Nonbulk Complex Structures in Thin Films of Symmetric Block Copolymers on Chemically Nanopatterned Surfaces

Responsive blends of block copolymers stabilize the hexagonally perforated lamellae morphology

Blends of block copolymers can form phases and exhibit features distinct from the constituent materials. We study thin film blends of cylinder-forming and lamellar-forming block copolymers across a range of substrate surface energies. Blend materials are responsive to interfacial energy, allowing selection of pure or coexisting phases based on surface chemistry. Blending stabilizes certain motifs that are typically metastable, and can be used to generate pure hexagonally perforated lamellar thin films across a range of film thicknesses and surface energies. This tolerant behavior is ascribed to the ability of blend materials to redistribute chains to stabilize otherwise high-energy defect structures. The blend responsiveness allows the morphology to be spatially defined through multi-tone chemical surface patterns.

Autonomous discovery of emergent morphologies in directed self-assembly of block copolymer blends

The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful approach to fabricate complex nanostructure arrays, but finding morphologies that emerge with changes in polymer architecture, composition, or assembly constraints remains daunting because of the increased dimensionality of the DSA design space. Here, we demonstrate machine-guided discovery of emergent morphologies from a cylinder/lamellae BCP blend directed by a chemical grating template, conducted without direct human intervention on a synchrotron x-ray scattering beamline. This approach maps the morphology-template phase space in a fraction of the time required by manual characterization and highlights regions deserving more detailed investigation. These studies reveal localized, template-directed partitioning of coexisting lamella- and cylinder-like subdomains at the template period length scale, manifesting as previously unknown morphologies such as aligned alternating subdomains, bilayers, or a "ladder" morphology. This work underscores the pivotal role that autonomous characterization can play in advancing the paradigm of DSA.

Block Copolymer Self-Assembly-Directed and Transient Laser Heating-Enabled Nanostructures toward Phononic and Photonic Quantum Materials

Three-dimensional (3D) periodic ordering of silicon (Si), an inorganic semiconductor, on the mesoscale was achieved by combining block copolymer (BCP) self-assembly (SA) based mesoporous alternating gyroidal network formation with nonequilibrium transient laser heating. 3D continuous and periodically ordered alternating gyroidal mesoporous carbon thin-film networks were prepared from spin coating, SA under solvent vapor annealing (SVA), and thermal processing of mixtures of a triblock terpolymer with resorcinol resols. The resulting mesoporous thin films, acting as structure-directing templates, were backfilled with amorphous silicon (a-Si). Nanosecond excimer laser heating led to transient Si melts conformally filling the template pores and subsequent Si crystallization. The ordered mesostructure of the organic polymer-derived templates was kept intact, despite being thermally unstable at the high temperatures around the Si melting point (MP), leading to high pattern transfer fidelity. As evidenced by a combination of grazing incidence small-angle X-ray scattering (GISAXS) and scanning electron microscopy (SEM), after template removal, the crystalline Si (c-Si) inherited the inverse network topology of the 3D mesoporous thin-film templates, but with reduced F222 space group symmetry (D₂ point group symmetry) from compression of the cubic alternating gyroid lattice. Structures with this reduced symmetry have been proposed as photonic and phononic materials exhibiting topologically protected Weyl points, adding to the emerging field of BCP SA-directed quantum materials promising advanced physics and materials properties.

Commensurability-Driven Orientation Control during Block Copolymer Directed Self-Assembly

In this study, the orientation of block copolymer (BCP) patterns in topographical templates is controlled using a simple template design rule. The orientation of the pattern is selected by using a template with one commensurate dimension and one incommensurate dimension. An array of binary states of a BCP pattern can be programmed into a desired layout by tuning of the template wall thickness.

Leveling of Polymer Grating Structures upon Heating: Dimension Dependence on the Nanoscale and the Effect of Antiplasticizers

The transition temperatures of nanoscale polymeric films are measured from a leveling experiment where a designed nanostructure is heated from below. Surface tension forces drive the relaxation of the polymeric features, allowing direct measurement of the critical temperature of collapse, T_flow, and indirect measurement of the glass transition temperature, T_G. Small-angle X-ray scattering and atomic force microscopy are used to follow the leveling dynamics, whereas a mathematical model for the momentum balance is implemented to extract the viscosity of the polymer film as a function of temperature. Our methodology is illustrated in the context of films of poly(methyl methacrylate) that are patterned via nanoimprint lithography into dense gratings. We study how the glass transition temperature and the critical temperature of collapse vary as a function of the film size and the inclusion of the antiplasticizer, tris(2-chloropropyl) phosphate. The grating periods are varied consistently between 80 and 240 nm, whereas the antiplasticizer concentrations are 1, 3, 5, and 10 wt %. The solution of the momentum balance allows the detailed correlation between stresses, curvature, heating, and shear rates during leveling. We found that both temperatures, T_G and T_flow, decrease as the film size decreases or as the concentration of the antiplasticizer increases. In addition, antiplasticizer concentrations between 3 and 5 wt % stabilize the size dependence of T_flow. We show that the nature of the antiplasticizer is effectively to increase the low-temperature viscosity of the film. However, during leveling, the antiplasticized film sustains its curvature, thereby driving a sudden relaxation, once T_G is reached, and increasing the possibilities of defects.

Influence of topographically patterned angled guidelines on directed self-assembly of block copolymers

Single chain in mean-field Monte Carlo simulations were employed to study the self-assembly of block copolymers (BCP) in thin films that use trapezoidal guidelines to direct the orientation and alignment of lamellar patterns. The present study explored the influence of sidewall interactions and geometry of the trapezoidal guidelines on the self-assembly of perpendicularly oriented lamellar morphologies. When both the sidewall and the top surface exhibit preferential interactions to the same block of the BCP, trapezoidal guidelines with intermediate taper angles were found to result in less defective perpendicularly orientated morphologies. Similarly, when the sidewall and top surface are preferential to distinct blocks of the BCP, intermediate tapering angles were found to be optimal in promoting defect free structures. Such results are rationalized based on the energetics arising in the formation of perpendicularly oriented lamella on patterned substrates.

Nanoscale control of Si nanoparticles within a 2D hexagonal array embedded in SiO2 thin films

In this work, we investigate the ability to control Si nanoparticles (NPs) spatially arranged in a hexagonal network of 20 nm wide nanovolumes at controlled depth within SiO₂ thin films. To achieve this goal an unconventional lithographic technique was implemented based on a bottom-up approach, that is fully compatible with the existing semiconductor technology. The method combines ultra-low energy ion beam synthesis with nanostructured block-copolymer thin films that are self-assembled on the SiO₂ substrates to form a nanoporous template with hexagonally packed pores. A systematic analytical investigation using time of flight-secondary ion mass spectroscopy and low-loss energy filtered transmission electron microscopy demonstrates that by adjusting few fabrication parameters, it is possible to narrow the size distribution of the NPs and to control the number of NPs per nanovolume. Experimental results are critically discussed on the basis of literature data, providing a description of the mechanism involved in the formation of Si NPs.

Effect of Stereochemistry on Directed Self-Assembly of Poly(styrene-b-lactide) Films on Chemical Patterns

We demonstrated here for the first time that the stereochemistry of polylactide (PLA) blocks affected the assembly behaviors of PS-b-PLA on chemical patterns. Two PS-b-PLA block copolymers, where the PLA block is either racemic (PDLLA) or left-handed (PLLA), were synthesized and directed to assemble on chemical patterns with a wide range of L_s/L₀. PS-b-PDLLA was stretched up to 70% on chemical patterns, while PS-b-PLLA was only stretched by 20%. The assembly behavior of PS-b-PDLLA was different from AB diblock copolymer, but similar to that of ABA triblock copolymer. The high stretchability might be attributed to the formation of stereocomplexes in PDLLA blocks. Compared to ABA triblock copolymers, stereocomplexed diblock copolymers have much faster assembly kinetics. This observation provides a new concept to achieve large process windows by the introduction of specific interactions, for example, H-bonding, supramolecular interaction, and sterecomplexation, between polymer chains.

Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes

Recently, alignment of block copolymer domains has been achieved using a topographically patterned substrate with a sidewall preferential to one of the blocks. This strategy has been suggested as an option to overcome the patterning resolution challenges facing chemoepitaxy strategies, which utilize chemical stripes with a width of about half the period of block copolymer to orient the equilibrium morphologies. In this work, single chain in mean field simulation methodology was used to study the self assembly of symmetric block copolymers on topographically patterned substrates with sidewall interactions. Random copolymer brushes grafted to the background region (space between patterns) were modeled explicitly. The effects of changes in pattern width, film thicknesses and strength of sidewall interaction on the resulting morphologies were examined and the conditions which led to perpendicular morphologies required for lithographic applications were identified. A number of density multiplication schemes were studied in order to gauge the efficiency with which the sidewall pattern can guide the self assembly of block copolymers. The results indicate that such a patterning technique can potentially utilize pattern widths of the order of one-two times the period of block copolymer and still be able to guide ordering of the block copolymer domains up to 8X density multiplication.

Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings

The ordering process of asymmetric PS-b-PMMA block copolymers (BCPs) is investigated on flat SiO2 surfaces and on topographically patterned substrates. The topographic patterns consist of periodic gratings of 10 trenches defined by conventional top-down approaches and subsequently neutralized using a P(S-r-MMA) random copolymer (RCP). When the ordering process is accomplished on a flat surface at a temperature ranging between 180 and 230 °C, cylindrical microdomains perpendicularly oriented with respect to the substrate are observed irrespective of annealing temperature. In contrast, when the ordering process occurs on topographically patterned substrates, different phenomena have to be considered. The simultaneous effect of the flow around the gratings and the BCP flux from the zone located between adjacent trenches (mesa) into the inner part of the trenches results in significant thickness variations of the confined BCP film. Therefore, the amount of BCP inside the trenches depends on the width of the mesa region, which acts as a BCP reservoir. Moreover, within each trench group, the BCP thickness progressively decreases from the external to the central trenches composing the periodic grating. The thickness variation of the BCP film within the trenches strongly affects the ordering process, ultimately leading to different orientations of the microdomains within the trenches. In particular, when the annealing temperature is 190 °C a precise confinement of the BCP within the trenches featuring a perpendicular cylinder morphology is observed. At higher temperatures, mixed or parallel orientations of the microdomains are obtained depending on the width of the trenches in the periodic grating.

Evolutionary Optimization of Directed Self-Assembly of Triblock Copolymers on Chemically Patterned Substrates

Directed self-assembly of block copolymers on chemical patterns is of considerable interest for sublithographic patterning. The concept of pattern interpolation, in which a subset of features patterned on a substrate is multiplied through the inherent morphology of an ordered block copolymer, has enabled fabrication of extremely small, defect-free features over large areas. One of the central challenges in design of pattern interpolation strategies is that of identifying system characteristics leading to ideal, defect-free directed assembly. In this work we demonstrate how a coarse-grained many-body model of block copolymers, coupled to an evolutionary computation (EC) strategy, can be used to design and optimize substrate-copolymer combinations for use in lithographic patterning. The proposed approach is shown to be significantly more effective than traditional algorithms based on random searches, and its results are validated in the context of recent experimental observations. The coupled simulation-evolution method introduced here provides a general and efficient method for potential design of complex device-oriented structures.

Three-dimensional nanofabrication by block copolymer self-assembly

Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of semiconductor devices, membranes, and other structures, taking advantage of microphase separation to produce well-organized nanostructures with periods of a few nm and above. However, the inherently three-dimensional structure of block copolymer microdomains could enable them to make 3D devices and structures directly, which could lead to efficient fabrication of complex heterogeneous structures. This article reviews recent progress in developing 3D nanofabrication processes based on block copolymers.

Self-sorting click reactions that generate spatially controlled chemical functionality on surfaces

This Article describes the generation of a patterned surface that can be postpolymerization modified to incorporate fragile macromolecules or delicate biomolecules without the need for special equipment. Two monomers that undergo different click reactions, pentafluorophenyl acrylate (PFPA) and 4-(trimethylsilyl) ethynylstyrene (TMSES), were sequentially polymerized from a silicon surface in the presence of a shadowmask with UV light, generating 12.5 and 62 μm pitch patterns. Two different dyes, 1-aminomethylpyrene (AMP) and 5-azidofluorescein (AF), were covalently attached to the polymer brushes through aminolysis and dual desilylation/copper(I)-catalyzed alkyne/azide cycloaddition (CuAAC) in one pot. Unlike most CuAAC reactions, the terminal alkyne of TMSES was not deprotected prior to functionalization. Although a 2 nm thickness increase was observed for poly(PFPA) brushes after polymerization of TMSES, cross-contamination was not visible through fluorescence microscopy after functionalization.