Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication

Inert-Atmosphere Microfabrication Technology for 2D Materials and Heterostructures

Most 2D materials are unstable under ambient conditions. Assembly of van der Waals heterostructures in the inert atmosphere of the glove box with ex situ lithography partially solves the problem of device fabrication out of unstable materials. In our paper, we demonstrate an approach to the next-generation inert-atmosphere (nitrogen, <20 ppm oxygen content) fabrication setup, including optical contact mask lithography with a 2 μm resolution, metal evaporation, lift-off and placement of the sample to the cryostat for electric measurements in the same inert atmosphere environment. We consider basic construction principles, budget considerations, and showcase the fabrication and subsequent degradation of black-phosphorous-based structures within weeks. The proposed solutions are surprisingly compact and inexpensive, making them feasible for implementation in numerous 2D materials laboratories.

Cost-Effective Laboratory Matrix Projection Micro-Lithography System

This paper presents a home-built projection lithographer designed to transfer the image from a DLP (digital light processing) projector MEMS matrix onto the microscope objective's field of view, where a photoresist-covered substrate is placed. The photoresist is exposed using blue light with a wavelength of 450 nm. To calibrate the device and adjust focal lengths, we utilize a red light that does not affect the photoresist. The substrate is located on a movable platform, allowing the exposure field to be shifted, enabling the exposure of designs with lateral sizes of 1 × 1 cm2 at a resolution of a few micrometers. Our setup showcases a 2 μm resolution for the single frame 200 × 100 μm2, and a 5 μm resolution for 1 × 1 cm2 with field stitching. The exposure speed, approximately 1 mm2/100 s, proves to be sufficient for a variety of laboratory prototyping needs. This system offers a significant advantage due to its utilization of easily accessible and budget-friendly components, thereby enhancing its accessibility for a broader user base. The exposure speed and resolution meet the requirements for laboratory prototyping in the fields of 2D materials, quantum optics, superconducting microelectronics, microfluidics, and biology.

Wearable chemical sensors based on 2D materials for healthcare applications

Chemical sensors worn on the body could make possible the continuous, noninvasive, and accurate monitoring of vital human signals, which is necessary for remote health monitoring and telemedicine. Attractive for creating high-performance, wearable chemical sensors are atomically thin materials with intriguing physical features, abundant chemistry, and high surface-to-volume ratios. These advantages allow for appropriate material-analyte interactions, resulting in a high level of sensitivity even at trace analyte concentrations. Previous review articles covered the material and device elements of 2D material-based wearable devices extensively. In contrast, little research has addressed the existing state, future outlook, and promise of 2D materials for wearable chemical sensors. We provide an overview of recent advances in 2D-material-based wearable chemical sensors to overcome this deficiency. The structure design, manufacturing techniques, and mechanisms of 2D material-based wearable chemical sensors will be evaluated, as well as their applicability in human health monitoring. Importantly, we present a thorough review of the current state of the art and the technological gaps that would enable the future design and nanomanufacturing of 2D materials and wearable chemical sensors. Finally, we explore the challenges and opportunities associated with designing and implementing 2D wearable chemical sensors.

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

The development of modern cutting-edge technology relies heavily on the huge success and advancement of nanotechnology, in which nanomaterials and nanostructures provide the indispensable material cornerstone. Owing to their nanoscale dimensions with possible quantum limit, nanomaterials and nanostructures possess a high surface-to-volume ratio, rich surface/interface effects, and distinct physical and chemical properties compared with their bulk counterparts, leading to the remarkably expanded horizons of their applications. Depending on their degree of spatial quantization, low-dimensional nanomaterials are generally categorized into nanoparticles (0D); nanorods, nanowires, and nanobelts (1D); and atomically thin layered materials (2D). This review article provides a comprehensive guide to low-dimensional nanomaterials and nanostructures. It begins with the classification of nanomaterials, followed by an inclusive account of nanofabrication and characterization. Both top-down and bottom-up fabrication approaches are discussed in detail. Next, various significant applications of low-dimensional nanomaterials are discussed, such as photonics, sensors, catalysis, energy storage, diverse coatings, and various bioapplications. This article would serve as a quick and facile guide for scientists and engineers working in the field of nanotechnology and nanomaterials.

Photodynamics of Bright Subnanosecond Emission from Pure Single-Photon Sources in Hexagonal Boron Nitride

Bright and stable emitters of single indistinguishable photons are crucial for quantum technologies. The origin of the promising bright emitters recently observed in hexagonal boron nitride (hBN) still remains unclear. This study reports pure single-photon sources in multi-layered hBN at room temperature that demonstrate high emission rates. The quantum emitters are introduced with argon beam treatment and air annealing of mechanically exfoliated hBN flakes with thicknesses of 5-100 nm. Spectral and time-resolved measurements reveal the emitters have more than 1 GHz of excited-to-ground state transition rate. The observed photoswitching between dark and bright states indicates the strong sensitivity of the emitter to the electrostatic environment and the importance of the indirect excitation for the photodynamics.

3D Hypersound Microscopy of van der Waals Heterostructures

The mechanical properties of the layered crystals in the few layer limit are largely unexplored. We employ a picosecond ultrasonic technique to access the corresponding mechanical parameters. Temporal variation of the reflection coefficient of the Al film that covers hBN/WSe₂/hBN (where hBN is hexagonal boron nitride) heterostructures on a sapphire substrate after the femtosecond laser pulse excitation is carefully measured using an interferometric technique with spatial resolution. The laser pulse generates a broadband sound wave packet propagating perpendicularly to the Al plane and partially reflecting from the heterostructural interfaces. The demonstrated technique allows one to resolve a WSe₂ monolayer embedded in hBN. We apply a multilayered model of the optoacoustical response to evaluate the mechanical parameters, in particular, the rigidity of the interfaces. Mapping of the Fourier spectra of the response visualizes different composition regions and may serve as an acoustic tomography tool. Almost zero phonon dissipation below 150 GHz demonstrates the van der Waals heterostructures' potential for nanoacoustical applications.

Setup for photolithography on microscopic flakes of 2D materials by combining simple-geometry mask projection with writing

An optical arrangement and procedure for photolithography on microscopic flakes of two-dimensional materials with an arbitrary shape/size is described. The technique combines projection of demagnified images of simple geometry macroscopic masks with writing. Only a few masks, such as vertical/horizontal slit and square hole, are sufficient to generate most of the required patterns. The setup allows for initially locating the photoresist coated flake on a substrate by imaging it. Thereafter, the automated precise sample stage motion followed by projection of the demagnified mask image is repeated several times to expose the photoresist in the shape of the required pattern. Appropriate light wavelength regimes for imaging and for exposure are chosen through automated optical filter switching. Programming steps for the process are described. The setup allows for direct lithography in one round on microscopic samples without requiring sample shape/size specific masks or predefined position markers. Making of electrode lines of width down to 3 μm, at desired locations on tiny flakes of MoS₂, is demonstrated.