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Vićentić T, Greco I, Iorio CS, Mišković V, Bajuk-Bogdanović D, Pašti IA, Radulović K, Klenk S, Stimpel-Lindner T, Duesberg GS, Spasenović M. Laser-induced graphene on cross-linked sodium alginate. Nanotechnology 2023; 35:115103. [PMID: 38081076 DOI: 10.1088/1361-6528/ad143a] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/25/2023] [Accepted: 12/10/2023] [Indexed: 12/30/2023]
Abstract
Laser-induced graphene (LIG) possesses desirable properties for numerous applications. However, LIG formation on biocompatible substrates is needed to further augment the integration of LIG-based technologies into nanobiotechnology. Here, LIG formation on cross-linked sodium alginate is reported. The LIG is systematically investigated, providing a comprehensive understanding of the physicochemical characteristics of the material. Raman spectroscopy, scanning electron microscopy with energy-dispersive x-ray analysis, x-ray diffraction, transmission electron microscopy, Fourier-transform infrared spectroscopy and x-ray photoelectron spectroscopy techniques confirm the successful generation of oxidized graphene on the surface of cross-linked sodium alginate. The influence of laser parameters and the amount of crosslinker incorporated into the alginate substrate is explored, revealing that lower laser speed, higher resolution, and increased CaCl2content leads to LIG with lower electrical resistance. These findings could have significant implications for the fabrication of LIG on alginate with tailored conductive properties, but they could also play a guiding role for LIG formation on other biocompatible substrates.
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Affiliation(s)
- T Vićentić
- Center for Microelectronic Technologies, Institute of Chemistry, Technology and Metallurgy, University of Belgrade, Belgrade, Serbia
| | - I Greco
- Center for Research and Engineering in Space Technologies (CREST), Universite Libre de Bruxelles, Bruxelles, Belgium
| | - C S Iorio
- Center for Research and Engineering in Space Technologies (CREST), Universite Libre de Bruxelles, Bruxelles, Belgium
| | - V Mišković
- Nearlab, Department of Electronics, Information, and Bioengineering, Politecnico di Milano, Milano, Italy
| | | | - I A Pašti
- University of Belgrade-Faculty of Physical Chemistry Belgrade, Serbia
| | - K Radulović
- Center for Microelectronic Technologies, Institute of Chemistry, Technology and Metallurgy, University of Belgrade, Belgrade, Serbia
| | - S Klenk
- Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, University of the Bundeswehr Munich & SENS Research Center, Neubiberg, Germany
| | - T Stimpel-Lindner
- Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, University of the Bundeswehr Munich & SENS Research Center, Neubiberg, Germany
| | - G S Duesberg
- Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, University of the Bundeswehr Munich & SENS Research Center, Neubiberg, Germany
| | - M Spasenović
- Center for Microelectronic Technologies, Institute of Chemistry, Technology and Metallurgy, University of Belgrade, Belgrade, Serbia
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2
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Plenča K, Cvetnić S, Prskalo H, Kovačić M, Cvetnić M, Kušić H, Matusinović Z, Kraljić Roković M, Genorio B, Lavrenčič Štangar U, Lončarić Božić A. Biomass Pyrolysis-Derived Biochar: A Versatile Precursor for Graphene Synthesis. Materials (Basel) 2023; 16:7658. [PMID: 38138800 PMCID: PMC10744795 DOI: 10.3390/ma16247658] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/15/2023] [Revised: 12/05/2023] [Accepted: 12/13/2023] [Indexed: 12/24/2023]
Abstract
Graphene, a two-dimensional carbon allotrope with a honeycomb structure, has emerged as a material of immense interest in diverse scientific and technical domains. It is mainly produced from graphite by mechanical, chemical and electrochemical exfoliation. As renewable energy and source utilization increase, including bioenergy from forest and woody residues, processed, among other methods, by pyrolysis treatment, it can be expected that biochar production will increase too. Thus, its useful applications, particularly in obtaining high-added-value products, need to be fully explored. This study aims at presenting a comprehensive analysis derived from experimental data, offering insights into the potential of biomass pyrolysis-derived biochar as a versatile precursor for the controlled synthesis of graphene and its derivatives. This approach comprehended the highest energy output and lowest negative environmental footprint, including the minimization of both toxic gas emissions during processing and heavy metals' presence in the feedstock, toward obtaining biochar suitable to be modified, employing the Hummers and intercalation with persulfate salts methods, aiming at deriving graphene-like materials. Material characterization has revealed that besides morphology and structural features of the original wooden biomass, graphitized structures are present as well, which is proven clearly by Raman and XPS analyses. Electrochemical tests revealed higher conductivity in modified samples, implying their graphene-like nature.
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Affiliation(s)
- Karla Plenča
- Faculty of Chemical Engineering and Technology, University of Zagreb, Marulićev trg 19, 10000 Zagreb, Croatia; (K.P.); (M.K.); (M.C.); (M.K.R.)
| | - Sara Cvetnić
- Department for Safety and Protection Engineering, Karlovac University of Applied Sciences, Trg J.J. Strossmayera 9, 47000 Karlovac, Croatia; (S.C.); (H.P.); (Z.M.)
| | - Helena Prskalo
- Department for Safety and Protection Engineering, Karlovac University of Applied Sciences, Trg J.J. Strossmayera 9, 47000 Karlovac, Croatia; (S.C.); (H.P.); (Z.M.)
| | - Marin Kovačić
- Faculty of Chemical Engineering and Technology, University of Zagreb, Marulićev trg 19, 10000 Zagreb, Croatia; (K.P.); (M.K.); (M.C.); (M.K.R.)
| | - Matija Cvetnić
- Faculty of Chemical Engineering and Technology, University of Zagreb, Marulićev trg 19, 10000 Zagreb, Croatia; (K.P.); (M.K.); (M.C.); (M.K.R.)
| | - Hrvoje Kušić
- Faculty of Chemical Engineering and Technology, University of Zagreb, Marulićev trg 19, 10000 Zagreb, Croatia; (K.P.); (M.K.); (M.C.); (M.K.R.)
- Department for Packaging, Recycling and Environmental Protection, University North, Trg dr. Žarka Dolinara 1, 48000 Koprivnica, Croatia
| | - Zvonimir Matusinović
- Department for Safety and Protection Engineering, Karlovac University of Applied Sciences, Trg J.J. Strossmayera 9, 47000 Karlovac, Croatia; (S.C.); (H.P.); (Z.M.)
| | - Marijana Kraljić Roković
- Faculty of Chemical Engineering and Technology, University of Zagreb, Marulićev trg 19, 10000 Zagreb, Croatia; (K.P.); (M.K.); (M.C.); (M.K.R.)
| | - Boštjan Genorio
- Faculty of Chemistry and Chemical Technology, University of Ljubljana, Večna pot 113, SI-1000 Ljubljana, Slovenia; (B.G.); (U.L.Š.)
| | - Urška Lavrenčič Štangar
- Faculty of Chemistry and Chemical Technology, University of Ljubljana, Večna pot 113, SI-1000 Ljubljana, Slovenia; (B.G.); (U.L.Š.)
| | - Ana Lončarić Božić
- Faculty of Chemical Engineering and Technology, University of Zagreb, Marulićev trg 19, 10000 Zagreb, Croatia; (K.P.); (M.K.); (M.C.); (M.K.R.)
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3
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Tiwari SK, Pandey SK, Pandey R, Wang N, Bystrzejewski M, Mishra YK, Zhu Y. Stone-Wales Defect in Graphene. Small 2023; 19:e2303340. [PMID: 37386778 DOI: 10.1002/smll.202303340] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/19/2023] [Indexed: 07/01/2023]
Abstract
2D graphene the most investigated structures from nanocarbon family studied in the last three decades. It is projected as an excellent material useful for quantum computing, artificial intelligence, and next generation advanced technologies. Graphene exists in several forms and its extraordinary thermal, mechanical, and electronic properties, principally depend on the kind of perfection of the hexagonal atomic lattice. Defects are always considered as undesired components but certain defects in graphene could be an asset for electrochemistry and quantum electronics due to the engineered electronclouds and quantum tunnelling. The authors carefully discuss the Stone-Wales imperfections in graphene and its derivatives comprehensively. A specific emphasis is focused on the experimental and theoretical aspects of the Stone-Wales defects in graphene with respect to structure-property relationships. The corroboration of extrinsic defects like external atomic doping, functionalization, edge distortion in the graphene consisting of Stone-Wales imperfections, which are very significant in designing graphene-based electronic devices, are summarized.
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Affiliation(s)
- Santosh K Tiwari
- Key Laboratory of New Processing Technology for Nonferrous Metals and Materials, Ministry of Education, School of Resources, Environment and Materials, Guangxi University, Nanning, 530004, China
- Department of Chemistry, NMAM Institute of Technology, Nitte (Deemed to be University), Mangaluru, Karnataka, 547110, India
| | - Sarvesh Kumar Pandey
- Department of Chemistry, School of Basic Sciences, Manipal University Jaipur, Jaipur, Rajasthan, 303007, India
| | - Raunak Pandey
- Department of Chemical Science and Engineering, Kathmandu University, Dhulikhel, 44600, Nepal
| | - Nannan Wang
- Key Laboratory of New Processing Technology for Nonferrous Metals and Materials, Ministry of Education, School of Resources, Environment and Materials, Guangxi University, Nanning, 530004, China
| | | | - Yogendra Kumar Mishra
- Smart Materials, NanoSYD, Mads Clausen Institute, University of Southern Denmark, Alsion 2, Sønderborg, 6400, Denmark
| | - Yanqiu Zhu
- College of Engineering, Mathematics and Physical Sciences, University of Exeter, Exeter, EX4 4QF, UK
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Abbas Q, Shinde PA, Abdelkareem MA, Alami AH, Mirzaeian M, Yadav A, Olabi AG. Graphene Synthesis Techniques and Environmental Applications. Materials (Basel) 2022; 15:7804. [PMID: 36363396 PMCID: PMC9658785 DOI: 10.3390/ma15217804] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/23/2022] [Revised: 10/29/2022] [Accepted: 10/31/2022] [Indexed: 06/16/2023]
Abstract
Graphene is fundamentally a two-dimensional material with extraordinary optical, thermal, mechanical, and electrical characteristics. It has a versatile surface chemistry and large surface area. It is a carbon nanomaterial, which comprises sp2 hybridized carbon atoms placed in a hexagonal lattice with one-atom thickness, giving it a two-dimensional structure. A large number of synthesis techniques including epitaxial growth, liquid phase exfoliation, electrochemical exfoliation, mechanical exfoliation, and chemical vapor deposition are used for the synthesis of graphene. Graphene prepared using different techniques can have a number of benefits and deficiencies depending on its application. This study provides a summary of graphene preparation techniques and critically assesses the use of graphene, its derivates, and composites in environmental applications. These applications include the use of graphene as membrane material for the detoxication and purification of water, active material for gas sensing, heavy metal ions detection, and CO2 conversion. Furthermore, a trend analysis of both synthesis techniques and environmental applications of graphene has been performed by extracting and analyzing Scopus data from the past ten years. Finally, conclusions and outlook are provided to address the residual challenges related to the synthesis of the material and its use for environmental applications.
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Affiliation(s)
- Qaisar Abbas
- Sustainable Energy & Power Systems Research Centre, RISE, University of Sharjah, Sharjah 27272, United Arab Emirates
- School of Engineering, Computing & Physical Sciences, University of the West of Scotland, Paisley PA1 2BE, UK
| | - Pragati A. Shinde
- Sustainable Energy & Power Systems Research Centre, RISE, University of Sharjah, Sharjah 27272, United Arab Emirates
| | - Mohammad Ali Abdelkareem
- Sustainable Energy & Power Systems Research Centre, RISE, University of Sharjah, Sharjah 27272, United Arab Emirates
- Chemical Engineering Department, Minia University, Minya 61519, Egypt
| | - Abdul Hai Alami
- Sustainable Energy & Power Systems Research Centre, RISE, University of Sharjah, Sharjah 27272, United Arab Emirates
| | - Mojtaba Mirzaeian
- School of Engineering, Computing & Physical Sciences, University of the West of Scotland, Paisley PA1 2BE, UK
- Faculty of Chemistry and Chemical Technology, Al-Farabi Kazakh National University, Al-Farabi Avenue, 71, Almaty 050012, Kazakhstan
| | - Arti Yadav
- School of Engineering, Newcastle University, Newcastle upon Tyne NE1 7RU, UK
| | - Abdul Ghani Olabi
- Sustainable Energy & Power Systems Research Centre, RISE, University of Sharjah, Sharjah 27272, United Arab Emirates
- Mechanical Engineering and Design, School of Engineering and Applied Science, Aston University Aston Triangle, Birmingham B4 7ET, UK
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5
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Hagendoorn Y, Pandraud G, Vollebregt S, Morana B, Sarro PM, Steeneken PG. Direct Wafer-Scale CVD Graphene Growth under Platinum Thin-Films. Materials (Basel) 2022; 15:ma15103723. [PMID: 35629749 PMCID: PMC9146350 DOI: 10.3390/ma15103723] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/01/2022] [Revised: 05/12/2022] [Accepted: 05/19/2022] [Indexed: 02/05/2023]
Abstract
Since the transfer process of graphene from a dedicated growth substrate to another substrate is prone to induce defects and contamination and can increase costs, there is a large interest in methods for growing graphene directly on silicon wafers. Here, we demonstrate the direct CVD growth of graphene on a SiO2 layer on a silicon wafer by employing a Pt thin film as catalyst. We pattern the platinum film, after which a CVD graphene layer is grown at the interface between the SiO2 and the Pt. After removing the Pt, Raman spectroscopy demonstrates the local growth of monolayer graphene on SiO2. By tuning the CVD process, we were able to fully cover 4-inch oxidized silicon wafers with transfer-free monolayer graphene, a result that is not easily obtained using other methods. By adding Ta structures, local graphene growth on SiO2 is selectively blocked, allowing the controlled graphene growth on areas selected by mask design.
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Affiliation(s)
- Yelena Hagendoorn
- Laboratory of Electronic Components, Technology and Materials (ECTM), Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands; (Y.H.); (G.P.); (S.V.); (B.M.); (P.M.S.)
| | - Gregory Pandraud
- Laboratory of Electronic Components, Technology and Materials (ECTM), Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands; (Y.H.); (G.P.); (S.V.); (B.M.); (P.M.S.)
| | - Sten Vollebregt
- Laboratory of Electronic Components, Technology and Materials (ECTM), Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands; (Y.H.); (G.P.); (S.V.); (B.M.); (P.M.S.)
| | - Bruno Morana
- Laboratory of Electronic Components, Technology and Materials (ECTM), Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands; (Y.H.); (G.P.); (S.V.); (B.M.); (P.M.S.)
| | - Pasqualina M. Sarro
- Laboratory of Electronic Components, Technology and Materials (ECTM), Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands; (Y.H.); (G.P.); (S.V.); (B.M.); (P.M.S.)
| | - Peter G. Steeneken
- Precision and Microsystems Engineering Department, Delft University of Technology, 2628 CD Delft, The Netherlands
- Correspondence:
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6
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Qiao Y, Gou G, Wu F, Jian J, Li X, Hirtz T, Zhao Y, Zhi Y, Wang F, Tian H, Yang Y, Ren TL. Graphene-Based Thermoacoustic Sound Source. ACS Nano 2020; 14:3779-3804. [PMID: 32186849 DOI: 10.1021/acsnano.9b10020] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Thermoacoustic (TA) effect has been discovered for more than 130 years. However, limited by the material characteristics, the performance of a TA sound source could not be compared with magnetoelectric and piezoelectric loudspeakers. Recently, graphene, a two-dimensional material with the lowest heat capacity per unit area, was discovered to have a good TA performance. Compared with a traditional sound source, graphene TA sound sources (GTASSs) have many advantages, such as small volume, no diaphragm vibration, wide frequency range, high transparency, good flexibility, and high sound pressure level (SPL). Therefore, graphene has a great potential as a next-generation sound source. Photoacoustic (PA) imaging can also be applied to the diagnosis and treatment of diseases using the photothermo-acoustic (PTA) effect. Therefore, in this review, we will introduce the history of TA devices. Then, the theory and simulation model of TA will be analyzed in detail. After that, we will talk about the graphene synthesis method. To improve the performance of GTASSs, many strategies such as lowering the thickness and using porous or suspended structures will be introduced. With a good PTA effect and large specific area, graphene PA imaging and drug delivery is a promising prospect in cancer treatment. Finally, the challenges and prospects of GTASSs will be discussed.
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Affiliation(s)
- Yancong Qiao
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Guangyang Gou
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Fan Wu
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Jinming Jian
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Xiaoshi Li
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Thomas Hirtz
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Yunfei Zhao
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Yao Zhi
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Fangwei Wang
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - He Tian
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Yi Yang
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
| | - Tian-Ling Ren
- Institute of Microelectronics and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China
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7
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Galvão N, Vasconcelos G, Pessoa R, Machado J, Guerino M, Fraga M, Rodrigues B, Camus J, Djouadi A, Maciel H. A Novel Method of Synthesizing Graphene for Electronic Device Applications. Materials (Basel) 2018; 11:E1120. [PMID: 29966342 PMCID: PMC6073295 DOI: 10.3390/ma11071120] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/29/2018] [Revised: 06/23/2018] [Accepted: 06/27/2018] [Indexed: 11/23/2022]
Abstract
This article reports a novel and efficient method to synthesize graphene using a thermal decomposition process. In this method, silicon carbide (SiC) thin films grown on Si(100) wafers with an AlN buffer layer were used as substrates. CO₂ laser beam heating, without vacuum or controlled atmosphere, was applied for SiC thermal decomposition. The physical, chemical, morphological, and electrical properties of the laser-produced graphene were investigated for different laser energy densities. The results demonstrate that graphene was produced in the form of small islands with quality, density, and properties depending on the applied laser energy density. Furthermore, the produced graphene exhibited a sheet resistance characteristic similar to graphene grown on mono-crystalline SiC wafers, which indicates its potential for electronic device applications.
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Affiliation(s)
- Nierlly Galvão
- Centro de Ciência e Tecnologia de Plasmas e Materiais-PlasMat, Instituto Tecnológico de Aeronáutica, 12228-900 São José dos Campos, SP, Brazil.
| | - Getúlio Vasconcelos
- Photonics Division, Instituto de Estudos Avançados, Rodovia dos Tamoios, 12228-001 São Jose dos Campos, SP, Brazil.
| | - Rodrigo Pessoa
- Centro de Ciência e Tecnologia de Plasmas e Materiais-PlasMat, Instituto Tecnológico de Aeronáutica, 12228-900 São José dos Campos, SP, Brazil.
- Universidade Brasil, Rua Carolina Fonseca 235, 08230-030 São Paulo, SP, Brazil.
| | - João Machado
- Associate Laboratory of Sensors and Materials, Instituto Nacional de Pesquisas Espaciais, 12227-010, São José dos Campos, SP, Brazil.
| | - Marciel Guerino
- Centro de Ciência e Tecnologia de Plasmas e Materiais-PlasMat, Instituto Tecnológico de Aeronáutica, 12228-900 São José dos Campos, SP, Brazil.
| | - Mariana Fraga
- Universidade Brasil, Rua Carolina Fonseca 235, 08230-030 São Paulo, SP, Brazil.
| | - Bruno Rodrigues
- Centro de Ciência e Tecnologia de Plasmas e Materiais-PlasMat, Instituto Tecnológico de Aeronáutica, 12228-900 São José dos Campos, SP, Brazil.
- Universidade Brasil, Rua Carolina Fonseca 235, 08230-030 São Paulo, SP, Brazil.
| | - Julien Camus
- Institut des Matériaux Jean Rouxel IMN, UMR 6502, Université de Nantes, 2 rue de La Houssinière, BP 32229, Nantes Cedex 44322, France.
| | - Abdou Djouadi
- Institut des Matériaux Jean Rouxel IMN, UMR 6502, Université de Nantes, 2 rue de La Houssinière, BP 32229, Nantes Cedex 44322, France.
| | - Homero Maciel
- Centro de Ciência e Tecnologia de Plasmas e Materiais-PlasMat, Instituto Tecnológico de Aeronáutica, 12228-900 São José dos Campos, SP, Brazil.
- Universidade Brasil, Rua Carolina Fonseca 235, 08230-030 São Paulo, SP, Brazil.
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Lukosius M, Dabrowski J, Kitzmann J, Fursenko O, Akhtar F, Lisker M, Lippert G, Schulze S, Yamamoto Y, Schubert MA, Krause HM, Wolff A, Mai A, Schroeder T, Lupina G. Metal-Free CVD Graphene Synthesis on 200 mm Ge/Si(001) Substrates. ACS Appl Mater Interfaces 2016; 8:33786-33793. [PMID: 27960421 DOI: 10.1021/acsami.6b11397] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
Good quality, complementary-metal-oxide-semiconductor (CMOS) technology compatible, 200 mm graphene was obtained on Ge(001)/Si(001) wafers in this work. Chemical vapor depositions were carried out at the deposition temperatures of 885 °C using CH4 as carbon source on epitaxial Ge(100) layers, which were grown on Si(100), prior to the graphene synthesis. Graphene layer with the 2D/G ratio ∼3 and low D mode (i.e., low concentration of defects) was measured over the entire 200 mm wafer by Raman spectroscopy. A typical full-width-at-half-maximum value of 39 cm-1 was extracted for the 2D mode, further indicating that graphene of good structural quality was produced. The study also revealed that the lack of interfacial oxide correlates with superior properties of graphene. In order to evaluate electrical properties of graphene, its 2 × 2 cm2 pieces were transferred onto SiO2/Si substrates from Ge/Si wafers. The extracted sheet resistance and mobility values of transferred graphene layers were ∼1500 ± 100 Ω/sq and μ ≈ 400 ± 20 cm2/V s, respectively. The transferred graphene was free of metallic contaminations or mechanical damage. On the basis of results of DFT calculations, we attribute the high structural quality of graphene grown by CVD on Ge to hydrogen-induced reduction of nucleation probability, explain the appearance of graphene-induced facets on Ge(001) as a kinetic effect caused by surface step pinning at linear graphene nuclei, and clarify the orientation of graphene domains on Ge(001) as resulting from good lattice matching between Ge(001) and graphene nucleated on such nuclei.
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Affiliation(s)
- M Lukosius
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - J Dabrowski
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - J Kitzmann
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - O Fursenko
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - F Akhtar
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - M Lisker
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - G Lippert
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - S Schulze
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - Y Yamamoto
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - M A Schubert
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - H M Krause
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - A Wolff
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - A Mai
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - T Schroeder
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
- BTU Cottbus-Senftenberg , Konrad Zuse Str. 1, 03046 Cottbus, Germany
| | - G Lupina
- IHP , Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
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9
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Scaparro AM, Miseikis V, Coletti C, Notargiacomo A, Pea M, De Seta M, Di Gaspare L. Investigating the CVD Synthesis of Graphene on Ge(100): toward Layer-by-Layer Growth. ACS Appl Mater Interfaces 2016; 8:33083-33090. [PMID: 27934132 DOI: 10.1021/acsami.6b11701] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
Germanium is emerging as the substrate of choice for the growth of graphene in CMOS-compatible processes. For future application in next generation devices the accurate control over the properties of high-quality graphene synthesized on Ge surfaces, such as number of layers and domain size, is of paramount importance. Here we investigate the role of the process gas flows on the CVD growth of graphene on Ge(100). The quality and morphology of the deposited material is assessed by using μ-Raman spectroscopy, X-ray photoemission spectroscopy, scanning electron microscopy, and atomic force microscopy. We find that by simply varying the carbon precursor flow different growth regimes yielding to graphene nanoribbons, graphene monolayer, and graphene multilayer are established. We identify the growth conditions yielding to a layer-by-layer growth regime and report on the achievement of homogeneous monolayer graphene with an average intensity ratio of 2D and G bands in the Raman map larger than 3.
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Affiliation(s)
- A M Scaparro
- Dipartimento di Scienze, Università degli Studi Roma Tre , Viale Marconi 446, 00146 Rome, Italy
| | - V Miseikis
- Center for Nanotechnology Innovation @NEST, Italian Institute of Technology , Piazza San Silvestro 12, 56127 Pisa, Italy
| | - C Coletti
- Center for Nanotechnology Innovation @NEST, Italian Institute of Technology , Piazza San Silvestro 12, 56127 Pisa, Italy
| | - A Notargiacomo
- Institute for Photonics and Nanotechnology, CNR , Via Cineto Romano 42, 00156 Rome, Italy
| | - M Pea
- Institute for Photonics and Nanotechnology, CNR , Via Cineto Romano 42, 00156 Rome, Italy
| | - M De Seta
- Dipartimento di Scienze, Università degli Studi Roma Tre , Viale Marconi 446, 00146 Rome, Italy
| | - L Di Gaspare
- Dipartimento di Scienze, Università degli Studi Roma Tre , Viale Marconi 446, 00146 Rome, Italy
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