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Debiossac M, Pan P, Roncin P. Elastic and inelastic diffraction of fast neon atoms on a LiF surface. Phys Chem Chem Phys 2023; 25:30966-30974. [PMID: 37937541 DOI: 10.1039/d3cp04034h] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2023]
Abstract
Grazing incidence fast atom diffraction has mainly been investigated with helium atoms, considered as the best possible choice for surface analysis. This article presents experimental diffraction profiles recorded with neon projectile, between 300 eV and 4 keV kinetic energy with incidence angles θi between 0.3 and 1.5° along three different directions of a LiF(001) crystal surface. These correspond to perpendicular energy ranging from a few meV up to almost 1 eV. A careful analysis of the scattering profile allows us to extract the diffracted intensities even when inelastic effects become so large that most quantum signatures have disappeared. The relevance of this approach is discussed in terms of surface topology.
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Affiliation(s)
- Maxime Debiossac
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay (ISMO), 91405 Orsay, France.
| | - Peng Pan
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay (ISMO), 91405 Orsay, France.
| | - Philippe Roncin
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay (ISMO), 91405 Orsay, France.
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Bühler J, Roncin P, Brand C. Describing the scattering of keV protons through graphene. Front Chem 2023; 11:1291065. [PMID: 38033471 PMCID: PMC10687178 DOI: 10.3389/fchem.2023.1291065] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/08/2023] [Accepted: 11/06/2023] [Indexed: 12/02/2023] Open
Abstract
Implementing two-dimensional materials in technological solutions requires fast, economic, and non-destructive tools to ensure efficient characterization. In this context, scattering of keV protons through free-standing graphene was proposed as an analytical tool. Here, we critically evaluate the predicted effects using classical simulations including a description of the lattice's thermal motion and the membrane corrugation via statistical averaging. Our study shows that the zero-point motion of the lattice atoms alone leads to considerable broadening of the signal that is not properly described by thermal averaging of the interaction potential. In combination with the non-negligible probability for introducing defects, it limits the prospect of proton scattering at 5 keV as an analytic tool.
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Affiliation(s)
- Jakob Bühler
- Department of Quantum Nanophysics, German Aerospace Center (DLR), Institute of Quantum Technologies, Ulm, Germany
| | - Philippe Roncin
- Institut des Sciences Moléculaires d’Orsay (ISMO), Centre national de la recherche scientifique (CNRS), University Paris-Sud, Université Paris-Saclay, Orsay, France
| | - Christian Brand
- Department of Quantum Nanophysics, German Aerospace Center (DLR), Institute of Quantum Technologies, Ulm, Germany
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Fern CL, Liu WJ, Chang YH, Chiang CC, Chen YT, Lu PX, Su XM, Lin SH, Lin KW. Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing. MATERIALS (BASEL, SWITZERLAND) 2023; 16:6989. [PMID: 37959587 PMCID: PMC10649230 DOI: 10.3390/ma16216989] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/16/2023] [Revised: 10/26/2023] [Accepted: 10/30/2023] [Indexed: 11/15/2023]
Abstract
Co60Fe20Sm20 thin films were deposited onto glass substrates in a high vacuum setting. The films varied in thickness from 10 to 50 nm and underwent annealing processes at different temperatures: room temperature (RT), 100, 200, and 300 °C. Our analysis encompassed structural, magnetic, electrical, nanomechanical, adhesive, and optical properties in relation to film thickness and annealing temperature. X-ray diffraction (XRD) analysis did not reveal characteristic peaks in Co60Fe20Sm20 thin films due to insufficient growth-driving forces. Electrical measurements indicated reduced resistivity and sheet resistance with increasing film thickness and higher annealing temperatures, owing to hindered current-carrier transport resulting from the amorphous structure. Atomic force microscope (AFM) analysis showed a decrease in surface roughness with increased thickness and annealing temperature. The low-frequency alternating current magnetic susceptibility (χac) values increased with film thickness and annealing temperature. Nanoindentation analysis demonstrated reduced film hardness and Young's modulus with thicker films. Contact angle measurements suggested a hydrophilic film. Surface energy increased with greater film thickness, particularly in annealed films, indicating a decrease in contact angle contributing to this increase. Transmittance measurements have revealed intensified absorption and reduced transmittance with thicker films. In summary, the surface roughness of CoFeSm films at different annealing temperatures significantly influenced their magnetic, electrical, adhesive, and optical properties. A smoother surface reduced the pinning effect on the domain walls, enhancing the χac value. Additionally, diminished surface roughness led to a lower contact angle and higher surface energy. Additionally, smoother surfaces exhibited higher carrier conductivity, resulting in reduced electrical resistance. The optical transparency decreased due to the smoother surface of Co60Fe20Sm20 films.
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Affiliation(s)
- Chi-Lon Fern
- Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan; (C.-L.F.); (K.-W.L.)
| | - Wen-Jen Liu
- Department of Materials Science and Engineering, I-Shou University, Kaohsiung 84001, Taiwan;
| | - Yung-Huang Chang
- Bachelor Program in Industrial Technology, National Yunlin University of Science and Technology, 123 University Road, Section 3, Yunlin, Douliou 64002, Taiwan;
| | - Chia-Chin Chiang
- Department of Mechanical Engineering, National Kaohsiung University of Science and Technology, Kaohsiung 80778, Taiwan;
| | - Yuan-Tsung Chen
- Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Yunlin, Douliou 64002, Taiwan; (P.-X.L.); (X.-M.S.)
| | - Pei-Xin Lu
- Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Yunlin, Douliou 64002, Taiwan; (P.-X.L.); (X.-M.S.)
| | - Xuan-Ming Su
- Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Yunlin, Douliou 64002, Taiwan; (P.-X.L.); (X.-M.S.)
| | - Shih-Hung Lin
- Department of Electronic Engineering, National Yunlin University of Science and Technology, 123 University Road, Section 3, Yunlin, Douliou 64002, Taiwan;
| | - Ko-Wei Lin
- Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan; (C.-L.F.); (K.-W.L.)
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Pan P, Rad JN, Roncin P. A setup for grazing incidence fast atom diffraction. THE REVIEW OF SCIENTIFIC INSTRUMENTS 2022; 93:093305. [PMID: 36182520 DOI: 10.1063/5.0099269] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/16/2022] [Accepted: 08/05/2022] [Indexed: 06/16/2023]
Abstract
We describe a UHV setup for grazing incidence fast atom diffraction (GIFAD) experiments. The overall geometry is simply a source of keV atoms facing an imaging detector. Therefore, it is very similar to the geometry of reflection high energy electron diffraction experiments used to monitor growth at surfaces. Several custom instrumental developments are described making GIFAD operation efficient and straightforward. The difficulties associated with accurately measuring the small scattering angle and the related calibration are carefully analyzed.
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Affiliation(s)
- Peng Pan
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay (ISMO), 91405 Orsay, France
| | - Jaafar Najafi Rad
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay (ISMO), 91405 Orsay, France
| | - Philippe Roncin
- Université Paris-Saclay, CNRS, Institut des Sciences Moléculaires d'Orsay (ISMO), 91405 Orsay, France
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