Electrodeposition of Ru by atomic layer deposition (ALD)

Enhanced Kinetics of Electrochemical Hydrogen Uptake and Release by Palladium Powders Modified by Electrochemical Atomic Layer Deposition

Electrochemical atomic layer deposition (E-ALD) is a method for the formation of nanofilms of materials, one atomic layer at a time. It uses the galvanic exchange of a less noble metal, deposited using underpotential deposition (UPD), to produce an atomic layer of a more noble element by reduction of its ions. This process is referred to as surface limited redox replacement and can be repeated in a cycle to grow thicker deposits. It was previously performed on nanoparticles and planar substrates. In the present report, E-ALD is applied for coating a submicron-sized powder substrate, making use of a new flow cell design. E-ALD is used to coat a Pd powder substrate with different thicknesses of Rh by exchanging it for Cu UPD. Cyclic voltammetry and X-ray photoelectron spectroscopy indicate an increasing Rh coverage with increasing numbers of deposition cycles performed, in a manner consistent with the atomic layer deposition (ALD) mechanism. Cyclic voltammetry also indicated increased kinetics of H sorption and desorption in and out of the Pd powder with Rh present, relative to unmodified Pd.

Atomic Layer Deposition from Dissolved Precursors

We establish a novel thin film deposition technique by transferring the principles of atomic layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a liquid. An established ALD reaction behaves similarly when performed from solutions. "Solution ALD" (sALD) can coat deep pores in a conformal manner. sALD offers novel opportunities by overcoming the need for volatile and thermally robust precursors. We establish a MgO sALD procedure based on the hydrolysis of a Grignard reagent.

Layer-by-layer evolution of structure, strain, and activity for the oxygen evolution reaction in graphene-templated Pt monolayers

In this study, we explore the dimensional aspect of structure-driven surface properties of metal monolayers grown on a graphene/Au template. Here, surface limited redox replacement (SLRR) is used to provide precise layer-by-layer growth of Pt monolayers on graphene. We find that after a few iterations of SLRR, fully wetted 4-5 monolayer Pt films can be grown on graphene. Incorporating graphene at the Pt-Au interface modifies the growth mechanism, charge transfers, equilibrium interatomic distances, and associated strain of the synthesized Pt monolayers. We find that a single layer of sandwiched graphene is able to induce a 3.5% compressive strain on the Pt adlayer grown on it, and as a result, catalytic activity is increased due to a greater areal density of the Pt layers beyond face-centered-cubic close packing. At the same time, the sandwiched graphene does not obstruct vicinity effects of near-surface electron exchange between the substrate Au and adlayers Pt. X-ray photoelectron spectroscopy (XPS) and extended X-ray absorption fine structure (EXAFS) techniques are used to examine charge mediation across the Pt-graphene-Au junction and the local atomic arrangement as a function of the Pt adlayer dimension. Cyclic voltammetry (CV) and the oxygen reduction reaction (ORR) are used as probes to examine the electrochemically active area of Pt monolayers and catalyst activity, respectively. Results show that the inserted graphene monolayer results in increased activity for the Pt due to a graphene-induced compressive strain, as well as a higher resistance against loss of the catalytically active Pt surface.

PtRu nanofilm formation by electrochemical atomic layer deposition (E-ALD)

The high CO tolerance of PtRu electrocatalysis, compared with pure Pt and other Pt-based alloys, makes it interesting as an anode material in proton exchange membrane fuel cells (PEMFC) and direct methanol fuel cells (DMFC). This report describes the formation of bimetallic PtRu nanofilms using the electrochemical form of atomic layer deposition (E-ALD). Metal nanofilm formation using E-ALD is facilitated by use of surface-limited redox replacement (SLRR), where an atomic layer (AL) of a sacrificial metal is first formed by UPD. The AL is then spontaneously exchanged for a more noble metal at the open-circuit potential (OCP). In the present study, PtRu nanofilms were formed using SLRR for Pt and Ru, and Pb UPD was used to form the sacrificial layers. The PtRu E-ALD cycle consisted of Pb UPD at -0.19 V, followed by replacement using Pt(IV) ions at OCP, rinsing with blank, then Pb UPD at -0.19 V, followed by replacement using Ru(III) ions at OCP. PtRu nanofilm thickness was controlled by the number of times the cycle was repeated. PtRu nanofilms with atomic proportions of 70/30, 82/18, and 50/50 Pt/Ru were formed on Au on glass slides using related E-ALD cycles. The charge for Pb UPD and changes in the OCP during replacement were monitored during the deposition process. The PtRu films were then characterized by CO adsorption and electrooxidation to determine their overpotentials. The 50/50 PtRu nanofilms displayed the lowest CO electrooxidation overpotentials as well as the highest currents, compared with the other alloy compositions, pure Pt, and pure Ru. In addition, CO electrooxidation studies of the terminating AL on the 50/50 PtRu nanostructured alloy were investigated by deposition of one or two SLRR of Pt, Ru, or PtRu on top.

Electrochemical deposition of subnanometer Ni films on TiN

In this paper, we show the electrochemical deposition of a subnanometer film of nickel (Ni) on top of titanium nitride (TiN). We exploit the concept of cluster growth inhibition to enhance the nucleation of new nuclei on the TiN substrate. By deliberately using an unbuffered electrolyte solution, the degree of nucleation is enhanced as growth is inhibited more strongly. This results in a very high particle density and therefore an ultralow coalescence thickness. To prevent the termination of Ni deposition that typically occurs in unbuffered solutions, the concentration of Ni(2+) in solution was increased. We have verified with RBS and ICP-MS that the deposition of Ni on the surface in this case did not terminate. Furthermore, annealing experiments were used to visualize the closed nature of the Ni film. The closure of the deposited film was also confirmed by TOF-SIMS measurements and occurs when the film thickness is still in the subnanometer regime. The ultrathin Ni film was found to be an excellent catalyst for carbon nanotube growth on conductive substrates and can also be applied as a seed layer for bulk deposition of a smooth Ni film on TiN.

Tailoring the catalytic activity of electrodes with monolayer amounts of foreign metals

During the past decade, electrocatalysis has attracted significant attention primarily due to the increased interest in the development of new generations of devices for electrochemical energy conversion. This has resulted in a progress in both fundamental understanding of the complex electrocatalytic systems and in the development of efficient synthetic schemes to tailor the surface precisely at the atomic level. One of the viable concepts in electrocatalysis is to optimise the activity through the direct engineering of the properties of the topmost layers of the surface, where the reactions take place, with monolayer and sub-monolayer amounts of metals. This forms (bi)metallic systems where the electronic structure of the active sites is optimised using the interplay between the nature and position of the atoms of solute metals at the surface. In this review, we focus on recent theoretical and experimental achievements in designing efficient (bi)metallic electrocatalysts with selective positioning of foreign atoms to form a variety of active catalytic sites at the electrode surface. We summarize recent results published in the literature and outline challenges for computational and experimental electrocatalysis to engineer active and selective catalysts using atomic layers.

Formation of palladium nanofilms using electrochemical atomic layer deposition (E-ALD) with chloride complexation

Pd thin films were formed by electrochemical atomic layer deposition (E-ALD) using surface-limited redox replacement (SLRR) of Cu underpotential deposits (UPD) on polycrystalline Au substrates. An automated electrochemical flow deposition system was used to deposit Pd atomic layers using a sequence of steps referred to as a cycle. The initial step was Cu UPD, followed by its exchange for Pd ions at open circuit, and finishing with a blank rinse to complete the cycle. Deposits were formed with up to 75 cycles and displayed proportional deposit thicknesses. Previous reports by this group indicated excess Pd deposition at the flow cell ingress, from electron probe microanalysis (EPMA). Those results suggested that the SLRR mechanism did not involve direct transfer between a Cu(UPD) atom and a Pd(2+) ion that would take its position. Instead, it was proposed that electrons are transferred through the metallic surface to reduce Pd(2+) ions near the surface where their activity is highest. It was proposed that if the cell was filled completely before a significant fraction of the Cu(UPD) atoms had been oxidized then the deposit would be homogeneous. Previous work with EDTA indicated that the hypothesis had merit, but it proved to be very sensitive to the EDTA concentration. In the present study, chloride was used to complex Pd(2+) ions, forming PdCl(4)(2-), to slow the exchange rate. Both complexing agents led to a decrease in the rate of replacement, producing more homogeneous films. Although the use of EDTA improved the homogeneity, it also decreased the deposit thickness by a factor of 3 compared to the thickness obtained via the use of chloride.

Ultralow Pt-loading bimetallic nanoflowers: fabrication and sensing applications

Ultralow Pt-loading Au nanoflowers (AuNFs) were synthesized on a glassy carbon electrode surface by the underpotential deposition (UPD) monolayer redox replacement technique, which involves redox replacement of a copper UPD monolayer by PtCl(4)(2-) that can be reduced and deposited simultaneously. Field-emission scanning electron microscopy, energy dispersive spectroscopy, x-ray photoelectron spectroscopy and the electrochemical method were utilized to characterize the ultralow Pt-loading AuNFs. Cyclic voltammogram results showed that the ultralow Pt-loading AuNFs exhibited excellent electrocatalytic activity towards the reduction of hydrogen peroxide and the oxidation of glucose in neutral media, and the reaction pathway of glucose oxidation was changed from an intermediate process based on the electrosorption of glucose to a direct oxidation process. From chronoamperometric results, it could be obtained that this prepared biosensor had wide linear ranges and very low detection limits (DLs) for H(2)O(2) (0.025-94.3 μM; DL = 0.006 μM) and glucose (0.0028-8.0 mM; DL = 0.8 μM), which were much better than previous results.

Selective electrodesorption based atomic layer deposition (SEBALD): a novel electrochemical route to deposit metal clusters on Ag(111)

The possibility of synergic effects of some metals on the catalytic activity of silver led us to study the way to perform controlled deposition on silver. In fact, many metals of technological interest such as Co, Ni, and Fe cannot be deposited at underpotential on silver, and any attempt to control the deposition at overpotential, even at potentials slightly negative of the Nernst value, did not allow an effective control. However, due to the favorable energy gain involved in the formation of the corresponding sulfides, these metals can be deposited at underpotential on sulfur covered silver. The deposition is surface limited and the successive electrodesorption of sulfur leaves confined clusters of metals. The method can also be used to obtain metal clusters of different size. In fact, the alternate underpotential deposition of elements that form a compound is the basis of the electrochemical atomic layer epitaxy (ECALE), and the reiteration of the basic cycle allows us to obtain sulfide deposits whose thickness increases with the number of cycles. Therefore, the successive selective desorption of sulfur leaves increasing amounts of metals.

Cobalt monolayer islands on Ag(111) for ORR catalysis

The design of a catalyst for one of the most important electrocatalytic reactions, the oxygen reduction reaction (ORR), was done following the most recent guidelines of theoretical studies on this topic. Aim of this work was to achieve a synergic effect of two different metals acting on different steps of the ORR. The catalytic activity of Ag, already known and characterized, was enhanced by the presence of a monolayer of cobalt subdivided into nanosized islands. To obtain such a controlled nanostructure, a novel method utilizing self-assembled monolayers (SAMs) as templates was employed. In a recent study, we were able to perform a confined electrodeposition of cobalt onto Ag(111) in a template formed by selectively desorbing a short-chain thiol (3-mercaptopropionic acid, MPA) from binary SAMs using 1-dodecanthiols (DDT). This method allows for an excellent control of the morphology of the deposit by varying the molar ratio of the two thiols. Because cobalt does not deposit on silver at an underpotential, the alternative approach of surface limited redox replacement (SLRR) was used. This method, recently developed by Adžić et al., consists of the use of a monolayer of a third metal, which can be deposited at an underpotential, as a template for the spontaneous deposition of a more noble metal. Herein, we choose zinc as template for the deposition of cobalt. Ag(111) crystals were covered by monolayer islands consisting of cobalt, with the surface atomic ratios ranging from 12 to 39% for cobalt. The catalytic activity of such samples towards ORR was evaluated and the best improvement in activity was found to be that of the sample with a cobalt percentage of approximately 30% with respect to the bare silver, which is in good agreement with theoretical hypotheses.

Aqueous electrodeposition of Ge monolayers

The electrodeposition of germanium on Au(111) in aqueous solutions has been investigated by means of cyclic voltammetry, Auger electron spectroscopy, and in situ scanning tunneling microscopy (STM). The data yield a picture of germanium deposition, which starts with the formation of two well-ordered hydroxide phases, with 1/3 ML and 4/9 ML coverages upon initial reduction of the Ge(IV) species (probably H(2)GeO(3) at pH 4.7). Those structures appear to result from a three-electron reduction to form surface-limited structures with (square root(3) x square root(3))R30 degrees or (3 x 3) unit cells, respectively. Further reduction, probably in a two-electron process from the hydroxide structures, resulted in a germanium hydride structure, again surface-limited, with a coverage of close to 0.8 ML. The hydride structure is very flat, though with the periodic modulation characteristic of a Moiré pattern. Longer deposition times and lower potentials resulted in increased coverage of Ge in some cases, but with apparently limited coverage as a function of pH. The maximum Ge coverage, about 4 ML, was observed using a pH 9.32 deposition solution. At potentials negative of the Moiré pattern, about -850 mV versus Ag/AgCl, a "corruption" of the smooth Moiré pattern occurred. This roughening appears to mark the initial formation of a Au-Ge alloy, accounting for the observation of coverage in excess of that needed to form the Moiré pattern at some pH values.

Electrodeposition of multilayered bimetallic nanoclusters of ruthenium and platinum via surface-limited redox-replacement reactions for electrocatalytic applications

An electrochemical synthesis of multilayered bimetallic Ru|Pt nanoclusters, supported on glassy carbon, is reported for the first time. The novel nanoclusters were synthesized via surface-limited redox-replacement reactions involving sacrificial Cu, deposited prior to the formation of each individual noble metal layer, in a sequential fashion. It has been shown that the Cu adlayers control the morphology and electrochemical properties of the resultant nanostructures. Sequentially deposited Ru|Pt nanoclusters exhibited superior electrocatalytic activity (when compared to equivalent monometallic Pt and an alloy-type codeposited Pt-Ru nanostructures) with respect to methanol electrooxidation in an acidic medium. Moreover, it has been established that the electrochemical process taking place at the Ru|Pt nanoclusters followed the bifunctional mechanism. Electrokinetic studies of the oxygen reduction reaction (ORR) were also performed. Analysis of hydrodynamic linear sweep voltammetric experiments, performed at various flow rates on oxygen-saturated acidic medium, revealed that the Pt and Ru|Pt nanoclusters exhibited direct four- and two-electron ORR pathways, respectively. A specially designed electrochemical flow-cell was used for automated sequential electrodeposition of the multilayered nanoclusters of predefined composition and electrochemical and electrocatalytic investigations.

Multifunctional 3D nanoarchitectures for energy storage and conversion

The design and fabrication of three-dimensional multifunctional architectures from the appropriate nanoscale building blocks, including the strategic use of void space and deliberate disorder as design components, permits a re-examination of devices that produce or store energy as discussed in this critical review. The appropriate electronic, ionic, and electrochemical requirements for such devices may now be assembled into nanoarchitectures on the bench-top through the synthesis of low density, ultraporous nanoarchitectures that meld high surface area for heterogeneous reactions with a continuous, porous network for rapid molecular flux. Such nanoarchitectures amplify the nature of electrified interfaces and challenge the standard ways in which electrochemically active materials are both understood and used for energy storage. An architectural viewpoint provides a powerful metaphor to guide chemists and materials scientists in the design of energy-storing nanoarchitectures that depart from the hegemony of periodicity and order with the promise--and demonstration--of even higher performance (265 references).