101
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Pan Y, Jia K, Huang K, Wu Z, Bai G, Yu J, Zhang Z, Zhang Q, Yin H. Near-ideal subthreshold swing MoS 2 back-gate transistors with an optimized ultrathin HfO 2 dielectric layer. NANOTECHNOLOGY 2019; 30:095202. [PMID: 30561381 DOI: 10.1088/1361-6528/aaf956] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
In this paper, a near-ideal subthreshold swing MoS2 back-gate transistor with an optimized ultrathin HfO2 dielectric layer is reported with detailed physical and electrical characteristics analyses. Ultrathin (10 nm) HfO2 films created by atomic-layer deposition (ALD) at a low temperature with rapid-thermal annealing (RTA) at different temperatures from 200 °C to 800 °C have a great effect on the electrical characteristics, such as the subthreshold swing (SS), on-to-off current (I ON/I OFF) ratio, etc, of the MoS2 devices. Physical examinations are performed, including x-ray diffraction, atomic force microscopy, and electrical experiments of metal-oxide-semiconductor capacitance-voltage. The results demonstrate a strong correlation between the HfO2 dielectric RTA temperature and the film characteristics, such as film density, crystallization degree, grain size and surface states, inducing a variation in the electrical parameters, such as the leakage, D it, equivalent oxide thickness, SS, and I ON, as well as I ON/I OFF of the MoS2 field effect transistors with the same channel materials and fabrication methods. With a balance between the crystallization degree and the surface state, the ultrathin (10 nm) HfO2 gate dielectric RTA at 500 °C is demonstrated to have the best performance with a field effect mobility of 40 cm2 V-1 s-1 and the lowest SS of 77.6 mV-1 decade, which are superior to those of the control samples at other temperatures. The excellent transistor results with an optimized industry-based HfO2 ALD and RTA process provide a promising approach for MoS2 applications into the scaling of the nanoscale CMOS process.
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Affiliation(s)
- Yu Pan
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, People's Republic of China
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102
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Jastrzebski C, Olkowska K, Jastrzebski DJ, Wierzbicki M, Gebicki W, Podsiadlo S. Raman scattering studies on very thin layers of gallium sulfide (GaS) as a function of sample thickness and temperature. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2019; 31:075303. [PMID: 30524093 DOI: 10.1088/1361-648x/aaf53b] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Gallium sulfide is a semiconducting material with a layered structure and a characteristic low interlayer interaction. Because of weak van der Waals forces, GaS crystals are relatively easy to exfoliate to very thin layers. In this work nanometric-GaS layers were obtained by a micro-mechanical exfoliation process and were transferred to Si/SiO2 substrate. The thickness of these layers was estimated from AFM measurements. Raman spectra were collected for different layer thicknesses ranging from one layer to bulk crystal. An analytical function fitted to experimental data is proposed to determine layer thickness from Raman measurements. For the first time, the Raman position and the FWHM of the main Raman peaks were measured on very thin GaS layers as a function of temperature in the range from 80 to 470 K. The first order temperature coefficients of the A 1g Raman peaks were determined. Phonon decay due to anharmonic processes at temperatures above 300 K in layers of thickness below 4 nm was observed. Contribution of optical phonon scattering processes to thermal properties of very thin GaS layers is discussed.
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Affiliation(s)
- Cezariusz Jastrzebski
- Faculty of Physics, Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw, Poland
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103
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Shen T, Ren JC, Liu X, Li S, Liu W. van der Waals Stacking Induced Transition from Schottky to Ohmic Contacts: 2D Metals on Multilayer InSe. J Am Chem Soc 2019; 141:3110-3115. [PMID: 30688068 DOI: 10.1021/jacs.8b12212] [Citation(s) in RCA: 59] [Impact Index Per Article: 11.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/10/2023]
Abstract
Incorporation of two-dimensional (2D) materials in electronic devices inevitably involves contact with metals, and the nature of this contact (Ohmic and/or Schottky) can dramatically affect the electronic properties of the assembly. Controlling these properties to reliably form low-resistance Ohmic contact remains a great challenge due to the strong Fermi level pinning (FLP) effect at the interface. Herein, we employ density functional theory calculations to show that van der Waals stacking can significantly modulate Schottky barrier heights in the contact formed between multilayer InSe and 2D metals by suppressing the FLP effect. Importantly, the increase of InSe layer number induces a transition from Schottky to Ohmic contact, which is attributed to the decrease of the conduction band minimum and rise of the valence band maximum of InSe. Based on the computed tunneling and Schottky barriers, Cd3C2 is the most compatible electrode for 2D InSe among the materials studied. This work illustrates a straightforward method for developing more effective InSe-based 2D electronic nanodevices.
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Affiliation(s)
- Tao Shen
- Nano and Heterogeneous Materials Center, School of Materials Science and Engineering , Nanjing University of Science and Technology , Nanjing 210094 , China
| | - Ji-Chang Ren
- Nano and Heterogeneous Materials Center, School of Materials Science and Engineering , Nanjing University of Science and Technology , Nanjing 210094 , China
| | - Xinyi Liu
- Nano and Heterogeneous Materials Center, School of Materials Science and Engineering , Nanjing University of Science and Technology , Nanjing 210094 , China
| | - Shuang Li
- Nano and Heterogeneous Materials Center, School of Materials Science and Engineering , Nanjing University of Science and Technology , Nanjing 210094 , China
| | - Wei Liu
- Nano and Heterogeneous Materials Center, School of Materials Science and Engineering , Nanjing University of Science and Technology , Nanjing 210094 , China
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104
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Pham KD, Hieu NN, Bui LM, Phuc HV, Hoi BD, Tu LT, Bach LG, Ilyasov VV, Amin B, Idrees M, Nguyen CV. Vertical strain and electric field tunable electronic properties of type-II band alignment C2N/InSe van der Waals heterostructure. Chem Phys Lett 2019. [DOI: 10.1016/j.cplett.2018.12.027] [Citation(s) in RCA: 33] [Impact Index Per Article: 6.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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105
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Two Dimensional β-InSe with Layer-Dependent Properties: Band Alignment, Work Function and Optical Properties. NANOMATERIALS 2019; 9:nano9010082. [PMID: 30634415 PMCID: PMC6358860 DOI: 10.3390/nano9010082] [Citation(s) in RCA: 32] [Impact Index Per Article: 6.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/23/2018] [Revised: 12/26/2018] [Accepted: 12/27/2018] [Indexed: 11/17/2022]
Abstract
Density functional theory calculations of the layer (L)-dependent electronic band structure, work function and optical properties of β-InSe have been reported. Owing to the quantum size effects (QSEs) in β-InSe, the band structures exhibit direct-to-indirect transitions from bulk β-InSe to few-layer β-InSe. The work functions decrease monotonically from 5.22 eV (1 L) to 5.0 eV (6 L) and then remain constant at 4.99 eV for 7 L and 8 L and drop down to 4.77 eV (bulk β-InSe). For optical properties, the imaginary part of the dielectric function has a strong dependence on the thickness variation. Layer control in two-dimensional layered materials provides an effective strategy to modulate the layer-dependent properties which have potential applications in the next-generation high performance electronic and optoelectronic devices.
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106
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Zhang Z, Zhang Y, Xie Z, Wei X, Guo T, Fan J, Ni L, Tian Y, Liu J, Duan L. Tunable electronic properties of an Sb/InSe van der Waals heterostructure by electric field effects. Phys Chem Chem Phys 2019; 21:5627-5633. [DOI: 10.1039/c8cp07407k] [Citation(s) in RCA: 45] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
An Sb/InSe heterostructure manifests a varied direct bandgap under an electric field which is more favorable to FETs and MEMS devices.
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Affiliation(s)
- Zhihui Zhang
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
| | - Yan Zhang
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
| | - Zifeng Xie
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
| | - Xing Wei
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
| | - Tingting Guo
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
| | - Jibin Fan
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
| | - Lei Ni
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
| | - Ye Tian
- Institute of Physics
- Chinese Academy of Sciences
- Beijing 100190
- China
| | - Jian Liu
- School of Physics
- Shandong University
- Jinan 250100
- China
| | - Li Duan
- School of Materials Science and Engineering
- Chang’an University
- Xi’an
- China
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107
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Wang F, Gao T, Zhang Q, Hu ZY, Jin B, Li L, Zhou X, Li H, Van Tendeloo G, Zhai T. Liquid-Alloy-Assisted Growth of 2D Ternary Ga 2 In 4 S 9 toward High-Performance UV Photodetection. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2019; 31:e1806306. [PMID: 30411824 DOI: 10.1002/adma.201806306] [Citation(s) in RCA: 49] [Impact Index Per Article: 9.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/29/2018] [Revised: 10/16/2018] [Indexed: 05/23/2023]
Abstract
2D ternary systems provide another degree of freedom of tuning physical properties through stoichiometry variation. However, the controllable growth of 2D ternary materials remains a huge challenge that hinders their practical applications. Here, for the first time, by using a gallium/indium liquid alloy as the precursor, the synthesis of high-quality 2D ternary Ga2 In4 S9 flakes of only a few atomic layers thick (≈2.4 nm for the thinnest samples) through chemical vapor deposition is realized. Their UV-light-sensing applications are explored systematically. Photodetectors based on the Ga2 In4 S9 flakes display outstanding UV detection ability (R λ = 111.9 A W-1 , external quantum efficiency = 3.85 × 104 %, and D* = 2.25 × 1011 Jones@360 nm) with a fast response speed (τring ≈ 40 ms and τdecay ≈ 50 ms). In addition, Ga2 In4 S9 -based phototransistors exhibit a responsivity of ≈104 A W-1 @360 nm above the critical back-gate bias of ≈0 V. The use of the liquid alloy for synthesizing ultrathin 2D Ga2 In4 S9 nanostructures may offer great opportunities for designing novel 2D optoelectronic materials to achieve optimal device performance.
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Affiliation(s)
- Fakun Wang
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Ting Gao
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Qi Zhang
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
- College of Materials and Environmental Engineering, Hangzhou Dianzi University, Xiasha Higher Education Zone, Hangzhou, Zhejiang, 310018, P. R. China
| | - Zhi-Yi Hu
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Luoshi Road 122, Wuhan, 430070, P. R. China
- NRC (Nanostructure Research Centre), Wuhan University of Technology, Luoshi Road 122, Wuhan, 430070, P. R. China
| | - Bao Jin
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Liang Li
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Xing Zhou
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Huiqiao Li
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
| | - Gustaaf Van Tendeloo
- NRC (Nanostructure Research Centre), Wuhan University of Technology, Luoshi Road 122, Wuhan, 430070, P. R. China
- EMAT (Electron Microscopy for Materials Science), University of Antwerp, Groenenborgerlaan 171, 2020, Antwerp, Belgium
| | - Tianyou Zhai
- State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, P. R. China
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108
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Remote Phonon Scattering in Two-Dimensional InSe FETs with High- κ Gate Stack. MICROMACHINES 2018; 9:mi9120674. [PMID: 30572574 PMCID: PMC6316064 DOI: 10.3390/mi9120674] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/15/2018] [Revised: 12/13/2018] [Accepted: 12/17/2018] [Indexed: 12/02/2022]
Abstract
This work focuses on the effect of remote phonon arising from the substrate and high-κ gate dielectric on electron mobility in two-dimensional (2D) InSe field-effect transistors (FETs). The electrostatic characteristic under quantum confinement is derived by self-consistently solving the Poisson and Schrödinger equations using the effective mass approximation. Then mobility is calculated by the Kubo–Greenwood formula accounting for the remote phonon scattering (RPS) as well as the intrinsic phonon scatterings, including the acoustic phonon, homopolar phonon, optical phonon scatterings, and Fröhlich interaction. Using the above method, the mobility degradation due to remote phonon is comprehensively explored in single- and dual-gate InSe FETs utilizing SiO2, Al2O3, and HfO2 as gate dielectric respectively. We unveil the origin of temperature, inversion density, and thickness dependence of carrier mobility. Simulations indicate that remote phonon and Fröhlich interaction plays a comparatively major role in determining the electron transport in InSe. Mobility is more severely degraded by remote phonon of HfO2 dielectric than Al2O3 and SiO2 dielectric, which can be effectively insulated by introducing a SiO2 interfacial layer between the high-κ dielectric and InSe. Due to its smaller in-plane and quantization effective masses, mobility begins to increase at higher density as carriers become degenerate, and mobility degradation with a reduced layer number is much stronger in InSe compared with MoS2.
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109
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Yu M, Li H, Liu H, Qin F, Gao F, Hu Y, Dai M, Wang L, Feng W, Hu P. Synthesis of Two-Dimensional Alloy Ga 0.84In 0.16Se Nanosheets for High-Performance Photodetector. ACS APPLIED MATERIALS & INTERFACES 2018; 10:43299-43304. [PMID: 30507146 DOI: 10.1021/acsami.8b15317] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
The electronic and optoelectronic properties of 2D alloy Ga0.84In0.16Se were investigated for the first time. 2D Ga0.84In0.16Se FETs show p-type conduction behaviors. 2D Ga0.84In0.16Se photodetectors show high photoresponse in the visible light range of 500 to 700 nm. The responsivity value is 258 A/W for alloy photodetector (500 nm illumination), and it is 92 times and 20 times higher than those of 2D GaSe and InSe photodetectors, respectively. Moreover, the alloy photodetector exhibits good photoresponse stability and rapid photoresponse time. Our results demonstrate that 2D alloy Ga0.84In0.16Se has great potential for application in photodetection and sensor devices.
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Affiliation(s)
- Miaomiao Yu
- Department of Chemistry and Chemical Engineering, College of Science , Northeast Forestry University , Harbin , 150040 , China
| | - Hang Li
- Innovation Lab of Space Robot System, Space Robotics Engineering Center, Changchun Institute of Optics, Fine Mechanics and Physics , Chinese Academy of Sciences , Changchun 130033 , China
| | - He Liu
- Department of Chemistry and Chemical Engineering, College of Science , Northeast Forestry University , Harbin , 150040 , China
| | - Fanglu Qin
- Department of Chemistry and Chemical Engineering, College of Science , Northeast Forestry University , Harbin , 150040 , China
| | - Feng Gao
- Key Lab of Microsystem and Microstructure of Ministry of Education , Harbin Institute of Technology , Harbin 150080 , China
| | - Yunxia Hu
- Key Lab of Microsystem and Microstructure of Ministry of Education , Harbin Institute of Technology , Harbin 150080 , China
| | - Mingjin Dai
- Key Lab of Microsystem and Microstructure of Ministry of Education , Harbin Institute of Technology , Harbin 150080 , China
| | - Lifeng Wang
- Institute for Frontier Materials , Deakin University , 75 Pigdons Road , Waurn Ponds, Geelong, Victoria 3216 , Australia
| | - Wei Feng
- Department of Chemistry and Chemical Engineering, College of Science , Northeast Forestry University , Harbin , 150040 , China
| | - PingAn Hu
- Key Lab of Microsystem and Microstructure of Ministry of Education , Harbin Institute of Technology , Harbin 150080 , China
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110
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Wells SA, Henning A, Gish JT, Sangwan VK, Lauhon LJ, Hersam MC. Suppressing Ambient Degradation of Exfoliated InSe Nanosheet Devices via Seeded Atomic Layer Deposition Encapsulation. NANO LETTERS 2018; 18:7876-7882. [PMID: 30418785 DOI: 10.1021/acs.nanolett.8b03689] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/28/2023]
Abstract
With exceptional charge carrier mobilities and a direct bandgap at most thicknesses, indium selenide (InSe) is an emerging layered semiconductor that has generated significant interest for electronic and optoelectronic applications. However, exfoliated InSe nanosheets are susceptible to rapid degradation in ambient conditions, thus limiting their technological potential. In addition to morphological changes upon ambient exposure, the mobilities and current modulation on/off ratios of InSe transistors, as well as the responsivities of InSe photodetectors, decrease by over 3 orders of magnitude within 12 h of ambient exposure. In an effort to mitigate these deleterious effects, here we present an encapsulation scheme based on seeded atomic layer deposition that provides pinhole-free growth of alumina without compromising the intrinsic electronic properties of the underlying InSe. In particular, this encapsulation provides reproducible InSe field-effect transistor characteristics and InSe photodetector responsivities in excess of 107 A/W following ambient exposure for time periods on the order of months. Because atomic layer deposition is a highly scalable and manufacturable process, this work will accelerate ongoing efforts to integrate InSe nanosheets into electronic and optoelectronic technologies.
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Affiliation(s)
- Spencer A Wells
- Department of Materials Science and Engineering , Northwestern University , Evanston , Illinois 60208 , United States
| | - Alex Henning
- Department of Materials Science and Engineering , Northwestern University , Evanston , Illinois 60208 , United States
| | - J Tyler Gish
- Department of Materials Science and Engineering , Northwestern University , Evanston , Illinois 60208 , United States
| | - Vinod K Sangwan
- Department of Materials Science and Engineering , Northwestern University , Evanston , Illinois 60208 , United States
| | - Lincoln J Lauhon
- Department of Materials Science and Engineering , Northwestern University , Evanston , Illinois 60208 , United States
| | - Mark C Hersam
- Department of Materials Science and Engineering , Northwestern University , Evanston , Illinois 60208 , United States
- Department of Chemistry , Northwestern University , Evanston , Illinois 60208 , United States
- Department of Electrical Engineering and Computer Science , Northwestern University , Evanston , Illinois 60208 , United States
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111
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Alshammari FH, Hota MK, Alshareef HN. Transparent Electronics Using One Binary Oxide for All Transistor Layers. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2018; 14:e1803969. [PMID: 30444579 DOI: 10.1002/smll.201803969] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/25/2018] [Revised: 10/29/2018] [Indexed: 06/09/2023]
Abstract
A novel process is developed in which thin film transistors (TFTs) comprising one binary oxide for all transistor layers (gate, source/drain, semiconductor channel, and dielectric) are fabricated in a single deposition system at low temperature. By simply changing the flow ratio of two chemical precursors, C8 H24 HfN4 and (C2 H5 )2 Zn, in an atomic layer deposition system, the electronic properties of the binary oxide (Hf x Zn1- x O2- δ or HZO) are tuned from conducting, to semiconducting, to insulating. Furthermore, by carefully optimizing the properties of the various transistor HZO layers, all-HZO thin film transistors are achieved with excellent performance on both glass and plastic substrates. Specifically, the optimized all-HZO TFTs show a saturation mobility of ≈17.9 cm2 V-1 s-1 , low subthreshold swing of ≈480 mV dec-1 , high Ion /Ioff ratio of >109 , and excellent gate bias stability at elevated temperatures. In addition, all-HZO inverters with high DC voltage gain (≈470), and all-HZO ring oscillators with low stage delay (≈408 ns) and high oscillation frequency of 245 kHz are demonstrated. This approach presents a novel, simple, high performance, and cost-effective process for the fabrication of indium-free transparent electronics.
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Affiliation(s)
- Fwzah H Alshammari
- Materials Science and Engineering, Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
- Department of Physics, University of Hafr Al-Batin (UOHB), Hafr Al-Batin, 31991, Saudi Arabia
| | - Mrinal K Hota
- Materials Science and Engineering, Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Husam N Alshareef
- Materials Science and Engineering, Physical Science and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
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112
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Feng W, Gao F, Hu Y, Dai M, Li H, Wang L, Hu P. High-performance and flexible photodetectors based on chemical vapor deposition grown two-dimensional In 2Se 3 nanosheets. NANOTECHNOLOGY 2018; 29:445205. [PMID: 30136650 DOI: 10.1088/1361-6528/aadc73] [Citation(s) in RCA: 21] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Two-dimensional (2D) In2Se3 with unique optical and electrical properties has great potential in next generation optoelectronics and multilevel phase-change memories. Here, for the first time, we report high-performance rigid and flexible photodetectors based on chemical vapor deposition (CVD) grown 2D In2Se3. Both rigid and flexible 2D In2Se3 photodetectors show a broadband response range from ultraviolet (254 nm) to visible light (700 nm). High photoresponsivities of 578 and 363 A · W-1 are achieved using rigid and flexible 2D In2Se3 photodetectors, respectively, under 700 nm light illumination, which are higher than those of photodetectors based on mechanically exfoliated 2D In2Se3 and physical vapor deposition grown 2D In2Se3. Furthermore, flexible 2D In2Se3 photodetectors show good mechanical durability and photoresponse stability under repeated bending tests. A high and stable photoresponse provides an opportunity for CVD-grown 2D In2Se3 applications in flexible optoelectronic and photovoltaic devices.
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Affiliation(s)
- Wei Feng
- Department of Chemistry and Chemical Engineering, College of Science, Northeast Forestry University, Harbin, 150040, People's Republic of China
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113
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Li M, Lin CY, Yang SH, Chang YM, Chang JK, Yang FS, Zhong C, Jian WB, Lien CH, Ho CH, Liu HJ, Huang R, Li W, Lin YF, Chu J. High Mobilities in Layered InSe Transistors with Indium-Encapsulation-Induced Surface Charge Doping. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2018; 30:e1803690. [PMID: 30589465 DOI: 10.1002/adma.201803690] [Citation(s) in RCA: 37] [Impact Index Per Article: 6.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/11/2018] [Revised: 08/13/2018] [Indexed: 06/09/2023]
Abstract
Tunability and stability in the electrical properties of 2D semiconductors pave the way for their practical applications in logic devices. A robust layered indium selenide (InSe) field-effect transistor (FET) with superior controlled stability is demonstrated by depositing an indium (In) doping layer. The optimized InSe FETs deliver an unprecedented high electron mobility up to 3700 cm2 V-1 s-1 at room temperature, which can be retained with 60% after 1 month. Further insight into the evolution of the position of the Fermi level and the microscopic device structure with different In thicknesses demonstrates an enhanced electron-doping behavior at the In/InSe interface. Furthermore, the contact resistance is also improved through the In insertion between InSe and Au electrodes, which coincides with the analysis of the low-frequency noise. The carrier fluctuation is attributed to the dominance of the phonon scattering events, which agrees with the observation of the temperature-dependent mobility. Finally, the flexible functionalities of the logic-circuit applications, for instance, inverter and not-and (NAND)/not-or (NOR) gates, are determined with these surface-doping InSe FETs, which establish a paradigm for 2D-based materials to overcome the bottleneck in the development of electronic devices.
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Affiliation(s)
- Mengjiao Li
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai, 200241, China
| | - Che-Yi Lin
- Department of Electrophysics, National Chiao Tung University, Hsinchu, 300, Taiwan
| | - Shih-Hsien Yang
- Department of Electrical Engineering and Institute of Electronic Engineering, National Tsing Hua University, Hsinchu, 300, Taiwan
| | - Yuan-Ming Chang
- Department of Physics, National Chung Hsing University, Taichung, 40227, Taiwan
| | - Jen-Kuei Chang
- Department of Physics, National Chung Hsing University, Taichung, 40227, Taiwan
| | - Feng-Shou Yang
- Department of Physics, National Chung Hsing University, Taichung, 40227, Taiwan
| | - Chaorong Zhong
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai, 200241, China
| | - Wen-Bin Jian
- Department of Electrophysics, National Chiao Tung University, Hsinchu, 300, Taiwan
| | - Chen-Hsin Lien
- Department of Electrical Engineering and Institute of Electronic Engineering, National Tsing Hua University, Hsinchu, 300, Taiwan
| | - Ching-Hwa Ho
- Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, Taipei, 106, Taiwan
| | - Heng-Jui Liu
- Department of Materials Science and Engineering, National Chung Hsing University, Taichung, 40227, Taiwan
| | - Rong Huang
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai, 200241, China
| | - Wenwu Li
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai, 200241, China
| | - Yen-Fu Lin
- Department of Physics, National Chung Hsing University, Taichung, 40227, Taiwan
| | - Junhao Chu
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Department of Electronic Engineering, East China Normal University, Shanghai, 200241, China
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114
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Huang YT, Chen YH, Ho YJ, Huang SW, Chang YR, Watanabe K, Taniguchi T, Chiu HC, Liang CT, Sankar R, Chou FC, Chen CW, Wang WH. High-Performance InSe Transistors with Ohmic Contact Enabled by Nonrectifying Barrier-Type Indium Electrodes. ACS APPLIED MATERIALS & INTERFACES 2018; 10:33450-33456. [PMID: 30191709 DOI: 10.1021/acsami.8b10576] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
The electrical contact to two-dimensional (2D) semiconductor materials is decisive to the electronic performance of 2D semiconductor field-effect devices (FEDs). The presence of a Schottky barrier often leads to a large contact resistance, which seriously limits the channel conductance and carrier mobility measured in a two-terminal geometry. In contrast, Ohmic contact is desirable and can be achieved by the presence of a nonrectifying or tunneling barrier. Here, we demonstrate that a nonrectifying barrier can be realized by contacting indium (In), a low work function metal, with layered InSe because of a favorable band alignment at the In-InSe interface. The nonrectifying barrier is manifested by Ohmic contact behavior at T = 2 K and a low barrier height, ΦB = 50 meV. This Ohmic contact enables demonstration of an on-current as large as 410 μA/μm, which is among the highest values achieved in FEDs based on layered semiconductors. A high electron mobility of 3700 and 1000 cm2/V·s is achieved with the two-terminal In-InSe FEDs at T = 2 K and room temperature, respectively, which can be attributed to enhanced quality of both conduction channel and the contacts. The improvement in the contact quality is further proven by an X-ray photoelectron spectroscopy study, which suggests that a reduction effect occurs at the In-InSe interface. The demonstration of high-performance In-InSe FEDs indicates a viable interface engineering method for next-generation, 2D semiconductor-based electronics.
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Affiliation(s)
- Yu-Ting Huang
- Institute of Atomic and Molecular Sciences , Academia Sinica , Taipei 106 , Taiwan
| | - Yi-Hsun Chen
- Institute of Atomic and Molecular Sciences , Academia Sinica , Taipei 106 , Taiwan
| | - Yi-Ju Ho
- Institute of Atomic and Molecular Sciences , Academia Sinica , Taipei 106 , Taiwan
| | - Shih-Wei Huang
- Institute of Atomic and Molecular Sciences , Academia Sinica , Taipei 106 , Taiwan
| | | | - Kenji Watanabe
- National Institute for Materials Science , 1-1 Namiki , Tsukuba , Ibaraki 305-0044 , Japan
| | - Takashi Taniguchi
- National Institute for Materials Science , 1-1 Namiki , Tsukuba , Ibaraki 305-0044 , Japan
| | - Hsiang-Chih Chiu
- Department of Physics , National Taiwan Normal University , Taipei 106 , Taiwan
| | | | | | | | | | - Wei-Hua Wang
- Institute of Atomic and Molecular Sciences , Academia Sinica , Taipei 106 , Taiwan
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115
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Chang HC, Tu CL, Lin KI, Pu J, Takenobu T, Hsiao CN, Chen CH. Synthesis of Large-Area InSe Monolayers by Chemical Vapor Deposition. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2018; 14:e1802351. [PMID: 30152600 DOI: 10.1002/smll.201802351] [Citation(s) in RCA: 28] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/19/2018] [Revised: 08/03/2018] [Indexed: 06/08/2023]
Abstract
Recently, 2D materials of indium selenide (InSe) layers have attracted much attention from the scientific community due to their high mobility transport and fascinating physical properties. To date, reports on the synthesis of high-quality and scalable InSe atomic films are limited. Here, a synthesis of InSe atomic layers by vapor phase selenization of In2 O3 in a chemical vapor deposition (CVD) system, resulting in large-area monolayer flakes or thin films, is reported. The atomic films are continuous and uniform over a large area of 1 × 1 cm2 , comprising of primarily InSe monolayers. Spectroscopic and microscopic measurements reveal the highly crystalline nature of the synthesized InSe monolayers. The ion-gel-gated field-effect transistors based on CVD InSe monolayers exhibit n-type channel behaviors, where the field effect electron mobility values can be up to ≈30 cm2 V-1 s-1 along with an on/off current ratio, of >104 at room temperature. In addition, the graphene can serve as a protection layer to prevent the oxidation between InSe and the ambient environment. Meanwhile, the synthesized InSe films can be transferred to arbitrary substrates, enabling the possibility of reassembly of various 2D materials into vertically stacked heterostructures, prompting research efforts to probe its characteristics and applications.
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Affiliation(s)
- Han-Ching Chang
- Department of Automatic Control Engineering, Feng Chia University, Taichung, 40724, Taiwan
| | - Chien-Liang Tu
- Department of Automatic Control Engineering, Feng Chia University, Taichung, 40724, Taiwan
| | - Kuang-I Lin
- Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, 70101, Taiwan
| | - Jiang Pu
- Department of Applied Physics, Nagoya University, Nagoya, 464-8603, Japan
| | - Taishi Takenobu
- Department of Applied Physics, Nagoya University, Nagoya, 464-8603, Japan
| | - Chien-Nan Hsiao
- Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, 30076, Taiwan
| | - Chang-Hsiao Chen
- Department of Automatic Control Engineering, Feng Chia University, Taichung, 40724, Taiwan
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116
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Kang J, Wells SA, Sangwan VK, Lam D, Liu X, Luxa J, Sofer Z, Hersam MC. Solution-Based Processing of Optoelectronically Active Indium Selenide. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2018; 30:e1802990. [PMID: 30095182 DOI: 10.1002/adma.201802990] [Citation(s) in RCA: 13] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/09/2018] [Revised: 07/23/2018] [Indexed: 05/24/2023]
Abstract
Layered indium selenide (InSe) presents unique properties for high-performance electronic and optoelectronic device applications. However, efforts to process InSe using traditional liquid phase exfoliation methods based on surfactant-assisted aqueous dispersions or organic solvents with high boiling points compromise electronic properties due to residual surface contamination and chemical degradation. Here, these limitations are overcome by utilizing a surfactant-free, low boiling point, deoxygenated cosolvent system. The resulting InSe flakes and thin films possess minimal processing residues and are structurally and chemically pristine. When employed in photodetectors, individual InSe nanosheets exhibit a maximum photoresponsivity of ≈5 × 107 A W-1 , which is the highest value of any solution-processed monolithic semiconductor to date. Furthermore, the surfactant-free cosolvent system not only stabilizes InSe dispersions but is also amenable to the assembly of electronically percolating InSe flake arrays without posttreatment, which enables the realization of ultrahigh performance thin-film photodetectors. This surfactant-free, deoxygenated cosolvent approach can be generalized to other layered materials, thereby presenting additional opportunities for solution-processed thin-film electronic and optoelectronic technologies.
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Affiliation(s)
- Joohoon Kang
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Spencer A Wells
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Vinod K Sangwan
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - David Lam
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Xiaolong Liu
- Applied Physics Graduate Program, Northwestern University, Evanston, IL, 60208, USA
| | - Jan Luxa
- Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28 Prague 6, Czech Republic
| | - Zdeněk Sofer
- Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28 Prague 6, Czech Republic
| | - Mark C Hersam
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
- Applied Physics Graduate Program, Northwestern University, Evanston, IL, 60208, USA
- Department of Chemistry, Electrical Engineering and Computer Science, Northwestern University, Evanston, IL, 60208, USA
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117
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Dai M, Chen H, Feng R, Feng W, Hu Y, Yang H, Liu G, Chen X, Zhang J, Xu CY, Hu P. A Dual-Band Multilayer InSe Self-Powered Photodetector with High Performance Induced by Surface Plasmon Resonance and Asymmetric Schottky Junction. ACS NANO 2018; 12:8739-8747. [PMID: 30095888 DOI: 10.1021/acsnano.8b04931] [Citation(s) in RCA: 67] [Impact Index Per Article: 11.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/17/2023]
Abstract
A dual-band self-powered photodetector (SPPD) with high sensitivity is realized by a facile combination of InSe Schottky diode and Au plasmonic nanoparticle (NP) arrays. Comparing with pristine InSe devices, InSe/Au photodetectors possess an additional capability of photodetection in visible to near-infrared (NIR) region. This intriguing phenomenon is attributed to the wavelength selective enhancement of pristine responsivities by hybridized quadrupole plasmons resonance of Au NPs. It is worth pointing out that the maximum of enhancement ratio in responsivity reaches up to ∼1200% at a wavelength of 685 nm. In addition, owing to a large Schottky barrier difference formed between active layer and two asymmetric electrodes, the responsivities of dual-band InSe/Au photodetector could reach up to 369 and 244 mA/W at the wavelength of 365 and 685 nm under zero bias voltage, respectively. This work would provide an additional opportunity for developing multifunctional photodetectors with high performance based on two-dimensional materials, upgrading their capacity of photodetection in a complex environment.
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Affiliation(s)
| | | | | | - Wei Feng
- Department of Chemistry and Chemical Engineering, College of Science , Northeast Forestry University , Harbin 150040 , P. R. China
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118
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Liu Y, Duan X, Huang Y, Duan X. Two-dimensional transistors beyond graphene and TMDCs. Chem Soc Rev 2018; 47:6388-6409. [PMID: 30079920 DOI: 10.1039/c8cs00318a] [Citation(s) in RCA: 126] [Impact Index Per Article: 21.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/11/2022]
Abstract
Two-dimensional semiconductors (2DSCs) have attracted considerable attention as atomically thin channel materials for field-effect transistors. Each layer in 2DSCs consists of a single- or few-atom-thick, covalently bonded lattice, in which all carriers are confined in their atomically thin channel with superior gate controllability and greatly suppressed OFF-state current, in contrast to typical bulk semiconductors plagued by short channel effects and heat generation from static power. Additionally, 2DSCs are free of surface dangling bonds that plague traditional semiconductors, and hence exhibit excellent electronic properties at the limit of single atom thickness. Therefore, 2DSCs can offer significant potential for the ultimate transistor scaling to single atomic body thickness. Earlier studies of graphene transistors have been limited by the zero bandgap and low ON-OFF ratio of graphene, and transition metal dichalcogenide (TMDC) devices are typically plagued by insufficient carrier mobility. To this end, considerable efforts have been devoted towards searching for new 2DSCs with optimum electronic properties. Within a relatively short period of time, a large number of 2DSCs have been demonstrated to exhibit unprecedented characteristics or unique functionalities. Here we review the recent efforts and progress in exploring novel 2DSCs beyond graphene and TMDCs for ultra-thin body transistors, discussing the merits, limits and prospects of each material.
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Affiliation(s)
- Yuan Liu
- State Key Laboratory for Chemo/Biosensing and Chemometrics, School of Physics and Electronics, College of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, China.
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119
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Wang Y, Fei R, Quhe R, Li J, Zhang H, Zhang X, Shi B, Xiao L, Song Z, Yang J, Shi J, Pan F, Lu J. Many-Body Effect and Device Performance Limit of Monolayer InSe. ACS APPLIED MATERIALS & INTERFACES 2018; 10:23344-23352. [PMID: 29916240 DOI: 10.1021/acsami.8b06427] [Citation(s) in RCA: 37] [Impact Index Per Article: 6.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Due to a higher environmental stability than few-layer black phosphorus and a higher carrier mobility than few-layer dichalcogenides, two-dimensional (2D) semiconductor InSe has become quite a promising channel material for the next-generation field-effect transistors (FETs). Here, we provide the investigation of the many-body effect and transistor performance scaling of monolayer (ML) InSe based on ab initio GW-Bethe-Salpeter equation approaches and quantum transport simulations, respectively. The fundamental band gap of ML InSe is indirect and 2.60 eV. The optical band gap of ML InSe is 2.50 eV for the in-plane polarized light, with the corresponding exciton binding energy of 0.58 eV. The ML InSe metal oxide semiconductor FETs (MOSFETs) show excellent performances with reduced short-channel effects. The on-current, delay time, and dynamic power indicator of the optimized n- and p-type ML InSe MOSFETs can satisfy the high-performance and low-power requirements of the International Technology Roadmap for Semiconductors 2013 both down to 3-5 nm gate length in the ballistic limit. Therefore, a new avenue is opened to continue Moore's law down to 3 nm by utilizing 2D InSe.
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Affiliation(s)
- Yangyang Wang
- Nanophotonics and Optoelectronics Research Center, Qian Xuesen Laboratory of Space Technology , China Academy of Space Technology , Beijing 100094 , P. R. China
| | - Ruixiang Fei
- Department of Physics and Institute of Materials Science and Engineering , Washington University , St Louis , Missouri 63130 , United States
| | - Ruge Quhe
- State Key Laboratory of Information Photonics and Optical Communications & School of Science , Beijing University of Posts and Telecommunications , Beijing 100876 , P. R. China
| | - Jingzhen Li
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
| | - Han Zhang
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
| | - Xiuying Zhang
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
| | - Bowen Shi
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
| | - Lin Xiao
- Nanophotonics and Optoelectronics Research Center, Qian Xuesen Laboratory of Space Technology , China Academy of Space Technology , Beijing 100094 , P. R. China
| | - Zhigang Song
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
| | - Jinbo Yang
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
- Collaborative Innovation Center of Quantum Matter , Beijing 100871 , P. R. China
| | - Junjie Shi
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
| | - Feng Pan
- School of Advanced Materials , Peking University, Shenzhen Graduate School , Shenzhen 518055 , P. R. China
| | - Jing Lu
- State Key Laboratory for Mesoscopic Physics and School of Physics , Peking University , Beijing 100871 , P. R. China
- Collaborative Innovation Center of Quantum Matter , Beijing 100871 , P. R. China
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120
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Zhang Y, Shi Y, Wu M, Zhang K, Man B, Liu M. Synthesis and Surface-Enhanced Raman Scattering of Ultrathin SnSe₂ Nanoflakes by Chemical Vapor Deposition. NANOMATERIALS 2018; 8:nano8070515. [PMID: 29996504 PMCID: PMC6070886 DOI: 10.3390/nano8070515] [Citation(s) in RCA: 44] [Impact Index Per Article: 7.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 06/07/2018] [Revised: 07/02/2018] [Accepted: 07/06/2018] [Indexed: 11/16/2022]
Abstract
As a new atomically layered, two-dimensional material, tin (IV) diselenide (SnSe2) has attracted extensive attention due to its compelling application in electronics and optoelectronics. However, the great challenge of impurities and the preparation of high-quality ultrathin SnSe2 nanoflakes has hindered far-reaching research and SnSe2 practical applications so far. Therefore, a facile chemical vapor deposition (CVD) method is employed to synthesize large-scale ultrathin SnSe2 flakes on mica substrates using SnSe and Se powder as precursors. The structural characteristics and crystalline quality of the product were investigated. Moreover, Raman characterizations indicate that the intensity of A1g peak and Eg peak, and the Raman shift of Eg are associated with the thickness of the SnSe2 nanoflakes. The ultrathin SnSe2 nanoflakes show a strong surface-enhanced Raman spectroscopy (SERS) activity for Rhodamine 6G (R6G) molecules. Theoretical explanations for the enhancement principle based on the chemical enhancement mechanism and charge transfer diagram between R6G and SnSe2 are provided. The results demonstrate that the ultrathin SnSe2 flakes are high-quality single crystal and can be exploited for microanalysis detection and optoelectronic application.
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Affiliation(s)
- Yongheng Zhang
- School of Physics and Electronics, Shandong Normal University, Jinan 250014, China.
| | - Ying Shi
- School of Physics and Electronics, Shandong Normal University, Jinan 250014, China.
| | - Meimei Wu
- School of Physics and Electronics, Shandong Normal University, Jinan 250014, China.
| | - Kun Zhang
- School of Physics and Electronics, Shandong Normal University, Jinan 250014, China.
| | - Baoyuan Man
- School of Physics and Electronics, Shandong Normal University, Jinan 250014, China.
| | - Mei Liu
- School of Physics and Electronics, Shandong Normal University, Jinan 250014, China.
- Institute of Materials and Clean Energy, Shandong Normal University, Jinan 250014, China.
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121
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Moro F, Bhuiyan MA, Kudrynskyi ZR, Puttock R, Kazakova O, Makarovsky O, Fay MW, Parmenter C, Kovalyuk ZD, Fielding AJ, Kern M, van Slageren J, Patanè A. Room Temperature Uniaxial Magnetic Anisotropy Induced By Fe-Islands in the InSe Semiconductor Van Der Waals Crystal. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2018; 5:1800257. [PMID: 30027057 PMCID: PMC6051381 DOI: 10.1002/advs.201800257] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/15/2018] [Revised: 03/08/2018] [Indexed: 05/28/2023]
Abstract
The controlled manipulation of the spin and charge of electrons in a semiconductor has the potential to create new routes to digital electronics beyond Moore's law, spintronics, and quantum detection and imaging for sensing applications. These technologies require a shift from traditional semiconducting and magnetic nanostructured materials. Here, a new material system is reported, which comprises the InSe semiconductor van der Waals crystal that embeds ferromagnetic Fe-islands. In contrast to many traditional semiconductors, the electronic properties of InSe are largely preserved after the incorporation of Fe. Also, this system exhibits ferromagnetic resonances and a large uniaxial magnetic anisotropy at room temperature, offering opportunities for the development of functional devices that integrate magnetic and semiconducting properties within the same material system.
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Affiliation(s)
- Fabrizio Moro
- School of Physics and AstronomyThe University of NottinghamNG7 2RDNottinghamUK
- Department of PhysicsChemistry and BiologyLinköping University581 83LinköpingSweden
| | - Mahabub A. Bhuiyan
- School of Physics and AstronomyThe University of NottinghamNG7 2RDNottinghamUK
| | | | - Robert Puttock
- National Physical LaboratoryHampton RoadTW11 0LWTeddingtonUK
| | - Olga Kazakova
- National Physical LaboratoryHampton RoadTW11 0LWTeddingtonUK
| | - Oleg Makarovsky
- School of Physics and AstronomyThe University of NottinghamNG7 2RDNottinghamUK
| | - Michael W. Fay
- Nanoscale and Microscale Research CentreThe University of NottinghamNG7 2RDNottinghamUK
| | - Christopher Parmenter
- Nanoscale and Microscale Research CentreThe University of NottinghamNG7 2RDNottinghamUK
| | - Zakhar D. Kovalyuk
- Institute for Problems of Materials ScienceThe National Academy of Sciences of Ukraine58001ChernivtsiUkraine
| | | | - Michal Kern
- Institut für Physikalische Chemie and the Center for Integrated Quantum Science and TechnologyUniversität StuttgartPfaffenwaldring 5570569StuttgartGermany
| | - Joris van Slageren
- Institut für Physikalische Chemie and the Center for Integrated Quantum Science and TechnologyUniversität StuttgartPfaffenwaldring 5570569StuttgartGermany
| | - Amalia Patanè
- School of Physics and AstronomyThe University of NottinghamNG7 2RDNottinghamUK
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122
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Wu M, Shi JJ, Zhang M, Ding YM, Wang H, Cen YL, Lu J. Enhancement of photoluminescence and hole mobility in 1- to 5-layer InSe due to the top valence-band inversion: strain effect. NANOSCALE 2018; 10:11441-11451. [PMID: 29882944 DOI: 10.1039/c8nr03172j] [Citation(s) in RCA: 20] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Recently, two-dimensional (2D) few-layer InSe nanosheets have become one of the most interesting materials due to their excellent electron transport, wide bandgap tunability and good metal contact. However, their low photoluminescence (PL) efficiency and hole mobility seriously restrict their application in 2D InSe-based nano-devices. Here, by exerting a suitable compressive strain, a remarkable modification for the electronic structure and the optical and transport properties of 1- to 5-layer InSe has been confirmed by powerful GW-BSE calculations. Both top valence band inversion and indirect-to-direct bandgap transition are induced; the light polarization is reversed from E||c to E⊥c; and the PL intensity and hole mobility are enhanced greatly. Surprisingly, under 6% compressive strain, the light emission of monolayer InSe with E⊥c is allowed at 2.58 eV, which has never been observed previously. Meanwhile, for the 2D few-layer InSe, the PL with E⊥c polarization increases over 10 times in intensity and has a blue-shift at about 0.6-0.7 eV, and the hole mobility increases two orders of magnitude up to 103 cm2 V-1 s-1, as high as electron mobility. The strained few-layer InSe are thus a promising candidate for future 2D electronic and optoelectronic nano-devices.
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Affiliation(s)
- Meng Wu
- State Key Laboratory for Artificial Microstructures and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China.
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123
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Zhang Y, Jie W, Chen P, Liu W, Hao J. Ferroelectric and Piezoelectric Effects on the Optical Process in Advanced Materials and Devices. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2018; 30:e1707007. [PMID: 29888451 DOI: 10.1002/adma.201707007] [Citation(s) in RCA: 52] [Impact Index Per Article: 8.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/30/2017] [Revised: 02/05/2018] [Indexed: 05/12/2023]
Abstract
Piezoelectric and ferroelectric materials have shown great potential for control of the optical process in emerging materials. There are three ways for them to impact on the optical process in various materials. They can act as external perturbations, such as ferroelectric gating and piezoelectric strain, to tune the optical properties of the materials and devices. Second, ferroelectricity and piezoelectricity as innate attributes may exist in some optoelectronic materials, which can couple with other functional features (e.g., semiconductor transport, photoexcitation, and photovoltaics) in the materials giving rise to unprecedented device characteristics. The last way is artificially introducing optical functionalities into ferroelectric and piezoelectric materials and devices, which provides an opportunity for investigating the intriguing interplay between the parameters (e.g., electric field, temperature, and strain) and the introduced optical properties. Here, the tuning strategies, fundamental mechanisms, and recent progress in ferroelectric and piezoelectric effects modulating the optical properties of a wide spectrum of materials, including lanthanide-doped phosphors, quantum dots, 2D materials, wurtzite-type semiconductors, and hybrid perovskites, are presented. Finally, the future outlook and challenges of this exciting field are suggested.
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Affiliation(s)
- Yang Zhang
- Institute of Modern Optics, Nankai University, Tianjin, 300071, China
| | - Wenjing Jie
- Department of Applied Physics, The Hong Kong Polytechnic University, Kowloon, Hong Kong, P. R. China
- College of Chemistry and Materials Science, Sichuan Normal University, Chengdu, 610068, China
| | - Ping Chen
- Institute of Modern Optics, Nankai University, Tianjin, 300071, China
| | - Weiwei Liu
- Institute of Modern Optics, Nankai University, Tianjin, 300071, China
| | - Jianhua Hao
- Department of Applied Physics, The Hong Kong Polytechnic University, Kowloon, Hong Kong, P. R. China
- The Hong Kong Polytechnic University Shenzhen Research Institute, Shenzhen, 518057, China
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124
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Petroni E, Lago E, Bellani S, Boukhvalov DW, Politano A, Gürbulak B, Duman S, Prato M, Gentiluomo S, Oropesa-Nuñez R, Panda JK, Toth PS, Del Rio Castillo AE, Pellegrini V, Bonaccorso F. Liquid-Phase Exfoliated Indium-Selenide Flakes and Their Application in Hydrogen Evolution Reaction. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2018; 14:e1800749. [PMID: 29845748 DOI: 10.1002/smll.201800749] [Citation(s) in RCA: 21] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/23/2018] [Revised: 04/19/2018] [Indexed: 06/08/2023]
Abstract
Single- and few-layered InSe flakes are produced by the liquid-phase exfoliation of β-InSe single crystals in 2-propanol, obtaining stable dispersions with a concentration as high as 0.11 g L-1 . Ultracentrifugation is used to tune the morphology, i.e., the lateral size and thickness of the as-produced InSe flakes. It is demonstrated that the obtained InSe flakes have maximum lateral sizes ranging from 30 nm to a few micrometers, and thicknesses ranging from 1 to 20 nm, with a maximum population centered at ≈5 nm, corresponding to 4 Se-In-In-Se quaternary layers. It is also shown that no formation of further InSe-based compounds (such as In2 Se3 ) or oxides occurs during the exfoliation process. The potential of these exfoliated-InSe few-layer flakes as a catalyst for the hydrogen evolution reaction (HER) is tested in hybrid single-walled carbon nanotubes/InSe heterostructures. The dependence of the InSe flakes' morphologies, i.e., surface area and thickness, on the HER performances is highlighted, achieving the best efficiencies with small flakes offering predominant edge effects. The theoretical model unveils the origin of the catalytic efficiency of InSe flakes, and correlates the catalytic activity to the Se vacancies at the edge of the flakes.
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Affiliation(s)
- Elisa Petroni
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
- Dipartimento di Chimica e Chimica Industriale, Università degli Studi di Genova, via Dodecaneso 31, 16146, Genoa, Italy
| | - Emanuele Lago
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
- Dipartimento di Chimica e Chimica Industriale, Università degli Studi di Genova, via Dodecaneso 31, 16146, Genoa, Italy
| | - Sebastiano Bellani
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
| | - Danil W Boukhvalov
- Department of Chemistry, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 04763, South Korea
- Department of Theoretical Physics and Applied Mathematics, Ural Federal University, Mira Street 19, 620002, Ekaterinburg, Russia
| | - Antonio Politano
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
| | - Bekir Gürbulak
- Department of Physics, Faculty of Sciences, Atatürk University, 25240, Erzurum, Turkey
| | - Songül Duman
- Department of Basic Sciences, Faculty of Sciences, Erzurum Technical University, 25050, Erzurum, Turkey
| | - Mirko Prato
- Materials Characterization Facility, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
| | - Silvia Gentiluomo
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
- Dipartimento di Chimica e Chimica Industriale, Università degli Studi di Genova, via Dodecaneso 31, 16146, Genoa, Italy
| | | | - Jaya-Kumar Panda
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
| | - Peter S Toth
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
| | | | - Vittorio Pellegrini
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
| | - Francesco Bonaccorso
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163, Genoa, Italy
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125
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Wu M, Shi JJ, Zhang M, Ding YM, Wang H, Cen YL, Guo WH, Pan SH, Zhu YH. Modulation of electronic and magnetic properties in InSe nanoribbons: edge effect. NANOTECHNOLOGY 2018; 29:205708. [PMID: 29504514 DOI: 10.1088/1361-6528/aab3f5] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Quite recently, the two-dimensional (2D) InSe nanosheet has become a hot material with great promise for advanced functional nano-devices. In this work, for the first time, we perform first-principles calculations on the structural, electronic, magnetic and transport properties of 1D InSe nanoribbons with/without hydrogen or halogen saturation. We find that armchair ribbons, with various edges and distortions, are all nonmagnetic semiconductors, with a direct bandgap of 1.3 (1.4) eV for bare (H-saturated) ribbons, and have the same high electron mobility of about 103 cm2V-1s-1 as the 2D InSe nanosheet. Zigzag InSe nanoribbons exhibit metallic behavior and diverse intrinsic ferromagnetic properties, with the magnetic moment of 0.5-0.7 μ B per unit cell, especially for their single-edge spin polarization. The edge spin orientation, mainly dominated by the unpaired electrons of the edge atoms, depends sensitively on the edge chirality. Hydrogen or halogen saturation can effectively recover the structural distortion, and modulate the electronic and magnetic properties. The binding energy calculations show that the stability of InSe nanoribbons is analogous to that of graphene and better than in 2D InSe nanosheets. These InSe nanoribbons, with novel electronic and magnetic properties, are thus very promising for use in electronic, spintronic and magnetoresistive nano-devices.
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Affiliation(s)
- Meng Wu
- State Key Laboratory for Artificial Microstructures and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, People's Republic of China
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126
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Sun Y, Luo S, Zhao XG, Biswas K, Li SL, Zhang L. InSe: a two-dimensional material with strong interlayer coupling. NANOSCALE 2018; 10:7991-7998. [PMID: 29610784 DOI: 10.1039/c7nr09486h] [Citation(s) in RCA: 35] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Atomically thin, two-dimensional (2D) indium selenide (InSe) has attracted considerable attention due to the large tunability in the band gap (from 1.4 to 2.6 eV) and high carrier mobility. The intriguingly high dependence of the band gap on layer thickness may lead to novel device applications, although its origin remains poorly understood, and is generally attributed to the quantum confinement effect. In this work, we demonstrate via first-principles calculations that strong interlayer coupling may be mainly responsible for this phenomenon, especially in the fewer-layer region, and it could also be an essential factor influencing other material properties of β-InSe and γ-InSe. The existence of strong interlayer coupling manifests itself in three aspects: (i) indirect-to-direct band gap transitions with increasing layer thickness; (ii) fan-like frequency diagrams of the shear and breathing modes of few-layer flakes; and (iii) strong layer-dependent carrier mobilities. Our results indicate that multiple-layer InSe may be deserving of attention from FET-based technologies and may also be an ideal system to study interlayer coupling, possibly inherent in other 2D materials.
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Affiliation(s)
- Yuanhui Sun
- Key Laboratory of Automobile Materials of MOE and College of Materials Science and Engineering, Jilin University, Changchun 130012, China.
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127
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Yao AL, Wang XF, Liu YS, Sun YN. Electronic Structure and I-V Characteristics of InSe Nanoribbons. NANOSCALE RESEARCH LETTERS 2018; 13:107. [PMID: 29671093 PMCID: PMC5906419 DOI: 10.1186/s11671-018-2517-2] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/05/2018] [Accepted: 04/05/2018] [Indexed: 06/08/2023]
Abstract
We have studied the electronic structure and the current-voltage (I-V) characteristics of one-dimensional InSe nanoribbons using the density functional theory combined with the nonequilibrium Green's function method. Nanoribbons having bare or H-passivated edges of types zigzag (Z), Klein (K), and armchair (A) are taken into account. Edge states are found to play an important role in determining their electronic properties. Edges Z and K are usually metallic in wide nanoribbons as well as their hydrogenated counterparts. Transition from semiconductor to metal is observed in hydrogenated nanoribbons HZZH as their width increases, due to the strong width dependence of energy difference between left and right edge states. Nevertheless, electronic structures of other nanoribbons vary with the width in a very limited scale. The I-V characteristics of bare nanoribbons ZZ and KK show strong negative differential resistance, due to spatial mismatch of wave functions in energy bands around the Fermi energy. Spin polarization in these nanoribbons is also predicted. In contrast, bare nanoribbons AA and their hydrogenated counterparts HAAH are semiconductors. The band gaps of nanoribbons AA (HAAH) are narrower (wider) than that of two-dimensional InSe monolayer and increase (decrease) with the nanoribbon width.
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Affiliation(s)
- A-Long Yao
- Jiangsu Key Laboratory of Thin Films, College of Physics, Optoelectronics and Energy, Soochow University, 1 Shizi Street, Suzhou, 215006 China
| | - Xue-Feng Wang
- Jiangsu Key Laboratory of Thin Films, College of Physics, Optoelectronics and Energy, Soochow University, 1 Shizi Street, Suzhou, 215006 China
- Key Laboratory of Terahertz Solid-State Technology, Chinese Academy of Sciences, 865 Changning Road, Shanghai, 200050 China
| | - Yu-Shen Liu
- College of Physics and Engineering, Changshu Institute of Technology, Changshu, 215500 China
| | - Ya-Na Sun
- Jiangsu Key Laboratory of Thin Films, College of Physics, Optoelectronics and Energy, Soochow University, 1 Shizi Street, Suzhou, 215006 China
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128
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Yang HW, Hsieh HF, Chen RS, Ho CH, Lee KY, Chao LC. Ultraefficient Ultraviolet and Visible Light Sensing and Ohmic Contacts in High-Mobility InSe Nanoflake Photodetectors Fabricated by the Focused Ion Beam Technique. ACS APPLIED MATERIALS & INTERFACES 2018; 10:5740-5749. [PMID: 29381044 DOI: 10.1021/acsami.7b15106] [Citation(s) in RCA: 19] [Impact Index Per Article: 3.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
A photodetector using a two-dimensional (2D) low-direct band gap indium selenide (InSe) nanostructure fabricated by the focused ion beam (FIB) technique has been investigated. The FIB-fabricated InSe photodetectors with a low contact resistance exhibit record high responsivity and detectivity to the ultraviolet and visible lights. The optimal responsivity and detectivity up to 1.8 × 107 A W-1 and 1.1 × 1015 Jones, respectively, are much higher than those of the other 2D material-based photoconductors and phototransistors. Moreover, the inherent photoconductivity (PC) quantified by the value of normalized gain has also been discussed and compared. By excluding the contribution of artificial parameters, the InSe nanoflakes exhibit an ultrahigh normalized gain of 3.2 cm2 V-1, which is several orders of magnitude higher than those of MoS2, GaS, and other layer material nanostructures. A high electron mobility at room temperature reaching 450 cm2 V-1 s-1 has been confirmed to be one of the major causes of the inherent superior PC in the InSe nanoflakes. The oxygen-sensitized PC mechanism that enhances carrier lifetime and carrier collection efficiency has also been proposed. This work demonstrates the devices fabricated by the FIB technique using InSe nanostructures for highly efficient broad-band optical sensing and light harvesting, which is critical for development of the 2D material-based ultrathin flexible optoelectronics.
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Affiliation(s)
- Hung-Wei Yang
- Graduate Institute of Applied Science and Technology and ‡Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology , Taipei 10607, Taiwan
| | - Ho-Feng Hsieh
- Graduate Institute of Applied Science and Technology and ‡Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology , Taipei 10607, Taiwan
| | - Ruei-San Chen
- Graduate Institute of Applied Science and Technology and ‡Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology , Taipei 10607, Taiwan
| | - Ching-Hwa Ho
- Graduate Institute of Applied Science and Technology and ‡Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology , Taipei 10607, Taiwan
| | - Kuei-Yi Lee
- Graduate Institute of Applied Science and Technology and ‡Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology , Taipei 10607, Taiwan
| | - Liang-Chiun Chao
- Graduate Institute of Applied Science and Technology and ‡Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology , Taipei 10607, Taiwan
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129
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Hu T, Zhou J, Dong J. Strain induced new phase and indirect-direct band gap transition of monolayer InSe. Phys Chem Chem Phys 2018; 19:21722-21728. [PMID: 28776623 DOI: 10.1039/c7cp03558f] [Citation(s) in RCA: 62] [Impact Index Per Article: 10.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/12/2022]
Abstract
The effect of in-plane strain on monolayer InSe has been systematically investigated by using first-principles calculations. It is found that monolayer InSe exhibits superior mechanical flexibility, which can sustain a tensile strain up to 27% in the armchair direction. More importantly, a new phase with inversion symmetry denoted as phase-II is obtained when the tensile strain increases over 25% along the zigzag direction, which is predicted to be metallic and thermodynamically stable at room temperature. And the phase-II InSe could show an out-of-plane negative Poisson's ratio after the uniaxial tensile strain is larger than 5%. Moreover, both uniaxial and biaxial compressive strains can trigger the indirect-to-direct band gap transition in the pristine monolayer InSe and its band gap decreases monotonously with the applied tensile strain, which offers an effective method to tune the electronic properties of monolayer InSe for its promising application in electronics and optoelectronics.
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Affiliation(s)
- Ting Hu
- Department of Applied Physics, Nanjing University of Science and Technology, Nanjing, 210094, China
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130
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Fan Y, Liu X, Wang J, Ai H, Zhao M. Silicene and germanene on InSe substrates: structures and tunable electronic properties. Phys Chem Chem Phys 2018; 20:11369-11377. [DOI: 10.1039/c8cp00610e] [Citation(s) in RCA: 32] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/31/2023]
Abstract
The tunable electronic properties of Si/InSe and Ge/InSe HLs by applying an external electric field or strain.
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Affiliation(s)
- Yingcai Fan
- Department of Assets Management
- School of Information and Electronic Engineering
- Shandong Technology and Business University
- Yantai 264005
- China
| | - Xiaobiao Liu
- School of Physics and State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
| | - Junru Wang
- School of Physics and State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
| | - Haoqiang Ai
- School of Physics and State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
| | - Mingwen Zhao
- School of Physics and State Key Laboratory of Crystal Materials
- Shandong University
- Jinan 250100
- China
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131
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Shi B, Wang Y, Li J, Zhang X, Yan J, Liu S, Yang J, Pan Y, Zhang H, Yang J, Pan F, Lu J. n-Type Ohmic contact and p-type Schottky contact of monolayer InSe transistors. Phys Chem Chem Phys 2018; 20:24641-24651. [DOI: 10.1039/c8cp04615h] [Citation(s) in RCA: 25] [Impact Index Per Article: 4.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
We explore the contact properties of monolayer InSe transistors and obtain n-type Ohmic/p-type Schottky contacts.
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132
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Wang XP, Li XB, Chen NK, Zhao JH, Chen QD, Sun HB. Electric field analyses on monolayer semiconductors: the example of InSe. Phys Chem Chem Phys 2018; 20:6945-6950. [DOI: 10.1039/c7cp07270h] [Citation(s) in RCA: 32] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Properties of an InSe monolayer under external vertical electric fields.
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Affiliation(s)
- Xue-Peng Wang
- State Key Laboratory of Integrated Optoelectronics
- College of Electronic Science and Engineering
- Jilin University
- Changchun
- China
| | - Xian-Bin Li
- State Key Laboratory of Integrated Optoelectronics
- College of Electronic Science and Engineering
- Jilin University
- Changchun
- China
| | - Nian-Ke Chen
- State Key Laboratory of Integrated Optoelectronics
- College of Electronic Science and Engineering
- Jilin University
- Changchun
- China
| | - Ji-Hong Zhao
- State Key Laboratory of Integrated Optoelectronics
- College of Electronic Science and Engineering
- Jilin University
- Changchun
- China
| | - Qi-Dai Chen
- State Key Laboratory of Integrated Optoelectronics
- College of Electronic Science and Engineering
- Jilin University
- Changchun
- China
| | - Hong-Bo Sun
- State Key Laboratory of Integrated Optoelectronics
- College of Electronic Science and Engineering
- Jilin University
- Changchun
- China
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133
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Wang T, Li J, Jin H, Wei Y. Tuning the electronic and magnetic properties of InSe nanosheets by transition metal doping. Phys Chem Chem Phys 2018; 20:7532-7537. [DOI: 10.1039/c8cp00219c] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/13/2022]
Abstract
A Cr-doped InSe monolayer that exhibits half metallic transport characteristics can be applied for spintronic devices.
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Affiliation(s)
- Tao Wang
- College of Physics and Energy
- Shenzhen Key Laboratory of Advanced Thin Films and Applications
- Shenzhen University
- Shenzhen 518060
- People's Republic of China
| | - Jianwei Li
- College of Physics and Energy
- Shenzhen Key Laboratory of Advanced Thin Films and Applications
- Shenzhen University
- Shenzhen 518060
- People's Republic of China
| | - Hao Jin
- College of Physics and Energy
- Shenzhen Key Laboratory of Advanced Thin Films and Applications
- Shenzhen University
- Shenzhen 518060
- People's Republic of China
| | - Yadong Wei
- College of Physics and Energy
- Shenzhen Key Laboratory of Advanced Thin Films and Applications
- Shenzhen University
- Shenzhen 518060
- People's Republic of China
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134
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Du L, Zheng K, Cui H, Wang Y, Tao L, Chen X. Novel electronic structures and enhanced optical properties of boron phosphide/blue phosphorene and F4TCNQ/blue phosphorene heterostructures: a DFT + NEGF study. Phys Chem Chem Phys 2018; 20:28777-28785. [DOI: 10.1039/c8cp05119d] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Blue phosphorene (Blue-p), an allotrope of black phosphorene, has attracted extensive interest due to its hexagonal crystal with a flat arranged layer of phosphorus atoms.
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Affiliation(s)
- Leqian Du
- Key Laboratory of Optoelectronic Technology & Systems
- Education Ministry of China
- Chongqing University and College of Optoelectronic Engineering
- Chongqing University
- 400044 Chongqing
| | - Kai Zheng
- Key Laboratory of Optoelectronic Technology & Systems
- Education Ministry of China
- Chongqing University and College of Optoelectronic Engineering
- Chongqing University
- 400044 Chongqing
| | - Heping Cui
- Key Laboratory of Optoelectronic Technology & Systems
- Education Ministry of China
- Chongqing University and College of Optoelectronic Engineering
- Chongqing University
- 400044 Chongqing
| | - Yunhao Wang
- School of Economics
- Northeast Normal University
- Changchun 130117
- China
| | - Luqi Tao
- Key Laboratory of Optoelectronic Technology & Systems
- Education Ministry of China
- Chongqing University and College of Optoelectronic Engineering
- Chongqing University
- 400044 Chongqing
| | - Xianping Chen
- Key Laboratory of Optoelectronic Technology & Systems
- Education Ministry of China
- Chongqing University and College of Optoelectronic Engineering
- Chongqing University
- 400044 Chongqing
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135
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Weng J, Gao SP. A honeycomb-like monolayer of HfO2 and the calculation of static dielectric constant eliminating the effect of vacuum spacing. Phys Chem Chem Phys 2018; 20:26453-26462. [DOI: 10.1039/c8cp04743j] [Citation(s) in RCA: 20] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
A novel dielectric material of monolayer 1T-HfO2 has been investigated using first-principles calculations.
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Affiliation(s)
- Junhui Weng
- Department of Materials Science
- Fudan University
- Shanghai 200433
- P. R. China
| | - Shang-Peng Gao
- Department of Materials Science
- Fudan University
- Shanghai 200433
- P. R. China
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136
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Kudrynskyi ZR, Bhuiyan MA, Makarovsky O, Greener JDG, Vdovin EE, Kovalyuk ZD, Cao Y, Mishchenko A, Novoselov KS, Beton PH, Eaves L, Patanè A. Giant Quantum Hall Plateau in Graphene Coupled to an InSe van der Waals Crystal. PHYSICAL REVIEW LETTERS 2017; 119:157701. [PMID: 29077458 DOI: 10.1103/physrevlett.119.157701] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/06/2017] [Indexed: 05/07/2023]
Abstract
We report on a "giant" quantum Hall effect plateau in a graphene-based field-effect transistor where graphene is capped by a layer of the van der Waals crystal InSe. The giant quantum Hall effect plateau arises from the close alignment of the conduction band edge of InSe with the Dirac point of graphene. This feature enables the magnetic-field- and electric-field-effect-induced transfer of charge carriers between InSe and the degenerate Landau level states of the adjacent graphene layer, which is coupled by a van der Waals heterointerface to the InSe.
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Affiliation(s)
- Z R Kudrynskyi
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - M A Bhuiyan
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - O Makarovsky
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - J D G Greener
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - E E Vdovin
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
- Institute of Microelectronics Technology and High Purity Materials, RAS, Chernogolovka 142432, Russia
| | - Z D Kovalyuk
- Institute for Problems of Materials Science, The National Academy of Sciences of Ukraine, Chernivtsi Branch, Chernivtsi 58001, Ukraine
| | - Y Cao
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
- National Graphene Institute, University of Manchester, Manchester M13 9PL, United Kingdom
| | - A Mishchenko
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
| | - K S Novoselov
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
| | - P H Beton
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - L Eaves
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - A Patanè
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
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137
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Ding YM, Shi JJ, Xia C, Zhang M, Du J, Huang P, Wu M, Wang H, Cen YL, Pan SH. Enhancement of hole mobility in InSe monolayer via an InSe and black phosphorus heterostructure. NANOSCALE 2017; 9:14682-14689. [PMID: 28944803 DOI: 10.1039/c7nr02725g] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
To enhance the low hole mobility (∼40 cm2 V-1 s-1) of InSe monolayer, a novel two-dimensional (2D) van der Waals heterostructure made of InSe and black phosphorus (BP) monolayers with high hole mobility (∼103 cm2 V-1 s-1) has been constructed and its structural and electronic properties are investigated using first-principles calculations. We find that the InSe/BP heterostructure exhibits a direct band gap of 1.39 eV and type-II band alignment with electrons (holes) located in the InSe (BP) layer. The band offsets of InSe and BP are 0.78 eV for the conduction band minimum and 0.86 eV for the valence band maximum, respectively. Surprisingly, the hole mobility in the InSe/BP heterostructure exceeds 104 cm2 V-1 s-1, which is one order of magnitude larger than the hole mobility of BP and three orders larger than that of the InSe monolayer. The electron mobility is also increased to 3 × 103 cm2 V-1 s-1. The physical reason has been analyzed deeply, and a universal method is proposed to improve the carrier mobility of 2D materials by forming heterostructures with them and other 2D materials with complementary properties. The InSe/BP heterostructure can thus be widely used in nanoscale InSe-based field-effect transistors, photodetectors and photovoltaic devices due to its type-II band alignment and high carrier mobility.
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Affiliation(s)
- Yi-Min Ding
- State Key Laboratory for Artificial Microstructures and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China.
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138
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Shi L, Zhou Q, Zhao Y, Ouyang Y, Ling C, Li Q, Wang J. Oxidation Mechanism and Protection Strategy of Ultrathin Indium Selenide: Insight from Theory. J Phys Chem Lett 2017; 8:4368-4373. [PMID: 28846423 DOI: 10.1021/acs.jpclett.7b02059] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 05/28/2023]
Abstract
Ultrathin indium selenide (InSe), as a newly emerging two-dimensional material with high carrier mobility and a broad absorption spectrum, has been the focus of current research. However, the long-term environmental instability of atomically thin InSe seriously limits its practical applications. To develop an effective strategy to protect InSe, it is crucial to reveal the degradation mechanism at the atomic level. By employing density functional theory and ab initio molecular dynamics simulations, we provide an in-depth understanding of the oxidation mechanism of InSe. The defect-free InSe presents excellent stability against oxidation. Nevertheless, the Se vacancies on the surface can react with water and oxygen in air directly and activate the neighboring In-Se bonds on the basal plane for further oxidation, leading to complete degradation of InSe into oxidation products of In2O3 and elemental Se. Furthermore, we propose an efficient strategy to repair the Se vacancies by thiol chemistry. In this way, the repaired surface can resist oxidation from oxygen and retain the original high electron mobility of pristine InSe simultaneously.
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Affiliation(s)
- Li Shi
- School of Physics, Southeast University , Nanjing 211189, China
| | - Qionghua Zhou
- School of Physics, Southeast University , Nanjing 211189, China
| | - Yinghe Zhao
- School of Physics, Southeast University , Nanjing 211189, China
| | - Yixin Ouyang
- School of Physics, Southeast University , Nanjing 211189, China
| | - Chongyi Ling
- School of Physics, Southeast University , Nanjing 211189, China
| | - Qiang Li
- School of Physics, Southeast University , Nanjing 211189, China
| | - Jinlan Wang
- School of Physics, Southeast University , Nanjing 211189, China
- Synergetic Innovation Center for Quantum Effects and Applications (SICQEA), Hunan Normal University , Changsha 410081, China
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139
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Ho PH, Chang YR, Chu YC, Li MK, Tsai CA, Wang WH, Ho CH, Chen CW, Chiu PW. High-Mobility InSe Transistors: The Role of Surface Oxides. ACS NANO 2017; 11:7362-7370. [PMID: 28661128 DOI: 10.1021/acsnano.7b03531] [Citation(s) in RCA: 25] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/28/2023]
Abstract
In search of high-performance field-effect transistors (FETs) made of atomic thin semiconductors, indium selenide (InSe) has held great promise because of its high intrinsic mobility and moderate electronic band gap (1.26 eV). Yet the performance of InSe FETs is decisively determined by the surface oxidation of InSe taking place spontaneously in ambient conditions, setting up a mobility ceiling and causing an uncontrollable current hysteresis. Encapsulation by hexagonal boron nitride (h-BN) has been currently used to cope with this deterioration. Here, we provide insights into the role of surface oxides played in device performance and introduce a dry-oxidation process that forms a dense capping layer on top, where InSe FETs exhibit a record-high two-probe mobility of 423 cm2/V·s at room temperature and 1006 cm2/V·s at liquid nitrogen temperature without the use of h-BN encapsulation or high-κ dielectric screening. Ultrahigh on/off current ratio of >108 and current density of 365 μA/μm can be readily achieved without elaborate engineering of drain/source contacts or gating technique. Thickness-dependent device properties are also studied, with optimized performance shown in FETs comprising of 13 nm thick InSe. The high performance of InSe FETs with ultrathin dry oxide is attributed to the effective unpinning of the Fermi level at the metal contacts, resulting in a low Schottky barrier height of 40 meV in an optimized channel thickness.
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Affiliation(s)
- Po-Hsun Ho
- Department of Electrical Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan
| | - Yih-Ren Chang
- Department of Materials Science and Engineering, National Taiwan University , Taipei 10617, Taiwan
| | - Yu-Cheng Chu
- Department of Electrical Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan
| | - Min-Ken Li
- Department of Materials Science and Engineering, National Taiwan University , Taipei 10617, Taiwan
| | - Che-An Tsai
- Institute of Atomic and Molecular Sciences, Academia Sinica , Taipei 10617, Taiwan
| | - Wei-Hua Wang
- Institute of Atomic and Molecular Sciences, Academia Sinica , Taipei 10617, Taiwan
| | - Ching-Hwa Ho
- Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology , Taipei 10617, Taiwan
| | - Chun-Wei Chen
- Department of Materials Science and Engineering, National Taiwan University , Taipei 10617, Taiwan
| | - Po-Wen Chiu
- Department of Electrical Engineering, National Tsing Hua University , Hsinchu 30013, Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica , Taipei 10617, Taiwan
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140
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Zhou M, Jiang X, Yang Y, Guo Y, Lin Z, Yao JJ, Wu Y. K2
ZnSn3
Se8
: A Non-Centrosymmetric Zinc Selenidostannate(IV) Featuring Interesting Covalently Bonded [ZnSn3
Se8
]2−
Layer and Exhibiting Intriguing Second Harmonic Generation Activity. Chem Asian J 2017; 12:1282-1285. [DOI: 10.1002/asia.201700426] [Citation(s) in RCA: 15] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/20/2017] [Revised: 04/12/2017] [Indexed: 11/12/2022]
Affiliation(s)
- Molin Zhou
- Beijing Center for Crystal R&D; Key Laboratory of Functional Crystals and Laser Technology of Chinese Academy of Sciences; Technical Institute of Physics and Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China
- University of Chinese Academy of Sciences; Beijing 100049 P.R. China
| | - Xingxing Jiang
- Beijing Center for Crystal R&D; Key Laboratory of Functional Crystals and Laser Technology of Chinese Academy of Sciences; Technical Institute of Physics and Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China
| | - Yi Yang
- Beijing Center for Crystal R&D; Key Laboratory of Functional Crystals and Laser Technology of Chinese Academy of Sciences; Technical Institute of Physics and Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China
- University of Chinese Academy of Sciences; Beijing 100049 P.R. China
| | - Yangwu Guo
- Beijing Center for Crystal R&D; Key Laboratory of Functional Crystals and Laser Technology of Chinese Academy of Sciences; Technical Institute of Physics and Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China
- University of Chinese Academy of Sciences; Beijing 100049 P.R. China
| | - Zheshuai Lin
- Beijing Center for Crystal R&D; Key Laboratory of Functional Crystals and Laser Technology of Chinese Academy of Sciences; Technical Institute of Physics and Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China
| | - JJiyong Yao
- Beijing Center for Crystal R&D; Key Laboratory of Functional Crystals and Laser Technology of Chinese Academy of Sciences; Technical Institute of Physics and Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China
| | - Yicheng Wu
- Beijing Center for Crystal R&D; Key Laboratory of Functional Crystals and Laser Technology of Chinese Academy of Sciences; Technical Institute of Physics and Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China
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141
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Yang Z, Jie W, Mak CH, Lin S, Lin H, Yang X, Yan F, Lau SP, Hao J. Wafer-Scale Synthesis of High-Quality Semiconducting Two-Dimensional Layered InSe with Broadband Photoresponse. ACS NANO 2017; 11:4225-4236. [PMID: 28316242 DOI: 10.1021/acsnano.7b01168] [Citation(s) in RCA: 51] [Impact Index Per Article: 7.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Large-scale synthesis of two-dimensional (2D) materials is one of the significant issues for fabricating layered materials into practical devices. As one of the typical III-VI semiconductors, InSe has attracted much attention due to its outstanding electrical transport property, attractive quantum physics characteristics, and dramatic photoresponse when it is reduced to atomic scale. However, scalable synthesis of single phase 2D InSe has not yet been achieved so far, greatly hindering further fundamental studies and device applications. Here, we demonstrate the direct growth of wafer-scale layered InSe nanosheets by pulsed laser deposition (PLD). The obtained InSe layers exhibit good uniformity, high crystallinity with macro texture feature, and stoichiometric growth by in situ precise control. The characterization of optical properties indicates that PLD grown InSe nanosheets have a wide range tunable band gap (1.26-2.20 eV) among the large-scale 2D crystals. The device demonstration of field-effect transistor shows the n-type channel feature with high mobility of 10 cm2 V-1 s-1. Upon illumination, InSe-based phototransistors show a broad photoresponse to the wavelengths from ultraviolet to near-infrared. The maximum photoresponsivity attains 27 A/W, plus a response time of 0.5 s for the rise and 1.7 s for the decay, demonstrating the strong and fast photodetection ability. Our findings suggest that the PLD grown InSe would be a promising choice for future device applications in the 2D limit.
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Affiliation(s)
- Zhibin Yang
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
- The Hong Kong Polytechnic University Shenzhen Research Institute , Shenzhen 518057, P. R. China
| | - Wenjing Jie
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
- The Hong Kong Polytechnic University Shenzhen Research Institute , Shenzhen 518057, P. R. China
| | - Chun-Hin Mak
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
| | - Shenghuang Lin
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
| | - Huihong Lin
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
| | - Xianfeng Yang
- Analytical and Testing Center, South China University of Technology , Guangzhou 510641, P. R. China
| | - Feng Yan
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
| | - Shu Ping Lau
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
| | - Jianhua Hao
- Department of Applied Physics, The Hong Kong Polytechnic University , Hung Hom, Hong Kong P. R. China
- The Hong Kong Polytechnic University Shenzhen Research Institute , Shenzhen 518057, P. R. China
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142
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Atomic Layer Growth of InSe and Sb2Se3 Layered Semiconductors and Their Heterostructure. ELECTRONICS 2017. [DOI: 10.3390/electronics6020027] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]
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143
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Ai R, Guan X, Li J, Yao K, Chen P, Zhang Z, Duan X, Duan X. Growth of Single-Crystalline Cadmium Iodide Nanoplates, CdI 2/MoS 2 (WS 2, WSe 2) van der Waals Heterostructures, and Patterned Arrays. ACS NANO 2017; 11:3413-3419. [PMID: 28303713 DOI: 10.1021/acsnano.7b01507] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/08/2023]
Abstract
Two-dimensional layered materials (2DLMs) have attracted considerable recent interest for their layer-number-dependent physical and chemical properties, as well as potential technological opportunities. Here we report the synthesis of two-dimensional layered cadmium iodide (CdI2) nanoplates using a vapor transport and deposition approach. Optical microscopy and scanning electron microscopy studies show that the resulting CdI2 nanoplates predominantly adopt hexagonal and triangular morphologies with a lateral dimension of ∼2-10 μm. Atomic force microscopy studies show that the resulting nanoplates exhibit a thickness in the range of 5-220 nm with a relatively smooth surface. X-ray diffraction studies reveal highly crystalline CdI2 in hexagonal phase, which is also confirmed by the characteristic Raman Ag mode at 110 cm-1. High-resolution transmission electron microscopy and selected area electron diffraction reveal that the resulting CdI2 nanoplates are single crystals. Taking a step further, we show the CdI2 nanoplates were readily grown on other 2DLMs (e.g., WS2, WSe2, MoS2), forming diverse van der Waals heterostructures. Using prepatterned WS2 monolayer square arrays as the nucleation and growth templates, we also show that regular arrays of CdI2/WS2 vertical heterostructures can be prepared. The synthesis of the CdI2 nanoplates, heterostructures, and heterostructure arrays offers a valuable material system for 2D materials science and technology.
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Affiliation(s)
- Ruoqi Ai
- State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University , Changsha 410082, China
| | - Xun Guan
- State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University , Changsha 410082, China
| | - Jia Li
- State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University , Changsha 410082, China
| | - Kangkang Yao
- State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University , Changsha 410082, China
| | - Peng Chen
- State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University , Changsha 410082, China
| | - Zhengwei Zhang
- State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University , Changsha 410082, China
| | - Xidong Duan
- State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University , Changsha 410082, China
| | - Xiangfeng Duan
- Department of Chemistry and Biochemistry, California NanoSystems Institute, University of California, Los Angeles , Los Angeles, California 90095, United States
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144
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Brotons-Gisbert M, Andres-Penares D, Martínez-Pastor JP, Cros A, Sánchez-Royo JF. Optical contrast of 2D InSe on SiO 2/Si and transparent substrates using bandpass filters. NANOTECHNOLOGY 2017; 28:115706. [PMID: 28117306 DOI: 10.1088/1361-6528/aa5bb1] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The particular optical and electronic properties recently reported for 2D InSe depict this 2D material as being very versatile for future electronic and optoelectronic devices with tunable and optimized functionalities. For its fundamental study and the development of practical applications, rapid and accurate identification methods of atomically thin InSe are essential. Here, we demonstrate an enhancement of the optical contrast between InSe nanosheets and the underlying SiO2/Si substrate by illuminating with a 40 nm wide bandpass filter centered at 500 nm. Moreover, we study the optical contrast of 2D InSe on transparent substrates. Our results suggest that a good optical contrast is achieved for transparent substrates with low real refractive indices such as LiF or a viscoelastic polydimethylsiloxane stamp. In this case, an optimum optical contrast would be achieved by using a bandpass filter centered at 450 nm. These results can be very useful for speeding up the continuously growing research on 2D InSe and its applications.
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145
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Bandurin DA, Tyurnina AV, Yu GL, Mishchenko A, Zólyomi V, Morozov SV, Kumar RK, Gorbachev RV, Kudrynskyi ZR, Pezzini S, Kovalyuk ZD, Zeitler U, Novoselov KS, Patanè A, Eaves L, Grigorieva IV, Fal'ko VI, Geim AK, Cao Y. High electron mobility, quantum Hall effect and anomalous optical response in atomically thin InSe. NATURE NANOTECHNOLOGY 2017; 12:223-227. [PMID: 27870843 DOI: 10.1038/nnano.2016.242] [Citation(s) in RCA: 366] [Impact Index Per Article: 52.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/26/2016] [Accepted: 10/10/2016] [Indexed: 05/25/2023]
Abstract
A decade of intense research on two-dimensional (2D) atomic crystals has revealed that their properties can differ greatly from those of the parent compound. These differences are governed by changes in the band structure due to quantum confinement and are most profound if the underlying lattice symmetry changes. Here we report a high-quality 2D electron gas in few-layer InSe encapsulated in hexagonal boron nitride under an inert atmosphere. Carrier mobilities are found to exceed 103 cm2 V-1 s-1 and 104 cm2 V-1 s-1 at room and liquid-helium temperatures, respectively, allowing the observation of the fully developed quantum Hall effect. The conduction electrons occupy a single 2D subband and have a small effective mass. Photoluminescence spectroscopy reveals that the bandgap increases by more than 0.5 eV with decreasing the thickness from bulk to bilayer InSe. The band-edge optical response vanishes in monolayer InSe, which is attributed to the monolayer's mirror-plane symmetry. Encapsulated 2D InSe expands the family of graphene-like semiconductors and, in terms of quality, is competitive with atomically thin dichalcogenides and black phosphorus.
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Affiliation(s)
- Denis A Bandurin
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, UK
| | - Anastasia V Tyurnina
- Skolkovo Institute of Science and Technology, Nobel St. 3, 143026 Moscow, Russia
- National Graphene Institute, University of Manchester, Manchester M13 9PL, UK
| | - Geliang L Yu
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, UK
| | - Artem Mishchenko
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, UK
| | - Viktor Zólyomi
- National Graphene Institute, University of Manchester, Manchester M13 9PL, UK
| | - Sergey V Morozov
- Institute of Microelectronics Technology and High Purity Materials, RAS, Chernogolovka 142432, Russia
- National University of Science and Technology 'MISiS', Leninsky Pr. 4, 119049 Moscow, Russia
| | | | - Roman V Gorbachev
- National Graphene Institute, University of Manchester, Manchester M13 9PL, UK
| | - Zakhar R Kudrynskyi
- School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, UK
| | - Sergio Pezzini
- High Field Magnet Laboratory (HFML -EMFL), Radboud University, Toernooiveld 7, 6525 ED Nijmegen, The Netherlands
| | - Zakhar D Kovalyuk
- National Academy of Sciences of Ukraine, Institute for Problems of Materials Science, UA-58001 Chernovtsy, Ukraine
| | - Uli Zeitler
- High Field Magnet Laboratory (HFML -EMFL), Radboud University, Toernooiveld 7, 6525 ED Nijmegen, The Netherlands
| | | | - Amalia Patanè
- School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, UK
| | - Laurence Eaves
- School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, UK
| | - Irina V Grigorieva
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, UK
| | - Vladimir I Fal'ko
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, UK
- National Graphene Institute, University of Manchester, Manchester M13 9PL, UK
| | - Andre K Geim
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, UK
| | - Yang Cao
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, UK
- National Graphene Institute, University of Manchester, Manchester M13 9PL, UK
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146
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Abstract
A controllable strategy for the fabrication of N-channel and P-channel few-layer InSe field-effect transistors has been developed.
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Affiliation(s)
- Lin Tao
- College of Material and Energy
- Guangdong University of Technology
- Guangzhou 510006
- People's Republic of China
| | - Yongtao Li
- College of Material and Energy
- Guangdong University of Technology
- Guangzhou 510006
- People's Republic of China
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147
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Lauth J, Kinge S, Siebbeles LD. Ultrafast Transient Absorption and Terahertz Spectroscopy as Tools to Probe Photoexcited States and Dynamics in Colloidal 2D Nanostructures. ACTA ACUST UNITED AC 2016. [DOI: 10.1515/zpch-2016-0911] [Citation(s) in RCA: 13] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2022]
Abstract
Abstract
Two-dimensional (2D) semiconductors hold high potential for the implementation of efficient ultrathin electronics (e.g. field-effect transistors, light emitting diodes and solar cell devices). In recent years, colloidal methods to synthesize ultrathin 2D materials have been developed that offer alternatives (like the production of non-layered 2D materials and upscaling) to mechanical exfoliation methods. By focusing on optoelectronic applications, it is important to characterize the nature and dynamics of photoexcited states in these materials. In this paper, we use ultrafast transient absorption (TA) and terahertz (THz) spectroscopy as optimal tools for such a characterization. We choose recently synthesized ultrathin colloidal 2D InSe nanosheets (inorganic layer thickness 0.8–1.7 nm; ≤5 nm including ligands) for discussing TA and THz spectroscopic studies and elucidate their charge carrier dynamics under photoexcitation with TA. THz spectroscopy is then used to extract contactless AC mobilities as high as 20±2 cm2/Vs in single InSe layers. The obtained results underpin the general applicability of TA and THz spectroscopy for characterizing photoexcited states in 2D semiconductors.
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Affiliation(s)
- Jannika Lauth
- Chemical Engineering Department, Delft University of Technology, Van der Maasweg 9, NL-2629 HZ Delft, The Netherlands
| | - Sachin Kinge
- Toyota Motor Europe, Materials Research and Development, Hoge Wei 33, B-1930, Zaventem, Belgium
| | - Laurens D.A. Siebbeles
- Chemical Engineering Department, Delft University of Technology, Van der Maasweg 9, NL-2629 HZ Delft, The Netherlands
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148
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The direct-to-indirect band gap crossover in two-dimensional van der Waals Indium Selenide crystals. Sci Rep 2016; 6:39619. [PMID: 28008964 PMCID: PMC5180233 DOI: 10.1038/srep39619] [Citation(s) in RCA: 127] [Impact Index Per Article: 15.9] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/12/2016] [Accepted: 11/23/2016] [Indexed: 12/12/2022] Open
Abstract
The electronic band structure of van der Waals (vdW) layered crystals has properties that depend on the composition, thickness and stacking of the component layers. Here we use density functional theory and high field magneto-optics to investigate the metal chalcogenide InSe, a recent addition to the family of vdW layered crystals, which transforms from a direct to an indirect band gap semiconductor as the number of layers is reduced. We investigate this direct-to-indirect bandgap crossover, demonstrate a highly tuneable optical response from the near infrared to the visible spectrum with decreasing layer thickness down to 2 layers, and report quantum dot-like optical emissions distributed over a wide range of energy. Our analysis also indicates that electron and exciton effective masses are weakly dependent on the layer thickness and are significantly smaller than in other vdW crystals. These properties are unprecedented within the large family of vdW crystals and demonstrate the potential of InSe for electronic and photonic technologies.
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149
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Zhou X, Zhang Q, Gan L, Li H, Xiong J, Zhai T. Booming Development of Group IV-VI Semiconductors: Fresh Blood of 2D Family. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2016; 3:1600177. [PMID: 27981008 PMCID: PMC5157174 DOI: 10.1002/advs.201600177] [Citation(s) in RCA: 69] [Impact Index Per Article: 8.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/05/2016] [Indexed: 05/19/2023]
Abstract
As an important component of 2D layered materials (2DLMs), the 2D group IV metal chalcogenides (GIVMCs) have drawn much attention recently due to their earth-abundant, low-cost, and environmentally friendly characteristics, thus catering well to the sustainable electronics and optoelectronics applications. In this instructive review, the booming research advancements of 2D GIVMCs in the last few years have been presented. First, the unique crystal and electronic structures are introduced, suggesting novel physical properties. Then the various methods adopted for synthesis of 2D GIVMCs are summarized such as mechanical exfoliation, solvothermal method, and vapor deposition. Furthermore, the review focuses on the applications in field effect transistors and photodetectors based on 2D GIVMCs, and extends to flexible devices. Additionally, the 2D GIVMCs based ternary alloys and heterostructures have also been presented, as well as the applications in electronics and optoelectronics. Finally, the conclusion and outlook have also been presented in the end of the review.
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Affiliation(s)
- Xing Zhou
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Qi Zhang
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Lin Gan
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Huiqiao Li
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Jie Xiong
- State Key Laboratory of Electronic Thin Films and Integrated DevicesUniversity of Electronic Science and Technology of ChinaChengdu611731P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
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150
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Luxa J, Wang Y, Sofer Z, Pumera M. Layered Post-Transition-Metal Dichalcogenides (X−M−M−X) and Their Properties. Chemistry 2016; 22:18810-18816. [DOI: 10.1002/chem.201604168] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/02/2016] [Indexed: 11/06/2022]
Affiliation(s)
- Jan Luxa
- Department of Inorganic Chemistry; University of Chemistry and Technology Prague; Technicka 5 166 28 Prague 6 Czech Republic
| | - Yong Wang
- Division of Chemistry and Biological Chemistry; School of Physical and Mathematical Science; Nanyang Technological University; 21 Nanyang Link 637371 Singapore
| | - Zdenek Sofer
- Department of Inorganic Chemistry; University of Chemistry and Technology Prague; Technicka 5 166 28 Prague 6 Czech Republic
| | - Martin Pumera
- Division of Chemistry and Biological Chemistry; School of Physical and Mathematical Science; Nanyang Technological University; 21 Nanyang Link 637371 Singapore
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