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Zha J, Dong D, Huang H, Xia Y, Tong J, Liu H, Chan HP, Ho JC, Zhao C, Chai Y, Tan C. Electronics and Optoelectronics Based on Tellurium. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2408969. [PMID: 39279605 DOI: 10.1002/adma.202408969] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/23/2024] [Revised: 08/28/2024] [Indexed: 09/18/2024]
Abstract
As a true 1D system, group-VIA tellurium (Te) is composed of van der Waals bonded molecular chains within a triangular crystal lattice. This unique crystal structure endows Te with many intriguing properties, including electronic, optoelectronic, thermoelectric, piezoelectric, chirality, and topological properties. In addition, the bandgap of Te exhibits thickness dependence, ranging from 0.31 eV in bulk to 1.04 eV in the monolayer limit. These diverse properties make Te suitable for a wide range of applications, addressing both established and emerging challenges. This review begins with an elaboration of the crystal structures and fundamental properties of Te, followed by a detailed discussion of its various synthesis methods, which primarily include solution phase, and chemical and physical vapor deposition technologies. These methods form the foundation for designing Te-centered devices. Then the device applications enabled by Te nanostructures are introduced, with an emphasis on electronics, optoelectronics, sensors, and large-scale circuits. Additionally, performance optimization strategies are discussed for Te-based field-effect transistors. Finally, insights into future research directions and the challenges that lie ahead in this field are shared.
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Affiliation(s)
- Jiajia Zha
- Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, SAR, 999077, China
| | - Dechen Dong
- Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, SAR, 999077, China
| | - Haoxin Huang
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, SAR, 999077, China
| | - Yunpeng Xia
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, SAR, 999077, China
| | - Jingyi Tong
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, SAR, 999077, China
| | - Handa Liu
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, SAR, 999077, China
| | - Hau Ping Chan
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, SAR, 999077, China
| | - Johnny C Ho
- Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong, SAR, 999077, China
| | - Chunsong Zhao
- Huawei Technologies CO., LTD, Shenzhen, 518000, China
| | - Yang Chai
- Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong, SAR, 999077, China
| | - Chaoliang Tan
- Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, SAR, 999077, China
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, SAR, 999077, China
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Zhao Y, Lou Z, Hu J, Li Z, Xu L, Chen Z, Xu Z, Wang T, Wu M, Ying H, An M, Li W, Lin X, Zheng X. Scalable Layer-Controlled Oxidation of Bi 2O 2Se for Self-Rectifying Memristor Arrays With sub-pA Sneak Currents. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2406608. [PMID: 39246123 DOI: 10.1002/adma.202406608] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/08/2024] [Revised: 08/28/2024] [Indexed: 09/10/2024]
Abstract
Smart memristors with innovative properties are crucial for the advancement of next-generation information storage and bioinspired neuromorphic computing. However, the presence of significant sneak currents in large-scale memristor arrays results in operational errors and heat accumulation, hindering their practical utility. This study successfully synthesizes a quasi-free-standing Bi2O2Se single-crystalline film and achieves layer-controlled oxidation by developing large-scale UV-assisted intercalative oxidation, resulting β-Bi2SeO5/Bi2O2Se heterostructures. The resulting β-Bi2SeO5/Bi2O2Se memristor demonstrates remarkable self-rectifying resistive switching performance (over 105 for ON/OFF and rectification ratios, as well as nonlinearity) in both nanoscale (through conductive atomic force microscopy) and microscale (through memristor array) regimes. Furthermore, the potential for scalable production of self-rectifying β-Bi2SeO5/Bi2O2Se memristor, achieving sub-pA sneak currents to minimize cross-talk effects in high-density memristor arrays is demonstrated. The memristors also exhibit ultrafast resistive switching (sub-100 ns) and low power consumption (1.2 pJ) as characterized by pulse-mode testing. The findings suggest a synergetic effect of interfacial Schottky barriers and oxygen vacancy migration as the self-rectifying switching mechanism, elucidated through controllable β-Bi2SeO5 thickness modulation and theoretical ab initio calculations.
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Affiliation(s)
- Yingjie Zhao
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Zhefeng Lou
- Key Laboratory for Quantum Materials of Zhejiang Province, Department of Physics, School of Science and Research Center for Industries of the Future, Westlake University, Hangzhou, 310030, P. R. China
| | - Jiaming Hu
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Zishun Li
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Lanxin Xu
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Zhe Chen
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Zhuokai Xu
- Key Laboratory for Quantum Materials of Zhejiang Province, Department of Physics, School of Science and Research Center for Industries of the Future, Westlake University, Hangzhou, 310030, P. R. China
| | - Tao Wang
- Key Laboratory for Quantum Materials of Zhejiang Province, Department of Physics, School of Science and Research Center for Industries of the Future, Westlake University, Hangzhou, 310030, P. R. China
| | - Mengqi Wu
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Haoting Ying
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Minghao An
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Wenbin Li
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
| | - Xiao Lin
- Key Laboratory for Quantum Materials of Zhejiang Province, Department of Physics, School of Science and Research Center for Industries of the Future, Westlake University, Hangzhou, 310030, P. R. China
| | - Xiaorui Zheng
- School of Engineering, Westlake University, Hangzhou, 310024, P. R. China
- Westlake Institute for Optoelectronics, Westlake University, Hangzhou, 310030, China
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Jiang TT, Wang XD, Wang JJ, Zhang HY, Lu L, Jia C, Wuttig M, Mazzarello R, Zhang W, Ma E. In situ characterization of vacancy ordering in Ge-Sb-Te phase-change memory alloys. FUNDAMENTAL RESEARCH 2024; 4:1235-1242. [PMID: 39431143 PMCID: PMC11489497 DOI: 10.1016/j.fmre.2022.09.010] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/17/2022] [Revised: 06/23/2022] [Accepted: 09/20/2022] [Indexed: 11/28/2022] Open
Abstract
Tailoring the degree of structural disorder in Ge-Sb-Te alloys is important for the development of non-volatile phase-change memory and neuro-inspired computing. Upon crystallization from the amorphous phase, these alloys form a cubic rocksalt-like structure with a high content of intrinsic vacancies. Further thermal annealing results in a gradual structural transition towards a layered structure and an insulator-to-metal transition. In this work, we elucidate the atomic-level details of the structural transition in crystalline GeSb2Te4 by in situ high-resolution transmission electron microscopy experiments and ab initio density functional theory calculations, providing a comprehensive real-time and real-space view of the vacancy ordering process. We also discuss the impact of vacancy ordering on altering the electronic and optical properties of GeSb2Te4, which is relevant to multilevel storage applications. The phase evolution paths in Ge-Sb-Te alloys and Sb2Te3 are illustrated using a summary diagram, which serves as a guide for designing phase-change memory devices.
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Affiliation(s)
- Ting-Ting Jiang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
| | - Xu-Dong Wang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
| | - Jiang-Jing Wang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
- Institute of Physics IA, RWTH Aachen University, Aachen 52074, Germany
| | - Han-Yi Zhang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
| | - Lu Lu
- The School of Microelectronics, State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong, University, Xi'an 710049, China
| | - Chunlin Jia
- The School of Microelectronics, State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong, University, Xi'an 710049, China
| | - Matthias Wuttig
- Institute of Physics IA, RWTH Aachen University, Aachen 52074, Germany
- JARA-FIT and JARA-HPC, RWTH Aachen University, Aachen 52056, Germany
- Peter Grünberg Institute (PGI 10), Forschungszentrum Jülich GmbH, Jülich 52425, Germany
| | | | - Wei Zhang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
| | - En Ma
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
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Shuang Y, Mori S, Yamamoto T, Hatayama S, Saito Y, Fons PJ, Song YH, Hong JP, Ando D, Sutou Y. Soret-Effect Induced Phase-Change in a Chromium Nitride Semiconductor Film. ACS NANO 2024; 18:21135-21143. [PMID: 39088786 PMCID: PMC11328172 DOI: 10.1021/acsnano.4c03574] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/03/2024]
Abstract
Phase-change materials such as Ge-Sb-Te (GST) exhibiting amorphous and crystalline phases can be used for phase-change random-access memory (PCRAM). GST-based PCRAM has been applied as a storage-class memory; however, its relatively low ON/OFF ratio and the large Joule heating energy required for the RESET process (amorphization) significantly limit the storage density. This study proposes a phase-change nitride, CrN, with a much wider programming window (ON/OFF ratio more than 105) and lower RESET energy (one order of magnitude reduction from GST). High-resolution transmission electron microscopy revealed a phase-change from the low-resistance cubic CrN phase into the highly resistive hexagonal CrN2 phase induced by the Soret-effect. The proposed phase-change nitride could greatly expand the scope of conventional phase-change chalcogenides and offer a strategy for the next-generation of PCRAM, enabling a large ON/OFF ratio (∼105), low switching energy (∼100 pJ), and fast operation (∼30 ns).
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Affiliation(s)
- Yi Shuang
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan
| | - Shunsuke Mori
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Takuya Yamamoto
- Department of Metallurgy, Graduate School of Engineering, Tohoku University, Miyagi 980-8579, Japan
| | - Shogo Hatayama
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Yuta Saito
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba 305-8568, Japan
| | - Paul J Fons
- Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama, Kanagawa 223-8522, Japan
| | - Yun-Heub Song
- Department of Electronic Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
| | - Jin-Pyo Hong
- Department of Physics, Hanyang University, Seoul 04763, Korea
| | - Daisuke Ando
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Yuji Sutou
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
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Choi M, Sung H, Koo B, Park J, Yang W, Kang Y, Park Y, Ham Y, Yun D, Ahn D, Yang K, Lee CS. Mechanism for Local-Atomic Structure Changes in Chalcogenide-based Threshold-Switching Devices. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024; 11:e2404035. [PMID: 38899829 PMCID: PMC11348050 DOI: 10.1002/advs.202404035] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/16/2024] [Revised: 06/01/2024] [Indexed: 06/21/2024]
Abstract
Threshold-switching devices based on amorphous chalcogenides are considered for use as selector devices in 3D crossbar memories. However, the fundamental understanding of amorphous chalcogenide is hindered owing to the complexity of the local structures and difficulties in the trap analysis of multinary compounds. Furthermore, after threshold switching, the local structures gradually evolve to more stable energy states owing to the unstable homopolar bonds. Herein, based on trap analysis, DFT simulations, and operando XPS analysis, it is determined that the threshold switching mechanism is deeply related to the charged state of Se-Se homopolar defects. A threshold switching device is demonstrated with an excellent performance through the modification of the local structure via the addition of alloying elements and investigating the time-dependent trap evolution. The results concerning the trap dynamics of local atomic structures in threshold switching phenomena may be used to improve the design of amorphous chalcogenides.
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Affiliation(s)
- Minwoo Choi
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Ha‐Jun Sung
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Bonwon Koo
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Jong‐Bong Park
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Wooyoung Yang
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Youngjae Kang
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Yongyoung Park
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Yongnam Ham
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Dong‐Jin Yun
- Analytical Engineering GroupSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Dongho Ahn
- Semiconductor R&D CenterSamsung ElectronicsHwaseong‐si18448South Korea
| | - Kiyeon Yang
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
| | - Chang Seung Lee
- Thin Film Technical UnitSamsung Advanced Institute of Technology (SAIT)Samsung ElectronicsSuwon‐si16677South Korea
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Jenderny S, Ochs K, Xue D. A memristive circuit for self-organized network topology formation based on guided axon growth. Sci Rep 2024; 14:16643. [PMID: 39025960 PMCID: PMC11258262 DOI: 10.1038/s41598-024-67400-3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/31/2023] [Accepted: 07/10/2024] [Indexed: 07/20/2024] Open
Abstract
Circuit implementations of neuronal networks so far have been focusing on synaptic weight changes as network growth principles. Besides these weight changes, however, it is also useful to incorporate additional network growth principles such as guided axon growth and pruning. These allow for dynamical signal delays and a higher degree of self-organization, and can thus lead to novel circuit design principles. In this work we develop an ideal, bio-inspired electrical circuit mimicking growth and pruning controlled by guidance cues. The circuit is based on memristively coupled neuronal oscillators. As coupling element, we use memsensors consisting of a general sensor, two gradient sensors, and two memristors. The oscillators and memsensors are arranged in a grid structure, where oscillators and memsensors realize nodes and edges, respectively. This allows for arbitrary 2D growth scenarios with axon growth controlled by guidance cues. Simulation results show that the circuit successfully mimics a biological example in which two neurons initially grow towards two target neurons, where undesired connections are pruned later on.
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Affiliation(s)
- Sebastian Jenderny
- Chair of Digital Communication Systems, Ruhr-University Bochum, Universitätsstraße 150, 44801, Bochum, Germany.
| | - Karlheinz Ochs
- Chair of Digital Communication Systems, Ruhr-University Bochum, Universitätsstraße 150, 44801, Bochum, Germany
| | - Daniel Xue
- Department of Electrical and Computer Engineering, University of Virginia, Main Office: Room C210 Thornton Hall, 351 McCormick Road, PO Box 400743, Charlottesville, 22904, USA
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Yan X, Lu Y. Improved optical contrast of plasmonic phase change memory using a Fabry-Perot cavity. OPTICS EXPRESS 2024; 32:18224-18236. [PMID: 38858984 DOI: 10.1364/oe.517544] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/02/2024] [Accepted: 04/10/2024] [Indexed: 06/12/2024]
Abstract
As a promising technology to realize multilevel, non-volatile data storage and information processing, optical phase change technologies have attracted extensive attention in recent years. However, existing phase-change photonic devices face significant challenges such as limited switching contrast and high switching energy. This study introduces an innovative approach to tackle these issues by leveraging Fabry-Perot (F-P) cavity resonance and plasmon resonance techniques to enhance the modulation effect of phase change materials (PCMs) on the light. To the best of our knowledge, a novel device structure is proposed, featuring an elliptic nano-antenna placed on an F-P cavity waveguide composed of symmetric Bragg grating. This design exploits the enhanced electric field to achieve low power consumption and high contrast. The device enables crucial functions, including read, write, and erase operations, under all light conditions. Through the synergistic utilization of plasma and F-P cavity effects, an ultra-high switching contrast of around 70.6% is achieved. By varying the pulse power or duration, the proportion between the crystalline and amorphous states of the PCMs is altered, consequently modifying its refractive index. With its wide range of applications in optical storage and computing, the device holds significant potential for advancing these fields.
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An D, Zhang S, Zhai X, Yang W, Wu R, Zhang H, Fan W, Wang W, Chen S, Cojocaru-Mirédin O, Zhang XM, Wuttig M, Yu Y. Metavalently bonded tellurides: the essence of improved thermoelectric performance in elemental Te. Nat Commun 2024; 15:3177. [PMID: 38609361 PMCID: PMC11014947 DOI: 10.1038/s41467-024-47578-w] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/02/2024] [Accepted: 04/03/2024] [Indexed: 04/14/2024] Open
Abstract
Elemental Te is important for semiconductor applications including thermoelectric energy conversion. Introducing dopants such as As, Sb, and Bi has been proven critical for improving its thermoelectric performance. However, the remarkably low solubility of these elements in Te raises questions about the mechanism with which these dopants can improve the thermoelectric properties. Indeed, these dopants overwhelmingly form precipitates rather than dissolve in the Te lattice. To distinguish the role of doping and precipitation on the properties, we have developed a correlative method to locally determine the structure-property relationship for an individual matrix or precipitate. We reveal that the conspicuous enhancement of electrical conductivity and power factor of bulk Te stems from the dopant-induced metavalently bonded telluride precipitates. These precipitates form electrically beneficial interfaces with the Te matrix. A quantum-mechanical-derived map uncovers more candidates for advancing Te thermoelectrics. This unconventional doping scenario adds another recipe to the design options for thermoelectrics and opens interesting pathways for microstructure design.
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Affiliation(s)
- Decheng An
- College of Chemistry, Taiyuan University of Technology, 030024, Taiyuan, China
| | - Senhao Zhang
- Institute of Physics (IA), RWTH Aachen University, Sommerfeldstraße 14, 52074, Aachen, Germany
| | - Xin Zhai
- School of Electronic Science & Engineering, Southeast University, 210096, Nanjing, China
| | - Wutao Yang
- College of Chemistry, Taiyuan University of Technology, 030024, Taiyuan, China
| | - Riga Wu
- Institute of Physics (IA), RWTH Aachen University, Sommerfeldstraße 14, 52074, Aachen, Germany
| | - Huaide Zhang
- Institute of Physics (IA), RWTH Aachen University, Sommerfeldstraße 14, 52074, Aachen, Germany
| | - Wenhao Fan
- Key Laboratory of Interface Science and Engineering in Advanced Materials, College of Materials Science and Engineering, Instrumental Analysis Center, Taiyuan University of Technology, 030024, Taiyuan, China
| | - Wenxian Wang
- Key Laboratory of Interface Science and Engineering in Advanced Materials, College of Materials Science and Engineering, Instrumental Analysis Center, Taiyuan University of Technology, 030024, Taiyuan, China
| | - Shaoping Chen
- Key Laboratory of Interface Science and Engineering in Advanced Materials, College of Materials Science and Engineering, Instrumental Analysis Center, Taiyuan University of Technology, 030024, Taiyuan, China
| | - Oana Cojocaru-Mirédin
- Department of Sustainable Systems Engineering (INATECH), Albert-Ludwigs-Universität Freiburg, 79110, Freiburg, Germany
| | - Xian-Ming Zhang
- College of Chemistry, Taiyuan University of Technology, 030024, Taiyuan, China.
- Key Laboratory of Interface Science and Engineering in Advanced Materials, College of Materials Science and Engineering, Instrumental Analysis Center, Taiyuan University of Technology, 030024, Taiyuan, China.
| | - Matthias Wuttig
- Institute of Physics (IA), RWTH Aachen University, Sommerfeldstraße 14, 52074, Aachen, Germany.
- Peter Grünberg Institute (PGI 10), Forschungszentrum Jülich, 52428, Jülich, Germany.
| | - Yuan Yu
- Institute of Physics (IA), RWTH Aachen University, Sommerfeldstraße 14, 52074, Aachen, Germany.
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9
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Qiao C, Chen L, Gu R, Liu B, Wang S, Wang S, Wang CZ, Ho KM, Xu M, Miao X. Structure, bonding and electronic characteristics of amorphous Se. Phys Chem Chem Phys 2024; 26:9510-9516. [PMID: 38450725 DOI: 10.1039/d4cp00078a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/08/2024]
Abstract
Ovonic threshold switching (OTS) selectors can effectively improve the storage density and suppress the leakage current of advanced phase-change memory devices. As a prototypical OTS material, amorphous GeSe is widely investigated. But the attention paid to amorphous Se (i.e., the functional constituent in amorphous GeSe) has been very limited up to now. Here we have explored the structure, bonding and electronic characteristics of amorphous Se using ab initio molecular dynamics simulations. The results reveal that the Se atoms in amorphous Se tend to form 2-coordinated configurations, and they connect with each other to form long chains. The fraction of the vibrational density of state located in the high frequency range is relatively large, and the formation energy of the Se-Se bond is as large as 4.44 eV, hinting that the Se-Se bonds in chains possess high stability. In addition, the mid-gap state related to the OTS behavior is also found in amorphous Se despite the small proportion. Our findings enrich the knowledge of amorphous Se, which aids the applications of Se-based OTS selectors.
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Affiliation(s)
- Chong Qiao
- School of Mathematics and Physics, Nanyang Institute of Technology, Nanyang 473004, China
| | - Lanli Chen
- School of Mathematics and Physics, Nanyang Institute of Technology, Nanyang 473004, China
| | - Rongchuan Gu
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China.
| | - Bin Liu
- School of Mathematics and Physics, Nanyang Institute of Technology, Nanyang 473004, China
| | - Shengzhao Wang
- School of Mathematics and Physics, Nanyang Institute of Technology, Nanyang 473004, China
| | - Songyou Wang
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center and Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China
| | - Cai-Zhuang Wang
- Ames Laboratory, U. S. Department of Energy and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011, USA
| | - Kai-Ming Ho
- Ames Laboratory, U. S. Department of Energy and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011, USA
| | - Ming Xu
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China.
| | - Xiangshui Miao
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China.
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10
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Ke S, Pan Y, Jin Y, Meng J, Xiao Y, Chen S, Zhang Z, Li R, Tong F, Jiang B, Song Z, Zhu M, Ye C. Efficient Spiking Neural Networks with Biologically Similar Lithium-Ion Memristor Neurons. ACS APPLIED MATERIALS & INTERFACES 2024; 16:13989-13996. [PMID: 38441421 DOI: 10.1021/acsami.3c19261] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 03/21/2024]
Abstract
Benefiting from the brain-inspired event-driven feature and asynchronous sparse coding approach, spiking neural networks (SNNs) are becoming a potentially energy-efficient replacement for conventional artificial neural networks. However, neuromorphic devices used to construct SNNs persistently result in considerable energy consumption owing to the absence of sufficient biological parallels. Drawing inspiration from the transport nature of Na+ and K+ in synapses, here, a Li-based memristor (LixAlOy) was proposed to emulate the biological synapse, leveraging the similarity of Li as a homologous main group element to Na and K. The Li-based memristor exhibits ∼8 ns ultrafast operating speed, 1.91 and 0.72 linearity conductance modulation, and reproducible switching behavior, enabled by lithium vacancies forming a conductive filament mechanism. Moreover, these memristors are capable of simulating fundamental behaviors of a biological synapse, including long-term potentiation and long-term depression behaviors. Most importantly, a threshold-tunable leaky integrate-and-fire (TT-LIF) neuron is built using LixAlOy memristors, successfully integrating synaptic signals from both temporal and spatial levels and achieving an optimal threshold of SNNs. A computationally efficient TT-LIF-based SNN algorithm is also implemented for image recognition schemes, featuring a high recognition rate of 90.1% and an ultralow firing rate of 0.335%, which is 4 times lower than those of other memristor-based SNNs. Our studies reveal the ion dynamics mechanism of the LixAlOy memristor and confirm its potential in rapid switching and the construction of SNNs.
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Affiliation(s)
- Shanwu Ke
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Yanqin Pan
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Yaoyao Jin
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Jiahao Meng
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Yongyue Xiao
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Siqi Chen
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Zihao Zhang
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Ruiqi Li
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Fangjiu Tong
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Bei Jiang
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
| | - Zhitang Song
- Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Min Zhu
- Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Cong Ye
- School of Microelectronics, Key Laboratory of Intelligent Sensing System and Security, Ministry of Education, Hubei University, Wuhan 430062, China
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11
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Zhang P, Liang Q, Zhou Q, Chen J, Li M, Deng Y, Liang W, Zhang L, Zhang Q, Gu L, Ge C, Jin KJ, Zhang C, Yang G. High-performance terahertz modulators induced by substrate field in Te-based all-2D heterojunctions. LIGHT, SCIENCE & APPLICATIONS 2024; 13:67. [PMID: 38443377 PMCID: PMC10915160 DOI: 10.1038/s41377-024-01393-6] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/03/2023] [Revised: 01/17/2024] [Accepted: 01/21/2024] [Indexed: 03/07/2024]
Abstract
High-performance active terahertz modulators as the indispensable core components are of great importance for the next generation communication technology. However, they currently suffer from the tradeoff between modulation depth and speed. Here, we introduce two-dimensional (2D) tellurium (Te) nanofilms with the unique structure as a new class of optically controlled terahertz modulators and demonstrate their integrated heterojunctions can successfully improve the device performances to the optimal and applicable levels among the existing all-2D broadband modulators. Further photoresponse measurements confirm the significant impact of the stacking order. We first clarify the direction of the substrate-induced electric field through first-principles calculations and uncover the unusual interaction mechanism in the photoexcited carrier dynamics associated with the charge transfer and interlayer exciton recombination. This advances the fundamental and applicative research of Te nanomaterials in high-performance terahertz optoelectronics.
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Affiliation(s)
- Pujing Zhang
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Qihang Liang
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Qingli Zhou
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China.
| | - Jinyu Chen
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Menglei Li
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Yuwang Deng
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Wanlin Liang
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Liangliang Zhang
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Qinghua Zhang
- Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
| | - Lin Gu
- Department of Materials Science and Engineering, Beijing National Center for Electron Microscopy and Laboratory of Advanced Materials, Tsinghua University, Beijing, 100084, China
| | - Chen Ge
- Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China.
| | - Kui-Juan Jin
- Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
| | - Cunlin Zhang
- Department of Physics, Key Laboratory of Terahertz Optoelectronics, Ministry of Education, and Beijing Advanced Innovation Center for Imaging Theory and Technology, Capital Normal University, Beijing, 100048, China
| | - Guozhen Yang
- Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
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12
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Ran Q, Wang Y, Zhang W, Xu N, Chen W, Tang X. Light-Mediated Multilevel Flexible High-Efficiency Perovskite Resistive Switching Memory Based on Mn:CsPbCl 3 Nanocrystals. J Phys Chem Lett 2024; 15:1572-1578. [PMID: 38301605 DOI: 10.1021/acs.jpclett.3c03455] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/03/2024]
Abstract
Herein, the electrical characteristics, photoelectric properties, resistive switching (RS) mechanism, and flexible storage application of Ag/PMMA&Mn:CsPbCl3/ITO (PMMA = poly(methyl methacrylate)) devices are studied by using the photoelectric material Mn:CsPbCl3 nanocrystals (NCs) embedded in PMMA as the RS layer. The devices exhibit bipolar RS behavior with low operating voltage, excellent cycling endurance (>1000 times), long retention time (≥104 s), high ON/OFF ratio (≈104), and good environmental stability. The flexible memory devices have demonstrated reliable mechanical stability of consecutive 1000 bending cycles. In addition, multilevel data storage is realized by introducing the UV light, and the adjustive resistive switching characteristics is achieved through photoelectric synergistic work. The resistive switching mechanism under the excitation of light has been studied comprehensively. This work may pave a new way for developing the next generation of high-density data storage and photoelectric memristor.
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Affiliation(s)
- Qian Ran
- Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China
| | - Yuchan Wang
- School of Integrated Circuit Science and Engineering, Tianjin University of Technology, Tianjin 300384, China
- Tianjin Key Laboratory of Film Electronic and Communication Devices, School of Integrated Circuit Science and Engineering, Tianjin University of Technology, Tianjin 300384, China
| | - Wenxia Zhang
- Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China
| | - Nannan Xu
- Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China
| | - Weiwei Chen
- Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China
| | - Xiaosheng Tang
- Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China
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13
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Zhao Z, Clima S, Garbin D, Degraeve R, Pourtois G, Song Z, Zhu M. Chalcogenide Ovonic Threshold Switching Selector. NANO-MICRO LETTERS 2024; 16:81. [PMID: 38206440 PMCID: PMC10784450 DOI: 10.1007/s40820-023-01289-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/30/2023] [Accepted: 11/14/2023] [Indexed: 01/12/2024]
Abstract
Today's explosion of data urgently requires memory technologies capable of storing large volumes of data in shorter time frames, a feat unattainable with Flash or DRAM. Intel Optane, commonly referred to as three-dimensional phase change memory, stands out as one of the most promising candidates. The Optane with cross-point architecture is constructed through layering a storage element and a selector known as the ovonic threshold switch (OTS). The OTS device, which employs chalcogenide film, has thereby gathered increased attention in recent years. In this paper, we begin by providing a brief introduction to the discovery process of the OTS phenomenon. Subsequently, we summarize the key electrical parameters of OTS devices and delve into recent explorations of OTS materials, which are categorized as Se-based, Te-based, and S-based material systems. Furthermore, we discuss various models for the OTS switching mechanism, including field-induced nucleation model, as well as several carrier injection models. Additionally, we review the progress and innovations in OTS mechanism research. Finally, we highlight the successful application of OTS devices in three-dimensional high-density memory and offer insights into their promising performance and extensive prospects in emerging applications, such as self-selecting memory and neuromorphic computing.
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Affiliation(s)
- Zihao Zhao
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, People's Republic of China
- University of Chinese Academy of Sciences, Beijing, 100029, People's Republic of China
| | | | | | | | | | - Zhitang Song
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, People's Republic of China
| | - Min Zhu
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, People's Republic of China.
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14
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Chen S, Ju Y, Yang Y, Xiang F, Yao Z, Zhang H, Li Y, Zhang Y, Xiang S, Chen B, Zhang Z. Multistate structures in a hydrogen-bonded polycatenation non-covalent organic framework with diverse resistive switching behaviors. Nat Commun 2024; 15:298. [PMID: 38182560 PMCID: PMC10770064 DOI: 10.1038/s41467-023-44214-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/17/2023] [Accepted: 12/05/2023] [Indexed: 01/07/2024] Open
Abstract
The inherent structural flexibility and reversibility of non-covalent organic frameworks have enabled them to exhibit switchable multistate structures under external stimuli, providing great potential in the field of resistive switching (RS), but not well explored yet. Herein, we report the 0D+1D hydrogen-bonded polycatenation non-covalent organic framework (HOF-FJU-52), exhibiting diverse and reversible RS behaviors with the high performance. Triggered by the external stimulus of electrical field E at room temperature, HOF-FJU-52 has excellent resistive random-access memory (RRAM) behaviors, comparable to the state-of-the-art materials. When cooling down below 200 K, it was transferred to write-once-read-many-times memory (WORM) behaviors. The two memory behaviors exhibit reversibility on a single crystal device through the temperature changes. The RS mechanism of this non-covalent organic framework has been deciphered at the atomic level by the detailed single-crystal X-ray diffraction analyses, demonstrating that the structural dual-flexibility both in the asymmetric hydrogen bonded dimers within the 0D loops and in the infinite π-π stacking column between the loops and chains contribute to reversible structure transformations between multi-states and thus to its dual RS behaviors.
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Affiliation(s)
- Shimin Chen
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Yan Ju
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Yisi Yang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Fahui Xiang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Zizhu Yao
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Hao Zhang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Yunbin Li
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Yongfan Zhang
- College of Chemistry, Fuzhou University, Fuzhou, 350108, China
| | - Shengchang Xiang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Banglin Chen
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China
| | - Zhangjing Zhang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Materials Science and Engineering, Fujian Normal University, Fuzhou, 350007, Fujian, China.
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15
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Jiang J, Xiong F, Sun L, Chen H, Zhu M, Xu W, Zhang J, Zhu Z. Reversible Amorphous-Crystalline Phase Transformation in an Ultrathin van der Waals FeTe System. ACS APPLIED MATERIALS & INTERFACES 2023; 15:47661-47668. [PMID: 37783452 DOI: 10.1021/acsami.3c07765] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/04/2023]
Abstract
Searching for new phase-change materials for memory and neuromorphic device applications and further understanding the phase transformation mechanism are attracting wide attention. Phase transformation from the amorphous phase to the crystal phase has been unraveled in iron telluride (FeTe) bulk film deposited by pulsed laser deposition, recently. However, the van der Waals-layered feature of FeTe in the crystal form was not noted, which will benefit the scaling of the memory devices and shine light on phase-change heterostructures or interfacial phase-change materials. Moreover, the demonstration of advanced memory or neuromorphic device applications is lacking. Here, we investigate the phase transformation of FeTe starting from mechanically exfoliated van der Waals layers from a bulk single crystal. Surficial amorphization is revealed at the surface layers of FeTe flakes after exfoliation under ambient conditions, which could be transformed back to the crystalline phase with laser irradiation or heating. The conductance drop of the flake devices near 400 K verifies the phase transformation electrically. Memristor behavior of the amorphous surface in FeTe has been further demonstrated, proving the reversibility of the phase transformation and shining light on the possible applications of neuromorphic devices.
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Affiliation(s)
- Jinbao Jiang
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China
| | - Feng Xiong
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China
| | - Linfeng Sun
- School of Physics, Beijing Institute of Technology, Beijing 100081, China
| | - Haitao Chen
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China
| | - Mengjian Zhu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China
| | - Wei Xu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China
| | - Jianfa Zhang
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China
| | - Zhihong Zhu
- College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha 410073, China
- Nanhu Laser Laboratory, National University of Defense Technology, Changsha 410073, China
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16
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Calogero G, Raciti D, Ricciarelli D, Acosta-Alba P, Cristiano F, Daubriac R, Demoulin R, Deretzis I, Fisicaro G, Hartmann JM, Kerdilès S, La Magna A. Atomistic Insights into Ultrafast SiGe Nanoprocessing. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2023; 127:19867-19877. [PMID: 37817920 PMCID: PMC10561275 DOI: 10.1021/acs.jpcc.3c05999] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/06/2023] [Revised: 09/13/2023] [Indexed: 10/12/2023]
Abstract
Controlling ultrafast material transformations with atomic precision is essential for future nanotechnology. Pulsed laser annealing (LA), inducing extremely rapid and localized phase transitions, is a powerful way to achieve this but requires careful optimization together with the appropriate system design. We present a multiscale LA computational framework that can simulate atom-by-atom the highly out-of-equilibrium kinetics of a material as it interacts with the laser, including effects of structural disorder. By seamlessly coupling a macroscale continuum solver to a nanoscale superlattice kinetic Monte Carlo code, this method overcomes the limits of state-of-the-art continuum-based tools. We exploit it to investigate nontrivial changes in composition, morphology, and quality of laser-annealed SiGe alloys. Validations against experiments and phase-field simulations as well as advanced applications to strained, defected, nanostructured, and confined SiGe are presented, highlighting the importance of a multiscale atomistic-continuum approach. Current applicability and potential generalization routes are finally discussed.
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Affiliation(s)
| | - Domenica Raciti
- STMicroelectronics, Stradale Primosole 50, 95121 Catania, Italy
| | | | | | | | | | - Remi Demoulin
- Univ
Rouen Normandie, INSA Rouen Normandie, CNRS, Normandie Univ, GPM UMR 6634, F-76000 Rouen, France
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17
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Tsai JY, Chen JY, Huang CW, Lo HY, Ke WE, Chu YH, Wu WW. A High-Entropy-Oxides-Based Memristor: Outstanding Resistive Switching Performance and Mechanisms in Atomic Structural Evolution. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2302979. [PMID: 37378645 DOI: 10.1002/adma.202302979] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/31/2023] [Revised: 06/11/2023] [Indexed: 06/29/2023]
Abstract
The application of high-entropy oxide (HEO) has attracted significant attention in recent years owing to their unique structural characteristics, such as excellent electrochemical properties and long-term cycling stability. However, the application of resistive random-access memory (RRAM) has not been extensively studied, and the switching mechanism of HEO-based RRAM has yet to be thoroughly investigated. In this study, HEO (Cr, Mn, Fe, Co, Ni)3 O4 with a spinel structure is epitaxially grown on a Nb:STO conductive substrate, and Pt metal is deposited as the top electrode. After the resistive-switching operation, some regions of the spinel structure are transformed into a rock-salt structure and analyzed using advanced transmission electron microscopy and scanning transmission electron microscopy. From the results of X-ray photoelectron spectroscopy and electron energy loss spectroscopy, only specific elements would change their valence state, which results in excellent resistive-switching properties with a high on/off ratio on the order of 105 , outstanding endurance (>4550 cycles), long retention time (>104 s), and high stability, which suggests that HEO is a promising RRAM material.
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Affiliation(s)
- Jing-Yuan Tsai
- Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu, 30010, Taiwan
| | - Jui-Yuan Chen
- Department of Materials Science and Engineering, National United University, Miaoli, 360, Taiwan
| | - Chun-Wei Huang
- Department of Materials Science and Engineering, Feng Chia University, Taichung, 407, Taiwan
| | - Hung-Yang Lo
- Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu, 30010, Taiwan
| | - Wei-En Ke
- Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu, 30010, Taiwan
| | - Ying-Hao Chu
- Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, 300, Taiwan
| | - Wen-Wei Wu
- Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu, 30010, Taiwan
- Center for the Intelligent Semiconductor Nano-system Technology Research, Hsinchu, 30078, Taiwan
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18
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Shen X, Zhou Y, Zhang H, Deringer VL, Mazzarello R, Zhang W. Surface effects on the crystallization kinetics of amorphous antimony. NANOSCALE 2023; 15:15259-15267. [PMID: 37674458 DOI: 10.1039/d3nr03536k] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/08/2023]
Abstract
Elemental antimony (Sb) is regarded as a promising candidate to improve the programming consistency and cycling endurance of phase-change memory and neuro-inspired computing devices. Although bulk amorphous Sb crystallizes spontaneously, the stability of the amorphous form can be greatly increased by reducing the thickness of thin films down to several nanometers, either with or without capping layers. Computational and experimental studies have explained the depressed crystallization kinetics caused by capping and interfacial confinement; however, it is unclear why amorphous Sb thin films remain stable even in the absence of capping layers. In this work, we carry out thorough ab initio molecular dynamics (AIMD) simulations to investigate the effects of free surfaces on the crystallization kinetics of amorphous Sb. We reveal a stark contrast in the crystallization behavior between bulk and surface models at 450 K, which stems from deviations from the bulk structural features in the regions approaching the surfaces. The presence of free surfaces intrinsically tends to create a sub-nanometer region where crystallization is suppressed, which impedes the incubation process and thus constrains the nucleation in two dimensions, stabilizing the amorphous phase in thin-film Sb-based memory devices.
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Affiliation(s)
- Xueyang Shen
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China.
| | - Yuxing Zhou
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China.
- Department of Chemistry, Inorganic Chemistry Laboratory, University of Oxford, Oxford, OX1 3QR, UK
| | - Hanyi Zhang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China.
| | - Volker L Deringer
- Department of Chemistry, Inorganic Chemistry Laboratory, University of Oxford, Oxford, OX1 3QR, UK
| | | | - Wei Zhang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China.
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19
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Wu R, Gu R, Gotoh T, Zhao Z, Sun Y, Jia S, Miao X, Elliott SR, Zhu M, Xu M, Song Z. The role of arsenic in the operation of sulfur-based electrical threshold switches. Nat Commun 2023; 14:6095. [PMID: 37773231 PMCID: PMC10542328 DOI: 10.1038/s41467-023-41643-6] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/13/2023] [Accepted: 09/11/2023] [Indexed: 10/01/2023] Open
Abstract
Arsenic is an essential dopant in conventional silicon-based semiconductors and emerging phase-change memory (PCM), yet the detailed functional mechanism is still lacking in the latter. Here, we fabricate chalcogenide-based ovonic threshold switching (OTS) selectors, which are key units for suppressing sneak currents in 3D PCM arrays, with various As concentrations. We discovered that incorporation of As into GeS brings >100 °C increase in crystallization temperature, remarkably improving the switching repeatability and prolonging the device lifetime. These benefits arise from strengthened As-S bonds and sluggish atomic migration after As incorporation, which reduces the leakage current by more than an order of magnitude and significantly suppresses the operational voltage drift, ultimately enabling a back-end-of-line-compatible OTS selector with >12 MA/cm2 on-current, ~10 ns speed, and a lifetime approaching 1010 cycles after 450 °C annealing. These findings allow the precise performance control of GeSAs-based OTS materials for high-density 3D PCM applications.
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Affiliation(s)
- Renjie Wu
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China
- University of Chinese Academy of Sciences, Beijing, 100029, China
| | - Rongchuan Gu
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430074, China
| | - Tamihiro Gotoh
- Department of Physics, Graduate School of Science and Technology, Gunma University, Maebashi, 3718510, Japan
| | - Zihao Zhao
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China
- University of Chinese Academy of Sciences, Beijing, 100029, China
| | - Yuting Sun
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China
- University of Chinese Academy of Sciences, Beijing, 100029, China
| | - Shujing Jia
- Frontier Institute of Chip and System, Fudan University, Shanghai, 200050, China
| | - Xiangshui Miao
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430074, China
| | - Stephen R Elliott
- Trinity College, University of Cambridge, Cambridge, CB2 1TQ, UK
- Physical and Theoretical Chemistry Laboratory, University of Oxford, Oxford, OX1 3QZ, UK
| | - Min Zhu
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.
| | - Ming Xu
- Wuhan National Laboratory for Optoelectronics, School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430074, China.
| | - Zhitang Song
- National Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.
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20
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Shuang Y, Chen Q, Kim M, Wang Y, Saito Y, Hatayama S, Fons P, Ando D, Kubo M, Sutou Y. NbTe 4 Phase-Change Material: Breaking the Phase-Change Temperature Balance in 2D Van der Waals Transition-Metal Binary Chalcogenide. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2303646. [PMID: 37338024 DOI: 10.1002/adma.202303646] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/19/2023] [Revised: 06/13/2023] [Indexed: 06/21/2023]
Abstract
2D van der Waals (vdW) transition metal di-chalcogenides (TMDs) have garnered significant attention in the nonvolatile memory field for their tunable electrical properties, scalability, and potential for phase engineering. However, their complex switching mechanism and complicated fabrication methods pose challenges for mass production. Sputtering is a promising technique for large-area 2D vdW TMD fabrication, but the high melting point (typically Tm > 1000 °C) of TMDs requires elevated temperatures for good crystallinity. This study focuses on the low-Tm 2D vdW TM tetra-chalcogenides and identifies NbTe4 as a promising candidate with an ultra-low Tm of around 447 °C (onset temperature). As-grown NbTe4 forms an amorphous phase upon deposition that can be crystallized by annealing at temperatures above 272 °C. The simultaneous presence of a low Tm and a high crystallization temperature Tc can resolve important issues facing current phase-change memory compounds, such as high Reset energies and poor thermal stability of the amorphous phase. Therefore, NbTe4 holds great promise as a potential solution to these issues.
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Affiliation(s)
- Yi Shuang
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai, 980-8577, Japan
| | - Qian Chen
- New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba, Aramaki, Aoba-ku, Sendai, 980-8579, Japan
- Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Japan
| | - Mihyeon Kim
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
| | - Yinli Wang
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
| | - Yuta Saito
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, 305-8568, Japan
| | - Shogo Hatayama
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, 305-8568, Japan
| | - Paul Fons
- Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama, Kanagawa, 223-8522, Japan
| | - Daisuke Ando
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
| | - Momoji Kubo
- New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba, Aramaki, Aoba-ku, Sendai, 980-8579, Japan
- Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Japan
| | - Yuji Sutou
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai, 980-8577, Japan
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
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21
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Jiang K, Li S, Chen F, Zhu L, Li W. Microstructure characterization, phase transition, and device application of phase-change memory materials. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 2023; 24:2252725. [PMID: 37745781 PMCID: PMC10512918 DOI: 10.1080/14686996.2023.2252725] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/30/2023] [Accepted: 08/23/2023] [Indexed: 09/26/2023]
Abstract
Phase-change memory (PCM), recently developed as the storage-class memory in a computer system, is a new non-volatile memory technology. In addition, the applications of PCM in a non-von Neumann computing, such as neuromorphic computing and in-memory computing, are being investigated. Although PCM-based devices have been extensively studied, several concerns regarding the electrical, thermal, and structural dynamics of phase-change devices remain. In this article, aiming at PCM devices, a comprehensive review of PCM materials is provided, including the primary PCM device mechanics that underpin read and write operations, physics-based modeling initiatives and experimental characterization of the many features examined in nanoscale PCM devices. Finally, this review will propose a prognosis on a few unsolved challenges and highlight research areas of further investigation.
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Affiliation(s)
- Kai Jiang
- School of Arts and Sciences, Shanghai Dianji University, Shanghai, China
- Department of Physics, East China Normal University, Shanghai, China
| | - Shubing Li
- Department of Physics, East China Normal University, Shanghai, China
| | - Fangfang Chen
- School of Arts and Sciences, Shanghai Dianji University, Shanghai, China
| | - Liping Zhu
- State Key Laboratory of Surface Physics and Institute for Nanoelectronic Devices and Quantum Computing, Department of Physics, Fudan University, Shanghai, China
| | - Wenwu Li
- Department of Physics, East China Normal University, Shanghai, China
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Department of Materials Science, Fudan University, Shanghai, China
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22
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Kim C, Hur N, Yang J, Oh S, Yeo J, Jeong HY, Shong B, Suh J. Atomic Layer Deposition Route to Scalable, Electronic-Grade van der Waals Te Thin Films. ACS NANO 2023; 17:15776-15786. [PMID: 37432767 DOI: 10.1021/acsnano.3c03559] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/13/2023]
Abstract
Scalable production and integration techniques for van der Waals (vdW) layered materials are vital for their implementation in next-generation nanoelectronics. Among available approaches, perhaps the most well-received is atomic layer deposition (ALD) due to its self-limiting layer-by-layer growth mode. However, ALD-grown vdW materials generally require high processing temperatures and/or additional postdeposition annealing steps for crystallization. Also, the collection of ALD-producible vdW materials is rather limited by the lack of a material-specific tailored process design. Here, we report the annealing-free wafer-scale growth of monoelemental vdW tellurium (Te) thin films using a rationally designed ALD process at temperatures as low as 50 °C. They exhibit exceptional homogeneity/crystallinity, precise layer controllability, and 100% step coverage, all of which are enabled by introducing a dual-function co-reactant and adopting a so-called repeating dosing technique. Electronically, vdW-coupled and mixed-dimensional vertical p-n heterojunctions with MoS2 and n-Si, respectively, are demonstrated with well-defined current rectification as well as spatial uniformity. Additionally, we showcase an ALD-Te-based threshold switching selector with fast switching time (∼40 ns), selectivity (∼104), and low Vth (∼1.3 V). This synthetic strategy allows the low-thermal-budget production of vdW semiconducting materials in a scalable fashion, thereby providing a promising approach for monolithic integration into arbitrary 3D device architectures.
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Affiliation(s)
- Changhwan Kim
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
| | - Namwook Hur
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
| | - Jiho Yang
- Department of Chemical Engineering, Hongik University, Seoul 04066, Republic of Korea
| | - Saeyoung Oh
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
| | - Jeongin Yeo
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
| | - Hu Young Jeong
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
| | - Bonggeun Shong
- Department of Chemical Engineering, Hongik University, Seoul 04066, Republic of Korea
| | - Joonki Suh
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
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23
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Lin S, Lin T, Wang W, Liu C, Ding Y. High Performance GaN-Based Ultraviolet Photodetector via Te/Metal Electrodes. MATERIALS (BASEL, SWITZERLAND) 2023; 16:4569. [PMID: 37444883 DOI: 10.3390/ma16134569] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/17/2023] [Revised: 06/01/2023] [Accepted: 06/01/2023] [Indexed: 07/15/2023]
Abstract
Photodetectors (PDs) based on two-dimensional (2D) materials have promising applications in modern electronics and optoelectronics. However, due to the intralayer recombination of the photogenerated carriers and the inevitable surface trapping stages of the constituent layers, the PDs based on 2D materials usually suffer from low responsivity and poor response speed. In this work, a distinguished GaN-based photodetector is constructed on a sapphire substrate with Te/metal electrodes. Due to the metal-like properties of tellurium, the band bending at the interface between Te and GaN generates an inherent electric field, which greatly reduces the carrier transport barrier and promotes the photoresponse of GaN. This Te-enhanced GaN-based PD show a promising responsivity of 4951 mA/W, detectivity of 1.79 × 1014 Jones, and an external quantum efficiency of 169%. In addition, owing to the collection efficiency of carriers by this Te-GaN interface, the response time is greatly decreased compared with pure GaN PDs. This high performance can be attributed to the fact that Te reduces the contact resistance of the metal electrode Au/Ti to GaN, forming an ohmic-like contact and promoting the photoresponse of GaN. This work greatly extends the application potential of GaN in the field of high-performance photodetectors and puts forward a new way of developing high performance photodetectors.
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Affiliation(s)
- Sheng Lin
- School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China
| | - Tingjun Lin
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China
| | - Wenliang Wang
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou 510640, China
| | - Chao Liu
- State Key Laboratory of Crystal Materials, School of Microelectronics, Institute of Novel Semiconductors, Shandong Technology Center of Nanodevices and Integration, Shandong University, Jinan 250100, China
| | - Yao Ding
- School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China
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24
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Zhou X, Zhao L, Yan C, Zhen W, Lin Y, Li L, Du G, Lu L, Zhang ST, Lu Z, Li D. Thermally stable threshold selector based on CuAg alloy for energy-efficient memory and neuromorphic computing applications. Nat Commun 2023; 14:3285. [PMID: 37280223 DOI: 10.1038/s41467-023-39033-z] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/31/2022] [Accepted: 05/25/2023] [Indexed: 06/08/2023] Open
Abstract
As a promising candidate for high-density data storage and neuromorphic computing, cross-point memory arrays provide a platform to overcome the von Neumann bottleneck and accelerate neural network computation. In order to suppress the sneak-path current problem that limits their scalability and read accuracy, a two-terminal selector can be integrated at each cross-point to form the one-selector-one-memristor (1S1R) stack. In this work, we demonstrate a CuAg alloy-based, thermally stable and electroforming-free selector device with tunable threshold voltage and over 7 orders of magnitude ON/OFF ratio. A vertically stacked 64 × 64 1S1R cross-point array is further implemented by integrating the selector with SiO2-based memristors. The 1S1R devices exhibit extremely low leakage currents and proper switching characteristics, which are suitable for both storage class memory and synaptic weight storage. Finally, a selector-based leaky integrate-and-fire neuron is designed and experimentally implemented, which expands the application prospect of CuAg alloy selectors from synapses to neurons.
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Affiliation(s)
- Xi Zhou
- The Interdisciplinary Research Center, Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China
- College of Information Science and Electronic Engineering, Zhejiang University, 38 Zheda Road, 310007, Hangzhou, China
- School of Microelectronics, University of Chinese Academy of Sciences, 19 Yuquan Road, 100049, Beijing, China
| | - Liang Zhao
- College of Information Science and Electronic Engineering, Zhejiang University, 38 Zheda Road, 310007, Hangzhou, China.
- Hefei Reliance Memory Ltd., Bldg. F4-11F, Innovation Industrial Park Phase II, 230088, Hefei, China.
| | - Chu Yan
- College of Information Science and Electronic Engineering, Zhejiang University, 38 Zheda Road, 310007, Hangzhou, China
| | - Weili Zhen
- High Magnetic Field Laboratory, Chinese Academy of Sciences, 230031, Hefei, China
| | - Yinyue Lin
- The Interdisciplinary Research Center, Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China
- School of Microelectronics, University of Chinese Academy of Sciences, 19 Yuquan Road, 100049, Beijing, China
| | - Le Li
- The Interdisciplinary Research Center, Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China
- School of Microelectronics, University of Chinese Academy of Sciences, 19 Yuquan Road, 100049, Beijing, China
| | - Guanlin Du
- The Interdisciplinary Research Center, Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China
- School of Microelectronics, University of Chinese Academy of Sciences, 19 Yuquan Road, 100049, Beijing, China
| | - Linfeng Lu
- The Interdisciplinary Research Center, Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China
- School of Microelectronics, University of Chinese Academy of Sciences, 19 Yuquan Road, 100049, Beijing, China
| | - Shan-Ting Zhang
- The Interdisciplinary Research Center, Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China
- School of Microelectronics, University of Chinese Academy of Sciences, 19 Yuquan Road, 100049, Beijing, China
- Zhangjiang Laboratory, 100 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China
| | - Zhichao Lu
- Hefei Reliance Memory Ltd., Bldg. F4-11F, Innovation Industrial Park Phase II, 230088, Hefei, China
| | - Dongdong Li
- The Interdisciplinary Research Center, Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China.
- School of Microelectronics, University of Chinese Academy of Sciences, 19 Yuquan Road, 100049, Beijing, China.
- Zhangjiang Laboratory, 100 Haike Road, Zhangjiang Hi-Tech Park, 201210, Pudong, Shanghai, China.
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25
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Torun G, Kishi T, Pugliese D, Milanese D, Bellouard Y. Formation Mechanism of Elemental Te Produced in Tellurite Glass Systems by Femtosecond Laser Irradiation. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2210446. [PMID: 36749876 DOI: 10.1002/adma.202210446] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/10/2022] [Revised: 12/23/2022] [Indexed: 05/19/2023]
Abstract
The formation of elemental trigonal tellurium (t-Te) on tellurite glass surfaces exposed to femtosecond laser pulses is discussed. Specifically, the underlying elemental crystallization phenomenon is investigated by altering laser parameters in common tellurite glass compositions under various ambient conditions. Elemental crystallization of t-Te by a single femtosecond laser pulse is unveiled by high-resolution imaging and analysis. The thermal diffusion model reveals the absence of lattice melting upon a single laser pulse, highlighting the complexity of the phase transformation. The typical cross-section displays three different crystal configurations over its depth, in which the overall thickness increases with each subsequent pulse. The effect of various controlled atmospheres shows the suppressing nature of the elemental crystallization, whereas the substrate temperature shows no significant impact on the nucleation of t-Te nanocrystals. This research gives new insight into the elemental crystallization of glass upon femtosecond laser irradiation and shows the potential to fabricate functional transparent electronic micro/nanodevices.
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Affiliation(s)
- Gözden Torun
- Galatea Laboratory, STI/IEM, Ecole Polytechnique Fédérale de Lausanne (EPFL), 2002, Neuchâtel, Switzerland
| | - Tetsuo Kishi
- Department of Materials Science and Engineering, Tokyo Institute of Technology, Tokyo, 152-8552, Japan
| | - Diego Pugliese
- Department of Electronics and Telecommunications, Polytechnic University of Turin, 10129, Turin, Italy
- Department of Applied Science and Technology and INSTM RU, Polytechnic University of Turin, 10129, Turin, Italy
| | - Daniel Milanese
- Department of Engineering and Architecture and INSTM RU, University of Parma, 43124, Parma, Italy
| | - Yves Bellouard
- Galatea Laboratory, STI/IEM, Ecole Polytechnique Fédérale de Lausanne (EPFL), 2002, Neuchâtel, Switzerland
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26
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Jiang J, Cheng R, Feng W, Yin L, Wen Y, Wang Y, Cai Y, Liu Y, Wang H, Zhai B, Liu C, He J, Wang Z. Van der Waals Epitaxy Growth of 2D Single-Element Room-Temperature Ferromagnet. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2211701. [PMID: 36807945 DOI: 10.1002/adma.202211701] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/14/2022] [Indexed: 05/12/2023]
Abstract
2D single-element materials, which are pure and intrinsically homogeneous on the nanometer scale, can cut the time-consuming material-optimization process and circumvent the impure phase, bringing about opportunities to explore new physics and applications. Herein, for the first time, the synthesis of ultrathin cobalt single-crystalline nanosheets with a sub-millimeter scale via van der Waals epitaxy is demonstrated. The thickness can be as low as ≈6 nm. Theoretical calculations reveal their intrinsic ferromagnetic nature and epitaxial mechanism: that is, the synergistic effect between van der Waals interactions and surface energy minimization dominates the growth process. Cobalt nanosheets exhibit ultrahigh blocking temperatures above 710 K and in-plane magnetic anisotropy. Electrical transport measurements further reveal that cobalt nanosheets have significant magnetoresistance (MR) effect, and can realize a unique coexistence of positive MR and negative MR under different magnetic field configurations, which can be attributed to the competition and cooperation effect among ferromagnetic interaction, orbital scattering, and electronic correlation. These results provide a valuable case for synthesizing 2D elementary metal crystals with pure phase and room-temperature ferromagnetism and pave the way for investigating new physics and related applications in spintronics.
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Affiliation(s)
- Jian Jiang
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Ruiqing Cheng
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
| | - Wenyong Feng
- The State Key Lab of Optoelectronic Materials & Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, P. R. China
| | - Lei Yin
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Yao Wen
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Yanrong Wang
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
| | - Yuchen Cai
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
| | - Yong Liu
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Hao Wang
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Baoxing Zhai
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Chuansheng Liu
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Jun He
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, And School of Physical and Technology, Wuhan University, Wuhan, 430072, P. R. China
- Wuhan Institute of Quantum Technology, Wuhan, 430206, P. R. China
| | - Zhenxing Wang
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
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27
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Zha J, Shi S, Chaturvedi A, Huang H, Yang P, Yao Y, Li S, Xia Y, Zhang Z, Wang W, Wang H, Wang S, Yuan Z, Yang Z, He Q, Tai H, Teo EHT, Yu H, Ho JC, Wang Z, Zhang H, Tan C. Electronic/Optoelectronic Memory Device Enabled by Tellurium-based 2D van der Waals Heterostructure for in-Sensor Reservoir Computing at the Optical Communication Band. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2211598. [PMID: 36857506 DOI: 10.1002/adma.202211598] [Citation(s) in RCA: 23] [Impact Index Per Article: 23.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/12/2022] [Revised: 02/16/2023] [Indexed: 05/19/2023]
Abstract
Although 2D materials are widely explored for data storage and neuromorphic computing, the construction of 2D material-based memory devices with optoelectronic responsivity in the short-wave infrared (SWIR) region for in-sensor reservoir computing (RC) at the optical communication band still remains a big challenge. In this work, an electronic/optoelectronic memory device enabled by tellurium-based 2D van der Waals (vdW) heterostructure is reported, where the ferroelectric CuInP2 S6 and tellurium channel endow this device with both the long-term potentiation/depression by voltage pulses and short-term potentiation by 1550 nm laser pulses (a typical wavelength in the conventional fiber optical communication band). Leveraging the rich dynamics, a fully memristive in-sensor RC system that can simultaneously sense, decode, and learn messages transmitted by optical fibers is demonstrated. The reported 2D vdW heterostructure-based memory featuring both the long-term and short-term memory behaviors using electrical and optical pulses in SWIR region has not only complemented the wide spectrum of applications of 2D materials family in electronics/optoelectronics but also paves the way for future smart signal processing systems at the edge.
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Affiliation(s)
- Jiajia Zha
- Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Shuhui Shi
- Department of Electrical and Electronic Engineering, University of Hong Kong, Hong Kong, 999077, P. R. China
- School of Microelectronics, Southern University of Science and Technology, Shenzhen, Guangdong, 518055, P. R. China
| | - Apoorva Chaturvedi
- School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Ave, Singapore, 639798, Singapore
| | - Haoxin Huang
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Peng Yang
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Yao Yao
- Department of Chemistry, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Siyuan Li
- Department of Chemistry, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Yunpeng Xia
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Zhuomin Zhang
- Department of Mechanical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Wei Wang
- Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Huide Wang
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Shaocong Wang
- Department of Electrical and Electronic Engineering, University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Zhen Yuan
- State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu, 610054, P. R. China
| | - Zhengbao Yang
- Department of Mechanical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
- Department of Mechanical and Aerospace Engineering, Hong Kong University of Science and Technology, Hong Kong, 999077, P. R. China
| | - Qiyuan He
- Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Huiling Tai
- State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu, 610054, P. R. China
| | - Edwin Hang Tong Teo
- School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Ave, Singapore, 639798, Singapore
- School of Electrical and Electronics Engineering, Nanyang Technological University, Singapore, 639798, Singapore
| | - Hongyu Yu
- School of Microelectronics, Southern University of Science and Technology, Shenzhen, Guangdong, 518055, P. R. China
| | - Johnny C Ho
- Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Zhongrui Wang
- Department of Electrical and Electronic Engineering, University of Hong Kong, Hong Kong, 999077, P. R. China
| | - Hua Zhang
- Department of Chemistry, City University of Hong Kong, Hong Kong, 999077, P. R. China
- Hong Kong Branch of National Precious Metals Material Engineering Research Center (NPMM), City University of Hong Kong, Hong Kong, P. R. China
- Shenzhen Research Institute, City University of Hong Kong, Shenzhen, 518057, P. R. China
| | - Chaoliang Tan
- Department of Electrical Engineering, City University of Hong Kong, Hong Kong, 999077, P. R. China
- Department of Chemistry, City University of Hong Kong, Hong Kong, 999077, P. R. China
- Shenzhen Research Institute, City University of Hong Kong, Shenzhen, 518057, P. R. China
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28
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Zhang SJ, Chen L, Li SS, Zhang Y, Yan JM, Tang F, Fang Y, Fei LF, Zhao W, Karel J, Chai Y, Zheng RK. Coexistence of logarithmic and SdH quantum oscillations in ferromagnetic Cr-doped tellurium single crystals. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2023; 35:245701. [PMID: 36940480 DOI: 10.1088/1361-648x/acc5ca] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/19/2022] [Accepted: 03/20/2023] [Indexed: 06/18/2023]
Abstract
We report the synthesis of transition-metal-doped ferromagnetic elemental single-crystal semiconductors with quantum oscillations using the physical vapor transport method. The 7.7 atom% Cr-doped Te crystals (Cr:Te) show ferromagnetism, butterfly-like negative magnetoresistance in the low temperature (<3.8 K) and low field (<0.15 T) region, and high Hall mobility, e.g. 1320 cm2V-1s-1at 30 K and 350 cm2V-1s-1at 300 K, implying that Cr:Te crystals are ferromagnetic elemental semiconductors. WhenB// [001] // I, the maximum negative MR is ∼-27% atT= 20 K andB= 8 T. In the low temperature semiconducting region, Cr:Te crystals show strong discrete scale invariance dominated logarithmic quantum oscillations when the direction of the magnetic fieldBis parallel to the [100] crystallographic direction (B// [100]) and show Landau quantization dominated Shubnikov-de Haas oscillations forB// [210] direction, which suggests the broken rotation symmetry of the Fermi pockets in the Cr:Te crystals. The findings of coexistence of multiple quantum oscillations and ferromagnetism in such an elemental quantum material may inspire more study of narrow bandgap semiconductors with ferromagnetism and quantum phenomena.
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Affiliation(s)
- Shu-Juan Zhang
- School of Materials and Mechanic & Electrical Engineering, Jiangxi Science and Technology Normal University, Nanchang 330038, People's Republic of China
| | - Lei Chen
- School of Physics and Materials Science, Guangzhou University, Guangzhou 510006, People's Republic of China
| | - Shuang-Shuang Li
- School of Materials Science and Engineering and Jiangxi Engineering Laboratory for Advanced Functional Thin Films, Nanchang University, Nanchang 330031, People's Republic of China
| | - Ying Zhang
- School of Materials Science and Engineering and Jiangxi Engineering Laboratory for Advanced Functional Thin Films, Nanchang University, Nanchang 330031, People's Republic of China
| | - Jian-Min Yan
- Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong 999077, People's Republic of China
| | - Fang Tang
- Jiangsu Laboratory of Advanced Functional Materials, Department of Physics, Changshu Institute of Technology, Changshu 215500, People's Republic of China
| | - Yong Fang
- Jiangsu Laboratory of Advanced Functional Materials, Department of Physics, Changshu Institute of Technology, Changshu 215500, People's Republic of China
| | - Lin-Feng Fei
- School of Materials Science and Engineering and Jiangxi Engineering Laboratory for Advanced Functional Thin Films, Nanchang University, Nanchang 330031, People's Republic of China
| | - Weiyao Zhao
- Department of Materials Science & Engineering, & ARC Centre of Excellence in Future Low-Energy Electronics Technologies, Monash University, Clayton, VIC 3800, Australia
| | - Julie Karel
- Department of Materials Science & Engineering, & ARC Centre of Excellence in Future Low-Energy Electronics Technologies, Monash University, Clayton, VIC 3800, Australia
| | - Yang Chai
- Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong 999077, People's Republic of China
| | - Ren-Kui Zheng
- School of Physics and Materials Science, Guangzhou University, Guangzhou 510006, People's Republic of China
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Wu R, Sun Y, Zhang S, Zhao Z, Song Z. Great Potential of Si-Te Ovonic Threshold Selector in Electrical Performance and Scalability. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:1114. [PMID: 36986008 PMCID: PMC10054576 DOI: 10.3390/nano13061114] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/02/2023] [Revised: 03/16/2023] [Accepted: 03/17/2023] [Indexed: 06/18/2023]
Abstract
The selector is an indispensable section of the phase change memory (PCM) chip, where it not only suppresses the crosstalk, but also provides high on-current to melt the incorporated phase change material. In fact, the ovonic threshold switching (OTS) selector is utilized in 3D stacking PCM chips by virtue of its high scalability and driving capability. In this paper, the influence of Si concentration on the electrical properties of Si-Te OTS materials is studied; the threshold voltage and leakage current remain basically unchanged with the decrease in electrode diameter. Meanwhile, the on-current density (Jon) increases significantly as the device is scaling down, and 25 MA/cm2 on-current density is achieved in the 60-nm SiTe device. In addition, we also determine the state of the Si-Te OTS layer and preliminarily obtain the approximate band structure, from which we infer that the conduction mechanism conforms to the Poole-Frenkel (PF) model.
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Affiliation(s)
- Renjie Wu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- University of Chinese Academy of Sciences, Beijing 100029, China
| | - Yuting Sun
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- University of Chinese Academy of Sciences, Beijing 100029, China
| | - Shuhao Zhang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- University of Chinese Academy of Sciences, Beijing 100029, China
| | - Zihao Zhao
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- University of Chinese Academy of Sciences, Beijing 100029, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
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30
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Shen J, Song W, Ren K, Song Z, Zhou P, Zhu M. Toward the Speed Limit of Phase-Change Memory. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2208065. [PMID: 36719053 DOI: 10.1002/adma.202208065] [Citation(s) in RCA: 5] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/02/2022] [Revised: 01/16/2023] [Indexed: 06/18/2023]
Abstract
Phase-change memory (PCM) is one of the most promising candidates for next-generation data-storage technology, the programming speed of which has enhanced within a timescale from milliseconds to sub-nanosecond (≈500 ps) through decades of effort. As the potential applications of PCM strongly depend on the switching speed, namely, the time required for the recrystallization of amorphous chalcogenide media, the finding of the ultimate crystallization speed is of great importance both theoretically and practically. In this work, through systematic analysis of discovered phase-change materials and ab initio molecular dynamics simulations, elemental Sb-based PCM is predicted to have a superfast crystallization speed. Indeed, such cells experimentally present extremely fast crystallization speeds within 360 ps. Remarkably, the recrystallization process is further sped up as the device shrinks, and a record-fast crystallization speed of only 242 ps is achieved in 60 nm-size devices. These findings open opportunities for dynamic random-access memory (DRAM)-like and even cache-like PCM using appropriate storage materials.
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Affiliation(s)
- Jiabin Shen
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
- State Key Laboratory of ASIC and System Department of Microelectronics, Fudan University, Shanghai, 200433, P. R. China
| | - Wenxiong Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
| | - Kun Ren
- College of Micro-Nano Electronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou, 310027, P. R. China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
| | - Peng Zhou
- State Key Laboratory of ASIC and System Department of Microelectronics, Fudan University, Shanghai, 200433, P. R. China
| | - Min Zhu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, P. R. China
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31
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Zhu H, Lu Y, Cai L. High-Performance On-Chip Racetrack Resonator Based on GSST-Slot for In-Memory Computing. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13050837. [PMID: 36903715 PMCID: PMC10005299 DOI: 10.3390/nano13050837] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/07/2023] [Revised: 02/11/2023] [Accepted: 02/17/2023] [Indexed: 06/01/2023]
Abstract
The data shuttling between computing and memory dominates the power consumption and time delay in electronic computing systems due to the bottleneck of the von Neumann architecture. To increase computational efficiency and reduce power consumption, photonic in-memory computing architecture based on phase change material (PCM) is attracting increasing attention. However, the extinction ratio and insertion loss of the PCM-based photonic computing unit are imperative to be improved before its application in a large-scale optical computing network. Here, we propose a 1 × 2 racetrack resonator based on Ge2Sb2Se4Te1 (GSST)-slot for in-memory computing. It demonstrates high extinction ratios of 30.22 dB and 29.64 dB at the through port and drop port, respectively. The insertion loss is as low as around 0.16 dB at the drop port in the amorphous state and about 0.93 dB at the through port in the crystalline state. A high extinction ratio means a wider range of transmittance variation, resulting in more multilevel levels. During the transition between crystalline and amorphous states, the tuning range of the resonant wavelength is as high as 7.13 nm, which plays an important role in the realization of reconfigurable photonic integrated circuits. The proposed phase-change cell demonstrates scalar multiplication operations with high accuracy and energy efficiency due to a higher extinction ratio and lower insertion loss compared with other traditional optical computing devices. The recognition accuracy on the MNIST dataset is as high as 94.6% in the photonic neuromorphic network. The computational energy efficiency can reach 28 TOPS/W, and the computational density of 600 TOPS/mm2. The superior performance is ascribed to the enhanced interaction between light and matter by filling the slot with GSST. Such a device enables an effective approach to power-efficient in-memory computing.
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32
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Yu Y, Joshi P, Bridges D, Fieser D, Hu A. Femtosecond Laser-Induced Nano-Joining of Volatile Tellurium Nanotube Memristor. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:789. [PMID: 36903667 PMCID: PMC10005240 DOI: 10.3390/nano13050789] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/17/2023] [Revised: 02/17/2023] [Accepted: 02/20/2023] [Indexed: 06/18/2023]
Abstract
Nanowire/nanotube memristor devices provide great potential for random-access high-density resistance storage. However, fabricating high-quality and stable memristors is still challenging. This paper reports multileveled resistance states of tellurium (Te) nanotube based on the clean-room free femtosecond laser nano-joining method. The temperature for the entire fabrication process was maintained below 190 °C. A femtosecond laser joining technique was used to form nanowire memristor units with enhanced properties. Femtosecond (fs) laser-irradiated silver-tellurium nanotube-silver structures resulted in plasmonic-enhanced optical joining with minimal local thermal effects. This produced a junction between the Te nanotube and the silver film substrate with enhanced electrical contacts. Noticeable changes in memristor behavior were observed after fs laser irradiation. Capacitor-coupled multilevel memristor behavior was observed. Compared to previous metal oxide nanowire-based memristors, the reported Te nanotube memristor system displayed a nearly two-order stronger current response. The research displays that the multileveled resistance state is rewritable with a negative bias.
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Affiliation(s)
- Yongchao Yu
- Department of Mechanical, Aerospace and Biomedical Engineering, University of Tennessee Knoxville, 1512 Middle Drive, Knoxville, TN 37996, USA
- School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Ave., Singapore 639798, Singapore
| | - Pooran Joshi
- Oak Ridge National Lab, 1 Bethel Valley Rd., Oak Ridge, TN 37831, USA
| | - Denzel Bridges
- Department of Mechanical, Aerospace and Biomedical Engineering, University of Tennessee Knoxville, 1512 Middle Drive, Knoxville, TN 37996, USA
| | - David Fieser
- Department of Mechanical, Aerospace and Biomedical Engineering, University of Tennessee Knoxville, 1512 Middle Drive, Knoxville, TN 37996, USA
| | - Anming Hu
- Department of Mechanical, Aerospace and Biomedical Engineering, University of Tennessee Knoxville, 1512 Middle Drive, Knoxville, TN 37996, USA
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33
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Effect of additives and optimized Cyclic voltammetry parameters on the morphology of electrodeposited Tellurium thin film. J Electroanal Chem (Lausanne) 2022. [DOI: 10.1016/j.jelechem.2022.116872] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022]
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34
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Li S, Li M, Chen L, Xu X, Cui A, Zhou X, Jiang K, Shang L, Li Y, Zhang J, Zhu L, Hu Z, Chu J. Ultra-Stable, Endurable, and Flexible Sb 2Te xSe 3-x Phase Change Devices for Memory Application and Wearable Electronics. ACS APPLIED MATERIALS & INTERFACES 2022; 14:45600-45610. [PMID: 36178431 DOI: 10.1021/acsami.2c13792] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Flexible memory and wearable electronics represent an emerging technology, thanks to their reliability, compatibility, and superior performance. Here, an Sb2TexSe3-x (STSe) phase change material was grown on flexible mica, which not only exhibited superior nature in thermal stability for phase change memory application but also revealed novel function performance in wearable electronics, thanks to its excellent mechanical reliability and endurance. The thermal stability of Sb2Te3 was improved obviously with the crystallization temperature elevated 60 K after Se doping, for the enhanced charge localization and stronger bonding energy, which was validated by the Vienna ab initio simulation package calculations. Based on the ultra-stability of STSe, the STSe-based phase change memory shows 65 000 reversible phase change ability. Moreover, the assembled flexible device can show real-time monitoring and recoverability response in sensing human activities in different parts of the body, which proves its effective reusability and potential as wearable electronics. Most importantly, the STSe device presents remarkable working reliability, reflected by excellent endurance over 100 s and long retention over 100 h. These results paved a novel way to utilize STSe phase change materials for flexible memory and wearable electronics with extreme thermal and mechanical stability and brilliant performance.
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Affiliation(s)
- Shubing Li
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Ming Li
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Li Chen
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Xionghu Xu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Anyang Cui
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Xin Zhou
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Kai Jiang
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Liyan Shang
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Yawei Li
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Jinzhong Zhang
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Liangqing Zhu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Zhigao Hu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan 030006, Shanxi, China
- Shanghai Institute of Intelligent Electronics & Systems, Fudan University, Shanghai 200433, China
| | - Junhao Chu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan 030006, Shanxi, China
- Shanghai Institute of Intelligent Electronics & Systems, Fudan University, Shanghai 200433, China
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35
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Yuan HL, Wang K, Hu H, Yang L, Chen J, Zheng K. Atomic-Scale Observation of Grain Boundary Dominated Unsynchronized Phase Transition in Polycrystalline Cu 2 Se. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2205715. [PMID: 35981531 DOI: 10.1002/adma.202205715] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/23/2022] [Revised: 08/09/2022] [Indexed: 06/15/2023]
Abstract
Phase transition is a physical phenomenon that attracts great interest of researchers. Although the theory of second-order phase transitions is well-established, their atomic-scale dynamics in polycrystalline materials remains elusive. In this work, second-order phase transitions in polycrystalline Cu2 Se at the transition temperature are directly observed by in situ aberration-corrected transmission electron microscopy. Phase transitions in microcrystalline Cu2 Se start at the grain boundaries and extend inside the grains. This phenomenon is more pronounced in nanosized grains. Analysis of phase transitions in nanocrystalline Cu2 Se with different grain boundaries demonstrates that grain boundary energy dominates unsynchronized phase transition behavior. This suggests that the energy of grain boundaries is the key factor influencing the energetic barrier for initiation of phase transition. The findings advance atomic-scale understanding of second-order phase transitions, which is crucial for the control of this process in polycrystalline materials.
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Affiliation(s)
- Hua-Lei Yuan
- Beijing Key Laboratory of Microstructure and Property of Solids, Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
| | - Kaiwen Wang
- Beijing Key Laboratory of Microstructure and Property of Solids, Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
| | - Hanwen Hu
- Beijing Key Laboratory of Microstructure and Property of Solids, Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
| | - Lei Yang
- School of Materials Science and Engineering, Sichuan University, Chengdu, 610064, China
| | - Jie Chen
- Institute of Chemical Materials, China Academy of Engineering Physics, Mianyang, 621999, China
| | - Kun Zheng
- Beijing Key Laboratory of Microstructure and Property of Solids, Faculty of Materials and Manufacturing, Beijing University of Technology, Beijing, 100124, China
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36
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Meng Y, Wang W, Ho JC. One-Dimensional Atomic Chains for Ultimate-Scaled Electronics. ACS NANO 2022; 16:13314-13322. [PMID: 35997488 DOI: 10.1021/acsnano.2c06359] [Citation(s) in RCA: 8] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/13/2023]
Abstract
The continuous downscaling of semiconducting channels in transistors has driven the development of modern electronics. However, with the component transistors becoming smaller and denser on a single chip, the continued downscaling progress has touched the physical limits. In this Perspective, we suggest that the emerging one-dimensional (1D) material system involving inorganic atomic chains (ACs) that are packed by van der Waals (vdW) interactions may tackle this issue. Stemming from their 1D crystal structures and naturally terminated surfaces, 1D ACs could potentially shrink transistors to atomic-scale diameters. Also, we argue that 1D ACs with few-atom widths allow us to revisit 1D materials and uncover physical properties distinct from conventional materials. These ultrathin 1D AC materials demand substantive attention. They may bring opportunities to develop ultimate-scaled AC-based electronic, optoelectronic, thermoelectric, spintronic, memory devices, etc.
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Affiliation(s)
| | | | - Johnny C Ho
- Institute for Materials Chemistry and Engineering, Kyushu University, Fukuoka 816-8580, Japan
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37
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Rao G, Fang H, Zhou T, Zhao C, Shang N, Huang J, Liu Y, Du X, Li P, Jian X, Ma L, Wang J, Liu K, Wu J, Wang X, Xiong J. Robust Piezoelectricity with Spontaneous Polarization in Monolayer Tellurene and Multilayer Tellurium Film at Room Temperature for Reliable Memory. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2204697. [PMID: 35793515 DOI: 10.1002/adma.202204697] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/24/2022] [Revised: 06/22/2022] [Indexed: 06/15/2023]
Abstract
Robust neuromorphic computing in the Big Data era calls for long-term stable crossbar-array memory cells; however, the elemental segregation in the switch unit and memory unit that inevitably occurs upon cycling breaks the compositional and structural stability, making the whole memory cell a failure. Searching for a novel material without segregation that can be used for both switch and memory units is the major concern to fabricate robust and reliable nonvolatile cross-array memory cells. Tellurium (Te) is found recently to be the only peculiar material without segregation for switching, but the memory function has not been demonstrated yet. Herein, apparent piezoelectricity is experimentally confirmed with spontaneous polarization behaviors in elementary 2D Te, even in monolayer tellurene (0.4 nm), due to the highly oriented polarization of the molecular structure and the non-centrosymmetric lattice structure. A large memory window of 7000, a low working voltage of 2 V, and high on switching current up to 36.6 µA µm-1 are achieved in the as-fabricated Te-based memory device, revealing the great promise of Te for both switching and memory units in one cell without segregation. The piezoelectric Te with spontaneous polarization provides a platform to build robust, reliable, and high-density logic-in-memory chips in neuromorphic computing.
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Affiliation(s)
- Gaofeng Rao
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Hui Fang
- School of Physics, Southeast University, Nanjing, 211189, China
| | - Ting Zhou
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Chunlin Zhao
- Department of Materials Science, Sichuan University, Chengdu, 6110064, China
- College of Materials Science and Engineering, Fuzhou University, Fuzhou, 350108, China
| | - Nianze Shang
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, China
| | - Jianwen Huang
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Yuqing Liu
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Xinchuan Du
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Peng Li
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Xian Jian
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Liang Ma
- School of Physics, Southeast University, Nanjing, 211189, China
| | - Jinlan Wang
- School of Physics, Southeast University, Nanjing, 211189, China
| | - Kaihui Liu
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, China
| | - Jiagang Wu
- Department of Materials Science, Sichuan University, Chengdu, 6110064, China
| | - Xianfu Wang
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Jie Xiong
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
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38
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Lin S, Chen S, Ju Y, Xiang F, Wei W, Wang X, Xiang S, Zhang Z. Electrical bistability based on metal-organic frameworks. Chem Commun (Camb) 2022; 58:9971-9978. [PMID: 35984650 DOI: 10.1039/d2cc03097g] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Electrical bistability existing in biochemical networks is critical for the proper functionalization of living systems. The development of artificial materials with electrical bistability begun to attract much interest due to their broad application prospects, especially in the field of memristors. Metal-organic frameworks (MOFs) have advantages in regular pores, crystallinity, structural designability and easy functionalization, which can promote the construction of novel MOF-based memristors and facilitate a better understanding of switching mechanisms. Here, we highlight recent advances in electrically bistable MOFs as memristors, and discuss their switching mechanisms, including interfacial reaction, proton-transfer mechanism, metal ion migration, charge trapping/detrapping and other mechanisms. Challenges and future perspectives are also presented.
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Affiliation(s)
- Si Lin
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
| | - Shimin Chen
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
| | - Yan Ju
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
| | - Fahui Xiang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
| | - Wuji Wei
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
| | - Xue Wang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
| | - Shengchang Xiang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
| | - Zhangjing Zhang
- Fujian Provincial Key Laboratory of Polymer Materials, College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, China.
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39
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Shen J, Cheng Z, Zhou P. Optical and optoelectronic neuromorphic devices based on emerging memory technologies. NANOTECHNOLOGY 2022; 33:372001. [PMID: 35605580 DOI: 10.1088/1361-6528/ac723f] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/18/2022] [Accepted: 05/23/2022] [Indexed: 06/15/2023]
Abstract
As artificial intelligence continues its rapid development, inevitable challenges arise for the mainstream computing hardware to process voluminous data (Big data). The conventional computer system based on von Neumann architecture with separated processor unit and memory is approaching the limit of computational speed and energy efficiency. Thus, novel computing architectures such as in-memory computing and neuromorphic computing based on emerging memory technologies have been proposed. In recent years, light is incorporated into computational devices, beyond the data transmission in traditional optical communications, due to its innate superiority in speed, bandwidth, energy efficiency, etc. Thereinto, photo-assisted and photoelectrical synapses are developed for neuromorphic computing. Additionally, both the storage and readout processes can be implemented in optical domain in some emerging photonic devices to leverage unique properties of photonics. In this review, we introduce typical photonic neuromorphic devices rooted from emerging memory technologies together with corresponding operational mechanisms. In the end, the advantages and limitations of these devices originated from different modulation means are listed and discussed.
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Affiliation(s)
- Jiabin Shen
- State Key Laboratory of ASIC and Systems, School of Microelectronics, Fudan University, Shanghai 200433, People's Republic of China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, People's Republic of China
| | - Zengguang Cheng
- State Key Laboratory of ASIC and Systems, School of Microelectronics, Fudan University, Shanghai 200433, People's Republic of China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, People's Republic of China
| | - Peng Zhou
- State Key Laboratory of ASIC and Systems, School of Microelectronics, Fudan University, Shanghai 200433, People's Republic of China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, People's Republic of China
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40
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Affiliation(s)
- Xu-Dong Wang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
| | - Wei Zhang
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China.
| | - En Ma
- Center for Alloy Innovation and Design (CAID), State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China.
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Lu J, Zhang L, Ma C, Huang W, Ye Q, Yi H, Zheng Z, Yang G, Liu C, Yao J. In situ integration of Te/Si 2D/3D heterojunction photodetectors toward UV-vis-IR ultra-broadband photoelectric technologies. NANOSCALE 2022; 14:6228-6238. [PMID: 35403635 DOI: 10.1039/d1nr08134a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Over the past decade, 2D elemental semiconductors have emerged as an ever-increasingly important group in the 2D material family due to their simple crystal structures and compositions, and versatile physical properties. Taking advantage of the relatively small bandgap, outstanding carrier mobility, high air-stability and strong interactions with light, 2D tellurium (Te) has emerged as a compelling candidate for use in ultra-broadband photoelectric technologies. In this study, high-quality centimeter-scale Te nanofilms have been successfully produced by exploiting pulsed-laser deposition (PLD). By performing deposition on pre-patterned SiO2/Si substrates, a Te/Si 2D/3D heterojunction array is formed in situ. To our delight, taking advantage of the relatively small bandgap of Te, the Te/Si photodetectors demonstrate an ultra-broadband photoresponse from ultraviolet to near-infrared (370.6 nm to 2240 nm), enabling them to serve as important alternatives to conventional 2D materials such as MoS2. In addition, an outstanding on/off ratio of ∼108 and a fast response rate (a response/recovery time of 3.7 ms/4.4 ms) are achieved, which is associated with the large band offset and strong interfacial built-in electric field that contribute to suppressing the dark current and separating photocarriers. Beyond these, a 35 × 35 matrix array has been successfully constructed, where the devices exhibit comparable properties, with a production yield of 100% for 100 randomly tested devices. The average responsivity, external quantum efficiency and detectivity reach 249 A W-1, 76 350% and 1.15 × 1011 Jones, respectively, making the Te/Si devices among the best-performing 2D/3D heterojunction photodetectors. On the whole, this study has established that PLD is a promising technique for producing high-quality Te nanofilms with good scalability, and the Te/Si 2D/3D heterojunction provides a promising platform for implementing high-performance ultra-broadband photoelectronic technologies.
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Affiliation(s)
- Jianting Lu
- State Key Laboratory of Optoelectronic Materials and Technologies, Nanotechnology Research Center, School of Materials Science & Engineering, Sun Yat-sen University, Guangzhou, 510275, Guangdong, P. R. China.
| | - Lingjiao Zhang
- State Key Laboratory of Optoelectronic Materials and Technologies and Guangdong Province Key Laboratory of Display Material and Technology, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou, 510275, China
| | - Churong Ma
- Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications, Institute of Photonics Technology, Jinan University, Guangzhou, 511443, China
| | - Wenjing Huang
- School of Materials Science & Engineering, Nanyang Technological University, Singapore, 639798, Singapore
| | - Qiaojue Ye
- State Key Laboratory of Optoelectronic Materials and Technologies, Nanotechnology Research Center, School of Materials Science & Engineering, Sun Yat-sen University, Guangzhou, 510275, Guangdong, P. R. China.
| | - Huaxin Yi
- State Key Laboratory of Optoelectronic Materials and Technologies, Nanotechnology Research Center, School of Materials Science & Engineering, Sun Yat-sen University, Guangzhou, 510275, Guangdong, P. R. China.
| | - Zhaoqiang Zheng
- School of Materials and Energy, Guangdong University of Technology, Guangzhou, 510006, Guangdong, P. R. China
| | - Guowei Yang
- State Key Laboratory of Optoelectronic Materials and Technologies, Nanotechnology Research Center, School of Materials Science & Engineering, Sun Yat-sen University, Guangzhou, 510275, Guangdong, P. R. China.
| | - Chuan Liu
- State Key Laboratory of Optoelectronic Materials and Technologies and Guangdong Province Key Laboratory of Display Material and Technology, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou, 510275, China
| | - Jiandong Yao
- State Key Laboratory of Optoelectronic Materials and Technologies, Nanotechnology Research Center, School of Materials Science & Engineering, Sun Yat-sen University, Guangzhou, 510275, Guangdong, P. R. China.
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Peng W, Wang Y, Fu Y, Deng Z, Lin S, Liang R. Characterization of the Tellurite-Resistance Properties and Identification of the Core Function Genes for Tellurite Resistance in Pseudomonas citronellolis SJTE-3. Microorganisms 2022; 10:microorganisms10010095. [PMID: 35056544 PMCID: PMC8779313 DOI: 10.3390/microorganisms10010095] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/09/2021] [Revised: 12/27/2021] [Accepted: 12/30/2021] [Indexed: 11/16/2022] Open
Abstract
Tellurite is highly toxic to bacteria and commonly used in the clinical screening for pathogens; it is speculated that there is a potential relationship between tellurite resistance and bacterial pathogenicity. Until now, the core function genes of tellurite resistance and their characteristics are still obscure. Pseudomonas citronellolis SJTE-3 was found able to resist high concentrations of tellurite (250 μg/mL) and formed vacuole-like tellurium nanostructures. The terZABCDE gene cluster located in the large plasmid pRBL16 endowed strain SJTE-3 with the tellurite resistance of high levels. Although the terC and terD genes were identified as the core function genes for tellurite reduction and resistance, the inhibition of cell growth was observed when they were used solely. Interestingly, co-expression of the terA gene or terZ gene could relieve the burden caused by the expression of the terCD genes and recover normal cell growth. TerC and TerD proteins commonly shared the conserved sequences and are widely distributed in many pathogenic bacteria, highly associated with the pathogenicity factors.
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Affiliation(s)
- Wanli Peng
- State Key Laboratory of Microbial Metabolism, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China; (W.P.); (Y.W.); (Y.F.); (Z.D.); (S.L.)
- Joint International Research Laboratory of Metabolic and Developmental Sciences, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Yanqiu Wang
- State Key Laboratory of Microbial Metabolism, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China; (W.P.); (Y.W.); (Y.F.); (Z.D.); (S.L.)
- Joint International Research Laboratory of Metabolic and Developmental Sciences, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Yali Fu
- State Key Laboratory of Microbial Metabolism, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China; (W.P.); (Y.W.); (Y.F.); (Z.D.); (S.L.)
- Joint International Research Laboratory of Metabolic and Developmental Sciences, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Zixin Deng
- State Key Laboratory of Microbial Metabolism, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China; (W.P.); (Y.W.); (Y.F.); (Z.D.); (S.L.)
- Joint International Research Laboratory of Metabolic and Developmental Sciences, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Shuangjun Lin
- State Key Laboratory of Microbial Metabolism, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China; (W.P.); (Y.W.); (Y.F.); (Z.D.); (S.L.)
- Joint International Research Laboratory of Metabolic and Developmental Sciences, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Rubing Liang
- State Key Laboratory of Microbial Metabolism, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China; (W.P.); (Y.W.); (Y.F.); (Z.D.); (S.L.)
- Joint International Research Laboratory of Metabolic and Developmental Sciences, School of Life Sciences and Biotechnology, Shanghai Jiao Tong University, Shanghai 200240, China
- Correspondence: ; Tel./Fax: +86-21-34204192
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Abstract
[Figure: see text].
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Affiliation(s)
- Raffaella Calarco
- Institute for Microelectronics and Microsystems (IMM), National Research Council (CNR), Via del Fosso del Cavaliere 100, 00133 Roma, Italy
| | - Fabrizio Arciprete
- Dipartimento di Fisica, Università di Roma "Tor Vergata," Via della Ricerca Scientifica 1, 00133 Rome, Italy
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