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Perinot A, Scuratti F, Scaccabarozzi AD, Tran K, Salazar-Rios JM, Loi MA, Salvatore G, Fabiano S, Caironi M. Solution-Processed Polymer Dielectric Interlayer for Low-Voltage, Unipolar n-Type Organic Field-Effect Transistors. ACS Appl Mater Interfaces 2023; 15:56095-56105. [PMID: 37990398 DOI: 10.1021/acsami.3c11285] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/23/2023]
Abstract
The integration of organic electronic circuits into real-life applications compels the fulfillment of a range of requirements, among which the ideal operation at a low voltage with reduced power consumption is paramount. Moreover, these performance factors should be achieved via solution-based fabrication schemes in order to comply with the promise of cost- and energy-efficient manufacturing offered by an organic, printed electronic technology. Here, we propose a solution-based route for the fabrication of low-voltage organic transistors, encompassing ideal device operation at voltages below 5 V and exhibiting n-type unipolarization. This process is widely applicable to a variety of semiconducting and dielectric materials. We achieved this through the use of a photo-cross-linked, low-k dielectric interlayer, which is used to fabricate multilayer dielectric stacks with areal capacitances of up to 40 nF/cm2 and leakage currents below 1 nA/cm2. Because of the chosen azide-based cross-linker, the dielectric promotes n-type unipolarization of the transistors and demonstrated to be compatible with different classes of semiconductors, from conjugated polymers to carbon nanotubes and low-temperature metal oxides. Our results demonstrate a general applicability of our unipolarizing dielectric, facilitating the implementation of complementary circuitry of emerging technologies with reduced power consumption.
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Affiliation(s)
- Andrea Perinot
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
| | - Francesca Scuratti
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
| | - Alberto D Scaccabarozzi
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
| | - Karolina Tran
- Photophysics and OptoElectronics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
| | - Jorge Mario Salazar-Rios
- Photophysics and OptoElectronics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
| | - Maria Antonietta Loi
- Photophysics and OptoElectronics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
| | - Giovanni Salvatore
- Department of Molecular Sciences and Nanosystems, Ca' Foscari University of Venice, Via Torino, 155─Alfa Building, 30172 Mestre Venice, Italy
| | - Simone Fabiano
- Laboratory of Organic Electronics, Department of Science and Technology, Linköping University, 60 174 Norrköping, Sweden
| | - Mario Caironi
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
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Wang Y, Fu X, Chen Y, Peng H, Qin L, Ning Y, Wang L. Optimal Design and Analysis of 4.7 μm Hybrid Deep Dielectric High Efficiency Transmission Gratings. Micromachines (Basel) 2022; 13:1706. [PMID: 36296059 PMCID: PMC9608812 DOI: 10.3390/mi13101706] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 08/17/2022] [Revised: 09/09/2022] [Accepted: 09/27/2022] [Indexed: 06/16/2023]
Abstract
There is currently no transmission grating with good diffraction efficiency in the 4.7 μm band. Metal gratings at this wavelength are all reflective gratings which has a diffraction efficiency of lower than 90% and lower laser damage threshold. In this paper, we bring up a design of a multi-layer transmission grating with both high diffraction efficiency and wide working wavelength band. We have proved that the transmission grating made of composite materials has an average diffraction effectiveness of more than 96% throughout the whole spectral range of 200 nm. Meanwhile, the theoretically computed transmission grating has a highest first-order diffraction efficiency of more than 99.77% at 4746 nm. This multilayer dielectric film transmission grating's optimized design may further boost spectral beam combining power, providing a practical technique for increasing SBC power and brightness.
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Affiliation(s)
- Ye Wang
- School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun 130022, China
- Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
| | - Xiuhua Fu
- School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun 130022, China
- Zhongshan Institute of Changchun University of Science and Technology, Zhongshan 528437, China
| | - Yongyi Chen
- Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
- Jlight Semiconductor Technology Co., Ltd., No. 1588, Changde Road, ETDZ, Changchun 130102, China
| | - Hangyu Peng
- Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
- Jlight Semiconductor Technology Co., Ltd., No. 1588, Changde Road, ETDZ, Changchun 130102, China
| | - Li Qin
- Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
| | - Yongqiang Ning
- Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
| | - Lijun Wang
- Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
- Peng Cheng Laboratory, No. 2, Xingke 1st Street, Nanshan, Shenzhen 518000, China
- Academician Team Innovation Center of Hainan Province, Key Laboratory of Laser Technology and Optoelectronic Functional Materials of Hainan Province, School of Physics and Electronic Engineering, Hainan Normal University, Haikou 570206, China
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Zhang Q, Barrett B, Lee T, Mukhopadhyaya T, Lu C, Plunkett EC, Kale T, Chi C, Livi KJT, McGuiggan P, Reich DH, Thon S, Bragg AE, Katz HE. Maximized Hole Trapping in a Polystyrene Transistor Dielectric from a Highly Branched Iminobis(aminoarene) Side Chain. ACS Appl Mater Interfaces 2021; 13:34584-34596. [PMID: 34254769 DOI: 10.1021/acsami.1c03929] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
We synthesized highly branched and electron-donating side chain subunits and attached them to polystyrene (PS) used as a dielectric layer in a pentacene field-effect transistor. The influence of these groups on dielectric function, charge retention, and threshold voltage shifts (ΔVth) depending on their positions in dielectric multilayers was determined. We compared the observations made on an N-perphenylated iminobisaniline side chain with those from the same side chains modified with ZnO nanoparticles and with an adduct formed from tetracyanoethylene (TCNE). We also synthesized an analogue in which six methoxy groups are present instead of two amine nitrogens. At 6 mol % side chain, hopping transport was sufficient to cause shorting of the gate, while at 2 mol %, charge trapping was observable as transistor threshold voltage shifts (ΔVth). We created three types of devices: with the substituted PS layer as single-layer dielectric, on top of a cross-linked PS layer but in contact with the pentacene (bilayers), and sandwiched between two PS layers in trilayers. Especially large bias stress effects and ΔVth, larger than those in the case of the hexamethoxy and previously studied dimethoxy analogues, were observed in the second case, and the effects increased with the increasing electron-donating properties of the modified side chains. The highest ΔVth was consistent with a majority of the side chains stabilizing the trapped charge. Trilayer devices showed decreased charge storage capability compared to previous work in which we used less donating side chains but in higher concentrations. The ZnO and TCNE modifications resulted in slightly more and less negative ΔVth, respectively, when the side chain polystyrene was not in contact with the pentacene and isolated from the gate electrode. The results indicate a likely maximum combination of molecular charge stabilizing activity and side chain concentration that still allows gate dielectric function.
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