• Reference Citation Analysis
  • v
  • v
  • Find an Article
Find an Article PDF (4598977)   Today's Articles (799)   Subscriber (49356)
For: Zhu S, Meng D, Liang G, Shi G, Zhao P, Cheng P, Li Y, Zhai X, Lu Y, Chen L, Wu K. Proximity-induced magnetism and an anomalous Hall effect in Bi2Se3/LaCoO3: a topological insulator/ferromagnetic insulator thin film heterostructure. Nanoscale 2018;10:10041-10049. [PMID: 29774918 DOI: 10.1039/c8nr02083c] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Number Cited by Other Article(s)
1
Liu J, Zhang X, Ji Y, Gao X, Wu J, Zhang M, Li L, Liu X, Yan W, Yao T, Yin Y, Wang L, Guo H, Cheng G, Wang Z, Gao P, Wang Y, Chen K, Liao Z. Controllable Itinerant Ferromagnetism in Weakly Correlated 5d SrIrO3. J Phys Chem Lett 2022;13:11946-11954. [PMID: 36534070 DOI: 10.1021/acs.jpclett.2c03313] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
2
Zhang G, Wu H, Zhang L, Yang L, Xie Y, Guo F, Li H, Tao B, Wang G, Zhang W, Chang H. Two-Dimensional Van Der Waals Topological Materials: Preparation, Properties, and Device Applications. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022;18:e2204380. [PMID: 36135779 DOI: 10.1002/smll.202204380] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/15/2022] [Revised: 08/23/2022] [Indexed: 06/16/2023]
3
Proximity-Induced Magnetism in a Topological Insulator/Half-Metallic Ferromagnetic Thin Film Heterostructure. COATINGS 2022. [DOI: 10.3390/coatings12060750] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/07/2022]
4
Wang D, Hu CE, Liu LG, Zhang M, Chen XR. An Efficient Dopant for Introducing Magnetism into Topological Insulator Bi2Se3. MATERIALS 2022;15:ma15113864. [PMID: 35683164 PMCID: PMC9181840 DOI: 10.3390/ma15113864] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/19/2022] [Revised: 05/24/2022] [Accepted: 05/25/2022] [Indexed: 11/16/2022]
5
Riddiford LJ, Grutter AJ, Pillsbury T, Stanley M, Reifsnyder Hickey D, Li P, Alem N, Samarth N, Suzuki Y. Understanding Signatures of Emergent Magnetism in Topological Insulator/Ferrite Bilayers. PHYSICAL REVIEW LETTERS 2022;128:126802. [PMID: 35394317 DOI: 10.1103/physrevlett.128.126802] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/12/2021] [Revised: 01/21/2022] [Accepted: 02/23/2022] [Indexed: 06/14/2023]
6
Peng X, Liang H, Dong X, Yang H, Wang X, Qiao L, Li J, Wang C, Han J, Wang Q, Chen G, Xiao W. Epitaxial growth of Bi(110) and Bi2Se3thin films on a ferromagnetic insulator substrate of Cr2Ge2Te6. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2021;33:415001. [PMID: 34271559 DOI: 10.1088/1361-648x/ac1535] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/10/2021] [Accepted: 07/16/2021] [Indexed: 06/13/2023]
7
Bhattacharyya S, Akhgar G, Gebert M, Karel J, Edmonds MT, Fuhrer MS. Recent Progress in Proximity Coupling of Magnetism to Topological Insulators. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021;33:e2007795. [PMID: 34185344 DOI: 10.1002/adma.202007795] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/16/2020] [Revised: 01/11/2021] [Indexed: 05/08/2023]
8
Ng SM, Wang H, Liu Y, Wong HF, Yau HM, Suen CH, Wu ZH, Leung CW, Dai JY. High-Temperature Anomalous Hall Effect in a Transition Metal Dichalcogenide Ferromagnetic Insulator Heterostructure. ACS NANO 2020;14:7077-7084. [PMID: 32407078 DOI: 10.1021/acsnano.0c01815] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
9
Singh A, Kumar S, Singh M, Singh P, Singh R, Gangwar VK, Lakhani A, Patil S, Schwier EF, Matsumura T, Shimada K, Ghosh AK, Chatterjee S. Anomalous Hall effect in Cu doped Bi2Te3 topological insulator. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2020;32:305602. [PMID: 32235039 DOI: 10.1088/1361-648x/ab8521] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
10
Jeong K, Park H, Chae J, Sim KI, Yang WJ, Kim JH, Hong SB, Kim JH, Cho MH. Topological Phase Control of Surface States in Bi2Se3 via Spin-Orbit Coupling Modulation through Interface Engineering between HfO2-X. ACS APPLIED MATERIALS & INTERFACES 2020;12:12215-12226. [PMID: 32073823 DOI: 10.1021/acsami.9b17555] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
11
Yao X, Gao B, Han MG, Jain D, Moon J, Kim JW, Zhu Y, Cheong SW, Oh S. Record High-Proximity-Induced Anomalous Hall Effect in (BixSb1-x)2Te3 Thin Film Grown on CrGeTe3 Substrate. NANO LETTERS 2019;19:4567-4573. [PMID: 31185718 DOI: 10.1021/acs.nanolett.9b01495] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
12
Mogi M, Nakajima T, Ukleev V, Tsukazaki A, Yoshimi R, Kawamura M, Takahashi KS, Hanashima T, Kakurai K, Arima TH, Kawasaki M, Tokura Y. Large Anomalous Hall Effect in Topological Insulators with Proximitized Ferromagnetic Insulators. PHYSICAL REVIEW LETTERS 2019;123:016804. [PMID: 31386415 DOI: 10.1103/physrevlett.123.016804] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/30/2018] [Revised: 03/24/2019] [Indexed: 06/10/2023]
PrevPage 1 of 1 1Next
© 2004-2024 Baishideng Publishing Group Inc. All rights reserved. 7041 Koll Center Parkway, Suite 160, Pleasanton, CA 94566, USA