An anti-ultrasonic-stripping effect in confined micro/nanoscale cavities and its applications for efficient multiscale metallic patterning

Scalable Fabrication of Metallic Nanogaps at the Sub-10 nm Level

Metallic nanogaps with metal-metal separations of less than 10 nm have many applications in nanoscale photonics and electronics. However, their fabrication remains a considerable challenge, especially for applications that require patterning of nanoscale features over macroscopic length-scales. Here, some of the most promising techniques for nanogap fabrication are evaluated, covering established technologies such as photolithography, electron-beam lithography (EBL), and focused ion beam (FIB) milling, plus a number of newer methods that use novel electrochemical and mechanical means to effect the patterning. The physical principles behind each method are reviewed and their strengths and limitations for nanogap patterning in terms of resolution, fidelity, speed, ease of implementation, versatility, and scalability to large substrate sizes are discussed.

Reverse-Offset Printing of Polymer Resist Ink for Micrometer-Level Patterning of Metal and Metal-Oxide Layers

Printed electronics has advanced during the recent decades in applications such as organic photovoltaic cells and biosensors. However, the main limiting factors preventing the more widespread use of printing in flexible electronics manufacturing are (i) the poor attainable linewidths via conventional printing methods (≫10 μm), (ii) the limited availability of printable materials (e.g., low work function metals), and (iii) the inferior performance of many printed materials when compared to vacuum-processed materials (e.g., printed vs sputtered ITO). Here, we report a printing-based, low-temperature, low-cost, and scalable patterning method that can be used to fabricate high-resolution, high-performance patterned layers with linewidths down to ∼1 μm from various materials. The method is based on sequential steps of reverse-offset printing (ROP) of a sacrificial polymer resist, vacuum deposition, and lift-off. The sharp vertical sidewalls of the ROP resist layer allow the patterning of evaporated metals (Al) and dielectrics (SiO) as well as sputtered conductive oxides (ITO), where the list is expandable also to other vacuum-deposited materials. The resulting patterned layers have sharp sidewalls, low line-edge roughness, and uniform thickness and are free from imperfections such as edge ears occurring with other printed lift-off methods. The applicability of the method is demonstrated with highly conductive Al (∼5 × 10^-8 Ωm resistivity) utilized as transparent metal mesh conductors with ∼35 Ω_□ at 85% transparent area percentage and source/drain electrodes for solution-processed metal-oxide (In₂O₃) thin-film transistors with ∼1 cm²/(Vs) mobility. Moreover, the method is expected to be compatible with other printing methods and applicable in other flexible electronics applications, such as biosensors, resistive random access memories, touch screens, displays, photonics, and metamaterials, where the selection of current printable materials falls short.

Plasmonic metal nanostructures with extremely small features: new effects, fabrication and applications

Surface plasmons in metals promise many fascinating properties and applications in optics, sensing, photonics and nonlinear fields. Plasmonic nanostructures with extremely small features especially demonstrate amazing new effects as the feature sizes scale down to the sub-nanometer scale, such as quantum size effects, quantum tunneling, spill-out of electrons and nonlocal states etc. The unusual physical, optical and photo-electronic properties observed in metallic structures with extreme feature sizes enable their unique applications in electromagnetic field focusing, spectra enhancing, imaging, quantum photonics, etc. In this review, we focus on the new effects, fabrication and applications of plasmonic metal nanostructures with extremely small features. For simplicity and consistency, we will focus our topic on the plasmonic metal nanostructures with feature sizes of sub-nanometers. Subsequently, we discussed four main and typical plasmonic metal nanostructures with extremely small features, including: (1) ultra-sharp plasmonic metal nanotips; (2) ultra-thin plasmonic metal films; (3) ultra-small plasmonic metal particles and (4) ultra-small plasmonic metal nanogaps. Additionally, the corresponding fascinating new effects (quantum nonlinear, non-locality, quantum size effect and quantum tunneling), applications (spectral enhancement, high-order harmonic wave generation, sensing and terahertz wave detection) and reliable fabrication methods will also be discussed. We end the discussion with a brief summary and outlook of the main challenges and possible breakthroughs in the field. We hope our discussion can inspire the broader design, fabrication and application of plasmonic metal nanostructures with extremely small feature sizes in the future.