Molecular layer deposition of thiol-ene multilayers on semiconductor surfaces

Effect of Electric Fields on Silicon-Based Monolayers

Electric fields can induce bond breaking and bond forming, catalyze chemical reactions on surfaces, and change the structure of self-assembled monolayers on electrode surfaces. Here, we study the effect of electric fields supplied either by an electrochemical potential or by conducting atomic force microscopy (C-AFM) on Si-based monolayers. We report that typical monolayers on silicon undergo partial desorption followed by the oxidation of the underneath silicon at +1.5 V vs Ag/AgCl. The monolayer loses 28% of its surface coverage and 55% of its electron transfer rate constant (k_et) when +1.5 V electrochemical potential is applied on the Si surface for 10 min. Similarly, a bias voltage of +5 V applied by C-AFM induces complete desorption of the monolayer at specific sites accompanied by an average oxide growth of 2.6 nm when the duration of the bias applied is 8 min. Current-voltage plots progressively change from rectifying, typical of metal-semiconductor junctions, to insulating as the oxide grows. These results define the stability of Si-based organic monolayers toward electric fields and have implication in the design of silicon-based monolayers, molecular electronics devices, and on the interpretation of charge-transfer kinetics across them.

In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

Organic thin films formed by molecular layer deposition (MLD) are important for next-generation electronics, energy storage, photoresists, protective barriers and other applications. This study uses in situ ellipsometry and quartz crystal microbalance to explore growth initiation and growth rate evolution during MLD of polyurea using aromatic p-phenylene diisocyanate (PDIC) or aliphatic 1,6-hexamethylene diisocyanate (HDIC) combined with ethylenediamine (ED) or 1,6-hexanediamine (HD) co-reactants. During the first 10-20 cycles of growth, we show the growth rate can increase and/or decrease substantially depending on the substrate as well as the flexibility, length, and structure of the isocyanate and amine reactants used. The transition from initial to steady growth is attributed to a change in active surface site density as the growth proceeds, where the number of sites is determined by a balance between steric effects that block active sites, double reactions that consume multiple active sites, and precursor physisorption and sub-surface diffusion that create new active sites, where the extent of each mechanism depends on the precursors and deposition conditions. Results shown here provide useful insight into mechanisms needed to control growth of ultra-thin organic films for advanced applications.

Reactive films fabricated using click sulfur(vi)–fluoride exchange reactions via layer-by-layer assembly

We describe a novel and efficient method to generate tunable multifunctional polymer films with a wide range of potential biomedical applications using the “sulfur(vi)–fluoride exchange” (SuFEx) click reaction.

Grafting Hyperbranched Polymers onto TiO2 Nanoparticles via Thiol-yne Click Chemistry and Its Effect on the Mechanical, Thermal and Surface Properties of Polyurethane Coating

In this study, we proposed a novel and facile method to modify the surface of TiO₂ nanoparticles and investigated the influence of the surface-modified TiO₂ nanoparticles as an additive in a polyurethane (PU) coating. The hyperbranched polymers (HBP) were grafted on the surface of TiO₂ nanoparticles via the thiol-yne click chemistry to reduce the aggregation of nanoparticles and increase the interaction between TiO₂ and polymer matrices. The grafting of HBP on the TiO₂ nanoparticles surface was investigated by means of X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), Fourier transform infrared (FT-IR), nuclear magnetic resonance (NMR) and thermogravimetry analysis (TGA). The thermal and mechanical properties of nanocomposite coatings containing various amounts of TiO₂ nanoparticles were measured by dynamic mechanical thermal (DMTA) and tensile strength measurement. Moreover, the surface structure and properties of the newly prepared nanocomposite coatings were examined. The experimental results demonstrate that the incorporation of the surface-modified TiO₂ nanoparticles can improve the mechanical and thermal properties of nanocomposite coatings. The results also reveal that the surface modification of TiO₂ with the HBP chains improves the nanoparticle dispersion, and the coating surface shows a lotus leaf-like microstructure. Thus, the functional nanocomposite coatings exhibit superhydrophobic properties, good photocatalytic depollution performance, and high stripping resistance.

Growth of a Surface-Tethered, All-Carbon Backboned Fluoropolymer by Photoactivated Molecular Layer Deposition

The synthesis of an all-carbon backboned fluoropolymer using photoactivated molecular layer deposition (pMLD) is developed. pMLD is a vapor-phase, layer-by-layer, organic thin film synthesis method utilizing UV light, allowing for the creation of materials previously unavailable via thermal MLD. The carbon backbone is achieved by reacting an iodine-containing fluorocarbon monomer (1,4-diiodooctafluorobutane) and a diene monomer (1,5-hexadiene) under UV irradiation in a step-growth polymerization sequence. The polymerization occurs with a growth rate of 1.3 Å/cycle, forming a copolymer containing hydrocarbon and fluorocarbon segments. X-ray photoelectron spectroscopy (XPS) was used to confirm the formation of new carbon-carbon bonds and quantify the final film composition. In situ XPS thermal annealing experiments confirm the film stability up to 400 °C. The ability to pattern the fluoropolymer on a surface is demonstrated using a photomask, suggesting that these films could be incorporated into photolithographic processes. Together, these results demonstrate that pMLD can be used to synthesize carbon backboned films with photopatterning ability, expanding the available chemistries and potential applications of MLD polymers.

Shape-Memory Assisted Scratch-Healing of Transparent Thiol-Ene Coatings

A photopolymerizable thiol-ene composition was prepared as a mixture of pentaerythritol tetrakis(3-mercaptopropionate) (PETMP) and 1,3,5-triallyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione (TTT), with 1 wt. % of 2,2-dimethoxy-2-phenylacetophenone (DMPA) photoinitiator. A systematic analytical analysis that investigated the crosslinked PETMP-TTT polymer coatings employed Fourier transform infrared spectroscopy, ultraviolet⁻visible spectroscopy, differential scanning calorimetry, thermogravimetric analysis, pencil hardness, thermo-mechanical cyclic tensile, scratch testing, and atomic force microscopy. These coatings exhibited high optical transparency and shape-memory that assisted scratch-healing properties. Scratches produced on the PETMP-TTT polymer coatings with different constant loadings (1.2 N, 1.5 N, and 2.7 N) were completely healed after the external stimulus was applied. The strain recovery ratio and total strain recovery ratio for PETMP-TTT polymer were found to be better than 94 ± 1% and 97 ± 1%, respectively. The crosslinked PETMP-TTT polymer network was also capable of initiating scratch recovery at ambient temperature conditions.

Shape-Memory Assisted Scratch-Healing of Transparent Thiol-Ene Coatings

A photopolymerizable thiol-ene composition was prepared as a mixture of pentaerythritol tetrakis(3-mercaptopropionate) (PETMP) and 1,3,5-triallyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione (TTT), with 1 wt. % of 2,2-dimethoxy-2-phenylacetophenone (DMPA) photoinitiator. A systematic analytical analysis that investigated the crosslinked PETMP-TTT polymer coatings employed Fourier transform infrared spectroscopy, ultraviolet⁻visible spectroscopy, differential scanning calorimetry, thermogravimetric analysis, pencil hardness, thermo-mechanical cyclic tensile, scratch testing, and atomic force microscopy. These coatings exhibited high optical transparency and shape-memory that assisted scratch-healing properties. Scratches produced on the PETMP-TTT polymer coatings with different constant loadings (1.2 N, 1.5 N, and 2.7 N) were completely healed after the external stimulus was applied. The strain recovery ratio and total strain recovery ratio for PETMP-TTT polymer were found to be better than 94 ± 1% and 97 ± 1%, respectively. The crosslinked PETMP-TTT polymer network was also capable of initiating scratch recovery at ambient temperature conditions.

Covalent layer-by-layer thin films with charge-transfer chromophores: side chain engineering for efficient Ag+ ion recognition in aqueous solutions

Covalent layer-by-layer (LbL) thin films are fabricated by a highly efficient [2+2] cycloaddition-retroelectrocyclization (CA-RE) reaction of aniline-substituted alkyne and 7,7,8,8-tetracyanoquinodimethane (TCNQ) moieties. Polystyrene bearing aniline-substituted alkyne side chains and TCNQ polyester were prepared as precursor polymers, then sequentially deposited and fixed by covalent bonds on an indium-tin-oxide (ITO) substrate. The successful alternate growth of the films was demonstrated by many techniques including absorption spectroscopy, surface roughness, and redox activities. Interestingly, the water contact angles of the film surface were dependent on the side chains of the polystyrene derivatives. When hydrophilic triethylene glycol was employed, the surface hydrophilicity was similar to that of the TCNQ polyester. In contrast, the use of hydrophobic n-hexyl groups resulted in a significant difference in the water contact angles between the polystyrene and TCNQ polyester. A similar difference occurred when the Ag+ ion recognition was studied by soaking the LbL films in aqueous solutions. The LbL films constructed from the polystyrene with triethylene glycol chains displayed a more rapid and significant recognition of Ag+ ions than those constructed from the polystyrene with n-hexyl chains.

Covalent layer-by-layer films: chemistry, design, and multidisciplinary applications

Covalent layer-by-layer (LbL) assembly is a powerful method used to construct functional ultrathin films that enables nanoscopic structural precision, componential diversity, and flexible design. Compared with conventional LbL films built using multiple noncovalent interactions, LbL films prepared using covalent crosslinking offer the following distinctive characteristics: (i) enhanced film endurance or rigidity; (ii) improved componential diversity when uncharged species or small molecules are stably built into the films by forming covalent bonds; and (iii) increased structural diversity when covalent crosslinking is employed in componential, spacial, or temporal (labile bonds) selective manners. In this review, we document the chemical methods used to build covalent LbL films as well as the film properties and applications achievable using various film design strategies. We expect to translate the achievement in the discipline of chemistry (film-building methods) into readily available techniques for materials engineers and thus provide diverse functional material design protocols to address the energy, biomedical, and environmental challenges faced by the entire scientific community.

Functional Covalent Layer-by-Layer Thin Films by [2 + 2] Cycloaddition-Retroelectrocyclization

Covalent layer-by-layer (LbL) thin films with the well-defined charge-transfer (CT) chromophores were fabricated by the highly efficient [2 + 2] cycloaddition-retroelectrocyclization (CA-RE) reaction between the dialkylaniline-substituted alkynes and 7,7,8,8-tetracyanoquinodimethane (TCNQ) moieties. The resulting thin films showed potent redox activities and Ag⁺ ion sensing ability due to the formed CT chromophores.

Molecular interaction-dependent surface potentials of sequentially polymerized alucone films

Here, we investigated the relationship between the surface potentials and molecular interactions in the alucone films grown by molecular layer deposition. Varying the C-C bond order of the organic precursors induced variations in inter-molecular interactions, resulting in variation in the surface potential, associated with the work function of the films.

Sequence-controlled molecular layers on surfaces by thiol–ene chemistry: synthesis and multitechnique characterization

Silicon surfaces were functionalized by thiol–ene chemistry using sequential reactions of different α,ω-dienes and α,ω-dithiols bearing marker moieties.

Intramolecular and Intermolecular Interactions in Hybrid Organic-Inorganic Alucone Films Grown by Molecular Layer Deposition

Investigation of molecular interactions in polymeric films is crucial for understanding and engineering multiscale physical phenomena correlated to device function and performance, but this often involves a compromise between theoretical and experimental data, because of poor film uniformity. Here, we report the intramolecular and intermolecular interactions inside the ultrathin and conformal hybrid organic-inorganic alucone films grown by molecular layer deposition, based on sequential and self-limiting surface reactions. Varying the carbon chain length of organic precursors, which affects their molecular flexibility, caused intramolecular interactions such as double reactions by bending of the molecular backbone, resulting in formation of hole vacancies in the films. Furthermore, intermolecular interactions in alucone polymeric films are dependent on the thermal kinetics of molecules, leading to binding failures and cross-linking at low and high growth temperatures, respectively. We illustrate these key interactions and identify molecular geometries and potential energies by density functional theory calculations.

Photocurrent generation in organic photodetectors with tailor-made active layers fabricated by layer-by-layer deposition

Photodetectors supply an electric response when illuminated. The detectors in this study consist of an active layer and a polyvinylidene fluoride (PVDF) blocking layer, which are sandwiched by an aluminum and an indium tin oxide (ITO) electrode. The active layer was prepared of Zn porphyrins and assembled by covalent layer-by-layer (LbL) deposition. Layer growth was monitored by UV-vis absorbance, ellipsometry, and X-ray photoelectron spectroscopy. Upon exposure to chopped light, the detectors show an alternating transient photocurrent, which is limited by the accumulation of space charges at the blocking layer/active layer interface. We could show that the number of photoactive layers has a significant impact on device performance. The fastest response was achieved with fewer layers. The highest photocurrents were measured for detectors with an intermediate number of layers, beyond which, more layers did not lead to an increase in the photocurrent despite containing more active material.

Nanoscale plasmonic stamp lithography on silicon

Nanoscale lithography on silicon is of interest for applications ranging from computer chip design to tissue interfacing. Block copolymer-based self-assembly, also called directed self-assembly (DSA) within the semiconductor industry, can produce a variety of complex nanopatterns on silicon, but these polymeric films typically require transformation into functional materials. Here we demonstrate how gold nanopatterns, produced via block copolymer self-assembly, can be incorporated into an optically transparent flexible PDMS stamp, termed a plasmonic stamp, and used to directly functionalize silicon surfaces on a sub-100 nm scale. We propose that the high intensity electric fields that result from the localized surface plasmons of the gold nanoparticles in the plasmonic stamps upon illumination with low intensity green light, lead to generation of electron-hole pairs in the silicon that drive spatially localized hydrosilylation. This approach demonstrates how localized surface plasmons can be used to enable functionalization of technologically relevant surfaces with nanoscale control.

Preparation of click thiol-ene/thiol-epoxy thermosets by controlled photo/thermal dual curing sequence

A new dual curing procedure based in the combination of UV-induced thiol-ene and thermal thiol-epoxy reactions has been established by the use of a latent amine precursor that can catalyze the thermal process.

Improving area-selective molecular layer deposition by selective SAM removal

Area selective molecular layer deposition (MLD) is a promising technique for achieving micro- or nanoscale patterned organic structures. However, this technique still faces challenges in attaining high selectivity, especially at large MLD cycle numbers. Here, we illustrate a new strategy for achieving high quality patterns in selective film deposition on patterned Cu/Si substrates. We employed the intrinsically selective adsorption of an octadecylphosphonic acid self-assembled monolayer (SAM) on Cu over Si surfaces to selectively create a resist layer only on Cu. MLD was then performed on the patterns to deposit organic films predominantly on the Si surface, with only small amounts growing on the Cu regions. A negative potential bias was subsequently applied to the pattern to selectively desorb the layer of SAMs electrochemically from the Cu surface while preserving the MLD films on Si. Selectivity could be enhanced up to 30-fold after this treatment.

Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques

Molecular layer deposition (MLD) of the hafnium alkoxide polymer known as "hafnicone" was grown using sequential exposures of tetrakis(dimethylamido) hafnium (TDMAH) and ethylene glycol (EG) as the reactants. In situ quartz crystal microbalance (QCM) experiments demonstrated self-limiting reactions and linear growth versus the number of TDMAH/EG reaction cycles. Ex situ X-ray reflectivity (XRR) analysis confirmed linear growth and measured the density of the hafnicone films. The hafnicone growth rates were temperature-dependent and decreased from 1.2 Å per cycle at 105 °C to 0.4 Å per cycle at 205 °C. The measured density was ∼3.0 g/cm(3) for the hafnicone films at all temperatures. Transmission electron microscopy images revealed very uniform and conformal hafnicone films. The XRR studies also showed that the hafnicone films were very stable with time. Nanoindentation measurements determined that the elastic modulus and hardness of the hafnicone films were 47 ± 2 and 2.6 ± 0.2 GPa, respectively. HfO2/hafnicone nanolaminate films also were fabricated using HfO2 atomic layer deposition (ALD) and hafnicone MLD at 145 °C. The in situ QCM measurements revealed that HfO2 ALD nucleation on the hafnicone MLD surface required at least 18 TDMAH/H2O cycles. Hafnicone alloys were also fabricated by combining HfO2 ALD and hafnicone MLD at 145 °C. The composition of the hafnicone alloy was varied by adjusting the relative number of TDMAH/H2O ALD cycles and TDMAH/EG MLD cycles in the reaction sequence. The electron density changed continuously from 8.2 × 10(23) e(-)/cm(3) for pure hafnicone MLD films to 2.4 × 10(24) e(-)/cm(3) for pure HfO2 ALD films. These hafnicone films and the HfO2/hafnicone nanolaminates and alloys may be useful for flexible thin-film devices.

Thiol–ene “click” reactions and recent applications in polymer and materials synthesis: a first update

This contribution serves as an update to a previous review (Polym. Chem.2010,1, 17–36) and highlights recent applications of thiol–ene ‘click’ chemistry as an efficient tool for both polymer/materials synthesis as well as modification.

ALD/MLD of novel layer-engineered Zn-based inorganic-organic hybrid thin films using heterobifunctional 4-aminophenol as an organic precursor

Here we present novel hybrid inorganic-organic thin films of the (-Zn-O-C(6)H(4)-NH-)(n) type deposited in an atomic/molecular layer-by-layer manner through sequential gas-surface reactions of separately introduced inorganic (diethyl zinc) and organic (4-aminophenol) precursor pulses. The organic precursor employed is heterobifunctional (containing both hydroxyl and amino groups) and possesses a rigid benzene backbone; these precursor characteristics are believed to suppress the unwanted double surface reactions and promote the ideal growth mechanism such that the film thickness is linearly controlled by the number of deposition cycles. The appreciably high growth rate of ~1.1 Å per cycle is found to remain constant in the deposition temperature range of 140-200 °C, but in practice our atomic/molecular layer deposition (ALD/MLD) process yields high-quality, uniform, smooth and relatively air-stable films even in a much wider temperature range from 140 up to 330 °C. The refractive index of the films is ~1.94 ± 0.01 independent of the deposition temperature and the density ranges within 1.5-1.7 g cm(-3).

Rapid formation of a dense sulfur layer on gold through use of triphenylmethane sulfenyl chloride as a precursor

The use of triphenylmethane sulfenyl chloride as a new precursor leads to the efficient deposition of sulfur on polycrystalline gold and Au(111) substrates. The modified surfaces are characterized using X-ray photoelectron spectroscopy (XPS), electrochemistry and scanning tunneling microscopy (STM). The XPS data shows the rapid deposition of polymeric sulfur within very short times. Electrochemical stripping cyclic voltammetry (CV) confirms the rapid deposition and shows that high coverage values are achieved. STM imaging shows the formation of a wide range sulfur layer and production of the well-known etch pits. High-resolution STM images confirm the high density of the sulfur layers and show formation of a long-range phase consisting of rhombus structures close to the previously described rectangular structures along with other parallelograms and partial parallelograms. The present results do not show the initial formation of any organic self-assembled monolayer (SAM) indicating that the formation of polymeric sulfur does not result from the decomposition of an initial SAM as previously observed with alkyl and aryl thiolate-based SAMs. The suggested mechanism involves an initial reductive process similar to the one reported for thiocyanates and sulfenyl chlorides. This is followed by the dissociation of the Ph(3)C-S bond, leaving only sulfur on the surface, through a process leading to the recombination of the remaining fragments to yield triphenylmethyl chloride.

UV-initiated hydrosilylation on hydrogen-terminated silicon (111): rate coefficient increase of two orders of magnitude in the presence of aromatic electron acceptors

UV-initiated (254 nm) hydrosilylation of hexadecene on Si(111)-H has been studied in the presence of various aliphatic and aromatic molecules (additives). Many of these additives cause an enhancement in the pseudo-first-order rate coefficient (k(obs)) of hydrosilylation, some up to 200× faster than observed in neat hexadecene. It is proposed that these additives capture the photoejected electron from the surface, thereby increasing the probability of reaction of the alkene with the surface hole (h(+)), leading to Si-C bond formation. While the ability of these additives to increase k(obs) is related to their reduction potential, aromatic additives are particularly efficient; we suspect this is due to the relatively strong physisorption of the aromatic molecules leading to a favorable geometry for electron transfer. The presence of these additives permits the use of a much lower intensity of UV light (~30 μW/cm(2)), reducing the probability of photodegradation of the monolayer, and maximum coverage can be reached within minutes.

Oligomer orientation in vapor-molecular-layer-deposited alkyl-aromatic polyamide films

The surface-limited molecular-layer deposition of alkyl-aromatic polyamide films using sequential doses of 1,4-butane diamine (BDA) and terephthaloyl dichloride (TDC) is characterized using in situ quartz crystal microbalance and ex situ spectroscopy analysis. For the first time, near-edge X-ray absorption fine structure (NEXAFS) spectroscopy is used to offer insight into molecular orientation in films deposited via molecular-layer deposition (MLD). The results show that the oligomer units are lying nearly parallel to the surface, which differs from the linear vertical growth mode often used to illustrate film growth.

Covalent layer-by-layer assembly of redox active molecular multilayers on silicon (100) by photochemical thiol-ene chemistry

The fabrication of thin organic films covalently grafted onto silicon substrates is of significant interest, as they are expected to give access to a broad range of new materials for integration into microelectronic applications. Covalent layer-by-layer (LbL) assembly offers a high degree of freedom when designing such thin films. In this work an approach for the preparation of covalent redox active molecular multilayers on silicon (100) surfaces is presented using a highly branched decaallylferrocene and thiol-ene click chemistry. The multilayers are analyzed by ellipsometry, X-ray photoelectron sprectroscopy, and cyclic voltammetry. The results indicate that the multilayer growth is linear for at least sixteen layers and the density of ferrocenes per layer is in the range of 6 × 10⁻¹¹ mol cm⁻². Moreover, this method for LbL assembly is extended to surfaces which have been locally passivated by microcontact printing. By atomic force microscopy measurements it is possible to show that the covalent LbL deposition proceeds exclusively in the nonpassivated areas.

Molecular layer deposition of an organic-based magnetic semiconducting laminate

Organic-based magnets are intriguing materials with unique magnetic and electronic properties that can be tailored by chemical methodology. By using molecular layer deposition (MLD), we demonstrate the thin film fabrication of V[TCNE: tetracyanoethylene](x), of the first known room temperature organic-based magnet. The resulting films exhibit improvement in surface morphology, larger coercivity (80 Oe), and higher Curie temperature/thermal stability (up to 400 K). Recently, the MLD method has been widely studied to implement fine control of organic film growth for various applications. This work broadens its application to magnetic and charge transfer materials and opens new opportunities for metal-organic hybrid material development and their applications in various multilayer film device structures. Finally, we demonstrate the applicability of the multilayer V[TCNE](x) as a spin injector combining LSMO, an standard inorganic magnetic semiconductor, for spintronics applications.

Molecular layer deposition of aluminum alkoxide polymer films using trimethylaluminum and glycidol

Molecular layer deposition (MLD) of aluminum alkoxide polymer films was examined using trimethlyaluminum (TMA) and glycidol (GLY) as the reactants. Glycidol is a high vapor pressure heterobifunctional reactant with both hydroxyl and epoxy chemical functionalites. These two different functionalities help avoid "double reactions" that are common with homobifuctional reactants. A variety of techniques, including in situ Fourier transform infrared (FTIR) spectroscopy and quartz crystal microbalance (QCM) measurements, were employed to study the film growth. FTIR measurements at 100 and 125 °C observed the selective reaction of the GLY hydroxyl group with the AlCH(3) surface species during GLY exposure. Epoxy ring-opening and methyl transfer from TMA to the surface epoxy species were then monitored during TMA exposure. This epoxy ring-opening reaction is dependent on strong Lewis acid-base interactions between aluminum and oxygen. The QCM experiments observed linear growth with self-limiting surface reactions at 100-175 °C under certain growth conditions. With a sufficient purge time of 20 s after TMA and GLY exposures at 125 °C, the mass gain per cycle (MGPC) was 19.8 ng/cm(2)-cycle. The individual mass gains after the TMA and GLY exposures were also consistent with a TMA/GLY stoichiometry of 4:3 in the MLD film. This TMA/GLY stoichiometry suggests the presence of Al(2)O(2) dimeric core species. The MLD films resulting from these TMA and GLY exposures also evolved with annealing temperature to form thinner conformal porous films with increased density. Non-self-limiting growth was a problem at shorter purge times and lower temperatures. With shorter purge times of 10 s at 125 °C, the MPGC increased dramatically to 134 ng/cm(2)-cycle. The individual mass gains after the TMA and GLY exposures in the CVD regime were consistent with a TMA/GLY stoichiometry of 1:1. The MGPC decreased progressively versus purge time. This behavior was attributed to the removal of reactants that could lead to CVD and the instability of the surface species after the reactant exposures. These results reveal that the TMA and GLY reaction displays much complexity and must be carefully controlled to be a useful MLD process.

Structural analysis of porphyrin multilayer films on ITO assembled using copper(I)-catalyzed azide-alkyne cycloaddition by ATR IR

We report the use of grazing-angle attenuated total reflectance (GATR) IR and polarized UV-vis to determine the molecular structure of porphyrin based molecular multilayer films grown in a layer-by-layer (LbL) fashion using copper-catalyzed azide-alkyne cycloaddition (CuAAC). The molecular orientation and bonding motif present in multilayer films of this type could impact their photophysical and electrochemical properties as well as potential applications. Multilayer films of M(II) 5,10,15,20-tetra(4-ethynylphenyl)porphyrin (1 M = Zn, 2 M = Cu) and azido based linkers 3-5 were used to fabricate the films on ITO substrates. Electrochemically determined coverage of films containing 2 match the trends observed in the absorbance. GATR-IR spectral analysis of the films indicate that CuAAC reactivity is leading to 1,4-triazole linked multilayers with increasing porphyrin and linker IR characteristic peaks. Films grown using all azido-linkers (3-5) display an oscillating trend in azide IR intensity suggesting that the surface bound azido group reacts with 1 and that further layering can occur through additional reaction with linkers, regenerating the azide surface. Films containing linker 5 in particular show an overall increase in azide content suggesting that only two of the three available groups react during multilayer fabrication, causing an overall buildup of azide content in the film. Films of 1 with linker 3 and 5 showed an average porphyrin plane angle of 46.4° with respect to the substrate as determined by GATR FT-IR. Polarized UV-vis absorbance measurements correlate well with the growth angle calculated by IR. The orientation of the porphyrin plane within the multilayer structures suggests that the CuAAC-LbL process results in a film with a trans bonding motif.

Photochemical microcontact printing by thiol-ene and thiol-yne click chemistry

This article describes the microstructured immobilization of functional thiols on alkene- and alkyne-terminated self-assembled monolayers on silicon oxide substrates by photochemical microcontact printing. A photochemical thiol-ene or thiol-yne “click” reaction was locally induced in the area of contact between stamp and substrate by irradiation with UV light (365 nm). The immobilization reaction by photochemical microcontact printing was verified by contact angle measurements, X-ray photoelectron spectroscopy, atomic force microscopy, and time-of-flight secondary ion mass spectrometry. The reaction rate of photochemical microcontact printing by thiol-ene chemistry was studied using time dependent contact angle measurements. The selective binding of lectins to galactoside microarrays prepared by photochemical microcontact printing was also demonstrated. It was found that photochemical microcontact printing results in a high surface coverage of functional thiols within 30 s of printing even for dilute (mM) ink solutions.

Micro- and nanopatterning of functional organic monolayers on oxide-free silicon by laser-induced photothermal desorption

The photothermal laser patterning of functional organic monolayers, prepared on oxide-free hydrogen-terminated silicon, and subsequent backfilling of the laser-written lines with a second organic monolayer that differs in its terminal functionality, is described. Since the thermal monolayer decomposition process is highly nonlinear in the applied laser power density, subwavelength patterning of the organic monolayers is feasible. After photothermal laser patterning of hexadecenyl monolayers, the lines freed up by the laser are backfilled with functional acid fluoride monolayers. Coupling of cysteamine to the acid fluoride groups and subsequent attachment of Au nanoparticles allows easy characterization of the functional lines by atomic force microscopy (AFM) and scanning electron microscopy (SEM). Depending on the laser power and writing speed, functional lines with widths between 1.1 μm and 250 nm can be created. In addition, trifluoroethyl-terminated (TFE) monolayers are also patterned. Subsequently, the decomposed lines are backfilled with a nonfunctional hexadecenyl monolayer, the TFE stripes are converted into thiol stripes, and then finally covered with Au nanoparticles. By reducing the lateral distance between the laser lines, Au-nanoparticle stripes with widths close to 100 nm are obtained. Finally, in view of the great potential of this type of monolayer in the field of biosensing, the ease of fabricating biofunctional patterns is demonstrated by covalent binding of fluorescently labeled oligo-DNA to acid-fluoride-backfilled laser lines, which--as shown by fluorescence microscopy--is accessible for hybridization.

A versatile molecular layer-by-layer thin film fabrication technique utilizing copper(I)-catalyzed azide-alkyne cycloaddition

We have developed a rapid and versatile layer-by-layer (LbL) thin film fabrication method using copper(I)-catalyzed azide-alkyne cycloaddition (CuAAC) or "click" chemistry in the construction of molecular multilayer assemblies. Multilayers containing synthetic porphyrins, perylene diimides, and mixtures of the two have been constructed in order to highlight the versatility of this method. Characterization of thin films using UV-vis absorption, water contact angle, and electrochemical techniques indicate that multilayer growth is consistent over tens of layers. Preliminary X-ray reflectivity measurements yield an average bilayer thickness of 2.47 nm for multilayers of 1 and 3 grown on glass. Polarized absorption measurements suggest that the dense thin films exhibit moderate ordering in their molecular structure with partial alignment with respect to the surface normal.