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Deva Arun Kumar K, Valanarasu S, Capelle A, Nar S, Karim W, Stolz A, Aspe B, Semmar N. Nanostructured Oxide (SnO 2, FTO) Thin Films for Energy Harvesting: A Significant Increase in Thermoelectric Power at Low Temperature. Micromachines (Basel) 2024; 15:188. [PMID: 38398917 PMCID: PMC10890522 DOI: 10.3390/mi15020188] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/27/2023] [Revised: 01/20/2024] [Accepted: 01/23/2024] [Indexed: 02/25/2024]
Abstract
Previous studies have shown that undoped and doped SnO2 thin films have better optical and electrical properties. This study aims to investigate the thermoelectric properties of two distinct semiconducting oxide thin films, namely SnO2 and F-doped SnO2 (FTO), by the nebulizer spray pyrolysis technique. An X-ray diffraction study reveals that the synthesized films exhibit a tetragonal structure with the (200) preferred orientation. The film structural quality increases from SnO2 to FTO due to the substitution of F- ions into the host lattice. The film thickness increases from 530 nm for SnO2 to 650 nm for FTO films. Room-temperature electrical resistivity decreases from (8.96 ± 0.02) × 10-2 Ω·cm to (4.64 ± 0.01) × 10-3 Ω·cm for the SnO2 and FTO thin films, respectively. This is due to the increase in the carrier density of the films, (2.92 ± 0.02) × 1019 cm-3 (SnO2) and (1.63 ± 0.03) × 1020 cm-3 (FTO), caused by anionic substitution. It is confirmed that varying the temperature (K) enhances the electron transport properties. The obtained Seebeck coefficient (S) increases as the temperature is increased, up to 360 K. The synthesized films exhibit the S value of -234 ± 3 μV/K (SnO2) and -204 ± 3 μV/K (FTO) at 360 K. The estimated power factor (PF) drastically increases from ~70 (μW/m·K2) to ~900 (μW/m·K2) for the SnO2 and FTO film, respectively.
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Affiliation(s)
- Karuppiah Deva Arun Kumar
- Groupe de Recherches sur l’Énergétique des Milieux Ionisés, GREMI, Université d’Orléans, CNRS, 14 Rue d’Issoudun, 45067 Orléans, France (S.N.); (W.K.); (B.A.)
- Department of Physics, Arul Anandar College, Madurai 625514, India
| | - S. Valanarasu
- Department of Physics, Arul Anandar College, Madurai 625514, India
| | - Alex Capelle
- Groupe de Recherches sur l’Énergétique des Milieux Ionisés, GREMI, Université d’Orléans, CNRS, 14 Rue d’Issoudun, 45067 Orléans, France (S.N.); (W.K.); (B.A.)
| | - Sibel Nar
- Groupe de Recherches sur l’Énergétique des Milieux Ionisés, GREMI, Université d’Orléans, CNRS, 14 Rue d’Issoudun, 45067 Orléans, France (S.N.); (W.K.); (B.A.)
- Laboratoire Nanotechnologies et Nanosystèmes (LN2)-CNRS IRL-3463, Université de Sherbrooke, Sherbrooke, QC J1K OA5, Canada
| | - Wael Karim
- Groupe de Recherches sur l’Énergétique des Milieux Ionisés, GREMI, Université d’Orléans, CNRS, 14 Rue d’Issoudun, 45067 Orléans, France (S.N.); (W.K.); (B.A.)
| | - Arnaud Stolz
- Groupe de Recherches sur l’Énergétique des Milieux Ionisés, GREMI, Université d’Orléans, CNRS, 14 Rue d’Issoudun, 45067 Orléans, France (S.N.); (W.K.); (B.A.)
| | - Barthélemy Aspe
- Groupe de Recherches sur l’Énergétique des Milieux Ionisés, GREMI, Université d’Orléans, CNRS, 14 Rue d’Issoudun, 45067 Orléans, France (S.N.); (W.K.); (B.A.)
| | - Nadjib Semmar
- Groupe de Recherches sur l’Énergétique des Milieux Ionisés, GREMI, Université d’Orléans, CNRS, 14 Rue d’Issoudun, 45067 Orléans, France (S.N.); (W.K.); (B.A.)
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Sagidolda Y, Yergaliyeva S, Tolepov Z, Ismailova G, Orynbay B, Nemkayeva R, Prikhodko O, Peshaya S, Maksimova S, Guseinov N, Mukhametkarimov Y. Peculiarities of the Structure of Au-TiO 2 and Au-WO 3 Plasmonic Nanocomposites. Materials (Basel) 2023; 16:6809. [PMID: 37895790 PMCID: PMC10608088 DOI: 10.3390/ma16206809] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/18/2023] [Revised: 10/19/2023] [Accepted: 10/20/2023] [Indexed: 10/29/2023]
Abstract
As nanotechnology continues to advance, the study of nanocomposites and their unique properties is at the forefront of research. There are still various blank spots in understanding the behavior of such composite materials, especially regarding plasmonic effects like localized surface plasmon resonance (LSPR) which is essential for developing advanced nanotechnologies. In this work, we explore the structural properties of composite thin films consisting of oxide matrices and gold nanoparticles (Au NPs), which were prepared by radio-frequency magnetron sputtering. Titanium dioxide (TiO2) and tungsten trioxide (WO3) were chosen as the host matrices of the composites. Such composite thin films owing to the presence of Au NPs demonstrate the LSPR phenomenon in the visible region. It is shown, that spectroscopic study, in particular, Raman spectroscopy can reveal peculiar features of structures of such composite systems due to LSPR and photoluminescence (PL) of Au NPs in the visible spectrum. In particular, defect peaks of TiO2 (700-720 cm-1) or WO3 (935 cm-1) in Raman spectra can be clearly observed when the samples are illuminated with a 633 nm excitation laser. Excitation with 532 nm leads to a decrease in the intensity of the defect peak, which totally disappears at 473 nm excitation. Such dependences of the defect peaks on excitation laser wavelength are probably related to the polarization of the matrix's defective regions close to the interface with gold NPs.
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Affiliation(s)
- Yerulan Sagidolda
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
- National Nanotechnology Laboratory of Open Type, Al-Farabi av. 71/23, Almaty 050040, Kazakhstan
| | - Saule Yergaliyeva
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
| | - Zhandos Tolepov
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
- National Nanotechnology Laboratory of Open Type, Al-Farabi av. 71/23, Almaty 050040, Kazakhstan
| | - Guzal Ismailova
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
| | - Bakytzhan Orynbay
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
- National Nanotechnology Laboratory of Open Type, Al-Farabi av. 71/23, Almaty 050040, Kazakhstan
| | - Renata Nemkayeva
- National Nanotechnology Laboratory of Open Type, Al-Farabi av. 71/23, Almaty 050040, Kazakhstan
| | - Oleg Prikhodko
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
| | - Svetlana Peshaya
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
| | - Suyumbika Maksimova
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
| | - Nazim Guseinov
- National Nanotechnology Laboratory of Open Type, Al-Farabi av. 71/23, Almaty 050040, Kazakhstan
| | - Yerzhan Mukhametkarimov
- Department of Physics and Technology, Al-Farabi Kazakh National University, Al-Farabi av. 71, Almaty 050040, Kazakhstan; (Y.S.); (O.P.); (S.P.)
- National Nanotechnology Laboratory of Open Type, Al-Farabi av. 71/23, Almaty 050040, Kazakhstan
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Napari M, Huq TN, Meeth DJ, Heikkilä MJ, Niang KM, Wang H, Iivonen T, Wang H, Leskelä M, Ritala M, Flewitt AJ, Hoye RLZ, MacManus-Driscoll JL. Role of ALD Al 2O 3 Surface Passivation on the Performance of p-Type Cu 2O Thin Film Transistors. ACS Appl Mater Interfaces 2021; 13:4156-4164. [PMID: 33443398 DOI: 10.1021/acsami.0c18915] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
High-performance p-type oxide thin film transistors (TFTs) have great potential for many semiconductor applications. However, these devices typically suffer from low hole mobility and high off-state currents. We fabricated p-type TFTs with a phase-pure polycrystalline Cu2O semiconductor channel grown by atomic layer deposition (ALD). The TFT switching characteristics were improved by applying a thin ALD Al2O3 passivation layer on the Cu2O channel, followed by vacuum annealing at 300 °C. Detailed characterization by transmission electron microscopy-energy dispersive X-ray analysis and X-ray photoelectron spectroscopy shows that the surface of Cu2O is reduced following Al2O3 deposition and indicates the formation of a 1-2 nm thick CuAlO2 interfacial layer. This, together with field-effect passivation caused by the high negative fixed charge of the ALD Al2O3, leads to an improvement in the TFT performance by reducing the density of deep trap states as well as by reducing the accumulation of electrons in the semiconducting layer in the device off-state.
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Affiliation(s)
- Mari Napari
- Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, U.K
| | - Tahmida N Huq
- Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, U.K
| | - David J Meeth
- Electrical Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, U.K
| | - Mikko J Heikkilä
- Department of Chemistry, University of Helsinki, Helsinki FI-00014, Finland
| | - Kham M Niang
- Electrical Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, U.K
| | - Han Wang
- School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
| | - Tomi Iivonen
- Department of Chemistry, University of Helsinki, Helsinki FI-00014, Finland
| | - Haiyan Wang
- School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
| | - Markku Leskelä
- Department of Chemistry, University of Helsinki, Helsinki FI-00014, Finland
| | - Mikko Ritala
- Department of Chemistry, University of Helsinki, Helsinki FI-00014, Finland
| | - Andrew J Flewitt
- Electrical Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, U.K
| | - Robert L Z Hoye
- Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, U.K
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Jung H, Oh IK, Yoon CM, Park BE, Lee S, Kwon O, Lee WJ, Kwon SH, Kim WH, Kim H. Effects of Ar Addition to O 2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films. ACS Appl Mater Interfaces 2018; 10:40286-40293. [PMID: 30358984 DOI: 10.1021/acsami.8b14244] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
A method for significantly increasing the growth rates (GRs) of high- k oxide thin films grown via plasma-enhanced atomic layer deposition (PE-ALD) by enhancing the plasma density through the addition of Ar gas to the O2 plasma oxidant was developed. This approach led to improvements of ∼60% in the saturation GRs of PE-ALD ZrO2, HfO2, and SiO2. Furthermore, despite the significantly higher GR enabled by PE-ALD, the mechanical and dielectric properties of the PE-ALD oxide films were similar or even superior to those of films grown via the conventional O2 plasma process. Optical emission spectroscopy analyses in conjunction with theoretical calculation of the electron energy distribution function revealed that adding Ar gas to the O2 plasma increased the density of high-energy electrons, thereby generating more O2 plasma species, such as ions and radicals, which played a key role in improving the GRs and the properties of the films. This promising approach is expected to facilitate the high-volume manufacturing of films via PE-ALD, especially for use as gate insulators in thin-film transistor-based devices in the display industry.
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Affiliation(s)
- Hanearl Jung
- School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-Ro , Seodaemun-Gu, Seoul 03722 , Republic of Korea
| | - Il-Kwon Oh
- School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-Ro , Seodaemun-Gu, Seoul 03722 , Republic of Korea
| | - Chang Mo Yoon
- School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-Ro , Seodaemun-Gu, Seoul 03722 , Republic of Korea
| | - Bo-Eun Park
- School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-Ro , Seodaemun-Gu, Seoul 03722 , Republic of Korea
| | - Sanghun Lee
- School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-Ro , Seodaemun-Gu, Seoul 03722 , Republic of Korea
| | - Ohyung Kwon
- Korea Institute of Industrial Technology, Gangwon Regional Division , 137-41, Gwahakdanji-ro , Sacheon-myeon, Gangneung-si , Gangwon-do 25440 , Republic of Korea
| | - Woo Jae Lee
- School of Materials Science and Engineering , Pusan National University , 30 Jangjeon-Dong , Geumjeong-Gu, Busan 46241 , Republic of Korea
| | - Se-Hun Kwon
- School of Materials Science and Engineering , Pusan National University , 30 Jangjeon-Dong , Geumjeong-Gu, Busan 46241 , Republic of Korea
| | - Woo-Hee Kim
- Division of Advanced Materials Engineering , Chonbuk National University , 567 Baekje-daero , Deokjin-gu, Jeonju-si , Jeollabuk-do 54896 , Republic of Korea
| | - Hyungjun Kim
- School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-Ro , Seodaemun-Gu, Seoul 03722 , Republic of Korea
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Lorenz M, Hirsch D, Patzig C, Höche T, Hohenberger S, Hochmuth H, Lazenka V, Temst K, Grundmann M. Correlation of Interface Impurities and Chemical Gradients with High Magnetoelectric Coupling Strength in Multiferroic BiFeO 3-BaTiO 3 Superlattices. ACS Appl Mater Interfaces 2017; 9:18956-18965. [PMID: 28508622 DOI: 10.1021/acsami.7b04084] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
The detailed understanding of magnetoelectric (ME) coupling in multiferroic oxide heterostructures is still a challenge. In particular, very little is known to date concerning the impact of the chemical interface structure and unwanted impurities that may be buried within short-period multiferroic BiFeO3-BaTiO3 superlattices during growth. Here, we demonstrate how trace impurities and elemental concentration gradients contribute to high ME voltage coefficients in thin-film superlattices, which are built from 15 double layers of BiFeO3-BaTiO3. Surprisingly, the highest ME voltage coefficient of 55 V cm-1 Oe-1 at 300 K was measured for a superlattice with a few atomic percent of Ba and Ti that diffused into the nominally 5 nm thin BiFeO3 layers, according to analytical transmission electron microscopy. In addition, highly sensitive enhancements of the cation signals were observed in depth profiles by secondary ion mass spectrometry at the interfaces of BaTiO3 and BiFeO3. As these interface features correlate with the ME performance of the samples, they point to the importance of charge effects at the interfaces, that is, to a possible charge mediation of ME coupling in oxide superlattices. The challenge is to provide cleaner materials and processes, as well as a well-defined control of the chemical interface structure, to push forward the application of oxide superlattices in multiferroic ME devices.
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Affiliation(s)
- Michael Lorenz
- Semiconductor Physics Group, Felix-Bloch-Institut für Festkörperphysik, Universität Leipzig , D-04103 Leipzig, Germany
| | - Dietmar Hirsch
- Physikalische Abteilung, Leibniz-Institut für Oberflächenmodifizierung e.V. , D-04318 Leipzig, Germany
| | - Christian Patzig
- Center for Applied Microstructure Diagnostics, Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen , D-06120 Halle, Germany
| | - Thomas Höche
- Center for Applied Microstructure Diagnostics, Fraunhofer-Institut für Mikrostruktur von Werkstoffen und Systemen , D-06120 Halle, Germany
| | - Stefan Hohenberger
- Semiconductor Physics Group, Felix-Bloch-Institut für Festkörperphysik, Universität Leipzig , D-04103 Leipzig, Germany
| | - Holger Hochmuth
- Semiconductor Physics Group, Felix-Bloch-Institut für Festkörperphysik, Universität Leipzig , D-04103 Leipzig, Germany
| | - Vera Lazenka
- Instituut voor Kern- en Stralingsfysica, KU Leuven , B-3001 Leuven, Belgium
| | - Kristiaan Temst
- Instituut voor Kern- en Stralingsfysica, KU Leuven , B-3001 Leuven, Belgium
| | - Marius Grundmann
- Semiconductor Physics Group, Felix-Bloch-Institut für Festkörperphysik, Universität Leipzig , D-04103 Leipzig, Germany
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Lorenz M, Wagner G, Lazenka V, Schwinkendorf P, Bonholzer M, Van Bael MJ, Vantomme A, Temst K, Oeckler O, Grundmann M. Correlation of High Magnetoelectric Coupling with Oxygen Vacancy Superstructure in Epitaxial Multiferroic BaTiO₃-BiFeO₃ Composite Thin Films. Materials (Basel) 2016; 9:E44. [PMID: 28787843 PMCID: PMC5456545 DOI: 10.3390/ma9010044] [Citation(s) in RCA: 15] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 10/30/2015] [Revised: 12/18/2015] [Accepted: 12/30/2015] [Indexed: 11/17/2022]
Abstract
Epitaxial multiferroic BaTiO₃-BiFeO₃ composite thin films exhibit a correlation between the magnetoelectric (ME) voltage coefficient αME and the oxygen partial pressure during growth. The ME coefficient αME reaches high values up to 43 V/(cm·Oe) at 300 K and at 0.25 mbar oxygen growth pressure. The temperature dependence of αME of the composite films is opposite that of recently-reported BaTiO₃-BiFeO₃ superlattices, indicating that strain-mediated ME coupling alone cannot explain its origin. Probably, charge-mediated ME coupling may play a role in the composite films. Furthermore, the chemically-homogeneous composite films show an oxygen vacancy superstructure, which arises from vacancy ordering on the {111} planes of the pseudocubic BaTiO₃-type structure. This work contributes to the understanding of magnetoelectric coupling as a complex and sensitive interplay of chemical, structural and geometrical issues of the BaTiO₃-BiFeO₃ composite system and, thus, paves the way to practical exploitation of magnetoelectric composites.
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Affiliation(s)
- Michael Lorenz
- Institut für Experimentelle Physik II, Universität Leipzig, Leipzig D-04103, Germany.
| | - Gerald Wagner
- Institut für Mineralogie, Kristallographie und Materialwissenschaft, Universität Leipzig, Leipzig D-04103, Germany.
| | - Vera Lazenka
- Instituut voor Kern- en Stralingsfysica, KU Leuven, Leuven B-3001, Belgium.
| | - Peter Schwinkendorf
- Institut für Experimentelle Physik II, Universität Leipzig, Leipzig D-04103, Germany.
| | - Michael Bonholzer
- Institut für Experimentelle Physik II, Universität Leipzig, Leipzig D-04103, Germany.
| | - Margriet J Van Bael
- Laboratorium voor Vaste-Stoffysica en Magnetisme, KU Leuven, Leuven B-3001, Belgium.
| | - André Vantomme
- Instituut voor Kern- en Stralingsfysica, KU Leuven, Leuven B-3001, Belgium.
| | - Kristiaan Temst
- Instituut voor Kern- en Stralingsfysica, KU Leuven, Leuven B-3001, Belgium.
| | - Oliver Oeckler
- Institut für Mineralogie, Kristallographie und Materialwissenschaft, Universität Leipzig, Leipzig D-04103, Germany.
| | - Marius Grundmann
- Institut für Experimentelle Physik II, Universität Leipzig, Leipzig D-04103, Germany.
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Park M, Do K, Kim J, Son D, Koo JH, Park J, Song JK, Kim JH, Lee M, Hyeon T, Kim DH. Oxide nanomembrane hybrids with enhanced mechano- and thermo-sensitivity for semitransparent epidermal electronics. Adv Healthc Mater 2015; 4:992-7. [PMID: 25808054 DOI: 10.1002/adhm.201500097] [Citation(s) in RCA: 44] [Impact Index Per Article: 4.9] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/10/2015] [Revised: 03/09/2015] [Indexed: 11/08/2022]
Abstract
Oxide nanomembrane hybrids with enhanced mechano- and thermo-sensitivity for semitransparent epidermal electronics are developed. The use of nanomaterials (single wall nanotubes and silver nanoparticles) embedded in the oxide nanomembranes significantly enhances mechanical and thermal sensitivities. These mechanical and thermal sensors are utilized in wheelchair control and hypothermia detection, which are useful for patients with strokes.
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Affiliation(s)
- Minjoon Park
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Kyungsik Do
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Jaemin Kim
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Donghee Son
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Ja Hoon Koo
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Jinkyung Park
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Jun-Kyul Song
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Ji Hoon Kim
- School of Mechanical Engineering; Pusan National University; Busan 609-735 Republic of Korea
| | - Minbaek Lee
- Department of Physics; Inha University; Incheon 402-751 Republic of Korea
| | - Taeghwan Hyeon
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
| | - Dae-Hyeong Kim
- Center for Nanoparticle; Research Institute for Basic Science (IBS); Seoul 151-742 Republic of Korea
- School of Chemical and Biological Engineering; Institute of Chemical Processes; Seoul National University; Seoul 151-742 Republic of Korea
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