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Mori Y, Cheon T, Kotsugi Y, Kim YH, Park Y, Ansari MZ, Mohapatra D, Jang Y, Bae JS, Kwon W, Kim G, Park YB, Lee HBR, Song W, Kim SH. Self-Formation of a Ru/ZnO Multifunctional Bilayer for the Next-Generation Interconnect Technology via Area-Selective Atomic Layer Deposition. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023; 19:e2300290. [PMID: 37127866 DOI: 10.1002/smll.202300290] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/10/2023] [Revised: 03/23/2023] [Indexed: 05/03/2023]
Abstract
This study suggests a Ru/ZnO bilayer grown using area-selective atomic layer deposition (AS-ALD) as a multifunctional layer for advanced Cu metallization. As a diffusion barrier and glue layer, ZnO is selectively grown on SiO2 , excluding Cu, where Ru, as a liner and seed layer, is grown on both surfaces. Dodecanethiol (DDT) is used as an inhibitor for the AS-ALD of ZnO using diethylzinc and H2 O at 120 °C. H2 plasma treatment removes the DDT adsorbed on Cu, forming inhibitor-free surfaces. The ALD-Ru film is then successfully deposited at 220 °C using tricarbonyl(trimethylenemethane)ruthenium and O2 . The Cu/bilayer/Si structural and electrical properties are investigated to determine the diffusion barrier performance of the bilayer film. Copper silicide is not formed without the conductivity degradation of the Cu/bilayer/Si structure, even after annealing at 700 °C. The effect of ZnO on the Ru/SiO2 structure interfacial adhesion energy is investigated using a double-cantilever-beam test and is found to increase with ZnO between Ru and SiO2 . Consequently, the Ru/ZnO bilayer can be a multifunctional layer for advanced Cu interconnects. Additionally, the formation of a bottomless barrier by eliminating ZnO on the via bottom, or Cu, is expected to decrease the via resistance for the ever-shrinking Cu lines.
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Affiliation(s)
- Yuki Mori
- Chemical Materials Development Department, TANAKA Precious Metals, 22, Wadai, Tsukuba, Ibaraki, 300-4247, Japan
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea
| | - Taehoon Cheon
- School of Materials Science and Engineering, Yeungnam University, 280 Daehak-Ro, Gyeongsan, Gyeongsangbuk-do, 38541, Republic of Korea
| | - Yohei Kotsugi
- Chemical Materials Development Department, TANAKA Precious Metals, 22, Wadai, Tsukuba, Ibaraki, 300-4247, Japan
| | - Youn-Hye Kim
- School of Materials Science and Engineering, Yeungnam University, 280 Daehak-Ro, Gyeongsan, Gyeongsangbuk-do, 38541, Republic of Korea
| | - Yejin Park
- School of Materials Science and Engineering, Yeungnam University, 280 Daehak-Ro, Gyeongsan, Gyeongsangbuk-do, 38541, Republic of Korea
| | - Mohd Zahid Ansari
- School of Materials Science and Engineering, Yeungnam University, 280 Daehak-Ro, Gyeongsan, Gyeongsangbuk-do, 38541, Republic of Korea
| | - Debananda Mohapatra
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea
| | - Yujin Jang
- Busan Center, Korea Basic Science Institute, 30, Gwahaksandan 1-ro 60beon-gil, Gangseo-gu, Busan, 46742, Republic of Korea
| | - Jong-Seong Bae
- Busan Center, Korea Basic Science Institute, 30, Gwahaksandan 1-ro 60beon-gil, Gangseo-gu, Busan, 46742, Republic of Korea
| | - Woobin Kwon
- School of Materials Science and Engineering, Andong National University, Andong-si, Gyeongsangbuk-do, 36729, Republic of Korea
| | - Gahui Kim
- School of Materials Science and Engineering, Andong National University, Andong-si, Gyeongsangbuk-do, 36729, Republic of Korea
| | - Young-Bae Park
- School of Materials Science and Engineering, Andong National University, Andong-si, Gyeongsangbuk-do, 36729, Republic of Korea
| | - Han-Bo-Ram Lee
- Department of Materials Science and Engineering, Incheon National University, Incheon, 22012, Republic of Korea
| | - Wooseok Song
- Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, 34114, Republic of Korea
| | - Soo-Hyun Kim
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea
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Porrati F, Barth S, Gazzadi GC, Frabboni S, Volkov OM, Makarov D, Huth M. Site-Selective Chemical Vapor Deposition on Direct-Write 3D Nanoarchitectures. ACS NANO 2023; 17:4704-4715. [PMID: 36826847 DOI: 10.1021/acsnano.2c10968] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
Recent advancements in additive manufacturing have enabled the preparation of free-shaped 3D objects with feature sizes down to and below the micrometer scale. Among the fabrication methods, focused electron beam- and focused ion beam-induced deposition (FEBID and FIBID, respectively) associate a high flexibility and unmatched accuracy in 3D writing with a wide material portfolio, thereby allowing for the growth of metallic to insulating materials. The combination of the free-shaped 3D nanowriting with established chemical vapor deposition (CVD) techniques provides attractive opportunities to synthesize complex 3D core-shell heterostructures. Hence, this hybrid approach enables the fabrication of morphologically tunable layer-based nanostructures with the great potential of unlocking further functionalities. Here, the fundamentals of such a hybrid approach are demonstrated by preparing core-shell heterostructures using 3D FEBID scaffolds for site-selective CVD. In particular, 3D microbridges are printed by FEBID with the (CH3)3CH3C5H4Pt precursor and coated by thermal CVD using the Nb(NMe2)3(N-t-Bu) and HFeCo3(CO)12 precursors. Two model systems on the basis of CVD layers consisting of a superconducting NbC-based layer and a ferromagnetic Co3Fe layer are prepared and characterized with regard to their composition, microstructure, and magneto-transport properties.
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Affiliation(s)
- Fabrizio Porrati
- Physikalisches Institut, Goethe-Universität, Max-von-Laue-Str. 1, D-60438 Frankfurt am Main, Germany
| | - Sven Barth
- Physikalisches Institut, Goethe-Universität, Max-von-Laue-Str. 1, D-60438 Frankfurt am Main, Germany
| | - Gian Carlo Gazzadi
- S3 Center, Nanoscience Institute-CNR, Via Campi 213/a, I-41125 Modena, Italy
| | - Stefano Frabboni
- S3 Center, Nanoscience Institute-CNR, Via Campi 213/a, I-41125 Modena, Italy
- FIM Department, University of Modena and Reggio Emilia, Via G. Campi 213/a, I-41125 Modena, Italy
| | - Oleksii M Volkov
- Helmholtz-Zentrum DresdenRossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01328 Dresden, Germany
| | - Denys Makarov
- Helmholtz-Zentrum DresdenRossendorf e.V., Institute of Ion Beam Physics and Materials Research, 01328 Dresden, Germany
| | - Michael Huth
- Physikalisches Institut, Goethe-Universität, Max-von-Laue-Str. 1, D-60438 Frankfurt am Main, Germany
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Gluschke JG, Seidl J, Lyttleton RW, Carrad DJ, Cochrane JW, Lehmann S, Samuelson L, Micolich AP. Using Ultrathin Parylene Films as an Organic Gate Insulator in Nanowire Field-Effect Transistors. NANO LETTERS 2018; 18:4431-4439. [PMID: 29923725 DOI: 10.1021/acs.nanolett.8b01519] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
We report the development of nanowire field-effect transistors featuring an ultrathin parylene film as a polymer gate insulator. The room temperature, gas-phase deposition of parylene is an attractive alternative to oxide insulators prepared at high temperatures using atomic layer deposition. We discuss our custom-built parylene deposition system, which is designed for reliable and controlled deposition of <100 nm thick parylene films on III-V nanowires standing vertically on a growth substrate or horizontally on a device substrate. The former case gives conformally coated nanowires, which we used to produce functional Ω-gate and gate-all-around structures. These give subthreshold swings as low as 140 mV/dec and on/off ratios exceeding 103 at room temperature. For the gate-all-around structure, we developed a novel fabrication strategy that overcomes some of the limitations with previous lateral wrap-gate nanowire transistors. Finally, we show that parylene can be deposited over chemically treated nanowire surfaces, a feature generally not possible with oxides produced by atomic layer deposition due to the surface "self-cleaning" effect. Our results highlight the potential for parylene as an alternative ultrathin insulator in nanoscale electronic devices more broadly, with potential applications extending into nanobioelectronics due to parylene's well-established biocompatible properties.
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Affiliation(s)
- J G Gluschke
- School of Physics , University of New South Wales , Sydney NSW 2052 , Australia
| | - J Seidl
- School of Physics , University of New South Wales , Sydney NSW 2052 , Australia
| | - R W Lyttleton
- School of Physics , University of New South Wales , Sydney NSW 2052 , Australia
| | - D J Carrad
- School of Physics , University of New South Wales , Sydney NSW 2052 , Australia
- Center for Quantum Devices, Niels Bohr Institute , University of Copenhagen , Copenhagen DK-2100 , Denmark
| | - J W Cochrane
- School of Physics , University of New South Wales , Sydney NSW 2052 , Australia
| | - S Lehmann
- Solid State Physics/NanoLund , Lund University , SE-221 00 Lund , Sweden
| | - L Samuelson
- Solid State Physics/NanoLund , Lund University , SE-221 00 Lund , Sweden
| | - A P Micolich
- School of Physics , University of New South Wales , Sydney NSW 2052 , Australia
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Cummins C, Shaw MT, Morris MA. Area Selective Polymer Brush Deposition. Macromol Rapid Commun 2017; 38. [DOI: 10.1002/marc.201700252] [Citation(s) in RCA: 15] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/19/2017] [Revised: 05/24/2017] [Indexed: 11/10/2022]
Affiliation(s)
- Cian Cummins
- Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) & AMBER CentreTrinity College Dublin 5 College Green Dublin 2 Ireland
| | | | - Michael A. Morris
- Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) & AMBER CentreTrinity College Dublin 5 College Green Dublin 2 Ireland
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Minaye Hashemi FS, Birchansky BR, Bent SF. Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns. ACS APPLIED MATERIALS & INTERFACES 2016; 8:33264-33272. [PMID: 27934166 DOI: 10.1021/acsami.6b09960] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Area selective atomic layer deposition has the potential to significantly improve current fabrication approaches by introducing a bottom-up process in which robust and conformal thin films are selectively deposited onto patterned substrates. In this paper, we demonstrate selective deposition of dielectrics on metal/dielectric patterns by protecting metal surfaces using alkanethiol blocking layers. We examine alkanethiol self-assembled monolayers (SAMs) with two different chain lengths deposited both in vapor and in solution and show that in both systems, thiols have the ability to block surfaces against dielectric deposition. We show that thiol molecules can displace Cu oxide, opening possibilities for easier sample preparation. A vapor-deposited alkanethiol SAM is shown to be more effective than a solution-deposited SAM in blocking ALD, even after only 30 s of exposure. The vapor deposition also results in a much better thiol regeneration process and may facilitate deposition of the SAMs on porous or three-dimensional structures, allowing for the fabrication of next generation electronic devices.
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Affiliation(s)
- Fatemeh Sadat Minaye Hashemi
- Department of Materials Science and Engineering, and ‡Department of Chemical Engineering, Stanford University , Stanford, California 94305-5025, United States
| | - Bradlee R Birchansky
- Department of Materials Science and Engineering, and ‡Department of Chemical Engineering, Stanford University , Stanford, California 94305-5025, United States
| | - Stacey F Bent
- Department of Materials Science and Engineering, and ‡Department of Chemical Engineering, Stanford University , Stanford, California 94305-5025, United States
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Zhou ZQ, Wang LX, Shi W, Sun SL, Lu M. A synergetic application of surface plasmon and field effect to improve Si solar cell performance. NANOTECHNOLOGY 2016; 27:145203. [PMID: 26902838 DOI: 10.1088/0957-4484/27/14/145203] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
We report a synergetic application of surface plasmon (SP) and field effect (FE) to improve crystalline Si solar cell performance. The SPs are supported by small-sized Ag nanoparticles with an average diameter of 36.7 nm. The localized SP electromagnetic field from Ag nanoparticles excites extra electron-hole pairs at the surface region of the Si solar cell emitter, and meanwhile, the electron-hole pairs are detached by the electrostatic field that crosses the emitter surface. This synergism of SP and FE produces extra charges and enhances the Si solar cell efficiency. As compared to a Si solar cell applying SP and FE independently, a more than 10% efficiency enhancement is achieved by using them synergistically.
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Affiliation(s)
- Zhi-Quan Zhou
- Department of Optical Science and Engineering, and Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Fudan University, Shanghai 200433, People's Republic of China
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Fang M, Ho JC. Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning. ACS NANO 2015; 9:8651-4. [PMID: 26351731 DOI: 10.1021/acsnano.5b05249] [Citation(s) in RCA: 21] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
Transistors have already been made three-dimensional (3D), with device channels (i.e., fins in trigate field-effect transistor (FinFET) technology) that are taller, thinner, and closer together in order to enhance device performance and lower active power consumption. As device scaling continues, these transistors will require more advanced, fabrication-enabling technologies for the conformal deposition of high-κ dielectric layers on their 3D channels with accurate position alignment and thickness control down to the subnanometer scale. Among many competing techniques, area-selective atomic layer deposition (AS-ALD) is a promising method that is well suited to the requirements without the use of complicated, complementary metal-oxide semiconductor (CMOS)-incompatible processes. However, further progress is limited by poor area selectivity for thicker films formed via a higher number of ALD cycles as well as the prolonged processing time. In this issue of ACS Nano, Professor Stacy Bent and her research group demonstrate a straightforward self-correcting ALD approach, combining selective deposition with a postprocess mild chemical etching, which enables selective deposition of dielectric films with thicknesses and processing times at least 10 times larger and 48 times shorter, respectively, than those obtained by conventional AS-ALD processes. These advances present an important technological breakthrough that may drive the AS-ALD technique a step closer toward industrial applications in electronics, catalysis, and photonics, etc. where more efficient device fabrication processes are needed.
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Affiliation(s)
- Ming Fang
- Department of Physics and Materials Science, City University of Hong Kong , 83 Tat Chee Avenue, Kowloon, Hong Kong
- Shenzhen Research Institute, City University of Hong Kong , Shenzhen, 518057, P. R. China
| | - Johnny C Ho
- Department of Physics and Materials Science, City University of Hong Kong , 83 Tat Chee Avenue, Kowloon, Hong Kong
- State Key Laboratory of Millimeter Waves, City University of Hong Kong , 83 Tat Chee Avenue, Kowloon, Hong Kong
- Shenzhen Research Institute, City University of Hong Kong , Shenzhen, 518057, P. R. China
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