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He M, Nolen JR, Nordlander J, Cleri A, Lu G, Arnaud T, McIlwaine NS, Diaz-Granados K, Janzen E, Folland TG, Edgar JH, Maria JP, Caldwell JD. Coupled Tamm Phonon and Plasmon Polaritons for Designer Planar Multiresonance Absorbers. Adv Mater 2023; 35:e2209909. [PMID: 36843308 DOI: 10.1002/adma.202209909] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/26/2022] [Revised: 01/13/2023] [Indexed: 05/19/2023]
Abstract
Wavelength-selective absorbers (WS-absorbers) are of interest for various applications, including chemical sensing and light sources. Lithography-free fabrication of WS-absorbers can be realized via Tamm plasmon polaritons (TPPs) supported by distributed Bragg reflectors (DBRs) on plasmonic materials. While multifrequency and nearly arbitrary spectra can be realized with TPPs via inverse design algorithms, demanding and thick DBRs are required for high quality-factors (Q-factors) and/or multiband TPP-absorbers, increasing the cost and reducing fabrication error tolerance. Here, high Q-factor multiband absorption with limited DBR layers (3 layers) is experimentally demonstrated by Tamm hybrid polaritons (THPs) formed by coupling TPPs and Tamm phonon polaritons when modal frequencies are overlapped. Compared to the TPP component, the Q-factors of THPs are improved twofold, and the angular broadening is also reduced twofold, facilitating applications where narrow-band and nondispersive WS-absorbers are needed. Moreover, an open-source algorithm is developed to inversely design THP-absorbers consisting of anisotropic media and exemplify that the modal frequencies can be assigned to desirable positions. Furthermore, it is demonstrated that inversely designed THP-absorbers can realize same spectral resonances with fewer DBR layers than a TPP-absorber, thus reducing the fabrication complexity and enabling more cost-effective, lithography-free, wafer-scale WS-absorberss for applications such as free-space communications and gas sensing.
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Affiliation(s)
- Mingze He
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, 37240, USA
| | - Joshua Ryan Nolen
- Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, TN, 37240, USA
- Photonics Initiative, Advanced Science Research Center, City University of New York, New York, NY, 10031, USA
| | - Josh Nordlander
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania, PA, 16802, USA
| | - Angela Cleri
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania, PA, 16802, USA
| | - Guanyu Lu
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, 37240, USA
| | - Thiago Arnaud
- Department of Physics, University of Florida, Gainesville, FL, 32611, USA
- Research Experience for Undergraduates (REU) program, Vanderbilt Institute for Nanoscale Science and Engineering (VINSE), Nashville, TN, 37240, USA
| | - Nathaniel S McIlwaine
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania, PA, 16802, USA
| | - Katja Diaz-Granados
- Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, TN, 37240, USA
| | - Eli Janzen
- Tim Taylor Department of Chemical Engineering, Kansas State University, Manhattan, KS, 66506, USA
| | - Thomas G Folland
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, 37240, USA
- Department of Physics and Astronomy, The University of Iowa, Iowa City, IA, 52242, USA
| | - James H Edgar
- Tim Taylor Department of Chemical Engineering, Kansas State University, Manhattan, KS, 66506, USA
| | - Jon-Paul Maria
- Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania, PA, 16802, USA
| | - Joshua D Caldwell
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, 37240, USA
- Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, TN, 37240, USA
- Sensorium Technological Laboratories, Nashville, TN, 37205, USA
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He M, Nolen JR, Nordlander J, Cleri A, McIlwaine NS, Tang Y, Lu G, Folland TG, Landman BA, Maria JP, Caldwell JD. Deterministic inverse design of Tamm plasmon thermal emitters with multi-resonant control. Nat Mater 2021; 20:1663-1669. [PMID: 34675374 DOI: 10.1038/s41563-021-01094-0] [Citation(s) in RCA: 16] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/18/2021] [Accepted: 08/04/2021] [Indexed: 05/26/2023]
Abstract
Wavelength-selective thermal emitters (WS-EMs) are of interest due to the lack of cost-effective, narrow-band sources in the mid- to long-wave infrared. WS-EMs can be realized via Tamm plasmon polaritons (TPPs) supported by distributed Bragg reflectors on metals. However, the design of multiple resonances is challenging as numerous structural parameters must be optimized simultaneously. Here we use stochastic gradient descent to optimize TPP emitters (TPP-EMs) composed of an aperiodic distributed Bragg reflector deposited on doped cadmium oxide (CdO) film, where layer thicknesses and carrier density are inversely designed. The combination of the aperiodic distributed Bragg reflector with the designable plasma frequency of CdO enables multiple TPP-EM modes to be simultaneously designed with arbitrary spectral control not accessible with metal-based TPPs. Using this approach, we experimentally demonstrated and numerically proposed TPP-EMs exhibiting single or multiple emission bands with designable frequencies, line-widths and amplitudes. This thereby enables lithography-free, wafer-scale WS-EMs that are complementary metal-oxide-semiconductor compatible for applications such as free-space communications and gas sensing.
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Affiliation(s)
- Mingze He
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, USA.
| | - J Ryan Nolen
- Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, TN, USA
| | - Josh Nordlander
- Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA, USA
| | - Angela Cleri
- Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA, USA
| | - Nathaniel S McIlwaine
- Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA, USA
| | - Yucheng Tang
- Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA
| | - Guanyu Lu
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, USA
| | - Thomas G Folland
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, USA
- Department of Physics and Astronomy, University of Iowa, Iowa City, IA, USA
| | - Bennett A Landman
- Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA
| | - Jon-Paul Maria
- Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA, USA
| | - Joshua D Caldwell
- Department of Mechanical Engineering, Vanderbilt University, Nashville, TN, USA.
- Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, USA.
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Tomko JA, Runnerstrom EL, Wang YS, Chu W, Nolen JR, Olson DH, Kelley KP, Cleri A, Nordlander J, Caldwell JD, Prezhdo OV, Maria JP, Hopkins PE. Long-lived modulation of plasmonic absorption by ballistic thermal injection. Nat Nanotechnol 2021; 16:47-51. [PMID: 33169011 DOI: 10.1038/s41565-020-00794-z] [Citation(s) in RCA: 26] [Impact Index Per Article: 8.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/24/2020] [Accepted: 10/13/2020] [Indexed: 06/11/2023]
Abstract
Light-matter interactions that induce charge and energy transfer across interfaces form the foundation for photocatalysis1,2, energy harvesting3 and photodetection4, among other technologies. One of the most common mechanisms associated with these processes relies on carrier injection. However, the exact role of the energy transport associated with this hot-electron injection remains unclear. Plasmon-assisted photocatalytic efficiencies can improve when intermediate insulation layers are used to inhibit the charge transfer5,6 or when off-resonance excitations are employed7, which suggests that additional energy transport and thermal effects could play an explicit role even if the charge transfer is inhibited8. This provides an additional interfacial mechanism for the catalytic and plasmonic enhancement at interfaces that moves beyond the traditionally assumed physical charge injection9-12. In this work, we report on a series of ultrafast plasmonic measurements that provide a direct measure of electronic distributions, both spatially and temporally, after the optical excitation of a metal/semiconductor heterostructure. We explicitly demonstrate that in cases of strong non-equilibrium, a novel energy transduction mechanism arises at the metal/semiconductor interface. We find that hot electrons in the metal contact transfer their energy to pre-existing free electrons in the semiconductor, without an equivalent spatiotemporal transfer of charge. Further, we demonstrate that this ballistic thermal injection mechanism can be utilized as a unique means to modulate plasmonic interactions. These experimental results are well-supported by both rigorous multilayer optical modelling and first-principle ab initio calculations.
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Affiliation(s)
- John A Tomko
- Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, USA
| | - Evan L Runnerstrom
- Army Research Office, CCDC US Army Research Laboratory, Research Triangle Park, NC, USA
- Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, USA
| | - Yi-Siang Wang
- Department of Chemistry, University of Southern California, Los Angeles, CA, USA
- Department of Physics and Astronomy, University of Southern California, Los Angeles, CA, USA
| | - Weibin Chu
- Department of Chemistry, University of Southern California, Los Angeles, CA, USA
- Department of Physics and Astronomy, University of Southern California, Los Angeles, CA, USA
| | - Joshua R Nolen
- Institute of Nanoscale Science and Engineering, Vanderbilt University, Nashville, TN, USA
| | - David H Olson
- Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, USA
| | - Kyle P Kelley
- Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, USA
| | - Angela Cleri
- Department of Materials Science and Engineering, Pennsylvania State University, State College, PA, USA
| | - Josh Nordlander
- Department of Materials Science and Engineering, Pennsylvania State University, State College, PA, USA
| | - Joshua D Caldwell
- Institute of Nanoscale Science and Engineering, Vanderbilt University, Nashville, TN, USA
| | - Oleg V Prezhdo
- Department of Chemistry, University of Southern California, Los Angeles, CA, USA
- Department of Physics and Astronomy, University of Southern California, Los Angeles, CA, USA
| | - Jon-Paul Maria
- Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, USA
- Department of Materials Science and Engineering, Pennsylvania State University, State College, PA, USA
| | - Patrick E Hopkins
- Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, USA.
- Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, USA.
- Department of Physics, University of Virginia, Charlottesville, VA, USA.
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Vu NM, Luo X, Novakov S, Jin W, Nordlander J, Meisenheimer PB, Trassin M, Zhao L, Heron JT. Bulk-like dielectric and magnetic properties of sub 100 nm thick single crystal Cr 2O 3 films on an epitaxial oxide electrode. Sci Rep 2020; 10:14721. [PMID: 32895413 PMCID: PMC7477579 DOI: 10.1038/s41598-020-71619-1] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/25/2020] [Accepted: 08/18/2020] [Indexed: 11/09/2022] Open
Abstract
The manipulation of antiferromagnetic order in magnetoelectric Cr2O3 using electric field has been of great interest due to its potential in low-power electronics. The substantial leakage and low dielectric breakdown observed in twinned Cr2O3 thin films, however, hinders its development in energy efficient spintronics. To compensate, large film thicknesses (250 nm or greater) have been employed at the expense of device scalability. Recently, epitaxial V2O3 thin film electrodes have been used to eliminate twin boundaries and significantly reduce the leakage of 300 nm thick single crystal films. Here we report the electrical endurance and magnetic properties of thin (less than 100 nm) single crystal Cr2O3 films on epitaxial V2O3 buffered Al2O3 (0001) single crystal substrates. The growth of Cr2O3 on isostructural V2O3 thin film electrodes helps eliminate the existence of twin domains in Cr2O3 films, therefore significantly reducing leakage current and increasing dielectric breakdown. 60 nm thick Cr2O3 films show bulk-like resistivity (~ 1012 Ω cm) with a breakdown voltage in the range of 150-300 MV/m. Exchange bias measurements of 30 nm thick Cr2O3 display a blocking temperature of ~ 285 K while room temperature optical second harmonic generation measurements possess the symmetry consistent with bulk magnetic order.
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Affiliation(s)
- N M Vu
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, 48109, USA
| | - X Luo
- Department of Physics, University of Michigan, Ann Arbor, MI, 48109, USA
| | - S Novakov
- Department of Physics, University of Michigan, Ann Arbor, MI, 48109, USA
| | - W Jin
- Department of Physics, Auburn University, Auburn, AL, 36849, USA
| | - J Nordlander
- Department of Materials, ETH Zürich, Vladimir-Prelog-Weg 4, 8093, Zurich, Switzerland
| | - P B Meisenheimer
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, 48109, USA
| | - M Trassin
- Department of Materials, ETH Zürich, Vladimir-Prelog-Weg 4, 8093, Zurich, Switzerland
| | - L Zhao
- Department of Physics, University of Michigan, Ann Arbor, MI, 48109, USA
| | - J T Heron
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, 48109, USA.
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Nordlander J, Campanini M, Rossell MD, Erni R, Meier QN, Cano A, Spaldin NA, Fiebig M, Trassin M. The ultrathin limit of improper ferroelectricity. Nat Commun 2019; 10:5591. [PMID: 31811133 PMCID: PMC6897979 DOI: 10.1038/s41467-019-13474-x] [Citation(s) in RCA: 14] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/06/2019] [Accepted: 11/08/2019] [Indexed: 11/25/2022] Open
Abstract
The secondary nature of polarization in improper ferroelectrics promotes functional properties beyond those of conventional ferroelectrics. In technologically relevant ultrathin films, however, the improper ferroelectric behavior remains largely unexplored. Here, we probe the emergence of the coupled improper polarization and primary distortive order parameter in thin films of hexagonal YMnO3. Combining state-of-the-art in situ characterization techniques separately addressing the improper ferroelectric state and its distortive driving force, we reveal a pronounced thickness dependence of the improper polarization, which we show to originate from the strong modification of the primary order at epitaxial interfaces. Nanoscale confinement effects on the primary order parameter reduce the temperature of the phase transition, which we exploit to visualize its order-disorder character with atomic resolution. Our results advance the understanding of the evolution of improper ferroelectricity within the confinement of ultrathin films, which is essential for their successful implementation in nanoscale applications. Evolution of improper ferroelectricity within the confinement of ultrathin films is essential for their successful implementation in nanoscale applications. Here, the authors show thickness dependence of the improper polarization originating from the strong modification of the primary order at epitaxial interfaces.
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Affiliation(s)
- J Nordlander
- Department of Materials, ETH Zurich, 8093, Zurich, Switzerland.
| | - M Campanini
- Electron Microscopy Center, Empa, 8600, Dübendorf, Switzerland
| | - M D Rossell
- Electron Microscopy Center, Empa, 8600, Dübendorf, Switzerland
| | - R Erni
- Electron Microscopy Center, Empa, 8600, Dübendorf, Switzerland
| | - Q N Meier
- Department of Materials, ETH Zurich, 8093, Zurich, Switzerland
| | - A Cano
- Department of Materials, ETH Zurich, 8093, Zurich, Switzerland.,Institut Néel, CNRS, 38042, Grenoble, France
| | - N A Spaldin
- Department of Materials, ETH Zurich, 8093, Zurich, Switzerland
| | - M Fiebig
- Department of Materials, ETH Zurich, 8093, Zurich, Switzerland
| | - M Trassin
- Department of Materials, ETH Zurich, 8093, Zurich, Switzerland.
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7
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Nordlander J, Deadman W. Solvolytic Displacement Reactions in Trifluoroacetic Acid. I. Trifluoroacetolysis of 2-Phenylethyl p-Toluenesulfonate. Evidence for Ethylenephenonium Ion. J Am Chem Soc 2003. [DOI: 10.1021/ja01008a600] [Citation(s) in RCA: 30] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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Abstract
Convergence angles of full-coverage preparations were measured in a clinical environment and compared with each other and the ideal taper of 4 to 10 degrees. Despite educational emphasis, the practical application of preparation design routinely exceeds the ideal taper and casts a different light on retention and resistance characteristics described in both laboratory and theoretical work. Comparison of preparations done by residents and by prosthodontists in this study showed that ideal preparation taper is seldom achieved. Given the complex interrelationships of clinical, theoretical, and mechanical factors that determine the retention and resistance characteristics of a preparation in vivo, it is advisable to design preparations that blend retentive characteristics with functional demands. Because it is difficult to assess preparation taper intraorally, efforts should be directed to using other retentive devices, especially on posterior preparations where ideal taper is difficult to achieve.
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Affiliation(s)
- J Nordlander
- Veterans Administration Medical Center, San Francisco, Calif
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Nordlander J, Kotian K, Raff, II D, Njoroge F, Winemiller J. Additions and Corrections - Regiochemistry, Stereochemistry, and Mechanism of Addition of Trifluoroacetic Acid to (Z)-Cyclooctene. J Am Chem Soc 1984. [DOI: 10.1021/ja00335a601] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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Nordlander J, Owuor P, Cabral D, Haky J. Additions and Corrections - Displacement Stereochemistry and Product-Formation Selectivities in the Solvolysis of Cycloocytl p-Bromobenzenesulfonate. J Am Chem Soc 1982. [DOI: 10.1021/ja00377a602] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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Nordlander J, McCrary, Jr. T. Additions and Corrections - Stereochemistry and Mechanism of Acetolysis of 4,4-Dimethylcyclohexyl Tosylate. J Am Chem Soc 1974. [DOI: 10.1021/ja00819a601] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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