo Torsi
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Rehan Younas
- Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - Christopher L Hinkle
- Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - Albert F Rigosi
- National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Heather M Hill
- National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Kunyan Zhang
- Department of Electrical and Computer Engineering, Rice University, Houston, Texas 77005, United States
- Department of Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Shengxi Huang
- Department of Electrical and Computer Engineering, Rice University, Houston, Texas 77005, United States
- Department of Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Christopher E Shuck
- A.J. Drexel Nanomaterials Institute and Department of Materials Science and Engineering, Drexel University, Philadelphia, Pennsylvania 19104, United States
| | - Chen Chen
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Yu-Hsiu Lin
- Department of Chemical Engineering & Materials Science, Michigan State University, East Lansing, Michigan 48824, United States
| | - Daniel Maldonado-Lopez
- Department of Chemical Engineering & Materials Science, Michigan State University, East Lansing, Michigan 48824, United States
| | - Jose L Mendoza-Cortes
- Department of Chemical Engineering & Materials Science, Michigan State University, East Lansing, Michigan 48824, United States
| | - John Ferrier
- Department of Physics and Chemical Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Swastik Kar
- Department of Physics and Chemical Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Nadire Nayir
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Mechanical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Physics, Karamanoglu Mehmet University, Karaman 70100, Turkey
| | - Siavash Rajabpour
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Adri C T van Duin
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Mechanical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Chemical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Xiwen Liu
- Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Deep Jariwala
- Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Jie Jiang
- Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, United States
| | - Jian Shi
- Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, United States
| | - Wouter Mortelmans
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02142, United States
| | - Rafael Jaramillo
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02142, United States
| | - Joao Marcelo J Lopes
- Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplaz 5-7, 10117 Berlin, Germany
| | - Roman Engel-Herbert
- Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplaz 5-7, 10117 Berlin, Germany
| | - Anthony Trofe
- Department of Nanoscience, Joint School of Nanoscience & Nanoengineering, University of North Carolina at Greensboro, Greensboro, North Carolina 27401, United States
| | - Tetyana Ignatova
- Department of Nanoscience, Joint School of Nanoscience & Nanoengineering, University of North Carolina at Greensboro, Greensboro, North Carolina 27401, United States
| | - Seng Huat Lee
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Zhiqiang Mao
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Leticia Damian
- Department of Physics, University of North Texas, Denton, Texas 76203, United States
| | - Yuanxi Wang
- Department of Physics, University of North Texas, Denton, Texas 76203, United States
| | - Megan A Steves
- Institute for Quantitative Biosciences, University of California Berkeley, Berkeley, California 94720, United States
| | - Kenneth L Knappenberger
- Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Zhengtianye Wang
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, United States
| | - Stephanie Law
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, United States
| | - George Bepete
- Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Center for 2-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Center for Atomically Thin Multifunctional Coatings, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Da Zhou
- Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Center for 2-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Jiang-Xiazi Lin
- Department of Physics, Brown University, Providence, Rhode Island 02906, United States
| | - Mathias S Scheurer
- Institute for Theoretical Physics, University of Innsbruck, Innsbruck A-6020, Austria
| | - Jia Li
- Department of Physics, Brown University, Providence, Rhode Island 02906, United States
| | - Pengjie Wang
- Department of Physics, Princeton University, Princeton, New Jersey 08540, United States
| | - Guo Yu
- Department of Physics, Princeton University, Princeton, New Jersey 08540, United States
- Department of Electrical and Computer Engineering, Princeton University, Princeton, New Jersey 08540, United States
| | - Sanfeng Wu
- Department of Physics, Princeton University, Princeton, New Jersey 08540, United States
| | - Deji Akinwande
- Department of Electrical and Computer Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
- Microelectronics Research Center, The University of Texas, Austin, Texas 78758, United States
| | - Joan M Redwing
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Mauricio Terrones
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Center for 2-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Center for Atomically Thin Multifunctional Coatings, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Research Initiative for Supra-Materials and Global Aqua Innovation Center, Shinshu University, Nagano 380-8553, Japan
| | - Joshua A Robinson
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Chemistry, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Center for 2-Dimensional and Layered Materials, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
- Center for Atomically Thin Multifunctional Coatings, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
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Desai DV, Yang J, Lee HH. Characteristics of Synaptic Function of Mesoporous Silica-Titania and Mesoporous Titania Lateral Electrode Devices. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13111734. [PMID: 37299637 DOI: 10.3390/nano13111734] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/29/2023] [Revised: 05/23/2023] [Accepted: 05/23/2023] [Indexed: 06/12/2023]
Abstract
In this paper, we have fabricated non-volatile memory resistive switching (RS) devices and analyzed analog memristive characteristics using lateral electrodes with mesoporous silica-titania (meso-ST) and mesoporous titania (meso-T) layers. For the planar-type device having two parallel electrodes, current-voltage (I-V) curves and pulse-driven current changes could reveal successful long-term potentiation (LTP) along with long-term depression (LTD), respectively, by the RS active mesoporous two layers for 20~100 μm length. Through mechanism characterization using chemical analysis, non-filamental memristive behavior unlike the conventional metal electroforming was identified. Additionally, high performance of the synaptic operations could be also accomplished such that a high current of 10-6 Amp level could occur despite a wide electrode spacing and short pulse spike biases under ambient condition with moderate humidity (RH 30~50%). Moreover, it was confirmed that rectifying characteristics were observed during the I-V measurement, which was a representative feature of dual functionality of selection diode and the analog RS device for both meso-ST and meso-T devices. The memristive and synaptic functions along with the rectification property could facilitate a chance of potential implementation of the meso-ST and meso-T devices to neuromorphic electronics platform.
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Affiliation(s)
- Dhanashri Vitthal Desai
- Department of Chemical Engineering, Myongji University, Yongin-Si 17058, Gyeonggi-Do, Republic of Korea
| | - Jongmin Yang
- Department of Chemical Engineering, Myongji University, Yongin-Si 17058, Gyeonggi-Do, Republic of Korea
| | - Hyun Ho Lee
- Department of Chemical Engineering, Myongji University, Yongin-Si 17058, Gyeonggi-Do, Republic of Korea
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42
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Kim J, Lee JH, Kim SH, Park Y, Jeong U, Lee D. First-Principles Investigations on the Semiconductor-to-Metal Phase Transition of 2D Si 2Te 3 for Reversible Resistive Switching. ACS APPLIED MATERIALS & INTERFACES 2023; 15:22212-22218. [PMID: 37116174 DOI: 10.1021/acsami.3c01267] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/11/2023]
Abstract
Si2Te3 is attracting attention due to its compatibility with Si technology while still showing advantages as a two-dimensional layered material. Although recent experimental studies have observed the resistive switching process in Si2Te3-based memristors, the mechanism has not been clearly identified. In this study, first-principles density functional theory calculations are employed to understand the relationship between the phase transition of Si2Te3 and the reversible resistive switching of the Si2Te3-based memristor. Our calculation results show that although semiconducting Si2Te3 is energetically more stable than two metallic Si2Te3 phases (α and β), two metallic Si2Te3 can be energetically stabilized by excess holes. The enhanced energetic preference of two metallic Si2Te3 by excess holes is explained by the reduced occupation of antibonding states between Si and Te. Our study finds that the energy barrier for the phase transition between semiconducting Si2Te3 and α-metallic Si2Te3 varies significantly by excess charge carriers so the phase transition can be directly connected to the reversible resistive switching of the Si2Te3-based memristor under external bias. Our finding will serve as a cornerstone for optimizing the resistive switching process of the Si2Te3-based memristor.
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Affiliation(s)
- Jaeseon Kim
- Department of Materials Science and Engineering (MSE), and Division of Advanced Materials Science (AMS), Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - June Ho Lee
- Department of Materials Science and Engineering (MSE), and Division of Advanced Materials Science (AMS), Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Seong Hun Kim
- Department of Materials Science and Engineering (MSE), and Division of Advanced Materials Science (AMS), Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Youngjun Park
- Department of Materials Science and Engineering (MSE), and Division of Advanced Materials Science (AMS), Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Unyong Jeong
- Department of Materials Science and Engineering (MSE), and Division of Advanced Materials Science (AMS), Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Donghwa Lee
- Department of Materials Science and Engineering (MSE), and Division of Advanced Materials Science (AMS), Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
- Institute for Convergence Research and Education in Advanced Technology (I_CREATE), Yonsei University, Incheon 21983, Republic of Korea
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43
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Ai L, Pei Y, Song Z, Yong X, Song H, Liu G, Nie M, Waterhouse GIN, Yan X, Lu S. Ligand-Triggered Self-Assembly of Flexible Carbon Dot Nanoribbons for Optoelectronic Memristor Devices and Neuromorphic Computing. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2023; 10:e2207688. [PMID: 36807578 PMCID: PMC10131856 DOI: 10.1002/advs.202207688] [Citation(s) in RCA: 15] [Impact Index Per Article: 15.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/25/2023] [Indexed: 05/19/2023]
Abstract
Carbon dots (CDs) are widely utilized in sensing, energy storage, and catalysis due to their excellent optical, electrical and semiconducting properties. However, attempts to optimize their optoelectronic performance through high-order manipulation have met with little success to date. In this study, through efficient packing of individual CDs in two-dimensions, the synthesis of flexible CDs ribbons is demonstrated technically. Electron microscopies and molecular dynamics simulations, show the assembly of CDs into ribbons results from the tripartite balance of π-π attractions, hydrogen bonding, and halogen bonding forces provided by the superficial ligands. The obtained ribbons are flexible and show excellent stability against UV irradiation and heating. CDs ribbons offer outstanding performance as active layer material in transparent flexible memristors, with the developed devices providing excellent data storage, retention capabilities, and fast optoelectronic responses. A memristor device with a thickness of 8 µm shows good data retention capability even after 104 cycles of bending. Furthermore, the device functions effectively as a neuromorphic computing system with integrated storage and computation capabilities, with the response speed of the device being less than 5.5 ns. These properties create an optoelectronic memristor with rapid Chinese character learning capability. This work lays the foundation for wearable artificial intelligence.
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Affiliation(s)
- Lin Ai
- Green Catalysis Center, and College of ChemistryZhengzhou UniversityZhengzhou450000China
| | - Yifei Pei
- Key Laboratory of Brain‐Like Neuromorphic Devices and Systems of Hebei ProvinceCollege of Physics Science & TechnologyHebei UniversityBaoding071002China
| | - Ziqi Song
- Green Catalysis Center, and College of ChemistryZhengzhou UniversityZhengzhou450000China
| | - Xue Yong
- Department of ChemistryUniversity of SheffieldSheffieldS3 7HFUK
| | - Haoqiang Song
- Green Catalysis Center, and College of ChemistryZhengzhou UniversityZhengzhou450000China
| | - Gongjie Liu
- Key Laboratory of Brain‐Like Neuromorphic Devices and Systems of Hebei ProvinceCollege of Physics Science & TechnologyHebei UniversityBaoding071002China
| | - Mingjun Nie
- Green Catalysis Center, and College of ChemistryZhengzhou UniversityZhengzhou450000China
| | | | - Xiaobing Yan
- Key Laboratory of Brain‐Like Neuromorphic Devices and Systems of Hebei ProvinceCollege of Physics Science & TechnologyHebei UniversityBaoding071002China
| | - Siyu Lu
- Green Catalysis Center, and College of ChemistryZhengzhou UniversityZhengzhou450000China
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44
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Symonowicz J, Polyushkin D, Mueller T, Di Martino G. Fully Optical in Operando Investigation of Ambient Condition Electrical Switching in MoS 2 Nanodevices. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2209968. [PMID: 36539947 DOI: 10.1002/adma.202209968] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/28/2022] [Revised: 12/04/2022] [Indexed: 06/17/2023]
Abstract
MoS2 nanoswitches have shown superb ultralow switching energies without excessive leakage currents. However, the debate about the origin and volatility of electrical switching is unresolved due to the lack of adequate nanoimaging of devices in operando. Here, three optical techniques are combined to perform the first noninvasive in situ characterization of nanosized MoS2 devices. This study reveals volatile threshold resistive switching due to the intercalation of metallic atoms from electrodes directly between Mo and S atoms, without the assistance of sulfur vacancies. A "semi-memristive" effect driven by an organic adlayer adjacent to MoS2 is observed, which suggests that nonvolatility can be achieved by careful interface engineering. These findings provide a crucial understanding of nanoprocess in vertically biased MoS2 nanosheets, which opens new routes to conscious engineering and optimization of 2D electronics.
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Affiliation(s)
- Joanna Symonowicz
- Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Rd, Cambridge, CB3 0FS, UK
| | - Dmitry Polyushkin
- Vienna University of Technology, Institute of Photonics, Gusshausstrasse 27-29 / 387, Vienna, 1040, Austria
| | - Thomas Mueller
- Vienna University of Technology, Institute of Photonics, Gusshausstrasse 27-29 / 387, Vienna, 1040, Austria
| | - Giuliana Di Martino
- Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Rd, Cambridge, CB3 0FS, UK
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Pang J, Peng S, Hou C, Zhao H, Fan Y, Ye C, Zhang N, Wang T, Cao Y, Zhou W, Sun D, Wang K, Rümmeli MH, Liu H, Cuniberti G. Applications of Graphene in Five Senses, Nervous System, and Artificial Muscles. ACS Sens 2023; 8:482-514. [PMID: 36656873 DOI: 10.1021/acssensors.2c02790] [Citation(s) in RCA: 7] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/20/2023]
Abstract
Graphene remains of great interest in biomedical applications because of biocompatibility. Diseases relating to human senses interfere with life satisfaction and happiness. Therefore, the restoration by artificial organs or sensory devices may bring a bright future by the recovery of senses in patients. In this review, we update the most recent progress in graphene based sensors for mimicking human senses such as artificial retina for image sensors, artificial eardrums, gas sensors, chemical sensors, and tactile sensors. The brain-like processors are discussed based on conventional transistors as well as memristor related neuromorphic computing. The brain-machine interface is introduced for providing a single pathway. Besides, the artificial muscles based on graphene are summarized in the means of actuators in order to react to the physical world. Future opportunities remain for elevating the performances of human-like sensors and their clinical applications.
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Affiliation(s)
- Jinbo Pang
- Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, Institute for Advanced Interdisciplinary Research (iAIR), University of Jinan, Jinan 250022, China
| | - Songang Peng
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center and Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
| | - Chongyang Hou
- Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, Institute for Advanced Interdisciplinary Research (iAIR), University of Jinan, Jinan 250022, China
| | - Hongbin Zhao
- State Key Laboratory of Advanced Materials for Smart Sensing, GRINM Group Co. Ltd., Xinwai Street 2, Beijing 100088, People's Republic of China
| | - Yingju Fan
- School of Chemistry and Chemical Engineering, University of Jinan, Shandong, Jinan 250022, China
| | - Chen Ye
- School of Chemistry and Chemical Engineering, University of Jinan, Shandong, Jinan 250022, China
| | - Nuo Zhang
- School of Chemistry and Chemical Engineering, University of Jinan, Shandong, Jinan 250022, China
| | - Ting Wang
- State Key Laboratory of Biobased Material and Green Papermaking and People's Republic of China School of Bioengineering, Qilu University of Technology, Shandong Academy of Sciences, No. 3501 Daxue Road, Jinan 250353, People's Republic of China
| | - Yu Cao
- Key Laboratory of Modern Power System Simulation and Control & Renewable Energy Technology (Ministry of Education) and School of Electrical Engineering, Northeast Electric Power University, Jilin 132012, China
| | - Weijia Zhou
- Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, Institute for Advanced Interdisciplinary Research (iAIR), University of Jinan, Jinan 250022, China
| | - Ding Sun
- School of Electrical and Computer Engineering, Jilin Jianzhu University, Changchun 130118, P. R. China
| | - Kai Wang
- School of Electrical Engineering, Weihai Innovation Research Institute, Qingdao University, Qingdao 266000, China
| | - Mark H Rümmeli
- Leibniz Institute for Solid State and Materials Research Dresden, Dresden, D-01171, Germany.,College of Energy, Soochow Institute for Energy and Materials Innovations, and Key Laboratory of Advanced Carbon Materials and Wearable Energy Technologies of Jiangsu Province, Soochow University, Suzhou 215006, China.,Centre of Polymer and Carbon Materials, Polish Academy of Sciences, M. Curie Sklodowskiej 34, Zabrze 41-819, Poland.,Institute for Complex Materials, IFW Dresden, 20 Helmholtz Strasse, Dresden 01069, Germany.,Center for Energy and Environmental Technologies, VŠB-Technical University of Ostrava, 17. Listopadu 15, Ostrava 708 33, Czech Republic
| | - Hong Liu
- Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, Institute for Advanced Interdisciplinary Research (iAIR), University of Jinan, Jinan 250022, China.,State Key Laboratory of Crystal Materials, Center of Bio & Micro/Nano Functional Materials, Shandong University, 27 Shandanan Road, Jinan 250100, China
| | - Gianaurelio Cuniberti
- Institute for Materials Science and Max Bergmann Center of Biomaterials and Center for Advancing Electronics Dresden, Technische Universität Dresden, Dresden 01069, Germany
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46
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Yu S, Cai Z, Sun D, Wu YN, Chen S. Defect Mo S Misidentified as Mo S2 in Monolayer MoS 2 by Scanning Transmission Electron Microscopy: A First-Principles Prediction. J Phys Chem Lett 2023; 14:1840-1847. [PMID: 36779693 DOI: 10.1021/acs.jpclett.3c00032] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
The defect types in layered semiconductors can be identified by matching the scanning transmission electron microscopy (STEM) images with the structures from first-principles simulations. In a PVD-grown MoS2 monolayer, the MoS2 antisite (one Mo replaces two S) is recognized as being dominant, because its calculated structure matches the distortive structure in STEM images. Therefore, MoS2 has received much attention in MoS2-related defect engineering. We reveal that MoS (one Mo replaces one S) may be mistaken for MoS2, because ionized MoS also has similar structural distortion and can easily be ionized under electron irradiation. Unfortunately, the radiation-induced ionization and associated structural distortion of MoS were overlooked in previous studies. Because the formation energy of MoS is much lower than that of MoS2, it is more likely to exist as the dominant defect in MoS2. Our results highlight the necessity of considering the defect ionization and associated structural distortion in STEM identification of defects in layered semiconductors.
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Affiliation(s)
- Song Yu
- School of Physics and Electronic Sciences, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University, Shanghai 200241, China
| | - Zenghua Cai
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Deyan Sun
- School of Physics and Electronic Sciences, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University, Shanghai 200241, China
| | - Yu-Ning Wu
- School of Physics and Electronic Sciences, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University, Shanghai 200241, China
| | - Shiyou Chen
- School of Physics and Electronic Sciences, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University, Shanghai 200241, China
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China
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47
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Kazemi SA, Imani Yengejeh S, Ogunkunle SA, Zhang L, Wen W, Wee-Chung Liew A, Wang Y. Vacancy impacts on electronic and mechanical properties of MX2 (M = Mo, W and X = S, Se) monolayers. RSC Adv 2023; 13:6498-6506. [PMID: 36845596 PMCID: PMC9951067 DOI: 10.1039/d3ra00205e] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/11/2023] [Accepted: 02/20/2023] [Indexed: 02/26/2023] Open
Abstract
Monolayers of transition metal dichalcogenides (TMD) exhibit excellent mechanical and electrical characteristics. Previous studies have shown that vacancies are frequently created during the synthesis, which can alter the physicochemical characteristics of TMDs. Even though the properties of pristine TMD structures are well studied, the effects of vacancies on the electrical and mechanical properties have received far less attention. In this paper, we applied first-principles density functional theory (DFT) to comparatively investigate the properties of defective TMD monolayers including molybdenum disulfide (MoS2), molybdenum diselenide (MoSe2), tungsten disulfide (WS2), and tungsten diselenide (WSe2). The impacts of six types of anion or metal complex vacancies were studied. According to our findings, the electronic and mechanical properties are slightly impacted by anion vacancy defects. In contrast, vacancies in metal complexes considerably affect their electronic and mechanical properties. Additionally, the mechanical properties of TMDs are significantly influenced by both their structural phases and anions. Specifically, defective diselenides become more mechanically unstable due to the comparatively poor bonding strength between Se and metal based on the analysis of the crystal orbital Hamilton population (COHP). The outcomes of this study may provide the theoretical knowledge base to boost more applications of the TMD systems through defect engineering.
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Affiliation(s)
- Seyedeh Alieh Kazemi
- Centre for Catalysis and Clean Energy, School of Environment and Science, Griffith University Gold Coast Campus QLD 4222 Australia
| | - Sadegh Imani Yengejeh
- Centre for Catalysis and Clean Energy, School of Environment and Science, Griffith University Gold Coast Campus QLD 4222 Australia
| | - Samuel Akinlolu Ogunkunle
- Centre for Catalysis and Clean Energy, School of Environment and Science, Griffith University Gold Coast Campus QLD 4222 Australia
| | - Lei Zhang
- Centre for Catalysis and Clean Energy, School of Environment and Science, Griffith University Gold Coast Campus QLD 4222 Australia
| | - William Wen
- Centre for Catalysis and Clean Energy, School of Environment and Science, Griffith University Gold Coast Campus QLD 4222 Australia
| | - Alan Wee-Chung Liew
- School of Information and Communication Technology, Griffith UniversityGold CoastQueensland 4215Australia
| | - Yun Wang
- Centre for Catalysis and Clean Energy, School of Environment and Science, Griffith University Gold Coast Campus QLD 4222 Australia
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48
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Liu L, Geng B, Ji W, Wu L, Lei S, Hu W. A Highly Crystalline Single Layer 2D Polymer for Low Variability and Excellent Scalability Molecular Memristors. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2208377. [PMID: 36398525 DOI: 10.1002/adma.202208377] [Citation(s) in RCA: 11] [Impact Index Per Article: 11.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/12/2022] [Revised: 11/07/2022] [Indexed: 06/16/2023]
Abstract
Large-scale growth of highly crystalline single layer 2D polymers (SL-2DPs) and their subsequent integration into memristors is key to advancing the development of high-density data storage devices. However, leakage problems resulting from the porous structure of 2DPs continue to make such advances extremely challenging. Herein, we overcome this issue by incorporating long alkoxy chains into key molecular building blocks to obtain a highly crystalline 2DP, as visualized by scanning tunneling microscopy, and prevent metal permeation in the subsequent device fabrication process. SL-2DP memristors constructed via direct evaporation of the top electrodes exhibit low variability (σVset = 0.14) due to the single-monomer-thick feature together with the high regular structure and coordination ability which minimizes the stochastic spatial distribution of conductive filaments (CFs) in both vertical and lateral dimensions. The variability is further decreased to 0.04 by confining the formation and fracture of CFs to the interface through the utilization of bilayer junctions. Using peak force tunneling atomic force microscopy, the nanometer scalability (< 50 nm2 ) and low power consumption of these molecular memristor devices are demonstrated.
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Affiliation(s)
- Lei Liu
- Tianjin Key Laboratory of Molecular Optoelectronic Science, Department of Chemistry, School of Science & Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin University, Tianjin, 300072, P. R. China
- Haihe Laboratory of Sustainable Chemical Transformations, Tianjin, 300192, China
| | - Bowen Geng
- Tianjin Key Laboratory of Molecular Optoelectronic Science, Department of Chemistry, School of Science & Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin University, Tianjin, 300072, P. R. China
- Haihe Laboratory of Sustainable Chemical Transformations, Tianjin, 300192, China
| | - Wenyan Ji
- Tianjin Key Laboratory of Molecular Optoelectronic Science, Department of Chemistry, School of Science & Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin University, Tianjin, 300072, P. R. China
- Haihe Laboratory of Sustainable Chemical Transformations, Tianjin, 300192, China
| | - Lingli Wu
- Medical College, Northwest Minzu University, Lanzhou, 730000, China
| | - Shengbin Lei
- Tianjin Key Laboratory of Molecular Optoelectronic Science, Department of Chemistry, School of Science & Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin University, Tianjin, 300072, P. R. China
- Haihe Laboratory of Sustainable Chemical Transformations, Tianjin, 300192, China
| | - Wenping Hu
- Tianjin Key Laboratory of Molecular Optoelectronic Science, Department of Chemistry, School of Science & Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin University, Tianjin, 300072, P. R. China
- Haihe Laboratory of Sustainable Chemical Transformations, Tianjin, 300192, China
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49
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Wang G, Guan Y, Wang Y, Ding Y, Yang L. Direct Laser Irradiation and Modification of 2D Te for Development of Volatile Memristor. MATERIALS (BASEL, SWITZERLAND) 2023; 16:738. [PMID: 36676475 PMCID: PMC9862747 DOI: 10.3390/ma16020738] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/22/2022] [Revised: 01/03/2023] [Accepted: 01/09/2023] [Indexed: 06/17/2023]
Abstract
Laser irradiation, as a kind of post-fabrication method for two-dimensional (2D) materials, is a promising way to tune the properties of materials and the performance of corresponding nano-devices. As the memristor has been regarded as an excellent candidate for in-memory devices in next-generation computing system, the application of laser irradiation in developing excellent memristor based on 2D materials should be explored deeply. Here, tellurene (Te) flakes are exposed to a 532 nm laser in the air atmosphere to investigate the evolutions of the surface morphology and atom structures under different irradiation parameters. Laser is capable of thinning the flakes, inducing amorphous structures, oxides and defects, and forming nanostructures by controlling the irradiation power and time. Furthermore, the laser-induced oxides and defects promote the migration of metal ions in Te, resulting in the formation of the conductive filaments, which provides the switching behavers of volatile memristor, opening a route to the development of next-generation nano-devices.
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Affiliation(s)
- Genwang Wang
- Key Laboratory of Microsystems and Microstructures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150001, China
- School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China
| | - Yanchao Guan
- Key Laboratory of Microsystems and Microstructures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150001, China
- School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China
| | - Yang Wang
- Key Laboratory of Microsystems and Microstructures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150001, China
- School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China
| | - Ye Ding
- Key Laboratory of Microsystems and Microstructures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150001, China
- School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China
| | - Lijun Yang
- Key Laboratory of Microsystems and Microstructures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150001, China
- School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, China
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50
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Lee L, Chiang CH, Shen YC, Wu SC, Shih YC, Yang TY, Hsu YC, Cyu RH, Yu YJ, Hsieh SH, Chen CH, Lebedev M, Chueh YL. Rational Design on Polymorphous Phase Switching in Molybdenum Diselenide-Based Memristor Assisted by All-Solid-State Reversible Intercalation toward Neuromorphic Application. ACS NANO 2023; 17:84-93. [PMID: 36575141 DOI: 10.1021/acsnano.2c04356] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
In this work, a low-power memristor based on vertically stacked two-dimensional (2D) layered materials, achieved by plasma-assisted vapor reaction, as the switching material, with which the copper and gold metals as electrodes featured by reversible polymorphous phase changes from a conducting 1T-phase to a semiconducting 2H-one once copper cations interacted between vertical lamellar layers and vice versa, was demonstrated. Here, molybdenum diselenide was chosen as the switching material, and the reversible polymorphous phase changes activated by the intercalation of Cu cations were confirmed by pseudo-operando Raman scattering, transmission electron microscopy, and scanning photoelectron microscopy under high and low resistance states, respectively. The switching can be activated at about ±1 V with critical currents less than 10 μA with an on/off ratio approaching 100 after 100 cycles and low power consumption of ∼0.1 microwatt as well as linear weight updates controlled by the amount of intercalation. The work provides alternative feasibility of reversible and all-solid-state metal interactions, which benefits monolithic integrations of 2D materials into operative electronic circuits.
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Affiliation(s)
- Ling Lee
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Chun-Hsiu Chiang
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Ying-Chun Shen
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Shu-Chi Wu
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yu-Chuan Shih
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Tzu-Yi Yang
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yu-Chieh Hsu
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Ruei-Hong Cyu
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yi-Jen Yu
- Instrument Center, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Shang-Hsien Hsieh
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Chia-Hao Chen
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Mikhail Lebedev
- Laboratory of Functional Films and Coatings, Nikolaev Institute of inorganic chemistry SB RAS, Lavrent'ev ave. 3, Novosibirsk 630090, Russia
| | - Yu-Lun Chueh
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
- Frontier Research Center on Fundamental and Applied Sciences of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
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