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Kirscher Q, Hajjar-Garreau S, Grasset F, Berling D, Soppera O. Deep-UV laser direct writing of photoluminescent ZnO submicron patterns: an example of nanoarchitectonics concept. Sci Technol Adv Mater 2022; 23:535-546. [PMID: 36238440 PMCID: PMC9553187 DOI: 10.1080/14686996.2022.2116294] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/11/2022] [Revised: 08/11/2022] [Accepted: 08/13/2022] [Indexed: 06/16/2023]
Abstract
Micro- and nanopatterning of metal oxide materials is an important process to develop electronic or optoelectronic devices. ZnO is a material of choice for its semiconducting and photoluminescence properties. In the frame of the nanoarchitectonics concept, we have developed and investigated a new process that relies on direct writing laser patterning in the Deep-UV (DUV) range to prepare photoluminescent microstructures of ZnO at room temperature, under air. This process is based on a synthesis of colloidal ZnO nanocrystals (NCs) with a careful choice of the ligands on the surface to obtain an optimal (i) stability of the colloids, (ii) redissolution of the non-insolated parts and (iii) cross-linking of the DUV-insolated parts. The mechanisms of photocrosslinking are studied by different spectroscopic methods. This room temperature process preserves the photoluminescence properties of the NCs and the wavelength used in DUV allows to reach a sub-micrometer resolution, which opens new perspectives for the integration of microstructures on flexible substrates for optoelectronic applications.
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Affiliation(s)
- Quentin Kirscher
- Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France
- Université de Strasbourg, Strasbourg, France
| | - Samar Hajjar-Garreau
- Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France
- Université de Strasbourg, Strasbourg, France
| | - Fabien Grasset
- CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), National Institute for Materials Science (NIMS), Tsukuba, Japan
- Université Rennes, CNRS, ISCR, UMR6226, Rennes, France
| | - Dominique Berling
- Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France
- Université de Strasbourg, Strasbourg, France
| | - Olivier Soppera
- Institut de Science des Matériaux de Mulhouse (IS2M) UMR 7361 CNRS-UHA, Université de Haute Alsace, Mulhouse, France
- Université de Strasbourg, Strasbourg, France
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Proust V, Kirscher Q, Nguyen TKN, Obringer L, Ishii K, Rault L, Demange V, Berthebaud D, Ohashi N, Uchikoshi T, Berling D, Soppera O, Grasset F. Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning. Nanomaterials (Basel) 2022; 12:nano12142334. [PMID: 35889559 PMCID: PMC9320788 DOI: 10.3390/nano12142334] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/25/2022] [Revised: 06/21/2022] [Accepted: 06/29/2022] [Indexed: 11/16/2022]
Abstract
In the frame of the nanoarchitectonic concept, the objective of this study was to develop simple and easy methods to ensure the preparation of polymorphic HfO2 thin film materials (<200 nm) having the best balance of patterning potential, reproducibility and stability to be used in optical, sensing or electronic fields. The nanostructured HfO2 thin films with micropatterns or continuous morphologies were synthesized by two different methods, i.e., the micropatterning of sol-gel solutions by deep ultraviolet (DUV) photolithography or the electrophoretic deposition (EPD) of HfO2 nanoparticles (HfO2-NPs). Amorphous and monoclinic HfO2 micropatterned nanostructured thin films (HfO2-DUV) were prepared by using a sol-gel solution precursor (HfO2-SG) and spin-coating process following by DUV photolithography, whereas continuous and dense monoclinic HfO2 nanostructured thin films (HfO2-EPD) were prepared by the direct EPD of HfO2-NPs. The HfO2-NPs were prepared by a hydrothermal route and studied through the changing aging temperature, pH and reaction time parameters to produce nanocrystalline particles. Subsequently, based on the colloidal stability study, suspensions of the monoclinic HfO2-NPs with morphologies near spherical, spindle- and rice-like shapes were used to prepare HfO2-EPD thin films on conductive indium-tin oxide-coated glass substrates. Morphology, composition and crystallinity of the HfO2-NPs and thin films were investigated by powder and grazing incidence X-ray diffraction, scanning electron microscopy, transmission electron microscopy and UV-visible spectrophotometry. The EPD and DUV photolithography performances were explored and, in this study, it was clearly demonstrated that these two complementary methods are suitable, simple and effective processes to prepare controllable and tunable HfO2 nanostructures as with homogeneous, dense or micropatterned structures.
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Affiliation(s)
- Vanessa Proust
- CEA, DES, ISEC, DMRC, Université de Montpellier, F-30200 Marcoule, France
- Research Center for Functional Materials, National Institute for Materials Science (NIMS), Tsukuba 305-0044, Japan; (K.I.); (N.O.); (T.U.)
- CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), NIMS, Tsukuba 305-0044, Japan; (T.K.N.N.); (D.B.)
- Correspondence: (V.P.); (O.S.); (F.G.)
| | - Quentin Kirscher
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; (Q.K.); (L.O.); (D.B.)
- Université de Strasbourg, F-67081 Strasbourg, France
| | - Thi Kim Ngan Nguyen
- CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), NIMS, Tsukuba 305-0044, Japan; (T.K.N.N.); (D.B.)
- International Center for Young Scientists, ICYS-Sengen, Global Networking Division, NIMS, Tsukuba 305-0047, Japan
| | - Lisa Obringer
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; (Q.K.); (L.O.); (D.B.)
- Université de Strasbourg, F-67081 Strasbourg, France
| | - Kento Ishii
- Research Center for Functional Materials, National Institute for Materials Science (NIMS), Tsukuba 305-0044, Japan; (K.I.); (N.O.); (T.U.)
| | - Ludivine Rault
- Univ Rennes, CNRS, ISCR UMR 6226, ScanMAT UAR 2025, F-35000 Rennes, France; (L.R.); (V.D.)
| | - Valérie Demange
- Univ Rennes, CNRS, ISCR UMR 6226, ScanMAT UAR 2025, F-35000 Rennes, France; (L.R.); (V.D.)
| | - David Berthebaud
- CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), NIMS, Tsukuba 305-0044, Japan; (T.K.N.N.); (D.B.)
| | - Naoki Ohashi
- Research Center for Functional Materials, National Institute for Materials Science (NIMS), Tsukuba 305-0044, Japan; (K.I.); (N.O.); (T.U.)
- CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), NIMS, Tsukuba 305-0044, Japan; (T.K.N.N.); (D.B.)
| | - Tetsuo Uchikoshi
- Research Center for Functional Materials, National Institute for Materials Science (NIMS), Tsukuba 305-0044, Japan; (K.I.); (N.O.); (T.U.)
- CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), NIMS, Tsukuba 305-0044, Japan; (T.K.N.N.); (D.B.)
| | - Dominique Berling
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; (Q.K.); (L.O.); (D.B.)
- Université de Strasbourg, F-67081 Strasbourg, France
| | - Olivier Soppera
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France; (Q.K.); (L.O.); (D.B.)
- Université de Strasbourg, F-67081 Strasbourg, France
- Correspondence: (V.P.); (O.S.); (F.G.)
| | - Fabien Grasset
- CNRS-Saint Gobain-NIMS, IRL 3629, Laboratory for Innovative Key Materials and Structures (LINK), NIMS, Tsukuba 305-0044, Japan; (T.K.N.N.); (D.B.)
- Univ Rennes, CNRS, ISCR UMR 6226, ScanMAT UAR 2025, F-35000 Rennes, France; (L.R.); (V.D.)
- Correspondence: (V.P.); (O.S.); (F.G.)
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Bidaud C, Berling D, Jamon D, Gamet E, Neveu S, Royer F, Soppera O. Photocrosslinking and photopatterning of magneto-optical nanocomposite sol-gel thin film under deep-UV irradiation. Sci Rep 2021; 11:5075. [PMID: 33658579 PMCID: PMC7930195 DOI: 10.1038/s41598-021-84376-6] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/09/2020] [Accepted: 01/12/2021] [Indexed: 11/09/2022] Open
Abstract
This paper is aimed at investigating the process of photocrosslinking under Deep-UV irradiation of nanocomposite thin films doped with cobalt ferrite magnetic nanoparticles (MNPs). This material is composed of a hybrid sol-gel matrix in which MNP can be introduced with high concentrations up to 20 vol%. Deep-UV (193 nm) is not only interesting for high-resolution patterning but we also show an efficient photopolymerization pathway even in the presence of high concentration of MNPs. In this study, we demonstrate that the photocrosslinking is based on the free radical polymerization of the methacrylate functions of the hybrid precursor. This process is initiated by Titanium-oxo clusters. The impact of the nanoparticles on the photopolymerization kinetic and photopatterning is investigated. We finally show that the photosensitive nanocomposite is suitable to obtain micropatterns with sub-micron resolution, with a simple and versatile process, which opens many opportunities for fabrication of miniaturized magneto-optical devices for photonic applications.
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Affiliation(s)
- C Bidaud
- CNRS, IS2M UMR 7361, Université de Haute-Alsace, 68100, Mulhouse, France.,Université de Strasbourg, Strasbourg, France
| | - D Berling
- CNRS, IS2M UMR 7361, Université de Haute-Alsace, 68100, Mulhouse, France. .,Université de Strasbourg, Strasbourg, France.
| | - D Jamon
- Université de Lyon, CNRS, UMR 5516, Institut d'Optique Graduate School, Laboratoire Hubert Curien, Université Jean Monnet, 42023, Saint-Etienne, France
| | - E Gamet
- Université de Lyon, CNRS, UMR 5516, Institut d'Optique Graduate School, Laboratoire Hubert Curien, Université Jean Monnet, 42023, Saint-Etienne, France
| | - S Neveu
- CNRS, Laboratoire de Physicochimie des Electrolytes et Nanosystèmes Interfaciaux, PHENIX, Sorbonne Université, 75005, Paris, France
| | - F Royer
- Université de Lyon, CNRS, UMR 5516, Institut d'Optique Graduate School, Laboratoire Hubert Curien, Université Jean Monnet, 42023, Saint-Etienne, France
| | - O Soppera
- CNRS, IS2M UMR 7361, Université de Haute-Alsace, 68100, Mulhouse, France. .,Université de Strasbourg, Strasbourg, France.
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Bidaud C, Gamet E, Jamon D, Vidal L, Neveu S, Soppera O, Royer F, Berling D. Deep‐UV Lithography of Nanocomposite Thin Films into Magnetooptical Gratings with Submicron Periodicity. CHEMPHOTOCHEM 2020. [DOI: 10.1002/cptc.202000048] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/08/2022]
Affiliation(s)
- Clémentine Bidaud
- Université de Haute-Alsace CNRS, IS2M UMR 7361 68100 Mulhouse France
- Université de Strasbourg 4 rue Blaise Pascal CS 90032 67081 Strasbourg cedex France
| | - Emilie Gamet
- Université de Lyon CNRS UMR 5516 Institut d'Optique Graduate School Laboratoire Hubert Curien Université Jean-Monnet 18 rue Pr. Lauras 42000 Saint-Etienne France
| | - Damien Jamon
- Université de Lyon CNRS UMR 5516 Institut d'Optique Graduate School Laboratoire Hubert Curien Université Jean-Monnet 18 rue Pr. Lauras 42000 Saint-Etienne France
| | - Loïc Vidal
- Université de Haute-Alsace CNRS, IS2M UMR 7361 68100 Mulhouse France
- Université de Strasbourg 4 rue Blaise Pascal CS 90032 67081 Strasbourg cedex France
| | - Sophie Neveu
- Sorbonne Université CNRS Laboratoire de Physicochimie des Electrolytes et Nanosystèmes Interfaciaux PHENIX 75005 Paris France
| | - Olivier Soppera
- Université de Haute-Alsace CNRS, IS2M UMR 7361 68100 Mulhouse France
- Université de Strasbourg 4 rue Blaise Pascal CS 90032 67081 Strasbourg cedex France
| | - François Royer
- Université de Lyon CNRS UMR 5516 Institut d'Optique Graduate School Laboratoire Hubert Curien Université Jean-Monnet 18 rue Pr. Lauras 42000 Saint-Etienne France
| | - Dominique Berling
- Université de Haute-Alsace CNRS, IS2M UMR 7361 68100 Mulhouse France
- Université de Strasbourg 4 rue Blaise Pascal CS 90032 67081 Strasbourg cedex France
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Chang PY, Lin CF, El Khoury Rouphael S, Huang TH, Wu CM, Berling D, Yeh PH, Lu CJ, Meng HF, Zan HW, Soppera O. Near-Infrared Laser-Annealed IZO Flexible Device as a Sensitive H 2S Sensor at Room Temperature. ACS Appl Mater Interfaces 2020; 12:24984-24991. [PMID: 32367710 DOI: 10.1021/acsami.0c03257] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
A metal-oxide material (indium zinc oxide [IZO]) device with near-infrared (NIR) laser annealing was demonstrated on both glass and bendable plastic substrates (polycarbonate, polyethylene, and polyethylene terephthalate). After only 60 s, the sheet resistance of IZO films annealed with a laser was comparable to that of thermal-annealed devices at temperatures in the range of 200-300 °C (1 h). XPS, ATR, and AFM were used to investigate the changes in the sheet resistance and correlate them to the composition and morphology of the thin film. Finally, the NIR-laser-annealed IZO films were demonstrated to be capable of detecting changes in humidity and serving as a highly sensitive gas sensor of hydrogen sulfide (in ppb concentration), with room-temperature operation on a bendable substrate.
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Affiliation(s)
- Po-Yi Chang
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
- Université de Strasbourg, 67081 Strasbourg, France
| | - Ching-Fu Lin
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
- Université de Strasbourg, 67081 Strasbourg, France
| | - Samer El Khoury Rouphael
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
- Université de Strasbourg, 67081 Strasbourg, France
| | - Ting-Hsuan Huang
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan
| | - Chang-Mao Wu
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan
| | - Dominique Berling
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
- Université de Strasbourg, 67081 Strasbourg, France
| | - Ping-Hung Yeh
- Department of Physics, Tamkang University, No. 151, Yingzhuan Road, Tamsui District, New Taipei City 25137, Taiwan
| | - Chia-Jung Lu
- Department of Chemistry, National Taiwan Normal University, 162, Section 1, Heping E. Road, Taipei 106, Taiwan
| | - Hsin-Fei Meng
- Institute of Physics, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010 Taiwan
| | - Hsiao-Wen Zan
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan
| | - Olivier Soppera
- Université de Haute-Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
- Université de Strasbourg, 67081 Strasbourg, France
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Boukhchina S, Akrout H, Berling D, Bousselmi L. Highly efficient modified lead oxide electrode using a spin coating/electrodeposition mode on titanium for electrochemical treatment of pharmaceutical pollutant. Chemosphere 2019; 221:356-365. [PMID: 30641377 DOI: 10.1016/j.chemosphere.2019.01.057] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/18/2018] [Revised: 01/07/2019] [Accepted: 01/08/2019] [Indexed: 06/09/2023]
Abstract
In this study, Ti/TiO2/PbO2 anodes consisting of a PbO2 coating growth on the TiO2 interlayer deposited on titanium substrates were prepared combining different deposition technics: electrochemical method using anodization (Anod), electrodeposition (EL), and sol gel spin coating (SG). Different kinds of anodes have been tested for the removal of ampicillin, a pharmaceutical pollutant, from water. The structure and the surface morphology of the prepared multiple coatings were characterized by scanning electron microscopy and Energy-Dispersive X-ray spectroscopy respectively. Electrochemical impedance spectroscopy was also investigated in order to study the electrocatalytic activity of the anodes. The performance of the electrodes was evaluated through high performance liquid chromatography and chemical oxygen demand (COD) measurements. It was noticed that ampicillin could be mineralized by anodic oxidation process using Ti/TiO2/PbO2 anodes. The best results were obtained for Ti/TiO2SG/PbO2EL as anode with a 64% of COD removal after 300 min of treatment and a fast decrease in the amount of ampicillin was reached after almost one hour. Experimental results demonstrate that Ti/TiO2SG/PbO2EL anode presents the best ability for the degradation of ampicillin through anodic oxidation compared to the Ti/TiO2SG/PbO2SG and Ti/TiO2Anod/PbO2EL electrodes.
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Affiliation(s)
- Sahar Boukhchina
- Laboratory of Wastewaters and Environment, Center of Water Researches and Technologies (CERTE) Technopark of Borj Cédria, PB 273, Soliman 8020, Tunisia; National Institute of Applied Sciences and Technology (INSAT), Tunisia.
| | - Hanene Akrout
- Laboratory of Wastewaters and Environment, Center of Water Researches and Technologies (CERTE) Technopark of Borj Cédria, PB 273, Soliman 8020, Tunisia.
| | - Dominique Berling
- Université de Haute Alsace, Institute of Materials Science of Mulhouse (IS2M) UMR 7361, F-68100 Mulhouse, France; Université de Strasbourg, France.
| | - Latifa Bousselmi
- Laboratory of Wastewaters and Environment, Center of Water Researches and Technologies (CERTE) Technopark of Borj Cédria, PB 273, Soliman 8020, Tunisia.
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Lin HC, Stehlin F, Soppera O, Zan HW, Li CH, Wieder F, Ponche A, Berling D, Yeh BH, Wang KH. Deep ultraviolet laser direct write for patterning sol-gel InGaZnO semiconducting micro/nanowires and improving field-effect mobility. Sci Rep 2015; 5:10490. [PMID: 26014902 PMCID: PMC4444848 DOI: 10.1038/srep10490] [Citation(s) in RCA: 16] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/16/2015] [Accepted: 04/15/2015] [Indexed: 01/30/2023] Open
Abstract
Deep-UV (DUV) laser was used to directly write indium-gallium-zinc-oxide (IGZO) precursor solution and form micro and nanoscale patterns. The directional DUV laser beam avoids the substrate heating and suppresses the diffraction effect. A IGZO precursor solution was also developed to fulfill the requirements for direct photopatterning and for achieving semi-conducting properties with thermal annealing at moderate temperature. The DUV-induced crosslinking of the starting material allows direct write of semi-conducting channels in thin-film transistors but also it improves the field-effect mobility and surface roughness. Material analysis has been carried out by XPS, FTIR, spectroscopic ellipsometry and AFM and the effect of DUV on the final material structure is discussed. The DUV irradiation step results in photolysis and a partial condensation of the inorganic network that freezes the sol-gel layer in a homogeneous distribution, lowering possibilities of thermally induced reorganization at the atomic scale. Laser irradiation allows high-resolution photopatterning and high-enough field-effect mobility, which enables the easy fabrication of oxide nanowires for applications in solar cell, display, flexible electronics, and biomedical sensors.
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Affiliation(s)
- Hung-Cheng Lin
- Department of Photonics and Institute of Electro-Optics, National Chiao Tung University, 1001 Ta Hsueh Rd., 300 HsinChu, Taiwan
| | - Fabrice Stehlin
- Institut de Science des Matériaux de Mulhouse (IS2M), CNRS - UMR 7361, Université de Haute Alsace, 15 rue Jean Starcky, Mulhouse, France
| | - Olivier Soppera
- Institut de Science des Matériaux de Mulhouse (IS2M), CNRS - UMR 7361, Université de Haute Alsace, 15 rue Jean Starcky, Mulhouse, France
| | - Hsiao-Wen Zan
- Department of Photonics and Institute of Electro-Optics, National Chiao Tung University, 1001 Ta Hsueh Rd., 300 HsinChu, Taiwan
| | - Chang-Hung Li
- Department of Photonics and Institute of Electro-Optics, National Chiao Tung University, 1001 Ta Hsueh Rd., 300 HsinChu, Taiwan
| | - Fernand Wieder
- Institut de Science des Matériaux de Mulhouse (IS2M), CNRS - UMR 7361, Université de Haute Alsace, 15 rue Jean Starcky, Mulhouse, France
| | - Arnaud Ponche
- Institut de Science des Matériaux de Mulhouse (IS2M), CNRS - UMR 7361, Université de Haute Alsace, 15 rue Jean Starcky, Mulhouse, France
| | - Dominique Berling
- Institut de Science des Matériaux de Mulhouse (IS2M), CNRS - UMR 7361, Université de Haute Alsace, 15 rue Jean Starcky, Mulhouse, France
| | - Bo-Hung Yeh
- Department of Photonics and Institute of Electro-Optics, National Chiao Tung University, 1001 Ta Hsueh Rd., 300 HsinChu, Taiwan
| | - Kuan-Hsun Wang
- Department of Photonics and Institute of Electro-Optics, National Chiao Tung University, 1001 Ta Hsueh Rd., 300 HsinChu, Taiwan
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Maafa I, Hajjar-Garreau S, Jaafar R, Berling D, Pirri C, Mehdaoui A, Denys E, Florentin A, Garreau G. Room-temperature ferromagnetism of all-epitaxial β-Fe-Ge/diamond-Ge/β-Fe-Ge trilayers. J Phys Condens Matter 2013; 25:256007. [PMID: 23740804 DOI: 10.1088/0953-8984/25/25/256007] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/02/2023]
Abstract
We report on the first all-epitaxial ferromagnet/inorganic semiconductor/ferromagnet hybrid heterostructure that exhibits (i) a Ge barrier of diamond crystal structure, (ii) room-temperature ferromagnetic electrodes and (iii) very smooth interfaces. Both bottom- and top-Fe-Ge electrodes exhibit tiny in-plane magnetic anisotropies dominated by a magnetocrystalline contribution of six-fold symmetry originating from the hexagonal symmetry of the B82 (Ni2In) β-Fe-Ge phase. A key result is the absence of any magnetic coupling between these soft-magnetic electrodes for Ge barrier thickness as low as ~2.5 nm, which allows us to easily tune the parallel and antiparallel magnetic alignments by applying suitably small magnetic fields. This confirms the beneficial use of H-surfactant in order to drastically reduce the roughness of the Ge barrier, as revealed by our scanning tunneling microscopy and transmission electron microscopy measurements. This new all-epitaxial ferromagnet/semiconductor hybrid system appears, therefore, to be a promising candidate for the realization of magnetic tunnel junctions with a single crystal semiconductor barrier that are fully compatible with Si-based technology.
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Affiliation(s)
- I Maafa
- Institut de Science des Matériaux de Mulhouse, CNRS-UMR 7361, Université de Haute-Alsace, Mulhouse, France
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Belmeguenai M, Tuzcuoglu H, Berling D, Chérif S, Roussigné Y, Devolder T, Westerholt K. Ferromagnetic resonance, transverse bias initial inverse susceptibility and torque studies of magnetic properties of Co 2MnSi thin films. EPJ Web of Conferences 2013. [DOI: 10.1051/epjconf/20134018001] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022] Open
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