Electron beam lithography on nonplanar and irregular surfaces

E-beam lithography is a powerful tool for generating nanostructures and fabricating nanodevices with fine features approaching a few nanometers in size. However, alternative approaches to conventional spin coating and development processes are required to optimize the lithography procedure on irregular surfaces. In this review, we summarize the state of the art in nanofabrication on irregular substrates using e-beam lithography. To overcome these challenges, unconventional methods have been developed. For instance, polymeric and nonpolymeric materials can be sprayed or evaporated to form uniform layers of electron-sensitive materials on irregular substrates. Moreover, chemical bonds can be applied to help form polymer brushes or self-assembled monolayers on these surfaces. In addition, thermal oxides can serve as resists, as the etching rate in solution changes after e-beam exposure. Furthermore, e-beam lithography tools can be combined with cryostages, evaporation systems, and metal deposition chambers for sample development and lift-off while maintaining low temperatures. Metallic nanopyramids can be fabricated on an AFM tip by utilizing ice as a positive resistor. Additionally, Ti/Au caps can be patterned around a carbon nanotube. Moreover, 3D nanostructures can be formed on irregular surfaces by exposing layers of anisole on organic ice surfaces with a focused e-beam. These advances in e-beam lithography on irregular substrates, including uniform film coating, instrumentation improvement, and new pattern transferring method development, substantially extend its capabilities in the fabrication and application of nanoscale structures.

Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO₂ spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO₂. This method takes advantage of traditional nanolithography without the need for a resist layer.

Hybrid application of laser-focused atomic deposition and extreme ultraviolet interference lithography methods for manufacturing of self-traceable nanogratings

A novel hybrid method that combines the laser-focused atomic deposition (LFAD) and extreme ultraviolet (EUV) interference lithography has been introduced. The Cr grating manufactured by LFAD has advantages of excellent uniformity, low line edge roughness and its pitch value determined directly by nature constants (i.e. self-traceable). To further enhance the density of the Cr grating, the EUV interference lithography with 13.4 nm wavelength was employed, which replicated the master Cr grating onto a Si wafer with its pitch reduced to half. In order to verify the performance of the gratings manufactured by this novel method, both mask grating (Cr grating) and replicated grating (silicon grating) were calibrated by the metrological large range scanning probe microscope (Met.LR-SPM) at Physikalisch-Technische Bundesanstalt (PTB). The calibrated results show that both gratings have excellent short-term and long-term uniformity: (i) the calibrated position deviation (i.e. nonlinearity) of the grating is below ±1 nm; (ii) the deviation of mean pitch values of 6 randomly selected measurement locations is below 0.003 nm. In addition, the mean pitch value of the Cr grating is calibrated as 212.781 ± 0.008 nm (k = 2). It well agrees with its theoretical value of 212.7787 ± 0.0049 nm, confirming the self-traceability of the manufactured grating by the LFAD. The mean pitch value of the Si grating is calibrated as 106.460 ± 0.012 nm (k = 2). It corresponds to the shrinking factor of 0.500 33 of the applied EUV interference lithographic technique. This factor is very close to its theoretical value of 0.5. The uniform, self-traceable gratings fabricated using this novel approach can be well applied as reference materials in calibrating, e.g. the magnification and uniformity of almost all kinds of high resolution microscopes for nanotechnology.

Bottom-up fabrication of the multi-layer carbon metal nanosheets

Ordered carbon composite materials have great potential for practical applications in many areas such as energy conversion, quantum computing, biotechnologies, and electronics. In this work, we demonstrate a state-of-the-art self-assembly driven building block approach to create new layered carbon–metal composite materials with advanced properties. We fabricate molecular nanocomposites using self-assembled metal intercalated multi-layers of dithiol derivatives. The obtained structures are analysed using different characterization tools (such as X-ray photoelectron and Raman spectroscopy and atomic force microscopy) and their electronic transport properties are studied by four-point probe measurements supplemented by density functional theory calculations. This work demonstrates a new strategy for low-cost, high-yield and eco-friendly nanofabrication of hybrid organometallic membranes.

Self-assembly based building block approach for creating layered carbon–metal composite materials.

Electron-induced chemistry of surface-grown coordination polymers with different linker anions

Electron beam processing of surface-grown coordination polymers is a versatile approach to the fabrication of nanoscale surface structures. Depending on their molecular components, these materials can be converted into pure metallic particles or they can be activated to become a template for the spatially selective decomposition of suitable gaseous precursor molecules and subsequent autocatalytic growth of deposits. However, insight into the fundamental electron-induced chemistry for such processes has been scarce so far. Therefore, we investigated the electron-induced reactions of three self-assembled copper-containing materials, namely, copper(ii) oxalate, copper(ii) squarate, and copper(ii) 1,3,5-benzenetricarboxylate (HKUST-1) which were grown on the surface of self-assembled monolayers of mercaptoundecanoic acid in a layer-by-layer approach from copper(ii) acetate and various linker molecules. Changes incurred to these materials during electron irradiation were monitored by four complementary techniques. Reflection absorption infrared spectroscopy (RAIRS) and X-ray photoelectron spectroscopy (XPS) were used to identify the chemical species that are formed upon electron exposure. The temporal evolution of electron-stimulated desorption (ESD) of neutral volatile fragments was monitored to reveal the kinetics governing the decomposition of the different materials. Furthermore, the morphology was investigated by helium ion microscopy (HIM). A detailed analysis of the results for the different linker molecules provides new insights into the electron-induced chemistry of such surface-grown layers.

Interfacial Electron Beam Lithography: Chemical Monolayer Nanopatterning via Electron-Beam-Induced Interfacial Solid-Phase Oxidation

Chemical nanopatterning-the deliberate nanoscale modification of the chemical nature of a solid surface-is conveniently realized using organic monolayer coatings to impart well-defined chemical functionalities to selected surface regions of the coated solid. Most monolayer patterning methods, however, exploit destructive processes that introduce topographic as well as other undesired structural and chemical transformations along with the desired surface chemical modification. In particular in electron beam lithography (EBL), organic monolayers have been used mainly as ultrathin resists capable of improving the resolution of patterning via local deposition or removal of material. On the basis of the recent discovery of a class of radiation-induced interfacial chemical transformations confined to the contact surface between two solids, we have advanced a direct, nondestructive EBL approach to chemical nanopatterning-interfacial electron beam lithography (IEBL)-demonstrated here by the e-beam-induced local oxidation of the -CH₃ surface moieties of a highly ordered self-assembled n-alkylsilane monolayer to -COOH while fully preserving the monolayer structural integrity and molecular organization. In this conceptually different EBL process, the traditional resist is replaced by a thin film coating that acts as a site-activated reagent/catalyst in the chemical modification of the coated surface, here the top surface of the to-be-patterned monolayer. Structural and chemical transformations induced in the thin film coating and the underlying monolayer upon exposure to the electron beam were elucidated using a semiquantitative surface characterization methodology that combines multimode AFM imaging with postpatterning surface chemical modifications and quantitative micro-FTIR measurements. IEBL offers attractive opportunities in chemical nanopatterning, for example, by enabling the application of the advanced EBL technology to the straightforward nanoscale functionalization of the simplest commonly used organosilane monolayers.

Direct Mapping of Heterogeneous Surface Coverage in DNA-Functionalized Gold Surfaces with Correlated Electron and Fluorescence Microscopy

The characterization of biofunctionalized surfaces such as alkanethiol self-assembled monolayers (SAMs) on gold modified with DNA or other biomolecules is a challenging analytical problem, and access to a routine method is desirable. Despite substantial investigation from structural and mechanistic perspectives, robust and high-throughput metrology tools for SAMs remain elusive but essential for the continued development of these devices. We demonstrate that scanning electron microscopy (SEM) can provide image contrast of the molecular interface during SAM functionalization. The high-speed, large magnification range, and ease of use make this widely available technique a powerful platform for measuring the structure and composition of SAM surfaces. This increased throughput allows for a better understanding of the nonideal spatial heterogeneity characteristic of SAMs utilized in real-world conditions. SEM image contrast is characterized through the use of fluorescently labeled DNA, which enables correlative SEM and fluorescence microscopy. This allows identification of the DNA-modified regions at resolutions that approach the size of the biomolecule. The effect of electron beam irradiation dose is explored, which leads to straightforward lithographic patterning of DNA SAMs with nanometer resolution and with control over the surface coverage of specifically adsorbed DNA.

Characterization of Self-Assembled Monolayers on a Ruthenium Surface

We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H₂SO₄ cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal-sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

Carbon Nanomembranes

This chapter describes the formation and properties of one nanometer thick carbon nanomembranes (CNMs), made by electron induced cross-linking of aromatic self-assembled monolayers (SAMs). The cross-linked SAMs are robust enough to be released from the surface and placed on solid support or over holes as free-standing membranes. Annealing at ~1000K transforms CNMs into graphene accompanied by a change of mechanical stiffness and electrical resistance. The developed fabrication approach is scalable and provides molecular level control over thickness and homogeneity of the produced CNMs. The mechanisms of electron-induced cross-linking process are discussed in details. A variety of polyaromatic thiols: oligophenyls as well as small and extended condensed polycyclic hydrocarbons have been successfully employed, demonstrating that the structural and functional properties of the resulting nanomembranes are strongly determined by the structure of molecular monolayers. The mechanical properties of CNMs (Young’s modulus, tensile strength and prestress) are characterized by bulge testing. The interpretation of the bulge test data relates the Young’s modulus to the properties of single molecules and to the structure of the pristine SAMs. The gas transport through the CNM is measured onto polydimethylsiloxane (PDMS) - thin film composite membrane. The established relationship of permeance and molecular size determines the molecular sieving mechanism of permeation through this ultrathin sheet.

Templating for hierarchical structure control in carbon materials

Carbon-based materials show a remarkable variety of physical properties. For this reason, they have recently been explored for many advanced applications and emerging technologies. In the absence of actual "chemical" functionalities in these materials, tailoring these physical properties requires control on all levels of the structural hierarchy, from the atomic structure (carbon connectivity, defects, impurities), to the supramolecular level (domain orientations), nanoscopic length scale (domain sizes, porosity), microscopic structure (morphology), and macroscopic aspects (shape, surface chemistry). When preparing carbon materials, all these features can be tailored through the use of hard, soft, or molecular templates. Based on such templating approaches or through their combination, tremendous progress towards hierarchically structured carbon materials has recently been accomplished. Novel carbon nanomaterials such as brick-walled carbon tubes, carbon nanotube forests, coral-like carbon monoliths, or functional carbon nanosheets have become available, some of which exhibit unusual combinations of electronic, mechanical, and chemical properties. This review aims to discuss how the different templating approaches allow the control of structure formation on various length scales, how hierarchical structure formation can be realized, and which challenges remain, such as the detailed control over the carbon connectivity or the surface chemistry.

Efficient electron-induced removal of oxalate ions and formation of copper nanoparticles from copper(II) oxalate precursor layers

Copper(II) oxalate grown on carboxy-terminated self-assembled monolayers (SAM) using a step-by-step approach was used as precursor for the electron-induced synthesis of surface-supported copper nanoparticles. The precursor material was deposited by dipping the surfaces alternately in ethanolic solutions of copper(II) acetate and oxalic acid with intermediate thorough rinsing steps. The deposition of copper(II) oxalate and the efficient electron-induced removal of the oxalate ions was monitored by reflection absorption infrared spectroscopy (RAIRS). Helium ion microscopy (HIM) reveals the formation of spherical nanoparticles with well-defined size and X-ray photoelectron spectroscopy (XPS) confirms their metallic nature. Continued irradiation after depletion of oxalate does not lead to further particle growth giving evidence that nanoparticle formation is primarily controlled by the available amount of precursor.

Electron Processing at 50 eV of Terphenylthiol Self-Assembled Monolayers: Contributions of Primary and Secondary Electrons

Aromatic self-assembled monolayers (SAMs) can serve as platforms for development of supramolecular assemblies driven by surface templates. For many applications, electron processing is used to locally reinforce the layer. To achieve better control of the irradiation step, chemical transformations induced by electron impact at 50 eV of terphenylthiol SAMs are studied, with these SAMs serving as model aromatic SAMs. High-resolution electron energy loss spectroscopy (HREELS) and electron-stimulated desorption (ESD) of neutral fragment measurements are combined to investigate electron-induced chemical transformation of the layer. The decrease of the CH stretching HREELS signature is mainly attributed to dehydrogenation, without a noticeable hybridization change of the hydrogenated carbon centers. Its evolution as a function of the irradiation dose gives an estimate of the effective hydrogen content loss cross-section, σ = 2.7-4.7 × 10(-17) cm(2). Electron impact ionization is the major primary mechanism involved, with the impact electronic excitation contributing only marginally. Therefore, special attention is given to the contribution of the low-energy secondary electrons to the induced chemistry. The effective cross-section related to dissociative secondary electron attachment at 6 eV is estimated to be 1 order of magnitude smaller. The 1 eV electrons do not induce significant chemical modification for a 2.5 mC cm(-2) dose, excluding their contribution.

Production of centimeter-scale gradient patterns by graded elastomeric tip array

Large-area patterned surfaces with chemical and/or morphological gradients have significant applications in biology, chemistry, and materials science. In this work, we developed a unique lithographic strategy to fabricate 2D and 3D gradient patterns with gradually varying feature size or height over centimeter-scale areas by utilizing a large-area polydimethylsiloxane (PDMS) tip array with programmable tip apex as a conformal photomask in near-field photolithography. Meanwhile, a new strategy was developed to create the PDMS tip array with graded apex size, which was employed to fabricate gradient patterns with the lateral feature sizes changing from sub-100 nm to several microns on one single substrate over macroscopic (square centimeter) areas. Furthermore, 3D gradient patterns with spatially varying feature height were enabled by employing gradient exposure dose. The formation of gradient feature size was ascribed either to gradient contact areas between tips and substrates or to exposure dose gradient. This lithography strategy combines the advantages of a wide range of feature sizes, simplicity, high-throughput, low-cost and diversified feature shapes, making it a facile and flexible approach to manufacture various functional gradient structures.

Electrowetting of nitro-functionalized oligoarylene thiols self-assembled on polycrystalline gold

Four linear terarylene molecules (i) 4-nitro-terphenyl-4″-methanethiol (NTM), (ii) 4-nitro-terphenyl-3″,5″-dimethanethiol (NTD), (iii) ([1,1';4',1″] terphenyl-3,5-diyl)methanethiol (TM), and (iv) ([1,1';4',1″] terphenyl-3,5-diyl)dimethanethiol (TD) have been synthesized and their self-assembled monolayers (SAMs) have been obtained on polycrystalline gold. NTM and NTD SAMs have been characterized by X-ray photoelectron spectroscopy, Kelvin probe measurements, electrochemistry, and contact angle measurements. The terminal nitro group (-NO2) is irreversibly reduced to hydroxylamine (-NHOH), which can be reversibly turned into nitroso group (-NO). The direct comparison between NTM/NTD and TM/TD SAMs unambiguously shows the crucial influence of the nitro group on electrowetting properties of polycrystalline Au. The higher grade of surface tension related to NHOH has been successfully exploited for basic operations of digital μ-fluidics, such as droplets motion and merging.

Electron beam lithography on irregular surfaces using an evaporated resist

An electron beam resist is typically applied by spin-coating, which cannot be reliably applied on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative electron beam resist polystyrene can be coated by thermal evaporation. A high resolution of 30 nm half-pitch was achieved using the evaporated resist. As a proof of concept of patterning on irregular surfaces, we fabricated nanostructures on the AFM cantilever and the optical fiber. Although an ice (H2O) resist has also been recently demonstrated as being capable of nanopatterning on irregular and fragile substrates, it requires specially designed accessories mounted inside a SEM chamber, whereas our process works with any thermal evaporator and is thus simpler and much more accessible. Nanofabrication on nonplanar surfaces may find applications in fields such as (AFM) tip-enhanced Raman spectroscopy for chemical analysis and lab-on-fiber technology.

Fabrication of quantum dot microarrays using electron beam lithography for applications in analyte sensing and cellular dynamics

Quantum dot (QD) based micro-/nanopatterned arrays are of broad interest in applications ranging from electronics, photonics, to sensor devices for biomedical purposes. Here, we report on a rapid, physico-chemically mild approach to generate high fidelity micropattern arrays of prefunctionalized water-soluble quantum dots using electron beam lithography. We show that such patterns retain their fluorescence and bioaffinity upon electron beam lithography and, based on the streptavidin-biotin interaction, allow for detection of proteins, colloidal gold nanoparticles and magnetic microparticles. Furthermore, we demonstrate the applicability of QD based microarray patterns differing in their shape (circles, squares, grid-like), size (from 1 to 10 μm) and pitch distance to study the adhesion, spreading and migration of human blood derived neutrophils. Using live cell confocal fluorescence microscopy, we show that pattern geometry and pitch distance influence the adhesion, spreading and migratory behavior of neutrophils. Research reported in this work paves the way for producing QD microarrays with multiplexed functionalities relevant for applications in analyte sensing and cellular dynamics.

SAM-like arrangement of thiolated graphene nanoribbons: decoupling the edge state from the metal substrate

Density functional theory calculations have been used to analyze the electronic and magnetic properties of ultrathin zigzag graphene nanoribbons (ZGNRs) with different edge saturations. We have compared a symmetric hydrogen saturation of both edges with an asymmetric saturation in which one of the edges is saturated with sulphur atoms or thiol groups, while the other one is kept hydrogen saturated. The adsorption of such partially thiolated ZGNRs on Au(111) has also been explored. We have considered vertical and tilted adsorption configurations of the ribbons, reminiscent of those found for thiolated organic molecules in self-assembled monolayers (SAM) on gold substrates. We have found that saturation with sulphur atoms or thiol groups removes the corresponding edge state from the Fermi energy and kills the accompanying spin polarization. However, this effect is so local that the electronic and magnetic properties of the mono-hydrogenated edge (H-edge) remain unaffected. Thus, the system develops a spin moment mainly localized at the H-edge. This property is not modified when the partially thiolated ribbon is attached to the gold substrate, and is quite independent of the width of the ribbon. Therefore, the upright adsorption of partially thiolated ZGNRs can be an effective way to decouple the spin-polarized channel provided by the H-edge from an underlying metal substrate. These observations might open a novel route to build spin-filter devices using ZGNRs on gold substrates.

Modification of nitrile-terminated biphenylthiol self-assembled monolayers by electron irradiation and related applications

Here we describe the behavior of self-assembled monolayers (SAMs) of 4'-cyanobiphenyl-4-thiol (CBPT) on Au(111) upon electron irradiation. Under such a treatment, the aromatic framework of CBPT SAMs is laterally cross-linked while the nitrile groups, located at the SAM-ambience interface, are reduced to active amine moieties which can be used as docking sites for the coupling of other species. This makes CBPT monolayers as a promising system for conventional and chemical lithography as well as for nanofabrication. Along these lines, we demonstrate the preparation of complex polymer brushes, patterning of the underlying substrate, and fabrication of molecule-thin, free-standing membranes on the basis of CBPT SAMs. The balance between the application-favorable processes and defragmentation in these films is studied in detail, and comparison to the well-established (for the relevant applications) system of 4'-nitrobiphenyl-4-thiols is performed. Taking CBPT SAMs as a model system, the effect of the energy of the primary electrons on the extent of the chemical transformation and cross-linking in substituted aromatic SAMs is investigated.

Adsorption characteristics of OH-terminated alkanethiol and arenethiol on Au(111) surfaces

Adsorption behaviors of hydroxyl-terminated alkanethiol, 3-mercapto-1-propanol (MPO), and arenethiol, 4-mercaptophenol (MPH), on Au(111) electrodes were studied by cyclic voltammetry (CV) and in situ scanning tunneling microscopy (STM). The effects of the molecular structure and the chain length on the characteristics of the self-assembled monolayers (SAMs) were investigated by comparison with the results of 11-mercapto-1-undecanol (MUO) and 6-mercapto-1-hexanol (MHO) reported in the literature. All the alkanethiol SAMs have the same coverage ratio (0.33 ML). For MUO which has a longer chain length, a hexagonal lattice, the (√3 ×√3) structure was observed. However, for shorter thiols (MHO and MPO), the adsorbed molecules exhibit different contrasts under the imaging of STM, ascribed to the different conformations of adsorbed molecules. The CV results indicated that a longer chain length triggers a SAM with higher adhesion and higher resistance to the charge transfer across a SAM. For the SAM of arenethiol, MPH, the π-π stacking interaction of the phenyl ring leads to a lower surface mobility of thiol/Au complexes, lower coverage ratio, and less uniform structure of the adlayer. Furthermore, the vacancy islands commonly observed on alkanethiol-modified Au(111) electrodes do not appear on the MPH-modified surface. Instead, 2-dimensional patch islands formed on the terrace due to the aggregation of moveable MPH/Au complexes.

Controlling Area-Selective Atomic Layer Deposition of HfO2 Dielectric by Self-assembled Monolayers

A series of self-assembled molecules have been investigated as deactivating agents for the HfO2 atomic layer deposition (ALD). Three important factors of self-assembled monolayers (SAMs) deactivating efficiency towards ALD--chain length, reactivity and steric effect--have been investigated and discussed as well as the initial blocking mechanism of this process. This investigation shows that in order to achieve satisfactory deactivation, it is crucial to choose high reactivity, low steric effect molecules with certain chain length to form condensed, high hydrophobic organic monolayers.

Controlling surface functionality through generation of thiol groups in a self-assembled monolayer

A lithographic method to generate reactive thiol groups on functionalized synthetic diamond for biosensor and molecular electronic applications is developed. We demonstrate that ultrananocrystalline diamond (UNCD) thin films covalently functionalized with surface-generated thiol groups allow controlled thiol-disulfide exchange surface hybridization processes. The generation of the thiol functional head groups was obtained by irradiating phenylsulfonic acid (PSA) monolayers on UNCD surfaces. The conversion of the functional headgroup of the self-assembled monolayer was verified by using X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure (NEXAFS), and fluorescence microscopy. Our findings indicate the selective generation of reactive thiol surface groups. Furthermore, we demonstrate the grafting of yeast cytochrome c to the thiol-modified diamond surface and the electron transfer between protein and electrode.

Building upon patterned organic monolayers produced via catalytic stamp lithography

Soft lithographic sub-100 nm chemical patterning was demonstrated on organic monolayer surfaces using poly(dimethylsiloxane)-based stamps decorated with Pd nanostructures, structures termed "catalytic stamps". Chemically reactive azide or alkene functionalities were incorporated on oxide-capped silicon surfaces and utilized for patterning via Pd-catalyzed hydrogenation or Heck reactions. The catalytic stamps were soft lithographic stamps based on PDMS with embedded nanoscale palladium catalysts, prepared via block copolymer-based templating. Nanoscale chemical patterns were readily generated on the azide or alkene precursor surfaces simply by applying the Pd catalytic stamps and the reactive molecule, the molecular ink, to the surface, thanks to the highly localized catalytic transformations induced by the patterned, immobilized solid Pd catalysts. A series of successful postfunctionalization reactions on the resulting patterned surfaces further demonstrated the utility of this approach to construct novel designs of nanoarchitectures, with potentially unique and innovative properties.

Molecular mechanisms of electron-induced cross-linking in aromatic SAMs

When aromatic self-assembled monolayers (SAMs) are electron-irradiated, intermolecular cross-links are formed and the SAMs transform into carbon nanosheets with molecular thickness. These nanosheets have a very high mechanical stability and can withstand temperatures above 1000 K. In this report, we investigate the electron induced cross-linking of 1,1'-biphenyl-4-thiol (BPT) SAMs on gold by combining X-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (NEXAFS), thermal desorption spectroscopy (TDS), and UV photoelectron spectroscopy (UPS). The experimental data were acquired as a function of electron dose and temperature and compared with quantum chemical calculations. Details of the intermolecular cross-linking, the microstructure of cross-linked films, and their structural transformations upon heating were obtained to derive a view of the mechanisms involved. Our analysis shows that room-temperature electron irradiation causes a lateral cross-linking via the formation of C-C linked phenyl species as well as a new sulfur species. The thermal stability of the BPT films increases with the electron dose and saturates at approximately 50 mC/cm2. Nevertheless, nonlinked fragments in the thermal desorption spectra indicate an incomplete cross-linking even at high doses, which can be attributed to steric reasons and quenching due to the reduced band gap of partially linked molecules. At temperatures above 800 K, all sulfur species are thermally desorbed, while the remaining film reveals an onset of carbonization.

Oxidation of Elemental Gold in Alcohol Solutions

Gold is designated as the noblest metal because of its chemical inertness. It is known to dissolve in cyanide solutions in the presence of air or H2O2 or in halogen-containing solutions, aqua regia being the most famous example. Herein, we report a unique thiol, especially 4-pyridinethiol (4-PS), assisted dissolution of Au in alcohol solutions. Although dissolution was found to be very selective for pyridinethiols, such a phenomenon is astonishing since thiols are commonly used as etch resists for Au and even 4-PS is extensively used as a surface modifier for Au. To gain further understanding of the dissolution process, the influence of the reaction conditions was extensively studied. On the basis of the obtained results, a mechanism for the dissolution reaction is proposed. Fascinatingly, by tuning of the reaction conditions, this phenomenon can be applied in selective preparation of self-supporting nanometer-thick Au foils.

Nanostructured polymer brushes

Nanopatterned polymer brushes with sub-50-nm resolution were prepared by a combination of electron-beam chemical lithography (EBCL) of self-assembled monolayers (SAMs) and surface-initiated photopolymerization (SIPP). As a further development of our previous work, selective EBCL was performed with a highly focused electron beam and not via a mask, to region-selectively convert a SAM of 4'-nitro-1,1'-biphenyl-4-thiol to defined areas of crosslinked 4'-amino-1,1'-biphenyl-4-thiol. These "written" structures were then used to prepare surface-bonded, asymmetric, azo initiator sites of 4'-azomethylmalonodinitrile-1,1'-biphenyl-4-thiol. In the presence of bulk styrene, SIPP amplified the primary structures of line widths from 500 to 10 nm to polystyrene structures of line widths 530 nm down to approximately 45 nm at a brush height of 10 or 7 nm, respectively, as measured by scanning electron microscopy and atomic force microscopy (AFM). The relative position of individual structures was within a tolerance of a few nanometers, as verified by AFM. At line-to-line spacings down to 50-70 nm, individual polymer brush structures are still observable. Below this threshold, neighboring structures merge due to chain overlap.

DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays

Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT), respectively. In this approach, patterns of MHA on gold are generated by DPN, and surrounding areas are passivated by ODT. Electrochemistry is used to selectively remove the MHA nanofeatures made by DPN. The exposed gold can be used as an electrode to plate silver from solution, generating raised features and structures that can be transferred to PDMS to make a lithographic master, or alternatively, they can be etched to make arrays of nanoholes.

Exposure of Monomolecular Lithographic Patterns to Ambient: An X-ray Photoemission Spectromicroscopy Study

Patterned self-assembled monolayers (SAMs) of alkanethiolates (AT) on Au and Ag substrates were imaged and characterized by scanning photoelectron microscopy (SPEM). The patterns were prepared in situ by direct writing with the zone-plate-focused X-ray beam provided by the SPEM station. Whereas both AT/Au and AT/Ag behaved alike upon the irradiation, which resulted in similar contrasts in the fabricated patterns and similar microspot spectra from the irradiated areas, the intensity relationship between the patterned and nonpatterned areas changed by different pathways for the Au and Ag substrates after the exposure of the patterns to ambient. The SPEM data imply that weakly bound molecular fragments are desorbed from the irradiated areas upon air exposure in the case of Ag, whereas adsorption of airborne molecules from ambient occurs for the Au substrate. The origin of the observed differences is presumably related to the specific branching patterns of irradiation-induced modification of AT/Au and AT/Ag.

Modification and Stability of Aromatic Self-Assembled Monolayers upon Irradiation with Energetic Particles

We have studied ion and electron irradiation of self-assembled monolayers (SAMs) of 2-(4'-methyl-biphenyl-4yl)-ethanethiol (BP2, CH3-C6H4C6H4CH2CH2-SH), phenyl mercaptan (PEM, C6H5CH2CH2-SH), and 4'-methyl-biphenyl-4-thiol (BP0, CH3-C6H4C6H4-SH) deposited on Au(111) substrates. Desorption of neutral particles from PEM/Au and BP2/Au was investigated using laser ionization in combination with mass spectrometry. The ion-induced damage of both BP2 and PEM SAMs is very efficient and interaction with a single ion leads to the modification of tens of molecules. This feature is the result of a desorption process caused by a chemical reaction initiated by an ion impact. Both for ions and electrons, experiments indicate that the possibility for scission of the Au-S bond strongly depends on the chemical nature of the SAM system. We attribute the possible origin of this effect to the orientation of the Au-S-C angle or adsorption sites of molecules. The analysis of electron-irradiated PEM/Au and BP2/Au, using ion-initiated laser probing, enabled measurements of the cross section for the electron-induced damage of the intact molecule or specific fragment. Analysis of electron-irradiated BP0/Au by using time-of-flight secondary ion mass spectrometry (TOF-SIMS) provides direct evidence for the quasi-polymerization process induced by electron irradiation.

X-ray Absorption Spectromicroscopy Studies for the Development of Lithography with a Monomolecular Resist

Soft X-ray absorption microscopy was applied to image and characterize molecular patterns produced by electron irradiation of aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs) on Au substrates. The measurements were performed at all relevant absorption edges. The fabricated patterns could be clearly imaged with a lateral resolution better than 150 nm, which, for example, allowed us to distinguish a fine structure of 1 microm features. The X-ray absorption microspot spectra derived from different areas of the SAM patterns provided specific chemical information on pristine and irradiated areas and unexpected features in these patterns. The quality of the microspot spectra is comparable with that of the analogous X-ray absorption spectra acquired with standard equipment from homogeneous SAMs. In particular, a chemical transformation of the functional tail groups within the irradiated areas of the patterned aromatic SAMs could be directly monitored.

Iterative reconstruction of in-line electron holograms

In low energy electron point source (LEEPS) microscopy, electrons emerge from a point source, propagate as spherical waves, and arrive at a screen. Some electrons scatter off an object, i.e. a cluster of atoms, placed between the source and the screen; others arrive at the screen without scattering. The interference pattern on the screen, an electron hologram, is used to reconstruct the object by calculating and analyzing a function K(r) in the region occupied by the object. We present an iterative method that uses the original reconstruction K(o)(r) to determine the atomic configuration of the object. No knowledge of the object, except for the vicinity in which the object is located, is used in the iterative scheme. In particular, no knowledge of the atomic structure is used. The method uses K(o)(r) to make a test object that in turn gives another reconstruction K(1)(r); K(1)(r) and K(o)(r) are used to modify the test object and obtain K(2)(r). The iteration is repeated until it converges on a final object that gives a reconstruction K(f)(r) that is very similar to K(o)(r). The final object gives an atomic structure that is close to the atomic structure of the original object. Results for several idealized objects are presented and discussed.

Tomographic reconstruction of multiple in-line electron holograms of realistic objects

In theoretical low energy electron point source microscopy, simulated holograms are made and used to reconstruct atomic clusters. In previous investigations, simple test clusters were used for convenience. In this paper we explore more realistic structures composed of a single type of atom such as diamond, graphite and Buckminsterfullerene--all of which consist of carbon atoms. We also examine clusters with two or more distinct atom types, including TiO(2), CuO, Pt(3)O(4), Ga(3)Pt(5), WC, MgCO(3), and MgO. Reconstructions from a single hologram do not give atomic resolution, and consist instead of 'spurious peaks' that are not located at atomic sites, as well as 'atomic peaks' close to atomic sites. Here we apply methods we developed previously to remove all spurious peaks. We show final reconstructions that consist only of atomic peaks located very close to atomic sites.

Strong temperature dependence of irradiation effects in organic layers

Radiation damage of self-assembled monolayers, which are prototypes of thin organic layers and highly organized biological systems, shows a strong dependence on temperature. Two limiting cases could be identified. Reactions involving transport of single atoms and small fragments proceed nearly independent of temperature. Reactions requiring transport of heavy fragments are, however, efficiently quenched by cooling. We foresee the combined use of temperature and irradiation by electrons or photons for advanced tailoring of self-assembled monolayers on surfaces. In addition, our results have direct implications for cryogenic approaches in advanced electron and x-ray microscopy and spectroscopy of biological macromolecules and cells.

Nanoscale chemical patterns fabricated by using colloidal lithography and self-assembled monolayers

A method for preparing surfaces with well-defined nanoscale chemical patterns is described. The fabrication strategy involves creating nanoscale Au pits surrounded by a TiO2 matrix, or vice versa, using colloidal lithography, followed by selective functionalization of the Au areas by CH3-terminated alkanethiols. Using AFM force spectroscopy with chemically modified tips (OH, CH3), we show that the nanopatterned surfaces display strong chemical contrast, in the form of hydrophobic CH3 nanopatches surrounded by a hydrophilic TiO2 surface, or vice versa. The nanofabrication approach presented here offers several advantages over existing patterning technologies, among which are easiness (no sophisticated instrumentation is required), versatility (patterns with a range of surface functionalities can be prepared), and the possibility to produce patterns over large areas at low cost.

Structural organization of DMPC lipid layers on chemically micropatterned self-assembled monolayers as biomimetic systems

The growth structure of DMPC lipid layers on hydrophobic and hydrophilic alkylsilane-based self-assembled monolayers adsorbed on silicon has been investigated by means of X-ray reflectometry and atomic force microscopy. Hydrophilic modification of hydrophobically terminated ODS-SAMs has been achieved by dose-controlled irradiation with DUV light. While island formation of small DMPC bilayer islands is observed on hydrophobic SAM surfaces, closed layers of DMPC monolayers are formed on hydrophilic SAM surfaces. Furthermore, DMPC adsorption on chemically micropatterned substrates with alternating hydrophobic/hydrophilic surface properties has been studied by imaging ellipsometry and photoemission microscopy. Indication for at least partial bridging of hydrophobic areas by an adsorbed DMPC monolayer has been found.

Controlled three-dimensional immobilization of biomolecules on chemically patterned surfaces

We used electron-beam lithography to fabricate chemical nanostructures, i.e. amino groups in aromatic self-assembled monolayers (SAMs) on gold surfaces. The amino groups are utilized as reactive species for mild covalent attachment of fluorescently labeled proteins. Since non-radiative energy transfer results in strong quenching of fluorescent dyes in the vicinity of the metal surfaces, different labeling strategies were investigated. Spacers of varying length were introduced between the gold surface and the fluorescently labeled proteins. First, streptavidin was directly coupled to the amino groups of the SAMs via a glutaraldehyde linker and fluorescently labeled biotin (X-Biotin) was added, resulting in a distance of approximately 2 nm between the dyes and the surface. Scanning confocal fluorescence images show that efficient energy transfer from the dye to the surface occurs, which is reflected in poor signal-to-background (S/B) ratios of approximately 1. Coupling of a second streptavidin layer increases the S/B-ratio only slightly to approximately 2. The S/B-ratio of the fluorescence signals could be further increased to approximately 4 by coupling of an additional fluorescently labeled antibody layer. Finally, we introduced tetraethylenepentamine as functional spacer molecule to diminish fluorescence quenching by the surface. We demonstrate that the use of this spacer in combination with multiple antibody layers enables the controlled fabrication of highly fluorescent three-dimensional nanostructures with S/B-ratios of >20. The presented technique might be used advantageously for the controlled three-dimensional immobilization of single protein or DNA molecules and the well-defined assembly of protein complexes.

AFM-Induced Amine Deprotection: Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects

An alpha,alpha-dimethyl-3,5-dimethoxybenzyloxycarbonyl (DDZ)-protected amine monolayer can be selectively deprotected by the application of a voltage bias from a conducting AFM tip to afford localized nanoscale patterns that can be visualized by self-assembly of dendritic molecular objects with terminal carboxylic acid groups and different aspect ratios.

Structure and electrochemistry of 4,4'-dithiodipyridine self-assembled monolayers in comparison with 4-mercaptopyridine self-assembled monolayers on Au(111)

4,4'-Dithiodipyridine (PySSPy) monolayers on Au(111) were investigated by cyclic voltammetry, X-ray photoelectron spectroscopy (XPS) and in situ scanning tunneling microscopy (STM). The studies were performed in solutions of different anions and pHs (0.1 M H2SO4, 0.1 M HClO4, 0.1 and 0.01 M Na2SO4, 0.1 and 0.01 M NaOH). The cyclic current-potential curves in H2SO4 show current peaks at about 0.4 V, which are absent for all other electrolytes at this potential. The XPS data suggest that PySSPy adsorbs via the S endgroup on the gold surface and the S-S bond breaks during adsorption. From the chemical shift of the N(ls) peak, it is concluded that in acidic media the self-assembled monolayer (SAM) is fully protonated, whereas in basic solution it is not. The pKa is estimated to be 5.3. STM studies reveal the existence of highly ordered superstructures for the SAM. In Na2SO4 and H2SO4, a (7 x mean square root of 3) structure is proposed. However, whereas in Na2SO4 solutions the superstructure does not change with potential, in 0.1 M H2SO4 the superstructure is observed only negative of the current peak at +0.4 V. At more positive potentials, the film becomes disordered. The results are compared to those for 4-mercaptopyridine (PyS) SAMs. XPS experiments and current-potential curves indicate that both molecules adsorb in the same manner on Au(111), that is, even in the case of PySSPy the adspecies is PyS. The STM results, however, call for a more subtle interpretation. While in Na2SO4 solutions the observed superstructures are the same for both SAMs, markedly different structures are found for PySSPy and PyS SAMs in 0.1 M H2SO4.

Self-assembled monolayers of 4-mercaptopyridine on Au(111): a potential-induced phase transition in sulfuric acid solutions

In situ scanning tunneling microscopy images of self-assembled monolayers (SAMs) of 4-mercaptopyridine (4-MPy) on Au(111) recorded in neat 0.1 M H2SO4 solutions provided evidence for a potential-induced phase transition over the range 0.40-0.15 V versus saturated calomel electrode. Analysis of the data was consistent with the presence of a (5 x square root(3)) and (10 x square root(3)) superstructure (phase A) at the positive end, that is, 0.40 V, for which the local coverage, theta(loc), is about 0.2 (two 4-MPy molecules per unit cell), which compresses at the negative end, that is, 0.15 V, to yield a much denser superstructure (phase B, theta(loc) ca. 0.5). This behavior is unlike that reported for the 4-MPy-Au(111) SAM prepared by identical means, in 0.1 M HClO4 (or in sulfate solutions of a much higher pH) for which only the (5 x square root(3)) superstructure was observed over the same potential range. The compression associated with the phase A to phase B transition is attributed to the formation of a hydrogen-bonded network of bisulfate coordinated in turn to the 4-MPy layer via the acidic hydrogens of the pyridinium moieties. Such conditions promote better packing of adsorbed 4-MPy species, which are aided by intermolecular pi-pi ring interactions, resulting in higher local coverages.