The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II

Be/Si/Al multilayer mirrors as the most promising optical elements for spectroscopy and imaging in the spectral region of 17-32 nm

The reflective and structural parameters of Be/Si/Al multilayer mirrors have been studied. The extent of stability of their X-ray optical characteristics has been demonstrated during storage in air for 4 years and during vacuum annealing at temperatures up to 100°C. A high reflectance of 62.5% was obtained, together with a spectral selectivity of λ/Δλ≈59 at a wavelength of 17.14 nm and 34%, with λ/Δλ ≈ 31 at a wavelength of 31.3 nm. It was shown that Si interlayers reduce the interlayer roughness from 0.45 to 0.20 nm.

X-FAST: A versatile, high-throughput, and user-friendly XUV femtosecond absorption spectroscopy tabletop instrument

We present the X-FAST (XUV Femtosecond Absorption Spectroscopy Tabletop) instrument at the University of Wisconsin-Madison. The instrument produces femtosecond extreme ultraviolet photon pulses via high-harmonic generation in the range of 40-72 eV, as well as optical pump pulses for transient-absorption experiments. The system implements a gas-cooled sample cell that enables studying the dynamics of thermally sensitive thin-film samples. This paper provides potential users with specifications of the optical, vacuum, data acquisition, and sample cooling systems of the X-FAST instrument, along with performance metrics and data of an ultrafast laser-induced phase transition in a Ni2MnGa Heusler thin film.

Spectromicroscopy of Nanoscale Materials in the Tender X-Ray Regime Enabled by a High Efficient Multilayer-Based Grating Monochromator

The combination of near edge X-ray absorption spectroscopy with nanoscale X-ray imaging is a powerful analytical tool for many applications in energy technologies, catalysis, which are critical to combat climate change, as well as microelectronics and life science. Materials from these scientific areas often contain key elements, such as Si, P, S, Y, Zr, Nb, and Mo as well as lanthanides, whose X-ray absorption edges lie in the so-called tender photon energy range 1.5-5.0 keV. Neither conventional grazing incidence grating nor crystal monochromators have high transmission in this energy range, thereby yielding the tender photon energy gap. To close this gap, a monochromator setup based on a multilayer coated blazed plane grating and plane mirror is devised. The measurements show that this novel concept improves the photon flux in the tender X-ray regime by two-orders-of-magnitude enabling previously unattainable laboratory and synchrotron-based studies. This setup is applied to perform nanoscale spectromicroscopy studies. The high photon flux provides sufficient sensitivity to obtain the electronic structure of Mo in platinum-free MoNi₄ nanoparticles for electrochemical energy conversion. Additionally, it is shown that the chemical bonding of nano-structures in integrated circuits can be distinguished by the electronic configuration at the Si-K edge.

Influence of Mo interlayers on the microstructure of layers and reflective characteristics of Ru/Be multilayer mirrors

The influence of Mo interlayers on the microstructure of films and boundaries, and the reflective characteristics of Ru/Be multilayer mirrors (MLM) were studied by X-ray reflectometry and diffractometry, and secondary ion mass spectrometry (SIMS). An increase in the reflection coefficients of MLM at a wavelength of 11.4 nm to record values of R = 72.2% and FWHM to Δλ_1/2= 0.38 nm is shown. The effect of interlayers on the structural and reflective characteristics of MLM is explained by the barrier properties of the Mo layers, which prevent the mutual mixing of the Ru and Be layers, which leads to the formation of beryllides and a decrease in the X-ray optical contrast at the boundaries.

Highly reflective Ru/Sr multilayer mirrors for wavelengths 9-12 nm

The results of investigations of Ru/Sr multilayer coatings optimized for the spectral range of 9-12 nm are presented in this Letter. Such mirrors are promising optical elements for solar astronomy and for the development of beyond extreme ultraviolet (BEUV) lithography. A near-normal incidence reflectivity of up to 62.3% (λ = 11.4 nm) right after the synthesis is measured. The reflection coefficient decreases to 56.8% after five days of storage in air with a subsequent stabilization of its value. At a wavelength of λ = 9.34 nm, the reflection coefficient is 48.6% after two months of storage in air. To date, to the best of our knowledge, this is the highest reflectivity measured in this spectral range. The possibility of further increasing the reflectivity is discussed.

Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nm

The results of the investigation of the reflective characteristics of multilayer mirrors based on Ru/Y are presented. Reflection coefficients at the level of 38.5% at an operating wavelength of 9.4 nm. It is shown that the deposition of B₄C barrier layers onto Y layers makes it possible to significantly increase the reflection coefficient compared to structures without barrier layers. A reflectance of 54% was obtained for mirrors optimized for 11.4 nm, which is close to the theoretical limit for these materials.

Performance and characterization of the FinEstBeAMS beamline at the MAX IV Laboratory

FinEstBeAMS (Finnish-Estonian Beamline for Atmospheric and Materials Sciences) is a multidisciplinary beamline constructed at the 1.5 GeV storage ring of the MAX IV synchrotron facility in Lund, Sweden. The beamline covers an extremely wide photon energy range, 4.5-1300 eV, by utilizing a single elliptically polarizing undulator as a radiation source and a single grazing-incidence plane grating monochromator to disperse the radiation. At photon energies below 70 eV the beamline operation relies on the use of optical and thin-film filters to remove higher-order components from the monochromated radiation. This paper discusses the performance of the beamline, examining such characteristics as the quality of the gratings, photon energy calibration, photon energy resolution, available photon flux, polarization quality and focal spot size.

Investigation of boron carbide and iridium thin films, an enabling technology for future x-ray telescopes

We present an experimental examination of iridium and boron carbide thin-film coatings for the purpose of fabricating x-ray optics. We use a combination of x-ray reflectometry and x-ray photoelectron spectroscopy to model the structure, composition, density, thickness, and micro-roughness of the thin films. We demonstrate in our analyses how the two characterization techniques are complementary, and from this we derive that an overlayer originating from atmospheric contamination with a thickness between 1.0-1.6 nm is present on the surface. The magnetron sputtered iridium films are measured to have a density of 22.4g/cm³. The boron carbide film exhibits a change in chemical composition in the top ∼2nm of the film surface when exposed to the ambient atmosphere. The chemical reaction occurring on the surface is due to an incorporation of oxygen and hydrogen present in the ambient atmosphere. Lastly, we present a correlation between the absorption edges and the emission lines exhibited by the thin films in an energy range from 50-800 eV and the impact on the reflectivity performance due to contamination in thin films.

Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4-250 eV

In this work, the refractive index of beryllium in the photon energy range 20.4-250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as well as reflectometric measurements of similar films on a substrate. Measurements were carried out at the optics beamline of the BESSY II synchrotron radiation source. The absorption coefficient β was found directly from the transmission coefficient of the films, and the real part of the polarizability δ was calculated from the Kramers-Kronig relations. A comparison is carried out with results obtained 20 years ago at the ALS synchrotron using a similar methodology.

Single-channel method for measuring the reflectance spectra of grazing incidence mirrors in the extreme ultraviolet range

This Letter presents a one-channel method of measurements of a grazing incidence reflection coefficient. The idea is to use the quasi-flat field extreme ultraviolet spectrometer to produce direct and reflected from the sample images of the spectral lines simultaneously at the same detector matrix. The analysis of a set of spectral lines in the working spectral range of the spectrometer gives the spectral dependence of the reflection coefficient. The results of the refection coefficient measurements for a plane ruthenium mirror for grazing angles of 6° and 10° in the spectral range 15-40 nm are presented.

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm-1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL-NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography

A comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin B₄C, C and Si interlayers. It was demonstrated that Mo/Be mirrors show maximum reflectance at normal incidence, while maximum structural perfection is shown by Mo/Be/Si mirrors. The introduction of B₄C and C layers into the structure increases the interlayer roughness and reduces the sharpness of the interfaces, adversely affecting the target coating characteristics. Results are presented for studies using four techniques: X-ray reflectometry, small-angle X-ray scattering, atomic force microscopy, and transmission electron microscopy.

Soft X-ray Reflection Spectroscopy for Nano-Scaled Layered Structure Materials

We introduce a novel approach that addresses the probing of interfacial structural phenomena in layered nano-structured films. The approach combines resonant soft x-ray reflection spectroscopy at grazing incidence near the "critical angle" with angular dependent reflection at energies around the respective absorption edges. Dynamic scattering is considered to determine the effective electron density and hence chemically resolved atomic profile across the structure based on simultaneous data analysis. We demonstrate application of the developed technique on the layered model structure C (20 Å)/B (40 Å)/Si (300 Å)/W (10 Å)/substrate. We precisely quantify atomic migration across the interfaces, a few percent of chemical changes of materials and the presence of impurities from top to the buried interfaces. The results obtained reveal the sensitivity of the approach towards resolving the compositional differences up to a few atomic percent. The developed approach enables the reconstruction of a highly spatio-chemically resolved interfacial map of complex nano-scaled interfaces with technical relevance to many emerging applied research fields.

Diffraction gratings metrology and ray-tracing results for an XUV Raman spectrometer at FLASH

The extreme-ultraviolet double-stage imaging Raman spectrometer is a permanent experimental endstation at the plane-grating monochromator beamline branch PG1 at FLASH at DESY in Hamburg, Germany. This unique instrument covers the photon energy range from 20 to 200 eV with high energy resolution of about 2 to 20 meV (design values) featuring an efficient elastic line suppression as well as effective stray light rejection. Such a design enables studies of low-energy excitations like, for example, phonons in solids close to the vicinity of the elastic line. The Raman spectrometer effectively operates with four reflective off-axial parabolic mirrors and two plane-grating units. The optics quality and their precise alignment are crucial to guarantee best performance of the instrument. Here, results on a comprehensive investigation of the quality of the spectrometer diffraction gratings are presented. The gratings have been characterized by ex situ metrology at the BESSY-II Optics Laboratory, employing slope measuring deflectometry and interferometry as well as atomic force microscopy studies. The efficiency of these key optical elements has been measured at the at-wavelength metrology laboratory using the reflectometer at the BESSY-II Optics beamline. Also, the metrology results are discussed with respect to the expected resolving power of the instrument by including them in ray-tracing studies of the instrument.

Efficient high-order suppression system for a metrology beamline

High-quality metrology with synchrotron radiation requires in particular a very high spectral purity of the incident beam. This is usually achieved by a set of transmission filters with suitable absorption edges to suppress high-order radiation of the monochromator. The at-wavelength metrology station at a BESSY-II bending-magnet collimated plane-grating monochromator (c-PGM) beamline has recently commissioned a high-order suppression system (HiOS) based on four reflections from mirrors which can be inserted into the beam path. Two pairs of mirrors are aligned parallel so as not to disturb the original beam path and are rotated clockwise and counter-clockwise. Three sets of coatings are available for the different energy ranges and the incidence angle is freely tunable to find the optimum figure of merit for maximum suppression at maximum transmission for each photon energy required. Measured performance results of the HiOS for the EUV and XUV range are compared with simulations, and applications are discussed.

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Blazed gratings are of dedicated interest for the monochromatization of synchrotron radiation when a high photon flux is required, such as, for example, in resonant inelastic X-ray scattering experiments or when the use of laminar gratings is excluded due to too high flux densities and expected damage, for example at free-electron laser beamlines. Their availability became a bottleneck since the decommissioning of the grating manufacture facility at Carl Zeiss in Oberkochen. To resolve this situation a new technological laboratory was established at the Helmholtz Zentrum Berlin, including instrumentation from Carl Zeiss. Besides the upgraded ZEISS equipment, an advanced grating production line has been developed, including a new ultra-precise ruling machine, ion etching technology as well as laser interference lithography. While the old ZEISS ruling machine GTM-6 allows ruling for a grating length up to 170 mm, the new GTM-24 will have the capacity for 600 mm (24 inch) gratings with groove densities between 50 lines mm-1 and 1200 lines mm-1. A new ion etching machine with a scanning radiofrequency excited ion beam (HF) source allows gratings to be etched into substrates of up to 500 mm length. For a final at-wavelength characterization, a new reflectometer at a new Optics beamline at the BESSY-II storage ring is under operation. This paper reports on the status of the grating fabrication, the measured quality of fabricated items by ex situ and in situ metrology, and future development goals.

High-reflection Mo/Be/Si multilayers for EUV lithography

The effect of Be layers on the reflection coefficients of Mo/Be/Si multilayer mirrors in the extreme ultraviolet (EUV) region is reported. Samples were studied using laboratory and synchrotron based reflectometry, and high-resolution transmission electron microscopy. The samples under study have reflection coefficients above 71% at 13.5 nm and more than 72% at 12.9 nm in a near normal incidence mode. Calculations show that by optimizing the thickness of the Be layer it should be possible to increase the reflection coefficient by another 0.5-1%. These results are of considerable interest for EUV lithography.

Polycapillary-boosted instrument performance in the extreme ultraviolet regime for inverse photoemission spectroscopy

A collimating polycapillary half lens, traditionally used in the medium and hard X-ray band, is operated at a photon energy of 36 eV for the first time. While the transmission still exceeds 50%, the measured and simulated spatial resolution and angular divergence approach 0.4 mm or less and at most 20 mrad, respectively. This unexpected, superior performance of the polycapillary optic in the extreme Ultraviolet could enable the design of an efficient, versatile and compact spectrometer for inverse photoemission spectroscopy (IPES): Its wavelength-dispersive component, a customized reflection zone plate, can maintain an energy resolution of 0.3 eV, whereas the sensitivity may be enhanced by more than one order of magnitude, compared to conventional spectrometers. Furthermore, the overall length of 0.9 m would allow for an eased alignment and evacuation. We see a significant potential for numerous polycapillary-based XUV / soft X-ray instruments in the future, in particular after further optimization for this long wavelength regime.

Design of a multilayer-based collimated plane-grating monochromator for tender X-ray range

Collimated plane-grating monochromators (cPGMs), consisting of a plane mirror and plane diffraction grating, are essential optics in synchrotron radiation sources for their remarkable flexibility and good optical characteristics in the soft X-ray region. However, the poor energy transport efficiency of a conventional cPGM (single-layer-coated) degrades the source intensity and leaves reduced flux at the sample, especially for the tender X-ray range (1-4 keV) that covers a large number of K- and L-edges of medium-Z elements, and M-edges of high-Z elements. To overcome this limitation, the use of a multilayer-based cPGM is proposed, combining a multilayer-coated plane mirror with blazed multilayer gratings. With this combination, the effective efficiency of cPGMs can be increased by an order of magnitude compared with the conventional single-layer cPGMs. In addition, higher resolving power can be achieved with improved efficiency by increasing the blaze angle and working at higher diffraction order.

Calibration of a compact XUV soft X-ray monochromator with a digital autocollimator in situ

A digital autocollimator of resolution 0.1 µrad (0.02 arcsec) serves as a handy correction tool for calibrating the angular uncertainty during angular and lateral movements of gratings inside a monochromator chamber under ultra-high vacuum. The photon energy dispersed from the extreme ultraviolet (XUV) to the soft X-ray region of the synchrotron beamline at the Taiwan Light Source was monitored using molecular ionization spectra at high resolution as energy references that correlate with the fine angular steps during grating rotation. The angular resolution of the scanning mechanism was <0.3 µrad, which results in an energy shift of 80 meV at 867 eV. The angular uncertainties caused by the lateral movement during a grating exchange were decreased from 2.2 µrad to 0.1 µrad after correction. The proposed method provides a simple solution for on-site beamline diagnostics of highly precise multi-axis optical manipulating instruments at synchrotron facilities and in-house laboratories.

Curved gratings as an integrated photon fluence monitor in x-ray transmission scattering experiments

A concept to obtain a measure of the photon flux accepted by a solid sample in single-shot transmission experiments with extreme ultraviolet (XUV) or soft x-ray radiation is demonstrated. Shallow, continuously distorted gratings are used to diffract a constant fraction of the incident photons onto an extended area of a CCD detector. The signal can be tailored to fit the dynamic range of the detector, i.e. matching the scattered intensity of the studied structure of interest. Furthermore, composite grating designs that also allow for the measurement of the spatial photon distribution on the sample are demonstrated. The gratings are directly fabricated by focused ion-beam (FIB) lithography into a Si₃N₄ membrane that supports the actual sample layer. This allows for rapid fabrication of hundreds of samples, making the concept suitable for systematic studies in destructive single-shot measurements at free-electron laser (FEL) sources. We demonstrate relative photon flux measurements in magnetic scattering experiments with synchrotron and FEL radiation at 59.6 eV photon energy.

Highly efficient blazed grating with multilayer coating for tender X-ray energies

For photon energies of 1 - 5 keV, blazed gratings with multilayer coating are ideally suited for the suppression of stray and higher orders light in grating monochromators. We developed and characterized a blazed 2000 lines/mm grating coated with a 20 period Cr/C- multilayer. The multilayer d-spacing of 7.3 nm has been adapted to the line distance of 500 nm and the blaze angle of 0.84° in order to provide highest efficiency in the photon energy range between 1.5 keV and 3 keV. Efficiency of the multilayer grating as well as the reflectance of a witness multilayer which were coated simultaneously have been measured. An efficiency of 35% was measured at 2 keV while a maximum efficiency of 55% was achieved at 4 keV. In addition, a strong suppression of higher orders was observed which makes blazed multilayer gratings a favorable dispersing element also for the low X-ray energy range.

At-wavelength metrology facility for soft X-ray reflection optics

A new Optics Beamline coupled to a versatile UHV reflectometer is successfully operating at BESSY-II. It is used to carry out at-wavelength characterization and calibration of in-house produced gratings and novel nano-optical devices as well as mirrors and multilayer systems in the UV and XUV spectral region. This paper presents most recent commissioning data of the beamline and shows their correlation with initial beamline design calculations. Special attention is paid to beamline key parameters which determine the quality of the measurements such as high-order suppression and stray light behavior. The facility is open to user operation.