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Cui J, Du L, Meng Z, Gao J, Tan A, Jin X, Zhu X. Ingenious Structure Engineering to Enhance Piezoelectricity in Poly(vinylidene fluoride) for Biomedical Applications. Biomacromolecules 2024. [PMID: 39129463 DOI: 10.1021/acs.biomac.4c00659] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 08/13/2024]
Abstract
The future development of wearable/implantable sensing and medical devices relies on substrates with excellent flexibility, stability, biocompatibility, and self-powered capabilities. Enhancing the energy efficiency and convenience is crucial, and converting external mechanical energy into electrical energy is a promising strategy for long-term advancement. Poly(vinylidene fluoride) (PVDF), known for its piezoelectricity, is an outstanding representative of an electroactive polymer. Ingeniously designed PVDF-based polymers have been fabricated as piezoelectric devices for various applications. Notably, the piezoelectric performance of PVDF-based platforms is determined by their structural characteristics at different scales. This Review highlights how researchers can strategically engineer structures on microscopic, mesoscopic, and macroscopic scales. We discuss advanced research on PVDF-based piezoelectric platforms with diverse structural designs in biomedical sensing, disease diagnosis, and treatment. Ultimately, we try to give perspectives for future development trends of PVDF-based piezoelectric platforms in biomedicine, providing valuable insights for further research.
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Affiliation(s)
- Jiwei Cui
- School of Chemistry and Chemical Engineering, State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, People's Republic of China
- Joint Research and Development Center of Fluorine Materials of Shanghai Jiao Tong University and Huayi 3F, 1391 Humin Road, Shanghai 200240, People's Republic of China
| | - Lijun Du
- Shanghai Huayi 3F New Materials Co., Ltd., No. 560 Xujiahui Road, Shanghai 200025, People's Republic of China
- Joint Research and Development Center of Fluorine Materials of Shanghai Jiao Tong University and Huayi 3F, 1391 Humin Road, Shanghai 200240, People's Republic of China
| | - Zhiheng Meng
- School of Chemistry and Chemical Engineering, State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, People's Republic of China
| | - Jiayin Gao
- School of Chemistry and Chemical Engineering, State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, People's Republic of China
| | - Anning Tan
- School of Chemistry and Chemical Engineering, State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, People's Republic of China
| | - Xin Jin
- School of Chemistry and Chemical Engineering, State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, People's Republic of China
- Joint Research and Development Center of Fluorine Materials of Shanghai Jiao Tong University and Huayi 3F, 1391 Humin Road, Shanghai 200240, People's Republic of China
| | - Xinyuan Zhu
- School of Chemistry and Chemical Engineering, State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, 800 Dongchuan Road, Shanghai 200240, People's Republic of China
- Joint Research and Development Center of Fluorine Materials of Shanghai Jiao Tong University and Huayi 3F, 1391 Humin Road, Shanghai 200240, People's Republic of China
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2
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Nachawaty A, Chen T, Ibrahim F, Wang Y, Hao Y, Dalla Francesca K, Tyagi P, Da Costa A, Ferri A, Liu C, Li X, Chshiev M, Migot S, Badie L, Jahjah W, Desfeux R, Le Breton JC, Schieffer P, Le Pottier A, Gries T, Devaux X, Lu Y. Voltage-Driven Fluorine Motion for Novel Organic Spintronic Memristor. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2401611. [PMID: 38848668 DOI: 10.1002/adma.202401611] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/30/2024] [Revised: 05/04/2024] [Indexed: 06/09/2024]
Abstract
Integrating tunneling magnetoresistance (TMR) effect in memristors is a long-term aspiration because it allows to realize multifunctional devices, such as multi-state memory and tunable plasticity for synaptic function. However, the reported TMR in different multiferroic tunnel junctions is limited to 100%. This work demonstrates a giant TMR of -266% in La0.6Sr0.4MnO3(LSMO)/poly(vinylidene fluoride)(PVDF)/Co memristor with thin organic barrier. Different from the ferroelectricity-based memristors, this work discovers that the voltage-driven florine (F) motion in the junction generates a huge reversible resistivity change up to 106% with nanosecond (ns) timescale. Removing F from PVDF layer suppresses the dipole field in the tunneling barrier, thereby significantly enhances the TMR. Furthermore, the TMR can be tuned by different polarizing voltage due to the strong modification of spin-polarization at the LSMO/PVDF interface upon F doping. Combining of high TMR in the organic memristor paves the way to develop high-performance multifunctional devices for storage and neuromorphic applications.
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Affiliation(s)
- Abir Nachawaty
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Tongxin Chen
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Fatima Ibrahim
- Univ. Grenoble Alpes, CEA, CNRS, Spintec, Grenoble, 38000, France
| | - Yuchen Wang
- Hefei National Research Center for Physical Sciences at the Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, China
| | - Yafei Hao
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
- Physics Department, Zhejiang Normal University, Jinhua, 321004, China
| | - Kevin Dalla Francesca
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | - Priyanka Tyagi
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Antonio Da Costa
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | - Anthony Ferri
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | - Chuanchuan Liu
- Hefei National Research Center for Physical Sciences at the Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, China
| | - Xiaoguang Li
- Hefei National Research Center for Physical Sciences at the Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, China
| | - Mairbek Chshiev
- Univ. Grenoble Alpes, CEA, CNRS, Spintec, Grenoble, 38000, France
- Institut Universitaire de France, Paris, 75231, France
| | - Sylvie Migot
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Laurent Badie
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Walaa Jahjah
- Univ. Rennes-CNRS, IPR (Institut de Physique de Rennes)-UMR 6251, Rennes, F-35000, France
| | - Rachel Desfeux
- Univ. Artois, CNRS, Centrale Lille, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), Lens, F-62300, France
| | | | - Philippe Schieffer
- Univ. Rennes-CNRS, IPR (Institut de Physique de Rennes)-UMR 6251, Rennes, F-35000, France
| | - Arnaud Le Pottier
- Univ. Rennes-CNRS, IPR (Institut de Physique de Rennes)-UMR 6251, Rennes, F-35000, France
| | - Thomas Gries
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Xavier Devaux
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
| | - Yuan Lu
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, Nancy, 54011, France
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3
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Zhang Y, Zhu Q, Tian B, Duan C. New-Generation Ferroelectric AlScN Materials. NANO-MICRO LETTERS 2024; 16:227. [PMID: 38918252 PMCID: PMC11199478 DOI: 10.1007/s40820-024-01441-1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/14/2024] [Accepted: 05/06/2024] [Indexed: 06/27/2024]
Abstract
Ferroelectrics have great potential in the field of nonvolatile memory due to programmable polarization states by external electric field in nonvolatile manner. However, complementary metal oxide semiconductor compatibility and uniformity of ferroelectric performance after size scaling have always been two thorny issues hindering practical application of ferroelectric memory devices. The emerging ferroelectricity of wurtzite structure nitride offers opportunities to circumvent the dilemma. This review covers the mechanism of ferroelectricity and domain dynamics in ferroelectric AlScN films. The performance optimization of AlScN films grown by different techniques is summarized and their applications for memories and emerging in-memory computing are illustrated. Finally, the challenges and perspectives regarding the commercial avenue of ferroelectric AlScN are discussed.
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Affiliation(s)
- Yalong Zhang
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-Inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, People's Republic of China
| | - Qiuxiang Zhu
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-Inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, People's Republic of China.
| | - Bobo Tian
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-Inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, People's Republic of China.
| | - Chungang Duan
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-Inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, People's Republic of China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, 030006, Shanxi, People's Republic of China
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4
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Chen C, Zhou Y, Tong L, Pang Y, Xu J. Emerging 2D Ferroelectric Devices for In-Sensor and In-Memory Computing. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024:e2400332. [PMID: 38739927 DOI: 10.1002/adma.202400332] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/08/2024] [Revised: 04/19/2024] [Indexed: 05/16/2024]
Abstract
The quantity of sensor nodes within current computing systems is rapidly increasing in tandem with the sensing data. The presence of a bottleneck in data transmission between the sensors, computing, and memory units obstructs the system's efficiency and speed. To minimize the latency of data transmission between units, novel in-memory and in-sensor computing architectures are proposed as alternatives to the conventional von Neumann architecture, aiming for data-intensive sensing and computing applications. The integration of 2D materials and 2D ferroelectric materials has been expected to build these novel sensing and computing architectures due to the dangling-bond-free surface, ultra-fast polarization flipping, and ultra-low power consumption of the 2D ferroelectrics. Here, the recent progress of 2D ferroelectric devices for in-sensing and in-memory neuromorphic computing is reviewed. Experimental and theoretical progresses on 2D ferroelectric devices, including passive ferroelectrics-integrated 2D devices and active ferroelectrics-integrated 2D devices, are reviewed followed by the integration of perception, memory, and computing application. Notably, 2D ferroelectric devices have been used to simulate synaptic weights, neuronal model functions, and neural networks for image processing. As an emerging device configuration, 2D ferroelectric devices have the potential to expand into the sensor-memory and computing integration application field, leading to new possibilities for modern electronics.
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Affiliation(s)
- Chunsheng Chen
- Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Hong Kong SAR, China
| | - Yaoqiang Zhou
- Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Hong Kong SAR, China
| | - Lei Tong
- Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Hong Kong SAR, China
| | - Yue Pang
- Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Hong Kong SAR, China
| | - Jianbin Xu
- Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Hong Kong SAR, China
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5
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Feng G, Zhu Q, Liu X, Chen L, Zhao X, Liu J, Xiong S, Shan K, Yang Z, Bao Q, Yue F, Peng H, Huang R, Tang X, Jiang J, Tang W, Guo X, Wang J, Jiang A, Dkhil B, Tian B, Chu J, Duan C. A ferroelectric fin diode for robust non-volatile memory. Nat Commun 2024; 15:513. [PMID: 38218871 PMCID: PMC10787831 DOI: 10.1038/s41467-024-44759-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/25/2023] [Accepted: 12/29/2023] [Indexed: 01/15/2024] Open
Abstract
Among today's nonvolatile memories, ferroelectric-based capacitors, tunnel junctions and field-effect transistors (FET) are already industrially integrated and/or intensively investigated to improve their performances. Concurrently, because of the tremendous development of artificial intelligence and big-data issues, there is an urgent need to realize high-density crossbar arrays, a prerequisite for the future of memories and emerging computing algorithms. Here, a two-terminal ferroelectric fin diode (FFD) in which a ferroelectric capacitor and a fin-like semiconductor channel are combined to share both top and bottom electrodes is designed. Such a device not only shows both digital and analog memory functionalities but is also robust and universal as it works using two very different ferroelectric materials. When compared to all current nonvolatile memories, it cumulatively demonstrates an endurance up to 1010 cycles, an ON/OFF ratio of ~102, a feature size of 30 nm, an operating energy of ~20 fJ and an operation speed of 100 ns. Beyond these superior performances, the simple two-terminal structure and their self-rectifying ratio of ~ 104 permit to consider them as new electronic building blocks for designing passive crossbar arrays which are crucial for the future in-memory computing.
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Affiliation(s)
- Guangdi Feng
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
- Zhejiang Lab, Hangzhou, 310000, China
| | - Qiuxiang Zhu
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
- Zhejiang Lab, Hangzhou, 310000, China
| | - Xuefeng Liu
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Luqiu Chen
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Xiaoming Zhao
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Jianquan Liu
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Shaobing Xiong
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
- Institute of Optoelectronics, Fudan University, Shanghai, 200433, China
| | - Kexiang Shan
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083, China
| | - Zhenzhong Yang
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Qinye Bao
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Fangyu Yue
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Hui Peng
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Rong Huang
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Xiaodong Tang
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Jie Jiang
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083, China
| | - Wei Tang
- National Engineering Laboratory of TFT-LCD Materials and Technologies, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai, 200030, China
| | - Xiaojun Guo
- National Engineering Laboratory of TFT-LCD Materials and Technologies, Department of Electronic Engineering, Shanghai Jiao Tong University, Shanghai, 200030, China
| | - Jianlu Wang
- Frontier Institute of Chip and System, Fudan University, Shanghai, 200433, China
| | - Anquan Jiang
- State Key Laboratory of ASIC & System, School of Microelectronics, Fudan University, Shanghai, 200433, China
| | - Brahim Dkhil
- Université Paris-Saclay, CentraleSupélec, CNRS-UMR8580, Laboratoire SPMS, 91190, Gif-sur-Yvette, France
| | - Bobo Tian
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China.
- Zhejiang Lab, Hangzhou, 310000, China.
| | - Junhao Chu
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
- Institute of Optoelectronics, Fudan University, Shanghai, 200433, China
| | - Chungang Duan
- Key Laboratory of Polar Materials and Devices, Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, Shanxi, 030006, China
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Wu G, Zhang X, Feng G, Wang J, Zhou K, Zeng J, Dong D, Zhu F, Yang C, Zhao X, Gong D, Zhang M, Tian B, Duan C, Liu Q, Wang J, Chu J, Liu M. Ferroelectric-defined reconfigurable homojunctions for in-memory sensing and computing. NATURE MATERIALS 2023; 22:1499-1506. [PMID: 37770677 DOI: 10.1038/s41563-023-01676-0] [Citation(s) in RCA: 12] [Impact Index Per Article: 12.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/17/2023] [Accepted: 09/03/2023] [Indexed: 09/30/2023]
Abstract
Recently, the increasing demand for data-centric applications is driving the elimination of image sensing, memory and computing unit interface, thus promising for latency- and energy-strict applications. Although dedicated electronic hardware has inspired the development of in-memory computing and in-sensor computing, folding the entire signal chain into one device remains challenging. Here an in-memory sensing and computing architecture is demonstrated using ferroelectric-defined reconfigurable two-dimensional photodiode arrays. High-level cognitive computing is realized based on the multiplications of light power and photoresponsivity through the photocurrent generation process and Kirchhoff's law. The weight is stored and programmed locally by the ferroelectric domains, enabling 51 (>5 bit) distinguishable weight states with linear, symmetric and reversible manipulation characteristics. Image recognition can be performed without any external memory and computing units. The three-in-one paradigm, integrating high-level computing, weight memorization and high-performance sensing, paves the way for a computing architecture with low energy consumption, low latency and reduced hardware overhead.
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Affiliation(s)
- Guangjian Wu
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China
- Shanghai Qi Zhi Institute, Xuhui District, Shanghai, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Xumeng Zhang
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China
- Shanghai Qi Zhi Institute, Xuhui District, Shanghai, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Guangdi Feng
- Key Laboratory of Polar Materials and Devices (MOE), Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, China
| | - Jingli Wang
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China
| | - Keji Zhou
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China
| | - Jinhua Zeng
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, China
| | - Danian Dong
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, China
| | - Fangduo Zhu
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China
| | - Chenkai Yang
- Key Laboratory of Polar Materials and Devices (MOE), Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, China
| | - Xiaoming Zhao
- Key Laboratory of Polar Materials and Devices (MOE), Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, China
| | - Danni Gong
- Key Laboratory of Polar Materials and Devices (MOE), Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, China
| | - Mengru Zhang
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China
| | - Bobo Tian
- Key Laboratory of Polar Materials and Devices (MOE), Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, China.
| | - Chungang Duan
- Key Laboratory of Polar Materials and Devices (MOE), Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, China
| | - Qi Liu
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China.
- Shanghai Qi Zhi Institute, Xuhui District, Shanghai, China.
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China.
| | - Jianlu Wang
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China.
- Shanghai Qi Zhi Institute, Xuhui District, Shanghai, China.
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China.
- Institute of Optoelectronics, Shanghai Frontier Base of Intelligent Optoelectronics and Perception, Fudan University, Shanghai, China.
| | - Junhao Chu
- Key Laboratory of Polar Materials and Devices (MOE), Ministry of Education, Shanghai Center of Brain-inspired Intelligent Materials and Devices, Department of Electronics, East China Normal University, Shanghai, China
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, China
- Institute of Optoelectronics, Shanghai Frontier Base of Intelligent Optoelectronics and Perception, Fudan University, Shanghai, China
| | - Ming Liu
- State Key Laboratory of Integrated Chips and Systems, Frontier Institute of Chip and System, Fudan University, Shanghai, China
- Shanghai Qi Zhi Institute, Xuhui District, Shanghai, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
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7
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Han H, Zhang X, Kang L, Zheng X, Zhao G. Tunnel electroresistance effect in a two-dimensional organic ferroelectric tunnel junction. Phys Chem Chem Phys 2023. [PMID: 37401410 DOI: 10.1039/d3cp01828h] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 07/05/2023]
Abstract
Two-dimensional (2D) ferroelectric materials have important application potential in device miniaturization due to their characteristics of only being a few atomic layers thick and non-volatility. How to design high-performance ferroelectric memory devices based on 2D ferroelectric materials has attracted extensive attention. In this work, based on the 2D organic ferroelectric material semi-hydroxylized graphane (SHLGA), which has in-plane ferroelectric polarization along three different directions, we construct a 2D organic ferroelectric tunnel junction (FTJ). By means of density functional theory (DFT) and the non-equilibrium Green's function (NEGF) method, we calculate the transport properties of the FTJ under different polarizations and obtain a giant tunnel electroresistance (TER) ratio of 7.55 × 104%. We find that the mechanism behind the TER effect in the organic SHLGA is based on the unique built-in electric field. That is, among the three ferroelectric polarization directions, any two directions have an angle of 120°. As a result, the built-in electric fields along the transport direction of the FTJ under different ferroelectric polarization directions are different. Moreover, our study shows that the giant TER effect can also be achieved by utilizing the asymmetry of the polarization along the transport direction of the ferroelectric material itself, which provides another route for the design of 2D FTJs.
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Affiliation(s)
- Huizhen Han
- Institute for Computational Materials Science, School of Physics and Electronics, International Joint Research Laboratory of New Energy Materials and Devices of Henan Province, Henan University, Kaifeng 475004, China.
| | - Xiaoli Zhang
- Physics Teaching and Experiment Center, Shenzhen Technology University, Shenzhen 518118, China
| | - Lili Kang
- Institute for Computational Materials Science, School of Physics and Electronics, International Joint Research Laboratory of New Energy Materials and Devices of Henan Province, Henan University, Kaifeng 475004, China.
| | - Xiaohong Zheng
- College of Information Science and Technology, Nanjing Forestry University, Nanjing 210037, China.
| | - Gaofeng Zhao
- Institute for Computational Materials Science, School of Physics and Electronics, International Joint Research Laboratory of New Energy Materials and Devices of Henan Province, Henan University, Kaifeng 475004, China.
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8
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Qian X, Chen X, Zhu L, Zhang QM. Fluoropolymer ferroelectrics: Multifunctional platform for polar-structured energy conversion. Science 2023; 380:eadg0902. [PMID: 37167372 DOI: 10.1126/science.adg0902] [Citation(s) in RCA: 19] [Impact Index Per Article: 19.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 05/13/2023]
Abstract
Ferroelectric materials are currently some of the most widely applied material systems and are constantly generating improved functions with higher efficiencies. Advancements in poly(vinylidene fluoride) (PVDF)-based polymer ferroelectrics provide flexural, coupling-efficient, and multifunctional material platforms for applications that demand portable, lightweight, wearable, and durable features. We highlight the recent advances in fluoropolymer ferroelectrics, their energetic cross-coupling effects, and emerging technologies, including wearable, highly efficient electromechanical actuators and sensors, electrocaloric refrigeration, and dielectric devices. These developments reveal that the molecular and nanostructure manipulations of the polarization-field interactions, through facile defect biasing, could introduce enhancements in the physical effects that would enable the realization of multisensory and multifunctional wearables for the emerging immersive virtual world and smart systems for a sustainable future.
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Affiliation(s)
- Xiaoshi Qian
- State Key Laboratory of Mechanical System and Vibration, Interdisciplinary Research Centre, and MOE Key Laboratory for Power Machinery and Engineering, School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Xin Chen
- Materials Research Institute and Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA 16802, USA
| | - Lei Zhu
- Department of Macromolecular Science and Engineering, Case Western Reserve University, Cleveland, OH 44106, USA
| | - Q M Zhang
- Materials Research Institute and Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA 16802, USA
- School of Electrical Engineering and Computer Science, The Pennsylvania State University, University Park, PA 16802, USA
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9
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Jiang Y, Ma X, Wang L, Zhang J, Wang Z, Zhao R, Liu G, Li Y, Zhang C, Ma C, Qi Y, Wu L, Gao J. Observation of Electric Hysteresis, Polarization Oscillation, and Pyroelectricity in Nonferroelectric p-n Heterojunctions. PHYSICAL REVIEW LETTERS 2023; 130:196801. [PMID: 37243636 DOI: 10.1103/physrevlett.130.196801] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/12/2022] [Accepted: 03/31/2023] [Indexed: 05/29/2023]
Abstract
The switchable electric polarization is usually achieved in ferroelectric materials with noncentrosymmetric structures, which opens exciting opportunities for information storage and neuromorphic computing. In another polar system of p-n junction, there exists the electric polarization at the interface due to the Fermi level misalignment. However, the resultant built-in electric field is unavailable to manipulate, thus attracting less attention for memory devices. Here, we report the interfacial polarization hysteresis (IPH) in the vertical sidewall van der Waals heterojunctions of black phosphorus and quasi-two-dimensional electron gas on SrTiO_{3}. A nonvolatile switching of electric polarization can be achieved by reconstructing the space charge region (SCR) with long-lifetime nonequilibrium carriers. The resulting electric-field controllable IPH is experimentally verified by electric hysteresis, polarization oscillation, and pyroelectric effect. Further studies confirm the transition temperature of 340 K, beyond which the IPH vanishes. The second transition is revealed with the temperature dropping below 230 K, corresponding to the sharp improvement of IPH and the freezing of SCR reconstruction. This work offers new possibilities for exploring the memory phenomena in nonferroelectric p-n heterojunctions.
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Affiliation(s)
- Yucheng Jiang
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
- School of Physics, Nanjing University, Nanjing 210093, China
| | - Xinglong Ma
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
- School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China
| | - Lin Wang
- School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China
| | - Jinlei Zhang
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Zhichao Wang
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Run Zhao
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Guozhen Liu
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Yang Li
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Cheng Zhang
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Chunlan Ma
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
| | - Yaping Qi
- Macau Institute of Systems Engineering, Macau University of Science and Technology, Macau 999078, China
- Advanced Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
| | - Lin Wu
- Science, Mathematics and Technology, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372, Singapore
- Institute of High Performance Computing, Agency for Science, Technology, and Research 1 Fusionopolis Way, #16-16 Connexis, Singapore 138632, Singapore
| | - Ju Gao
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou 215009, China
- School for Optoelectronic Engineering, Zaozhuang University, Shandong 277160, China
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10
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Zhu Y, Jiang Q, Zhang J, Ma Y. Recent Progress of Organic Semiconductor Materials in Spintronics. Chem Asian J 2023; 18:e202201125. [PMID: 36510771 DOI: 10.1002/asia.202201125] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/07/2022] [Revised: 12/12/2022] [Accepted: 12/12/2022] [Indexed: 12/15/2022]
Abstract
Spintronics, a new discipline focusing on the spin-dependent transport process of electrons, has been developing rapidly. Spin valves are the most significant carriers of spintronics utilizing the spin freedom of electrons. It is expected to pierce "Moore's Law" and become the core component in processors of the next generation. Organic semiconductors advance in their adjustable band gap, weak spin-orbit coupling and hyperfine interaction, excellent film-forming property, having enormous promise for spin valves. Here, the principle of spin valves is introduced, and the history and progress in organic spin injection and transport materials are summarized. Then we analyze the influence of spinterface on device performance and introduce reliable methods of constructing organic spin valves. Finally, the challenges for spin valves are discussed, and the future is proposed. We aim to draw the attention of researchers to organic spin valves and promote further research in spintronics through this paper.
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Affiliation(s)
- Yanuo Zhu
- Institute of Polymer Optoelectronic Materials and Devices, State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, 381 Wushan Road, Guangzhou, Guangdong, 510640, P. R. China
| | - Qinglin Jiang
- Institute of Polymer Optoelectronic Materials and Devices, State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, 381 Wushan Road, Guangzhou, Guangdong, 510640, P. R. China
| | - Jiang Zhang
- Department of Physics, South China University of Technology 381 Wushan Road, Guangzhou, Guangdong, 510640, P. R. China
| | - Yuguang Ma
- Institute of Polymer Optoelectronic Materials and Devices, State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, 381 Wushan Road, Guangzhou, Guangdong, 510640, P. R. China
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11
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Zhou Y, Wang Y, Zhuge F, Guo J, Ma S, Wang J, Tang Z, Li Y, Miao X, He Y, Chai Y. A Reconfigurable Two-WSe 2 -Transistor Synaptic Cell for Reinforcement Learning. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2107754. [PMID: 35104378 DOI: 10.1002/adma.202107754] [Citation(s) in RCA: 18] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/28/2021] [Revised: 01/19/2022] [Indexed: 06/14/2023]
Abstract
Reward-modulated spike-timing-dependent plasticity (R-STDP) is a brain-inspired reinforcement learning (RL) rule, exhibiting potential for decision-making tasks and artificial general intelligence. However, the hardware implementation of the reward-modulation process in R-STDP usually requires complicated Si complementary metal-oxide-semiconductor (CMOS) circuit design that causes high power consumption and large footprint. Here, a design with two synaptic transistors (2T) connected in a parallel structure is experimentally demonstrated. The 2T unit based on WSe2 ferroelectric transistors exhibits reconfigurable polarity behavior, where one channel can be tuned as n-type and the other as p-type due to nonvolatile ferroelectric polarization. In this way, opposite synaptic weight update behaviors with multilevel (>6 bit) conductance states, ultralow nonlinearity (0.56/-1.23), and large Gmax /Gmin ratio of 30 are realized. By applying positive/negative reward to (anti-)STDP component of 2T cell, R-STDP learning rules are realized for training the spiking neural network and demonstrated to solve the classical cart-pole problem, exhibiting a way for realizing low-power (32 pJ per forward process) and highly area-efficient (100 µm2 ) hardware chip for reinforcement learning.
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Affiliation(s)
- Yue Zhou
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430000, China
- Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, 999077, China
| | - Yasai Wang
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430000, China
| | - Fuwei Zhuge
- School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430000, China
| | - Jianmiao Guo
- Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, 999077, China
| | - Sijie Ma
- Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, 999077, China
| | - Jingli Wang
- Frontier Institute of Chip and System, Fudan University, Shanghai, 200433, China
| | - Zijian Tang
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430000, China
| | - Yi Li
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430000, China
| | - Xiangshui Miao
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430000, China
| | - Yuhui He
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430000, China
| | - Yang Chai
- Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, 999077, China
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12
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Sun Y, He N, Yuan Q, Wang Y, Dong Y, Wen D. Ferroelectric Polarized in Transistor Channel Polarity Modulation for Reward-Modulated Spike-Time-Dependent Plasticity Application. J Phys Chem Lett 2022; 13:10056-10064. [PMID: 36264655 DOI: 10.1021/acs.jpclett.2c03007] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Reward signals reflect the developmental tendency of reinforcement learning (RL) agents. Reward-modulated spike-time-dependent plasticity (R-STDP) is an efficient and concise information processing feature in RL. However, the physical construction of R-STDP normally demands complex circuit design engineering, resulting in large power consumption and large area. In this work, we studied the role of ferroelectric polarization in the modulation of carbon nanotube transistor channel polarity. Furthermore, we applied a modulating channel method to construct a 2T synaptic component by spin-coating technology. Based on the nonvolatility of ferroelectric polarization, the synaptic component constructed has the characteristics of reconfigurable polarity. One channel could be modulated to n-type and the other to p-type. One modulated channel was used to perform the STDP function when the reward signal arrived, and the other modulated channel was used to perform the anti-STDP function when the punishment signal arrived. Finally, R-STDP learning rules are implemented on hardware. This work provides a strategy for hardware construction of RL.
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Affiliation(s)
- Yanmei Sun
- School of Electronic Engineering, Heilongjiang University, Harbin 150080, China
- Heilongjiang Provincial Key Laboratory of Micro-nano Sensitive Devices and Systems, Heilongjiang University, Harbin 150080, China
- HLJ Province Key Laboratories of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
| | - Nian He
- School of Electronic Engineering, Heilongjiang University, Harbin 150080, China
- Heilongjiang Provincial Key Laboratory of Micro-nano Sensitive Devices and Systems, Heilongjiang University, Harbin 150080, China
- HLJ Province Key Laboratories of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
| | - Qi Yuan
- School of Electronic Engineering, Heilongjiang University, Harbin 150080, China
- Heilongjiang Provincial Key Laboratory of Micro-nano Sensitive Devices and Systems, Heilongjiang University, Harbin 150080, China
- HLJ Province Key Laboratories of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
| | - Yufei Wang
- School of Electronic Engineering, Heilongjiang University, Harbin 150080, China
- Heilongjiang Provincial Key Laboratory of Micro-nano Sensitive Devices and Systems, Heilongjiang University, Harbin 150080, China
- HLJ Province Key Laboratories of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
| | - Yan Dong
- School of Electronic Engineering, Heilongjiang University, Harbin 150080, China
- Heilongjiang Provincial Key Laboratory of Micro-nano Sensitive Devices and Systems, Heilongjiang University, Harbin 150080, China
- HLJ Province Key Laboratories of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
| | - Dianzhong Wen
- School of Electronic Engineering, Heilongjiang University, Harbin 150080, China
- Heilongjiang Provincial Key Laboratory of Micro-nano Sensitive Devices and Systems, Heilongjiang University, Harbin 150080, China
- HLJ Province Key Laboratories of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
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13
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Xu M, Sheng C, Zhang Q, Zhou X, Tian B, Chen L, Cai Y, Li J, Wang J, Xie Y, Qiu X, Wang W, Xiong S, Cong C, Qiu ZJ, Liu R, Hu L. Large-Area Flexible Memory Arrays of Oriented Molecular Ferroelectric Single Crystals with Nearly Saturated Polarization. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2203882. [PMID: 36168115 DOI: 10.1002/smll.202203882] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/23/2022] [Revised: 08/23/2022] [Indexed: 06/16/2023]
Abstract
Molecular ferroelectrics (MFs) have been proven to demonstrate excellent properties even comparable to those of inorganic counterparts usually with heavy metals. However, the validation of their device applications is still at the infant stage. The polycrystalline feature of conventionally obtained MF films, the patterning challenges for microelectronics and the brittleness of crystalline films significantly hinder their development for organic integrated circuits, as well as emerging flexible electronics. Here, a large-area flexible memory array is demonstrated of oriented molecular ferroelectric single crystals (MFSCs) with nearly saturated polarization. Highly-uniform MFSC arrays are prepared on large-scale substrates including Si wafers and flexible substrates using an asymmetric-wetting and microgroove-assisted coating (AWMAC) strategy. Resultant flexible memory arrays exhibit excellent nonvolatile memory properties with a low-operating voltage of <5 V, i.e., nearly saturated ferroelectric polarization (6.5 µC cm-2 ), and long bending endurance (>103 ) under various bending radii. These results may open an avenue for scalable flexible MF electronics with high performance.
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Affiliation(s)
- Mingsheng Xu
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Chenxu Sheng
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Qiuyi Zhang
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Xiaojie Zhou
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Bobo Tian
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Luqiu Chen
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Yichen Cai
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Jianping Li
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Jiao Wang
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Yongfa Xie
- School of Chemistry and Chemical Engineering, Nanchang University, Nanchang, 330031, P. R. China
| | - Xinxia Qiu
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Wenchong Wang
- Physikalisches Institut and Center for Nanotechnology, Universität Münster, Wilhelm-Klemm-Straße 10, 48149, Münster, Germany
| | - Shisheng Xiong
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Chunxiao Cong
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
- Yiwu Research Institute of Fudan University, Yiwu City, Zhejiang, 322000, China
| | - Zhi-Jun Qiu
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Ran Liu
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
| | - Laigui Hu
- School of Information Science and Technology, Fudan University, Shanghai, 200433, P. R. China
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14
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Humbert V, El Hage R, Krieger G, Sanchez‐Santolino G, Sander A, Collin S, Trastoy J, Briatico J, Santamaria J, Preziosi D, Villegas JE. An Oxygen Vacancy Memristor Ruled by Electron Correlations. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2022; 9:e2201753. [PMID: 35901494 PMCID: PMC9507366 DOI: 10.1002/advs.202201753] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/25/2022] [Revised: 07/01/2022] [Indexed: 06/15/2023]
Abstract
Resistive switching effects offer new opportunities in the field of conventional memories as well as in the booming area of neuromorphic computing. Here the authors demonstrate memristive switching effects produced by a redox-driven oxygen exchange in tunnel junctions based on NdNiO3 , a strongly correlated electron system characterized by the presence of a metal-to-insulator transition (MIT). Strikingly, a strong interplay exists between the MIT and the redox mechanism, which on the one hand modifies the MIT itself, and on the other hand radically affects the tunnel resistance switching and the resistance states' lifetime. That results in a very unique temperature behavior and endows the junctions with multiple degrees of freedom. The obtained results bring up fundamental questions on the interplay between electronic correlations and the creation and mobility of oxygen vacancies in nickelates, opening a new avenue toward mimicking neuromorphic functions by exploiting the electric-field control of correlated states.
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Affiliation(s)
- Vincent Humbert
- Unité Mixte de PhysiqueCNRSThalesUniversité Paris‐SaclayPalaiseau91767France
| | - Ralph El Hage
- Unité Mixte de PhysiqueCNRSThalesUniversité Paris‐SaclayPalaiseau91767France
| | | | - Gabriel Sanchez‐Santolino
- Grupo de Física de Materiales ComplejosDpt. Física de MaterialesUniversidad Complutense de MadridMadrid28040Spain
| | - Anke Sander
- Unité Mixte de PhysiqueCNRSThalesUniversité Paris‐SaclayPalaiseau91767France
| | - Sophie Collin
- Unité Mixte de PhysiqueCNRSThalesUniversité Paris‐SaclayPalaiseau91767France
| | - Juan Trastoy
- Unité Mixte de PhysiqueCNRSThalesUniversité Paris‐SaclayPalaiseau91767France
| | - Javier Briatico
- Unité Mixte de PhysiqueCNRSThalesUniversité Paris‐SaclayPalaiseau91767France
| | - Jacobo Santamaria
- Grupo de Física de Materiales ComplejosDpt. Física de MaterialesUniversidad Complutense de MadridMadrid28040Spain
| | | | - Javier E. Villegas
- Unité Mixte de PhysiqueCNRSThalesUniversité Paris‐SaclayPalaiseau91767France
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15
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Nonvolatile ferroelectric domain wall memory integrated on silicon. Nat Commun 2022; 13:4332. [PMID: 35882838 PMCID: PMC9325887 DOI: 10.1038/s41467-022-31763-w] [Citation(s) in RCA: 14] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/10/2021] [Accepted: 07/01/2022] [Indexed: 11/30/2022] Open
Abstract
Ferroelectric domain wall memories have been proposed as a promising candidate for nonvolatile memories, given their intriguing advantages including low energy consumption and high-density integration. Perovskite oxides possess superior ferroelectric prosperities but perovskite-based domain wall memory integrated on silicon has rarely been reported due to the technical challenges in the sample preparation. Here, we demonstrate a domain wall memory prototype utilizing freestanding BaTiO3 membranes transferred onto silicon. While as-grown BaTiO3 films on (001) SrTiO3 substrate are purely c-axis polarized, we find they exhibit distinct in-plane multidomain structures after released from the substrate and integrated onto silicon due to the collective effects from depolarizing field and strain relaxation. Based on the strong in-plane ferroelectricity, conductive domain walls with reading currents up to nanoampere are observed and can be both created and erased artificially, highlighting the great potential of the integration of perovskite oxides with silicon for ferroelectric domain wall memories. Integrating ferroelectric perovskite oxides on Si is highly desired for electronic applications but challenging. Here, the authors show emergent in-plane ferroelectricity and promising nonvolatile memories based on resistive domain wall in BaTiO3/Si.
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16
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Dlugosch JM, Seim H, Bora A, Kamiyama T, Lieberman I, May F, Müller-Plathe F, Nefedov A, Prasad S, Resch S, Saller K, Seim C, Speckbacher M, Voges F, Tornow M, Kirsch P. Conductance Switching in Liquid Crystal-Inspired Self-Assembled Monolayer Junctions. ACS APPLIED MATERIALS & INTERFACES 2022; 14:31044-31053. [PMID: 35776551 DOI: 10.1021/acsami.2c05264] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
We present the prototype of a ferroelectric tunnel junction (FTJ), which is based on a self-assembled monolayer (SAM) of small, functional molecules. These molecules have a structure similar to those of liquid crystals, and they are embedded between two solid-state electrodes. The SAM, which is deposited through a short sequence of simple fabrication steps, is extremely thin (3.4 ± 0.5 nm) and highly uniform. The functionality of the FTJ is ingrained in the chemical structure of the SAM components: a conformationally flexible dipole that can be reversibly reoriented in an electrical field. Thus, the SAM acts as an electrically switchable tunnel barrier. Fabricated stacks of Al/Al2O3/SAM/Pb/Ag with such a polar SAM show pronounced hysteretic, reversible conductance switching at voltages in the range of ±2-3 V, with a conductance ratio of the low and the high resistive states of up to 100. The switching mechanism is analyzed using a combination of quantum chemical, molecular dynamics, and tunneling resistance calculation methods. In contrast to more common, inorganic material-based FTJs, our approach using SAMs of small organic molecules allows for a high degree of functional complexity and diversity to be integrated by synthetic standard methods, while keeping the actual device fabrication process robust and simple. We expect that this technology can be further developed toward a level that would then allow its application in the field of information storage and processing, in particular for in-memory and neuromorphic computing architectures.
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Affiliation(s)
- Julian M Dlugosch
- Molecular Electronics, Technical University of Munich, Hans-Piloty-Straße 1, 85748 Garching, Germany
| | - Henning Seim
- Electronics R&D, Merck KGaA, Frankfurter Straße 250, 64293 Darmstadt, Germany
| | - Achyut Bora
- Molecular Electronics, Technical University of Munich, Hans-Piloty-Straße 1, 85748 Garching, Germany
| | - Takuya Kamiyama
- Molecular Electronics, Technical University of Munich, Hans-Piloty-Straße 1, 85748 Garching, Germany
| | - Itai Lieberman
- Electronics R&D, Merck KGaA, Frankfurter Straße 250, 64293 Darmstadt, Germany
| | - Falk May
- Electronics R&D, Merck KGaA, Frankfurter Straße 250, 64293 Darmstadt, Germany
| | - Florian Müller-Plathe
- Eduard-Zintl Institute of Inorganic and Physical Chemistry, Technical University of Darmstadt, Alarich-Weiss-Straße 8, 64287 Darmstadt, Germany
| | - Alexei Nefedov
- Institute of Functional Interfaces, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany
| | - Saurav Prasad
- Eduard-Zintl Institute of Inorganic and Physical Chemistry, Technical University of Darmstadt, Alarich-Weiss-Straße 8, 64287 Darmstadt, Germany
| | - Sebastian Resch
- Electronics R&D, Merck KGaA, Frankfurter Straße 250, 64293 Darmstadt, Germany
| | - Kai Saller
- Molecular Electronics, Technical University of Munich, Hans-Piloty-Straße 1, 85748 Garching, Germany
| | - Christian Seim
- Xploraytion GmbH, Bismarckstraße 10-12, 10625 Berlin, Germany
| | - Maximilian Speckbacher
- Molecular Electronics, Technical University of Munich, Hans-Piloty-Straße 1, 85748 Garching, Germany
| | - Frank Voges
- Electronics R&D, Merck KGaA, Frankfurter Straße 250, 64293 Darmstadt, Germany
| | - Marc Tornow
- Molecular Electronics, Technical University of Munich, Hans-Piloty-Straße 1, 85748 Garching, Germany
- Fraunhofer Research Institution for Microsystems and Solid State Technologies (EMFT), Hansastraße 27d, 80686 München, Germany
| | - Peer Kirsch
- Electronics R&D, Merck KGaA, Frankfurter Straße 250, 64293 Darmstadt, Germany
- Institute of Materials Science, Technical University of Darmstadt, Alarich-Weiss-Straße 2, 64297 Darmstadt, Germany
- Freiburg Materials Research Center (FMF), Albert Ludwig University Freiburg, Stefan-Meier-Straße 21, 79104 Freiburg, Germany
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17
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Yoon C, Oh G, Park BH. Ion-Movement-Based Synaptic Device for Brain-Inspired Computing. NANOMATERIALS 2022; 12:nano12101728. [PMID: 35630952 PMCID: PMC9148095 DOI: 10.3390/nano12101728] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/21/2022] [Revised: 05/13/2022] [Accepted: 05/16/2022] [Indexed: 02/04/2023]
Abstract
As the amount of data has grown exponentially with the advent of artificial intelligence and the Internet of Things, computing systems with high energy efficiency, high scalability, and high processing speed are urgently required. Unlike traditional digital computing, which suffers from the von Neumann bottleneck, brain-inspired computing can provide efficient, parallel, and low-power computation based on analog changes in synaptic connections between neurons. Synapse nodes in brain-inspired computing have been typically implemented with dozens of silicon transistors, which is an energy-intensive and non-scalable approach. Ion-movement-based synaptic devices for brain-inspired computing have attracted increasing attention for mimicking the performance of the biological synapse in the human brain due to their low area and low energy costs. This paper discusses the recent development of ion-movement-based synaptic devices for hardware implementation of brain-inspired computing and their principles of operation. From the perspective of the device-level requirements for brain-inspired computing, we address the advantages, challenges, and future prospects associated with different types of ion-movement-based synaptic devices.
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18
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Lao J, Yan M, Tian B, Jiang C, Luo C, Xie Z, Zhu Q, Bao Z, Zhong N, Tang X, Sun L, Wu G, Wang J, Peng H, Chu J, Duan C. Ultralow-Power Machine Vision with Self-Powered Sensor Reservoir. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2022; 9:e2106092. [PMID: 35285175 PMCID: PMC9130913 DOI: 10.1002/advs.202106092] [Citation(s) in RCA: 27] [Impact Index Per Article: 13.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/30/2021] [Revised: 02/14/2022] [Indexed: 05/11/2023]
Abstract
A neuromorphic visual system integrating optoelectronic synapses to perform the in-sensor computing is triggering a revolution due to the reduction of latency and energy consumption. Here it is demonstrated that the dwell time of photon-generated carriers in the space-charge region can be effectively extended by embedding a potential well on the shoulder of Schottky energy barrier. It permits the nonlinear interaction of photocurrents stimulated by spatiotemporal optical signals, which is necessary for in-sensor reservoir computing (RC). The machine vision with the sensor reservoir constituted by designed self-powered Au/P(VDF-TrFE)/Cs2 AgBiBr6 /ITO devices is competent for both static and dynamic vision tasks. It shows an accuracy of 99.97% for face classification and 100% for dynamic vehicle flow recognition. The in-sensor RC system takes advantage of near-zero energy consumption in the reservoir, resulting in decades-time lower training costs than a conventional neural network. This work paves the way for ultralow-power machine vision using photonic devices.
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Affiliation(s)
- Jie Lao
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Mengge Yan
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Bobo Tian
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
- Zhejiang LabHangzhou310000China
| | - Chunli Jiang
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Chunhua Luo
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Zhuozhuang Xie
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Qiuxiang Zhu
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
- Zhejiang LabHangzhou310000China
| | - Zhiqiang Bao
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Ni Zhong
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Xiaodong Tang
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
| | - Linfeng Sun
- Centre for Quantum Physics Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE)School of Physics Beijing Institute of TechnologyBeijing100081China
| | - Guangjian Wu
- Institute of OptoelectronicsFrontier Institute of Chip and SystemFudan University220 Handan RoadShanghai200433China
| | - Jianlu Wang
- Institute of OptoelectronicsFrontier Institute of Chip and SystemFudan University220 Handan RoadShanghai200433China
| | - Hui Peng
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
- Collaborative Innovation Center of Extreme OpticsShanxi UniversityShanxi030006China
| | - Junhao Chu
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
- Institute of OptoelectronicsFudan University220 Handan RoadShanghai200433China
| | - Chungang Duan
- Key Laboratory of Polar Materials and Devices (MOE)Ministry of EducationDepartment of ElectronicsEast China Normal UniversityShanghai200241China
- Collaborative Innovation Center of Extreme OpticsShanxi UniversityShanxi030006China
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19
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Zhu S, Li D, Wang Q, He Z, Wu Y, Lin H, Huang LB, Huang H, Gao S, Wang J, Gong Z, Qin Q, Wang X. Exciton Emissions in Bilayer WSe 2 Tuned by the Ferroelectric Polymer. J Phys Chem Lett 2022; 13:1636-1643. [PMID: 35143214 DOI: 10.1021/acs.jpclett.1c04029] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
In this work, a hybrid structure of multilayer transition-metal dichalcogenides (TMDs) and a ferroelectric polymer is designed to achieve passive control of optical properties in situ. The electrical polarization in the ferroelectric poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) polymer can regulate the photoluminescence (PL) in bilayer WSe2. The total PL emission intensity is substantially suppressed or enhanced under large gate voltage in bilayer WSe2. This is because electrons transfer between the conduction band K valley and the conduction band Λ valley by the electrostatic field in the P(VDF-TrFE) polymer. This electron transfer further adjusts the proportion of direct and indirect excitons and, in turn, changes the overall optical radiation efficiency. We also illustrate that the engineered PL originates from the external electric-field-dependent transferred electron effect. The theoretical result matches the experimental data well. This work demonstrates a device platform in which passive regulation is achieved using 2D TMDs modulated by polarized ferroelectric materials.
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Affiliation(s)
- Sixin Zhu
- College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, People's Republic of China
- School of Chemical and Environmental Engineering, Hanshan Normal University, Chaozhou 521041, Guangdong, People's Republic of China
| | - Dan Li
- State Key Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China
| | - Qiang Wang
- College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, People's Republic of China
| | - Zirui He
- Department of Materials Science, Fudan University, Shanghai 200433, People's Republic of China
| | - Yongpeng Wu
- College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, People's Republic of China
| | - Huihong Lin
- School of Chemical and Environmental Engineering, Hanshan Normal University, Chaozhou 521041, Guangdong, People's Republic of China
| | - Long-Biao Huang
- College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, People's Republic of China
| | - Hai Huang
- Department of Materials Science, Fudan University, Shanghai 200433, People's Republic of China
| | - Shangpeng Gao
- Department of Materials Science, Fudan University, Shanghai 200433, People's Republic of China
| | - Jianlu Wang
- State Key Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China
| | - Zhirui Gong
- College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, People's Republic of China
| | - Qi Qin
- College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, People's Republic of China
| | - Xingjun Wang
- State Key Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China
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20
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He S, Guo M, Dan Z, Lan S, Ren W, Zhou L, Wang Y, Liang Y, Zheng Y, Pan J, Shen Y. Large-area atomic-smooth polyvinylidene fluoride Langmuir-Blodgett film exhibiting significantly improved ferroelectric and piezoelectric responses. Sci Bull (Beijing) 2021; 66:1080-1090. [PMID: 36654342 DOI: 10.1016/j.scib.2021.02.004] [Citation(s) in RCA: 7] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/30/2020] [Revised: 12/16/2020] [Accepted: 01/21/2021] [Indexed: 01/20/2023]
Abstract
Large roughness and structure disorder in ferroelectric ultrathin Langmuir-Blodgett (LB) film results in severe space scatter in electrical, ferroelectric and piezoelectric characteristics, thus limiting the nanoscale research and reliability of nano-devices. However, no effective method aiming at large-area uniform organic ferroelectric LB film has ever been reported to date. Herein, we present a facile hot-pressing strategy to prepare relatively large-area poly(vinylidene fluoride) (PVDF) LB film with ultra-smooth surface root mean square (RMS) roughness is 0.3 nm in a 30 μm × 30 μm area comparable to that of metal substrate, which maximized the potential of LB technique to control thickness distribution. More importantly, compared with traditionally annealed LB film, the hot-pressed LB film manifests significantly improved structure uniformity, less fluctuation in ferroelectric characteristics and higher dielectric and piezoelectric responses, owing to the uniform dipole orientation and higher crystalline quality. Besides, different surface charge relaxation behaviors are investigated and the underlying mechanisms are explained in the light of the interplay of surface charge and polarization charge in the case of nanoscale non-uniform switching. We believe that our work not only presents a novel strategy to endow PVDF LB film with unprecedented reliability and improved performance as a competitive candidate for future ferroelectric tunnel junctions (FTJs) and nano electro mechanical systems (NEMS), but also reveals an attracting coupling effect between the surface potential distribution and nanoscale non-uniform switching behavior, which is crucial for the understanding of local transport characterization modulated by band structure, bit signal stability for data-storage application and the related surface charge research, such as charge gradient microscopy (CGM) based on the collection of surface charge on the biased ferroelectric domains.
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Affiliation(s)
- Shan He
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Mengfan Guo
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Zhenkang Dan
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Shun Lan
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Weibin Ren
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Le Zhou
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Yue Wang
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Yuhan Liang
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Yunpeng Zheng
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Jiayu Pan
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Yang Shen
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
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21
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Li X, Shi Z, Zhang X, Meng X, Huang Z, Zhang D. The Influence Mechanism of Temperature and Storage Period on Polarization Properties of Poly (Vinylidene Fluoride-Trifluoroethylene) Ultrathin Films. MEMBRANES 2021; 11:301. [PMID: 33919098 PMCID: PMC8143098 DOI: 10.3390/membranes11050301] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/16/2021] [Revised: 04/19/2021] [Accepted: 04/19/2021] [Indexed: 11/20/2022]
Abstract
The effect of testing temperature and storage period on the polarization fatigue properties of poly (vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) ultrathin film devices were investigated. The experimental results show that, even after stored in air for 150 days, the relative remanent polarization (Pr/Pr(0)) of P(VDF-TrFE) of ultrathin films can keep at a relatively high level of 0.80 at 25 °C and 0.70 at 60 °C. To account for this result, a hydrogen fluoride (HF) formation inhibition mechanism was proposed, which correlated the testing temperature and the storage period with the microstructure of P(VDF-TrFE) molecular chain. Moreover, a theoretical model was constructed to describe the polarization fatigue evolution of P(VDF-TrFE) samples.
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Affiliation(s)
- Xingjia Li
- School of Mathematics, Physics and Statistics, Shanghai University of Engineering Science, Shanghai 201620, China; (X.L.); (Z.S.); (Z.H.); (D.Z.)
- Research Center for Advanced Mirco-and Nano-Fabrication Materials, Shanghai University of Engineering Science, Shanghai 201620, China
| | - Zhi Shi
- School of Mathematics, Physics and Statistics, Shanghai University of Engineering Science, Shanghai 201620, China; (X.L.); (Z.S.); (Z.H.); (D.Z.)
| | - Xiuli Zhang
- School of Mathematics, Physics and Statistics, Shanghai University of Engineering Science, Shanghai 201620, China; (X.L.); (Z.S.); (Z.H.); (D.Z.)
- Research Center for Advanced Mirco-and Nano-Fabrication Materials, Shanghai University of Engineering Science, Shanghai 201620, China
- Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
- Key Laboratory of Infrared Imaging Materials and Detectors, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
| | - Xiangjian Meng
- Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
| | - Zhiqiang Huang
- School of Mathematics, Physics and Statistics, Shanghai University of Engineering Science, Shanghai 201620, China; (X.L.); (Z.S.); (Z.H.); (D.Z.)
| | - Dandan Zhang
- School of Mathematics, Physics and Statistics, Shanghai University of Engineering Science, Shanghai 201620, China; (X.L.); (Z.S.); (Z.H.); (D.Z.)
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22
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Wang X, Zhu C, Deng Y, Duan R, Chen J, Zeng Q, Zhou J, Fu Q, You L, Liu S, Edgar JH, Yu P, Liu Z. Van der Waals engineering of ferroelectric heterostructures for long-retention memory. Nat Commun 2021; 12:1109. [PMID: 33597507 PMCID: PMC7889872 DOI: 10.1038/s41467-021-21320-2] [Citation(s) in RCA: 55] [Impact Index Per Article: 18.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/10/2020] [Accepted: 01/21/2021] [Indexed: 01/31/2023] Open
Abstract
The limited memory retention for a ferroelectric field-effect transistor has prevented the commercialization of its nonvolatile memory potential using the commercially available ferroelectrics. Here, we show a long-retention ferroelectric transistor memory cell featuring a metal-ferroelectric-metal-insulator-semiconductor architecture built from all van der Waals single crystals. Our device exhibits 17 mV dec-1 operation, a memory window larger than 3.8 V, and program/erase ratio greater than 107. Thanks to the trap-free interfaces and the minimized depolarization effects via van der Waals engineering, more than 104 cycles endurance, a 10-year memory retention and sub-5 μs program/erase speed are achieved. A single pulse as short as 100 ns is enough for polarization reversal, and a 4-bit/cell operation of a van der Waals ferroelectric transistor is demonstrated under a 100 ns pulse train. These device characteristics suggest that van der Waals engineering is a promising direction to improve ferroelectronic memory performance and reliability for future applications.
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Affiliation(s)
- Xiaowei Wang
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Chao Zhu
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Ya Deng
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Ruihuan Duan
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Jieqiong Chen
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Qingsheng Zeng
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Jiadong Zhou
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Qundong Fu
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore
| | - Lu You
- grid.263761.70000 0001 0198 0694Jiangsu Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou, China
| | - Song Liu
- grid.36567.310000 0001 0737 1259Tim Taylor Department of Chemical Engineering, Durland Hall, Kansas State University, Manhattan, KS USA
| | - James H. Edgar
- grid.36567.310000 0001 0737 1259Tim Taylor Department of Chemical Engineering, Durland Hall, Kansas State University, Manhattan, KS USA
| | - Peng Yu
- grid.12981.330000 0001 2360 039XSchool of Materials Science and Engineering, State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, Guangzhou, China
| | - Zheng Liu
- grid.59025.3b0000 0001 2224 0361School of Materials Science and Engineering, Nanyang Technological University, Singapore, Singapore ,grid.59025.3b0000 0001 2224 0361CINTRA CNRS/NTU/THALES, UMI 3288, Research Techno Plaza, Singapore, Singapore ,grid.59025.3b0000 0001 2224 0361Centre for Micro-/Nano-electronics (NOVITAS), School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, Singapore
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23
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Goh Y, Hwang J, Jeon S. Excellent Reliability and High-Speed Antiferroelectric HfZrO 2 Tunnel Junction by a High-Pressure Annealing Process and Built-In Bias Engineering. ACS APPLIED MATERIALS & INTERFACES 2020; 12:57539-57546. [PMID: 33307691 DOI: 10.1021/acsami.0c15091] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Hafnia-based ferroelectric tunnel junctions (FTJs) have great potential for use in logic in nonvolatile memory because of their complementary metal-oxide-semiconductor process compatibility, low power consumption, high scalability, and nondestructive readout. However, typically, ferroelectrics have a depolarization field, resulting in poor endurance owing to the early dielectric breakdown. Herein, an outstandingly reliable and high-speed antiferroelectric HfZrO tunnel junction (AFTJ) is probed to understand whether it is a promising candidate for next-generation nonvolatile memory applications. High-reliability AFTJ can be explained by less charge injection due to the low depolarized field. The formation of two stable nonvolatile states, even with antiferroelectric materials, is possible if asymmetric work function electrodes and fixed oxide charges are employed, generating a built-in bias and shifting the polarization-voltage curve. In addition, via high-pressure annealing, a critical voltage that determines the transition from the t-phase to the o-phase is effectively reduced (22%). The AFTJ shows a higher endurance property (>109 cycles) and faster switching speed (<30 ns) than FTJ. Hence, it is proposed that with the help of internal bias modulation and high-pressure annealing, AFTJs can be employed in next-generation memory devices.
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Affiliation(s)
- Youngin Goh
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
| | - Junghyeon Hwang
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
| | - Sanghun Jeon
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
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24
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Cao Q, Lü W, Wang XR, Guan X, Wang L, Yan S, Wu T, Wang X. Nonvolatile Multistates Memories for High-Density Data Storage. ACS APPLIED MATERIALS & INTERFACES 2020; 12:42449-42471. [PMID: 32812741 DOI: 10.1021/acsami.0c10184] [Citation(s) in RCA: 38] [Impact Index Per Article: 9.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
In the current information age, the realization of memory devices with energy efficient design, high storage density, nonvolatility, fast access, and low cost is still a great challenge. As a promising technology to meet these stringent requirements, nonvolatile multistates memory (NMSM) has attracted lots of attention over the past years. Owing to the capability to store data in more than a single bit (0 or 1), the storage density is dramatically enhanced without scaling down the memory cell, making memory devices more efficient and less expensive. Multistates in a single cell also provide an unconventional in-memory computing platform beyond the Von Neumann architecture and enable neuromorphic computing with low power consumption. In this review, an in-depth perspective is presented on the recent progress and challenges on the device architectures, material innovation, working mechanisms of various types of NMSMs, including flash, magnetic random-access memory (MRAM), resistive random-access memory (RRAM), ferroelectric random-access memory (FeRAM), and phase-change memory (PCM). The intriguing properties and performance of these NMSMs, which are the key to realizing highly integrated memory hierarchy, are discussed and compared.
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Affiliation(s)
- Qiang Cao
- Spintronics Institute, University of Jinan, Jinan 250022, China
| | - Weiming Lü
- Spintronics Institute, University of Jinan, Jinan 250022, China
| | - X Renshaw Wang
- School of Physical and Mathematical Sciences & School of Electrical and Electronic Engineering, Nanyang Technological University, 639798 Singapore
| | - Xinwei Guan
- School of Materials Science and Engineering, University of New South Wales, Sydney, New South Wales 2052, Australia
| | - Lan Wang
- School of Science, ARC Centre of Excellence in Future Low-Energy Electronics Technologies, RMIT University, Melbourne, Victoria 3001, Australia
| | - Shishen Yan
- Spintronics Institute, University of Jinan, Jinan 250022, China
| | - Tom Wu
- School of Materials Science and Engineering, University of New South Wales, Sydney, New South Wales 2052, Australia
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25
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Wen Z, Wu D. Ferroelectric Tunnel Junctions: Modulations on the Potential Barrier. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e1904123. [PMID: 31583775 DOI: 10.1002/adma.201904123] [Citation(s) in RCA: 51] [Impact Index Per Article: 12.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/29/2019] [Revised: 08/16/2019] [Indexed: 06/10/2023]
Abstract
Recently, ferroelectric tunnel junctions (FTJs) have attracted considerable attention for potential applications in next-generation memories, owing to attractive advantages such as high-density of data storage, nondestructive readout, fast write/read access, and low energy consumption. Herein, recent progress regarding FTJ devices is reviewed with an emphasis on the modulation of the potential barrier. Electronic and ionic approaches that modulate the ferroelectric barriers themselves and/or induce extra barriers in electrodes or at ferroelectric/electrode interfaces are discussed with the enhancement of memory performance. Emerging physics, such as nanoscale ferroelectricity, resonant tunneling, and interfacial metallization, and the applications of FTJs in nonvolatile data storage, neuromorphic synapse emulation, and electromagnetic multistate memory are summarized. Finally, challenges and perspectives of FTJ devices are underlined.
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Affiliation(s)
- Zheng Wen
- College of Physics and Center for Marine Observation and Communications, Qingdao University, Qingdao, 266071, China
- Collaborative Innovation Center for Advanced Materials, Nanjing University, Nanjing, 210093, China
| | - Di Wu
- National Laboratory of Solid State Microstructures, Department of Materials Science and Engineering, Jiangsu Key Laboratory of Artificial Functional Materials and Collaborative Innovation Center for Advanced Materials, Nanjing University, Nanjing, 210093, China
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26
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Shi L, Zheng G, Tian B, Dkhil B, Duan C. Research progress on solutions to the sneak path issue in memristor crossbar arrays. NANOSCALE ADVANCES 2020; 2:1811-1827. [PMID: 36132530 PMCID: PMC9418872 DOI: 10.1039/d0na00100g] [Citation(s) in RCA: 26] [Impact Index Per Article: 6.5] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/06/2020] [Accepted: 03/10/2020] [Indexed: 05/15/2023]
Abstract
Since the emergence of memristors (or memristive devices), how to integrate them into arrays has been widely investigated. After years of research, memristor crossbar arrays have been proposed and realized with potential applications in nonvolatile memory, logic and neuromorphic computing systems. Despite the promising prospects of memristor crossbar arrays, one of the main obstacles for their development is the so-called sneak-path current causing cross-talk interference between adjacent memory cells and thus may result in misinterpretation which greatly influences the operation of memristor crossbar arrays. Solving the sneak-path current issue, the power consumption of the array will immensely decrease, and the reliability and stability will simultaneously increase. In order to suppress the sneak-path current, various solutions have been provided. So far, some reviews have considered some of these solutions and established a sophisticated classification, including 1D1M, 1T1M, 1S1M (D: diode, M: memristor, T: transistor, S: selector), self-selective and self-rectifying memristors. Recently, a mass of studies have been additionally reported. This review thus attempts to provide a survey on these new findings, by highlighting the latest research progress realized for relieving the sneak-path issue. Here, we first present the concept of the sneak-path current issue and solutions proposed to solve it. Consequently, we select some typical and promising devices, and present their structures and properties in detail. Then, the latest research activities focusing on single-device structures are introduced taking into account the mechanisms underlying these devices. Finally, we summarize the properties and perspectives of these solutions.
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Affiliation(s)
- Lingyun Shi
- Department of Electronics, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University Shanghai 200241 China
| | - Guohao Zheng
- Department of Electronics, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University Shanghai 200241 China
| | - Bobo Tian
- Department of Electronics, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University Shanghai 200241 China
- Laboratoire Structures, Propriétés et Modélisation des Solides, CentraleSupélec, CNRS-UMR8580, Université Paris-Saclay 91190 Gif-sur-Yvette France
| | - Brahim Dkhil
- Laboratoire Structures, Propriétés et Modélisation des Solides, CentraleSupélec, CNRS-UMR8580, Université Paris-Saclay 91190 Gif-sur-Yvette France
| | - Chungang Duan
- Department of Electronics, Key Laboratory of Polar Materials and Devices (MOE), East China Normal University Shanghai 200241 China
- Collaborative Innovation Center of Extreme Optics, Shanxi University Shanxi 030006 China
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27
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Liu YZ, Zhang H, Yu JX, Huang ZY, Wang C, Sun Y. Ferroelectric P(VDF-TrFE)/POSS nanocomposite films: compatibility, piezoelectricity, energy harvesting performance, and mechanical and atomic oxygen erosion. RSC Adv 2020; 10:17377-17386. [PMID: 35521467 PMCID: PMC9053480 DOI: 10.1039/d0ra01769h] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/24/2020] [Accepted: 04/24/2020] [Indexed: 11/21/2022] Open
Abstract
Poly(vinylidene difluoride) (PVDF) and its copolymers as the polymers with the highest piezoelectric coefficient have been widely used as sensors and generators. However, their relatively low performances limit their applications in some harsh environments. In this work, piezoelectric poly(vinylidene-trifluoroethylene) P(VDF-TrFE) matrices with different amounts of polyhedral oligomeric silsesquioxane (POSS) were prepared by a low temperature solvent evaporation method and thermal poling. The morphology, surface performance, crystalline phase, and piezoelectric and ferroelectric properties of the nanocomposites were investigated and the influence of POSS on these performances was studied. POSS had good compatibility with P(VDF-TrFE) and did not affect the crystalline phase formation of the matrix. The composites presented good piezoelectric properties. Piezo- and triboelectric nanogenerators were designed and fabricated. The voltage and current outputs were analyzed and the polarization effect was evaluated. The average output voltage and the current density of the matrix were 3 V and 0.5 μA cm−2 when subjected to a force of 38 N on an area of 1 cm2. The mechanical properties of P(VDF-TrFE)/POSS nanocomposites were also studied by the nanoindentation test. The hardness and modulus of samples increased 20% and 17% with a low addition of POSS. Atomic oxygen erosion properties of the composites were numerically simulated by the Monte Carlo method. The erosion cavity shape and depth were compared and studied. The influence of POSS addition on the P(VDF-TrFE) matrix and the associated reinforcing mechanism were analyzed. Poly(vinylidene difluoride) (PVDF) and its copolymers as the polymers with the highest piezoelectric coefficient have been widely used as sensors and generators.![]()
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Affiliation(s)
- Y Z Liu
- Department of Astronautic Science and Mechanics, Harbin Institute of Technology Harbin China
| | - H Zhang
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology Harbin China
| | - J X Yu
- School of Materials Science and Engineering, Harbin Institute of Technology Harbin China
| | - Z Y Huang
- Department of Astronautic Science and Mechanics, Harbin Institute of Technology Harbin China
| | - C Wang
- Department of Astronautic Science and Mechanics, Harbin Institute of Technology Harbin China
| | - Y Sun
- Department of Astronautic Science and Mechanics, Harbin Institute of Technology Harbin China
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28
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Wu G, Wang X, Chen Y, Wu S, Wu B, Jiang Y, Shen H, Lin T, Liu Q, Wang X, Zhou P, Zhang S, Hu W, Meng X, Chu J, Wang J. MoTe 2 p-n Homojunctions Defined by Ferroelectric Polarization. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e1907937. [PMID: 32104952 DOI: 10.1002/adma.201907937] [Citation(s) in RCA: 53] [Impact Index Per Article: 13.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/03/2019] [Revised: 01/14/2020] [Indexed: 05/16/2023]
Abstract
Doped p-n junctions are fundamental electrical components in modern electronics and optoelectronics. Due to the development of device miniaturization, the emergence of two-dimensional (2D) materials may initiate the next technological leap toward the post-Moore era owing to their unique structures and physical properties. The purpose of fabricating 2D p-n junctions has fueled many carrier-type modulation methods, such as electrostatic doping, surface modification, and element intercalation. Here, by using the nonvolatile ferroelectric field polarized in the opposite direction, efficient carrier modulation in ambipolar molybdenum telluride (MoTe2 ) to form a p-n homojunction at the domain wall is demonstrated. The nonvolatile MoTe2 p-n junction can be converted to n-p, n-n, and p-p configurations by external gate voltage pulses. Both rectifier diodes exhibited excellent rectifying characteristics with a current on/off ratio of 5 × 105 . As a photodetector/photovoltaic, the device presents responsivity of 5 A W-1 , external quantum efficiency of 40%, specific detectivity of 3 × 1012 Jones, fast response time of 30 µs, and power conversion efficiency of 2.5% without any bias or gate voltages. The MoTe2 p-n junction presents an obvious short-wavelength infrared photoresponse at room temperature, complementing the current infrared photodetectors with the inadequacies of complementary metal-oxide-semiconductor incompatibility and cryogenic operation temperature.
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Affiliation(s)
- Guangjian Wu
- National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, College of Engineering and Applied Science, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, China
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Xudong Wang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Yan Chen
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Shuaiqin Wu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Binmin Wu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Yiyang Jiang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Hong Shen
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Tie Lin
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Qi Liu
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
| | - Xinran Wang
- School of Electronic Science and Engineering, Key Laboratory of Advanced Photonic and Electronic Materials, Collaborative Innovation Center of Solid-State Lighting and Energy-Saving Electronics, Nanjing University, Nanjing, 210093, China
| | - Peng Zhou
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Shantao Zhang
- National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, College of Engineering and Applied Science, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, China
| | - Weida Hu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, 310024, China
| | - Xiangjian Meng
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Junhao Chu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
| | - Jianlu Wang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai, 200083, China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, 310024, China
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Liu Y, Wang Q. Ferroelectric Polymers Exhibiting Negative Longitudinal Piezoelectric Coefficient: Progress and Prospects. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2020; 7:1902468. [PMID: 32195083 PMCID: PMC7080546 DOI: 10.1002/advs.201902468] [Citation(s) in RCA: 28] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/10/2019] [Revised: 12/08/2019] [Indexed: 05/11/2023]
Abstract
Piezoelectric polymers are well-recognized to hold great promise for a wide range of flexible, wearable, and biocompatible applications. Among the known piezoelectric polymers, ferroelectric polymers represented by poly(vinylidene fluoride) and its copolymer poly(vinylidene fluoride-co-trifluoroethylene) possess the best piezoelectric coefficients. However, the physical origin of negative longitudinal piezoelectric coefficients occurring in the polymers remains elusive. To address this long-standing challenge, several theoretical models proposed over the past decades, which are controversial in nature, have been revisited and reviewed. It is concluded that negative longitudinal piezoelectric coefficients arise from the negative longitudinal electrostriction in the crystalline domain of the polymers, independent of amorphous and crystalline-amorphous interfacial regions. The crystalline origin of piezoelectricity offers unprecedented opportunities to improve electromechanical properties of polymers via structural engineering, i.e., design of morphotropic phase boundaries in ferroelectric polymers.
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Affiliation(s)
- Yang Liu
- Department of Materials Science and EngineeringThe Pennsylvania State UniversityUniversity ParkPA16802USA
| | - Qing Wang
- Department of Materials Science and EngineeringThe Pennsylvania State UniversityUniversity ParkPA16802USA
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30
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Li H, Wang R, Han S, Zhou Y. Ferroelectric polymers for non‐volatile memory devices: a review. POLYM INT 2020. [DOI: 10.1002/pi.5980] [Citation(s) in RCA: 31] [Impact Index Per Article: 7.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/11/2022]
Affiliation(s)
- Huilin Li
- Institute of Microscale Optoelectronics, Shenzhen University Shenzhen PR China
- Henan Key Laboratory of Photovoltaic MaterialsHenan University Kaifeng PR China
| | - Ruopeng Wang
- College of Electronics and Information EngineeringShenzhen University Shenzhen PR China
| | - Su‐Ting Han
- Institute of Microscale Optoelectronics, Shenzhen University Shenzhen PR China
| | - Ye Zhou
- Institute for Advanced Study, Shenzhen University Shenzhen PR China
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31
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Ng CYB, Gan WC, Velayutham TS, Goh BT, Hashim R. Structural control of the dielectric, pyroelectric and ferroelectric properties of poly(vinylidene fluoride-co-trifluoroethylene) thin films. Phys Chem Chem Phys 2020; 22:2414-2423. [PMID: 31939468 DOI: 10.1039/c9cp01556f] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
The effects of solvents and temperature on the crystal formation were investigated for vinylidene fluoride/trifluoroethylene copolymer P(VDF-TrFE). Highly crystalline P(VDF-TrFE) thin films were fabricated by spin-casting using various polar solvents such as diethyl carbonate (DEC), methyl ethyl ketone (MEK), N,N-dimethylformamide (DMF) and dimethyl sulfoxide (DMSO). Ferroelectric polarisation reversal of the P(VDF-TrFE) was evidenced by a displacement (D)-electric field (E) hysteresis loop measurement and supported by the presence of pyroelectric activity. The samples which were annealed above 100 °C gave elongated rod-like crystalline structures and the highest crystallinity, Xc of 83% was formed at 120 °C. Consequently, remnant polarisation (85 mC m-2) and the pyroelectric coefficient (30 μC m-2 K-1) were enhanced. Thus, annealing plays a substantial role in controlling the crystalline structure of P(VDF-TrFE) films regardless of the choice of solvent. Although, the crystalline structure control is almost independent of the solvent's polarity, the choice of solvent is essential in preparing a smoother film surface. Molecular dynamics of P(VDF-TrFE) are discussed from the observation of two dielectric relaxation processes, β and γ related to the segmental micro-Brownian and local modes, respectively. The complete ferroelectric polarization reversal caused a reduction in the dielectric polarization and reduced the lattice spacing of the 110/200 planes.
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Affiliation(s)
- C Y B Ng
- Low Dimensional Materials Research Center, Department of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, Malaysia.
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32
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Yin Z, Tian B, Zhu Q, Duan C. Characterization and Application of PVDF and Its Copolymer Films Prepared by Spin-Coating and Langmuir-Blodgett Method. Polymers (Basel) 2019; 11:E2033. [PMID: 31817985 PMCID: PMC6960743 DOI: 10.3390/polym11122033] [Citation(s) in RCA: 37] [Impact Index Per Article: 7.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/25/2019] [Revised: 12/04/2019] [Accepted: 12/05/2019] [Indexed: 12/11/2022] Open
Abstract
Poly(vinylidene fluoride) (PVDF) and its copolymers are key polymers, displaying properties such as flexibility and electroactive responses, including piezoelectricity, pyroelectricity, and ferroelectricity. In the past several years, they have been applied in numerous applications, such as memory, transducers, actuators, and energy harvesting and have shown thriving prospects in the ongoing research and commercialization process. The crystalline polymorphs of PVDF can present nonpolar α, ε phase and polar β, γ, and δ phases with different processing methods. The copolymers, such as poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)), can crystallize directly into a phase analogous to the β phase of PVDF. Since the β phase shows the highest dipole moment among polar phases, many reproducible and efficient methods producing β-phase PVDF and its copolymer have been proposed. In this review, PVDF and its copolymer films prepared by spin-coating and Langmuir-Blodgett (LB) method are introduced, and relevant characterization techniques are highlighted. Finally, the development of memory, artificial synapses, and medical applications based on PVDF and its copolymers is elaborated.
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Affiliation(s)
| | - Bobo Tian
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China; (Z.Y.); (C.D.)
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33
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Urbanaviciute I, Bhattacharjee S, Biler M, Lugger JAM, Cornelissen TD, Norman P, Linares M, Sijbesma RP, Kemerink M. Suppressing depolarization by tail substitution in an organic supramolecular ferroelectric. Phys Chem Chem Phys 2019; 21:2069-2079. [PMID: 30638230 DOI: 10.1039/c8cp06315j] [Citation(s) in RCA: 18] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Abstract
Despite being very well established in the field of electro-optics, ferroelectric liquid crystals so far lacked interest from a ferroelectric device perspective due to a typically high operating temperature, a modest remnant polarization and/or poor polarization retention. Here, we experimentally demonstrate how simple structural modification of a prototypical ferroelectric liquid-crystal benzene-1,3,5-trisamide (BTA) - introduction of branched-tail substituents - results in materials with a wide operating temperature range and a data retention time of more than 10 years in thin-film solution-processed capacitor devices at room temperature. The observed differences between linear- and branched-tail compounds are analyzed using density functional theory (DFT) and molecular dynamics (MD) simulations. We conclude that morphological factors like improved packing quality and reduced disorder, rather than electrostatic interactions or intra/inter-columnar steric hindrance, underlay the superior properties of the branched-tailed BTAs. Synergistic effects upon blending of compounds with branched and linear side-chains can be used to further improve the materials' characteristics.
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Affiliation(s)
- Indre Urbanaviciute
- Complex Materials and Devices, Department of Physics, Chemistry and Biology (IFM), Linköping University, 58183 Linköping, Sweden.
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34
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Liang S, Yu Z, Devaux X, Ferri A, Huang W, Yang H, Desfeux R, Li X, Migot S, Chaudhuri D, Yang H, Chshiev M, Yang C, Zhou B, Fang J, Mangin S, Lu Y. Quenching of Spin Polarization Switching in Organic Multiferroic Tunnel Junctions by Ferroelectric "Ailing-Channel" in Organic Barrier. ACS APPLIED MATERIALS & INTERFACES 2018; 10:30614-30622. [PMID: 30125490 DOI: 10.1021/acsami.8b11437] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
The ferroelectric control of spin-polarization at ferromagnet (FM)/ferroelectric organic (FE-Org) interface by electrically switching the ferroelectric polarization of the FE-Org has been recently realized in the organic multiferroic tunnel junctions (OMFTJs) and gained intensive interests for future multifunctional organic spintronic applications. Here, we report the evidence of ferroelectric "ailing-channel" in the organic barrier, which can effectively pin the ferroelectric domain, resulting in nonswitchable spin polarization at the FM/FE-Org interface. In particular, OMFTJs based on La0.6Sr0.4MnO3/P(VDF-TrFE) ( t)/Co/Au structures with different P(VDF-TrFE) thickness ( t) were fabricated. The combined advanced electron microscopy and spectroscopy studies clearly reveal that very limited Co diffusion exists in the P(VDF-TrFE) organic barrier when the Au/Co electrode is deposited around 80K. Pot-hole structures at the boundary between the P(VDF-TrFE) needle-like grains are evidenced to induce "ailing-channels" that hinder efficient ferroelectric polarization of the organic barrier and result in the quenching of the spin polarization switching at Co/P(VDF-TrFE) interface. Furthermore, the spin diffusion length in the negatively polarized P(VDF-TrFE) is measured to be about 7.2 nm at 20K. The evidence of the mechanism of ferroelectric "ailing-channels" is of essential importance to improve the performance of OMFTJ and master the key condition for an efficient ferroelectric control of the spin polarization of "spinterface".
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Affiliation(s)
- Shiheng Liang
- Institut Jean Lamour, UMR 7198 , CNRS-Université de Lorraine, Campus ARTEM , 2 Allée André Guinier, BP 50840 , 54011 Nancy , France
- Department of Physics , Hubei University , Wuhan 430062 , P. R. China
| | - Zhongwei Yu
- Institut Jean Lamour, UMR 7198 , CNRS-Université de Lorraine, Campus ARTEM , 2 Allée André Guinier, BP 50840 , 54011 Nancy , France
- School of Science , Nantong University , 9 Seyuan Road , Nantong 226019 , P. R. China
| | - Xavier Devaux
- Institut Jean Lamour, UMR 7198 , CNRS-Université de Lorraine, Campus ARTEM , 2 Allée André Guinier, BP 50840 , 54011 Nancy , France
| | - Anthony Ferri
- Univ. Artois, CNRS, Centrale Lille, ENSCL, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS) , F-62300 Lens , France
| | - Weichuan Huang
- Hefei National Laboratory for Physical Sciences at the Microscale, Department of Physics , University of Science and Technology of China , Hefei 230026 , P. R. China
| | - Huaiwen Yang
- Institut Jean Lamour, UMR 7198 , CNRS-Université de Lorraine, Campus ARTEM , 2 Allée André Guinier, BP 50840 , 54011 Nancy , France
| | - Rachel Desfeux
- Univ. Artois, CNRS, Centrale Lille, ENSCL, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS) , F-62300 Lens , France
| | - Xiaoguang Li
- Hefei National Laboratory for Physical Sciences at the Microscale, Department of Physics , University of Science and Technology of China , Hefei 230026 , P. R. China
| | - Sylvie Migot
- Institut Jean Lamour, UMR 7198 , CNRS-Université de Lorraine, Campus ARTEM , 2 Allée André Guinier, BP 50840 , 54011 Nancy , France
| | - Debapriya Chaudhuri
- Univ. Grenoble Alpes, CEA, CNRS , Grenoble INP, INAC-Spintec, 38000 Grenoble , France
| | - Hongxin Yang
- Key Laboratory of Magnetic Materials and Devices , Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences , Ningbo 315201 , China
| | - Mairbek Chshiev
- Univ. Grenoble Alpes, CEA, CNRS , Grenoble INP, INAC-Spintec, 38000 Grenoble , France
| | - Changping Yang
- Department of Physics , Hubei University , Wuhan 430062 , P. R. China
| | - Bin Zhou
- Department of Physics , Hubei University , Wuhan 430062 , P. R. China
| | - Jinghuai Fang
- School of Science , Nantong University , 9 Seyuan Road , Nantong 226019 , P. R. China
| | - Stéphane Mangin
- Institut Jean Lamour, UMR 7198 , CNRS-Université de Lorraine, Campus ARTEM , 2 Allée André Guinier, BP 50840 , 54011 Nancy , France
| | - Yuan Lu
- Institut Jean Lamour, UMR 7198 , CNRS-Université de Lorraine, Campus ARTEM , 2 Allée André Guinier, BP 50840 , 54011 Nancy , France
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35
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Chen L, Wang TY, Dai YW, Cha MY, Zhu H, Sun QQ, Ding SJ, Zhou P, Chua L, Zhang DW. Ultra-low power Hf 0.5Zr 0.5O 2 based ferroelectric tunnel junction synapses for hardware neural network applications. NANOSCALE 2018; 10:15826-15833. [PMID: 30105324 DOI: 10.1039/c8nr04734k] [Citation(s) in RCA: 46] [Impact Index Per Article: 7.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Brain-inspired neuromorphic computing has shown great promise beyond the conventional Boolean logic. Nanoscale electronic synapses, which have stringent demands for integration density, dynamic range, energy consumption, etc., are key computational elements of the brain-inspired neuromorphic system. Ferroelectric tunneling junctions have been shown to be ideal candidates to realize the functions of electronic synapses due to their ultra-low energy consumption and the nature of ferroelectric tunneling. Here, we report a new electronic synapse based on a three-dimensional vertical Hf0.5Zr0.5O2-based ferroelectric tunneling junction that meets the full functions of biological synapses. The fabricated three-dimensional vertical ferroelectric tunneling junction synapse (FTJS) exhibits high integration density and excellent performances, such as analog-like conductance transition under a training scheme, low energy consumption of synaptic weight update (1.8 pJ per spike) and good repeatability (>103 cycles). In addition, the implementation of pattern training in hardware with strong tolerance to input faults and variations is also illustrated in the 3D vertical FTJS array. Furthermore, pattern classification and recognition are achieved, and these results demonstrate that the Hf0.5Zr0.5O2-based FTJS has high potential to be an ideal electronic component for neuromorphic system applications.
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Affiliation(s)
- Lin Chen
- State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China.
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36
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Direct observation of room-temperature out-of-plane ferroelectricity and tunneling electroresistance at the two-dimensional limit. Nat Commun 2018; 9:3319. [PMID: 30127419 PMCID: PMC6102252 DOI: 10.1038/s41467-018-05662-y] [Citation(s) in RCA: 38] [Impact Index Per Article: 6.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/21/2017] [Accepted: 07/02/2018] [Indexed: 02/06/2023] Open
Abstract
Out-of-plane ferroelectricity with a high transition temperature in nanometer-scale films is required to miniaturize electronic devices. Direct visualization of stable ferroelectric polarization and its switching behavior in atomically thick films is critical for achieving this goal. Here, ferroelectric order at room temperature in the two-dimensional limit is demonstrated in tetragonal BiFeO3 ultrathin films. Using aberration-corrected scanning transmission electron microscopy, we directly observed robust out-of-plane spontaneous polarization in one-unit-cell-thick BiFeO3 films. High-resolution piezoresponse force microscopy measurements show that the polarization is stable and switchable, whereas a tunneling electroresistance effect of up to 370% is achieved in BiFeO3 films. Based on first-principles calculations and Kelvin probe force microscopy measurements, we explain the mechanism of polarization stabilization by the ionic displacements in oxide electrode and the surface charges. Our results indicate that critical thickness for ferroelectricity in the BiFeO3 film is virtually absent, making it a promising candidate for high-density nonvolatile memories. High temperature perpendicular ferroelectricity in nano thin films is crucial for miniaturization of electronic devices. Here the authors show the presence of stable and switchable out-of-plane ferroelectricity in tetragonal BiFeO3 thin films at the two-dimensional limit and 370% tunneling electroresistance in ferroelectric tunnel junctions.
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37
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Tiwari VK, Lee Y, Song G, Lib Kim K, Jung Park Y, Park C. Thin poly(ionic liquid) and poly(vinylidene fluoride) blend films with ferro- and piezo-electric polar γ-crystals. ACTA ACUST UNITED AC 2018. [DOI: 10.1002/polb.24593] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Vimal K. Tiwari
- Department of Materials Science and Engineering; Yonsei University; Seoul 120-749 Republic of Korea
| | - Yujeong Lee
- Department of Materials Science and Engineering; Yonsei University; Seoul 120-749 Republic of Korea
| | - Giyoung Song
- Department of Materials Science and Engineering; Yonsei University; Seoul 120-749 Republic of Korea
| | - Kang Lib Kim
- Department of Materials Science and Engineering; Yonsei University; Seoul 120-749 Republic of Korea
| | - Youn Jung Park
- IP Center, Samsung Electronics; Seoul 06705 Republic of Korea
| | - Cheolmin Park
- Department of Materials Science and Engineering; Yonsei University; Seoul 120-749 Republic of Korea
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38
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Wang J, Fang H, Wang X, Chen X, Lu W, Hu W. Recent Progress on Localized Field Enhanced Two-dimensional Material Photodetectors from Ultraviolet-Visible to Infrared. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2017; 13. [PMID: 28597486 DOI: 10.1002/smll.201700894] [Citation(s) in RCA: 86] [Impact Index Per Article: 12.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/19/2017] [Revised: 04/18/2017] [Indexed: 05/06/2023]
Abstract
Two-dimensional (2D) materials have drawn tremendous attention in recent years. Being atomically thin, stacked with van der Waals force and free of surface chemical dangling bonds, 2D materials exhibit several distinct physical properties. To date, 2D materials include graphene, transition metal dichalcogenides (TMDS), black phosphorus, black P(1-x) Asx , boron nitride (BN) and so forth. Owing to their various bandgaps, 2D materials have been utilized for photonics and optoelectronics. Photodetectors based on 2D materials with different structures and detection mechanisms have been established and present excellent performance. In this Review, localized field enhanced 2D material photodetectors (2DPDs) are introduced with sensitivity over the spectrum from ultraviolet, visible to infrared in the sight of the influence of device structure on photodetector performance instead of directly illustrating the detection mechanisms. Six types of localized fields are summarized. They are: ferroelectric field, photogating electric field, floating gate induced electrostatic field, interlayer built-in field, localized optical field, and photo-induced temperature gradient field, respectively. These localized fields are proved to effectively promote the detection ability of 2DPDs by suppressing background noise, enhancing optical absorption, improving electron-hole separation efficiency, amplifying photoelectric gain and/or extending the detection range.
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Affiliation(s)
- Jianlu Wang
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yutian Road, Shanghai, 200083, China
| | - Hehai Fang
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yutian Road, Shanghai, 200083, China
- University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing, 100049, China
| | - Xudong Wang
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yutian Road, Shanghai, 200083, China
| | - Xiaoshuang Chen
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yutian Road, Shanghai, 200083, China
- University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing, 100049, China
| | - Wei Lu
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yutian Road, Shanghai, 200083, China
- University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing, 100049, China
| | - Weida Hu
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yutian Road, Shanghai, 200083, China
- University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing, 100049, China
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39
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Bärtsch M, Niederberger M. The Role of Interfaces in Heterostructures. Chempluschem 2017; 82:42-59. [DOI: 10.1002/cplu.201600519] [Citation(s) in RCA: 23] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/06/2016] [Revised: 12/16/2016] [Indexed: 11/06/2022]
Affiliation(s)
- Mario Bärtsch
- Laboratory for Multifunctional Materials; Department of Materials; ETH Zürich; Vladimir-Prelog-Weg 5 8093 Zürich Switzerland
| | - Markus Niederberger
- Laboratory for Multifunctional Materials; Department of Materials; ETH Zürich; Vladimir-Prelog-Weg 5 8093 Zürich Switzerland
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40
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Liang S, Yang H, Yang H, Tao B, Djeffal A, Chshiev M, Huang W, Li X, Ferri A, Desfeux R, Mangin S, Lacour D, Hehn M, Copie O, Dumesnil K, Lu Y. Ferroelectric Control of Organic/Ferromagnetic Spinterface. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2016; 28:10204-10210. [PMID: 27709711 DOI: 10.1002/adma.201603638] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/10/2016] [Revised: 08/18/2016] [Indexed: 06/06/2023]
Abstract
Organic multiferroic tunnel junctions based on La0.6 Sr0.4 MnO3 /poly(vinylidene fluoride) (PVDF)/Co structures are fabricated. The tunneling magneto-resistance sign can be changed by electrically switching the ferroelectric polarization of PVDF barrier. It is demonstrated that the spin-polarization of the PVDF/Co spinterface can be actively controlled by tuning the ferroelectric polarization of PVDF. This study opens new functionality in controlling the injection of spin polarization into organic materials via the ferroelectric polarization of the barrier.
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Affiliation(s)
- Shiheng Liang
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Hongxin Yang
- Univ. Grenoble Alpes, INAC-SPINTEC, F-38000 Grenoble, France CEA, INAC-SPINTEC F-38000 Grenoble, France CNRS, SPINTEC, F-38000, Grenoble, France
| | - Huaiwen Yang
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Bingshan Tao
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Abdelhak Djeffal
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Mairbek Chshiev
- Univ. Grenoble Alpes, INAC-SPINTEC, F-38000 Grenoble, France CEA, INAC-SPINTEC F-38000 Grenoble, France CNRS, SPINTEC, F-38000, Grenoble, France
| | - Weichuan Huang
- Hefei National Laboratory for Physical Sciences at Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, P. R. China
| | - Xiaoguang Li
- Hefei National Laboratory for Physical Sciences at Microscale, Department of Physics, University of Science and Technology of China, Hefei, 230026, P. R. China
| | - Anthony Ferri
- Univ. Artois, CNRS, Centrale Lille, ENSCL, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), F-62300, Lens, France
| | - Rachel Desfeux
- Univ. Artois, CNRS, Centrale Lille, ENSCL, Univ. Lille, UMR 8181, Unité de Catalyse et Chimie du Solide (UCCS), F-62300, Lens, France
| | - Stéphane Mangin
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Daniel Lacour
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Michel Hehn
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Olivier Copie
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Karine Dumesnil
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
| | - Yuan Lu
- Institut Jean Lamour, CNRS-Université de Lorraine, UMR 7198, BP 239, 54506, Vandœuvre, France
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