Dot-Matrix Hologram Rendering Algorithm and its Validation through Direct Laser Interference Patterning

Optical diffraction properties of three superimposed self-organized nanostructures induced by a laser process

Controlling the diffraction properties of materials over a large area holds great promise for a wide range of optical applications. Laser-based techniques have emerged as a viable solution to address this need. Here, we present the diffraction properties of laser-induced self-organized structures, which consist of three interlaced grating-like structures: self-organized nanoparticles, self-organized cracks, and laser marking lines. Under normal incidence external illumination, the sample exhibits an asymmetric diffraction pattern. However, when the incidence angle is tilted, circular diffraction patterns are observed in the plane perpendicular to both the sample and the incidence plane. These phenomena are attributed to the combination effect of the diffraction gratings. To elucidate the underlying physics of multiple diffraction, we use rigorous coupled-wave analysis (RCWA) and grating equations written in direction cosine space, extended to account for the presence of three superimposed gratings. Exploiting the laser-induced diffraction properties of these samples may have great potential for various industrial implementations, including security, display, and design.

Large area structural color printing based on dot-matrix laser interference patterning

Optically Variable Devices (OVDs) are widely used as security features in anti-counterfeiting efforts. OVDs enable the display of color dynamic effects that are easily interpreted by the user. However, obtaining these elements over large areas poses certain challenges in terms of efficiency. The paper presents a modified approach for manufacturing plasmonic type OVDs through dot-matrix technology, which is a standard origination step of security holograms. By adjusting the spatial filters in the optical scheme, it is possible to double the resolution of the recorded quasi-sinusoidal diffraction gratings. The experiments confirm the creation of diffraction gratings with frequencies from 1600 to 3500 lines per mm, which facilitates the production of plasmonic zero-order spectral filters. The paper shows how the transmission characteristics of the studied elements are affected by the geometric parameters of the diffraction grating, silver layer thickness, angle of incidence, and polarization of light. The results have shown that using the proposed method it is possible to obtain 1D or 2D structural color OVD-image on a large area - several square centimeters and more. High speed recording of such elements is provided: the exposure time was from 120 to 400 ms depending on the grating resolution for a 0.05 mm2 frame, the total printing time for the size of the 25×25 mm2 OVD was about 2.5 hours for a 1D element, and less than 3.5 hours for a 2D element. Thus, the proposed method and the OVD elements produced by it can be useful to designers of optical security elements as a simpler and faster alternative to electron-beam lithographic technologies.

Full Geometric Control of Hidden Color Information in Diffraction Gratings under Angled White Light Illumination

Under white light illumination, gratings produce an angular distribution of wavelengths dependent on the diffraction order and geometric parameters. However, previous studies of gratings are limited to at least one geometric parameter (height, periodicity, orientation, angle of incidence) kept constant. Here, we vary all geometric parameters in the gratings using a versatile nanofabrication technique, two-photon polymerization lithography, to encode hidden color information through two design approaches. The first approach hides color information by decoupling the effects of grating height and periodicity under normal and oblique incidence. The second approach hides multiple sets of color information by arranging gratings in sectors around semicircular pixels. Different images are revealed with negligible crosstalk under oblique incidence and varying sample rotation angles. Our analysis shows that an angular separation of ≥10° between adjacent sectors is required to suppress crosstalk. This work has potential applications in information storage and security watermarks.

Nanooptical elements for visual verification

This paper focuses on the development of flat diffractive optical elements (DOEs) for protecting banknotes, documents, plastic cards, and securities against counterfeiting. A DOE is a flat diffractive element whose microrelief, when illuminated by white light, forms a visual image consisting of several symbols (digits or letters), which move across the optical element when tilted. The images formed by these elements are asymmetric with respect to the zero order. To form these images, the microrelief of a DOE must itself be asymmetric. The microrelief has a depth of ~ 0.3 microns and is shaped with an accuracy of ~ 10-15 nm using electron-beam lithography. The DOEs developed in this work are securely protected against counterfeiting and can be replicated hundreds of millions of times using standard equipment meant for the mass production of relief holograms.

Wettability control of polymeric microstructures replicated from laser-patterned stamps

In this study, two-step approaches to fabricate periodic microstructures on polyethylene terephthalate (PET) and poly(methyl methacrylate) (PMMA) substrates are presented to control the wettability of polymeric surfaces. Micropillar arrays with periods between 1.6 and 4.6 µm are patterned by plate-to-plate hot embossing using chromium stamps structured by four-beam Direct Laser Interference Patterning (DLIP). By varying the laser parameters, the shape, spatial period, and structure height of the laser-induced topography on Cr stamps are controlled. After that, the wettability properties, namely the static, advancing/receding contact angles (CAs), and contact angle hysteresis were characterized on the patterned PET and PMMA surfaces. The results indicate that the micropillar arrays induced a hydrophobic state in both polymers with CAs up to 140° in the case of PET, without modifying the surface chemistry. However, the structured surfaces show high adhesion to water, as the droplets stick to the surfaces and do not roll down even upon turning the substrates upside down. To investigate the wetting state on the structured polymers, theoretical CAs predicted by Wenzel and Cassie-Baxter models for selected structured samples with different topographical characteristics are also calculated and compared with the experimental data.

Scatterometry and diffractometry techniques to monitor surfaces textured by rapid ultra-short pulse laser

The overall aim of the PROMETHEUS project is to develop high power ultra-short pulse lasers and the associated optics to enable the precise periodic texturing of surfaces to impart a range of surface functionalities at unprecedented processing speeds. The project focusses upon the industrial application of ultra-short pulse lasers for manufacturing and on the development of high power ultra-short pulse laser technologies in the range of 700 ps – 10 ns. In summary, new textures will be manufactured to achieve functional surfaces utilising fewer raw materials, less energy and less waste; improve accuracy, power and control over existing technologies; increase achievable precision and minimize heat impact on sensitive materials. This article will provide the outcomes of the first results achieved from the monitoring solutions being used to assess surface textures with micrometer resolution.

DOE for the formation of the effect of switching between two images when an element is turned by 180 degrees

An optical security element forming different 2D images when it is turned by 180 degrees is developed and manufactured for the first time. A synthesis technology is developed that incorporates the computation of the beam pattern in elementary hogels with sizes smaller than 100 microns, computation of the phase function of the diffractive optical element (DOE), and formation of the microrelief of the DOE using electron-beam technology. The DOE employed is a multilevel kinoform with an asymmetrical microrelief shaped with a precision of 10 nm. The resulting security feature is easy to control visually, and the DOE is securely protected against counterfeiting. These DOEs are easy to replicate using standard technologies in the manufacturing of embossed holograms and can be used to protect bank notes, securities, and documents against counterfeiting.

Development of an Analytical Model for Optimization of Direct Laser Interference Patterning

Direct laser interference patterning (DLIP) has proven to be a fast and, at the same time, high-resolution process for the fabrication of large-area surface structures. In order to provide structures with adequate quality and defined morphology at the fastest possible fabrication speed, the processing parameters have to be carefully selected. In this work, an analytical model was developed and verified by experimental data, which allows calculating the morphological properties of periodic structures as a function of most relevant laser-processing parameters. The developed model permits to improve the process throughput by optimizing the laser spot diameter, as well as pulse energy, and repetition rate. The model was developed for the structures formed by a single scan of the beam in one direction. To validate the model, microstructures with a 5.5 µm spatial period were fabricated on stainless steel by means of picosecond DLIP (10 ps), using a laser source operating at a 1064 nm wavelength. The results showed a difference of only 10% compared to the experimental results.

Picosecond Laser Interference Patterning of Periodical Micro-Architectures on Metallic Molds for Hot Embossing

In this work, it is demonstrated that direct laser interference patterning (DLIP) is a method capable of producing microtextured metallic molds for hot embossing processes. Three different metals (Cr, Ni, and Cu), relevant for the mold production used in nanoimprinting systems, are patterned by DLIP using a picosecond laser source emitting at a 532 nm wavelength. The results show that the quality and surface topography of the produced hole-like micropatterns are determined by the laser processing parameters, such as irradiated energy density and the number of pulses. Laser-induced periodic surface structures (LIPSS) are also observed on the treated surfaces, whose shapes, periodicities, and orientations are strongly dependent on the accumulated fluence. Finally, the three structured metals are used as embossing molds to imprint microlenses on polymethyl methacrylate (PMMA) foils using an electrohydraulic press. Topographical profiles demonstrate that the obtained structures are comparable to the masters showing a satisfactory reproduction of the texture. The polymeric microlens arrays that showed the best surface homogeneity and overall quality were those embossed with the Cr molds.