Single-layer ionic conduction on carboxyl-terminated silane monolayers patterned by constructive lithography

Interfacial Electron Beam Lithography Converts an Insulating Organic Monolayer to a Patterned Single-Layer Conductor with Puzzling Charge Transport Performance

The direct generation of conducting paths within an insulating surface represents a conceptually unexplored approach to single-layer electrical conduction that opens vistas for exciting research and applications fundamentally different from those based on specific layered materials. Herein we report surface channels with single-layer -COOH functionality patterned on insulating n-octadecyltrichlorosilane monolayers on silicon that exhibit unusual ionic-electronic conduction when equipped with ion-releasing silver electrodes. The strong dependence of charge transport in such channels on their lateral dimensions (nanosize, macro-size), the type (p, n) and resistivity (doping level) of the underlying silicon substrate, the nature of the insulating spacer layer between the conducting channel and the silicon surface, and the postpatterning chemical manipulation of channel's -COOH functionality allows designing channels with variable resistivities, ranging from that of a practical insulator to some unexpectedly low values. The unusually low resistivities displayed by channels with nanometric widths and micrometer-millimeter lengths are attributed primarily to enhanced electronic transport within ultrathin nanowire-like silver metal films formed along their conductive paths. Function-structure correlations derived from a comprehensive analysis of electrical, atomic force microscopy, and Fourier transform infrared spectral data suggest an unconventional mode of conduction in these channels, which has yet to be elucidated, apparently involving coupled ionic-electronic transport mediated and enhanced by interfacial electrical interactions with charge carriers located outside the conducting channel and separated from those carrying the measured current. These intriguing findings hint at effects akin to Coulomb pairing in the proposed mechanisms of excitonic superconductivity in interfacial nanosystems structurally related to the present metalized surface channels.

Thermal Stability and Orthogonal Functionalization of Organophosphonate Self-Assembled Monolayers as Potential Liners for Cu Interconnect

In this study, we investigated the thermal stabilities of butylphosphonic acid (BPA) and aminopropyltriethoxysilane (APTES) self-assembled monolayers (SAM) on a Si substrate. The thermal desorption and the thermal cleavage of the BPA and APTES SAM film on the Si substrate were studied by X-ray photoelectron spectroscopy (XPS) upon thermal treatment from 50 to 550 °C. XPS analyses show that the onset of the thermal desorption of the APTES monolayer occurs at 250 °C and the APTES SAM completely decomposed at 400 °C. Conversely, BPA SAM on Si shows that the onset of thermal desorption occurs at 350 °C, and the BPA SAM completely desorbed at approximately 500 °C. Our study revealed that the organophosphonate SAM is a more stable SAM in modifying the dielectric sidewalls of a Cu interconnect when compared to organosilane SAM. To overcome the spontaneous reaction of the organophosphonate film on the metal substrate, a simple orthogonal functionalization method using thiolate SAM as a sacrificial layer was also demonstrated in this study.

An artificial synapse based on molecular junctions

Shrinking the size of the electronic synapse to molecular length-scale, for example, an artificial synapse directly fabricated by using individual or monolayer molecules, is important for maximizing the integration density, reducing the energy consumption, and enabling functionalities not easily achieved by other synaptic materials. Here, we show that the conductance of the self-assembled peptide molecule monolayer could be dynamically modulated by placing electrical biases, enabling us to implement basic synaptic functions. Both short-term plasticity (e.g., paired-pulse facilitation) and long-term plasticity (e.g., spike-timing-dependent plasticity) are demonstrated in a single molecular synapse. The dynamic current response is due to a combination of both chemical gating and coordination effects between Ag⁺ and hosting groups within peptides which adjusts the electron hopping rate through the molecular junction. In the end, based on the nonlinearity and short-term synaptic characteristics, the molecular synapses are utilized as reservoirs for waveform recognition with 100% accuracy at a small mask length.

Field-Created Coordinate Cation Bridges Enable Conductance Modulation and Artificial Synapse within Metal Nanoparticles

When metal nanoparticles are functionalized with charged ligands, the movement of counterions and conduction electrons is coupled, which enables us to develop electronic devices, including diodes, transistors, and logic gates, but dynamically modulating the conductivity of a synaptic device within these materials has proved challenging. Here we show that an artificial synapse can be created from thin films of functionalized metal nanoparticles using an active silver electrode. The electric-field-injected Ag⁺ coordinates with carboxyl ligands that sets up a conduction bridge to increase the nanoparticle conductivity by reducing the electron tunneling/hopping energy barriers. The dynamic modulation of conductivity allows us to implement several important synaptic functions such as potentiation/depression, paired-pulse facilitation, learning behaviors including short-term to long-term memory transition, self-learning, and massed leaning vs spaced learning. Finally, based on the nonvolatile characteristics, the metal nanoparticle synapse is used to build a single-layer hardware spiking neural network (SNN) for pattern recognition.

Stable solar water splitting with wettable organic-layer-protected silicon photocathodes

Protective layers are essential for Si-based photocathodes to achieve long-term stability. The conventionally used inorganic protective layers, such as TiO₂, need to be free of pinholes to isolate Si from corrosive solution, which demands extremely high-quality deposition techniques. On the other hand, organic hydrophobic protective layers suffer from the trade-off between current density and stability. This paper describes the design and fabrication of a discontinuous hybrid organic protective layer with controllable surface wettability. The underlying hydrophobic layer induces the formation of thin gas layers at the discontinuous pores to isolate the electrolyte from Si substrate, while allowing Pt co-catalyst to contact the electrolyte for water splitting. Meanwhile, the surface of this organic layer is modified with hydrophilic hydroxyl groups to facilitate bubble detachment. The optimized photocathode achieves a stable photocurrent of 35 mA/cm² for over 110 h with no trend of decay.

Preparation of inorganic protective layers for photoelectrodes requires high-quality deposition techniques. Here, the authors report a spin-coated organic protective layer that enables Si photocathodes to realize stable solar water splitting.

Natural Acidic Polysaccharide-Based Memristors for Transient Electronics: Highly Controllable Quantized Conductance for Integrated Memory and Nonvolatile Logic Applications

As a leading candidate for further memory and computing applications, memristors are being developed in an important direction of transient electronics. Herein, wafer-scale acidic polysaccharide thin films are reported as promising materials for memristors with remarkable transient characteristics. The memristor shows freestanding and lightweight features, and can be fully dissolved in deionized water within 3.5 s. More importantly, the ion-confinement capability of acidic polysaccharides where the cations can interact with the ionizable acid groups enables atomic manipulation of conductive filament. As a result, (i) a single device can produce 16 highly controllable and independent quantized conductance (QC) states with quasi-nonvolatile and nonvolatile characteristics and (ii) QC switching can be performed with ultrafast speed (2-5 ns) and low energy consumption (0.6-16 pJ). These remarkable features make the memristor promising for fast, low-power, and high-density memory and computing applications. Based on QC switching, the encoding/decoding and nonvolatile basic Boolean logic are designed and implemented. More importantly, "stateful" material implication logic which is promising for future in-memory computing is demonstrated with QC switching. These results significantly advance acidic polysaccharides to develop nanodevices with quantum effects.

Ionic Transport and Robust Switching Properties of the Confined Self-Assembled Block Copolymer/Homopolymer in Asymmetric Nanochannels

The self-assembly of block copolymers in a confined space has been proven to be a facile and robust strategy for fabricating assembled structures with various potential applications. Herein, we employed a new pH-responsive polymer self-assembly method to regulate ion transport inside artificial nanochannels. The track-etched asymmetric nanochannels were functionalized with PS_22k-b-P4VP_17k/hPS_4k blend polymers, and the ionic conductance and rectification properties of the proposed system were investigated. The pH-actuated changes in the surface charge and wettability resulted in the selective pH-gated ionic transport behavior. The designed system showed a good switching property to the pH stimulus and could recover during the repetitive experiments. The gating ability of the polymer-nanochannel system increased with increasing the weight of the homopolymer, and the proposed platform demonstrated robust stability and reusability. Numerical and the dissipative particle dynamics simulations were implemented to emulate the pH-dependent self-assembling behavior of diblock copolymers in a confined space, which were consistent with the experimental observations. As an example of the self-assembly of polymers in nanoconfinements, this work provides a facile and robust strategy for the regulation of ion transport in synthetic nanochannels. Meanwhile, this work can be further extended to design artificial smart nanogates for various applications such as mass delivery and energy harvesting.

Temperature-Dependent Mechanochemical Wear of Silicon in Water: The Role of Si-OH Surfacial Groups

Mechanochemical wear has attracted much attention due to its critical role in micro/nanodevice applications, reliable microscopy, and ultraprecision manufacturing. As a process of stress-associated chemical reactions, mechanochemical wear strongly depends on temperature; however, the impact mechanism is not fully understood at any length scale. Here, we reported different water-temperature dependence of mechanochemical wear on two typical single crystal silicon (Si) surfaces, involving oxide-covered Si partially terminated with Si-OH groups and oxide-free Si fully terminated with Si-H groups. As the water temperature increased from 10 to 80 °C, the mechanochemical wear of the oxide-covered Si underwent a process from no obvious surface damage to significant material removal but that occurring at all temperatures decreased gradually on the oxide-free Si surface. The opposite temperature-dependence was found to have a strong relation to the growth or degeneration of the Si-OH surfacial groups. The mechanochemical wear on the both Si surfaces decreased with the Si-OH coverage rising, which facilitated the growth of strongly hydrogen-bonded ordered water and then suppressed the chemical reaction between the sliding interfaces. These results can provide new insight into the mechanism of the surrounding temperature affecting the reliable micro/nanodevices, manufacturing, and microscopy.

Carboxylic acid-protruding zincophosphate sheets exhibiting surface mechanochemical reactivity and intriguing nano-morphological reversibility

A hybrid zincophosphate with surface-active and interior –COOH exhibits remarkable characteristics of high thermal stability, modifiable wettability and nano-morphological reversibility.

Direct Patterning of p-Type-Doped Few-layer WSe2 Nanoelectronic Devices by Oxidation Scanning Probe Lithography

Direct, robust, and high-resolution patterning methods are needed to downscale the lateral size of two-dimensional materials to observe new properties and optimize the overall processing of these materials. In this work, we report a fabrication process where the initial microchannel of a few-layer WSe₂ field-effect transistor is treated by oxygen plasma to form a self-limited oxide layer on top of the flake. This thin oxide layer has a double role here. First, it induces the so-called p-doping effect in the device. Second, it enables the fabrication of oxide nanoribbons with controlled width and depth by oxidation scanning probe lithography (o-SPL). After the removal of the oxides by deionized H₂O etching, a nanoribbon-based field-effect transistor is produced. Oxidation SPL is a direct writing technique that minimizes the use of resists and lithographic steps. We have applied this process to fabricate a 5 nm thick WSe₂ field-effect transistor, where the channel consists in an array of 5 parallel 350 nm half-pitch nanoribbons. The electrical measurements show that the device presents an improved conduction level compared to the starting thin-layer transistor and a positive threshold voltage shift associated to the p-doping treatment. The method enables to pattern devices with sub-50 nm feature sizes. We have patterned an array of 10 oxide nanowires with 36 nm half-pitch by oxidation SPL.

Interfacial Electron Beam Lithography: Chemical Monolayer Nanopatterning via Electron-Beam-Induced Interfacial Solid-Phase Oxidation

Chemical nanopatterning-the deliberate nanoscale modification of the chemical nature of a solid surface-is conveniently realized using organic monolayer coatings to impart well-defined chemical functionalities to selected surface regions of the coated solid. Most monolayer patterning methods, however, exploit destructive processes that introduce topographic as well as other undesired structural and chemical transformations along with the desired surface chemical modification. In particular in electron beam lithography (EBL), organic monolayers have been used mainly as ultrathin resists capable of improving the resolution of patterning via local deposition or removal of material. On the basis of the recent discovery of a class of radiation-induced interfacial chemical transformations confined to the contact surface between two solids, we have advanced a direct, nondestructive EBL approach to chemical nanopatterning-interfacial electron beam lithography (IEBL)-demonstrated here by the e-beam-induced local oxidation of the -CH₃ surface moieties of a highly ordered self-assembled n-alkylsilane monolayer to -COOH while fully preserving the monolayer structural integrity and molecular organization. In this conceptually different EBL process, the traditional resist is replaced by a thin film coating that acts as a site-activated reagent/catalyst in the chemical modification of the coated surface, here the top surface of the to-be-patterned monolayer. Structural and chemical transformations induced in the thin film coating and the underlying monolayer upon exposure to the electron beam were elucidated using a semiquantitative surface characterization methodology that combines multimode AFM imaging with postpatterning surface chemical modifications and quantitative micro-FTIR measurements. IEBL offers attractive opportunities in chemical nanopatterning, for example, by enabling the application of the advanced EBL technology to the straightforward nanoscale functionalization of the simplest commonly used organosilane monolayers.

Vapor-Phase Nanopatterning of Aminosilanes with Electron Beam Lithography: Understanding and Minimizing Background Functionalization

Electron beam lithography (EBL) is a highly precise, serial method for patterning surfaces. Positive tone EBL resists enable patterned exposure of the underlying surface, which can be subsequently functionalized for the application of interest. In the case of widely used native oxide-capped silicon surfaces, coupling an activated silane with electron beam lithography would enable nanoscale chemical patterning of the exposed regions. Aminoalkoxysilanes are extremely useful due to their reactive amino functionality but have seen little attention for nanopatterning silicon surfaces with an EBL resist due to background contamination. In this work, we investigated three commercial positive tone EBL resists, PMMA (950k and 495k) and ZEP520A (57k), as templates for vapor-phase patterning of two commonly used aminoalkoxysilanes, 3-aminopropyltrimethoxysilane (APTMS) and 3-aminopropyldiisopropylethoxysilane (APDIPES). The PMMA resists were susceptible to significant background reaction within unpatterned areas, a problem that was particularly acute with APTMS. On the other hand, with both APTMS and APDIPES exposure, unpatterned regions of silicon covered by the ZEP520A resist emerged pristine, as shown both with SEM images of the surfaces of the underlying silicon and through the lack of electrostatically driven binding of negatively charged gold nanoparticles. The ZEP520A resist allowed for the highly selective deposition of these alkoxyaminosilanes in the exposed areas, leaving the unpatterned areas clean, a claim also supported by contact angle measurements with four probe liquids and X-ray photoelectron spectroscopy (XPS). We investigated the mechanistic reasons for the stark contrast between the PMMA resists and ZEP520A, and it was found that the efficacy of resist removal appeared to be the critical factor in reducing the background functionalization. Differences in the molecular weight of the PMMA resists and the resulting influence on APTMS diffusion through the resist films are unlikely to have a significant impact. Area-selective nanopatterning of 15 nm gold nanoparticles using the ZEP520A resist was demonstrated, with no observable background conjugation noted in the unexposed areas on the silicon surface by SEM.

Nanomanufacturing of silicon surface with a single atomic layer precision via mechanochemical reactions

Topographic nanomanufacturing with a depth precision down to atomic dimension is of importance for advancement of nanoelectronics with new functionalities. Here we demonstrate a mask-less and chemical-free nanolithography process for regio-specific removal of atomic layers on a single crystalline silicon surface via shear-induced mechanochemical reactions. Since chemical reactions involve only the topmost atomic layer exposed at the interface, the removal of a single atomic layer is possible and the crystalline lattice beneath the processed area remains intact without subsurface structural damages. Molecular dynamics simulations depict the atom-by-atom removal process, where the first atomic layer is removed preferentially through the formation and dissociation of interfacial bridge bonds. Based on the parametric thresholds needed for single atomic layer removal, the critical energy barrier for water-assisted mechanochemical dissociation of Si–Si bonds was determined. The mechanochemical nanolithography method demonstrated here could be extended to nanofabrication of other crystalline materials.

The continued scaling of silicon based electronic devices requires the development of increasingly innovative approaches for high-precision material removal. Here, the authors demonstrate subnanometre depth removal of silicon using scanning probe, shear-induced mechanochemical reactions.

Advanced oxidation scanning probe lithography

Force microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomolecules. Oxidation SPL has also been applied to develop sophisticated electronic and nanomechanical devices such as quantum dots, quantum point contacts, nanowire transistors or mechanical resonators. Here, we review the principles, instrumentation aspects and some device applications of o-SPL. Our focus is to provide a balanced view of the method that introduces the key steps in its evolution, provides some detailed explanations on its fundamentals and presents current trends and applications. To illustrate the capabilities and potential of o-SPL as an alternative lithography we have favored the most recent and updated contributions in nanopatterning and device fabrication.

"Self-Peel-Off" Transfer Produces Ultrathin Polyvinylidene-Fluoride-Based Flexible Nanodevices

Here, a new strategy, self-peel-off transfer, for the preparation of ultrathin flexible nanodevices made from polyvinylidene-fluoride (PVDF) is reported. In this process, a functional pattern of nanoparticles is transferred via peeling from a temporary substrate to the final PVDF film. This peeling process takes advantage of the differences in the work of adhesion between the various layers (the PVDF layer, the nanoparticle-pattern layer and the substrate layer) and of the high stresses generated by the differential thermal expansion of the layers. The work of adhesion is mainly guided by the basic physical/chemical properties of these layers and is highly sensitive to variations in temperature and moisture in the environment. The peeling technique is tested on a variety of PVDF-based functional films using gold/palladium nanoparticles, carbon nanotubes, graphene oxide, and lithium iron phosphate. Several PVDF-based flexible nanodevices are prepared, including a single-sided wireless flexible humidity sensor in which PVDF is used as the substrate and a double-sided flexible capacitor in which PVDF is used as the ferroelectric layer and the carrier layer. Results show that the nanodevices perform with high repeatability and stability. Self-peel-off transfer is a viable preparation strategy for the design and fabrication of flexible, ultrathin, and light-weight nanodevices.

DNA condensation in one dimension

DNA can be programmed to assemble into a variety of shapes and patterns on the nanoscale and can act as a template for hybrid nanostructures such as conducting wires, protein arrays and field-effect transistors. Current DNA nanostructures are typically in the sub-micrometre range, limited by the sequence space and length of the assembled strands. Here we show that on a patterned biochip, DNA chains collapse into one-dimensional (1D) fibres that are 20 nm wide and around 70 µm long, each comprising approximately 35 co-aligned chains at its cross-section. Electron beam writing on a photocleavable monolayer was used to immobilize and pattern the DNA molecules, which condense into 1D bundles in the presence of spermidine. DNA condensation can propagate and split at junctions, cross gaps and create domain walls between counterpropagating fronts. This system is inherently adept at solving probabilistic problems and was used to find the possible paths through a maze and to evaluate stochastic switching circuits. This technique could be used to propagate biological or ionic signals in combination with sequence-specific DNA nanotechnology or for gene expression in cell-free DNA compartments.

Site-Targeted Interfacial Solid-Phase Chemistry: Surface Functionalization of Organic Monolayers via Chemical Transformations Locally Induced at the Boundary between Two Solids

Effective control of chemistry at interfaces is of fundamental importance for the advancement of methods of surface functionalization and patterning that are at the basis of many scientific and technological applications. A conceptually new type of interfacial chemical transformations has been discovered, confined to the contact surface between two solid materials, which may be induced by exposure to X-rays, electrons or UV light, or by the application of electrical bias. One of the reacting solids is a removable thin film coating that acts as a reagent/catalyst in the chemical modification of the solid surface on which it is applied. Given the diversity of thin film coatings that may be used as solid reagents/catalysts and the lateral confinement options provided by the use of irradiation masks, conductive AFM probes or stamps, and electron beams in such solid-phase reactions, this approach is suitable for precise targeting of different desired chemical modifications to predefined surface sites spanning the macro- to nanoscale.