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Hur N, Kim Y, Park B, Yoon S, Kim S, Lim DH, Jeong H, Kwon Y, Suh J. Ultralow-Power Programmable 3D Vertical Phase-Change Memory with Heater-All-Around Configuration. SMALL METHODS 2024:e2401381. [PMID: 39498672 DOI: 10.1002/smtd.202401381] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/28/2024] [Revised: 10/24/2024] [Indexed: 11/07/2024]
Abstract
Recent advancements in phase-change memory (PCM) technology have predominantly stemmed from material-level designs, which have led to fast and durable device performances. However, there remains a pressing need to address the enormous energy consumption through device-level electrothermal solutions. Thus, the concept of a 3D heater-all-around (HAA) PCM fabricated along the vertical nanoscale hole of dielectric/metal/dielectric stacks is proposed. The embedded thin metallic heater completely encircles the phase-change material, so it promotes highly localized Joule heating with minimal loss. Hence, a low RESET current density of 6-8 MA cm-2 and operation energy of 150-200 pJ are achieved even for a sizable hole diameter of 300 nm. Beyond the conventional 2D scaling of the bottom electrode contact, it accordingly enhances ≈80% of operational energy efficiency compared to planar PCM with an identical contact area. In addition, reliable memory operations of ≈105 cycles and the 3-bits-per-cell multilevel storage despite ultrathin (<10 nm) sidewall deposition of Ge2Sb2Te5 are optimized. The proposed 3D-scaled HAA-PCM architecture holds promise as a universally applicable backbone for emerging phase-change chalcogenides toward high-density, ultralow-power computing units.
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Affiliation(s)
- Namwook Hur
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
| | - Yechan Kim
- Department of Materials Science and Engineering, Hongik University, Seoul, 04066, Republic of Korea
| | - Beomsung Park
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
| | - Sohui Yoon
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
| | - Seunghwan Kim
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
| | - Dong-Hyeok Lim
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
| | - Hongsik Jeong
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
| | - Yoongwoo Kwon
- Department of Materials Science and Engineering, Hongik University, Seoul, 04066, Republic of Korea
| | - Joonki Suh
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
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2
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Zeng Y, Ma G, Li H, Cheng X, Miao X. Significant Power Consumption Reduction and Speed Boosting in Phase Change Memory with Nanocurrent Channels. NANO LETTERS 2024; 24:12658-12665. [PMID: 39316704 DOI: 10.1021/acs.nanolett.4c03900] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/26/2024]
Abstract
The excessive power consumption is challenging for phase change memory (PCM) on its way to becoming universal memory in complex hierarchies of memory systems. Here, from the perspective of device structure, by adding a nanocurrent-channel (NCC) layer between the electrode layer and phase change layer, a RESET power consumption reduction by more than 95% and 10 times faster SET speed were realized simultaneously. Through the first principle calculations, Au and SiO2 were screened as the metal and insulating matrix material of NCC layer, respectively. Our PCM device with a Au-SiO2 NCC layer shows an ultralow RESET power consumption, down to 381 fJ, and an ultrafast SET speed (8 ns). Much higher current density near NCC in the phase change layer and thermal barrier effect of insulating matrix material were confirmed by finite element analysis (FEA), and the role of Au nanochannels was revealed by transmission electron microscopy (TEM). Our NCC layer structure provides a simple and practicable method to significantly decrease PCM power consumption.
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Affiliation(s)
- Yuntao Zeng
- School of Integrated Circuits, Hubei Key Laboratory for Advanced Memories, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Ge Ma
- School of Integrated Circuits, Hubei Key Laboratory for Advanced Memories, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Han Li
- School of Integrated Circuits, Hubei Key Laboratory for Advanced Memories, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Xiaomin Cheng
- School of Integrated Circuits, Hubei Key Laboratory for Advanced Memories, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Xiangshui Miao
- School of Integrated Circuits, Hubei Key Laboratory for Advanced Memories, Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
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3
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Shuang Y, Mori S, Yamamoto T, Hatayama S, Saito Y, Fons PJ, Song YH, Hong JP, Ando D, Sutou Y. Soret-Effect Induced Phase-Change in a Chromium Nitride Semiconductor Film. ACS NANO 2024; 18:21135-21143. [PMID: 39088786 PMCID: PMC11328172 DOI: 10.1021/acsnano.4c03574] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/03/2024]
Abstract
Phase-change materials such as Ge-Sb-Te (GST) exhibiting amorphous and crystalline phases can be used for phase-change random-access memory (PCRAM). GST-based PCRAM has been applied as a storage-class memory; however, its relatively low ON/OFF ratio and the large Joule heating energy required for the RESET process (amorphization) significantly limit the storage density. This study proposes a phase-change nitride, CrN, with a much wider programming window (ON/OFF ratio more than 105) and lower RESET energy (one order of magnitude reduction from GST). High-resolution transmission electron microscopy revealed a phase-change from the low-resistance cubic CrN phase into the highly resistive hexagonal CrN2 phase induced by the Soret-effect. The proposed phase-change nitride could greatly expand the scope of conventional phase-change chalcogenides and offer a strategy for the next-generation of PCRAM, enabling a large ON/OFF ratio (∼105), low switching energy (∼100 pJ), and fast operation (∼30 ns).
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Affiliation(s)
- Yi Shuang
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan
| | - Shunsuke Mori
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Takuya Yamamoto
- Department of Metallurgy, Graduate School of Engineering, Tohoku University, Miyagi 980-8579, Japan
| | - Shogo Hatayama
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Yuta Saito
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba 305-8568, Japan
| | - Paul J Fons
- Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama, Kanagawa 223-8522, Japan
| | - Yun-Heub Song
- Department of Electronic Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
| | - Jin-Pyo Hong
- Department of Physics, Hanyang University, Seoul 04763, Korea
| | - Daisuke Ando
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Yuji Sutou
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
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4
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Kim DH, Park SW, Choi JY, Lee HJ, Oh JS, Joo JM, Kim TG. Phase Change Heterostructure Memory with Oxygen-Doped Sb 2Te 3 Layers for Improved Durability and Reliability through Nano crystalline Island Formation. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2312249. [PMID: 38618929 DOI: 10.1002/smll.202312249] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/29/2023] [Revised: 02/27/2024] [Indexed: 04/16/2024]
Abstract
Phase-change random access memory represents a notable advancement in nonvolatile memory technology; however, it faces challenges in terms of thermal stability and reliability, hindering its broader application. To mitigate these issues, doping and structural modification techniques such as phase-change heterostructures (PCH) are widely studied. Although doping typically enhances thermal stability, it can adversely affect the switching speed. Structural modifications such as PCH have struggled to sustain stable performance under high atmospheric conditions. In this study, these challenges are addressed by synergizing oxygen-doped Sb2Te3 (OST) with PCH technology. This study presents a novel approach in which OST significantly improves the crystallization temperature, power efficiency, and cyclability. Subsequently, the integration of the PCH technology bolsters the switching speed and further amplifies the device's reliability and endurance by refining the grain size (≈7 nm). The resultant OST-PCH devices exhibit exceptional performance metrics, including a drift coefficient of 0.003 in the RESET state, endurance of ≈4 × 108 cycles, an switching speed of 300 ns, and 67.6 pJ of RESET energy. These findings suggest that the OST-PCH devices show promise for integration into embedded systems, such as those found in automotive applications and Internet of Things devices.
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Affiliation(s)
- Dong Hyun Kim
- School of Electrical Engineering, Korea University, Seongbuk-gu, Seoul, 02841, South Korea
| | - Seung Woo Park
- School of Electrical Engineering, Korea University, Seongbuk-gu, Seoul, 02841, South Korea
| | - Jun Young Choi
- School of Electrical Engineering, Korea University, Seongbuk-gu, Seoul, 02841, South Korea
| | - Ho Jin Lee
- School of Electrical Engineering, Korea University, Seongbuk-gu, Seoul, 02841, South Korea
| | - Jin Suk Oh
- School of Electrical Engineering, Korea University, Seongbuk-gu, Seoul, 02841, South Korea
| | - Jong Min Joo
- School of Electrical Engineering, Korea University, Seongbuk-gu, Seoul, 02841, South Korea
| | - Tae Geun Kim
- School of Electrical Engineering, Korea University, Seongbuk-gu, Seoul, 02841, South Korea
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5
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Park SO, Hong S, Sung SJ, Kim D, Seo S, Jeong H, Park T, Cho WJ, Kim J, Choi S. Phase-change memory via a phase-changeable self-confined nano-filament. Nature 2024; 628:293-298. [PMID: 38570686 DOI: 10.1038/s41586-024-07230-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/05/2023] [Accepted: 02/23/2024] [Indexed: 04/05/2024]
Abstract
Phase-change memory (PCM) has been considered a promising candidate for solving von Neumann bottlenecks owing to its low latency, non-volatile memory property and high integration density1,2. However, PCMs usually require a large current for the reset process by melting the phase-change material into an amorphous phase, which deteriorates the energy efficiency2-5. Various studies have been conducted to reduce the operation current by minimizing the device dimensions, but this increases the fabrication cost while the reduction of the reset current is limited6,7. Here we show a device for reducing the reset current of a PCM by forming a phase-changeable SiTex nano-filament. Without sacrificing the fabrication cost, the developed nano-filament PCM achieves an ultra-low reset current (approximately 10 μA), which is about one to two orders of magnitude smaller than that of highly scaled conventional PCMs. The device maintains favourable memory characteristics such as a large on/off ratio, fast speed, small variations and multilevel memory properties. Our finding is an important step towards developing novel computing paradigms for neuromorphic computing systems, edge processors, in-memory computing systems and even for conventional memory applications.
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Affiliation(s)
- See-On Park
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Seokman Hong
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Su-Jin Sung
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Dawon Kim
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Seokho Seo
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Hakcheon Jeong
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Taehoon Park
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea
| | - Won Joon Cho
- Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics Co., Ltd., Suwon, Republic of Korea
| | - Jeehwan Kim
- Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics Co., Ltd., Suwon, Republic of Korea
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Shinhyun Choi
- The School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Republic of Korea.
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6
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Meng Y, Yang D, Jiang X, Bando Y, Wang X. Thermal Conductivity Enhancement of Polymeric Composites Using Hexagonal Boron Nitride: Design Strategies and Challenges. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:331. [PMID: 38392704 PMCID: PMC10893155 DOI: 10.3390/nano14040331] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/21/2023] [Revised: 02/02/2024] [Accepted: 02/05/2024] [Indexed: 02/24/2024]
Abstract
With the integration and miniaturization of chips, there is an increasing demand for improved heat dissipation. However, the low thermal conductivity (TC) of polymers, which are commonly used in chip packaging, has seriously limited the development of chips. To address this limitation, researchers have recently shown considerable interest in incorporating high-TC fillers into polymers to fabricate thermally conductive composites. Hexagonal boron nitride (h-BN) has emerged as a promising filler candidate due to its high-TC and excellent electrical insulation. This review comprehensively outlines the design strategies for using h-BN as a high-TC filler and covers intrinsic TC and morphology effects, functionalization methods, and the construction of three-dimensional (3D) thermal conduction networks. Additionally, it introduces some experimental TC measurement techniques of composites and theoretical computational simulations for composite design. Finally, the review summarizes some effective strategies and possible challenges for the design of h-BN fillers. This review provides researchers in the field of thermally conductive polymeric composites with a comprehensive understanding of thermal conduction and constructive guidance on h-BN design.
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Affiliation(s)
- Yuhang Meng
- National Laboratory of Solid State Microstructures (NLSSM), Collaborative Innovation Center of Advanced Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China
| | - Dehong Yang
- National Laboratory of Solid State Microstructures (NLSSM), Collaborative Innovation Center of Advanced Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China
| | - Xiangfen Jiang
- State Key Laboratory of Mechanics and Control of Mechanical Structures, Key Laboratory for Intelligent Nano Materials and Devices of the Ministry of Education, College of Material Science and Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China
| | - Yoshio Bando
- Chemistry Department, College of Science, King Saud University, Riyadh 11451, Saudi Arabia
- Australian Institute for Innovative Materials, University of Wollongong, Wollongong, NSW 2500, Australia
| | - Xuebin Wang
- National Laboratory of Solid State Microstructures (NLSSM), Collaborative Innovation Center of Advanced Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Nanjing University, Nanjing 210093, China
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7
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Long H, Liao W, Liu R, Zeng R, Li Q, Zhao L. Significantly Improve the Thermal Conductivity and Dielectric Performance of Epoxy Composite by Introducing Boron Nitride and POSS. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:205. [PMID: 38251169 PMCID: PMC10818431 DOI: 10.3390/nano14020205] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/06/2023] [Revised: 12/28/2023] [Accepted: 12/30/2023] [Indexed: 01/23/2024]
Abstract
Dielectric materials with superb thermal and electrical properties are highly desired for high-voltage electrical equipment and advanced electronics. Here, we propose a novel strategy to improve the performance of epoxy composites by employing boron nitride nanosheets (BNNSs) and γ-glycidyl ether oxypropyl sesimoxane (G-POSS) as functional fillers. The resultant ternary epoxy composites exhibit high electrical resistivity (1.63 × 1013 Ω·cm) and low dielectric loss (<0.01) due to the ultra-low dielectric constants of cage-structure of G-POSS. In addition, a high thermal conductivity of 0.3969 W·m-1·K-1 is achieved for the epoxy composites, which is 114.66% higher than that of pure epoxy resin. This can be attributed to the high aspect ratio and excellent thermally conductive characteristics of BNNSs, promoting phonon propagation in the composites. Moreover, the epoxy composite simultaneously possesses remarkable dynamic mechanical properties and thermal stability. It is believed that this work provides a universal strategy for designing and fabricating multifunctional composites using a combination of different functional fillers.
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Affiliation(s)
- Hongnian Long
- College of Electrical Engineering, Sichuan University, Chengdu 610065, China
| | - Wenlong Liao
- Electric Power Research Institute, State Grid Corporation of Sichuan Province, Chengdu 610072, China
| | - Rui Liu
- Electric Power Research Institute, State Grid Corporation of Sichuan Province, Chengdu 610072, China
| | - Ruichi Zeng
- College of Electrical Engineering, Sichuan University, Chengdu 610065, China
| | - Qihan Li
- College of Aviation Engineering, Civil Aviation Flight University of China, Guanghan 618307, China
| | - Lihua Zhao
- College of Electrical Engineering, Sichuan University, Chengdu 610065, China
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8
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Adam-Cervera I, Huerta-Recasens J, Gómez CM, Culebras M, Muñoz-Espí R. Nanoencapsulation of Organic Phase Change Materials in Poly(3,4-Ethylenedioxythiophene) for Energy Storage and Conversion. Polymers (Basel) 2023; 16:100. [PMID: 38201765 PMCID: PMC10780879 DOI: 10.3390/polym16010100] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/29/2023] [Revised: 12/23/2023] [Accepted: 12/26/2023] [Indexed: 01/12/2024] Open
Abstract
This work focuses on the encapsulation of two organic phase change materials (PCMs), hexadecane and octadecane, through the formation of nanocapsules of the conducting polymer poly(3,4-ethylenedioxythiophene) (PEDOT) obtained by oxidative polymerization in miniemulsion. The energy storage capacity of nanoparticles is studied by preparing polymer films on supporting substrates. The results indicate that the prepared systems can store and later release thermal energy in the form of latent heat efficiently, which is of vital importance to increase the efficiency of future thermoelectric devices.
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Affiliation(s)
| | | | | | - Mario Culebras
- Institute of Materials Science (ICMUV), University of Valencia, Catedràtic José Beltrán 2, 46980 Paterna, Spain; (I.A.-C.); (J.H.-R.); (C.M.G.)
| | - Rafael Muñoz-Espí
- Institute of Materials Science (ICMUV), University of Valencia, Catedràtic José Beltrán 2, 46980 Paterna, Spain; (I.A.-C.); (J.H.-R.); (C.M.G.)
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Haensch W, Raghunathan A, Roy K, Chakrabarti B, Phatak CM, Wang C, Guha S. Compute in-Memory with Non-Volatile Elements for Neural Networks: A Review from a Co-Design Perspective. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2204944. [PMID: 36579797 DOI: 10.1002/adma.202204944] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/31/2022] [Revised: 11/01/2022] [Indexed: 06/17/2023]
Abstract
Deep learning has become ubiquitous, touching daily lives across the globe. Today, traditional computer architectures are stressed to their limits in efficiently executing the growing complexity of data and models. Compute-in-memory (CIM) can potentially play an important role in developing efficient hardware solutions that reduce data movement from compute-unit to memory, known as the von Neumann bottleneck. At its heart is a cross-bar architecture with nodal non-volatile-memory elements that performs an analog multiply-and-accumulate operation, enabling the matrix-vector-multiplications repeatedly used in all neural network workloads. The memory materials can significantly influence final system-level characteristics and chip performance, including speed, power, and classification accuracy. With an over-arching co-design viewpoint, this review assesses the use of cross-bar based CIM for neural networks, connecting the material properties and the associated design constraints and demands to application, architecture, and performance. Both digital and analog memory are considered, assessing the status for training and inference, and providing metrics for the collective set of properties non-volatile memory materials will need to demonstrate for a successful CIM technology.
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Affiliation(s)
- Wilfried Haensch
- Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Anand Raghunathan
- Department of Electrical Engineering, Purdue University, West Lafayette, IN, 47907, USA
| | - Kaushik Roy
- Department of Electrical Engineering, Purdue University, West Lafayette, IN, 47907, USA
| | - Bhaswar Chakrabarti
- Department of Electrical Engineering, Indian Institute of Technology Madras, Chennai, Tamil Nadu, 600036, India
| | - Charudatta M Phatak
- Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Cheng Wang
- Department of Electrical Engineering, Purdue University, West Lafayette, IN, 47907, USA
| | - Supratik Guha
- Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, 60637, USA
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10
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Shuang Y, Chen Q, Kim M, Wang Y, Saito Y, Hatayama S, Fons P, Ando D, Kubo M, Sutou Y. NbTe 4 Phase-Change Material: Breaking the Phase-Change Temperature Balance in 2D Van der Waals Transition-Metal Binary Chalcogenide. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2303646. [PMID: 37338024 DOI: 10.1002/adma.202303646] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/19/2023] [Revised: 06/13/2023] [Indexed: 06/21/2023]
Abstract
2D van der Waals (vdW) transition metal di-chalcogenides (TMDs) have garnered significant attention in the nonvolatile memory field for their tunable electrical properties, scalability, and potential for phase engineering. However, their complex switching mechanism and complicated fabrication methods pose challenges for mass production. Sputtering is a promising technique for large-area 2D vdW TMD fabrication, but the high melting point (typically Tm > 1000 °C) of TMDs requires elevated temperatures for good crystallinity. This study focuses on the low-Tm 2D vdW TM tetra-chalcogenides and identifies NbTe4 as a promising candidate with an ultra-low Tm of around 447 °C (onset temperature). As-grown NbTe4 forms an amorphous phase upon deposition that can be crystallized by annealing at temperatures above 272 °C. The simultaneous presence of a low Tm and a high crystallization temperature Tc can resolve important issues facing current phase-change memory compounds, such as high Reset energies and poor thermal stability of the amorphous phase. Therefore, NbTe4 holds great promise as a potential solution to these issues.
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Affiliation(s)
- Yi Shuang
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai, 980-8577, Japan
| | - Qian Chen
- New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba, Aramaki, Aoba-ku, Sendai, 980-8579, Japan
- Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Japan
| | - Mihyeon Kim
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
| | - Yinli Wang
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
| | - Yuta Saito
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, 305-8568, Japan
| | - Shogo Hatayama
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba, 305-8568, Japan
| | - Paul Fons
- Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama, Kanagawa, 223-8522, Japan
| | - Daisuke Ando
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
| | - Momoji Kubo
- New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aoba, Aramaki, Aoba-ku, Sendai, 980-8579, Japan
- Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Japan
| | - Yuji Sutou
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai, 980-8577, Japan
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai, 980-8579, Japan
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11
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Viti L, Riccardi E, Beere HE, Ritchie DA, Vitiello MS. Real-Time Measure of the Lattice Temperature of a Semiconductor Heterostructure Laser via an On-Chip Integrated Graphene Thermometer. ACS NANO 2023; 17:6103-6112. [PMID: 36883532 PMCID: PMC10062027 DOI: 10.1021/acsnano.3c01208] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/08/2023] [Accepted: 02/24/2023] [Indexed: 06/18/2023]
Abstract
The on-chip integration of two-dimensional nanomaterials, having exceptional optical, electrical, and thermal properties, with terahertz (THz) quantum cascade lasers (QCLs) has recently led to wide spectral tuning, nonlinear high-harmonic generation, and pulse generation. Here, we transfer a large area (1 × 1 cm2) multilayer graphene (MLG), to lithographically define a microthermometer, on the bottom contact of a single-plasmon THz QCL to monitor, in real-time, its local lattice temperature during operation. We exploit the temperature dependence of the MLG electrical resistance to measure the local heating of the QCL chip. The results are further validated through microprobe photoluminescence experiments, performed on the front-facet of the electrically driven QCL. We extract a heterostructure cross-plane conductivity of k⊥= 10.2 W/m·K, in agreement with previous theoretical and experimental reports. Our integrated system endows THz QCLs with a fast (∼30 ms) temperature sensor, providing a tool to reach full electrical and thermal control on laser operation. This can be exploited, inter alia, to stabilize the emission of THz frequency combs, with potential impact on quantum technologies and high-precision spectroscopy.
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Affiliation(s)
- Leonardo Viti
- NEST, CNR - Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy
| | - Elisa Riccardi
- NEST, CNR - Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy
| | - Harvey E. Beere
- Cavendish
Laboratory, University of Cambridge, Cambridge CB3 0HE, U.K.
| | - David A. Ritchie
- Cavendish
Laboratory, University of Cambridge, Cambridge CB3 0HE, U.K.
| | - Miriam S. Vitiello
- NEST, CNR - Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy
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12
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Zhang J, Fang W, Wang R, Li C, Zheng J, Zou X, Song S, Song Z, Zhou X. Nanoscale Phase Change Material Array by Sub-Resolution Assist Feature for Storage Class Memory Application. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:1050. [PMID: 36985944 PMCID: PMC10059855 DOI: 10.3390/nano13061050] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/19/2023] [Revised: 03/09/2023] [Accepted: 03/12/2023] [Indexed: 06/18/2023]
Abstract
High density phase change memory array requires both minimized critical dimension (CD) and maximized process window for the phase change material layer. High in-wafer uniformity of the nanoscale patterning of chalcogenides material is challenging given the optical proximity effect (OPE) in the lithography process and the micro-loading effect in the etching process. In this study, we demonstrate an approach to fabricate high density phase change material arrays with half-pitch down to around 70 nm by the co-optimization of lithography and plasma etching process. The focused-energy matrix was performed to improve the pattern process window of phase change material on a 12-inch wafer. A variety of patternings from an isolated line to a dense pitch line were investigated using immersion lithography system. The collapse of the edge line is observed due to the OPE induced shrinkage in linewidth, which is deteriorative as the patterning density increases. The sub-resolution assist feature (SRAF) was placed to increase the width of the lines at both edges of each patterning by taking advantage of the optical interference between the main features and the assistant features. The survival of the line at the edges is confirmed with around a 70 nm half-pitch feature in various arrays. A uniform etching profile across the pitch line pattern of phase change material was demonstrated in which the micro-loading effect and the plasma etching damage were significantly suppressed by co-optimizing the etching parameters. The results pave the way to achieve high density device arrays with improved uniformity and reliability for mass storage applications.
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Affiliation(s)
- Jiarui Zhang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
| | - Wencheng Fang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Ruobing Wang
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Chengxing Li
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Jia Zheng
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Xixi Zou
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
| | - Sannian Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
| | - Xilin Zhou
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
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13
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Yoo C, Jeon JW, Yoon S, Cheng Y, Han G, Choi W, Park B, Jeon G, Jeon S, Kim W, Zheng Y, Lee J, Ahn J, Cho S, Clendenning SB, Karpov IV, Lee YK, Choi JH, Hwang CS. Atomic Layer Deposition of Sb 2 Te 3 /GeTe Superlattice Film and Its Melt-Quenching-Free Phase-Transition Mechanism for Phase-Change Memory. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2207143. [PMID: 36271720 DOI: 10.1002/adma.202207143] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/05/2022] [Revised: 10/11/2022] [Indexed: 06/16/2023]
Abstract
Atomic layer deposition (ALD) of Sb2 Te3 /GeTe superlattice (SL) film on planar and vertical sidewall areas containing TiN metal and SiO2 insulator is demonstrated. The peculiar chemical affinity of the ALD precursor to the substrate surface and the 2D nature of the Sb2 Te3 enable the growth of an in situ crystallized SL film with a preferred orientation. The SL film shows a reduced reset current of ≈1/7 of the randomly oriented Ge2 Sb2 Te5 alloy. The reset switching is induced by the transition from the SL to the (111)-oriented face-centered-cubic (FCC) Ge2 Sb2 Te5 alloy and subsequent melt-quenching-free amorphization. The in-plane compressive stress, induced by the SL-to-FCC structural transition, enhances the electromigration of Ge along the [111] direction of FCC structure, which enables such a significant improvement. Set operation switches the amorphous to the (111)-oriented FCC structure.
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Affiliation(s)
- Chanyoung Yoo
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Jeong Woo Jeon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Seungjae Yoon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
| | - Yan Cheng
- Key Laboratory of Polar Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Gyuseung Han
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
| | - Wonho Choi
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Byongwoo Park
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Gwangsik Jeon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Sangmin Jeon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Woohyun Kim
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Yonghui Zheng
- Key Laboratory of Polar Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Jongho Lee
- SK Hynix Inc., Icheon, Gyeonggi, 17336, Republic of Korea
| | - Junku Ahn
- SK Hynix Inc., Icheon, Gyeonggi, 17336, Republic of Korea
| | - Sunglae Cho
- SK Hynix Inc., Icheon, Gyeonggi, 17336, Republic of Korea
| | | | - Ilya V Karpov
- Components Research, Intel Corporation, Hillsboro, OR, 97124, USA
| | - Yoon Kyung Lee
- Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, Jeonbuk, 54896, Republic of Korea
| | - Jung-Hae Choi
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
| | - Cheol Seong Hwang
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
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14
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Hatayama S, Yamamoto T, Mori S, Song YH, Sutou Y. Understanding the Origin of Low-Energy Operation Characteristics for Cr 2Ge 2Te 6 Phase-Change Material: Enhancement of Thermal Efficiency in the High-Scaled Memory Device. ACS APPLIED MATERIALS & INTERFACES 2022; 14:44604-44613. [PMID: 36149674 DOI: 10.1021/acsami.2c13189] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Data recording based on the phase transition between amorphous and crystalline phases in a phase-change material (PCM) generally consumes a large amount of operation energy. Heat confinement and scaling down of the contact area between the PCM and electrode are effective strategies for reducing the operation energy in the memory device. Contrary to conventional PCM, such as Ge-Sb-Te compounds (GST), Cr2Ge2Te6 (CrGT) exhibits low thermal conductivity and low-energy memory operation characteristics even in a relatively large contact area. Herein, we show that the operation energy of the CrGT-based memory device is greatly reduced by scaling down. Based on the present results, an operation energy at subpico J order, which was achieved using carbon nanotubes or graphene nanoribbon in the GST-based device, can be realized in the contact area comparable to the product level in the CrGT-based device. The numerical simulation suggests that small thermal and electrical conductivities enhance the thermal efficiency, resulting in a small operation energy for amorphization. It was also found that the residual metastable phase after the amorphization process increased the operation energy for crystallization by the simulation. In other words, these results indicate that further small operation energy can be realized in the CrGT-based device by reducing the metastable phase volume.
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Affiliation(s)
- Shogo Hatayama
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Takuya Yamamoto
- Department of Frontier Sciences for Advanced Environment, Graduate School of Environmental Studies, Tohoku University, Miyagi 980-8579, Japan
- Department of Metallurgy, Graduate School of Engineering, Tohoku University, Miyagi 980-8579, Japan
| | - Shunsuke Mori
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
| | - Yun-Heub Song
- Department of Electronic Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
| | - Yuji Sutou
- Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11 Aoba-yama, Sendai 980-8579, Japan
- WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan
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15
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Lian X, Liu C, Fu J, Liu X, Ren Q, Wan X, Xiao W, Cai Z, Wang L. Design of plasmonic enhanced all-optical phase-change memory for secondary storage applications. NANOTECHNOLOGY 2022; 33:495204. [PMID: 35973383 DOI: 10.1088/1361-6528/ac89f6] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/10/2022] [Accepted: 08/16/2022] [Indexed: 06/15/2023]
Abstract
Phase-change optical device has recently gained tremendous interest due to its ultra-fast transmitting speed, multiplexing and large bandwidth. However, majority of phase-change optical devices are only devoted to on-chip components such as optical tensor core and optical main memory, while developing a secondary storage memory in an optical manner is rarely reported. To address this issue, we propose a novel phase-change optical memory based on plasmonic resonance effects for secondary storage applications. Such design makes use of the plasmonic dimer nanoantenna to generate plasmonic resonance inside the chalcogenide alloy, and thus enables the performance improvements in terms of energy consumption and switching speed. It is found that choosing height, radius, and separation of the plasmonic nanoantenna as 10 nm, 150 nm, and 10 nm, respectively, allows for a write/erase energies of 100 and 240 pJ and a write/erase speed of 10 ns for crystallization and amorphization processes, respectively. Such performance merits encouragingly prevail conventional secondary storage memories and thus pave a route towards the advent of all-optical computer in near future.
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Affiliation(s)
- Xiaojuan Lian
- College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
- National and Local Joint Engineering Laboratory of RF Integration and Micro-Assembly Technology, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Cunhu Liu
- College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Jinke Fu
- College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Xiaoyan Liu
- College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Qingying Ren
- Electrical and Electronic Center, College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Xiang Wan
- College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Wanang Xiao
- Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, People's Republic of China
- Center of Materials Science and Optoelectronics Engineering & School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China
- Jiangsu JITRI Intelligent Integrated Circuit Design Technology Co., Ltd, Wuxi, Jiangsu 214028, People's Republic of China
| | - Zhikuang Cai
- College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Lei Wang
- College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
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16
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Ning J, Wang Y, Teo TY, Huang CC, Zeimpekis I, Morgan K, Teo SL, Hewak DW, Bosman M, Simpson RE. Low Energy Switching of Phase Change Materials Using a 2D Thermal Boundary Layer. ACS APPLIED MATERIALS & INTERFACES 2022; 14:41225-41234. [PMID: 36043468 DOI: 10.1021/acsami.2c12936] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
The switchable optical and electrical properties of phase change materials (PCMs) are finding new applications beyond data storage in reconfigurable photonic devices. However, high power heat pulses are needed to melt-quench the material from crystalline to amorphous. This is especially true in silicon photonics, where the high thermal conductivity of the waveguide material makes heating the PCM energy inefficient. Here, we improve the energy efficiency of the laser-induced phase transitions by inserting a layer of two-dimensional (2D) material, either MoS2 or WS2, between the silica or silicon substrate and the PCM. The 2D material reduces the required laser power by at least 40% during the amorphization (RESET) process, depending on the substrate. Thermal simulations confirm that both MoS2 and WS2 2D layers act as a thermal barrier, which efficiently confines energy within the PCM layer. Remarkably, the thermal insulation effect of the 2D layer is equivalent to a ∼100 nm layer of SiO2. The high thermal boundary resistance induced by the van der Waals (vdW)-bonded layers limits the thermal diffusion through the layer interface. Hence, 2D materials with stable vdW interfaces can be used to improve the thermal efficiency of PCM-tuned Si photonic devices. Furthermore, our waveguide simulations show that the 2D layer does not affect the propagating mode in the Si waveguide; thus, this simple additional thin film produces a substantial energy efficiency improvement without degrading the optical performance of the waveguide. Our findings pave the way for energy-efficient laser-induced structural phase transitions in PCM-based reconfigurable photonic devices.
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Affiliation(s)
- Jing Ning
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
- Department of Materials Science & Engineering, National University of Singapore, 9 Engineering Drive 1, 117575 Singapore
| | - Yunzheng Wang
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
| | - Ting Yu Teo
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
| | - Chung-Che Huang
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Ioannis Zeimpekis
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Katrina Morgan
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Siew Lang Teo
- Institute of Materials Research and Engineering (IMRE), Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis 138634, Singapore
| | - Daniel W Hewak
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Michel Bosman
- Department of Materials Science & Engineering, National University of Singapore, 9 Engineering Drive 1, 117575 Singapore
- Institute of Materials Research and Engineering (IMRE), Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis 138634, Singapore
| | - Robert E Simpson
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
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17
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Zheng C, Simpson RE, Tang K, Ke Y, Nemati A, Zhang Q, Hu G, Lee C, Teng J, Yang JKW, Wu J, Qiu CW. Enabling Active Nanotechnologies by Phase Transition: From Electronics, Photonics to Thermotics. Chem Rev 2022; 122:15450-15500. [PMID: 35894820 DOI: 10.1021/acs.chemrev.2c00171] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Abstract
Phase transitions can occur in certain materials such as transition metal oxides (TMOs) and chalcogenides when there is a change in external conditions such as temperature and pressure. Along with phase transitions in these phase change materials (PCMs) come dramatic contrasts in various physical properties, which can be engineered to manipulate electrons, photons, polaritons, and phonons at the nanoscale, offering new opportunities for reconfigurable, active nanodevices. In this review, we particularly discuss phase-transition-enabled active nanotechnologies in nonvolatile electrical memory, tunable metamaterials, and metasurfaces for manipulation of both free-space photons and in-plane polaritons, and multifunctional emissivity control in the infrared (IR) spectrum. The fundamentals of PCMs are first introduced to explain the origins and principles of phase transitions. Thereafter, we discuss multiphysical nanodevices for electronic, photonic, and thermal management, attesting to the broad applications and exciting promises of PCMs. Emerging trends and valuable applications in all-optical neuromorphic devices, thermal data storage, and encryption are outlined in the end.
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Affiliation(s)
- Chunqi Zheng
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore.,NUS Graduate School, National University of Singapore, Singapore 119077, Singapore
| | - Robert E Simpson
- Engineering Product Development, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore
| | - Kechao Tang
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing 100871, China
| | - Yujie Ke
- Engineering Product Development, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore
| | - Arash Nemati
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore 138634, Singapore
| | - Qing Zhang
- School of Physics, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Guangwei Hu
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
| | - Chengkuo Lee
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
| | - Jinghua Teng
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore 138634, Singapore
| | - Joel K W Yang
- Engineering Product Development, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore.,Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore 138634, Singapore
| | - Junqiao Wu
- Department of Materials Science and Engineering, University of California, Berkeley, and Lawrence Berkeley National Laboratory, California 94720, United States
| | - Cheng-Wei Qiu
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
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18
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Zhang Y, Chen J, Liu S, Jin W, Cheng S, Zhang Y, Liu Z, Zhang J, Yuan L. All-fiber nonvolatile broadband optical switch using an all-optical method. OPTICS LETTERS 2022; 47:3604-3607. [PMID: 35838741 DOI: 10.1364/ol.462200] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/26/2022] [Accepted: 06/30/2022] [Indexed: 06/15/2023]
Abstract
Optical switches based on phase change materials have enormous application potential in optical logic circuits and optical communication systems. Integration of all-optical switching devices with optical fibers is a promising approach for realizing practical applications in enabling the optical fiber to transmit and process signals simultaneously. We describe an all-fiber nonvolatile broadband optical switch using an all-optical method. We use a single optical pulse to modulate the phase change material deposited on the tapered fiber to achieve logical control of the transmitted light. The response time of our optical switch is 80 ns for SET and 200 ns for RESET. Our optical switches can operate in the C-band (1530-1565 nm). The optical switching contrast is 40%. Our approach paves the way for all-optical nonvolatile fiber optic communication.
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19
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Yang Z, Li B, Wang J, Wang X, Xu M, Tong H, Cheng X, Lu L, Jia C, Xu M, Miao X, Zhang W, Ma E. Designing Conductive-Bridge Phase-Change Memory to Enable Ultralow Programming Power. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2022; 9:e2103478. [PMID: 35032111 PMCID: PMC8922100 DOI: 10.1002/advs.202103478] [Citation(s) in RCA: 7] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/09/2021] [Revised: 11/27/2021] [Indexed: 05/31/2023]
Abstract
Phase-change material (PCM) devices are one of the most mature nonvolatile memories. However, their high power consumption remains a bottleneck problem limiting the data storage density. One may drastically reduce the programming power by patterning the PCM volume down to nanometer scale, but that route incurs a stiff penalty from the tremendous cost associated with the complex nanofabrication protocols required. Instead, here a materials solution to resolve this dilemma is offered. The authors work with memory cells of conventional dimensions, but design/exploit a PCM alloy that decomposes into a heterogeneous network of nanoscale crystalline domains intermixed with amorphous ones. The idea is to confine the subsequent phase-change switching in the interface region of the crystalline nanodomain with its amorphous surrounding, forming/breaking "nano-bridges" that link up the crystalline domains into a conductive path. This conductive-bridge switching mechanism thus only involves nanometer-scale volume in programming, despite of the large areas in contact with the electrodes. The pore-like devices based on spontaneously phase-separated Ge13 Sb71 O16 alloy enable a record-low programming energy, down to a few tens of femtojoule. The new PCM/fabrication is fully compatible with the current 3D integration technology, adding no expenses or difficulty in processing.
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Affiliation(s)
- Zhe Yang
- Wuhan National Laboratory for OptoelectronicsSchool of Optical and Electronic InformationHuazhong University of Science and TechnologyWuhan430074China
| | - Bowen Li
- Wuhan National Laboratory for OptoelectronicsSchool of Optical and Electronic InformationHuazhong University of Science and TechnologyWuhan430074China
| | - Jiang‐Jing Wang
- Center for Alloy Innovation and Design (CAID)State Key Laboratory for Mechanical Behavior of MaterialsXi'an Jiaotong UniversityXi'an710049China
| | - Xu‐Dong Wang
- Center for Alloy Innovation and Design (CAID)State Key Laboratory for Mechanical Behavior of MaterialsXi'an Jiaotong UniversityXi'an710049China
| | - Meng Xu
- Wuhan National Laboratory for OptoelectronicsSchool of Optical and Electronic InformationHuazhong University of Science and TechnologyWuhan430074China
| | - Hao Tong
- Wuhan National Laboratory for OptoelectronicsSchool of Optical and Electronic InformationHuazhong University of Science and TechnologyWuhan430074China
| | - Xiaomin Cheng
- Wuhan National Laboratory for OptoelectronicsSchool of Optical and Electronic InformationHuazhong University of Science and TechnologyWuhan430074China
| | - Lu Lu
- The School of MicroelectronicsState Key Laboratory for Mechanical Behavior of MaterialsXi'an Jiaotong UniversityXi'an710049China
| | - Chunlin Jia
- The School of MicroelectronicsState Key Laboratory for Mechanical Behavior of MaterialsXi'an Jiaotong UniversityXi'an710049China
| | - Ming Xu
- Wuhan National Laboratory for OptoelectronicsSchool of Optical and Electronic InformationHuazhong University of Science and TechnologyWuhan430074China
| | - Xiangshui Miao
- Wuhan National Laboratory for OptoelectronicsSchool of Optical and Electronic InformationHuazhong University of Science and TechnologyWuhan430074China
| | - Wei Zhang
- Center for Alloy Innovation and Design (CAID)State Key Laboratory for Mechanical Behavior of MaterialsXi'an Jiaotong UniversityXi'an710049China
| | - En Ma
- Center for Alloy Innovation and Design (CAID)State Key Laboratory for Mechanical Behavior of MaterialsXi'an Jiaotong UniversityXi'an710049China
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20
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Kwon H, Khan AI, Perez C, Asheghi M, Pop E, Goodson KE. Uncovering Thermal and Electrical Properties of Sb 2Te 3/GeTe Superlattice Films. NANO LETTERS 2021; 21:5984-5990. [PMID: 34270270 DOI: 10.1021/acs.nanolett.1c00947] [Citation(s) in RCA: 9] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Superlattice-like phase change memory (SL-PCM) promises lower switching current than conventional PCM based on Ge2Sb2Te5 (GST); however, a fundamental understanding of SL-PCM requires detailed characterization of the interfaces within such an SL. Here we explore the electrical and thermal transport of SLs with deposited Sb2Te3 and GeTe alternating layers of various thicknesses. We find up to an approximately four-fold reduction of the effective cross-plane thermal conductivity of the SL stack (as-deposited polycrystalline) compared with polycrystalline GST (as-deposited amorphous and later annealed) due to the thermal interface resistances within the SL. Thermal measurements with varying periods of our SLs show a signature of phonon coherence with a transition from wave-like to particle-like phonon transport, further described by our modeling. Electrical resistivity measurements of such SLs reveal strong anisotropy (∼2000×) between the in-plane and cross-plane directions due to the weakly interacting van der Waals-like gaps. This work uncovers electrothermal transport in SLs based on Sb2Te3 and GeTe for the improved design of low-power PCM.
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Affiliation(s)
- Heungdong Kwon
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Asir Intisar Khan
- Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States
| | - Christopher Perez
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Mehdi Asheghi
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Eric Pop
- Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, United States
| | - Kenneth E Goodson
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, United States
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21
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Yin L, Cheng R, Wen Y, Liu C, He J. Emerging 2D Memory Devices for In-Memory Computing. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021; 33:e2007081. [PMID: 34105195 DOI: 10.1002/adma.202007081] [Citation(s) in RCA: 44] [Impact Index Per Article: 14.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/17/2020] [Revised: 12/27/2020] [Indexed: 06/12/2023]
Abstract
It is predicted that the conventional von Neumann computing architecture cannot meet the demands of future data-intensive computing applications due to the bottleneck between the processing and memory units. To try to solve this problem, in-memory computing technology, where calculations are carried out in situ within each nonvolatile memory unit, has been intensively studied. Among various candidate materials, 2D layered materials have recently demonstrated many new features that have been uniquely exploited to build next-generation electronics. Here, the recent progress of 2D memory devices is reviewed for in-memory computing. For each memory configuration, their operation mechanisms and memory characteristics are described, and their pros and cons are weighed. Subsequently, their versatile applications for in-memory computing technology, including logic operations, electronic synapses, and random number generation are presented. Finally, the current challenges and potential strategies for future 2D in-memory computing systems are also discussed at the material, device, circuit, and architecture levels. It is hoped that this manuscript could give a comprehensive review of 2D memory devices and their applications in in-memory computing, and be helpful for this exciting research area.
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Affiliation(s)
- Lei Yin
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, and School of Physics and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Ruiqing Cheng
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, and School of Physics and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Yao Wen
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, and School of Physics and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Chuansheng Liu
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, and School of Physics and Technology, Wuhan University, Wuhan, 430072, P. R. China
| | - Jun He
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, and School of Physics and Technology, Wuhan University, Wuhan, 430072, P. R. China
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22
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Kwon H, Perez C, Kim HK, Asheghi M, Park W, Goodson KE. Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition. ACS APPLIED MATERIALS & INTERFACES 2021; 13:21905-21913. [PMID: 33914509 DOI: 10.1021/acsami.0c19197] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Interfaces govern thermal transport in a variety of nanostructured systems such as FinFETs, interconnects, and vias. Thermal boundary resistances, however, critically depend on the choice of materials, nanomanufacturing processes and conditions, and the planarity of interfaces. In this work, we study the interfacial thermal transport between a nonreactive metal (Pt) and a dielectric by engineering two differing bonding characters: (i) the mechanical adhesion/van der Waals bonding offered by the physical vapor deposition (PVD) and (ii) the chemical bonding generated by plasma-enhanced atomic layer deposition (PEALD). We introduce 40-cycle (∼2 nm thick), nearly continuous PEALD Pt films between 98 nm PVD Pt and dielectric materials (8.0 nm TiO2/Si and 11.0 nm Al2O3/Si) treated with either O2 or O2 + H2 plasma to modulate their bonding strengths. By correlating the treatments through thermal transport measurements using time-domain thermoreflectance (TDTR), we find that the thermal boundary resistances are consistently reduced with the same increased treatment complexity that has been demonstrated in the literature to enhance mechanical adhesion. For samples on TiO2 (Al2O3), reductions in thermal resistance are at least 4% (10%) compared to those with no PEALD Pt at all, but could be as large as 34% (42%) given measurement uncertainties that could be improved with thinner nucleation layers. We suspect the O2 plasma generates stronger covalent bonds to the substrate, while the H2 plasma strips the PEALD Pt of contaminants such as carbon that gives rise to a less thermally resistive heat conduction pathway.
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Affiliation(s)
- Heungdong Kwon
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Christopher Perez
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Hyojin K Kim
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Mehdi Asheghi
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Woosung Park
- Division of Mechanical Systems Engineering, Sookmyung Women's University, Seoul 04310, South Korea
| | - Kenneth E Goodson
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States
- Huang Building, Dean's Office Suite, Stanford, California 94305, United States
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23
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Aryana K, Gaskins JT, Nag J, Stewart DA, Bai Z, Mukhopadhyay S, Read JC, Olson DH, Hoglund ER, Howe JM, Giri A, Grobis MK, Hopkins PE. Interface controlled thermal resistances of ultra-thin chalcogenide-based phase change memory devices. Nat Commun 2021; 12:774. [PMID: 33536411 PMCID: PMC7858634 DOI: 10.1038/s41467-020-20661-8] [Citation(s) in RCA: 17] [Impact Index Per Article: 5.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/20/2020] [Accepted: 12/15/2020] [Indexed: 01/30/2023] Open
Abstract
Phase change memory (PCM) is a rapidly growing technology that not only offers advancements in storage-class memories but also enables in-memory data processing to overcome the von Neumann bottleneck. In PCMs, data storage is driven by thermal excitation. However, there is limited research regarding PCM thermal properties at length scales close to the memory cell dimensions. Our work presents a new paradigm to manage thermal transport in memory cells by manipulating the interfacial thermal resistance between the phase change unit and the electrodes without incorporating additional insulating layers. Experimental measurements show a substantial change in interfacial thermal resistance as GST transitions from cubic to hexagonal crystal structure, resulting in a factor of 4 reduction in the effective thermal conductivity. Simulations reveal that interfacial resistance between PCM and its adjacent layer can reduce the reset current for 20 and 120 nm diameter devices by up to ~ 40% and ~ 50%, respectively. These thermal insights present a new opportunity to reduce power and operating currents in PCMs.
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Affiliation(s)
- Kiumars Aryana
- Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA
| | - John T Gaskins
- Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA
| | - Joyeeta Nag
- Western Digital Corporation, San Jose, CA, 95119, USA
| | | | - Zhaoqiang Bai
- Western Digital Corporation, San Jose, CA, 95119, USA
| | - Saikat Mukhopadhyay
- NRC Research Associate at Naval Research Laboratory, Washington, DC, 20375, USA
| | - John C Read
- Western Digital Corporation, San Jose, CA, 95119, USA
| | - David H Olson
- Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA
| | - Eric R Hoglund
- Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA
| | - James M Howe
- Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA
| | - Ashutosh Giri
- Department of Mechanical, Industrial and Systems Engineering, University of Rhode Island, Kingston, RI, 02881, USA
| | | | - Patrick E Hopkins
- Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
- Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
- Department of Physics, University of Virginia, Charlottesville, VA, 22904, USA.
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24
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Cheng Y, Cai D, Zheng Y, Yan S, Wu L, Li C, Song W, Xin T, Lv S, Huang R, Lv H, Song Z, Feng S. Microscopic Mechanism of Carbon-Dopant Manipulating Device Performance in CGeSbTe-Based Phase Change Random Access Memory. ACS APPLIED MATERIALS & INTERFACES 2020; 12:23051-23059. [PMID: 32340441 DOI: 10.1021/acsami.0c02507] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Carbon (C)-doped Ge2Sb2Te5 material is a potential candidate in phase change random access memory (PCRAM) because of its superb thermal stability and ultrahigh cycle endurance. Unfortunately, the role and distribution evolution of C-dopant is still not fully understood, especially in practical industrial devices. In this report, with the aid of advanced spherical aberration corrected transmission electron microscopy, the mechanism of microstructure evolution manipulated by C-dopant is clearly defined. The grain-inner C atoms distinctly increase cationic migration energy barriers, which is the fundamental reason for promoting the thermal stability of metastable face-centered-cubic phase and postponing its transition to the hexagonal structure. By current pulses stimulation, the stochastic grain-outer C clusters tend to aggregate in the active area by breaking C-Ge bonding; thus, grain growth and elemental segregation are effectively suppressed to improve device reliability, for example, lower SET resistance, shorter SET time, and enlarged RESET/SET ratio. In short, the visual distribution variations of C-dopant can manipulate the performance of the PCRAM device, having much broader implications for optimizing its microstructure transition and understanding C-doped material system.
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Affiliation(s)
- Yan Cheng
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China
| | - Daolin Cai
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Yonghui Zheng
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- Erich Schmid Institute of Materials Science, Austrian Academy of Science, Leoben 8700, Austria
| | - Shuai Yan
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Lei Wu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Chao Li
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China
| | - Wenxiong Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Tianjiao Xin
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Shilong Lv
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Rong Huang
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China
| | - Hangbing Lv
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Songlin Feng
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
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25
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Zheng J, Zhu S, Xu P, Dunham S, Majumdar A. Modeling Electrical Switching of Nonvolatile Phase-Change Integrated Nanophotonic Structures with Graphene Heaters. ACS APPLIED MATERIALS & INTERFACES 2020; 12:21827-21836. [PMID: 32297737 DOI: 10.1021/acsami.0c02333] [Citation(s) in RCA: 23] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Progress in integrated nanophotonics has enabled large-scale programmable photonic integrated circuits (PICs) for general-purpose electronic-photonic systems on a chip. Relying on the weak, volatile thermo-optic, or electro-optic effects, such systems usually exhibit limited reconfigurability along with high-energy consumption and large footprints. These challenges can be addressed by resorting to chalcogenide phase-change materials (PCMs) such as Ge2Sb2Te5 (GST) that provide a substantial optical contrast in a self-holding fashion upon phase transitions. However, current PCM-based integrated photonic applications are limited to single devices or simple PICs because of the poor scalability of the optical or electrical self-heating actuation approaches. Thermal-conduction heating via external electrical heaters, instead, allows large-scale integration and large-area switching, but fast and energy-efficient electrical control is yet to be achieved. Here, we model electrical switching of GST-clad-integrated nanophotonic structures with graphene heaters based on the programmable GST-on-silicon platform. Thanks to the ultra-low heat capacity and high in-plane thermal conductivity of graphene, the proposed structures exhibit a high switching speed of ∼80 MHz and a high energy efficiency of 19.2 aJ/nm3 (6.6 aJ/nm3) for crystallization (amorphization) while achieving complete phase transitions to ensure strong attenuation (∼6.46 dB/μm) and optical phase (∼0.28 π/μm at 1550 nm) modulation. Compared with indium tin oxide and silicon p-i-n heaters, the structures with graphene heaters display two orders of magnitude higher figure of merits for heating and overall performance. Our work facilitates the analysis and understanding of the thermal-conduction heating-enabled phase transitions on PICs and supports the development of future large-scale PCM-based electronic-photonic systems.
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Affiliation(s)
- Jiajiu Zheng
- Department of Electrical and Computer Engineering, University of Washington, Seattle, Washington 98195, United States
| | - Shifeng Zhu
- Department of Physics, University of Washington, Seattle, Washington 98195, United States
| | - Peipeng Xu
- Laboratory of Infrared Materials and Devices, Advanced Technology Research Institute, Ningbo University, Ningbo 315211, China
| | - Scott Dunham
- Department of Electrical and Computer Engineering, University of Washington, Seattle, Washington 98195, United States
- Department of Physics, University of Washington, Seattle, Washington 98195, United States
| | - Arka Majumdar
- Department of Electrical and Computer Engineering, University of Washington, Seattle, Washington 98195, United States
- Department of Physics, University of Washington, Seattle, Washington 98195, United States
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26
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Liu B, Liu W, Li Z, Li K, Wu L, Zhou J, Song Z, Sun Z. Y-Doped Sb 2Te 3 Phase-Change Materials: Toward a Universal Memory. ACS APPLIED MATERIALS & INTERFACES 2020; 12:20672-20679. [PMID: 32283921 DOI: 10.1021/acsami.0c03027] [Citation(s) in RCA: 14] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
The disadvantages of high power consumption and slow operating speed hinder the application of phase-change materials (PCMs) for a universal memory. In this work, based on a rigorous experimental scheme, we synthesized a series of YxSb2-xTe3 (0 ≤ x ≤ 0.333) PCMs and demonstrated that Y0.25Sb1.75Te3 (YST) is an excellent candidate material for the universal phase-change memory. This YST PCM, even being integrated into a conventional T-shaped device, exhibits an ultralow reset power consumption of 1.3 pJ and a competitive fast set speed of 6 ns. The ultralow power consumption is attributed to the Y-reduced thermal and electrical conductivity, while the maintained crystal structure of Sb2Te3 and the grain refinement provide the competitive fast crystallization speed. This work highlights a novel way to obtain new PCMs with lower power consumption and competitive fast speed toward a universal memory.
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Affiliation(s)
- Bin Liu
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Wanliang Liu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Zhen Li
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Kaiqi Li
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Liangcai Wu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Jian Zhou
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Zhimei Sun
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
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27
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Datye IM, Rojo MM, Yalon E, Deshmukh S, Mleczko MJ, Pop E. Localized Heating and Switching in MoTe 2-Based Resistive Memory Devices. NANO LETTERS 2020; 20:1461-1467. [PMID: 31951419 DOI: 10.1021/acs.nanolett.9b05272] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/17/2023]
Abstract
Two-dimensional (2D) materials have recently been incorporated into resistive memory devices because of their atomically thin nature, but their switching mechanism is not yet well understood. Here we study bipolar switching in MoTe2-based resistive memory of varying thickness and electrode area. Using scanning thermal microscopy (SThM), we map the surface temperature of the devices under bias, revealing clear evidence of localized heating at conductive "plugs" formed during switching. The SThM measurements are correlated to electro-thermal simulations, yielding a range of plug diameters (250 to 350 nm) and temperatures at constant bias and during switching. Transmission electron microscopy images reveal these plugs result from atomic migration between electrodes, which is a thermally-activated process. However, the initial forming may be caused by defect generation or Te migration within the MoTe2. This study provides the first thermal and localized switching insights into the operation of such resistive memory and demonstrates a thermal microscopy technique that can be applied to a wide variety of traditional and emerging memory devices.
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Affiliation(s)
- Isha M Datye
- Department of Electrical Engineering , Stanford University , Stanford , California 94305 , United States
| | - Miguel Muñoz Rojo
- Department of Electrical Engineering , Stanford University , Stanford , California 94305 , United States
| | - Eilam Yalon
- Department of Electrical Engineering , Stanford University , Stanford , California 94305 , United States
| | - Sanchit Deshmukh
- Department of Electrical Engineering , Stanford University , Stanford , California 94305 , United States
| | - Michal J Mleczko
- Department of Electrical Engineering , Stanford University , Stanford , California 94305 , United States
| | - Eric Pop
- Department of Electrical Engineering , Stanford University , Stanford , California 94305 , United States
- Department of Materials Science & Engineering , Stanford University , Stanford , California 94305 , United States
- Precourt Institute for Energy , Stanford University , Stanford , California 94305 , United States
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28
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Anam MK, Ahn EC. Understanding the effect of dry etching on nanoscale phase-change memory. NANOTECHNOLOGY 2019; 30:495202. [PMID: 31476740 DOI: 10.1088/1361-6528/ab4079] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
PCM (phase-change memory) is an important class of data storage, operating based on the Joule heating-induced reversible switching of chalcogenide alloys. Nanoscale PCM often requires advanced microfabrication techniques such as dry (plasma) etching, but the possible impacts of process damages or imperfections on the device performance still remain relatively unexplored. This is critical because some chemical etching species are known to cause over-etching with rough edge onto the sidewall of a phase-change material. It is also possible that the phase-change material experiences a composition change due to etching-induced re-deposition of by-products or thermal stress. In this study, a finite-element simulation is performed to understand the effect of dry etching on the RESET characteristics of a nanoscale PCM device to provide a guideline on the PCM manufacturing and cell design.
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Affiliation(s)
- Md Khirul Anam
- The Department of Electrical and Computer Engineering, The University of Texas at San Antonio, One UTSA Circle, San Antonio, Texas 78249, United States of America
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29
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Graphene and two-dimensional materials for silicon technology. Nature 2019; 573:507-518. [PMID: 31554977 DOI: 10.1038/s41586-019-1573-9] [Citation(s) in RCA: 460] [Impact Index Per Article: 92.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/10/2018] [Accepted: 07/08/2019] [Indexed: 11/09/2022]
Abstract
The development of silicon semiconductor technology has produced breakthroughs in electronics-from the microprocessor in the late 1960s to early 1970s, to automation, computers and smartphones-by downscaling the physical size of devices and wires to the nanometre regime. Now, graphene and related two-dimensional (2D) materials offer prospects of unprecedented advances in device performance at the atomic limit, and a synergistic combination of 2D materials with silicon chips promises a heterogeneous platform to deliver massively enhanced potential based on silicon technology. Integration is achieved via three-dimensional monolithic construction of multifunctional high-rise 2D silicon chips, enabling enhanced performance by exploiting the vertical direction and the functional diversification of the silicon platform for applications in opto-electronics and sensing. Here we review the opportunities, progress and challenges of integrating atomically thin materials with silicon-based nanosystems, and also consider the prospects for computational and non-computational applications.
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30
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Zhang L, Gong T, Wang H, Guo Z, Zhang H. Memristive devices based on emerging two-dimensional materials beyond graphene. NANOSCALE 2019; 11:12413-12435. [PMID: 31231746 DOI: 10.1039/c9nr02886b] [Citation(s) in RCA: 29] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
With the explosion of data in the information universe and the approaching of fundamental limits in silicon-based flash memories, the exploration of new device architectures and alternative materials is necessary for next-generation memory technology. Accordingly, emerging two-dimensional (2D) material-based memristive devices have attracted increasing attention due to their unique properties and great potential in flexible and wearable devices, and even neuromorphic computing systems. Herein, we provide an overview of the recent progress on memristive devices based on 2D materials beyond graphene. The device structures and choice of active materials and electrodes materials are summarized for various types of 2D material-based memristive devices. Following the discussion and classification on the device performances and mechanisms, the challenges and perspectives on future research based on 2D materials are also presented.
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Affiliation(s)
- Lei Zhang
- Hubei Collaborative Innovation Center for Advanced Organic Chemical Materials, Key Laboratory for the Green Preparation and Application of Functional Materials, Ministry of Education, School of Materials Science and Engineering, Hubei University, Wuhan 430062, China.
| | - Tian Gong
- Hubei Collaborative Innovation Center for Advanced Organic Chemical Materials, Key Laboratory for the Green Preparation and Application of Functional Materials, Ministry of Education, School of Materials Science and Engineering, Hubei University, Wuhan 430062, China.
| | - Huide Wang
- Shenzhen Engineering Laboratory of Phosphorene and Optoelectronics, Shenzhen University, Shenzhen 518060, China.
| | - Zhinan Guo
- Shenzhen Engineering Laboratory of Phosphorene and Optoelectronics, Shenzhen University, Shenzhen 518060, China.
| | - Han Zhang
- Shenzhen Engineering Laboratory of Phosphorene and Optoelectronics, Shenzhen University, Shenzhen 518060, China.
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31
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Bae SH, Kum H, Kong W, Kim Y, Choi C, Lee B, Lin P, Park Y, Kim J. Integration of bulk materials with two-dimensional materials for physical coupling and applications. NATURE MATERIALS 2019; 18:550-560. [PMID: 31114063 DOI: 10.1038/s41563-019-0335-2] [Citation(s) in RCA: 88] [Impact Index Per Article: 17.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/19/2018] [Accepted: 03/06/2019] [Indexed: 05/21/2023]
Abstract
Hybrid heterostructures are essential for functional device systems. The advent of 2D materials has broadened the material set beyond conventional 3D material-based heterostructures. It has triggered the fundamental investigation and use in applications of new coupling phenomena between 3D bulk materials and 2D atomic layers that have unique van der Waals features. Here we review the state-of-the-art fabrication of 2D and 3D heterostructures, present a critical survey of unique phenomena arising from forming 3D/2D interfaces, and introduce their applications. We also discuss potential directions for research based on these new coupled architectures.
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Affiliation(s)
- Sang-Hoon Bae
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Hyun Kum
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Wei Kong
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Yunjo Kim
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Chanyeol Choi
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
- Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Byunghun Lee
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Peng Lin
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Yongmo Park
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Jeehwan Kim
- Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
- Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, MA, USA.
- Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
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32
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Bertolazzi S, Bondavalli P, Roche S, San T, Choi SY, Colombo L, Bonaccorso F, Samorì P. Nonvolatile Memories Based on Graphene and Related 2D Materials. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2019; 31:e1806663. [PMID: 30663121 DOI: 10.1002/adma.201806663] [Citation(s) in RCA: 104] [Impact Index Per Article: 20.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/14/2018] [Revised: 11/19/2018] [Indexed: 05/19/2023]
Abstract
The pervasiveness of information technologies is generating an impressive amount of data, which need to be accessed very quickly. Nonvolatile memories (NVMs) are making inroads into high-capacity storage to replace hard disk drives, fuelling the expansion of the global storage memory market. As silicon-based flash memories are approaching their fundamental limit, vertical stacking of multiple memory cell layers, innovative device concepts, and novel materials are being investigated. In this context, emerging 2D materials, such as graphene, transition metal dichalcogenides, and black phosphorous, offer a host of physical and chemical properties, which could both improve existing memory technologies and enable the next generation of low-cost, flexible, and wearable storage devices. Herein, an overview of graphene and related 2D materials (GRMs) in different types of NVM cells is provided, including resistive random-access, flash, magnetic and phase-change memories. The physical and chemical mechanisms underlying the switching of GRM-based memory devices studied in the last decade are discussed. Although at this stage most of the proof-of-concept devices investigated do not compete with state-of-the-art devices, a number of promising technological advancements have emerged. Here, the most relevant material properties and device structures are analyzed, emphasizing opportunities and challenges toward the realization of practical NVM devices.
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Affiliation(s)
- Simone Bertolazzi
- Université de Strasbourg, CNRS, ISIS UMR 7006, 8 allée Gaspard Monge, 67000, Strasbourg, France
| | - Paolo Bondavalli
- Chemical and Multifunctional Materials Lab, Thales Research and Technology, 91767, Palaiseau, France
| | - Stephan Roche
- Catalan Institute of Nanoscience and Nanotechnology, CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193, Barcelona, Spain
- ICREA-Institució Catalana de Recerca i Estudis Avançats, 08070, Barcelona, Spain
| | - Tamer San
- Texas Instruments, Dallas, TX, 75243, USA
| | - Sung-Yool Choi
- School of Electrical Engineering, Graphene/2D Materials Research Center, KAIST, 34141, Daejeon, Korea
| | - Luigi Colombo
- Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080, USA
| | - Francesco Bonaccorso
- Istituto Italiano di Tecnologia, Graphene Labs, Via Morego 30, I-16163, Genova, Italy
- BeDimensional Spa, Via Albisola 121, 16163, Genova, Italy
| | - Paolo Samorì
- Université de Strasbourg, CNRS, ISIS UMR 7006, 8 allée Gaspard Monge, 67000, Strasbourg, France
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Chen B, Lam Do V, Ten Brink G, Palasantzas G, Rudolf P, Kooi BJ. Dynamics of GeSbTe phase-change nanoparticles deposited on graphene. NANOTECHNOLOGY 2018; 29:505706. [PMID: 30251967 DOI: 10.1088/1361-6528/aae403] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Phase-change Ge2Sb2Te5 nanoparticles (NPs), that are promising for next-generation phase-change memory and other emerging optoelectronic applications, have been deposited on graphene support layers and analyzed using advanced transmission electron microscopy techniques allowing high quality atomic resolution imaging at accelerating voltages as low as 40 kV. The deposition results in about three times higher NP coverage on suspended graphene than on graphene containing an amorphous background support. We attribute this to the variation in surface energy of suspended and supported graphene, indicating that the former harvests NPs more effectively. Hydrocarbon contamination on the graphene profoundly enhances the mobility of the NP atoms and after prolonged (weeks) exposure to air resulted in more severe oxidation and spreading of NPs on the suspended graphene than on supported graphene because the network of hydrocarbons develops more extensively on the suspended rather than on the supported graphene. Due to this oxidation, GeO x shells are formed out of NPs having a uniform composition initially. The present work provides new insights into the structure and stability of phase-change NPs, graphene and their combinations.
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Affiliation(s)
- Bin Chen
- Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747AG Groningen, The Netherlands
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MB-CNN: Memristive Binary Convolutional Neural Networks for Embedded Mobile Devices. JOURNAL OF LOW POWER ELECTRONICS AND APPLICATIONS 2018. [DOI: 10.3390/jlpea8040038] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/24/2023]
Abstract
Applications of neural networks have gained significant importance in embedded mobile devices and Internet of Things (IoT) nodes. In particular, convolutional neural networks have emerged as one of the most powerful techniques in computer vision, speech recognition, and AI applications that can improve the mobile user experience. However, satisfying all power and performance requirements of such low power devices is a significant challenge. Recent work has shown that binarizing a neural network can significantly improve the memory requirements of mobile devices at the cost of minor loss in accuracy. This paper proposes MB-CNN, a memristive accelerator for binary convolutional neural networks that perform XNOR convolution in-situ novel 2R memristive data blocks to improve power, performance, and memory requirements of embedded mobile devices. The proposed accelerator achieves at least 13.26 × , 5.91 × , and 3.18 × improvements in the system energy efficiency (computed by energy × delay) over the state-of-the-art software, GPU, and PIM architectures, respectively. The solution architecture which integrates CPU, GPU and MB-CNN outperforms every other configuration in terms of system energy and execution time.
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Cao X, Meng C, Li J, Wang J, Yuan Y, Su J, Liu C, Zhang X, Zhang H, Wang J. Characterization of interfacial barrier charging as a resistive switching mechanism in Ag/Sb 2Te 3/Ag heterojunctions. Phys Chem Chem Phys 2018; 20:18200-18206. [PMID: 29796567 DOI: 10.1039/c8cp00901e] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
In this study, bipolar memristive behaviors were systematically characterized in Ag/Sb2Te3/Ag hetero-junctions. By using in situ Raman and photoluminescence spectroscopy, a direct observation of the bonding environment and band structure confirmed that resistive switches are strongly related to the electronic valence changes in Sb2Te3 and the formation of Schottky barriers at Ag/Sb2Te3 interfaces. Band movement of Sb2Te3 acquired by first-principles calculations also supports the electrostatic barrier charging as a memristive mechanism of Ag/Sb2Te3/Ag heterocells. Independent resistance-switching behaviors that can be utilized in both amorphous and crystalline Sb2Te3 lead to multiple resistance values with a large memory window (104-105) and low read voltage (∼0.2 V), giving rise to a unique multi-level memory concept. This study based on Ag/Sb2Te3/Ag hetero-junctions offers a significant understanding to promote the use of Sb2Te3 and other chalcogenide memristors as promising candidates for compatible high-density memory applications.
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Affiliation(s)
- Xinran Cao
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center, Department of Optical Science and Engineering, Fudan University, Shanghai, 200433, China.
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Liu R, Zhou X, Zhai J, Song J, Wu P, Lai T, Song S, Song Z. Multilayer SnSb 4-SbSe Thin Films for Phase Change Materials Possessing Ultrafast Phase Change Speed and Enhanced Stability. ACS APPLIED MATERIALS & INTERFACES 2017; 9:27004-27013. [PMID: 28737032 DOI: 10.1021/acsami.7b06533] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
A multilayer thin film, comprising two different phase change material (PCM) components alternatively deposited, provides an effective means to tune and leverage good properties of its components, promising a new route toward high-performance PCMs. The present study systematically investigated the SnSb4-SbSe multilayer thin film as a potential PCM, combining experiments and first-principles calculations, and demonstrated that these multilayer thin films exhibit good electrical resistivity, robust thermal stability, and superior phase change speed. In particular, the potential operating temperature for 10 years is shown to be 122.0 °C and the phase change speed reaches 5 ns in the device test. The good thermal stability of the multilayer thin film is shown to come from the formation of the Sb2Se3 phase, whereas the fast phase change speed can be attributed to the formation of vacancies and a SbSe metastable phase. It is also demonstrated that the SbSe metastable phase contributes to further enhancing the electrical resistivity of the crystalline state and the thermal stability of the amorphous state, being vital to determining the properties of the multilayer SnSb4-SbSe thin film.
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Affiliation(s)
- Ruirui Liu
- Shanghai Key Laboratory for R&D and Application of Metallic Functional Materials, School of Materials Science & Engineering, Tongji University , Shanghai 201804, China
- Department of Mining and Materials Engineering, McGill University , Montreal, Quebec H3A 0C5, Canada
| | - Xiao Zhou
- Department of Mining and Materials Engineering, McGill University , Montreal, Quebec H3A 0C5, Canada
| | - Jiwei Zhai
- Shanghai Key Laboratory for R&D and Application of Metallic Functional Materials, School of Materials Science & Engineering, Tongji University , Shanghai 201804, China
| | - Jun Song
- Department of Mining and Materials Engineering, McGill University , Montreal, Quebec H3A 0C5, Canada
| | - Pengzhi Wu
- Department of Physics, State Key Laboratory of Optoelectronic Materials and Technology, Sun Yat-Sen University , Guangzhou 510275, China
| | - Tianshu Lai
- Department of Physics, State Key Laboratory of Optoelectronic Materials and Technology, Sun Yat-Sen University , Guangzhou 510275, China
| | - Sannian Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences , Shanghai 200050, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences , Shanghai 200050, China
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Hayat H, Kohary K, Wright CD. Can conventional phase-change memory devices be scaled down to single-nanometre dimensions? NANOTECHNOLOGY 2017; 28:035202. [PMID: 27934782 DOI: 10.1088/1361-6528/28/3/035202] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The scaling potential of 'mushroom-type' phase-change memory devices is evaluated, down to single-nanometre dimensions, using physically realistic simulations that combine electro-thermal modelling with a Gillespie Cellular Automata phase-transformation approach. We found that cells with heater contact sizes as small as 6 nm could be successfully amorphized and re-crystallized (RESET and SET) using moderate excitation voltages. However, to enable the efficient formation of amorphous domes during RESET in small cells (heater contact diameters of 10 nm or less), it was necessary to improve the thermal confinement of the cell to reduce heat loss via the electrodes. The resistance window between the SET and RESET states decreased as the cell size reduced, but it was still more than an order of magnitude even for the smallest cells. As expected, the RESET current reduced as the cells got smaller; indeed, RESET current scaled with the inverse of the heater contact diameter and ultra-small RESET currents of only 19 μA were achieved for the smallest cells. Our results show that the conventional mushroom-type phase-change cell architecture is scalable and operable in the sub-10nm region.
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Affiliation(s)
- Hasan Hayat
- College of Engineering, Mathematics and Physical Sciences, University of Exeter, Exeter, EX4 4QF, UK
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