Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm

Plasmonic direct-writing lithography via high numerical aperture objectives

The exploration of light-matter interactions at the sub-wavelength scale requires advanced nano-patterning tools with low cost and high flexibility. Plasmonic lithography as a promising candidate receives much attention owing to its ability to confine ultraviolet light sources into an extremely tiny volume. To date, most plasmonic patterning schemes utilize metallic nano-structures to achieve tight focusing. The drawback is that the plasmonic structures need, however, to be pre-defined, usually accompanied with the expense of complex fabrication processes. Here we numerically and experimentally report an antenna-free plasmonic lithography technique using high numerical aperture (NA) objectives as the scanning head. Minimum feature sizes of 0.36λ/NA and 0.46λ/NA are numerically and experimentally demonstrated, respectively, under the linearly polarized continuous-wave illumination at 457 nm with no involvement of nonlinear effects. Back-focal-plane imaging is used to visualize surface-plasmon excitations, acting as a viable way of adjusting focus precisely. Our method can serve as a candidate for laser processing at the sub-wavelength scale, and offers a truly convenient and economical way of nano-patterning.

Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation

Plasmonic lithography, which uses the evanescent electromagnetic (EM) fields to generate image beyond the diffraction limit, has been successfully demonstrated as an alternative lithographic technology for creating sub-10 nm patterns. However, the obtained photoresist pattern contour in general exhibits a very poor fidelity due to the near-field optical proximity effect (OPE), which is far below the minimum requirement for nanofabrication. Understanding the near-field OPE formation mechanism is important to minimize its impact on nanodevice fabrication and improve its lithographic performance. In this work, a point-spread function (PSF) generated by a plasmonic bowtie-shaped nanoaperture (BNA) is employed to quantify the photon-beam deposited energy in the near-field patterning process. The achievable resolution of plasmonic lithography has successfully been enhanced to approximately 4 nm with numerical simulations. A field enhancement factor (F) as a function of gap size is defined to quantitatively evaluate the strong near-field enhancement effect excited by a plasmonic BNA, which also reveals that the high enhancement of the evanescent field is due to the strong resonant coupling between the plasmonic waveguide and the surface plasmon waves (SPWs). However, based on an investigation of the physical origin of the near-field OPE, and the theoretical calculations and simulation results indicate that the evanescent-field-induced rapid loss of high-k information is one of the main optical contributors to the near-field OPE. Furthermore, an analytic formula is introduced to quantitatively analyze the effect of the rapidly decaying feature of the evanescent field on the final exposure pattern profile. Notably, a fast and effective optimization method based on the compensation principle of the exposure dose is proposed to reduce the pattern distortion by modulating the exposure map with dose leveling. The proposed pattern quality enhancement method can open new possibilities in the manufacture of nanostructures with ultrahigh pattern quality via plasmonic lithography, which would find potentially promising applications in high density optical storage, biosensors, and plasmonic nanofocusing.

Simple route for high-throughput fabrication of metasurfaces using one-step UV-curable resin printing

Phase-gradient metasurfaces are two-dimensional (2D) optical elements that can manipulate light by imposing local, space-variant phase changes on an incident electromagnetic wave. These metasurfaces hold the potential and the promise to revolutionize photonics by providing ultrathin alternatives for a wide range of common optical elements such as bulky refractive optics, waveplates, polarizers, and axicons. However, the fabrication of state-of-the-art metasurfaces typically requires some time-consuming, expensive, and possibly hazardous processing steps. To overcome these limitations on conventional metasurface fabrication, a facile methodology to produce phase-gradient metasurfaces through one-step UV-curable resin printing is developed by our research group. The method dramatically reduces the required processing time and cost, as well as eliminates safety hazards. As a proof-of-concept, the advantages of the method are clearly demonstrated via a rapid reproduction of high-performance metalenses based on the Pancharatnam-Berry phase gradient concept in the visible spectrum.

Achieving high aspect ratio in plasmonic lithography for practical applications with sub-20 nm half pitch

Plasmonic lithography, which exploits a bowtie nanoaperture (BNA) for the purpose of subwavelength near-field focusing, has the capability of high-resolution patterning. However, the ultra-small feature size is achieved at the price of sharply decay of the surface plasmon waves (SPWs) in the photoresist (PR) layer, which directly leads to some unfavorable patterning issues, such as non-uniformity and shallow pattern depth even over small exposure areas. In this work, a special hybrid plasmonic waveguide (HPW) patterning system, which is composed of the plasmonic BNA-PR layer-silver reflector, is designed to facilitate high spatial frequency selection and amplify the evanescent field in the PR layer. Theoretical calculations indicate that the antisymmetric coupled SPWs and plasmonic waveguide modes excited by the HPW structure can remove the exponential decay and ensure uniform exposure over the entire depth of the PR layer. Importantly, the hyperbolic decaying characteristic of the SPWs in the PR layer plays a noticeable role in the improvement of achievable resolution, depth-of-field, and line array pattern profile. It is worth to note that the uniform periodic patterns in sub-20 nm feature can be achieved with high aspect ratio. Additionally, further numerical simulation results are presented to demonstrate the achievement of spatial frequency selection of high-k mode in HPW structure by controlling the PR thickness and gap size. Our findings may provide a new perspective on the manufacture of surface nanostructures and broaden the potential promising applications of plasmonic lithography in nanoscale patterning.

Surface-enhanced Raman Scattering of Au-Ag bimetallic nanopillars fabricated using surface-plasmon lithography

Arrays of gold-silver (Au-Ag) bimetallic nanopillars were fabricated by a newly developed surface-plasmon lithography (SPL) and their enhancement properties as surface-enhanced Raman scattering (SERS) substrates have been studied. We demonstrated that the SPL is a low-cost and high efficiency method for the fabrication of SERS substrates with both high sensitivity and reproducibility. The nanopillars showed a good response in the detection of methylene blue molecules at a low concentration of 1.0 × 10^-11mol· l^-1. The SERS enhancement factors (EFs) are on the orders of 10⁷and the relative standard deviation of SERS intensity is <8% over an area of 50μm × 50μm. The EFs increase fast with the height increasing from 200 to 530 nm, then increase slowly when further increase the height of the nanopillars to 1100 nm. In addition, the Au-Ag bimetallic coating has shown much higher SERS enhancement than the coatings of either the pure Au or Ag. The excellent SERS enhancement and reproducibility of the Au-Ag coated nanopillars indicated that the fabricated SERS substrates can be used for the detection of biochemical molecules at trace level and the SPL is a promising method for fabrication of SERS substrates.

Scalable Fabrication of Metallic Nanogaps at the Sub-10 nm Level

Metallic nanogaps with metal-metal separations of less than 10 nm have many applications in nanoscale photonics and electronics. However, their fabrication remains a considerable challenge, especially for applications that require patterning of nanoscale features over macroscopic length-scales. Here, some of the most promising techniques for nanogap fabrication are evaluated, covering established technologies such as photolithography, electron-beam lithography (EBL), and focused ion beam (FIB) milling, plus a number of newer methods that use novel electrochemical and mechanical means to effect the patterning. The physical principles behind each method are reviewed and their strengths and limitations for nanogap patterning in terms of resolution, fidelity, speed, ease of implementation, versatility, and scalability to large substrate sizes are discussed.

Micropatterns Fabricated by Photodimerization-Induced Diffusion

Pattern technology plays an important role in the generation of microstructures with different functionalities and morphologies. In this report, a straightforward and versatile strategy is presented for spatially regulating the growth of a microstructure on a surface by the photodimerization of maleimide (MI). Upon exposure of ultraviolet (UV) light, photodimerization of MI in a film comprising furan-grafted polymer and bismaleimide (BMI) produces a chemical gradient, which can drive the diffusion of BMI from the unexposed to the exposed region and from the bottom to the surface, resulting in the growth of micropatterns. Sequential crosslinking induced by the Diels-Alder reaction between MI and furan maintains the stability of pattern shape. Theoretical modeling with reaction-diffusion equations reveal that as photodimerization moves the system far from thermodynamic equilibrium, the formation of a chemical potential gradient requires the redistribution of matter, resulting in the formation of topographies. Directional molecular motion induced by UV light can generate complex morphology, and produce materials with unique optical functions, such as charming-ordered gratings. This straightforward method of fabricating micropatterns by photodimerization-induced diffusion is successfully applied to patterned curved surfaces, microfluidic channels and encapsulation of integrated light emitting diode chips.

Nanoimprint lithography for high-throughput fabrication of metasurfaces

Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties that are not found in nature. They have been widely investigated for optical applications such as holograms, wavefront shaping, and structural color printing, however, electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low productivity. Although alternative optical technologies, such as holographic lithography and plasmonic lithography, can overcome these drawbacks, such methods are still constrained by the optical diffraction limit. To break through this fundamental problem, mechanical nanopatterning processes have been actively studied in many fields, with nanoimprint lithography (NIL) coming to the forefront. Since NIL replicates the nanopattern of the mold regardless of the diffraction limit, NIL can achieve sufficiently high productivity and patterning resolution, giving rise to an explosive development in the fabrication of metasurfaces. In this review, we focus on various NIL technologies for the manufacturing of metasurfaces. First, we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of metasurfaces. We also discuss recent applications of NIL in the realization of metasurfaces. Finally, we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces.

Nanowire Waveguides and Lasers: Advances and Opportunities in Photonic Circuits

Due to their single-crystalline structures, comparatively large aspect ratios, tight optical confinement and smooth surfaces, nanowires have increasingly attracted research interests for both fundamental studies and technological applications in on-chip photonic devices. This class of nanostructures typically have cross-sections of 2~200 nm and lengths upwards of several micrometers, allowing for the bridging of the nanoscopic and macroscopic world. In particular, the lasing behaviors can be established from a nanowire resonator with positive feedback via end-facet reflection, making the nanowire a promising candidate in the next generation of optoelectronics. Consequently, versatile nanowire-based devices ranging from nanoscale coherent lasers, optical sensors, waveguides, optical switching, and photonic networks have been proposed and experimentally demonstrated in the past decade. In this article, significant progresses in the nanowire fabrication, lasers, circuits, and devices are reviewed. First, we focus on the achievements of nanowire synthesis and introduce the basics of nanowire optics. Following the cavity configurations and mode categories, then the different light sources consisting of nanowires are presented. Next, we review the recent progress and current status of functional nanowire devices. Finally, we offer our perspective of nanowires regarding their challenges and future opportunities in photonic circuits.

Nanostructured Color Filters: A Review of Recent Developments

Color plays an important role in human life: without it life would be dull and monochromatic. Printing color with distinct characteristics, like hue, brightness and saturation, and high resolution, are the main characteristic of image sensing devices. A flexible design of color filter is also desired for angle insensitivity and independence of direction of polarization of incident light. Furthermore, it is important that the designed filter be compatible with the image sensing devices in terms of technology and size. Therefore, color filter requires special care in its design, operation and integration. In this paper, we present a comprehensive review of nanostructured color filter designs described to date and evaluate them in terms of their performance.