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Fantasia A, Rovaris F, Abou El Kheir O, Marzegalli A, Lanzoni D, Pessina L, Xiao P, Zhou C, Li L, Henkelman G, Scalise E, Montalenti F. Development of a machine learning interatomic potential for exploring pressure-dependent kinetics of phase transitions in germanium. J Chem Phys 2024; 161:014110. [PMID: 38953439 DOI: 10.1063/5.0214588] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/18/2024] [Accepted: 06/15/2024] [Indexed: 07/04/2024] Open
Abstract
We introduce a data-driven potential aimed at the investigation of pressure-dependent phase transitions in bulk germanium, including the estimate of kinetic barriers. This is achieved by suitably building a database including several configurations along minimum energy paths, as computed using the solid-state nudged elastic band method. After training the model based on density functional theory (DFT)-computed energies, forces, and stresses, we provide validation and rigorously test the potential on unexplored paths. The resulting agreement with the DFT calculations is remarkable in a wide range of pressures. The potential is exploited in large-scale isothermal-isobaric simulations, displaying local nucleation in the R8 to β-Sn pressure-induced phase transformation, taken here as an illustrative example.
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Affiliation(s)
- A Fantasia
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
| | - F Rovaris
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
| | - O Abou El Kheir
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
| | - A Marzegalli
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
| | - D Lanzoni
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
| | - L Pessina
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
| | - P Xiao
- Department of Physics and Atmospheric Science, Dalhousie University, 1453 Lord Dalhousie Drive, Halifax, Nova Scotia B3H 4R2, Canada
| | - C Zhou
- Department of Materials Science and Engineering, Southern University of Science and Technology, 1088 Xueyuan Avenue, 518055 Shenzhen, China
| | - L Li
- Department of Materials Science and Engineering, Southern University of Science and Technology, 1088 Xueyuan Avenue, 518055 Shenzhen, China
| | - G Henkelman
- Department of Chemistry, The University of Texas at Austin, 105 East 24th Street STOP A5300 Austin, Texas 78712, USA
| | - E Scalise
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
| | - F Montalenti
- Department of Materials Science, University of Milano-Bicocca, 20125 Milano, Italy
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2
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Hilliard D, Tauchnitz T, Hübner R, Vasileiadis I, Gkotinakos A, Dimitrakopulos G, Komninou P, Sun X, Winnerl S, Schneider H, Helm M, Dimakis E. At the Limit of Interfacial Sharpness in Nanowire Axial Heterostructures. ACS NANO 2024. [PMID: 38970499 DOI: 10.1021/acsnano.4c04172] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/08/2024]
Abstract
As semiconductor devices approach dimensions at the atomic scale, controlling the compositional grading across heterointerfaces becomes paramount. Particularly in nanowire axial heterostructures, which are promising for a broad spectrum of nanotechnology applications, the achievement of sharp heterointerfaces has been challenging owing to peculiarities of the commonly used vapor-liquid-solid growth mode. Here, the grading of Al across GaAs/AlxGa1-xAs/GaAs heterostructures in self-catalyzed nanowires is studied, aiming at finding the limits of the interfacial sharpness for this technologically versatile material system. A pulsed growth mode ensures precise control of the growth mechanisms even at low temperatures, while a semiempirical thermodynamic model is derived to fit the experimental Al-content profiles and quantitatively describe the dependences of the interfacial sharpness on the growth temperature, the nanowire radius, and the Al content. Finally, symmetrical Al profiles with interfacial widths of 2-3 atomic planes, at the limit of the measurement accuracy, are obtained, outperforming even equivalent thin-film heterostructures. The proposed method enables the development of advanced heterostructure schemes for a more effective utilization of the nanowire platform; moreover, it is considered expandable to other material systems and nanostructure types.
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Affiliation(s)
- Donovan Hilliard
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
- TUD Dresden University of Technology, Dresden 01062, Germany
| | - Tina Tauchnitz
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
- TUD Dresden University of Technology, Dresden 01062, Germany
| | - René Hübner
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
| | - Isaak Vasileiadis
- Department of Physics, Aristotle University of Thessaloniki, Thessaloniki 54124, Greece
| | - Athanasios Gkotinakos
- Department of Physics, Aristotle University of Thessaloniki, Thessaloniki 54124, Greece
| | - George Dimitrakopulos
- Department of Physics, Aristotle University of Thessaloniki, Thessaloniki 54124, Greece
| | - Philomela Komninou
- Department of Physics, Aristotle University of Thessaloniki, Thessaloniki 54124, Greece
| | - Xiaoxiao Sun
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
| | - Stephan Winnerl
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
| | - Harald Schneider
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
| | - Manfred Helm
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
- TUD Dresden University of Technology, Dresden 01062, Germany
| | - Emmanouil Dimakis
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Dresden 01328, Germany
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3
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Warias JE, Petersdorf L, Hövelmann SC, Giri RP, Lemke C, Festersen S, Greve M, Mandin P, LeBideau D, Bertram F, Magnussen OM, Murphy BM. The laser pump X-ray probe system at LISA P08 PETRA III. JOURNAL OF SYNCHROTRON RADIATION 2024; 31:779-790. [PMID: 38843001 PMCID: PMC11226150 DOI: 10.1107/s1600577524003400] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/11/2023] [Accepted: 04/17/2024] [Indexed: 07/06/2024]
Abstract
Understanding and controlling the structure and function of liquid interfaces is a constant challenge in biology, nanoscience and nanotechnology, with applications ranging from molecular electronics to controlled drug release. X-ray reflectivity and grazing incidence diffraction provide invaluable probes for studying the atomic scale structure at liquid-air interfaces. The new time-resolved laser system at the LISA liquid diffractometer situated at beamline P08 at the PETRA III synchrotron radiation source in Hamburg provides a laser pump with X-ray probe. The femtosecond laser combined with the LISA diffractometer allows unique opportunities to investigate photo-induced structural changes at liquid interfaces on the pico- and nanosecond time scales with pump-probe techniques. A time resolution of 38 ps has been achieved and verified with Bi. First experiments include laser-induced effects on salt solutions and liquid mercury surfaces with static and varied time scales measurements showing the proof of concept for investigations at liquid surfaces.
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Affiliation(s)
- Jonas Erik Warias
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
| | - Lukas Petersdorf
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
- Ruprecht-Haensel Laboratory, Olshausenstrasse 40, 24098Kiel, Germany
| | - Svenja Carolin Hövelmann
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
- Ruprecht-Haensel Laboratory, Olshausenstrasse 40, 24098Kiel, Germany
- Deutsches Elektronen-Synchrotron DESYNotkestrasse 8522607HamburgGermany
| | - Rajendra Prasad Giri
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
| | - Christoph Lemke
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
| | - Sven Festersen
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
| | - Matthias Greve
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
| | | | | | - Florian Bertram
- Deutsches Elektronen-Synchrotron DESYNotkestrasse 8522607HamburgGermany
| | - Olaf Magnus Magnussen
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
- Ruprecht-Haensel Laboratory, Olshausenstrasse 40, 24098Kiel, Germany
| | - Bridget Mary Murphy
- Institute of Experimental and Applied PhysicsKiel UniversityLeibnizstrasse 1924118KielGermany
- Ruprecht-Haensel Laboratory, Olshausenstrasse 40, 24098Kiel, Germany
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4
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Peeters WHJ, van Lange VT, Belabbes A, van Hemert MC, Jansen MM, Farina R, van Tilburg MAJ, Verheijen MA, Botti S, Bechstedt F, Haverkort JEM, Bakkers EPAM. Direct bandgap quantum wells in hexagonal Silicon Germanium. Nat Commun 2024; 15:5252. [PMID: 38898007 PMCID: PMC11187182 DOI: 10.1038/s41467-024-49399-3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/02/2024] [Accepted: 06/04/2024] [Indexed: 06/21/2024] Open
Abstract
Silicon is indisputably the most advanced material for scalable electronics, but it is a poor choice as a light source for photonic applications, due to its indirect band gap. The recently developed hexagonal Si1-xGex semiconductor features a direct bandgap at least for x > 0.65, and the realization of quantum heterostructures would unlock new opportunities for advanced optoelectronic devices based on the SiGe system. Here, we demonstrate the synthesis and characterization of direct bandgap quantum wells realized in the hexagonal Si1-xGex system. Photoluminescence experiments on hex-Ge/Si0.2Ge0.8 quantum wells demonstrate quantum confinement in the hex-Ge segment with type-I band alignment, showing light emission up to room temperature. Moreover, the tuning range of the quantum well emission energy can be extended using hexagonal Si1-xGex/Si1-yGey quantum wells with additional Si in the well. These experimental findings are supported with ab initio bandstructure calculations. A direct bandgap with type-I band alignment is pivotal for the development of novel low-dimensional light emitting devices based on hexagonal Si1-xGex alloys, which have been out of reach for this material system until now.
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Affiliation(s)
- Wouter H J Peeters
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
| | - Victor T van Lange
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
| | - Abderrezak Belabbes
- Department of Physics, Sultan Qaboos University, P.O. Box 123, Muscat, Oman
- Institut für Festkörpertheorie und -optik, Friedrich-Schiller-Universität Jena, Jena, Germany
| | - Max C van Hemert
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
| | - Marvin Marco Jansen
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
| | - Riccardo Farina
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
| | - Marvin A J van Tilburg
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
| | - Marcel A Verheijen
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
- Eurofins Materials Science Netherlands BV, Eindhoven, The Netherlands
| | - Silvana Botti
- Institut für Festkörpertheorie und -optik, Friedrich-Schiller-Universität Jena, Jena, Germany
- Research Center Future Energy Materials and Systems of the University Alliance Ruhr and Interdisciplinary Centre for Advanced Materials Simulation, Ruhr University Bochum, Universitätsstraße 150, Bochum, Germany
| | - Friedhelm Bechstedt
- Institut für Festkörpertheorie und -optik, Friedrich-Schiller-Universität Jena, Jena, Germany
| | - Jos E M Haverkort
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands
| | - Erik P A M Bakkers
- Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Eindhoven, The Netherlands.
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5
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Katsumi Y, Gamo H, Motohisa J, Tomioka K. InP Crystal Phase Heterojunction Transistor with a Vertical Gate-All-Around Structure. ACS APPLIED MATERIALS & INTERFACES 2024; 16:30471-30477. [PMID: 38819142 PMCID: PMC11182027 DOI: 10.1021/acsami.4c00147] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/03/2024] [Revised: 05/09/2024] [Accepted: 05/22/2024] [Indexed: 06/01/2024]
Abstract
Crystal phase transitions can form a new type of heterojunction with different atomic arrangements in the same material: crystal phase heterojunction (CPHJ). The CPHJ has an inherently strong impact on band engineering without concerns over critical thicknesses with misfit dislocations and a semiconductor-metal transition. In-plane CPHJ was recently demonstrated in two-dimensional (2D) transition-metal dichalcogenide (TMD) materials and utilized for conventional planar field-effect transistor applications. However, scalability such as gate electrostatic control, miniaturization, and multigate structure have been limited because of the geometrical issue. Here, we demonstrated a transistor using the CPHJ with a vertical gate-all-around structure by forming a CPHJ in conventional III-V semiconductors. The CPHJ, composed of wurtzite InP nanowires with zincblende InP substrates, showed an atomically flat heterojunction without dislocations and indicated a Type-II band discontinuity across the junction. The CPHJ transistor had moderate to good gate electrostatic controllability with high on-state currents and transconductance. The CPHJ offer will provide a new switching mechanism and add a new junction and device design choice to the long history of transistors.
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Affiliation(s)
- Yu Katsumi
- Graduate
School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research
Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
| | - Hironori Gamo
- Graduate
School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research
Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
| | - Junichi Motohisa
- Graduate
School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research
Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
| | - Katsuhiro Tomioka
- Graduate
School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research
Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
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6
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Meng Y, Wang W, Fan R, Lai Z, Wang W, Li D, Li X, Quan Q, Xie P, Chen D, Shao H, Li B, Wu Z, Yang Z, Yip S, Wong CY, Lu Y, Ho JC. An inorganic-blended p-type semiconductor with robust electrical and mechanical properties. Nat Commun 2024; 15:4440. [PMID: 38789422 PMCID: PMC11126573 DOI: 10.1038/s41467-024-48628-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/01/2023] [Accepted: 05/06/2024] [Indexed: 05/26/2024] Open
Abstract
Inorganic semiconductors typically have limited p-type behavior due to the scarcity of holes and the localized valence band maximum, hindering the progress of complementary devices and circuits. In this work, we propose an inorganic blending strategy to activate the hole-transporting character in an inorganic semiconductor compound, namely tellurium-selenium-oxygen (TeSeO). By rationally combining intrinsic p-type semimetal, semiconductor, and wide-bandgap semiconductor into a single compound, the TeSeO system displays tunable bandgaps ranging from 0.7 to 2.2 eV. Wafer-scale ultrathin TeSeO films, which can be deposited at room temperature, display high hole field-effect mobility of 48.5 cm2/(Vs) and robust hole transport properties, facilitated by Te-Te (Se) portions and O-Te-O portions, respectively. The nanosphere lithography process is employed to create nanopatterned honeycomb TeSeO broadband photodetectors, demonstrating a high responsibility of 603 A/W, an ultrafast response of 5 μs, and superior mechanical flexibility. The p-type TeSeO system is highly adaptable, scalable, and reliable, which can address emerging technological needs that current semiconductor solutions may not fulfill.
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Affiliation(s)
- You Meng
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
- State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Weijun Wang
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Rong Fan
- Department of Mechanical Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
- Chengdu Research Institute, City University of Hong Kong, Chengdu, 610200, China
| | - Zhengxun Lai
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Wei Wang
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Dengji Li
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Xiaocui Li
- Department of Mechanical Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Quan Quan
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Pengshan Xie
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Dong Chen
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - He Shao
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Bowen Li
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Zenghui Wu
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Zhe Yang
- Department of Chemistry, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - SenPo Yip
- Institute for Materials Chemistry and Engineering, Kyushu University, Fukuoka, 816 8580, Japan
| | - Chun-Yuen Wong
- Department of Chemistry, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR.
| | - Yang Lu
- Chengdu Research Institute, City University of Hong Kong, Chengdu, 610200, China.
- Department of Mechanical Engineering, The University of Hong Kong, Pokfulam, 999077, Hong Kong SAR.
| | - Johnny C Ho
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR.
- State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR.
- Institute for Materials Chemistry and Engineering, Kyushu University, Fukuoka, 816 8580, Japan.
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7
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Pezzoli F. Tuning light by the vibes. NATURE NANOTECHNOLOGY 2024:10.1038/s41565-024-01663-9. [PMID: 38684807 DOI: 10.1038/s41565-024-01663-9] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/02/2024]
Affiliation(s)
- Fabio Pezzoli
- Department of Materials Science and BiQuTe, University of Milano-Bicocca, Milan, Italy.
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8
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Wang X, Song C, Xu B, Yang H. High conductivity characteristics of phosphorus-doped nanocrystalline silicon thin films by KrF pulsed excimer laser irradiation method. RSC Adv 2024; 14:10697-10702. [PMID: 38567328 PMCID: PMC10986161 DOI: 10.1039/d4ra00040d] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/03/2024] [Accepted: 03/20/2024] [Indexed: 04/04/2024] Open
Abstract
The microstructure and high conductivity properties of phosphorus-doped nanocrystalline silicon films were investigated on samples prepared by a plasma-enhanced chemical vapor deposition technique and the KrF pulsed excimer laser irradiation method. The results of Fourier transform infrared spectroscopy and Raman spectroscopy show that Si nanocrystallites with an average diameter of 2 nm to 3 nm are formed in the film. The degree of crystallinity increases with the increase of laser radiation intensity, while the content of hydrogen decreases gradually. More phosphorus atoms are substitutionally incorporated into the nc-Si dots under higher laser irradiation fluence, which is responsible for the high dark conductivity. By controlling the laser fluence at 1.0 J cm-2, the dark conductivity as high as 25.7 S cm-1 can be obtained. Based on the measurements of temperature-dependent conductivity, the carrier transport processes are discussed. The phosphorus doping and the increase of electron concentration are considered to be the reason for high dark conductivity and extremely low conductivity activation energy.
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Affiliation(s)
- Xiang Wang
- Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory Chaozhou 521041 China
- Department of Physics and Electrical Engineering, Hanshan Normal University Chaozhou 521041 China
| | - Chao Song
- Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory Chaozhou 521041 China
- School of Materials Science and Engineering, Hanshan Normal University Chaozhou 521041 China
| | - Boxu Xu
- School of Science, University of Science and Technology Liaoning Anshan 114051 China
| | - Huan Yang
- School of Materials Science and Engineering, Hanshan Normal University Chaozhou 521041 China
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9
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Zhang Y, Wang B, Miao C, Chai H, Hong W, Ross FM, Wen RT. Controlled formation of three-dimensional cavities during lateral epitaxial growth. Nat Commun 2024; 15:2247. [PMID: 38472172 DOI: 10.1038/s41467-024-46222-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/08/2023] [Accepted: 02/15/2024] [Indexed: 03/14/2024] Open
Abstract
Epitaxial growth is a fundamental step required to create devices for the semiconductor industry, enabling different materials to be combined in layers with precise control of strain and defect structure. Patterning the growth substrate with a mask before performing epitaxial growth offers additional degrees of freedom to engineer the structure and hence function of the semiconductor device. Here, we demonstrate that conditions exist where such epitaxial lateral overgrowth can produce complex, three-dimensional structures that incorporate cavities of deterministic size. We grow germanium on silicon substrates patterned with a dielectric mask and show that fully-enclosed cavities can be created through an unexpected self-assembly process that is controlled by surface diffusion and surface energy minimization. The result is confined cavities enclosed by single crystalline Ge, with size and position tunable through the initial mask pattern. We present a model to account for the observed cavity symmetry, pinch-off and subsequent evolution, reflecting the dominant role of surface energy. Since dielectric mask patterning and epitaxial growth are compatible with conventional device processing steps, we suggest that this mechanism provides a strategy for developing electronic and photonic functionalities.
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Affiliation(s)
- Yiwen Zhang
- Department of Materials Science and Engineering, Southern University of Science and Technology, 518055, Shenzhen, Guangdong, China
| | - Baoming Wang
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Changxu Miao
- Shenzhen Key Laboratory of Soft Mechanics and Smart Manufacturing, Department of Mechanics and Aerospace Engineering, Southern University of Science and Technology, 518055, Shenzhen, Guangdong, China
| | - Haozhi Chai
- Department of Materials Science and Engineering, Southern University of Science and Technology, 518055, Shenzhen, Guangdong, China
| | - Wei Hong
- Shenzhen Key Laboratory of Soft Mechanics and Smart Manufacturing, Department of Mechanics and Aerospace Engineering, Southern University of Science and Technology, 518055, Shenzhen, Guangdong, China.
| | - Frances M Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA.
| | - Rui-Tao Wen
- Department of Materials Science and Engineering, Southern University of Science and Technology, 518055, Shenzhen, Guangdong, China.
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10
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Berghuis WHWJ, van Tilburg MAJ, Peeters WHJ, van Lange VT, Farina R, Fadaly EMT, Renirie ECM, Theeuwes RJ, Verheijen MA, Macco B, Bakkers EPAM, Haverkort JEM, Kessels WMME. Low Surface Recombination in Hexagonal SiGe Alloy Nanowires: Implications for SiGe-Based Nanolasers. ACS APPLIED NANO MATERIALS 2024; 7:2343-2351. [PMID: 38298254 PMCID: PMC10825821 DOI: 10.1021/acsanm.3c05770] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 12/06/2023] [Revised: 12/23/2023] [Accepted: 12/26/2023] [Indexed: 02/02/2024]
Abstract
Monolithic integration of silicon-based electronics and photonics could open the door toward many opportunities including on-chip optical data communication and large-scale application of light-based sensing devices in healthcare and automotive; by some, it is considered the Holy Grail of silicon photonics. The monolithic integration is, however, severely hampered by the inability of Si to efficiently emit light. Recently, important progress has been made by the demonstration of efficient light emission from direct-bandgap hexagonal SiGe (hex-SiGe) alloy nanowires. For this promising material, realized by employing a nanowire structure, many challenges and open questions remain before a large-scale application can be realized. Considering that for other direct-bandgap materials like GaAs, surface recombination can be a true bottleneck, one of the open questions is the importance of surface recombination for the photoluminescence efficiency of this new material. In this work, temperature-dependent photoluminescence measurements were performed on both hex-Ge and hex-SiGe nanowires with and without surface passivation schemes that have been well documented and proven effective on cubic silicon and germanium to elucidate whether and to what extent the internal quantum efficiency (IQE) of the wires can be improved. Additionally, time-resolved photoluminescence (TRPL) measurements were performed on unpassivated hex-SiGe nanowires as a function of their diameter. The dependence of the surface recombination on the SiGe composition could, however, not be yet addressed given the sample-to-sample variations of the state-of-the-art hex-SiGe nanowires. With the aforementioned experiments, we demonstrate that at room temperature, under high excitation conditions (a few kW cm-2), the hex-(Si)Ge surface is most likely not a bottleneck for efficient radiative emission under relatively high excitation conditions. This is an important asset for future hex(Si)Ge optoelectronic devices, specifically for nanolasers.
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Affiliation(s)
| | | | - Wouter H. J. Peeters
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
| | - Victor T. van Lange
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
| | - Riccardo Farina
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
| | - Elham M. T. Fadaly
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
| | - Elsa C. M. Renirie
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
| | - Roel J. Theeuwes
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
| | - Marcel. A. Verheijen
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
- Eurofins
Materials Science BV, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands
| | - Bart Macco
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
| | | | - Jos E. M. Haverkort
- Eindhoven
University of Technology, Postbus 513, 5600 MB Eindhoven, The Netherlands
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11
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Yuan LD, Li SS, Luo JW. Direct bandgap emission from strain-doped germanium. Nat Commun 2024; 15:618. [PMID: 38242877 PMCID: PMC10799082 DOI: 10.1038/s41467-024-44916-w] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/27/2023] [Accepted: 01/04/2024] [Indexed: 01/21/2024] Open
Abstract
Germanium (Ge) is an attractive material for Silicon (Si) compatible optoelectronics, but the nature of its indirect bandgap renders it an inefficient light emitter. Drawing inspiration from the significant expansion of Ge volume upon lithiation as a Lithium (Li) ion battery anode, here, we propose incorporating Li atoms into the Ge to cause lattice expansion to achieve the desired tensile strain for a transition from an indirect to a direct bandgap. Our first-principles calculations show that a minimal amount of 3 at.% Li can convert Ge from an indirect to a direct bandgap to possess a dipole transition matrix element comparable to that of typical direct bandgap semiconductors. To enhance compatibility with Si Complementary-Metal-Oxide-Semiconductors (CMOS) technology, we additionally suggest implanting noble gas atoms instead of Li atoms. We also demonstrate the tunability of the direct-bandgap emission wavelength through the manipulation of dopant concentration, enabling coverage of the mid-infrared to far-infrared spectrum. This Ge-based light-emitting approach presents exciting prospects for surpassing the physical limitations of Si technology in the field of photonics and calls for experimental proof-of-concept studies.
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Affiliation(s)
- Lin-Ding Yuan
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Shu-Shen Li
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Jun-Wei Luo
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China.
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China.
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12
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Zhang N, Yan J, Wang L, Zhang J, Zhang Z, Miao T, Zheng C, Jiang Z, Hu H, Zhong Z. Hexagonal-Ge Nanostructures with Direct-Bandgap Emissions in a Si-Based Light-Emitting Metasurface. ACS NANO 2024; 18:328-336. [PMID: 38147566 DOI: 10.1021/acsnano.3c06279] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/28/2023]
Abstract
Si-based emitters have been of great interest as an ideal light source for monolithic optical-electronic integrated circuits (MOEICs) on Si substrates. However, the general Si-based material is a diamond structure of cubic lattice with an indirect band gap, which cannot emit light efficiently. Here, hexagonal-Ge (H-Ge) nanostructures within a light-emitting metasurface consisting of a cubic-SiGe nanodisk array are reported. The H-Ge nanostructure is naturally formed within the cubic-Ge epitaxially grown on Si (001) substrates due to the strain-induced nanoscale crystal structure transformation assisted by far-from-equilibrium growth conditions. The direct-bandgap features of H-Ge nanostructures are observed and discussed, including a rather strong and linearly power-dependent photoluminescence (PL) peak around 1562 nm at room temperature and temperature-insensitive PL spectrum near room temperature. Given the direct-bandgap nature, the heterostructure of H-Ge/C-Ge, and the compatibility with the sophisticated Si technology, the H-Ge nanostructure has great potential for innovative light sources and other functional devices, particularly in Si-based MOEICs.
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Affiliation(s)
- Ningning Zhang
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, P. R. China
- Key Laboratory of Analog Integrated Circuits and Systems, Ministry of Education, School of Microelectronics, Xidian University, Xi'an 710071, P. R. China
| | - Jia Yan
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, P. R. China
| | - Liming Wang
- Key Laboratory of Analog Integrated Circuits and Systems, Ministry of Education, School of Microelectronics, Xidian University, Xi'an 710071, P. R. China
| | - Jiarui Zhang
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, P. R. China
| | - Zhifang Zhang
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, P. R. China
| | - Tian Miao
- Key Laboratory of Analog Integrated Circuits and Systems, Ministry of Education, School of Microelectronics, Xidian University, Xi'an 710071, P. R. China
| | - Changlin Zheng
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, P. R. China
| | - Zuimin Jiang
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, P. R. China
| | - Huiyong Hu
- Key Laboratory of Analog Integrated Circuits and Systems, Ministry of Education, School of Microelectronics, Xidian University, Xi'an 710071, P. R. China
| | - Zhenyang Zhong
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200438, P. R. China
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13
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Wang Q, Zhuang Y, Aierken A, Song Q, Zhang Q, Dou Y, Zhang Q, Zhang S. A study on the Si 1-xGe x gradual buffer layer of III-V/Si multi-junction solar cells based on first-principles calculations. Phys Chem Chem Phys 2024; 26:1293-1302. [PMID: 38105747 DOI: 10.1039/d3cp05309a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/19/2023]
Abstract
III-V/Si multi-junction solar cells have been widely studied in recent years due to their excellent theoretical efficiency (∼42%). In order to solve the problem of lattice mismatch between Si and III-V compounds of III-V/Si solar cells, different hexagonal Si1-xGex buffer layer models on the surface of hexagonal diamond Si(001) were built, and the structural, electronic and optical properties of the proposed models were calculated based on first principles calculations. The results showed that all models of the designed buffer layer could effectively reduce the lattice mismatch, and the buffer layer hex-Si1-xGex (x = 0, 0.75, and 1) is the ideal model and has achieved the best lattice-matching improvement with high defect formation energy, as well as direct band gap properties and a larger light adsorption coefficient. These theoretical models, with their analyzed properties, could offer a promising pathway toward realizing high efficiency and low cost III-V/Si multi-junction solar cells.
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Affiliation(s)
- Qian Wang
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
| | - Yu Zhuang
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
| | - Abuduwayiti Aierken
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
| | - Qiaogang Song
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
| | - Qin Zhang
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
| | - Youbo Dou
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
| | - Qiuli Zhang
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
| | - Shuyi Zhang
- School of Energy and Environment Science, Yunnan Normal University, Kunming, Yunnan Province 650500, People's Republic of China.
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14
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Liu Y, Zhang H, Chen G, Wang X, Qian Y, Wu Z, You W, Tang Y, Zhang J, Che R. Engineering Phase to Reinforce Dielectric Polarization in Nickel Sulfide Heterostructure for Electromagnetic Wave Absorption. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023:e2308129. [PMID: 38037491 DOI: 10.1002/smll.202308129] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/16/2023] [Revised: 10/22/2023] [Indexed: 12/02/2023]
Abstract
Engineering phase transition in micro-nanomaterials to optimize the dielectric properties and further enhance the electromagnetic microwave absorption (EMA) performance is highly desirable. However, the severe synthesis conditions restrict the design of EMA materials featuring controllable phases, which hinders the tunability of effective absorption bandwidth (EAB) and leads to an unclear loss mechanism. Herein, a seed phase decomposition-controlled strategy is proposed to induct nickel sulfide (NiSx ) absorbers with controllable phases and hollow sphere nature. Transmission electron microscopy holography and theoretical calculations evidence that the reconstruction of atoms in phase transition induces numerous heterogeneous interfaces and lattice defects/sulfur vacancies to cause varied work functions and local electronic redistribution, which contributes to reinforced dielectric polarization. As a result, the optimized NiS2 /NiS heterostructure enables enhanced EM attenuation capability with a wide EAB of 5.04 GHz at only 1.6 mm, compared to that of NiS2 and NiS. Moreover, the correlation between EAB and NiS phase content is demonstrated as the "volcano" feature. This study on the concept of phase transition of micro-nanomaterials can offer a novel approach to constructing highly efficient absorbers for EMA and other functionalities.
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Affiliation(s)
- Yihao Liu
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
| | - Huibin Zhang
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
| | - Guanyu Chen
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
| | - Xiangyu Wang
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
| | - Yuetong Qian
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
| | - Zhengchen Wu
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
| | - Wenbin You
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
| | - Yi Tang
- Department of Chemistry, Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Laboratory of Advanced Materials and Collaborative Innovation Center of Chemistry for Energy Materials, Fudan University, Shanghai, 200438, P. R. China
| | | | - Renchao Che
- Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, 200438, P. R. China
- Zhejiang Laboratory, Hangzhou, 311100, P. R. China
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15
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Yun Q, Ge Y, Shi Z, Liu J, Wang X, Zhang A, Huang B, Yao Y, Luo Q, Zhai L, Ge J, Peng Y, Gong C, Zhao M, Qin Y, Ma C, Wang G, Wa Q, Zhou X, Li Z, Li S, Zhai W, Yang H, Ren Y, Wang Y, Li L, Ruan X, Wu Y, Chen B, Lu Q, Lai Z, He Q, Huang X, Chen Y, Zhang H. Recent Progress on Phase Engineering of Nanomaterials. Chem Rev 2023. [PMID: 37962496 DOI: 10.1021/acs.chemrev.3c00459] [Citation(s) in RCA: 4] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2023]
Abstract
As a key structural parameter, phase depicts the arrangement of atoms in materials. Normally, a nanomaterial exists in its thermodynamically stable crystal phase. With the development of nanotechnology, nanomaterials with unconventional crystal phases, which rarely exist in their bulk counterparts, or amorphous phase have been prepared using carefully controlled reaction conditions. Together these methods are beginning to enable phase engineering of nanomaterials (PEN), i.e., the synthesis of nanomaterials with unconventional phases and the transformation between different phases, to obtain desired properties and functions. This Review summarizes the research progress in the field of PEN. First, we present representative strategies for the direct synthesis of unconventional phases and modulation of phase transformation in diverse kinds of nanomaterials. We cover the synthesis of nanomaterials ranging from metal nanostructures such as Au, Ag, Cu, Pd, and Ru, and their alloys; metal oxides, borides, and carbides; to transition metal dichalcogenides (TMDs) and 2D layered materials. We review synthesis and growth methods ranging from wet-chemical reduction and seed-mediated epitaxial growth to chemical vapor deposition (CVD), high pressure phase transformation, and electron and ion-beam irradiation. After that, we summarize the significant influence of phase on the various properties of unconventional-phase nanomaterials. We also discuss the potential applications of the developed unconventional-phase nanomaterials in different areas including catalysis, electrochemical energy storage (batteries and supercapacitors), solar cells, optoelectronics, and sensing. Finally, we discuss existing challenges and future research directions in PEN.
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Affiliation(s)
- Qinbai Yun
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
- Department of Chemical and Biological Engineering & Energy Institute, The Hong Kong University of Science and Technology, Hong Kong, China
| | - Yiyao Ge
- School of Materials Science and Engineering, Peking University, Beijing 100871, China
| | - Zhenyu Shi
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Jiawei Liu
- Institute of Sustainability for Chemicals, Energy and Environment, Agency for Science, Technology and Research (A*STAR), Singapore, 627833, Singapore
| | - Xixi Wang
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - An Zhang
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Biao Huang
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
- Hong Kong Branch of National Precious Metals Material Engineering Research Center (NPMM), City University of Hong Kong, Hong Kong, China
| | - Yao Yao
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Qinxin Luo
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Li Zhai
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
- Hong Kong Branch of National Precious Metals Material Engineering Research Center (NPMM), City University of Hong Kong, Hong Kong, China
| | - Jingjie Ge
- Department of Applied Biology and Chemical Technology, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong SAR
| | - Yongwu Peng
- College of Materials Science and Engineering, Zhejiang University of Technology, Hangzhou 310014, China
| | - Chengtao Gong
- College of Materials Science and Engineering, Zhejiang University of Technology, Hangzhou 310014, China
| | - Meiting Zhao
- Institute of Molecular Aggregation Science, Department of Chemistry, Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Tianjin University, Tianjin 300072, China
| | - Yutian Qin
- Institute of Molecular Aggregation Science, Department of Chemistry, Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Tianjin University, Tianjin 300072, China
| | - Chen Ma
- Department of Chemistry, The Chinese University of Hong Kong, Shatin, Hong Kong, China
| | - Gang Wang
- Department of Chemistry, The Chinese University of Hong Kong, Shatin, Hong Kong, China
| | - Qingbo Wa
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Xichen Zhou
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Zijian Li
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Siyuan Li
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Wei Zhai
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Hua Yang
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Yi Ren
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Yongji Wang
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Lujing Li
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Xinyang Ruan
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Yuxuan Wu
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
| | - Bo Chen
- State Key Laboratory of Organic Electronics and Information Displays & Jiangsu Key Laboratory for Biosensors, Institute of Advanced Materials, School of Chemistry and Life Sciences, Nanjing University of Posts and Telecommunications, Nanjing 210023, China
| | - Qipeng Lu
- School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China
| | - Zhuangchai Lai
- Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong SAR, China
| | - Qiyuan He
- Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong SAR, China
| | - Xiao Huang
- Institute of Advanced Materials (IAM), School of Flexible Electronics (SoFE), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing Tech University (NanjingTech), Nanjing 211816, China
| | - Ye Chen
- Department of Chemistry, The Chinese University of Hong Kong, Shatin, Hong Kong, China
| | - Hua Zhang
- Department of Chemistry, City University of Hong Kong, Kowloon, Hong Kong, China
- Hong Kong Branch of National Precious Metals Material Engineering Research Center (NPMM), City University of Hong Kong, Hong Kong, China
- Shenzhen Research Institute, City University of Hong Kong, Shenzhen 518057, China
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16
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Calogero G, Raciti D, Ricciarelli D, Acosta-Alba P, Cristiano F, Daubriac R, Demoulin R, Deretzis I, Fisicaro G, Hartmann JM, Kerdilès S, La Magna A. Atomistic Insights into Ultrafast SiGe Nanoprocessing. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2023; 127:19867-19877. [PMID: 37817920 PMCID: PMC10561275 DOI: 10.1021/acs.jpcc.3c05999] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/06/2023] [Revised: 09/13/2023] [Indexed: 10/12/2023]
Abstract
Controlling ultrafast material transformations with atomic precision is essential for future nanotechnology. Pulsed laser annealing (LA), inducing extremely rapid and localized phase transitions, is a powerful way to achieve this but requires careful optimization together with the appropriate system design. We present a multiscale LA computational framework that can simulate atom-by-atom the highly out-of-equilibrium kinetics of a material as it interacts with the laser, including effects of structural disorder. By seamlessly coupling a macroscale continuum solver to a nanoscale superlattice kinetic Monte Carlo code, this method overcomes the limits of state-of-the-art continuum-based tools. We exploit it to investigate nontrivial changes in composition, morphology, and quality of laser-annealed SiGe alloys. Validations against experiments and phase-field simulations as well as advanced applications to strained, defected, nanostructured, and confined SiGe are presented, highlighting the importance of a multiscale atomistic-continuum approach. Current applicability and potential generalization routes are finally discussed.
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Affiliation(s)
| | - Domenica Raciti
- STMicroelectronics, Stradale Primosole 50, 95121 Catania, Italy
| | | | | | | | | | - Remi Demoulin
- Univ
Rouen Normandie, INSA Rouen Normandie, CNRS, Normandie Univ, GPM UMR 6634, F-76000 Rouen, France
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17
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Gamo H, Lian C, Motohisa J, Tomioka K. Selective-Area Growth of Vertical InGaAs/GaSb Core-Shell Nanowires on Silicon and Dual Switching Properties. ACS NANO 2023; 17:18346-18351. [PMID: 37615535 DOI: 10.1021/acsnano.3c05613] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/25/2023]
Abstract
The epitaxy of the Sb-related quantum well structure has been extensively investigated. However, the GaSb facet growth in selective-area growth (SAG) and GaSb nanostructures has not been investigated because of the surface diffusion complexity and surfactant effect of Sb adatoms. Here, the growth morphology of GaSb structures in SAG was characterized via InGaAs nanowires (NWs) monolithically grown on a Si template. SAG of GaSb using NWs included four growth processes: lateral-over growth along the ⟨1̅10⟩ directions, axial growth along the vertical ⟨111⟩ B direction, downward step-flow growth, and desorption of Sb adatoms from the NW sidewalls. The dominant processes could be controlled by the GaSb growth temperature and could form smooth GaSb shell layers. The vertical diode of InGaAs/GaSb core-shell NWs on Si exhibited moderate rectifying properties because of the InGaAs/GaSb heterojunction band alignment. In the vertical transistor application, specific dual-carrier modulation behaviors, such as p-channel field-effect transistor and n-channel tunnel field-effect transistor modes, occurred in the same transistor architecture. This was because the carrier transport changed with respect to the bias polarity. This specific transistor behavior in the InGaAs/GaSb core-shell NW on Si would expand possibilities for integrated circuit technologies using only a single transistor structure.
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Affiliation(s)
- Hironori Gamo
- Graduate School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
| | - Chen Lian
- Graduate School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
| | - Junichi Motohisa
- Graduate School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
| | - Katsuhiro Tomioka
- Graduate School of Information Science and Technology, Hokkaido University, North 14 West 9, Sapporo 060-0814, Japan
- Research Center for Integrated Quantum Electronics (RCIQE), Hokkaido University, North 13 West 8, Sapporo 060-0813, Japan
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18
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Ge Y, Huang B, Li L, Yun Q, Shi Z, Chen B, Zhang H. Structural Transformation of Unconventional-Phase Materials. ACS NANO 2023. [PMID: 37428980 DOI: 10.1021/acsnano.3c01922] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/12/2023]
Abstract
The structural transformation of materials, which involves the evolution of different structural features, including phase, composition, morphology, etc., under external conditions, represents an important fundamental phenomenon and has drawn substantial research interest. Recently, materials with unconventional phases that are different from their thermodynamically stable ones have been demonstrated to possess distinct properties and compelling functions and can further serve as starting materials for structural transformation studies. The identification and mechanism study of the structural transformation process of unconventional-phase starting materials can not only provide deep insights into their thermodynamic stability in potential applications but also offer effective approaches for the synthesis of other unconventional structures. Here, we briefly summarize the recent research progress on the structural transformation of some typical starting materials with various unconventional phases, including the metastable crystalline phase, amorphous phase, and heterophase, induced by different approaches. The importance of unconventional-phase starting materials in the structural modulation of resultant intermediates and products will be highlighted. The employment of diverse in situ/operando characterization techniques and theoretical simulations in studying the mechanism of the structural transformation process will also be introduced. Finally, we discuss the existing challenges in this emerging research field and provide some future research directions.
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Affiliation(s)
- Yiyao Ge
- School of Materials Science and Engineering, Peking University, Beijing 100871, China
| | - Biao Huang
- Department of Chemistry, City University of Hong Kong, Hong Kong, China
- Hong Kong Branch of National Precious Metals Material Engineering Research Center (NPMM), City University of Hong Kong, Hong Kong, China
| | - Lujiang Li
- Department of Chemistry, City University of Hong Kong, Hong Kong, China
| | - Qinbai Yun
- Department of Chemistry, City University of Hong Kong, Hong Kong, China
| | - Zhenyu Shi
- Department of Chemistry, City University of Hong Kong, Hong Kong, China
| | - Bo Chen
- Department of Chemistry, City University of Hong Kong, Hong Kong, China
| | - Hua Zhang
- Department of Chemistry, City University of Hong Kong, Hong Kong, China
- Hong Kong Branch of National Precious Metals Material Engineering Research Center (NPMM), City University of Hong Kong, Hong Kong, China
- Shenzhen Research Institute, City University of Hong Kong, Shenzhen 518057, China
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19
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Peretokin AV, Yurasov DV, Stepikhova MV, Shaleev MV, Yablonskiy AN, Shengurov DV, Dyakov SA, Rodyakina EE, Smagina ZV, Novikov AV. Tuning the Luminescence Response of an Air-Hole Photonic Crystal Slab Using Etching Depth Variation. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13101678. [PMID: 37242094 DOI: 10.3390/nano13101678] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/19/2023] [Revised: 05/06/2023] [Accepted: 05/16/2023] [Indexed: 05/28/2023]
Abstract
Detailed studies of the luminescent properties of the Si-based 2D photonic crystal (PhC) slabs with air holes of various depths are reported. Ge self-assembled quantum dots served as an internal light source. It was obtained that changing the air hole depth is a powerful tool which allows tuning of the optical properties of the PhC. It was shown that increasing the depth of the holes in the PhC has complex influences on its overall photoluminescence (PL) response due to the simultaneous influences of counteracting factors. As a result, the maximal increase in the PL signal of more than two orders of magnitude was obtained for some intermediate, but not full, depth of the PhC's air holes. It was demonstrated that it is possible to engineer the PhC band structure in such a way as to construct specific states, namely bound states in continuum (BIC), with specially designed dispersion curves being relatively flat. In this case, such states manifest themselves as sharp peaks in the PL spectra, and have high Q-factors which are larger than those of radiative modes and other BIC modes without such a flat dispersion characteristic.
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Affiliation(s)
- Artem V Peretokin
- Institute for Physics of Microstructures of the Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
| | - Dmitry V Yurasov
- Institute for Physics of Microstructures of the Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
| | - Margarita V Stepikhova
- Institute for Physics of Microstructures of the Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
| | - Mikhail V Shaleev
- Institute for Physics of Microstructures of the Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
| | - Artem N Yablonskiy
- Institute for Physics of Microstructures of the Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
| | - Dmitry V Shengurov
- Institute for Physics of Microstructures of the Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
| | - Sergey A Dyakov
- Skolkovo Institute of Science and Technology, 143026 Moscow, Russia
| | - Ekaterina E Rodyakina
- Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, 630090 Novosibirsk, Russia
- Physical Department, Novosibirsk State University, 630090 Novosibirsk, Russia
| | - Zhanna V Smagina
- Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, 630090 Novosibirsk, Russia
| | - Alexey V Novikov
- Institute for Physics of Microstructures of the Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
- Radiophysical Department, Lobachevsky State University of Nizhny Novgorod, 603950 Nizhny Novgorod, Russia
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20
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Zhang G, Hao T, Cen Q, Li M, Shi N, Li W, Xiao X, Qi N, Dong J, Dai Y, Zhu N, Li M. Hybrid-integrated wideband tunable optoelectronic oscillator. OPTICS EXPRESS 2023; 31:16929-16938. [PMID: 37157761 DOI: 10.1364/oe.485897] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/10/2023]
Abstract
As a photonic-based microwave signal generation method, the optoelectronic oscillator (OEO) has the potential of meeting the increasing demand of practical applications for high frequency, broadband tunability and ultra-low phase noise. However, conventional OEO systems implemented with discrete optoelectronic devices have a bulky size and low reliability, which extremely limits their practical applications. In this paper, a hybrid-integrated wideband tunable OEO with low phase noise is proposed and experimentally demonstrated. The proposed hybrid integrated OEO achieves a high integration level by first integrating a laser chip with a silicon photonic chip, and then connecting the silicon photonic chip with electronic chips through wire-bonding to microstrip lines. A compact fiber ring and an yttrium iron garnet filter are also adopted for high-Q factor and frequency tuning, respectively. The integrated OEO exhibits a low phase noise of -128.04 dBc/Hz @ 10 kHz for an oscillation frequency of 10 GHz. A wideband tuning range from 3 GHz to 18 GHz is also obtained, covering the entire C, X, and Ku bands. Our work demonstrates an effective way to achieve compact high-performance OEO based on hybrid integration, and has great potential in a wide range of applications such as modern radar, wireless communication, and electronic warfare systems.
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21
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Makihara K, Yamamoto Y, Imai Y, Taoka N, Schubert MA, Tillack B, Miyazaki S. Room Temperature Light Emission from Superatom-like Ge-Core/Si-Shell Quantum Dots. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13091475. [PMID: 37177020 PMCID: PMC10179835 DOI: 10.3390/nano13091475] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/09/2023] [Revised: 04/12/2023] [Accepted: 04/24/2023] [Indexed: 05/15/2023]
Abstract
We have demonstrated the high-density formation of super-atom-like Si quantum dots with Ge-core on ultrathin SiO2 with control of high-selective chemical-vapor deposition and applied them to an active layer of light-emitting diodes (LEDs). Through luminescence measurements, we have reported characteristics carrier confinement and recombination properties in the Ge-core, reflecting the type II energy band discontinuity between the Si-clad and Ge-core. Additionally, under forward bias conditions over a threshold bias for LEDs, electroluminescence becomes observable at room temperature in the near-infrared region and is attributed to radiative recombination between quantized states in the Ge-core with a deep potential well for holes caused by electron/hole simultaneous injection from the gate and substrate, respectively. The results will lead to the development of Si-based light-emitting devices that are highly compatible with Si-ultra-large-scale integration processing, which has been believed to have extreme difficulty in realizing silicon photonics.
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Affiliation(s)
- Katsunori Makihara
- Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
- IHP-Leibniz-Institut für Innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt, Germany
| | - Yuji Yamamoto
- IHP-Leibniz-Institut für Innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt, Germany
| | - Yuki Imai
- Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
| | - Noriyuki Taoka
- Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
| | - Markus Andreas Schubert
- IHP-Leibniz-Institut für Innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt, Germany
| | - Bernd Tillack
- IHP-Leibniz-Institut für Innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt, Germany
- Technische Universität Berlin, HFT4, Einsteinufer 25, 10587 Berlin, Germany
| | - Seiichi Miyazaki
- Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
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22
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Mayengbam R, Tan CS, Fan W. Theoretical insights into the amplified optical gain of hexagonal germanium by strain engineering. RSC Adv 2023; 13:11324-11336. [PMID: 37057269 PMCID: PMC10088490 DOI: 10.1039/d3ra00791j] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/06/2023] [Accepted: 03/17/2023] [Indexed: 04/15/2023] Open
Abstract
Strain engineering is a versatile technique used to tune the electronic and optical attributes of a semiconductor. A proper degree of strain can induce the optimum amount of gain necessary for light-emitting applications. Particularly, photonic integrated chips require an efficient light-emitting material that can be easily assimilated into complementary metal-oxide semiconductor (CMOS) technology. Germanium falls in the same group of the periodic table as silicon, and thus, it completely complies with Si technology. Hence, we investigated extensively the electronic and optical properties of hexagonal germanium for both compressive and tensile strains using density functional theory. The electronic bandstructure, dielectric function, absorption, and reflectivity were calculated by employing a modified Becke-Johnson (mBJ) potential including spin-orbit coupling for uniaxial strains ±0.5-5%. We calculated the effective masses at various symmetry points and determined other band parameters, including the crystal field splitting and spin-orbit splitting energies. The partial, projected, and total density of states were discussed in great depth to unveil the characteristics of the energy states that take part in optical transitions. Finally, the optical gain for the semiconductor was calculated as a function of strain. After the band inversion phenomenon, hex-Ge generates a huge increase in the amplification and bandwidth of optical gain. This results from the increased electron concentration in Γ- 7c state and enhanced momentum matrix between the p-character valence states and sp-hybridized states of the conduction band. Conduction band to light hole recombination is observed to improve the light emission to a great extent.
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Affiliation(s)
- Rishikanta Mayengbam
- School of Electrical and Electronics Engineering, Nanyang Technological University (NTU) 50 Nanyang Avenue Singapore 639798 Singapore
| | - Chuan Seng Tan
- School of Electrical and Electronics Engineering, Nanyang Technological University (NTU) 50 Nanyang Avenue Singapore 639798 Singapore
| | - Weijun Fan
- School of Electrical and Electronics Engineering, Nanyang Technological University (NTU) 50 Nanyang Avenue Singapore 639798 Singapore
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23
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Zhang P, Zhang L, Lyu F, Wang D, Zhang L, Wu K, Wang S, Tang C. Luminescent Amorphous Silicon Oxynitride Systems: High Quantum Efficiencies in the Visible Range. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:1269. [PMID: 37049362 PMCID: PMC10096760 DOI: 10.3390/nano13071269] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/27/2023] [Revised: 03/27/2023] [Accepted: 04/02/2023] [Indexed: 06/19/2023]
Abstract
In recent years, researchers have placed great importance on the use of silicon (Si)-related materials as efficient light sources for the purpose of realizing Si-based monolithic optoelectronic integration. Previous works were mostly focused on Si nanostructured materials, and, so far, exciting results from Si-based compounds are still lacking. In this paper, we have systematically demonstrated the high photoluminescence external quantum efficiency (PL EQE) and internal quantum efficiency (PL IQE) of amorphous silicon oxynitride (a-SiNxOy) systems. Within an integration sphere, we directly measured the PL EQE values of a-SiNxOy, which ranged from approximately 2% to 10% in the visible range at room temperature. Then, we calculated the related PL IQE through temperature-dependent PL measurements. The obtained PL IQE values (~84% at 480 nm emission peak wavelength) were very high compared with those of reported Si-based luminescent thin films. We also calculated the temperature-dependent PL EQE values of a-SiNxOy systems, and discussed the related PL mechanisms.
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Affiliation(s)
- Pengzhan Zhang
- College of Electronic and Information Engineering, Jinling Institute of Technology, Nanjing 211169, China
- Collaborative Innovation Center of Advanced Microstructures, National Laboratory of Solid-State Microstructures, Nanjing University, Nanjing 210093, China
| | - Leng Zhang
- College of Electronic and Information Engineering, Jinling Institute of Technology, Nanjing 211169, China
- Collaborative Innovation Center of Advanced Microstructures, National Laboratory of Solid-State Microstructures, Nanjing University, Nanjing 210093, China
| | - Fei Lyu
- College of Electronic and Information Engineering, Jinling Institute of Technology, Nanjing 211169, China
| | - Danbei Wang
- College of Electronic and Information Engineering, Jinling Institute of Technology, Nanjing 211169, China
| | - Ling Zhang
- College of Electronic and Information Engineering, Jinling Institute of Technology, Nanjing 211169, China
| | - Kongpin Wu
- College of Electronic and Information Engineering, Jinling Institute of Technology, Nanjing 211169, China
| | - Sake Wang
- College of Electronic and Information Engineering, Jinling Institute of Technology, Nanjing 211169, China
| | - Chunmei Tang
- College of Science, Hohai University, Nanjing 210098, China
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24
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Minehisa K, Murakami R, Hashimoto H, Nakama K, Sakaguchi K, Tsutsumi R, Tanigawa T, Yukimune M, Nagashima K, Yanagida T, Sato S, Hiura S, Murayama A, Ishikawa F. Wafer-scale integration of GaAs/AlGaAs core-shell nanowires on silicon by the single process of self-catalyzed molecular beam epitaxy. NANOSCALE ADVANCES 2023; 5:1651-1663. [PMID: 36926567 PMCID: PMC10012865 DOI: 10.1039/d2na00848c] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/25/2022] [Accepted: 01/23/2023] [Indexed: 06/18/2023]
Abstract
GaAs/AlGaAs core-shell nanowires, typically having 250 nm diameter and 6 μm length, were grown on 2-inch Si wafers by the single process of molecular beam epitaxy using constituent Ga-induced self-catalysed vapor-liquid-solid growth. The growth was carried out without specific pre-treatment such as film deposition, patterning, and etching. The outermost Al-rich AlGaAs shells form a native oxide surface protection layer, which provides efficient passivation with elongated carrier lifetime. The 2-inch Si substrate sample exhibits a dark-colored feature due to the light absorption of the nanowires where the reflectance in the visible wavelengths is less than 2%. Homogeneous and optically luminescent and adsorptive GaAs-related core-shell nanowires were prepared over the wafer, showing the prospect for large-volume III-V heterostructure devices available with this approach as complementary device technologies for integration with silicon.
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Affiliation(s)
- Keisuke Minehisa
- Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan
- Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan
| | - Ryo Murakami
- Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan
| | - Hidetoshi Hashimoto
- Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan
- Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan
| | - Kaito Nakama
- Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan
- Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan
| | - Kenta Sakaguchi
- Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan
| | - Rikuo Tsutsumi
- Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan
| | - Takeru Tanigawa
- Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan
| | - Mitsuki Yukimune
- Graduate School of Science and Engineering, Ehime University Matsuyama 790-8577 Japan
| | - Kazuki Nagashima
- Graduate School of Engineering, The University of Tokyo 113-8656 Japan
| | - Takeshi Yanagida
- Graduate School of Engineering, The University of Tokyo 113-8656 Japan
| | - Shino Sato
- Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan
| | - Satoshi Hiura
- Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan
| | - Akihiro Murayama
- Faculty of Information Science and Technology, Hokkaido University Sapporo 060-0814 Japan
| | - Fumitaro Ishikawa
- Research Center for Integrated Quantum Electronics, Hokkaido University Sapporo 060-0813 Japan
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25
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Köstler B, Bae H, Gilmer J, Virovets A, Lerner HW, Albert P, Fantuzzi F, Wagner M. Dope it with germanium: selective access to functionalized Si 5Ge heterocycles. Chem Commun (Camb) 2023; 59:716-719. [PMID: 36541103 DOI: 10.1039/d2cc06060d] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Abstract
The Cl- diadduct [nBu4N]2[A·2Cl] of the mixed cyclohexatetrelane (SiCl2)5(GeMe2), A, is accessible from Me2GeCl2, 6 eq. Si2Cl6, and 2 eq. [nBu4N]Cl in one step (96%). Free, tenfold functionalized A can be released from the primary product by decomplexation with AlCl3 (78%). Insight into the assembly mechanism of [nBu4N]2[A·2Cl] and the reactivity of A is provided.
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Affiliation(s)
- Benedikt Köstler
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Straße 7, Frankfurt am Main 60438, Germany.
| | - Hyunwoo Bae
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Straße 7, Frankfurt am Main 60438, Germany.
| | - Jannik Gilmer
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Straße 7, Frankfurt am Main 60438, Germany.
| | - Alexander Virovets
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Straße 7, Frankfurt am Main 60438, Germany.
| | - Hans-Wolfram Lerner
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Straße 7, Frankfurt am Main 60438, Germany.
| | - Philipp Albert
- Smart Materials, Evonik Operations GmbH, Untere Kanalstraße 3, Rheinfelden 79618, Germany
| | - Felipe Fantuzzi
- School of Chemistry and Forensic Science, University of Kent, Park Wood Road, Canterbury CT2 7NH, UK
| | - Matthias Wagner
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Straße 7, Frankfurt am Main 60438, Germany.
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26
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Zhou Z, Ou X, Fang Y, Alkhazraji E, Xu R, Wan Y, Bowers JE. Prospects and applications of on-chip lasers. ELIGHT 2023; 3:1. [PMID: 36618904 PMCID: PMC9810524 DOI: 10.1186/s43593-022-00027-x] [Citation(s) in RCA: 21] [Impact Index Per Article: 21.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/29/2022] [Revised: 09/03/2022] [Accepted: 09/05/2022] [Indexed: 01/05/2023]
Abstract
Integrated silicon photonics has sparked a significant ramp-up of investment in both academia and industry as a scalable, power-efficient, and eco-friendly solution. At the heart of this platform is the light source, which in itself, has been the focus of research and development extensively. This paper sheds light and conveys our perspective on the current state-of-the-art in different aspects of application-driven on-chip silicon lasers. We tackle this from two perspectives: device-level and system-wide points of view. In the former, the different routes taken in integrating on-chip lasers are explored from different material systems to the chosen integration methodologies. Then, the discussion focus is shifted towards system-wide applications that show great prospects in incorporating photonic integrated circuits (PIC) with on-chip lasers and active devices, namely, optical communications and interconnects, optical phased array-based LiDAR, sensors for chemical and biological analysis, integrated quantum technologies, and finally, optical computing. By leveraging the myriad inherent attractive features of integrated silicon photonics, this paper aims to inspire further development in incorporating PICs with on-chip lasers in, but not limited to, these applications for substantial performance gains, green solutions, and mass production.
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Affiliation(s)
- Zhican Zhou
- Integrated Photonics Lab, King Abdullah University of Science and Technology, Thuwal, Makkah Province Saudi Arabia
| | - Xiangpeng Ou
- Integrated Photonics Lab, King Abdullah University of Science and Technology, Thuwal, Makkah Province Saudi Arabia
| | - Yuetong Fang
- Function Hub, The Hong Kong University of Science and Technology (Guangzhou), Guangdong, China
| | - Emad Alkhazraji
- Integrated Photonics Lab, King Abdullah University of Science and Technology, Thuwal, Makkah Province Saudi Arabia
| | - Renjing Xu
- Function Hub, The Hong Kong University of Science and Technology (Guangzhou), Guangdong, China
| | - Yating Wan
- Integrated Photonics Lab, King Abdullah University of Science and Technology, Thuwal, Makkah Province Saudi Arabia
- Institute for Energy Efficiency, University of California, Santa Barbara, Santa Barbara, CA 93106 USA
| | - John E. Bowers
- Institute for Energy Efficiency, University of California, Santa Barbara, Santa Barbara, CA 93106 USA
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27
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Sahdane T, Masrour R. Magnetocaloric properties and hysteresis loops of hexagons in a square–hexagon-octagon (4-6-8) structure with mixed spins: Monte Carlo Study. Polyhedron 2023. [DOI: 10.1016/j.poly.2023.116279] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/03/2023]
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28
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Ding Y, Zhao X, Zhao Z, Wang Y, Wu T, Yuan G, Liu JM. Strain-Manipulated Photovoltaic and Photoelectric Effects of the MAPbBr 3 Single Crystal. ACS APPLIED MATERIALS & INTERFACES 2022; 14:52134-52139. [PMID: 36375893 DOI: 10.1021/acsami.2c13349] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Lead halide perovskite materials, such as MAPbBr3 and MAPbI3, show excellent semiconductor properties, and thus, they have attracted a lot of attention for applications in solar cells, photodetectors, etc. Here, a periodic strain can dynamically manipulate the build-in electric field (Ebi) of the depletion region with piezoelectricity at the Au/MAPbBr3 interface. As a result, the photovoltaic short-circuit current density (Jsc) and the open-circuit voltage (Voc) are increased by 670 and 82%, respectively, by applying an external strain upon an asymmetric solar-cell-like Au/MAPbBr3/Ga structure. Furthermore, the equivalent piezoelectric d33 values of ∼3.5 pC/N are confirmed in the Au/MAPbBr3/Au structure with both the sinusoidal strain and the 405 nm light illumination with 220 mW/cm2 upon one semitransparent Au electrode. This study not only proves that pressure can effectively enhance the energy conversion efficiency of the halide perovskite-based solar cells and light detectors but also supposes a multifunctional sensor, which can detect light intensity, sense dynamic pressure, explore accelerated speed, etc. simultaneously.
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Affiliation(s)
- Yecheng Ding
- School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu210094, People's Republic of China
| | - Xuefeng Zhao
- School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu210094, People's Republic of China
| | - Zeen Zhao
- School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu210094, People's Republic of China
| | - Yaojin Wang
- School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu210094, People's Republic of China
| | - Tom Wu
- School of Materials Science and Engineering, University of New South Wales (UNSW), Sydney, New South Wales2052, Australia
| | - Guoliang Yuan
- School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu210094, People's Republic of China
| | - Jun-Ming Liu
- Laboratory of Solid State Microstructures, Nanjing University, Nanjing, Jiangsu210093, People's Republic of China
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29
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Becdelievre J, Guan X, Dudko I, Regreny P, Chauvin N, Patriarche G, Gendry M, Danescu A, Penuelas J. Growing self-assisted GaAs nanowires up to 80 μm long by molecular beam epitaxy. NANOTECHNOLOGY 2022; 34:045603. [PMID: 36270200 DOI: 10.1088/1361-6528/ac9c6b] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/30/2022] [Accepted: 10/20/2022] [Indexed: 06/16/2023]
Abstract
Ultralong GaAs nanowires were grown by molecular beam epitaxy using the vapor-liquid-solid method. In this ultralong regime we show the existence of two features concerning the growth kinetic and the structural properties. Firstly, we observed a non-classical growth mode, where the axial growth rate is attenuated. Secondly, we observed structural defects at the surface of Wurtzite segments located at the bottom part of the nanowires. We explain these two phenomena as arising from a particular pathway of the group V species, specific to ultralong nanowires. Finally, the optical properties of such ultralong nanowires are studied by photoluminescence experiments.
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Affiliation(s)
- Jeanne Becdelievre
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
| | - Xin Guan
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
| | - I Dudko
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
- School of Engineering, RMIT University, Melbourne 3001, Victoria, Australia
- Functional Materials and Microsystems, Research Group and Micro Nano Research Facility, RMIT University, Melbourne 3001, Victoria, Australia
| | - Philippe Regreny
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
| | - Nicolas Chauvin
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
| | - Gilles Patriarche
- Centre de Nanosciences et de Nanotechnologies-C2N, CNRS, Université Paris-Sud, Université Paris-Saclay, F-91120 Palaiseau, France
| | - Michel Gendry
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
| | - Alexandre Danescu
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
| | - José Penuelas
- Univ Lyon, Ecole Centrale de Lyon, CNRS, INSA Lyon, Université Claude Bernard Lyon, CPE Lyon, INL, UMR5270, F69130 Ecully, France
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30
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Xiang F, Liao Y. Electronic structures and optical properties of uniform ordered hexagonal Ge0.5Si0.5 alloys from first principles. Chem Phys Lett 2022. [DOI: 10.1016/j.cplett.2022.140178] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/07/2022]
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31
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Huang Q, Zhang Y, Tang J, Sun J. The Design, Fabrication and Characterization of Grating Couplers for SiGe Photonic Integration Employing a Reflective Back Mirror. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:nano12213789. [PMID: 36364564 PMCID: PMC9658239 DOI: 10.3390/nano12213789] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/12/2022] [Revised: 10/09/2022] [Accepted: 10/25/2022] [Indexed: 05/28/2023]
Abstract
We propose and demonstrate an efficient grating coupler for integrated SiGe photonic devices. A bottom metal layer is adopted to enhance the coupling efficiency on the wafer backside. A low coupling loss of -1.34 dB and -0.79 dB can be theoretically obtained with optimal parameters for uniform and apodized grating couplers, respectively. The fabrication process is CMOS compatible without need of wafer bonding. The influence of fabrication errors on the coupling efficiency is analyzed in terms of substrate thickness, grating dimension and material refractive index. The results indicate a large tolerance for the deviations in practical fabrication. The measured coupling loss of the uniform grating is -2.7 dB at approximately 1465 nm with a 3 dB bandwidth of more than 40 nm. The proposed grating coupler provides a promising approach to realize efficient chip-fiber coupling for the SiGe photonic integration.
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Affiliation(s)
- Qiang Huang
- Hunan Provincial Key Laboratory of Grids Operation and Control on Multi-Power Sources Area, School of Electrical Engineering, Shaoyang University, Shaoyang 422000, China
- Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Yi Zhang
- Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Jie Tang
- Hunan Provincial Key Laboratory of Grids Operation and Control on Multi-Power Sources Area, School of Electrical Engineering, Shaoyang University, Shaoyang 422000, China
| | - Junqiang Sun
- Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China
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32
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Köstler B, Jungwirth F, Achenbach L, Sistani M, Bolte M, Lerner HW, Albert P, Wagner M, Barth S. Mixed-Substituted Single-Source Precursors for Si 1-xGe x Thin Film Deposition. Inorg Chem 2022; 61:17248-17255. [PMID: 36260357 DOI: 10.1021/acs.inorgchem.2c02835] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Abstract
A series of new mixed-substituted heteronuclear precursors with preformed Si-Ge bonds has been synthesized via a two-step synthesis protocol. The molecular sources combine convenient handling with sufficient thermal lability to provide access to group IV alloys with low carbon content. Differences in the molecule-material conversion by chemical vapor deposition (CVD) techniques are described and traced back to the molecular design. This study illustrates the possibility of tailoring the physical and chemical properties of single-source precursors for their application in the CVD of Si1-xGex coatings. Moreover, partial crystallization of the Si1-xGex has been achieved by Ga metal-supported CVD growth, which demonstrated the potential of the presented precursor class for the synthesis of crystalline group IV alloys.
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Affiliation(s)
- Benedikt Köstler
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Felix Jungwirth
- Physical Institute, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt, Germany
| | - Luisa Achenbach
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Masiar Sistani
- Institute of Solid State Electronics, TU Wien, Gußhausstraße 25-25a, 1040 Vienna, Austria
| | - Michael Bolte
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Hans-Wolfram Lerner
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Philipp Albert
- Smart Materials, Evonik Operations GmbH, Untere Kanalstraße 3, 79618 Rheinfelden, Germany
| | - Matthias Wagner
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Sven Barth
- Physical Institute, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt, Germany
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Li A, Hauge HIT, Verheijen MA, Bakkers EPAM, Tucker RT, Vincent L, Renard C. Hexagonal silicon-germanium nanowire branches with tunable composition. NANOTECHNOLOGY 2022; 34:015601. [PMID: 36126589 DOI: 10.1088/1361-6528/ac9317] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/19/2022] [Accepted: 09/20/2022] [Indexed: 06/15/2023]
Abstract
Hexagonal SiGe-2H has been recently shown to have a direct bandgap, and holds the promise to be compatible with silicon technology. Hexagonal Si and Ge have been grown on an epitaxial lattice matched template consisting of wurtzite GaP and GaAs, respectively. Here, we present the growth of hexagonal Si and SiGe nanowire branches grown from a wurtzite stem by the vapor-liquid-solid growth mode, which is substantiated byin situtransmission electron microscopy. We show that the composition can be tuned through the whole range of stoichiometry from Si to Ge, and the possibility to realize Si and SiGe heterostructures in these branches.
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Affiliation(s)
- A Li
- Department of Applied Physics, TU Eindhoven, Den Dolech 2, 5612 AZ Eindhoven, The Netherlands
| | - H I T Hauge
- Department of Applied Physics, TU Eindhoven, Den Dolech 2, 5612 AZ Eindhoven, The Netherlands
| | - M A Verheijen
- Department of Applied Physics, TU Eindhoven, Den Dolech 2, 5612 AZ Eindhoven, The Netherlands
- Eurofins Materials Science, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands
| | - E P A M Bakkers
- Department of Applied Physics, TU Eindhoven, Den Dolech 2, 5612 AZ Eindhoven, The Netherlands
| | - R T Tucker
- Department of Applied Physics, TU Eindhoven, Den Dolech 2, 5612 AZ Eindhoven, The Netherlands
- Department of Electrical & Computer Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada
| | - L Vincent
- Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, F-91120, Palaiseau, France
| | - C Renard
- Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, F-91120, Palaiseau, France
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Chen X, Alradhi H, Jin ZM, Zhu L, Sanchez AM, Ma S, Zhuang Q, Shao J. Mid-infrared photoluminescence revealing internal quantum efficiency enhancement of type-I and type-II InAs core/shell nanowires. OPTICS LETTERS 2022; 47:5208-5211. [PMID: 36181223 DOI: 10.1364/ol.473154] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/15/2022] [Accepted: 09/12/2022] [Indexed: 06/16/2023]
Abstract
Internal quantum efficiency (IQE) is an important figure of merit for photoelectric applications. While the InAs core/shell (c/s) nanowire (NW) is a promising solution for efficient quantum emission, the relationship between the IQE and shell coating remains unclear. This Letter reports mid-infrared PL measurements on InAs/InGaAs, InAs/AlSb, and InAs/GaSb c/s NWs, together with bare InAs NWs as a reference. Analyses show that the IQE is depressed by a shell coating at 9 K but gets improved by up to approximately 50% for the InGaAs shell coating at 40 -140 K and up to approximately 20% beyond 110 K for the AlSb shell. The effect is ascribed not only to the crystal quality but more importantly to the radial band alignment. The result indicates the high-temperature IQE improvement of the type-I and type-II c/s NWs and the appropriateness of the mid-infrared PL analyses for narrow-gap NW evaluation.
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Poitiers NE, Huch V, Morgenstern B, Zimmer M, Scheschkewitz D. Siliconoid Expansion by a Single Germanium Atom through Isolated Intermediates. Angew Chem Int Ed Engl 2022; 61:e202205399. [PMID: 35502469 PMCID: PMC9401078 DOI: 10.1002/anie.202205399] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/12/2022] [Indexed: 11/06/2022]
Abstract
The growth of (semi-)metal clusters is pivotal for nucleation processes in gaseous and condensed phases. We now report the isolation of intermediates during the expansion of a stable unsaturated silicon cluster (siliconoid) by a single germanium atom through a sequence of substitution, rearrangement and reduction. The reaction of ligato-lithiated hexasilabenzpolarene LiSi6 Tip5 (1Li⋅(thf)2 , Tip=2,4,6-triisopropylphenyl) with GeCl2 ⋅NHC (NHC=1,3-diisopropyl-4,5-dimethylimidazol-2-ylidene) initially yields the product with exohedral germanium(II) functionality, which then inserts into an Si-Si bond of the Si6 scaffold. The concomitant transfer of the chloro functionality from germanium to an adjacent silicon preserves the electron-precise nature of the formed endohedral germylene. Full incorporation of the germanium heteroatom to the Si6 Ge cluster core is finally achieved either by reduction under loss of the coordinating NHC or directly by reaction of 1Li⋅(thf)2 with GeCl2 ⋅1,4-dioxane.
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Affiliation(s)
- Nadine E. Poitiers
- Krupp Chair in General and Inorganic ChemistrySaarland UniversityGermany
| | - Volker Huch
- Krupp Chair in General and Inorganic ChemistrySaarland UniversityGermany
| | - Bernd Morgenstern
- Krupp Chair in General and Inorganic ChemistrySaarland UniversityGermany
| | - Michael Zimmer
- Krupp Chair in General and Inorganic ChemistrySaarland UniversityGermany
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Low-Dimensional Nanomaterial Systems Formed by IVA Group Elements Allow Energy Conversion Materials to Flourish. NANOMATERIALS 2022; 12:nano12152521. [PMID: 35893488 PMCID: PMC9332081 DOI: 10.3390/nano12152521] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/15/2022] [Revised: 07/13/2022] [Accepted: 07/15/2022] [Indexed: 11/22/2022]
Abstract
In response to the exhaustion of traditional energy, green and efficient energy conversion has attracted growing attention. The IVA group elements, especially carbon, are widely distributed and stable in the earth’s crust, and have received a lot of attention from scientists. The low-dimensional structures composed of IVA group elements have special energy band structure and electrical properties, which allow them to show more excellent performance in the fields of energy conversion. In recent years, the diversification of synthesis and optimization of properties of IVA group elements low-dimensional nanomaterials (IVA-LD) contributed to the flourishing development of related fields. This paper reviews the properties and synthesis methods of IVA-LD for energy conversion devices, as well as their current applications in major fields such as ion battery, moisture electricity generation, and solar-driven evaporation. Finally, the prospects and challenges faced by the IVA-LD in the field of energy conversion are discussed.
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37
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Zhang X, Li Z, Zhang Y, Wang X, Yi X, Wang G, Li J. Heterogeneously integrated InGaN-based green microdisk light-emitters on Si (100). OPTICS EXPRESS 2022; 30:26676-26689. [PMID: 36236855 DOI: 10.1364/oe.462422] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/02/2022] [Accepted: 06/23/2022] [Indexed: 06/16/2023]
Abstract
Heterogeneous integration of nitrides on Si (100) is expected to open the door to the new possibilities for this material system in the fields of high-speed integrated photonics and information processing. In this work, GaN epitaxial layer grown on the patterned sapphire substrate is transferred onto Si (100) by a combination of wafer bonding, laser lift-off and chemical mechanical polishing (CMP) processes. The GaN epilayer transferred is uniformly thinned down to 800 nm with a root mean square surface roughness as low as 2.33 Å. The residual stress within the InGaN quantum wells transferred is mitigated by 79.4% after the CMP process. Accordingly, its emission wavelength exhibits a blue shift of 8.8 nm, revealing an alleviated quantum-confined Stark effect. Based on this platform, an array of microcavities with diverse geometrics and sizes are fabricated, by which optically-pumped green lasing at ∼505.8 nm is achieved with a linewidth of ∼0.48 nm from ∼12 µm microdisks. A spontaneous emission coupling factor of around 10-4 is roughly estimated based on the light output characteristics with increasing the pumping densities. Lasing behaviors beyond the threshold suggest that the microdisk suffers less thermal effects as compared to its undercut counterparts. The electrically-injected microdisks are also fabricated, with a turn-on voltage of ∼2.0 V and a leakage current as low as ∼2.4 pA at -5 V. Being compatible with traditional semiconductor processing techniques, this work provides a feasible solution to fabricate large-area heterogeneously integrated optoelectronic devices based on nitrides.
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38
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Doping of nanocrystalline silicon with sulfur by gas-phase diffusion. INORG CHEM COMMUN 2022. [DOI: 10.1016/j.inoche.2022.109602] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/20/2022]
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39
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Zhan L, Fang Y, Zhang R, Lu X, Lü TY, Cao X, Zhu Z, Wu S. Quantum spin Hall effect in tilted penta silicene and its isoelectronic substitutions. Phys Chem Chem Phys 2022; 24:15201-15207. [PMID: 35612307 DOI: 10.1039/d2cp01390h] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Silicene, a competitive two-dimensional (2D) material for future electronic devices, has attracted intensive attention in condensed matter physics. Utilizing an adaptive genetic algorithm (AGA), we identify a topological allotrope of silicene, named tilted penta (tPenta) silicene. Based on first-principles calculations, the geometric and electronic properties of tPenta silicene and its isoelectronic substitutions (Ge, Sn) are investigated. Our results indicate that tPenta silicene exhibits a semimetallic state with distorted Dirac cones in the absence of spin-orbit coupling (SOC). When SOC is considered, it shows semiconducting behavior with a gap opening of 2.4 meV at the Dirac point. Based on the results of invariant ( = 1) and the helical edge states, we demonstrate that tPenta silicene is a topological insulator. Furthermore, the effect of isoelectronic substitutions on tPenta silicene is studied. Two stoichiometric phases, i.e., tPenta Si0.333Ge0.667 and tPenta Si0.333Sn0.667 are found to retain the geometric framework of tPenta silicene and exhibit high stabilities. Our calculations show that both tPenta Si0.333Ge0.667 and tPenta Si0.333Sn0.667 are QSH insulators with enlarged band gaps of 32.5 meV and 94.3 meV, respectively, at the HSE06 level, offering great potential for practical applications at room temperature.
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Affiliation(s)
- Lijin Zhan
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China.
| | - Yimei Fang
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China.
| | - Ruotong Zhang
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China.
| | - Xiancong Lu
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China.
| | - Tie-Yu Lü
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China.
| | - Xinrui Cao
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China. .,Fujian Provincial Key Laboratory of Theoretical and Computational Chemistry, Xiamen University, Xiamen, 361005, China
| | - Zizhong Zhu
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China. .,Fujian Provincial Key Laboratory of Theoretical and Computational Chemistry, Xiamen University, Xiamen, 361005, China
| | - Shunqing Wu
- Department of Physics, OSED, Key Laboratory of Low Dimensional Condensed Matter Physics (Department of Education of Fujian Province), Jiujiang Research Institute, Xiamen University, Xiamen 361005, China.
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40
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Shen H, Yang R, Zhou J, Yu Z, Lu M, Zheng Y, Zhang R, Chen L, Su WS, Wang S. A new direct band gap Si-Ge allotrope with advanced electronic and optical properties. Phys Chem Chem Phys 2022; 24:16310-16316. [PMID: 35758594 DOI: 10.1039/d2cp01400a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Direct-band silicon materials have been a sought-after material for potential applications in silicon photonics and solar cells. Accordingly, methodologies like nanostructure engineering, alloy engineering and strain engineering have been developed. In this work, the particle swarm optimization (PSO) algorithm is used to design direct-band Si-Ge alloys. The findings of phonon computations demonstrate that all these structures are dynamically stable. In addition, ab initio molecular dynamics and elastic constant calculations are carried out, with results indicating these structures are thermodynamically stable at 300 K, as well as being mechanically stable. All of these materials exhibit semiconductor behavior with band gaps of 1.03, 0.68 and 1.37 eV for α, β and γ phases, respectively, at the HSE06 level. The results of effective mass and mobility of carriers that are important in applications show that holes are more easily transported in all structures, with higher concentration of holes accompanied by lower carrier mobility. Different concentrations of holes nh lead to different limits in the scattering process. When nh is lower than the value of around 1016 cm-3, deformation potential scattering is dominant, while the ionized impurity scattering process limits overall mobility when nh is higher than such a value. Finally, the absorption spectra shows that both α and β phases have isotropic optical properties in the X- and Y-directions while strong anisotropy can be seen in the Z-direction. However, the γ phase exhibits no notable isotropy. This investigation finds three direct-band and potentially CMOS compatible materials, a finding which will benefit the development of high efficiency emitters or solar cells.
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Affiliation(s)
- Hong Shen
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Riyi Yang
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Jian Zhou
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Zhiyuan Yu
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Ming Lu
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Yuxiang Zheng
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Rongjun Zhang
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Liangyao Chen
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
| | - Wan-Sheng Su
- National Taiwan Science Education Center, Taipei 11165, Taiwan. .,Department of Electro-Optical Engineering, National Taipei University of Technology, Taipei 10608, Taiwan.,Department of Applied Physics, National University of Kaohsiung, Kaohsiung 81148, Taiwan
| | - Songyou Wang
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China. .,Key Laboratory for Information Science of Electromagnetic Waves (MoE), Shanghai 200433, China.,Yiwu Research Institution of Fudan University, Yiwu 322000, China
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Poitiers NE, Huch V, Morgenstern B, Zimmer M, Scheschkewitz D. Gerüsterweiterung eines Silicoids um ein einzelnes Germaniumatom über isolierte Zwischenprodukte. Angew Chem Int Ed Engl 2022. [DOI: 10.1002/ange.202205399] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
Affiliation(s)
- Nadine E. Poitiers
- Krupp Chair in General and Inorganic Chemistry Saarland University Deutschland
| | - Volker Huch
- Krupp Chair in General and Inorganic Chemistry Saarland University Deutschland
| | - Bernd Morgenstern
- Krupp Chair in General and Inorganic Chemistry Saarland University Deutschland
| | - Michael Zimmer
- Krupp Chair in General and Inorganic Chemistry Saarland University Deutschland
| | - David Scheschkewitz
- Krupp Chair in General and Inorganic Chemistry Saarland University Deutschland
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A Review of Capabilities and Scope for Hybrid Integration Offered by Silicon-Nitride-Based Photonic Integrated Circuits. SENSORS 2022; 22:s22114227. [PMID: 35684846 PMCID: PMC9185365 DOI: 10.3390/s22114227] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/27/2022] [Revised: 05/26/2022] [Accepted: 05/27/2022] [Indexed: 12/23/2022]
Abstract
In this review we present some of the recent advances in the field of silicon nitride photonic integrated circuits. The review focuses on the material deposition techniques currently available, illustrating the capabilities of each technique. The review then expands on the functionalisation of the platform to achieve nonlinear processing, optical modulation, nonvolatile optical memories and integration with III-V materials to obtain lasing or gain capabilities.
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43
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Highly efficient nonlinear optical emission from a subwavelength crystalline silicon cuboid mediated by supercavity mode. Nat Commun 2022; 13:2749. [PMID: 35585064 PMCID: PMC9117321 DOI: 10.1038/s41467-022-30503-4] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/17/2021] [Accepted: 05/03/2022] [Indexed: 11/08/2022] Open
Abstract
The low quantum efficiency of silicon (Si) has been a long-standing challenge for scientists. Although improvement of quantum efficiency has been achieved in porous Si or Si quantum dots, highly efficient Si-based light sources prepared by using the current fabrication technooloy of Si chips are still being pursued. Here, we proposed a strategy, which exploits the intrinsic excitation of carriers at high temperatures, to modify the carrier dynamics in Si nanoparticles. We designed a Si/SiO2 cuboid supporting a quasi-bound state in the continuum (quasi-BIC) and demonstrated the injection of dense electron-hole plasma via two-photon-induced absorption by resonantly exciting the quasi-BIC with femtosecond laser pulses. We observed a significant improvement in quantum efficiency by six orders of magnitude to ~13%, which is manifested in the ultra-bright hot electron luminescence emitted from the Si/SiO2 cuboid. We revealed that femtosecond laser light with transverse electric polarization (i.e., the electric field perpendicular to the length of a Si/SiO2 cuboid) is more efficient for generating hot electron luminescence in Si/SiO2 cuboids as compared with that of transverse magnetic polarization (i.e., the magnetic field perpendicular to the length of a Si/SiO2 cuboid). Our findings pave the way for realizing on-chip nanoscale Si light sources for photonic integrated circuits and open a new avenue for manipulating the luminescence properties of semiconductors with indirect bandgaps. Enhancing the efficiency of quantum emitters is essential for exploring new functionalities. Here the authors show Si cuboids that sustain bound states in the continuum enable the injection of dense electron-hole plasma and provide high quantum efficiency.
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Bonino V, Pauc N, Calvo V, Frauenrath M, Hartmann JM, Chelnokov A, Reboud V, Rosenthal M, Segura-Ruiz J. Microstructuring to Improve the Thermal Stability of GeSn Layers. ACS APPLIED MATERIALS & INTERFACES 2022; 14:22270-22277. [PMID: 35510890 DOI: 10.1021/acsami.2c01652] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Tin segregation in Ge1-xSnx alloys is one of the major problems potentially hindering the use of this material in devices. Ge1-xSnx microdisks fabricated from layers with Sn concentrations up to 16.9% underwent here annealing at temperatures as high as 400 °C for 20 min without Sn segregation, in contrast with the full segregation observed in the corresponding blanket layers annealed simultaneously. After annealing, no changes in the elemental composition of the microdisks were evidenced. An enhancement of the total integrated photoluminescence, with no modifications of the emission energy, was also observed. These findings show that microstructuring offers a completely new path in maintaining the stability of high Sn concentration Ge1-xSnx layers at temperatures much higher than those used for growth. This approach enables the use of thermal annealing processes to improve the properties of this alloy in optoelectronic devices (such as light emitting diodes, lasers, photodetectors, or modulators). It should also facilitate the integration of Ge1-xSnx into well-established technologies requiring medium temperature processes. The same strategy may help to prevent Sn segregation during high temperature processes in similar metastable alloys.
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Affiliation(s)
- Valentina Bonino
- ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble, France
| | - Nicolas Pauc
- University of Grenoble Alpes, CEA, Grenoble INP, IRIG, PHELIQS, 38000 Grenoble, France
| | - Vincent Calvo
- University of Grenoble Alpes, CEA, Grenoble INP, IRIG, PHELIQS, 38000 Grenoble, France
| | | | | | - Alexei Chelnokov
- University of Grenoble Alpes, CEA, LETI, F-38054 Grenoble, France
| | - Vincent Reboud
- University of Grenoble Alpes, CEA, LETI, F-38054 Grenoble, France
| | - Martin Rosenthal
- ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble, France
| | - Jaime Segura-Ruiz
- ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble, France
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Saidov AS, Razzokov AS. Growth and Morphological Study of Graded-Gap Si–Si1 – xGex–GaAs Structures. CRYSTALLOGR REP+ 2022. [DOI: 10.1134/s1063774522020146] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/23/2022]
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46
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Li D, Chen J, Sun T, Zhang Y, Xu J, Li W, Chen K. Enhanced subband light emission from Si quantum dots/SiO 2 multilayers via phosphorus and boron co-doping. OPTICS EXPRESS 2022; 30:12308-12315. [PMID: 35472868 DOI: 10.1364/oe.453086] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/06/2022] [Accepted: 03/15/2022] [Indexed: 06/14/2023]
Abstract
Seeking light sources from Si-based materials with an emission wavelength meeting the requirements of optical telecommunication is a challenge nowadays. It was found that the subband emission centered near 1200 nm can be achieved in phosphorus-doped Si quantum dots/SiO2 multilayers. In this work, we propose the phosphorus/boron co-doping in Si quantum dots/SiO2 multilayers to enhance the subband light emission. By increasing the B co-doping ratio, the emission intensity is first increased and then decreased, while the strongest integrated emission intensity is almost two orders of magnitude stronger than that of P solely-doped sample. The enhanced subband light emission in co-doped samples can be attributed to the passivation of surface dangling bonds by B dopants. At high B co-doping ratios, the samples transfer to p-type and the subband light emission from phosphorus-related deep level is suppressed but the emission centered around 1400 nm is appeared.
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Pavlov J, Ceponis T, Pukas K, Makarenko L, Gaubas E. 5.5 MeV Electron Irradiation-Induced Transformation of Minority Carrier Traps in p-Type Si and Si 1-xGe x Alloys. MATERIALS 2022; 15:ma15051861. [PMID: 35269092 PMCID: PMC8911796 DOI: 10.3390/ma15051861] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/04/2022] [Revised: 02/21/2022] [Accepted: 02/28/2022] [Indexed: 02/05/2023]
Abstract
Minority carrier traps play an important role in the performance and radiation hardness of the radiation detectors operating in a harsh environment of particle accelerators, such as the up-graded sensors of the high-luminosity hadron collider (HL-HC) at CERN. It is anticipated that the sensors of the upgraded strip tracker will be based on the p-type silicon doped with boron. In this work, minority carrier traps in p-type silicon (Si) and silicon–germanium (Si1−xGex) alloys induced by 5.5 MeV electron irradiation were investigated by combining various modes of deep-level transient spectroscopy (DLTS) and pulsed technique of barrier evaluation using linearly increasing voltage (BELIV). These investigations were addressed to reveal the dominant radiation defects, the dopant activity transforms under local strain, as well as reactions with interstitial impurities and mechanisms of acceptor removal in p-type silicon (Si) and silicon–germanium (SiGe) alloys, in order to ground technological ways for radiation hardening of the advanced particle detectors. The prevailing defects of interstitial boron–oxygen (BiOi) and the vacancy–oxygen (VO) complexes, as well as the vacancy clusters, were identified using the values of activation energy reported in the literature. The activation energy shift of the radiation-induced traps with content of Ge was clarified in all the examined types of Si1−xGex (with x= 0–0.05) materials.
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Affiliation(s)
- Jevgenij Pavlov
- Institute of Photonics and Nanotechnology, Vilnius University, Sauletekio Ave. 3, LT-10257 Vilnius, Lithuania; (T.C.); (K.P.); (E.G.)
- Correspondence: ; Tel.: +370-5-223-4487
| | - Tomas Ceponis
- Institute of Photonics and Nanotechnology, Vilnius University, Sauletekio Ave. 3, LT-10257 Vilnius, Lithuania; (T.C.); (K.P.); (E.G.)
| | - Kornelijus Pukas
- Institute of Photonics and Nanotechnology, Vilnius University, Sauletekio Ave. 3, LT-10257 Vilnius, Lithuania; (T.C.); (K.P.); (E.G.)
| | - Leonid Makarenko
- Department of Applied Mathematics and Computer Science, Belarusian State University, Independence Ave. 4, 220030 Minsk, Belarus;
| | - Eugenijus Gaubas
- Institute of Photonics and Nanotechnology, Vilnius University, Sauletekio Ave. 3, LT-10257 Vilnius, Lithuania; (T.C.); (K.P.); (E.G.)
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48
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Wu Y, Wang X, Tian G, Zheng L, Liang F, Zhang S, Yu H, Zhang H. Inverse Design of Ferroelectric-Order in Perovskite Crystal for Self-Powered Ultraviolet Photodetection. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2105108. [PMID: 34932855 DOI: 10.1002/adma.202105108] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/03/2021] [Revised: 12/06/2021] [Indexed: 06/14/2023]
Abstract
It has always been a hot topic to design an orderly mesoscopic structure in functional materials to tailor the macroscopic properties or realize new functions. The existence of domains in ferroelectric materials has been proven to affect the macroscopic properties, being actively studied in nonlinear optical conversion and piezoelectric effects. However, the high-efficiency photoelectric conversion capability of ferroelectric crystals has not yet been explored. Here, the authors study the orderly arrangement of ferroelectric order in KTa1- x Nbx O3 (KTN) perovskite crystals, and design the "head-to-head" domains by tuning the Curie temperature Tc , thereby generating abundant charged domain walls and robust conductive channels for electrons and holes. An ultrahigh ultraviolet photoresponsivity is achieved in the KTN crystal under zero bias voltage, being about four orders magnitude higher than that of the well-known ferroelectric materials. The substantial improvement can be attributed to the judiciously designed ferroelectric order, as demonstrated by the conductive atomic force microscopy. In addition, KTN detector exhibits high stability and reliability after high-temperature and fatigue treatment. KTN crystal features giant photoresponsivity, high electric-optical coefficient, and large χ(2) nonlinearity concurrently, indicating its great potential for application of all-optical devices on photonic chips.
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Affiliation(s)
- Yabo Wu
- State Key Laboratory of Crystal Materials and Institute of Crystal Materials, Shandong University, Jinan, 250100, China
| | - Xuping Wang
- Advanced Materials Institute, Qilu University of Technology (Shandong Academy of Sciences), Jinan, 250014, China
| | - Gang Tian
- School of Physics, Shandong University, Jinan, 250100, China
| | - Limei Zheng
- School of Physics, Shandong University, Jinan, 250100, China
| | - Fei Liang
- State Key Laboratory of Crystal Materials and Institute of Crystal Materials, Shandong University, Jinan, 250100, China
| | - Shujun Zhang
- Institute for Superconducting and Electronic Materials, AIIM, University of Wollongong, Wollongong, New South Wales, 2500, Australia
| | - Haohai Yu
- State Key Laboratory of Crystal Materials and Institute of Crystal Materials, Shandong University, Jinan, 250100, China
| | - Huaijin Zhang
- State Key Laboratory of Crystal Materials and Institute of Crystal Materials, Shandong University, Jinan, 250100, China
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Zhang Y, Fonseka HA, Yang H, Yu X, Jurczak P, Huo S, Sanchez AM, Liu H. Thermally-driven formation method for growing (quantum) dots on sidewalls of self-catalysed thin nanowires. NANOSCALE HORIZONS 2022; 7:311-318. [PMID: 35119067 DOI: 10.1039/d1nh00638j] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Embedding quantum dots (QDs) on nanowire (NW) sidewalls allows the integration of multi-layers of QDs into the active region of radial p-i-n junctions to greatly enhance light emission/absorption. However, the surface curvature makes the growth much more challenging compared with growths on thin-films, particularly on NWs with small diameters (Ø < 100 nm). Moreover, the {110} sidewall facets of self-catalyzed NWs favor two-dimensional growth, with the realization of three-dimensional Stranski-Krastanow growth becoming extremely challenging. Here, we have developed a novel thermally-driven QD growth method. The QD formation is driven by the system energy minimization when the pseudomorphic shell layer (made of QD material) is annealed under high-temperature, and thus without any restriction on the NW diameter or the participation of elastic strain. It has demonstrated that the lattice-matched Ge dots can be grown defect-freely in a controllable way on the sidewall facets of the thin (∼50 nm) self-catalyzed GaAs NWs without using any surfactant or surface treatment. This method opens a new avenue to integrate QDs on NWs, and can allow the formation of QDs in a wider range of materials systems where the growth by traditional mechanisms is not possible, with benefits for novel NWQD-based optoelectronic devices.
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Affiliation(s)
- Yunyan Zhang
- School of Micro-Nano Electronics, Zhejiang University, Hangzhou, Zhejiang, 311200, China.
- Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, UK
- Department of Physics, Paderborn University, Warburger Straße 100, Paderborn, 33098, Germany
| | - H Aruni Fonseka
- Department of Physics, University of Warwick, Coventry CV4 7AL, UK
| | - Hui Yang
- Department of Materials, Imperial College London, Exhibition Road, London SW7 2AZ, UK.
| | - Xuezhe Yu
- Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, UK
| | - Pamela Jurczak
- Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, UK
| | - Suguo Huo
- London Centre for Nanotechnology, University College London, WC1H 0AH, UK
| | - Ana M Sanchez
- Department of Physics, University of Warwick, Coventry CV4 7AL, UK
| | - Huiyun Liu
- Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, UK
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Becheker R, Bailly M, Idlahcen S, Godin T, Gerard B, Delahaye H, Granger G, Fèvrier S, Grisard A, Lallier E, Hideur A. Optical parametric generation in OP-GaAs waveguides pumped by a femtosecond fluoride fiber laser. OPTICS LETTERS 2022; 47:886-889. [PMID: 35167550 DOI: 10.1364/ol.443896] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/21/2021] [Accepted: 12/22/2021] [Indexed: 06/14/2023]
Abstract
We report on mid-infrared optical parametric generation in the 4-5 μm and 9-12 μm bands by pumping custom-designed orientation-patterned gallium arsenide (OP-GaAs) rib waveguides with an ultrafast femtosecond fiber laser system. This pump source is seeded by a mode-locked fluoride fiber laser with 59 MHz repetition rate and can be tuned between 2.8 and 3.2 μm using a soliton self-frequency shifting stage. The single TE and TM modes OP-GaAs crystals feature quasi-phase-matched grating periods of 85 and 90 μm and different transverse sizes thus allowing a wide spectral tunability.
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