Elemental mercury removal by a novel advanced oxidation process of ultraviolet/chlorite-ammonia: Mechanism and kinetics

A novel advanced oxidation process (AOP) of ultraviolet/chlorite-ammonia (UV/NaClO₂-NH₄OH) was developed to remove Hg⁰ from flue gas. The distribution of mercury concentration in three solutions of NaClO₂-NH₄OH, KCl, and H₂SO₄-KMnO₄ was determined by cold atom fluorescence spectrometry (AFS). The role of NH₄OH was to help NaClO₂ preserving and/or stabilizing Hg²⁺ meanwhile inhibiting the photo-production of ClO₂. In the absence of UV, decreasing pH promoted the release of Hg²⁺ from NaClO₂-NH₄OH; introducing NO, SO₂, O₂, Br^-, Cl^-, and HCO₃^- suppressed Hg⁰ oxidation. In the presence of UV, rising temperature accelerated the release of Hg²⁺ from NaClO₂-NH₄OH; while SO₂, Br^- and HCO₃^- facilitated Hg⁰ oxidation. In the absence and presence of UV, Hg⁰ oxidation was controlled by ClO₂^- and by ClO/Cl₂O₂/HO/ClO₂, respectively. The formations of ClO/HO/ClO₂ were confirmed by electron spin resonance (ESR). X-ray photoelectron spectroscopy (XPS) revealed that the products of Hg⁰ and ClO₂^- were HgCl₂, and ClO₂, Cl-, ClO₃-, Cl₂, and ClO₄-, respectively. Analysis of kinetics showed that the Hatta numbers were 23-133 and 69-305 without and with UV, respectively, thus, the gas-film mass transfer was the rate-determining step. This paper gives a new insight in radical behavior in Hg⁰ oxidation.

Roles of reactive chlorine species in trimethoprim degradation in the UV/chlorine process: Kinetics and transformation pathways

The UV/chlorine process, which forms several reactive species including hydroxyl radicals (HO) and reactive chlorine species (RCS) to degrade contaminants, is being considered to be an advanced oxidation process. This study investigated the kinetics and mechanism of the degradation of trimethoprim (TMP) by the UV/chlorine process. The degradation of TMP was much faster by UV/chlorine compared to UV/H₂O₂. The degradation followed pseudo first-order kinetics, and the rate constant (k') increased linearly as the chlorine dosage increased from 20 μM to 200 μM and decreased as pH rose from 6.1 to 8.8. k' was not affected by chloride and bicarbonate but decreased by 50% in the presence of 1-mg/L NOM. The contribution of RCS, including Cl, Cl₂^- and ClO, to the degradation removal rate was much higher than that of HO and increased from 67% to 87% with increasing pH from 6.1 to 8.8 under the experimental condition. The increasing contribution of RCS to the degradation with increasing pH was attributable to the increase in the ClO concentration. Kinetic modeling and radical scavenging tests verified that ClO mainly attacked the trimethoxybenzyl moiety of TMP. RCS reacted with TMP much faster than HOCl/OCl^- to form chlorinated products (i.e., m/z 325) and chlorinated disinfection byproducts such as chloroform, chloral hydrate, dichloroacetonitrile and trichloronitromethane. The hydroxylation and demethylation of m/z 325 driven by HO generated m/z 327 and m/z 341. Meanwhile, reactions of m/z 325 with HO and RCS/HOCl/OCl^- generated dichlorinated and hydroxylated products (i.e., m/z 377). All the chlorinated products could be further depleted to produce products with less degree of halogenation in the UV/chlorine process, compared to dark chlorination. The acute toxicity to Vibrio fischeri by UV/chlorine was lower than chlorination at the same removal rate of TMP. This study demonstrated the importance of RCS, in particular, ClO, in the degradation of micropollutants in the UV/chlorine process.