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Bertran-Serra E, Rodriguez-Miguel S, Li Z, Ma Y, Farid G, Chaitoglou S, Amade R, Ospina R, Andújar JL. Advancements in Plasma-Enhanced Chemical Vapor Deposition for Producing Vertical Graphene Nanowalls. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:2533. [PMID: 37764562 PMCID: PMC10537120 DOI: 10.3390/nano13182533] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/09/2023] [Revised: 09/01/2023] [Accepted: 09/09/2023] [Indexed: 09/29/2023]
Abstract
In recent years, vertical graphene nanowalls (VGNWs) have gained significant attention due to their exceptional properties, including their high specific surface area, excellent electrical conductivity, scalability, and compatibility with transition metal compounds. These attributes position VGNWs as a compelling choice for various applications, such as energy storage, catalysis, and sensing, driving interest in their integration into next-generation commercial graphene-based devices. Among the diverse graphene synthesis methods, plasma-enhanced chemical vapor deposition (PECVD) stands out for its ability to create large-scale graphene films and VGNWs on diverse substrates. However, despite progress in optimizing the growth conditions to achieve micrometer-sized graphene nanowalls, a comprehensive understanding of the underlying physicochemical mechanisms that govern nanostructure formation remains elusive. Specifically, a deeper exploration of nanometric-level phenomena like nucleation, carbon precursor adsorption, and adatom surface diffusion is crucial for gaining precise control over the growth process. Hydrogen's dual role as a co-catalyst and etchant in VGNW growth requires further investigation. This review aims to fill the knowledge gaps by investigating VGNW nucleation and growth using PECVD, with a focus on the impact of the temperature on the growth ratio and nucleation density across a broad temperature range. By providing insights into the PECVD process, this review aims to optimize the growth conditions for tailoring VGNW properties, facilitating applications in the fields of energy storage, catalysis, and sensing.
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Affiliation(s)
- Enric Bertran-Serra
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
- Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, E-08028 Barcelona, Spain
| | - Shahadev Rodriguez-Miguel
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
| | - Zhuo Li
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
| | - Yang Ma
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
- Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, E-08028 Barcelona, Spain
| | - Ghulam Farid
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
- Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, E-08028 Barcelona, Spain
| | - Stefanos Chaitoglou
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
- Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, E-08028 Barcelona, Spain
| | - Roger Amade
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
- Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, E-08028 Barcelona, Spain
| | - Rogelio Ospina
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
- Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, E-08028 Barcelona, Spain
- Escuela de Física, Universidad Industrial de Santander, Carrera 27 Calle 9 Ciudad Universitaria, Bucaramanga 680002, Colombia
| | - José-Luis Andújar
- ENPHOCAMAT (FEMAN) Group, Department of Applied Physics, Universitat de Barcelona, Martí i Franquès 1, E-08028 Barcelona, Spain
- Institute of Nanoscience and Nanotechnology (IN2UB), Universitat de Barcelona, E-08028 Barcelona, Spain
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2
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Jing L, Cheng R, Garg R, Gong W, Lee I, Schmit A, Cohen-Karni T, Zhang X, Shen S. 3D Graphene-Nanowire "Sandwich" Thermal Interface with Ultralow Resistance and Stiffness. ACS NANO 2023; 17:2602-2610. [PMID: 36649646 PMCID: PMC10041630 DOI: 10.1021/acsnano.2c10525] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 10/21/2022] [Accepted: 01/11/2023] [Indexed: 06/17/2023]
Abstract
Despite the recent advancements of passive and active cooling solutions for electronics, interfaces between materials have generally become crucial barriers for thermal transport because of intrinsic material dissimilarity and surface roughness at interfaces. We demonstrate a 3D graphene-nanowire "sandwich" thermal interface that enables an ultralow thermal resistance of ∼0.24 mm2·K/W that is about 1 order of magnitude smaller than those of solders and several orders of magnitude lower than those of thermal greases, gels, and epoxies, as well as a low elastic and shear moduli of ∼1 MPa like polymers and foams. The flexible 3D "sandwich" exhibits excellent long-term reliability with >1000 cycles over a broad temperature range from -55 °C to 125 °C. This nanostructured thermal interface material can greatly benefit a variety of electronic systems and devices by allowing them to operate at lower temperatures or at the same temperature but with higher performance and higher power density.
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Affiliation(s)
- Lin Jing
- Department
of Mechanical Engineering, Carnegie Mellon
University; Pittsburgh, Pennsylvania 15213, United States
| | - Rui Cheng
- Department
of Mechanical Engineering, Carnegie Mellon
University; Pittsburgh, Pennsylvania 15213, United States
| | - Raghav Garg
- Department
of Materials Science and Engineering, Carnegie
Mellon University; Pittsburgh, Pennsylvania 15213, United States
| | - Wei Gong
- Department
of Mechanical Engineering, Carnegie Mellon
University; Pittsburgh, Pennsylvania 15213, United States
| | - Inkyu Lee
- Department
of Materials Science and Engineering, Carnegie
Mellon University; Pittsburgh, Pennsylvania 15213, United States
| | - Aaron Schmit
- Department
of Mechanical Engineering, Massachusetts
Institute of Technology; Cambridge, Massachusetts 02139, United States
| | - Tzahi Cohen-Karni
- Department
of Materials Science and Engineering, Carnegie
Mellon University; Pittsburgh, Pennsylvania 15213, United States
| | - Xu Zhang
- Department
of Electrical and Computer Engineering, Carnegie Mellon University; Pittsburgh, Pennsylvania 15213, United States
| | - Sheng Shen
- Department
of Mechanical Engineering, Carnegie Mellon
University; Pittsburgh, Pennsylvania 15213, United States
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3
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Zhu J, Shen H, Wang Z, Li Y, Wu T, Mao W, Zhang J. Direct fabrication of high-quality vertical graphene nanowalls on arbitrary substrates without catalysts for tidal power generation. NANOSCALE 2022; 14:15119-15128. [PMID: 36205314 DOI: 10.1039/d2nr03489a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
The non-catalytic preparation of high-quality vertical graphene nanowalls (VGN) and graphene-based high output power hydrovoltaic effect power generation devices has always been difficult to achieve. In this work, we successfully prepared VGN with defect density, few layers and submicron domain size on a variety of substrates without catalysts through reasonable adjustment of growth conditions by the hot-wire chemical vapor deposition (HWCVD) method. The Raman test of the VGN prepared under optimal conditions showed that its ID/IG value was less than 1, and I2D/IG was more than 2.8. The deposition pressure was a key factor affecting the crystallization quality of the VGN. A suitable deposition pressure of 500 Pa could screen the active carbon clusters involved in the growth of nanowalls. The VGN prepared had excellent electrical properties and output of dropping-ion-droplet nano-power generation devices. Because of the larger crystal domain area and smaller contact angle of the VGN, the maximum output power exhibited at 100 Pa was 15.7 μW, which exceeded the value produced by other reported hydrovoltaic energy harvesting devices. All of them confirmed that VGN with improved quality had high application prospects in nano-energy devices.
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Affiliation(s)
- Junkui Zhu
- Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, College of Materials Science & Technology, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China.
| | - Honglie Shen
- Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, College of Materials Science & Technology, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China.
| | - Zehui Wang
- Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, College of Materials Science & Technology, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China.
| | - Yufang Li
- Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, College of Materials Science & Technology, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China.
| | - Tianru Wu
- State Key Laboratory of Functional Materials for Informatics Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Weibiao Mao
- Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, College of Materials Science & Technology, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China.
| | - Jingzhe Zhang
- Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, College of Materials Science & Technology, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China.
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4
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Carbon-Related Materials: Graphene and Carbon Nanotubes in Semiconductor Applications and Design. MICROMACHINES 2022; 13:mi13081257. [PMID: 36014179 PMCID: PMC9412642 DOI: 10.3390/mi13081257] [Citation(s) in RCA: 7] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 06/01/2022] [Revised: 07/05/2022] [Accepted: 07/29/2022] [Indexed: 12/04/2022]
Abstract
As the scaling technology in the silicon-based semiconductor industry is approaching physical limits, it is necessary to search for proper materials to be utilized as alternatives for nanoscale devices and technologies. On the other hand, carbon-related nanomaterials have attracted so much attention from a vast variety of research and industry groups due to the outstanding electrical, optical, mechanical and thermal characteristics. Such materials have been used in a variety of devices in microelectronics. In particular, graphene and carbon nanotubes are extraordinarily favorable substances in the literature. Hence, investigation of carbon-related nanomaterials and nanostructures in different ranges of applications in science, technology and engineering is mandatory. This paper reviews the basics, advantages, drawbacks and investigates the recent progress and advances of such materials in micro and nanoelectronics, optoelectronics and biotechnology.
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5
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Huang JZ, Ni IC, Hsu YH, Li SW, Chan YC, Yang SY, Lee MH, Shue SL, Chen MH, Wu CI. Low-temperature synthesis of high-quality graphene by controlling the carbon-hydrogen ratio of the precursor. NANO EXPRESS 2022. [DOI: 10.1088/2632-959x/ac3388] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
Abstract
Abstract
A furnace-free inductively coupled plasma chemical vapor deposition (ICP-PECVD) system, which does not require sample heating, was used to grow graphene at a temperature below 300 °C. This studies have found that under low-temperature PECVD growth conditions, liquid precursors are more suitable for preparing low-temperature graphene precursors than gaseous precursors. Hence, benzene is used as a carbon precursor to obtain a sheet resistance of approximately 1.24 kΩ sq−1. In this research, it was discovered that the carbon-hydrogen ratio of the precursor molecule is an important factor while using PECVD to grow graphene. This factor affects the quality of graphene and the sheet resistance value —when the carbon–hydrogen ratio for the precursor molecule is 1:1, graphene has the high quality and lowest sheet resistance; when it is less than 1:2, the graphene that cannot be deposited has the worst quality and sheet resistance. Furthermore, we found that methane, a precursor often used to deposit graphene, will etch graphene under low-temperature conditions, and that acetylene can be used as a precursor to deposit graphene. It was further proven that the carbon–hydrogen ratio of the precursor molecules in the PECVD process caused the reduction in the graphene temperature.
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6
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Abstract
The efficient monitoring of the environment is currently gaining a continuous growing interest in view of finding solutions for the global pollution issues and their associated climate change. In this sense, two-dimensional (2D) materials appear as one of highly attractive routes for the development of efficient sensing devices due, in particular, to the interesting blend of their superlative properties. For instance, graphene (Gr) and graphitic carbon nitride g-C3N4 (g-CN) have specifically attracted great attention in several domains of sensing applications owing to their excellent electronic and physical-chemical properties. Despite the high potential they offer in the development and fabrication of high-performance gas-sensing devices, an exhaustive comparison between Gr and g-CN is not well established yet regarding their electronic properties and their sensing performances such as sensitivity and selectivity. Hence, this work aims at providing a state-of-the-art overview of the latest experimental advances in the fabrication, characterization, development, and implementation of these 2D materials in gas-sensing applications. Then, the reported results are compared to our numerical simulations using density functional theory carried out on the interactions of Gr and g-CN with some selected hazardous gases’ molecules such as NO2, CO2, and HF. Our findings conform with the superior performances of the g-CN regarding HF detection, while both g-CN and Gr show comparable detection performances for the remaining considered gases. This allows suggesting an outlook regarding the future use of these 2D materials as high-performance gas sensors.
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7
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M Santhosh N, Shvalya V, Modic M, Hojnik N, Zavašnik J, Olenik J, Košiček M, Filipič G, Abdulhalim I, Cvelbar U. Label-Free Mycotoxin Raman Identification by High-Performing Plasmonic Vertical Carbon Nanostructures. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2021; 17:e2103677. [PMID: 34636140 DOI: 10.1002/smll.202103677] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/23/2021] [Revised: 08/17/2021] [Indexed: 06/13/2023]
Abstract
Mycotoxins are widespread chemical entities in the agriculture and food industries that can induce cancer growth and immune deficiency, posing a serious health threat for humankind. These hazardous compounds are produced naturally by various molds (fungi) that contaminate different food products and can be detected in cereals, nuts, spices, and other food products. However, their detection, especially at minimally harmful concentrations, remains a serious analytical challenge. This research shows that high-performing plasmonic substrates (analytical enhancement factor = 5 × 107 ) based on plasma-grown vertical hollow carbon nanotubes can be applied for immediate detection of the most toxic mycotoxins. Due to excellent sensitivity allowing operation at ppb concentrations, it is possible to collect vibrational fingerprints of aflatoxin B1 , zearalenone, alternariol, and fumonisin B1 , highlighting the key spectral differences between them using principal component analysis. Regarding time-consuming conventional methods, including thin-layer chromatography, gas chromatography, high-performance liquid chromatography, and enzyme-linked immunosorbent assay, the designed surface-enhanced Raman spectroscopy substrates provide a clear roadmap to reducing the detection time-scale of mycotoxins down to seconds.
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Affiliation(s)
- Neelakandan M Santhosh
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
- Jožef Stefan International Postgraduate School, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Vasyl Shvalya
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Martina Modic
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Nataša Hojnik
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Janez Zavašnik
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
- Jožef Stefan International Postgraduate School, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Jaka Olenik
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Martin Košiček
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
- Jožef Stefan International Postgraduate School, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Gregor Filipič
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
| | - Ibrahim Abdulhalim
- Department of Electro-Optics and Photonics Engineering, School of Electrical and Computer Engineering, Ilse-Katz Institute for Nano-Scale Science and Technology, Ben Gurion University, Beer Sheva, 84105, Israel
| | - Uroš Cvelbar
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
- Jožef Stefan International Postgraduate School, Jamova cesta 39, Ljubljana, SI-1000, Slovenia
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8
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Santhosh N, Upadhyay KK, Stražar P, Filipič G, Zavašnik J, Mão de Ferro A, Silva RP, Tatarova E, Montemor MDF, Cvelbar U. Advanced Carbon-Nickel Sulfide Hybrid Nanostructures: Extending the Limits of Battery-Type Electrodes for Redox-Based Supercapacitor Applications. ACS APPLIED MATERIALS & INTERFACES 2021; 13:20559-20572. [PMID: 33881814 PMCID: PMC8289178 DOI: 10.1021/acsami.1c03053] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/15/2021] [Accepted: 04/09/2021] [Indexed: 06/12/2023]
Abstract
Transition-metal sulfides combined with conductive carbon nanostructures are considered promising electrode materials for redox-based supercapacitors due to their high specific capacity. However, the low rate capability of these electrodes, still considered "battery-type" electrodes, presents an obstacle for general use. In this work, we demonstrate a successful and fast fabrication process of metal sulfide-carbon nanostructures ideal for charge-storage electrodes with ultra-high capacity and outstanding rate capability. The novel hybrid binder-free electrode material consists of a vertically aligned carbon nanotube (VCN), terminated by a nanosized single-crystal metallic Ni grain; Ni is covered by a nickel nitride (Ni3N) interlayer and topped by trinickel disulfide (Ni3S2, heazlewoodite). Thus, the electrode is formed by a Ni3S2/Ni3N/Ni@NVCN architecture with a unique broccoli-like morphology. Electrochemical measurements show that these hybrid binder-free electrodes exhibit one of the best electrochemical performances compared to the other reported Ni3S2-based electrodes, evidencing an ultra-high specific capacity (856.3 C g-1 at 3 A g-1), outstanding rate capability (77.2% retention at 13 A g-1), and excellent cycling stability (83% retention after 4000 cycles at 13 A g-1). The remarkable electrochemical performance of the binder-free Ni3S2/Ni3N/Ni@NVCN electrodes is a significant step forward, improving rate capability and capacity for redox-based supercapacitor applications.
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Affiliation(s)
- Neelakandan
M. Santhosh
- Department
of Gaseous Electronics, Jožef Stefan
Institute, Jamova Cesta
39, Ljubljana SI-1000, Slovenia
- Jožef
Stefan International Postgraduate School, Jamova Cesta 39, Ljubljana SI-1000, Slovenia
| | - Kush K. Upadhyay
- Charge2C-NewCap, Av. José Francisco Guerreiro,
No 28 Paiã Park, Armazém A2.12, Pontinha, Odivelas 1675-078, Portugal
- Centro
de Química Estrutural-CQE, Departamento de Engenharia Química,
Instituto Superior Técnico, Universidade
de Lisboa, Lisboa 1049-001, Portugal
| | - Petra Stražar
- Department
of Gaseous Electronics, Jožef Stefan
Institute, Jamova Cesta
39, Ljubljana SI-1000, Slovenia
- Jožef
Stefan International Postgraduate School, Jamova Cesta 39, Ljubljana SI-1000, Slovenia
| | - Gregor Filipič
- Department
of Gaseous Electronics, Jožef Stefan
Institute, Jamova Cesta
39, Ljubljana SI-1000, Slovenia
| | - Janez Zavašnik
- Department
of Gaseous Electronics, Jožef Stefan
Institute, Jamova Cesta
39, Ljubljana SI-1000, Slovenia
| | - André Mão de Ferro
- Charge2C-NewCap, Av. José Francisco Guerreiro,
No 28 Paiã Park, Armazém A2.12, Pontinha, Odivelas 1675-078, Portugal
| | - Rui Pedro Silva
- Charge2C-NewCap, Av. José Francisco Guerreiro,
No 28 Paiã Park, Armazém A2.12, Pontinha, Odivelas 1675-078, Portugal
| | - Elena Tatarova
- Instituto
de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Lisboa 1049, Portugal
| | - Maria de Fátima Montemor
- Centro
de Química Estrutural-CQE, Departamento de Engenharia Química,
Instituto Superior Técnico, Universidade
de Lisboa, Lisboa 1049-001, Portugal
| | - Uroš Cvelbar
- Department
of Gaseous Electronics, Jožef Stefan
Institute, Jamova Cesta
39, Ljubljana SI-1000, Slovenia
- Jožef
Stefan International Postgraduate School, Jamova Cesta 39, Ljubljana SI-1000, Slovenia
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9
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Wang CY, Lin YW, Chuang C, Yang CH, Patel DK, Chen SZ, Yeh CC, Chen WC, Lin CC, Chen YH, Wang WH, Sankar R, Chou FC, Kruskopf M, Elmquist RE, Liang CT. Magnetotransport in hybrid InSe/monolayer graphene on SiC. NANOTECHNOLOGY 2021; 32:155704. [PMID: 33373982 DOI: 10.1088/1361-6528/abd726] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
The magnetotransport properties of a hybrid InSe/monolayer graphene in a SiC system are systematically studied. Compared to those of its bare graphene counterpart, in InSe/graphene, we can effectively modify the carrier density, mobility, effective mass, and electron-electron (e-e) interactions enhanced by weak disorder. We show that in bare graphene and hybrid InSe/graphene systems, the logarithmic temperature (lnT) dependence of the Hall slope R H = δR xy /δB = δρ xy /δB can be used to probe e-e interaction effects at various temperatures even when the measured resistivity does not show a lnT dependence due to strong electron-phonon scattering. Nevertheless, one needs to be certain that the change of R H is not caused by an increase of the carrier density by checking the magnetic field position of the longitudinal resistivity minimum at different temperatures. Given the current challenges in gating graphene on SiC with a suitable dielectric layer, our results suggest that capping a van der Waals material on graphene is an effective way to modify the electronic properties of monolayer graphene on SiC.
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Affiliation(s)
- Chih-Yuan Wang
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 106, Taiwan
| | - Yun-Wu Lin
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Chiashain Chuang
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
| | - Cheng-Hsueh Yang
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 106, Taiwan
| | - Dinesh K Patel
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
- Physical Measurement Laboratory, National Institute of Standard and Technology (NIST), Gaithersburg, MD 20899, United States of America
| | - Sheng-Zong Chen
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Ching-Chen Yeh
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Wei-Chen Chen
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Chia-Chun Lin
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Yi-Hsun Chen
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Wei-Hua Wang
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Raman Sankar
- Institute of Physics, Academia Sinica, Taipei 115, Taiwan
- Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan
| | - Fang-Cheng Chou
- Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan
| | - Mattias Kruskopf
- Physical Measurement Laboratory, National Institute of Standard and Technology (NIST), Gaithersburg, MD 20899, United States of America
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, United States of America
| | - Randolph E Elmquist
- Physical Measurement Laboratory, National Institute of Standard and Technology (NIST), Gaithersburg, MD 20899, United States of America
| | - Chi-Te Liang
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 106, Taiwan
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
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10
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Santhosh NM, Vasudevan A, Jurov A, Filipič G, Zavašnik J, Cvelbar U. Oriented Carbon Nanostructures from Plasma Reformed Resorcinol-Formaldehyde Polymer Gels for Gas Sensor Applications. NANOMATERIALS (BASEL, SWITZERLAND) 2020; 10:E1704. [PMID: 32872479 PMCID: PMC7559324 DOI: 10.3390/nano10091704] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 07/28/2020] [Revised: 08/23/2020] [Accepted: 08/25/2020] [Indexed: 02/03/2023]
Abstract
Oriented carbon nanostructures (OCNs) with dominant graphitic characteristics have attracted research interest for various applications due to the excellent electrical and optical properties owing to their vertical orientation, interconnected structures, electronic properties, and large surface area. Plasma enhanced chemical vapor deposition (PECVD) is considered as a promising method for the large-scale synthesis of OCNs. Alternatively, structural reformation of natural carbon precursor or phenol-based polymers using plasma-assisted surface treatment is also considered for the fabrication of OCNs. In this work, we have demonstrated a fast technique for the synthesis of OCNs by plasma-assisted structure reformation of resorcinol-formaldehyde (RF) polymer gels using radio-frequency inductively coupled plasma (rf-ICP). A thin layer of RF polymer gel cast on a glass substrate was used as the carbon source and treated with rf plasma under different plasma discharge conditions. Argon and hydrogen gases were used in surface treatment, and the growth of carbon nanostructures at different discharge parameters was systematically examined. This study explored the influence of the gas flow rate, the plasma power, and the treatment time on the structural reformation of polymer gel to produce OCNs. Moreover, the gas-sensing properties of as-prepared OCNs towards ethanol at atmospheric conditions were also investigated.
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Affiliation(s)
- Neelakandan M. Santhosh
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana, Slovenia; (N.M.S.); (A.V.); (A.J.); (G.F.); (J.Z.)
- Jožef Stefan International Postgraduate School, Jamova cesta 39, SI-1000 Ljubljana, Slovenia
| | - Aswathy Vasudevan
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana, Slovenia; (N.M.S.); (A.V.); (A.J.); (G.F.); (J.Z.)
- Jožef Stefan International Postgraduate School, Jamova cesta 39, SI-1000 Ljubljana, Slovenia
| | - Andrea Jurov
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana, Slovenia; (N.M.S.); (A.V.); (A.J.); (G.F.); (J.Z.)
- Jožef Stefan International Postgraduate School, Jamova cesta 39, SI-1000 Ljubljana, Slovenia
| | - Gregor Filipič
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana, Slovenia; (N.M.S.); (A.V.); (A.J.); (G.F.); (J.Z.)
| | - Janez Zavašnik
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana, Slovenia; (N.M.S.); (A.V.); (A.J.); (G.F.); (J.Z.)
| | - Uroš Cvelbar
- Department of Gaseous Electronics, Jožef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana, Slovenia; (N.M.S.); (A.V.); (A.J.); (G.F.); (J.Z.)
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