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Cho HD, Lee J, Kim DY, Chung SY, Lee JK. Enhanced Photoresponse of High Crystalline Bi 2Se 3 Thin-Films Using Patterned Substrates. ACS Appl Mater Interfaces 2023; 15:22274-22281. [PMID: 37115789 DOI: 10.1021/acsami.3c02501] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/11/2023]
Abstract
High-quality Bi2Se3 thin films with topological insulating properties at room temperature have recently attracted much attention as one of the promising materials for realizing innovative electronic and optoelectronic devices. Here, we report the high crystallinity growth of Bi2Se3 thin films on a patterned sapphire substrate (PSS) by using a vapor-phase transport deposition with minimizing thermal dissociation of Se atoms vaporized in Bi2Se3 powder. This PSS not only reduces the large dislocation of heterogeneously grown Bi2Se3 on a sapphire substrate but also induces enhanced light absorption in the visible to near-infrared (IR) ranges compared to Bi2Se3 on planar sapphire substrates. Thus, the Bi2Se3 thin film laterally grown on the PSS reveals uniform surface properties and high crystallinity in the rhombohedral lattice phase with a full width at half maximum of 0.06° for the XRD (003) peak. Also, the photoresponse of the fabricated IR conversion device using Bi2Se3/PSS heterostructure exhibits excellent performance and high reliability with no degradation after continuous switching. As a result, the device constructed with the Bi2Se3/PSS exhibits one order of magnitude higher NIR induced-photocurrent and 1-2 orders of magnitude faster photo-switching than that with Bi2Se3/Al2O3. Such an enhancement in the device performance of Bi2Se3/PSS is confirmed by the increased absorption spectra in visible and NIR ranges and the improved light absorption distribution.
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Affiliation(s)
- Hak Dong Cho
- Quantum Functional Semiconductor Research Center, Dongguk University, Seoul 04620, Korea
| | - Juwon Lee
- Quantum Functional Semiconductor Research Center, Dongguk University, Seoul 04620, Korea
| | - Deuk Young Kim
- Quantum Functional Semiconductor Research Center, Dongguk University, Seoul 04620, Korea
- Division of Physics and Semiconductor Science, Dongguk University, Seoul 04620, Korea
| | - Sung Yun Chung
- Division of Energy and Optical Technology Convergence, Cheongju University, Cheongju-si, Chungcheongbuk-do 28503, Korea
| | - Jong-Kwon Lee
- Division of Energy and Optical Technology Convergence, Cheongju University, Cheongju-si, Chungcheongbuk-do 28503, Korea
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Zhao X, Wang CS, Chou NN, Wang FH, Yang CF. Synthesis of ZnO Nanoflower Arrays on Patterned Cavity Substrate and Their Application in Methylene Blue Degradation. Materials (Basel) 2023; 16:2647. [PMID: 37048941 PMCID: PMC10096390 DOI: 10.3390/ma16072647] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/11/2023] [Revised: 03/24/2023] [Accepted: 03/24/2023] [Indexed: 06/19/2023]
Abstract
A novel method was proposed to fabricate a ZnO seed layer with a protrusion and matrix structure, and then ZnO nanorods could be synthesized on it using the hydrothermal method to form ZnO nanoflower arrays (NFAs) easily. A patterned sapphire with a matrix cavity was used as the template, ZnO gel was deposited on the multilayer substrates using spinning coating, and the prepared seed layer with a protrusion and an array-patterned structure was moved to a Si substrate using the lift-off method. Because the ZnO seed layer exhibited a matrix and protrusion structure, ZnO nanorods were grown vertically downwards and formed ZnO NFAs. The XRD patterns resulting from analyses showed that the diffraction peaks of the five growth directions of ZnO NFAs increased as growth time increased. Furthermore, SEM and FIB analyses indicated that the length, width, aspect ratio, and total surface area of ZnO NFAs grown on the transferred seed layer increased as the synthesis time increased. Different ZnO NFAs synthesized for varying synthesis times were used to investigate methylene blue degradation, with the effect of ZnO NFAs on methylene blue degradation determined using the Beer-Lambert law. Our results demonstrate that the effect of ZnO NFAs on methylene blue degradation was enhanced with increasing synthesis time.
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Affiliation(s)
- Xin Zhao
- School of Information Engineering, Shanghai Zhongqiao Vocational and Technical University, Shanghai 201514, China
| | - Ching-Shan Wang
- Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan
| | - Ni-Ni Chou
- Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan
| | - Fang-Hsing Wang
- Graduate Institute of Optoelectronic Engineering, National Chung Hsing University, Taichung 402, Taiwan
| | - Cheng-Fu Yang
- Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan
- Department of Aeronautical Engineering, Chaoyang University of Technology, Taichung 413, Taiwan
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Xu L, Cao Y, Song T, Xu C. Resonant Lasing Emission in Undoped and Mg-Doped Gallium Nitride Thin Films on Interfacial Periodic Patterned Sapphire Substrates. Nanomaterials (Basel) 2022; 12:3238. [PMID: 36145026 PMCID: PMC9505499 DOI: 10.3390/nano12183238] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 08/20/2022] [Revised: 09/09/2022] [Accepted: 09/15/2022] [Indexed: 06/16/2023]
Abstract
In this work, low-threshold resonant lasing emission was investigated in undoped and Mg-doped GaN thin films on interfacial designed sapphire substrates. The scattering cross-section of the periodic resonant structure was evaluated by using the finite difference time domain (FDTD) method and was found to be beneficial for reducing the threshold and enhancing the resonant lasing emission within the periodic structures. Compared with undoped and Si-doped GaN thin films, p-type Mg-doped GaN thin films demonstrated a better lasing emission performance. The lasing energy level system and defect densities played vital roles in the lasing emission. This work is beneficial to the realization of multifunctional applications in optoelectronic devices.
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Affiliation(s)
- Long Xu
- Chongqing Key Laboratory of Micro & Nano Structure Optoelectronics, School of Physical Science and Technology, Southwest University, Chongqing 400715, China
| | - Yuehan Cao
- Chongqing Key Laboratory of Micro & Nano Structure Optoelectronics, School of Physical Science and Technology, Southwest University, Chongqing 400715, China
| | - Tianwei Song
- Chongqing Key Laboratory of Micro & Nano Structure Optoelectronics, School of Physical Science and Technology, Southwest University, Chongqing 400715, China
| | - Caixia Xu
- School of Primary Education, Chongqing Normal University, Chongqing 400700, China
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He C, Zhao W, Zhang K, He L, Wu H, Liu N, Zhang S, Liu X, Chen Z. High-Quality GaN Epilayers Achieved by Facet-Controlled Epitaxial Lateral Overgrowth on Sputtered AlN/PSS Templates. ACS Appl Mater Interfaces 2017; 9:43386-43392. [PMID: 29164860 DOI: 10.1021/acsami.7b14801] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
It is widely believed that the lack of high-quality GaN wafers severely hinders the progress in GaN-based devices, especially for defect-sensitive devices. Here, low-cost AlN buffer layers were sputtered on cone-shaped patterned sapphire substrates (PSSs) to obtain high-quality GaN epilayers. Without any mask or regrowth, facet-controlled epitaxial lateral overgrowth was realized by metal-organic chemical vapor deposition. The uniform coating of the sputtered AlN buffer layer and the optimized multiple modulation guaranteed high growth selectivity and uniformity of the GaN epilayer. As a result, an extremely smooth surface was achieved with an average roughness of 0.17 nm over 3 × 3 μm2. It was found that the sputtered AlN buffer layer could significantly suppress dislocations on the cones. Moreover, the optimized three-dimensional growth process could effectively promote dislocation bending. Therefore, the threading dislocation density (TDD) of the GaN epilayer was reduced to 4.6 × 107 cm-2, which is about an order of magnitude lower than the case of two-step GaN on the PSS. In addition, contamination and crack in the light-emitting diode fabricated on the obtained GaN were also effectively suppressed by using the sputtered AlN buffer layer. All of these advantages led to a high output power of 116 mW at 500 mA with an emission wavelength of 375 nm. This simple, yet effective growth technique is believed to have great application prospects in high-performance TDD-sensitive optoelectronic and electronic devices.
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Affiliation(s)
- Chenguang He
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
| | - Wei Zhao
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
| | - Kang Zhang
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
| | - Longfei He
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
| | - Hualong Wu
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
| | - Ningyang Liu
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
| | - Shan Zhang
- School of Physics & Electronic Engineering, Guangzhou University , Guangzhou 510006, China
| | - Xiaoyan Liu
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
| | - Zhitao Chen
- Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences , Guangzhou 510650, China
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Wang SW, Medina H, Hong KB, Wu CC, Qu Y, Manikandan A, Su TY, Lee PT, Huang ZQ, Wang Z, Chuang FC, Kuo HC, Chueh YL. Thermally Strained Band Gap Engineering of Transition-Metal Dichalcogenide Bilayers with Enhanced Light-Matter Interaction toward Excellent Photodetectors. ACS Nano 2017; 11:8768-8776. [PMID: 28753274 DOI: 10.1021/acsnano.7b02444] [Citation(s) in RCA: 29] [Impact Index Per Article: 4.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/16/2023]
Abstract
Integration of strain engineering of two-dimensional (2D) materials in order to enhance device performance is still a challenge. Here, we successfully demonstrated the thermally strained band gap engineering of transition-metal dichalcogenide bilayers by different thermal expansion coefficients between 2D materials and patterned sapphire structures, where MoS2 bilayers were chosen as the demonstrated materials. In particular, a blue shift in the band gap of the MoS2 bilayers can be tunable, displaying an extraordinary capability to drive electrons toward the electrode under the smaller driven bias, and the results were confirmed by simulation. A model to explain the thermal strain in the MoS2 bilayers during the synthesis was proposed, which enables us to precisely predict the band gap-shifted behaviors on patterned sapphire structures with different angles. Furthermore, photodetectors with enhancement of 286% and 897% based on the strained MoS2 on cone- and pyramid-patterned sapphire substrates were demonstrated, respectively.
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Affiliation(s)
- Sheng-Wen Wang
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University , Hsinchu 30010, Taiwan
| | - Henry Medina
- Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan
- Institute of Materials Research and Engineering, Agency for Science, Technology, and Research (A*STAR) , Innovis, Singapore 138634
| | - Kuo-Bin Hong
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University , Hsinchu 30010, Taiwan
| | - Chun-Chia Wu
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University , Hsinchu 30010, Taiwan
| | - Yindong Qu
- Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China , Chengdu 611731, P. R. China
| | - Arumugam Manikandan
- Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan
| | - Teng-Yu Su
- Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan
| | - Po-Tsung Lee
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University , Hsinchu 30010, Taiwan
| | - Zhi-Quan Huang
- Department of Physics, National Sun Yat-Sen University , Kaohsiung 80424, Taiwan
| | - Zhiming Wang
- Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China , Chengdu 611731, P. R. China
| | - Feng-Chuan Chuang
- Department of Physics, National Sun Yat-Sen University , Kaohsiung 80424, Taiwan
| | - Hao-Chung Kuo
- Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University , Hsinchu 30010, Taiwan
| | - Yu-Lun Chueh
- Department of Materials Science and Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan
- School of Material Science and Engineering, State Key Laboratory of Advanced Processing and Recycling of Non-Ferrous Metals in Gansu Province, Lanzhou University of Technology , Lanzhou 730050, Gansu, P. R. China
- Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China , Chengdu 611731, P. R. China
- Department of Physics, National Sun Yat-Sen University , Kaohsiung 80424, Taiwan
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Song J, Choi J, Xiong K, Xie Y, Cha JJ, Han J. Semipolar (202̅1̅) GaN and InGaN Light-Emitting Diodes Grown on Sapphire. ACS Appl Mater Interfaces 2017; 9:14088-14092. [PMID: 28361536 DOI: 10.1021/acsami.7b01336] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
We have demonstrated growing uniform and purely nitrogen polar semipolar (202̅1̅) GaN epilayers on 2 in. patterned sapphire substrates. The as-grown surface of (202̅1̅) GaN is composed of two stable facets: (101̅0) and (101̅1̅). A chemical mechanical polishing process was further used to planarize the surface with a final surface root-mean-square roughness of less than 1.5 nm over an area of 10 × 10 μm2. InGaN light-emitting diodes were grown on a polished (202̅1̅) GaN/sapphire template with an electroluminescence emission at around 490 nm. Our work exhibits the potential to produce high-quality nitrogen-polar semipolar GaN templates and optoelectronic devices on large-area sapphire substrates with economical feasibility.
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Affiliation(s)
- Jie Song
- Department of Electrical Engineering, Yale University , New Haven, Connecticut 06520, United States
- Saphlux Inc. , Branford, Connecticut 06405, United States
| | - Joowon Choi
- Department of Electrical Engineering, Yale University , New Haven, Connecticut 06520, United States
| | - Kanglin Xiong
- Department of Electrical Engineering, Yale University , New Haven, Connecticut 06520, United States
| | - Yujun Xie
- Department of Mechanical Engineering & Materials Science, Yale University , New Haven, Connecticut 06520, United States
- Energy Sciences Institute, Yale University , Yale West Campus, West Haven, Connecticut 06516, United States
| | - Judy J Cha
- Department of Mechanical Engineering & Materials Science, Yale University , New Haven, Connecticut 06520, United States
- Energy Sciences Institute, Yale University , Yale West Campus, West Haven, Connecticut 06516, United States
| | - Jung Han
- Department of Electrical Engineering, Yale University , New Haven, Connecticut 06520, United States
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Chen LC, Tsai WF. Properties of GaN-based light-emitting diodes on patterned sapphire substrate coated with silver nanoparticles prepared by mask-free chemical etching. Nanoscale Res Lett 2013; 8:157. [PMID: 23566549 PMCID: PMC3655001 DOI: 10.1186/1556-276x-8-157] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/24/2013] [Accepted: 03/24/2013] [Indexed: 06/02/2023]
Abstract
This study reports on the use of a template that is made of silver nanoparticles (ANPs) that are dispersed on a patterned sapphire substrate (PSS) to improve the light output power of GaN-based light-emitting diodes (LEDs). The dipping of a sapphire substrate in hot H2SO4 solution generates white reaction products that are identified as a mixture of polycrystalline aluminum sulfates. These white reaction products can act as a natural etching mask in the preparation of an ANP-coated PSS (PSS-ANP) template. The optimal annealing temperature and time, surface morphology, and optical characteristics of the PSS-ANP template were investigated. The light output power of an LED that is bonded to the PSS-ANP template is approximately double than that of an LED that is not.
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Affiliation(s)
- Lung-Chien Chen
- Department of Electro-optical Engineering, National Taipei University of Technology, 1, Sec. 3, Chung-Hsiao E. Rd, Taipei 106, Taiwan
| | - Wen-Fang Tsai
- Department of Electro-optical Engineering, National Taipei University of Technology, 1, Sec. 3, Chung-Hsiao E. Rd, Taipei 106, Taiwan
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