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Priebe A, Michler J. Review of Recent Advances in Gas-Assisted Focused Ion Beam Time-of-Flight Secondary Ion Mass Spectrometry (FIB-TOF-SIMS). MATERIALS (BASEL, SWITZERLAND) 2023; 16:2090. [PMID: 36903205 PMCID: PMC10003971 DOI: 10.3390/ma16052090] [Citation(s) in RCA: 5] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/26/2023] [Revised: 02/21/2023] [Accepted: 02/26/2023] [Indexed: 06/18/2023]
Abstract
Time-of-flight secondary ion mass spectrometry (TOF-SIMS) is a powerful chemical characterization technique allowing for the distribution of all material components (including light and heavy elements and molecules) to be analyzed in 3D with nanoscale resolution. Furthermore, the sample's surface can be probed over a wide analytical area range (usually between 1 µm2 and 104 µm2) providing insights into local variations in sample composition, as well as giving a general overview of the sample's structure. Finally, as long as the sample's surface is flat and conductive, no additional sample preparation is needed prior to TOF-SIMS measurements. Despite many advantages, TOF-SIMS analysis can be challenging, especially in the case of weakly ionizing elements. Furthermore, mass interference, different component polarity of complex samples, and matrix effect are the main drawbacks of this technique. This implies a strong need for developing new methods, which could help improve TOF-SIMS signal quality and facilitate data interpretation. In this review, we primarily focus on gas-assisted TOF-SIMS, which has proven to have potential for overcoming most of the aforementioned difficulties. In particular, the recently proposed use of XeF2 during sample bombardment with a Ga+ primary ion beam exhibits outstanding properties, which can lead to significant positive secondary ion yield enhancement, separation of mass interference, and inversion of secondary ion charge polarity from negative to positive. The implementation of the presented experimental protocols can be easily achieved by upgrading commonly used focused ion beam/scanning electron microscopes (FIB/SEM) with a high vacuum (HV)-compatible TOF-SIMS detector and a commercial gas injection system (GIS), making it an attractive solution for both academic centers and the industrial sectors.
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2
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Budnik G, Scott JA, Jiao C, Maazouz M, Gledhill G, Fu L, Tan HH, Toth M. Nanoscale 3D Tomography by In-Flight Fluorescence Spectroscopy of Atoms Sputtered by a Focused Ion Beam. NANO LETTERS 2022; 22:8287-8293. [PMID: 36215134 DOI: 10.1021/acs.nanolett.2c03101] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Nanoscale fabrication and characterization techniques critically underpin a vast range of fields, including nanoelectronics and nanobiotechnology. Focused ion beam (FIB) techniques are appealing due to their high spatial resolution and widespread use for processing of nanostructured materials. Here, we introduce FIB-induced fluorescence spectroscopy (FIB-FS) as a nanoscale technique for spectroscopic detection of atoms sputtered by an ion beam. We use semiconductor heterostructures to demonstrate nanoscale lateral and depth resolution and show that it is limited by ion-induced intermixing of nanostructured materials. Sensitivity is demonstrated qualitatively by depth profiling of 3.5, 5, and 8 nm quantum wells and quantitatively by detection of trace-level impurities present at parts-per-million levels. The utility of the FIB-FS technique is demonstrated by characterization of quantum wells and Li-ion batteries. Our work introduces FIB-FS as a high-resolution, high-sensitivity, 3D analysis and tomography technique that combines the versatility of FIB nanofabrication techniques with the power of diffraction-unlimited fluorescence spectroscopy.
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Affiliation(s)
- Garrett Budnik
- School of Mathematical and Physical Sciences, University of Technology Sydney, Ultimo, NSW 2007, Australia
- Thermo Fisher Scientific, Hillsboro, Oregon 97124, United States
| | - John A Scott
- School of Mathematical and Physical Sciences, University of Technology Sydney, Ultimo, NSW 2007, Australia
- ARC Centre of Excellence for Transformative Meta-Optical Systems, University of Technology Sydney, Ultimo, NSW 2007, Australia
| | - Chengge Jiao
- Thermo Fisher Scientific, Eindhoven 5651 GG, The Netherlands
| | - Mostafa Maazouz
- Thermo Fisher Scientific, Hillsboro, Oregon 97124, United States
| | - Galen Gledhill
- Thermo Fisher Scientific, Hillsboro, Oregon 97124, United States
| | - Lan Fu
- Australian Research Council Centre of Excellence for Transformative Meta-Optical Systems, Department of Electronic Materials Engineering, Research School of Physics, The Australian National University, Canberra, ACT 2600, Australia
| | - Hark Hoe Tan
- Australian Research Council Centre of Excellence for Transformative Meta-Optical Systems, Department of Electronic Materials Engineering, Research School of Physics, The Australian National University, Canberra, ACT 2600, Australia
| | - Milos Toth
- School of Mathematical and Physical Sciences, University of Technology Sydney, Ultimo, NSW 2007, Australia
- ARC Centre of Excellence for Transformative Meta-Optical Systems, University of Technology Sydney, Ultimo, NSW 2007, Australia
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3
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De Castro O, Audinot JN, Hoang HQ, Coulbary C, Bouton O, Barrahma R, Ost A, Stoffels C, Jiao C, Dutka M, Geryk M, Wirtz T. Magnetic Sector Secondary Ion Mass Spectrometry on FIB-SEM Instruments for Nanoscale Chemical Imaging. Anal Chem 2022; 94:10754-10763. [PMID: 35862487 PMCID: PMC9352148 DOI: 10.1021/acs.analchem.2c01410] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Abstract
![]()
The structural, morphological,
and chemical characterization of
samples is of utmost importance for a large number of scientific fields.
Furthermore, this characterization very often needs to be performed
in three dimensions and at length scales down to the nanometer. Therefore,
there is a stringent necessity to develop appropriate instrumentational
solutions to fulfill these needs. Here we report on the deployment
of magnetic sector secondary ion mass spectrometry (SIMS) on a type
of instrument widely used for such nanoscale investigations, namely,
focused ion beam (FIB)–scanning electron microscopy (SEM) instruments.
First, we present the layout of the FIB-SEM-SIMS instrument and address
its performance by using specific test samples. The achieved performance
can be summarized as follows: an overall secondary ion beam transmission
above 40%, a mass resolving power (M/ΔM) of more than 400, a detectable mass range from 1 to 400
amu, a lateral resolution in two-dimensional (2D) chemical imaging
mode of 15 nm, and a depth resolution of ∼4 nm at 3.0 keV of
beam landing energy. Second, we show results (depth profiling, 2D
imaging, three-dimensional imaging) obtained in a wide range of areas,
such as battery research, photovoltaics, multilayered samples, and
life science applications. We hereby highlight the system’s
versatile capability of conducting high-performance correlative studies
in the fields of materials science and life sciences.
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Affiliation(s)
- Olivier De Castro
- Advanced Instrumentation for Nano-Analytics, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Jean-Nicolas Audinot
- Advanced Instrumentation for Nano-Analytics, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Hung Quang Hoang
- Advanced Instrumentation for Nano-Analytics, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Chérif Coulbary
- Advanced Instrumentation for Nano-Analytics, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Olivier Bouton
- Prototyping, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Rachid Barrahma
- Prototyping, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Alexander Ost
- Advanced Instrumentation for Nano-Analytics, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg.,Faculty of Science, Technology and Medicine, University of Luxembourg, 2 Avenue de l'Université, L-4365 Esch-sur-Alzette, Luxembourg
| | - Charlotte Stoffels
- Advanced Instrumentation for Nano-Analytics, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg.,Faculty of Science, Technology and Medicine, University of Luxembourg, 2 Avenue de l'Université, L-4365 Esch-sur-Alzette, Luxembourg
| | - Chengge Jiao
- Thermo Fisher Scientific; Achtseweg Noord 5, 5651 GG Eindhoven, Netherlands
| | - Mikhail Dutka
- Thermo Fisher Scientific; Achtseweg Noord 5, 5651 GG Eindhoven, Netherlands
| | - Michal Geryk
- Thermo Fisher Scientific; Vlastimila Pecha 12, 627 00 Brno, Czech Republic
| | - Tom Wirtz
- Advanced Instrumentation for Nano-Analytics, MRT Department, Luxembourg Institute of Science and Technology, 41 rue du Brill, L-4422 Belvaux, Luxembourg
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4
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Unger WES, Senoner M, Stockmann JM, Fernandez V, Fairley N, Passiu C, Spencer ND, Rossi A. Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam‐based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X‐ray photoelectron spectrometers (XPS). SURF INTERFACE ANAL 2021. [DOI: 10.1002/sia.7025] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/30/2023]
Affiliation(s)
- Wolfgang E. S. Unger
- Surface Analysis & Interfacial Chemistry Bundesanstalt für Materialforschung und ‐prüfung (BAM) Berlin Germany
| | - Mathias Senoner
- Surface Analysis & Interfacial Chemistry Bundesanstalt für Materialforschung und ‐prüfung (BAM) Berlin Germany
| | - Jörg M. Stockmann
- Surface Analysis & Interfacial Chemistry Bundesanstalt für Materialforschung und ‐prüfung (BAM) Berlin Germany
| | - Vincent Fernandez
- Service d'analyse de surface Institut des Matériaux Jean Rouxel (IMN) Nantes Cedex 3 France
| | | | - Cristiana Passiu
- Laboratory for Surface Science and Technology, Department of Materials ETH Zurich Zürich Switzerland
| | - Nicholas D. Spencer
- Laboratory for Surface Science and Technology, Department of Materials ETH Zurich Zürich Switzerland
| | - Antonella Rossi
- Laboratory for Surface Science and Technology, Department of Materials ETH Zurich Zürich Switzerland
- Dipartimento di Scienze Chimiche e Geologiche Università di Cagliari Monserrato (Cagliari) Italy
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Audinot JN, Philipp P, De Castro O, Biesemeier A, Hoang QH, Wirtz T. Highest resolution chemical imaging based on secondary ion mass spectrometry performed on the helium ion microscope. REPORTS ON PROGRESS IN PHYSICS. PHYSICAL SOCIETY (GREAT BRITAIN) 2021; 84:105901. [PMID: 34404033 DOI: 10.1088/1361-6633/ac1e32] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/08/2020] [Accepted: 08/17/2021] [Indexed: 06/13/2023]
Abstract
This paper is a review on the combination between Helium Ion Microscopy (HIM) and Secondary Ion Mass Spectrometry (SIMS), which is a recently developed technique that is of particular relevance in the context of the quest for high-resolution high-sensitivity nano-analytical solutions. We start by giving an overview on the HIM-SIMS concept and the underlying fundamental principles of both HIM and SIMS. We then present and discuss instrumental aspects of the HIM and SIMS techniques, highlighting the advantage of the integrated HIM-SIMS instrument. We give an overview on the performance characteristics of the HIM-SIMS technique, which is capable of producing elemental SIMS maps with lateral resolution below 20 nm, approaching the physical resolution limits, while maintaining a sub-nanometric resolution in the secondary electron microscopy mode. In addition, we showcase different strategies and methods allowing to take profit of both capabilities of the HIM-SIMS instrument (high-resolution imaging using secondary electrons and mass filtered secondary sons) in a correlative approach. Since its development HIM-SIMS has been successfully applied to a large variety of scientific and technological topics. Here, we will present and summarise recent applications of nanoscale imaging in materials research, life sciences and geology.
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Affiliation(s)
- Jean-Nicolas Audinot
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Patrick Philipp
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Olivier De Castro
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Antje Biesemeier
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Quang Hung Hoang
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
| | - Tom Wirtz
- Advanced Instrumentation for Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg
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Priebe A, Pethö L, Huszar E, Xie T, Utke I, Michler J. High Sensitivity of Fluorine Gas-Assisted FIB-TOF-SIMS for Chemical Characterization of Buried Sublayers in Thin Films. ACS APPLIED MATERIALS & INTERFACES 2021; 13:15890-15900. [PMID: 33769781 DOI: 10.1021/acsami.1c01627] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
In this work, we present the potential of high vacuum-compatible time-of-flight secondary ion mass spectrometry (TOF-SIMS) detectors, which can be integrated within focused ion beam (FIB) instruments for precise and fast chemical characterization of thin films buried deep under the sample surface. This is demonstrated on complex multilayer systems composed of alternating ceramic and metallic layers with thicknesses varying from several nanometers to hundreds of nanometers. The typical problems of the TOF-SIMS technique, that is, low secondary ion signals and mass interference between ions having similar masses, were solved using a novel approach of co-injecting fluorine gas during the sample surface sputtering. In the most extreme case of the Al/Al2O3/Al/Al2O3/.../Al sample, a <10 nm thick Al2O3 thin film buried under a 0.5 μm material was detected and spatially resolved using only 27Al+ signal distribution. This is an impressive achievement taking into account that Al and Al2O3 layers varied only by a small amount of oxygen content. Due to its high sensitivity, fluorine gas-assisted FIB-TOF-SIMS can be used for quality control of nano- and microdevices as well as for the failure analysis of fabrication processes. Therefore, it is expected to play an important role in the development of microelectronics and thin-film-based devices for energy applications.
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Affiliation(s)
- Agnieszka Priebe
- Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Laszlo Pethö
- Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Emese Huszar
- Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
- Laboratory for Nanometallurgy, Department of Materials, ETH Zurich, Vladimir-Prelog-Weg 5, 8093 Zurich, Switzerland
| | - Tianle Xie
- Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
- College of Material Science and Engineering, Hunan University, 2 Lushan S Rd, Yuelu, 410082 Changsha, P.R. China
| | - Ivo Utke
- Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Johann Michler
- Laboratory for Mechanics of Materials and Nanostructures, Empa, Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
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7
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Kaja K, Mariolle D, Chevalier N, Naja A, Jouiad M. Sub-10 nm spatial resolution for electrical properties measurements using bimodal excitation in electric force microscopy. THE REVIEW OF SCIENTIFIC INSTRUMENTS 2021; 92:023703. [PMID: 33648128 DOI: 10.1063/5.0038335] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/20/2020] [Accepted: 01/13/2021] [Indexed: 06/12/2023]
Abstract
We demonstrate that under ambient and humidity-controlled conditions, operation of bimodal excitation single-scan electric force microscopy with no electrical feedback loop increases the spatial resolution of surface electrical property measurements down to the 5 nm limit. This technical improvement is featured on epitaxial graphene layers on SiC, which is used as a model sample. The experimental conditions developed to achieve such resolution are discussed and linked to the stable imaging achieved using the proposed method. The application of the herein reported method is achieved without the need to apply DC bias voltages, which benefits specimens that are highly sensitive to polarization. Besides, it allows the simultaneous parallel acquisition of surface electrical properties (such as contact potential difference) at the same scanning rate as in amplitude modulation atomic force microscopy (AFM) topography measurements. This makes it attractive for applications in high scanning speed AFM experiments in various fields for material screening and metrology of semiconductor systems.
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Affiliation(s)
- Khaled Kaja
- Laboratoire National de Métrologie et d'Essais, 29 Rue Roger Hennequin, 78190 Trappes, France
| | - Denis Mariolle
- Univ. Grenoble Alpes, CEA, Leti, F-38000 Grenoble, France
| | | | - Adnan Naja
- Laboratory of Physics and Modelling, EDST, Lebanese University, 1300 Tripoli, Lebanon
| | - Mustapha Jouiad
- Laboratory of Physics of Condensed Matter, LPMC, Université de Picardie Jules Verne, 80093 Amiens, France
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8
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Nicholas M, Josefson M, Fransson M, Wilbs J, Roos C, Boissier C, Thalberg K. Quantification of surface composition and surface structure of inhalation powders using TOF-SIMS. Int J Pharm 2020; 587:119666. [PMID: 32702450 DOI: 10.1016/j.ijpharm.2020.119666] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/11/2020] [Revised: 07/11/2020] [Accepted: 07/15/2020] [Indexed: 12/12/2022]
Abstract
A multivariate TOF-SIMS methodology has been developed and applied to quantify surface composition and chemical distribution for dry powder blends. Surface properties are often critical to the behavior of powder formulations, especially in the case of dry powders for inhalation, as surface properties directly affect inter-particulate forces and, hence, the dispersibility of the formulation. The mass spectrum at each pixel was fit to a linear combination of reference spectra obtained by non-negatively constrained alternating least squares. From the pixel compositions, average surface coverage and a range of other image features were calculated. Two kinds of systems have been examined: 1) binary blends of lactose particles and coating agents, and 2) blends of different inhalation drugs with carrier lactose. For both kinds of systems, detailed insight into the surface composition and structure could be derived. For the former study, TOF-SIMS results were compared with a complementary surface analysis technique, XPS.
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Affiliation(s)
- Mark Nicholas
- AstraZeneca Pharmaceutical Technology & Development, Gothenburg, Sweden.
| | - Mats Josefson
- AstraZeneca Pharmaceutical Technology & Development, Gothenburg, Sweden
| | - Magnus Fransson
- AstraZeneca Pharmaceutical Technology & Development, Gothenburg, Sweden
| | - Jonas Wilbs
- AstraZeneca Pharmaceutical Technology & Development, Gothenburg, Sweden
| | - Carl Roos
- AstraZeneca Pharmaceutical Technology & Development, Gothenburg, Sweden
| | | | - Kyrre Thalberg
- AstraZeneca Pharmaceutical Technology & Development, Gothenburg, Sweden.
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9
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Abstract
Abstract
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10
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Klingner N, Heller R, Hlawacek G, Facsko S, von Borany J. Time-of-flight secondary ion mass spectrometry in the helium ion microscope. Ultramicroscopy 2018; 198:10-17. [PMID: 30612043 DOI: 10.1016/j.ultramic.2018.12.014] [Citation(s) in RCA: 15] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/31/2018] [Revised: 12/20/2018] [Accepted: 12/23/2018] [Indexed: 10/27/2022]
Abstract
A helium ion microscope, known for high resolution imaging and modification with helium or neon ions, has been equipped with a time-of-flight spectrometer for compositional analysis. Here we report on its design, implementation and show first results of this powerful add-on. Our design considerations were based on the results of detailed ion collision cascade simulations that focus on the physically achievable resolution for various detection limits. Different secondary ion extraction geometries and spectrometer types are considered and compared with respect to the demands and limitations of the microscope. As a result the development and evaluation of a secondary ion extraction optics and time-of-flight spectrometer that allows the parallel measurement of all secondary ion masses is reported. First experimental results demonstrate an excellent mass resolution as well as high-resolution secondary ion imaging capabilities with sub-8 nm lateral resolution. The combination of high resolution secondary electron images and mass-separated sputtered ion distributions have a high potential to answer open questions in microbiology, cell biology, earth sciences and materials research.
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Affiliation(s)
- N Klingner
- Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Bautzner Landstr. 400, Dresden 01328, Germany.
| | - R Heller
- Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Bautzner Landstr. 400, Dresden 01328, Germany
| | - G Hlawacek
- Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Bautzner Landstr. 400, Dresden 01328, Germany
| | - S Facsko
- Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Bautzner Landstr. 400, Dresden 01328, Germany
| | - J von Borany
- Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Bautzner Landstr. 400, Dresden 01328, Germany
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11
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Almosni S, Delamarre A, Jehl Z, Suchet D, Cojocaru L, Giteau M, Behaghel B, Julian A, Ibrahim C, Tatry L, Wang H, Kubo T, Uchida S, Segawa H, Miyashita N, Tamaki R, Shoji Y, Yoshida K, Ahsan N, Watanabe K, Inoue T, Sugiyama M, Nakano Y, Hamamura T, Toupance T, Olivier C, Chambon S, Vignau L, Geffroy C, Cloutet E, Hadziioannou G, Cavassilas N, Rale P, Cattoni A, Collin S, Gibelli F, Paire M, Lombez L, Aureau D, Bouttemy M, Etcheberry A, Okada Y, Guillemoles JF. Material challenges for solar cells in the twenty-first century: directions in emerging technologies. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 2018; 19:336-369. [PMID: 29707072 PMCID: PMC5917436 DOI: 10.1080/14686996.2018.1433439] [Citation(s) in RCA: 30] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/07/2017] [Revised: 01/15/2018] [Accepted: 01/24/2018] [Indexed: 05/23/2023]
Abstract
Photovoltaic generation has stepped up within the last decade from outsider status to one of the important contributors of the ongoing energy transition, with about 1.7% of world electricity provided by solar cells. Progress in materials and production processes has played an important part in this development. Yet, there are many challenges before photovoltaics could provide clean, abundant, and cheap energy. Here, we review this research direction, with a focus on the results obtained within a Japan-French cooperation program, NextPV, working on promising solar cell technologies. The cooperation was focused on efficient photovoltaic devices, such as multijunction, ultrathin, intermediate band, and hot-carrier solar cells, and on printable solar cell materials such as colloidal quantum dots.
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Affiliation(s)
- Samy Almosni
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Amaury Delamarre
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Zacharie Jehl
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | - Daniel Suchet
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | | | - Maxime Giteau
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | - Benoit Behaghel
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- IPVF, UMR CNRS 9006, Palaiseau, France
- Centre for Nanoscience and Nanotechnology (C2N), CNRS, University Paris-Sud/Paris-Saclay, Palaiseau, France
| | - Anatole Julian
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
| | - Camille Ibrahim
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
| | - Léa Tatry
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
| | - Haibin Wang
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Takaya Kubo
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Satoshi Uchida
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Komaba Organization for Educational Excellence, Faculty of Arts and Sciences, The University of Tokyo, Tokyo, Japan
| | - Hiroshi Segawa
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Department of General Systems Studies, Graduate School of Arts and Sciences, The University of Tokyo, Tokyo, Japan
| | - Naoya Miyashita
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | - Ryo Tamaki
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | - Yasushi Shoji
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | - Katsuhisa Yoshida
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | - Nazmul Ahsan
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
| | - Kentaro Watanabe
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Tomoyuki Inoue
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Masakazu Sugiyama
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Yoshiaki Nakano
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
| | - Tomofumi Hamamura
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Department of General Systems Studies, Graduate School of Arts and Sciences, The University of Tokyo, Tokyo, Japan
- University of Bordeaux, Institut des Sciences Moléculaires (ISM), CNRS (UMR 5255), Talence Cédex, France
| | - Thierry Toupance
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- University of Bordeaux, Institut des Sciences Moléculaires (ISM), CNRS (UMR 5255), Talence Cédex, France
| | - Céline Olivier
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- University of Bordeaux, Institut des Sciences Moléculaires (ISM), CNRS (UMR 5255), Talence Cédex, France
| | - Sylvain Chambon
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- University of Bordeaux, IMS, CNRS UMR 5218, Talence, France
| | - Laurence Vignau
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- University of Bordeaux, IMS, CNRS UMR 5218, Talence, France
| | - Camille Geffroy
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Université de Bordeaux, Laboratoire de Chimie des Polymères Organiques (LCPO), UMR 5629, ENSCBP, IPB, Pessac Cedex, France
| | - Eric Cloutet
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Université de Bordeaux, Laboratoire de Chimie des Polymères Organiques (LCPO), UMR 5629, ENSCBP, IPB, Pessac Cedex, France
| | - Georges Hadziioannou
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Université de Bordeaux, Laboratoire de Chimie des Polymères Organiques (LCPO), UMR 5629, ENSCBP, IPB, Pessac Cedex, France
| | - Nicolas Cavassilas
- Aix Marseille Université, CNRS, Université de Toulon, IM2NP UMR 7334, Marseille, France
| | - Pierre Rale
- Centre for Nanoscience and Nanotechnology (C2N), CNRS, University Paris-Sud/Paris-Saclay, Palaiseau, France
| | - Andrea Cattoni
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Centre for Nanoscience and Nanotechnology (C2N), CNRS, University Paris-Sud/Paris-Saclay, Palaiseau, France
| | - Stéphane Collin
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Centre for Nanoscience and Nanotechnology (C2N), CNRS, University Paris-Sud/Paris-Saclay, Palaiseau, France
| | | | | | - Laurent Lombez
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- IPVF, UMR CNRS 9006, Palaiseau, France
| | - Damien Aureau
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin (UVSQ), Université Paris-Saclay, Versailles, France
| | - Muriel Bouttemy
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin (UVSQ), Université Paris-Saclay, Versailles, France
| | - Arnaud Etcheberry
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin (UVSQ), Université Paris-Saclay, Versailles, France
| | - Yoshitaka Okada
- NextPV, LIA RCAST-CNRS, The University of Tokyo, Tokyo, Japan
- Research Center for Advanced Science and Technology, The University of Tokyo, Tokyo, Japan
- Okadalab, Research Center for Advanced Science and Technology (RCAST), The University of Tokyo, Tokyo, Japan
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12
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Tai T, Kertesz V, Lin MW, Srijanto BR, Hensley DK, Xiao K, Van Berkel GJ. Polymeric spatial resolution test patterns for mass spectrometry imaging using nano-thermal analysis with atomic force microscopy. RAPID COMMUNICATIONS IN MASS SPECTROMETRY : RCM 2017; 31:1204-1210. [PMID: 28493365 DOI: 10.1002/rcm.7894] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/28/2016] [Revised: 05/03/2017] [Accepted: 05/04/2017] [Indexed: 06/07/2023]
Abstract
RATIONALE As the spatial resolution of mass spectrometry imaging technologies has begun to reach into the nanometer regime, finding readily available or easily made resolution reference materials has become particularly challenging for molecular imaging purposes. This paper describes the fabrication, characterization and use of vertical line array polymeric spatial resolution test patterns for nano-thermal analysis/atomic force microscopy/mass spectrometry chemical imaging. METHODS Test patterns of varied line width (0.7 or 1.0 μm) and spacing (0.7 or 1.0 μm) were created in an ~1-μm-thick poly(methyl methacrylate) thin film using electron beam lithography. The patterns were characterized by scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy topography and nano-thermal analysis/mass spectrometry imaging. RESULTS The efficacy of these polymeric test patterns for the advancement of chemical imaging techniques was illustrated by their use to judge the spatial resolution improvement achieved by heating the ionization interface of the current instrument platform. The spatial resolution of the mass spectral chemical images was estimated to be 1.4 μm, based on the ability to statistically distinguish 0.7-μm-wide lines separated by 0.7-μm-wide spacings in those images when the interface cross was heated to 200°C. CONCLUSIONS This work illustrates that e-beam lithography is a viable method to create spatial resolution test patterns in a thin film of high molecular weight polymer to allow unbiased judgment of intra-laboratory advancement and/or inter-laboratory comparison of instrument advances in nano-thermal analysis/atomic force microscopy/mass spectrometry chemical imaging. Published in 2017. This article is a U.S. Government work and is in the public domain in the USA.
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Affiliation(s)
- Tamin Tai
- Mass Spectrometry and Laser Spectroscopy Group, Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
- Laboratory for Physical Sciences, 8050 Greenmead Drive, College Park, MD, 20740, USA
| | - Vilmos Kertesz
- Mass Spectrometry and Laser Spectroscopy Group, Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Ming-Wei Lin
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Bernadeta R Srijanto
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Dale K Hensley
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Kai Xiao
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Gary J Van Berkel
- Mass Spectrometry and Laser Spectroscopy Group, Chemical Sciences Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
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13
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Passiu C, Rossi A, Bernard L, Paul D, Hammond J, Unger WES, Venkataraman NV, Spencer ND. Fabrication and Microscopic and Spectroscopic Characterization of Planar, Bimetallic, Micro- and Nanopatterned Surfaces. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2017; 33:5657-5665. [PMID: 28502183 DOI: 10.1021/acs.langmuir.7b00942] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Micropatterns and nanopatterns of gold embedded in silver and titanium embedded in gold have been prepared by combining either photolithography or electron-beam lithography with a glue-free template-stripping procedure. The obtained patterned surfaces have been topographically characterized using atomic force microscopy and scanning electron microscopy, showing a very low root-mean-square roughness (<0.5 nm), high coplanarity between the two metals (maximum height difference ≈ 2 nm), and topographical continuity at the bimetallic interface. Spectroscopic characterization using X-ray photoelectron spectroscopy (XPS), time-of-flight secondary-ion mass spectrometry (ToF-SIMS), and Auger electron spectroscopy (AES) has shown a sharp chemical contrast between the two metals at the interface for titanium patterns embedded in gold, whereas diffusion of silver into gold was observed for gold patterns embedded in silver. Surface flatness combined with a high chemical contrast makes the obtained surfaces suitable for applications involving functionalization with molecules by orthogonal adsorption chemistries or for instrumental calibration. The latter possibility has been tested by determining the image sharpness and the analyzed area on circular patterns of different sizes for each of the spectroscopic techniques applied for characterization.This is the first study in which the analyzed area has been determined using XPS and AES on a flat surface, and the first example of a method for determining the analyzed area using ToF-SIMS.
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Affiliation(s)
- Cristiana Passiu
- Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich , Vladimir-Prelog-Weg 5, CH-8093 Zurich, Switzerland
| | - Antonella Rossi
- Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich , Vladimir-Prelog-Weg 5, CH-8093 Zurich, Switzerland
- Dipartimento di Scienze Chimiche e Geologiche, Università degli Studi di Cagliari, Cittadella Universitaria di Monserrato , I-09042 Cagliari, Italy
| | | | - Dennis Paul
- Physical Electronics USA , 18725 Lake Drive East, Chanhassen, Minnesota 55317, United States
| | - John Hammond
- Physical Electronics USA , 18725 Lake Drive East, Chanhassen, Minnesota 55317, United States
| | - Wolfgang E S Unger
- BAM Federal Institute for Materials Research and Testing , Unter den Eichen 87, 12205 Berlin, Germany
| | - Nagaiyanallur V Venkataraman
- Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich , Vladimir-Prelog-Weg 5, CH-8093 Zurich, Switzerland
| | - Nicholas D Spencer
- Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich , Vladimir-Prelog-Weg 5, CH-8093 Zurich, Switzerland
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14
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van Elteren JT, Izmer A, Šelih VS, Vanhaecke F. Novel Image Metrics for Retrieval of the Lateral Resolution in Line Scan-Based 2D LA-ICPMS Imaging via an Experimental-Modeling Approach. Anal Chem 2016; 88:7413-20. [PMID: 27349804 DOI: 10.1021/acs.analchem.6b02052] [Citation(s) in RCA: 20] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/13/2023]
Abstract
The quality of elemental image maps obtained via line scan-based LA-ICPMS is a function of the temporal response of the entire system, governed by the design of the system and mapping and acquisition conditions used, next to the characteristics of the sample. To quantify image degradation, ablation targets with periodic gratings are required for the construction of a modulation transfer function (MTF) and subsequent determination of the lateral resolution as a function of image noise and contrast. Since such ablation targets, with suitable matrix composition, are not readily available, computer-generated periodic gratings were virtually ablated via a computational process based on a two-step discrete-time convolution procedure using empirical/experimental input data. This experimental-modeling procedure simulates LA-ICPMS imaging based on two consecutive processes, viz., LA sampling (via ablation crater profiles [ACP]) and aerosol washout/transfer/ICPMS measurement (via single pulse responses [SPR]). By random selection of experimental SPRs from a large database for each individual pulse during the simulation, the convolution procedure simulates an accurate elemental image map of the periodic gratings with realistic (proportional or flicker) noise. This facilitates indirect retrieval of the experimental lateral resolution for the matrix targeted without performing actual line scanning on periodic gratings.
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Affiliation(s)
- Johannes Teun van Elteren
- Department of Analytical Chemistry, National Institute of Chemistry , Hajdrihova 19, SI-1000 Ljubljana, Slovenia
| | - Andrei Izmer
- Department of Analytical Chemistry, Ghent University , Campus Sterre, Krijgslaan 281-S12, B-9000 Ghent, Belgium
| | - Vid Simon Šelih
- Department of Analytical Chemistry, National Institute of Chemistry , Hajdrihova 19, SI-1000 Ljubljana, Slovenia
| | - Frank Vanhaecke
- Department of Analytical Chemistry, Ghent University , Campus Sterre, Krijgslaan 281-S12, B-9000 Ghent, Belgium
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Hodoroaba VD, Rades S, Salge T, Mielke J, Ortel E, Schmidt R. Characterisation of nanoparticles by means of high-resolution SEM/EDS in transmission mode. ACTA ACUST UNITED AC 2016. [DOI: 10.1088/1757-899x/109/1/012006] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
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