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1
Suzuki J, Furukawa T, Miyata H, Shiratani M, Naruoka T, Maruyama K, Nakagawa H, Nagai T. Novel EUV Photoresist for Sub-7 nm Node. J PHOTOPOLYM SCI TEC 2017. [DOI: 10.2494/photopolymer.30.671] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
2
Nagai T, Nakagawa H, Naruoka T, Dei S, Tagawa S, Oshima A, Nagahara S, Shiraishi G, Yoshihara K, Terashita Y, Minekawa Y, Buitrago E, Ekinci Y, Yildirim O, Meeuwissen M, Hoefnagels R, Rispens G, Verspaget C, Maas R. Novel High Sensitivity EUV Photoresist for Sub-7 nm Node. J PHOTOPOLYM SCI TEC 2016. [DOI: 10.2494/photopolymer.29.475] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
3
Kimoto T, Naruoka T, Nakagawa H, Fujisawa T, Shiratani M, Nagai T, Ayothi R, Hishiro Y, Hori M, Hoshiko K, Kimura T. Novel EUV Resist Development for Sub-14nm Half Pitch. J PHOTOPOLYM SCI TEC 2015. [DOI: 10.2494/photopolymer.28.519] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
4
Hayashi N, Matsushima M, Kido M, Naruoka T, Furuta A, Furuta N, Takahashi H, Egawa S. BMI is associated with larger index tumors and worse outcome after radical prostatectomy. Prostate Cancer Prostatic Dis 2014;17:233-7. [PMID: 24841331 DOI: 10.1038/pcan.2014.15] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/02/2013] [Revised: 02/20/2014] [Accepted: 02/21/2014] [Indexed: 11/09/2022]
5
Nakagawa H, Naruoka T, Nagai T. Recent EUV Resists toward High Volume Manufacturing. J PHOTOPOLYM SCI TEC 2014. [DOI: 10.2494/photopolymer.27.739] [Citation(s) in RCA: 21] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
6
Sakai K, Shiratani M, Fujisawa T, Inukai K, Sakai K, Maruyama K, Hoshiko K, Ayothi R, Santos A, Naruoka T, Nagai T. Novel EUV Resists Materials for 16nm HP and beyond. J PHOTOPOLYM SCI TEC 2014. [DOI: 10.2494/photopolymer.27.639] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
7
Komatsu H, Hori M, Minegishi S, Naruoka T, Nagai T. Development of Directed Self-Assembly Materials for Sub 10 nm Patterning. J PHOTOPOLYM SCI TEC 2014. [DOI: 10.2494/photopolymer.27.425] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
8
Minegishi S, Naruoka T, Nagai T. Directed Self Assembly Materials for Semiconductor Lithography. J PHOTOPOLYM SCI TEC 2013. [DOI: 10.2494/photopolymer.26.793] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
9
Minegishi S, Namie Y, Izumi K, Anno Y, Buch X, Naruoka T, Hishiro Y, Nagai T. Directed Self Assembly Material Development for Fine Patterning and Pattern Repair. J PHOTOPOLYM SCI TEC 2013. [DOI: 10.2494/photopolymer.26.27] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
10
Sakamoto K, Naruoka T, Kira M. Regulation of Main-Chain Conformation of Permethyldecasilane by Complexation with γ-Cyclodextrin. CHEM LETT 2003. [DOI: 10.1246/cl.2003.380] [Citation(s) in RCA: 20] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
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