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Ma H, Chen X, Han Y, Zhang J, Wen K, Cheng S, Zhao Q, Wang Y, Wu J, Shao J. Ice-Enabled Transfer of Graphene on Copper Substrates Enhanced by Electric Field and Cu 2O. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024; 11:e2402319. [PMID: 38924683 PMCID: PMC11348137 DOI: 10.1002/advs.202402319] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/04/2024] [Revised: 06/02/2024] [Indexed: 06/28/2024]
Abstract
Graphene films grown by the chemical vapor deposition (CVD) method suffer from contamination and damage during transfer. Herein, an innovative ice-enabled transfer method under an applied electric field and in the presence of Cu2O (or Cu2O-Electric-field Ice Transfer, abbreviated as CEIT) is developed. Ice serves as a pollution-free transfer medium while water molecules under the electric field fully wet the graphene surface for a bolstered adhesion force between the ice and graphene. Cu2O is used to reduce the adhesion force between graphene and copper. The combined methodology in CEIT ensures complete separation and clean transfer of graphene, resulting in successfully transferred graphene to various substrates, including polydimethylsiloxane (PDMS), Teflon, and C4F8 without pollution. The graphene obtained via CEIT is utilized to fabricate field-effect transistors with electrical performances comparable to that of intrinsic graphene characterized by small Dirac points and high carrier mobility. The carrier mobility of the transferred graphene reaches 9090 cm2 V-1 s-1, demonstrating a superior carrier mobility over that from other dry transfer methods. In a nutshell, the proposed clean and efficient transfer method holds great potential for future applications of graphene.
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Affiliation(s)
- Hechuan Ma
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
| | - Xiaoming Chen
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
- XJTU‐POLIMI Joint School of Design and InnovationXi'an Jiaotong UniversityXi'anShaanxi710049China
| | - Yufei Han
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
| | - Jie Zhang
- Electronic Materials Research LabKey Laboratory of the Ministry of EducationXi'an Jiaotong UniversityXi'anShaanxi710049China
| | - Kaiqiang Wen
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
| | - Siyi Cheng
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
| | - Quanyi Zhao
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
| | - Yijie Wang
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
| | - Jianyang Wu
- Department of PhysicsJiujiang Research Institute and Research Institute for Biomimetics and Soft MatterFujian Provincial Key Laboratory for Soft Functional Materials ResearchXiamen UniversityXiamen361005China
| | - Jinyou Shao
- Micro‐ and Nanotechnology Research CenterState Key Laboratory for Manufacturing Systems EngineeringXi'an Jiaotong UniversityXi'anShannxi710049China
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2
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Liu H, Zhao J, Ly TH. Clean Transfer of Two-Dimensional Materials: A Comprehensive Review. ACS NANO 2024; 18:11573-11597. [PMID: 38655635 DOI: 10.1021/acsnano.4c01000] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/26/2024]
Abstract
The growth of two-dimensional (2D) materials through chemical vapor deposition (CVD) has sparked a growing interest among both the industrial and academic communities. The interest stems from several key advantages associated with CVD, including high yield, high quality, and high tunability. In order to harness the application potentials of 2D materials, it is often necessary to transfer them from their growth substrates to their desired target substrates. However, conventional transfer methods introduce contamination that can adversely affect the quality and properties of the transferred 2D materials, thus limiting their overall application performance. This review presents a comprehensive summary of the current clean transfer methods for 2D materials with a specific focus on the understanding of interaction between supporting layers and 2D materials. The review encompasses various aspects, including clean transfer methods, post-transfer cleaning techniques, and cleanliness assessment. Furthermore, it analyzes and compares the advances and limitations of these clean transfer techniques. Finally, the review highlights the primary challenges associated with current clean transfer methods and provides an outlook on future prospects.
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Affiliation(s)
- Haijun Liu
- Department of Chemistry and Center of Super-Diamond & Advanced Films (COSDAF), City University of Hong Kong, Kowloon, Hong Kong 999077, China
- City University of Hong Kong Shenzhen Research Institute, Shenzhen 518057, China
| | - Jiong Zhao
- Department of Applied Physics, The Hong Kong Polytechnic University, Kowloon, Hong Kong 999077, China
- The Hong Kong Polytechnic University Shenzhen Research Institute, Shenzhen 518057, China
| | - Thuc Hue Ly
- Department of Chemistry and Center of Super-Diamond & Advanced Films (COSDAF), City University of Hong Kong, Kowloon, Hong Kong 999077, China
- City University of Hong Kong Shenzhen Research Institute, Shenzhen 518057, China
- State Key Laboratory of Marine Pollution, City University of Hong Kong, Kowloon, Hong Kong 999077, China
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3
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Dong W, Dai Z, Liu L, Zhang Z. Toward Clean 2D Materials and Devices: Recent Progress in Transfer and Cleaning Methods. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2303014. [PMID: 38049925 DOI: 10.1002/adma.202303014] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/01/2023] [Revised: 08/30/2023] [Indexed: 12/06/2023]
Abstract
Two-dimensional (2D) materials have tremendous potential to revolutionize the field of electronics and photonics. Unlocking such potential, however, is hampered by the presence of contaminants that usually impede the performance of 2D materials in devices. This perspective provides an overview of recent efforts to develop clean 2D materials and devices. It begins by discussing conventional and recently developed wet and dry transfer techniques and their effectiveness in maintaining material "cleanliness". Multi-scale methodologies for assessing the cleanliness of 2D material surfaces and interfaces are then reviewed. Finally, recent advances in passive and active cleaning strategies are presented, including the unique self-cleaning mechanism, thermal annealing, and mechanical treatment that rely on self-cleaning in essence. The crucial role of interface wetting in these methods is emphasized, and it is hoped that this understanding can inspire further extension and innovation of efficient transfer and cleaning of 2D materials for practical applications.
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Affiliation(s)
- Wenlong Dong
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication and CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Zhaohe Dai
- Department of Mechanics and Engineering Science, State Key Laboratory for Turbulence and Complex Systems, College of Engineering, Peking University, Beijing, 100871, China
| | - Luqi Liu
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication and CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China
| | - Zhong Zhang
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Modern Mechanics, University of Science and Technology of China, Hefei, 230027, China
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4
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Cho YS, Kang J. Two-dimensional materials as catalysts, interfaces, and electrodes for an efficient hydrogen evolution reaction. NANOSCALE 2024; 16:3936-3950. [PMID: 38347766 DOI: 10.1039/d4nr00147h] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/23/2024]
Abstract
Two-dimensional (2D) materials have been significantly investigated as electrocatalysts for the hydrogen evolution reaction (HER) over the past few decades due to their excellent electrocatalytic properties and their structural uniqueness including the atomically thin structure and abundant active sites. Recently, 2D materials with various electronic properties have not only been used as active catalytic materials, but also employed in other components of the HER electrodes including a conductive electrode layer and an interfacial layer to maximize the HER efficiency or utilized as templates for catalytic nanostructure growth. This review provides the recent progress and future perspectives of 2D materials as key components in electrocatalytic systems with an emphasis on the HER applications. We categorized the use of 2D materials into three types: a catalytic layer, an electrode for catalyst support, and an interlayer for enhancing charge transfer between the catalytic layer and the electrode. We first introduce various scalable synthesis methods of electrocatalytic-grade 2D materials, and we discuss the role of 2D materials as HER catalysts, an interface for efficient charge transfer, and an electrode and/or a growth template of nanostructured noble metals.
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Affiliation(s)
- Yun Seong Cho
- School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon 16419, Republic of Korea.
| | - Joohoon Kang
- School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon 16419, Republic of Korea.
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5
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Ansari S, Bianconi S, Kang CM, Mohseni H. From Material to Cameras: Low-Dimensional Photodetector Arrays on CMOS. SMALL METHODS 2024; 8:e2300595. [PMID: 37501320 DOI: 10.1002/smtd.202300595] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/08/2023] [Revised: 06/25/2023] [Indexed: 07/29/2023]
Abstract
The last two decades have witnessed a dramatic increase in research on low-dimensional material with exceptional optoelectronic properties. While low-dimensional materials offer exciting new opportunities for imaging, their integration in practical applications has been slow. In fact, most existing reports are based on single-pixel devices that cannot rival the quantity and quality of information provided by massively parallelized mega-pixel imagers based on complementary metal-oxide semiconductor (CMOS) readout electronics. The first goal of this review is to present new opportunities in producing high-resolution cameras using these new materials. New photodetection methods and materials in the field are presented, and the challenges involved in their integration on CMOS chips for making high-resolution cameras are discussed. Practical approaches are then presented to address these challenges and methods to integrate low-dimensional material on CMOS. It is also shown that such integrations could be used for ultra-low noise and massively parallel testing of new material and devices. The second goal of this review is to present the colossal untapped potential of low-dimensional material in enabling the next-generation of low-cost and high-performance cameras. It is proposed that low-dimensional materials have the natural ability to create excellent bio-inspired artificial imaging systems with unique features such as in-pixel computing, multi-band imaging, and curved retinas.
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Affiliation(s)
- Samaneh Ansari
- Electrical and Computer Engneering Department, Northwestern University, Evanston, IL, 60208, USA
| | - Simone Bianconi
- Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA, 91109, USA
| | - Chang-Mo Kang
- Photonic Semiconductor Research Center, Korea Photonics Technology Institute, Gwangju, 61007, Republic of Korea
| | - Hooman Mohseni
- Electrical and Computer Engneering Department, Northwestern University, Evanston, IL, 60208, USA
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6
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K NA, Kumar S. Ion Selectivity in Multilayered Stacked Nanoporous Graphene. ACS APPLIED MATERIALS & INTERFACES 2024; 16:5294-5301. [PMID: 38236663 DOI: 10.1021/acsami.3c15044] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/01/2024]
Abstract
Nanoporous graphene is an ideal candidate for molecular filtration as it can potentially combine high permeability with high selectivity at molecular levels. To make use of graphene in filtration setups, the defects formed during its growth and during the transfer of graphene to the carrier support pose a challenge. These uncontrolled pores can be avoided by stacking graphene layers, and then, controlled pores can be initiated with oxygen plasma. Here, we show that two-layer stacks provide the best balance of defect coverage and high selectivity compared with other stacks. Using the electrical characterization of ionic solutions in the standard diffusion cell, we compare the ionic transport and ionic selectivity of up to three-layered stacks of graphene that have been plasma-treated. We find that there is a decrease in the ionic selectivity of a two-layered stack as one more layer of graphene is added. We provide a model for this occurrence. Our results will be helpful for making practical and high-performance filtration systems from two-dimensional materials.
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Affiliation(s)
- Niketa A K
- Department of Electrical Engineering, Indian Institute of Technology Hyderabad, Hyderabad 502284, Telangana, India
| | - Shishir Kumar
- Department of Electrical Engineering, Indian Institute of Technology Hyderabad, Hyderabad 502284, Telangana, India
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7
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Lin YC, Matsumoto R, Liu Q, Solís-Fernández P, Siao MD, Chiu PW, Ago H, Suenaga K. Alkali metal bilayer intercalation in graphene. Nat Commun 2024; 15:425. [PMID: 38267420 PMCID: PMC11258350 DOI: 10.1038/s41467-023-44602-3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/03/2023] [Accepted: 12/21/2023] [Indexed: 01/26/2024] Open
Abstract
Alkali metal (AM) intercalation between graphene layers holds promise for electronic manipulation and energy storage, yet the underlying mechanism remains challenging to fully comprehend despite extensive research. In this study, we employ low-voltage scanning transmission electron microscopy (LV-STEM) to visualize the atomic structure of intercalated AMs (potassium, rubidium, and cesium) in bilayer graphene (BLG). Our findings reveal that the intercalated AMs adopt bilayer structures with hcp stacking, and specifically a C6M2C6 composition. These structures closely resemble the bilayer form of fcc (111) structure observed in AMs under high-pressure conditions. A negative charge transferred from bilayer AMs to graphene layers of approximately 1~1.5×1014 e-/cm-2 was determined by electron energy loss spectroscopy (EELS), Raman, and electrical transport. The bilayer AM is stable in BLG and graphite superficial layers but absent in the graphite interior, primarily dominated by single-layer AM intercalation. This hints at enhancing AM intercalation capacity by thinning the graphite material.
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Affiliation(s)
- Yung-Chang Lin
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8565, Japan.
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka, 567-0047, Japan.
| | - Rika Matsumoto
- Department of Engineering, Tokyo Polytechnic University, 5-45-1 Iiyamaminami, Atsugi, Kanagawa, 243-0297, Japan
| | - Qiunan Liu
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka, 567-0047, Japan
| | | | - Ming-Deng Siao
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
| | - Po-Wen Chiu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei, 10617, Taiwan
| | - Hiroki Ago
- Global Innovation Center (GIC), Kyushu University, Fukuoka, 816-8580, Japan
- Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka, 816-8580, Japan
| | - Kazu Suenaga
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8565, Japan.
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka, 567-0047, Japan.
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8
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Guo L, Liu Y, Zeng H, Zhang S, Song R, Yang J, Han X, Wang Y, Wang L. Covalently Functionalized Nanopores for Highly Selective Separation of Monovalent Ions. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2307242. [PMID: 37717168 DOI: 10.1002/adma.202307242] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/21/2023] [Revised: 09/03/2023] [Indexed: 09/18/2023]
Abstract
Biological ion channels possess prominent ion transport performances attributed to their critical chemical groups across the continuous nanoscale filters. However, it is still a challenge to imitate these sophisticated performances in artificial nanoscale systems. Herein, this work develops the strategy to fabricate functionalized graphene nanopores in pioneer based on the synergistic regulation of the pore size and chemical properties of atomically thin confined structure through decoupling etching combined with in situ covalent modification. The modified graphene nanopores possess asymmetric ion transport behaviors and efficient monovalent metal ions sieving (K+ /Li+ selectivity ≈48.6). Meanwhile, it also allows preferential transport for cations, the resulting membranes exhibit a K+ /Cl- selectivity of 76 and a H+ /Cl- selectivity of 59.3. The synergistic effects of steric hindrance and electrostatic interactions imposing a higher energy barrier for Cl- or Li+ across nanopores lead to ultra-selective H+ or K+ transport. Further, the functionalized graphene nanopores generate a power density of 25.3 W m-2 and a conversion efficiency of 33.9%, showing potential application prospects in energy conversion. The theoretical studies quantitatively match well with the experimental results. The feasible preparation of functionalized graphene nanopores paves the way toward direct investigation on ion transport mechanism and advanced design in devices.
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Affiliation(s)
- Liping Guo
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
| | - Yuancheng Liu
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
| | - Haiou Zeng
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
| | - Shengping Zhang
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
- Academy for Advanced Interdisciplinary Studies and Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Peking University, Beijing, 100871, China
- Beijing Graphene Institute, Beijing, 100095, China
| | - Ruiyang Song
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
| | - Jing Yang
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
| | - Xiao Han
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
- Academy for Advanced Interdisciplinary Studies and Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Peking University, Beijing, 100871, China
- Beijing Graphene Institute, Beijing, 100095, China
| | - Ying Wang
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
| | - Luda Wang
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, China
- Beijing Advanced Innovation Center for Integrated Circuits, Beijing, 100871, China
- Academy for Advanced Interdisciplinary Studies and Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Peking University, Beijing, 100871, China
- Beijing Graphene Institute, Beijing, 100095, China
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9
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Tsai MY, Tsai TH, Gandhi AC, Lu HL, Li JX, Chen PL, Chen KW, Chen SZ, Chen CH, Liu CH, Lin YF, Chiu PW. Ultrafast and Broad-Band Graphene Heterojunction Photodetectors with High Gain. ACS NANO 2023; 17:25037-25044. [PMID: 38096421 DOI: 10.1021/acsnano.3c07665] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/27/2023]
Abstract
Graphene possesses an exotic band structure that spans a wide range of important technological wavelength regimes for photodetection, all within a single material. Conventional methods aimed at enhancing detection efficiency often suffer from an extended response time when the light is switched off. The task of achieving ultrafast broad-band photodetection with a high gain remains challenging. Here, we propose a devised architecture that combines graphene with a photosensitizer composed of an alternating strip superstructure of WS2-WSe2. Upon illumination, n+-WS2 and p+-WSe2 strips create alternating electron- and hole-conduction channels in graphene, effectively overcoming the tradeoff between the responsivity and switch time. This configuration allows for achieving a responsivity of 1.7 × 107 mA/W, with an extrinsic response time of 3-4 μs. The inclusion of the superstructure booster enables photodetection across a wide range from the near-ultraviolet to mid-infrared regime and offers a distinctive photogating route for high responsivity and fast temporal response in the pursuit of broad-band detection.
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Affiliation(s)
- Meng-Yu Tsai
- Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Chung Hsing University, Taichung 40227, Taiwan
| | - Tsung-Han Tsai
- Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | | | - Hsueh-Lung Lu
- Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Jia-Xin Li
- Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Po-Liang Chen
- Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Kai-Wen Chen
- Department of Materials Science & Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan
| | - Sun-Zen Chen
- Center for Nanotechnology, Materials Science and Microsystem, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Chia-Hao Chen
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Chang-Hua Liu
- Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yen-Fu Lin
- Department of Physics, National Chung Hsing University, Taichung 40227, Taiwan
| | - Po-Wen Chiu
- Institute of Electronics Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
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10
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Liu Q, Lin YC, Kretschmer S, Ghorbani-Asl M, Solís-Fernández P, Siao MD, Chiu PW, Ago H, Krasheninnikov AV, Suenaga K. Molybdenum Chloride Nanostructures with Giant Lattice Distortions Intercalated into Bilayer Graphene. ACS NANO 2023. [PMID: 38007700 DOI: 10.1021/acsnano.3c06958] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/28/2023]
Abstract
The nanospace of the van der Waals (vdW) gap between structural units of two-dimensional (2D) materials serves as a platform for growing unusual 2D systems through intercalation and studying their properties. Various kinds of metal chlorides have previously been intercalated for tuning the properties of host layered materials, but the atomic structure of the intercalants remains still unidentified. In this study, we investigate the atomic structural transformation of molybdenum(V) chloride (MoCl5) after intercalation into bilayer graphene (BLG). Using scanning transmission electron microscopy, we found that the intercalated material represents MoCl3 networks, MoCl2 chains, and Mo5Cl10 rings. Giant lattice distortions and frequent structural transitions occur in the 2D MoClx that have never been observed in metal chloride systems. The trend of symmetric to nonsymmetric structural transformations can cause additional charge transfer from BLG to the intercalated MoClx, as suggested by our density functional theory calculations. Our study deepens the understanding of the behavior of matter in the confined space of the vdW gap in BLG and provides hints at a more efficient tuning of material properties by intercalation for potential applications, including transparent conductive films, optoelectronics, and energy storage.
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Affiliation(s)
- Qiunan Liu
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka 567-0047, Japan
| | - Yung-Chang Lin
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka 567-0047, Japan
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Silvan Kretschmer
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany
| | - Mahdi Ghorbani-Asl
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany
| | | | - Ming-Deng Siao
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Po-Wen Chiu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
| | - Hiroki Ago
- Global Innovation Center (GIC), Kyushu University, Fukuoka 816-8580, Japan
- Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
| | - Arkady V Krasheninnikov
- Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany
- Department of Applied Physics, Aalto University, P.O. Box 11100, 00076 Aalto, Finland
| | - Kazu Suenaga
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka 567-0047, Japan
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
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11
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Rasouli HR, Kaiser D, Neumann C, Frey M, Eshaghi G, Weimann T, Turchanin A. Critical Point Drying of Graphene Field-Effect Transistors Improves Their Electric Transport Characteristics. SMALL METHODS 2023; 7:e2300288. [PMID: 37423957 DOI: 10.1002/smtd.202300288] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/05/2023] [Revised: 06/07/2023] [Indexed: 07/11/2023]
Abstract
A critical point drying (CPD) technique is reported with supercritical CO2 as a cleaning step for graphene field-effect transistors (GFETs) microfabricated on oxidized Si wafers, which results in an increase of the field-effect mobility and a decrease of the impurity doping. It is shown that the polymeric residues remaining on graphene after the transfer process and device microfabrication are significantly reduced after the CPD treatment. Moreover, the CPD effectively removes ambient adsorbates such as water therewith reducing the undesirable p-type doping of the GFETs. It is proposed that CPD of electronic, optoelectronic, and photonic devices based on 2D materials as a promising technique to recover their intrinsic properties after the microfabrication in a cleanroom and after storage at ambient conditions.
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Affiliation(s)
- Hamid Reza Rasouli
- Institute of Physical Chemistry, Friedrich Schiller University Jena, 07743, Jena, Germany
| | - David Kaiser
- Institute of Physical Chemistry, Friedrich Schiller University Jena, 07743, Jena, Germany
| | - Christof Neumann
- Institute of Physical Chemistry, Friedrich Schiller University Jena, 07743, Jena, Germany
| | - Martha Frey
- Institute of Physical Chemistry, Friedrich Schiller University Jena, 07743, Jena, Germany
| | - Ghazaleh Eshaghi
- Institute of Physical Chemistry, Friedrich Schiller University Jena, 07743, Jena, Germany
| | - Thomas Weimann
- Physikalisch-Technische Bundesanstalt (PTB), 38116, Braunschweig, Germany
| | - Andrey Turchanin
- Institute of Physical Chemistry, Friedrich Schiller University Jena, 07743, Jena, Germany
- Abbe Center of Photonics, Friedrich Schiller University Jena, 07745, Jena, Germany
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12
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Liu M, Senga R, Koshino M, Lin YC, Suenaga K. Direct Observation of Locally Modified Excitonic Effects within a Moiré Unit Cell in Twisted Bilayer Graphene. ACS NANO 2023; 17:18433-18440. [PMID: 37682623 DOI: 10.1021/acsnano.3c06021] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/10/2023]
Abstract
Bilayer graphene, which forms moiré superlattices, possesses distinct electronic and optical properties owing to its hybridized energy band and the emergence of van Hove singularities depending on its twist angle. Extensive research has been conducted on the global characteristics of moiré superlattices induced by their long-range periodicity. However, the local properties, which differ owing to the variations in the three-dimensional atomic arrangement, within a moiré unit cell have been rarely explored. In this study, we demonstrate the highly localized excitation of carbon 1s electrons to unoccupied van Hove singularities in twisted bilayer graphene by electron energy loss spectroscopy using a monochromated transmission electron microscope. The core-level excitations associated with the van Hove singularities exhibit a systematic twist-angle dependence analogous to optical excitations. Furthermore, local variations in the core-level van Hove singularity peaks, which can originate from the core-exciton lifetimes and band modifications corresponding to the local stacking geometry within a moiré unit cell, are unambiguously corroborated.
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Affiliation(s)
- Ming Liu
- The Institute of Scientific and Industrial Research (SANKEN), Osaka University, Mihogaoka 8-1, Ibaraki, Osaka 567-0047, Japan
| | - Ryosuke Senga
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba 305-8565, Japan
| | - Masanori Koshino
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba 305-8565, Japan
| | - Yung-Chang Lin
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba 305-8565, Japan
| | - Kazu Suenaga
- The Institute of Scientific and Industrial Research (SANKEN), Osaka University, Mihogaoka 8-1, Ibaraki, Osaka 567-0047, Japan
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13
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Dyck O, Lupini AR, Jesse S. Atom-by-Atom Direct Writing. NANO LETTERS 2023; 23:2339-2346. [PMID: 36877825 DOI: 10.1021/acs.nanolett.3c00114] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
Direct-write processes enable the alteration or deposition of materials in a continuous, directable, sequential fashion. In this work, we demonstrate an electron beam direct-write process in an aberration-corrected scanning transmission electron microscope. This process has several fundamental differences from conventional electron-beam-induced deposition techniques, where the electron beam dissociates precursor gases into chemically reactive products that bond to a substrate. Here, we use elemental tin (Sn) as a precursor and employ a different mechanism to facilitate deposition. The atomic-sized electron beam is used to generate chemically reactive point defects at desired locations in a graphene substrate. Temperature control of the sample is used to enable the precursor atoms to migrate across the surface and bond to the defect sites, thereby enabling atom-by-atom direct writing.
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Affiliation(s)
- Ondrej Dyck
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States
| | - Andrew R Lupini
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States
| | - Stephen Jesse
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States
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14
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Liu N, Wang HW. Better Cryo-EM Specimen Preparation: How to Deal with the Air-Water Interface? J Mol Biol 2022; 435:167926. [PMID: 36563741 DOI: 10.1016/j.jmb.2022.167926] [Citation(s) in RCA: 13] [Impact Index Per Article: 6.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/18/2022] [Revised: 12/08/2022] [Accepted: 12/14/2022] [Indexed: 12/24/2022]
Abstract
Cryogenic electron microscopy (cryo-EM) is now one of the most powerful and widely used methods to determine high-resolution structures of macromolecules. A major bottleneck of cryo-EM is to prepare high-quality vitrified specimen, which still faces many practical challenges. During the conventional vitrification process, macromolecules tend to adsorb at the air-water interface (AWI), which is known unfriendly to biological samples. In this review, we outline the nature of AWI and the problems caused by it, such as unpredictable or uneven particle distribution, protein denaturation, dissociation of complex and preferential orientation. We review and discuss the approaches and underlying mechanisms to deal with AWI: 1) Additives, exemplified by detergents, forming a protective layer at AWI and thus preserving the native folds of target macromolecules. 2) Fast vitrification devices based on the idea to freeze in-solution macromolecules before their touching of AWI. 3) Thin layer of continuous supporting films to adsorb macromolecules, and when functionalized with affinity ligands, to specifically anchor the target particles away from the AWI. Among these supporting films, graphene, together with its derivatives, with negligible background noise and mechanical robustness, has emerged as a new generation of support. These strategies have been proven successful in various cases and enable us a better handling of the problems caused by the AWI in cryo-EM specimen preparation.
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Affiliation(s)
- Nan Liu
- Ministry of Education Key Laboratory of Protein Sciences, Beijing Advanced Innovation Center for Structural Biology, Beijing Frontier Research Center for Biological Structures, School of Life Sciences, Tsinghua University, Beijing 100084, China
| | - Hong-Wei Wang
- Ministry of Education Key Laboratory of Protein Sciences, Beijing Advanced Innovation Center for Structural Biology, Beijing Frontier Research Center for Biological Structures, School of Life Sciences, Tsinghua University, Beijing 100084, China; Tsinghua-Peking Joint Center for Life Sciences, Tsinghua University, Beijing 100084, China.
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15
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Lin YC, Chang YP, Chen KW, Lee TT, Hsiao BJ, Tsai TH, Yang YC, Lin KI, Suenaga K, Chen CH, Chiu PW. Patterning and doping of transition metals in tungsten dichalcogenides. NANOSCALE 2022; 14:16968-16977. [PMID: 36350092 DOI: 10.1039/d2nr04677f] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Substitutional transition metal doping in two-dimensional (2D) layered dichalcogenides is of fundamental importance in manipulating their electrical, excitonic, magnetic, and catalytic properties through the variation of the d-electron population. Yet, most doping strategies are spatially global, with dopants embedded concurrently during the synthesis. Here, we report an area-selective doping scheme for W-based dichalcogenide single layers, in which pre-patterned graphene is used as a reaction mask in the high-temperature substitution of the W sublattice. The chemical inertness of the thin graphene layer can effectively differentiate the spatial doping reaction, allowing for local manipulation of the host 2D materials. Using graphene as a mask is also beneficial in the sense that it also acts as an insertion layer between the contact metal and the doped channel, capable of depinning the Fermi level for low contact resistivity. Tracing doping by means of chalcogen labelling, deliberate Cr embedment is found to become energetically favorable in the presence of chalcogen deficiency, assisting the substitution of the W sublattice in the devised chemical vapor doping scheme. Atomic characterization using scanning transmission electron microscopy (STEM) shows that the dopant concentration is controllable and varies linearly with the reaction time in the current doping approach. Using the same method, other transition metal atoms such as Mo, V, and Fe can also be doped in the patterned area.
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Affiliation(s)
- Yung-Chang Lin
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Yao-Pang Chang
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
| | - Kai-Wen Chen
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Tai-Ting Lee
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
| | - Bo-Jiun Hsiao
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
| | - Tsung-Han Tsai
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
| | - Yueh-Chiang Yang
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
| | - Kuang-I Lin
- Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 70101, Taiwan
| | - Kazu Suenaga
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka 567-0047, Japan
| | - Chia-Hao Chen
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
- Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan
| | - Po-Wen Chiu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
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16
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Duan T, Li H, Papadakis R, Leifer K. Towards ballistic transport CVD graphene by controlled removal of polymer residues. NANOTECHNOLOGY 2022; 33:495704. [PMID: 36041409 DOI: 10.1088/1361-6528/ac8d9b] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/16/2022] [Accepted: 08/29/2022] [Indexed: 06/15/2023]
Abstract
Polymer-assisted wet transfer of chemical vapor deposited (CVD) graphene has achieved great success towards the true potential for large-scale electronic applications, while the lack of an efficient polymer removal method has been regarded as a crucial factor for realizing high carrier mobility in graphene devices. Hereby, we report an efficient and facile method to clean polymer residues on graphene surface by merely employing solvent mixture of isopropanol (IPA) and water (H2O). Raman spectroscopy shows an intact crystal structure of graphene after treatment, and the x-ray photoelectron spectroscopy indicates a significant decrease in the C-O and C=O bond signals, which is mainly attributed to the removal of polymer residues and further confirmed by subsequent atomic force microscopy analysis. More importantly, our gated measurements demonstrate that the proposed approach has resulted in a 3-fold increase of the carrier mobility in CVD graphene with the electron mobility close to 10 000 cm2V-1S-1, corresponding to an electron mean free path beyond 100 nm. This intrigues the promising application for this novel method in achieving ballistic transport for CVD graphene devices.
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Affiliation(s)
- Tianbo Duan
- Shandong Technology Centre of Nanodevices and Integration, School of Microelectronics, Shandong University, 250101 Jinan, People's Republic of China
- Department of Materials Science and Engineering, Ångström Laboratory, Uppsala University, SE-75121 Uppsala, Sweden
| | - Hu Li
- Shandong Technology Centre of Nanodevices and Integration, School of Microelectronics, Shandong University, 250101 Jinan, People's Republic of China
- Department of Materials Science and Engineering, Ångström Laboratory, Uppsala University, SE-75121 Uppsala, Sweden
- Shenzhen Research Institute of Shandong University, 518057 Shenzhen, People's Republic of China
| | | | - Klaus Leifer
- Shandong Technology Centre of Nanodevices and Integration, School of Microelectronics, Shandong University, 250101 Jinan, People's Republic of China
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17
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Integrated wafer-scale ultra-flat graphene by gradient surface energy modulation. Nat Commun 2022; 13:5410. [PMID: 36109519 PMCID: PMC9477858 DOI: 10.1038/s41467-022-33135-w] [Citation(s) in RCA: 10] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/05/2022] [Accepted: 09/02/2022] [Indexed: 11/11/2022] Open
Abstract
The integration of large-scale two-dimensional (2D) materials onto semiconductor wafers is highly desirable for advanced electronic devices, but challenges such as transfer-related crack, contamination, wrinkle and doping remain. Here, we developed a generic method by gradient surface energy modulation, leading to a reliable adhesion and release of graphene onto target wafers. The as-obtained wafer-scale graphene exhibited a damage-free, clean, and ultra-flat surface with negligible doping, resulting in uniform sheet resistance with only ~6% deviation. The as-transferred graphene on SiO2/Si exhibited high carrier mobility reaching up ~10,000 cm2 V−1 s−1, with quantum Hall effect (QHE) observed at room temperature. Fractional quantum Hall effect (FQHE) appeared at 1.7 K after encapsulation by h-BN, yielding ultra-high mobility of ~280,000 cm2 V−1 s−1. Integrated wafer-scale graphene thermal emitters exhibited significant broadband emission in near-infrared (NIR) spectrum. Overall, the proposed methodology is promising for future integration of wafer-scale 2D materials in advanced electronics and optoelectronics. Defect-free integration of 2D materials onto semiconductor wafers is desired to implement heterogeneous electronic devices. Here, the authors report a method to transfer high-quality graphene on target wafers via gradient surface energy modulation, leading to improved structural and electronic properties.
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18
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Okada M, Pu J, Lin YC, Endo T, Okada N, Chang WH, Lu AKA, Nakanishi T, Shimizu T, Kubo T, Miyata Y, Suenaga K, Takenobu T, Yamada T, Irisawa T. Large-Scale 1T'-Phase Tungsten Disulfide Atomic Layers Grown by Gas-Source Chemical Vapor Deposition. ACS NANO 2022; 16:13069-13081. [PMID: 35849128 DOI: 10.1021/acsnano.2c05699] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
The control of crystal polymorphism and exploration of metastable, two-dimensional, 1T'-phase, transition-metal dichalcogenides (TMDs) have received considerable research attention. 1T'-phase TMDs are expected to offer various opportunities for the study of basic condensed matter physics and for its use in important applications, such as devices with topological states for quantum computing, low-resistance contact for semiconducting TMDs, energy storage devices, and as hydrogen evolution catalysts. However, due to the high energy difference and phase change barrier between 1T' and the more stable 2H-phase, there are few methods that can be used to obtain monolayer 1T'-phase TMDs. Here, we report on the chemical vapor deposition (CVD) growth of 1T'-phase WS2 atomic layers from gaseous precursors, i.e., H2S and WF6, with alkali metal assistance. The gaseous nature of the precursors, reducing properties of H2S, and presence of Na+, which acts as a countercation, provided an optimal environment for the growth of 1T'-phase WS2, resulting in the formation of high-quality submillimeter-sized crystals. The crystal structure was characterized by atomic-resolution scanning transmission electron microscopy, and the zigzag chain structure of W atoms, which is characteristic of the 1T' structure, was clearly observed. Furthermore, the grown 1T'-phase WS2 showed superconductivity with the transition temperature in the 2.8-3.4 K range and large upper critical field anisotropy. Thus, alkali metal assisted gas-source CVD growth is useful for realizing large-scale, high-quality, phase-engineered TMD atomic layers via a bottom-up synthesis.
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Affiliation(s)
- Mitsuhiro Okada
- Nano Carbon Device Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Jiang Pu
- Department of Applied Physics, Nagoya University, Nagoya 464-8603, Japan
| | - Yung-Chang Lin
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Takahiko Endo
- Department of Physics, Tokyo Metropolitan University, Hachioji 192-0397, Japan
| | - Naoya Okada
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8568, Japan
| | - Wen-Hsin Chang
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8568, Japan
| | - Anh Khoa Augustin Lu
- Mathematics for Advanced Materials Open Innovation Laboratory, National Institute of Advanced Industrial Science and Technology (AIST), Sendai 980-8577, Japan
- International Center for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), Tsukuba 305-0044, Japan
| | - Takeshi Nakanishi
- Mathematics for Advanced Materials Open Innovation Laboratory, National Institute of Advanced Industrial Science and Technology (AIST), Sendai 980-8577, Japan
| | - Tetsuo Shimizu
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Toshitaka Kubo
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Yasumitsu Miyata
- Department of Physics, Tokyo Metropolitan University, Hachioji 192-0397, Japan
| | - Kazu Suenaga
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
- The Institute of Scientific and Industrial Research (ISIR-SANKEN), Osaka University, Osaka 567-0047, Japan
| | - Taishi Takenobu
- Department of Applied Physics, Nagoya University, Nagoya 464-8603, Japan
| | - Takatoshi Yamada
- Nano Carbon Device Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Toshifumi Irisawa
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8568, Japan
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19
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Beckmann Y, Grundmann A, Daniel L, Abdelbaky M, McAleese C, Wang X, Conran B, Pasko S, Krotkus S, Heuken M, Kalisch H, Vescan A, Mertin W, Kümmell T, Bacher G. Role of Surface Adsorbates on the Photoresponse of (MO)CVD-Grown Graphene-MoS 2 Heterostructure Photodetectors. ACS APPLIED MATERIALS & INTERFACES 2022; 14:35184-35193. [PMID: 35852455 DOI: 10.1021/acsami.2c06047] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
A promising strategy toward ultrathin, sensitive photodetectors is the combination of a photoactive semiconducting transition-metal dichalcogenide (TMDC) monolayer like MoS2 with highly conductive graphene. Such devices often exhibit a complex and contradictory photoresponse as incident light can trigger both photoconductivity and photoinduced desorption of molecules from the surface. Here, we use metal-organic chemical vapor deposition (MOCVD) to directly grow MoS2 on top of graphene that is deposited on a sapphire wafer via chemical vapor deposition (CVD) for realizing graphene-MoS2 photodetectors. Two-color optical pump-electrical probe experiments allow for separation of light-induced carrier transfer across the graphene-MoS2 heterointerface from adsorbate-induced effects. We demonstrate that adsorbates strongly modify both magnitude and sign of the photoconductivity. This is attributed to a change of the graphene doping from p- to n-type in case adsorbates are being desorbed, while in either case, photogenerated electrons are transferred from MoS2 to graphene. This nondestructive probing method sheds light on the charge carrier transfer mechanisms and the role of adsorbates in two-dimensional (2D) heterostructure photodetectors.
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Affiliation(s)
- Yannick Beckmann
- Werkstoffe der Elektrotechnik and CENIDE, University of Duisburg-Essen, 47057 Duisburg, Germany
| | - Annika Grundmann
- Compound Semiconductor Technology, RWTH Aachen University, 52074 Aachen, Germany
| | - Leon Daniel
- Werkstoffe der Elektrotechnik and CENIDE, University of Duisburg-Essen, 47057 Duisburg, Germany
| | - Mohamed Abdelbaky
- Werkstoffe der Elektrotechnik and CENIDE, University of Duisburg-Essen, 47057 Duisburg, Germany
| | | | | | | | | | | | - Michael Heuken
- Compound Semiconductor Technology, RWTH Aachen University, 52074 Aachen, Germany
- AIXTRON SE, 52134 Herzogenrath, Germany
| | - Holger Kalisch
- Compound Semiconductor Technology, RWTH Aachen University, 52074 Aachen, Germany
| | - Andrei Vescan
- Compound Semiconductor Technology, RWTH Aachen University, 52074 Aachen, Germany
| | - Wolfgang Mertin
- Werkstoffe der Elektrotechnik and CENIDE, University of Duisburg-Essen, 47057 Duisburg, Germany
| | - Tilmar Kümmell
- Werkstoffe der Elektrotechnik and CENIDE, University of Duisburg-Essen, 47057 Duisburg, Germany
| | - Gerd Bacher
- Werkstoffe der Elektrotechnik and CENIDE, University of Duisburg-Essen, 47057 Duisburg, Germany
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20
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Thompson A, Lee KS, Lewis NS. Strain-Based Chemiresistive Polymer-Coated Graphene Vapor Sensors. ACS OMEGA 2022; 7:10765-10774. [PMID: 35382337 PMCID: PMC8973036 DOI: 10.1021/acsomega.2c00543] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/26/2022] [Accepted: 02/28/2022] [Indexed: 05/04/2023]
Abstract
Suspended chemiresistive graphene sensors have been fabricated using well-established nanofabrication techniques to generate sensors that are highly sensitive to pyridine and with excellent discrimination between polar and nonpolar analytes. When coated with a polymer surface layer and suspended on 3-D patterned glass electrodes, a hybrid combination of polymer and graphene yields chemiresistive vapor sensors. Expansion and contraction of the polymer layer produces strain on the suspended graphene (Gr). Hence, when organic vapors permeate into the polymer layer, the high gauge factor of the graphene induces substantial electrical resistive changes as folds and creases are induced in the graphene. The hybrid suspended polymer/Gr sensor exhibits substantial responses to polar organic vapors, especially pyridine, while also exhibiting reversibility and increased discrimination between polar and nonpolar analytes compared to previous approaches. This sensor design also allows for potential tunability in the types of polymers used for the reactive surface layer, allowing for use in a variety of potential applications.
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21
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Siao MD, Gandhi AC, Sahoo AK, Wu YC, Syu HK, Tsai MY, Tsai TH, Yang YC, Lin YF, Liu RS, Chiu PW. WSe 2/WS 2 Heterobilayer Nonvolatile Memory Device with Boosted Charge Retention. ACS APPLIED MATERIALS & INTERFACES 2022; 14:3467-3475. [PMID: 34995438 DOI: 10.1021/acsami.1c20076] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
A two-dimensional (2D) nonvolatile memory device architecture to improve the long-term charge retention with the minimum charge loss without compromising storage capacity and the extinction ratio for practical applications has been an imminent demand. To address the current issue, we adopted a novel type-II band-aligned heterobilayer channel comprising vertically stacked monolayer WSe2 nanodots on monolayer WS2. The band offset modulation leads to electron doping from WSe2 nanodots into the WS2 channel without any external driving electric field. As a result, the tested device outperformed with a memory window as high as 34 V and a negligible charge loss of 7% in a retention period of 10 years while maintaining a high extinction ratio of 106. The doping technique presented in this work provides a feasible route to modulate the electrical properties of 2D channel materials without hampering charge transport, paving the way for high-performance 2D memory devices.
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Affiliation(s)
- Ming-Deng Siao
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | | | - Anup Kumar Sahoo
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yi-Chieh Wu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Hong-Kai Syu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Meng-Yu Tsai
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Physics, National Chung Hsing University, Taichung 40227, Taiwan
| | - Tsung-Han Tsai
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yueh-Chiang Yang
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yen-Fu Lin
- Department of Physics, National Chung Hsing University, Taichung 40227, Taiwan
| | - Rai-Shung Liu
- Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Taiwan
- Frontier Research Center on Fundamental and Applied Science of Matters, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Po-Wen Chiu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
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22
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Zhao YX, Zhou XF, Zhang Y, He L. Oscillations of the Spacing between van Hove Singularities Induced by sub-Ångstrom Fluctuations of Interlayer Spacing in Graphene Superlattices. PHYSICAL REVIEW LETTERS 2021; 127:266801. [PMID: 35029491 DOI: 10.1103/physrevlett.127.266801] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/02/2021] [Revised: 06/27/2021] [Accepted: 11/18/2021] [Indexed: 06/14/2023]
Abstract
Physical properties of two-dimensional van der Waals (vdWs) structures depend sensitively on both stacking orders and interlayer interactions. Yet, in most cases studied to date, the interlayer interaction is considered to be a "static" property of the vdWs structures. Here we demonstrate that applying a scanning tunneling microscopy (STM) tip pulse on twisted bilayer graphene (TBG) can induce sub-Ångstrom fluctuations of the interlayer separation in the TBG, which are equivalent to dynamic vertical external pressure of about 10 GPa on the TBG. The sub-Ångstrom fluctuations of the interlayer separation result in large oscillations of the energy separations between two van Hove singularities (VHSs) in the TBG. The period of the oscillations of the VHSs spacing is extremely long, about 500-1000 sec, attributing to tip-induced local stress in the atomic-thick TBG. Our result provides an efficient method to tune and measure the physical properties of the vdWs structures dynamically.
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Affiliation(s)
- Ya-Xin Zhao
- Center for Advanced Quantum Studies, Department of Physics, Beijing Normal University, Beijing, 100875, People's Republic of China
| | - Xiao-Feng Zhou
- Center for Advanced Quantum Studies, Department of Physics, Beijing Normal University, Beijing, 100875, People's Republic of China
| | - Yu Zhang
- Center for Advanced Quantum Studies, Department of Physics, Beijing Normal University, Beijing, 100875, People's Republic of China
- School of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing 100081, China
- Advanced Research Institute of Multidisciplinary Science, Beijing Institute of Technology, Beijing 100081, China
| | - Lin He
- Center for Advanced Quantum Studies, Department of Physics, Beijing Normal University, Beijing, 100875, People's Republic of China
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23
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Gao Y, Chen J, Chen G, Fan C, Liu X. Recent Progress in the Transfer of Graphene Films and Nanostructures. SMALL METHODS 2021; 5:e2100771. [PMID: 34928026 DOI: 10.1002/smtd.202100771] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/07/2021] [Revised: 10/13/2021] [Indexed: 06/14/2023]
Abstract
The one-atom-thick graphene has excellent electronic, optical, thermal, and mechanical properties. Currently, chemical vapor deposition (CVD) graphene has received a great deal of attention because it provides access to large-area and uniform films with high-quality. This allows the fabrication of graphene based-electronics, sensors, photonics, and optoelectronics for practical applications. Zero bandgap, however, limits the application of a graphene film as electronic transistor. The most commonly used bottom-up approaches have achieved efficient tuning of the electronic bandgap by customizing well-defined graphene nanostructures. The postgrowth transfer of graphene films/nanostructures to a certain substrate is crucial in utilizing graphene in applicable devices. In this review, the basic growth mechanism of CVD graphene is first introduced. Then, recent advances in various transfer methods of as-grown graphene to target substrates are presented. The fabrication and transfer methods of graphene nanostructures are also provided, and then the transfer-related applications are summarized. At last, the challenging issues and the potential transfer-free approaches are discussed.
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Affiliation(s)
- Yanjing Gao
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Jielin Chen
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Guorui Chen
- Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Chunhai Fan
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Xiaoguo Liu
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
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24
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Jang Y, Seo YM, Jang HS, Heo K, Whang D. Performance Improvement of Residue-Free Graphene Field-Effect Transistor Using Au-Assisted Transfer Method. SENSORS 2021; 21:s21217262. [PMID: 34770570 PMCID: PMC8587746 DOI: 10.3390/s21217262] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/08/2021] [Revised: 10/19/2021] [Accepted: 10/26/2021] [Indexed: 11/27/2022]
Abstract
We report a novel graphene transfer technique for fabricating graphene field-effect transistors (FETs) that avoids detrimental organic contamination on a graphene surface. Instead of using an organic supporting film like poly(methyl methacrylate) (PMMA) for graphene transfer, Au film is directly deposited on the as-grown graphene substrate. Graphene FETs fabricated using the established organic film transfer method are easily contaminated by organic residues, while Au film protects graphene channels from these contaminants. In addition, this method can also simplify the device fabrication process, as the Au film acts as an electrode. We successfully fabricated graphene FETs with a clean surface and improved electrical properties using this Au-assisted transfer method.
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Affiliation(s)
- Yamujin Jang
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Korea;
| | - Young-Min Seo
- Institute of Advanced Composite Materials, Korea Institute of Science and Technology (KIST), Jeonju 55324, Korea; (Y.-M.S.); (H.-S.J.)
| | - Hyeon-Sik Jang
- Institute of Advanced Composite Materials, Korea Institute of Science and Technology (KIST), Jeonju 55324, Korea; (Y.-M.S.); (H.-S.J.)
| | - Keun Heo
- School of Semiconductor and Chemical Engineering, Jeonbuk National University, Jeonju 54896, Korea;
| | - Dongmok Whang
- School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Korea;
- Correspondence: ; Tel.: +82-31-2907399; Fax: +82-31-2907410
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25
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Yuan K, Song T, Yang C, Guo J, Sun Q, Zou Y, Jiao F, Li L, Zhang X, Dong H, Li L, Hu W. Polymer-Assisted Space-Confined Strategy for the Foot-Scale Synthesis of Flexible Metal-Organic Framework-Based Composite Films. J Am Chem Soc 2021; 143:17526-17534. [PMID: 34644063 DOI: 10.1021/jacs.1c07033] [Citation(s) in RCA: 9] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/01/2023]
Abstract
At the gas-liquid interface, the confined synthesis of metal-organic framework (MOF) films has been extensively developed by spreading an ultrathin oil layer on the aqueous surface as a reactor. However, this interface is susceptible to various disturbances and incapable of synthesizing large-area crystalline MOF films. Herein, we developed a polymer-assisted space-confined strategy to synthesize large-area films by blending poly(methyl methacrylate) (PMMA) into the oil layer, which improved the stability of the gas-liquid interface and the self-shrinkage of the oil layer on the water surface. Meanwhile, the as-synthesized MOFs as a quasi-solid substrate immobilized the edge of the oil layer, which maintained a large spreading area. Thanks to this synergistic effect, we synthesized the freestanding MOF-based film with a foot-level (0.66 ft) lateral dimension, which is the largest size reported so far. Besides, due to the phase separation of the two components, the MOF-PMMA composite film combined the conductivity of MOFs (1.13 S/m) with the flexibility of PMMA and exhibited excellent mechanical properties. More importantly, this strategy could be extended to the preparation of other MOFs, coordination polymers (CPs), and even inorganic material composite films, bringing light to the design and large-scale synthesis of various composite films for practical applications.
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Affiliation(s)
- Kuo Yuan
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China.,Institute for New Energy Materials and Low Carbon Technologies, School of Materials Science and Engineering, Tianjin University of Technology, Tianjin 300384, China
| | - Tianqun Song
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China.,School of Chemistry and Chemical Engineering, Liaoning Normal University, Dalian 116029, China
| | - Chenhuai Yang
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China
| | - Jun Guo
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China
| | - Qisheng Sun
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China
| | - Ye Zou
- National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
| | - Fei Jiao
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China
| | - Lujiang Li
- School of Materials Science and Engineering, Nankai University, Tianjin 300071, China
| | - Xiaotao Zhang
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China
| | - Huanli Dong
- National Laboratory for Molecular Sciences, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
| | - Liqiang Li
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China
| | - Wenping Hu
- Department of Chemistry, School of Science and Collaborative Innovation Center of Chemical Science and Engineering, Tianjin University, Tianjin 300072, China.,Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Binhai New City, Fuzhou 350207, China
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26
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Zhang R, Li M, Li L, Fan Y, Zhang Q, Yu G, Geng D, Hu W. The way towards for ultraflat and superclean graphene. NANO SELECT 2021. [DOI: 10.1002/nano.202100217] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022] Open
Affiliation(s)
- Ruijie Zhang
- Department of Chemistry, School of Science, Tianjin Key Laboratory of Molecular Optoelectronic Sciences Tianjin University and Collaborative Innovation Center of Chemical Science and Engineering Tianjin P. R. China
| | - Menghan Li
- Institute of Molecular Plus Tianjin University Tianjin P. R. China
| | - Lin Li
- Institute of Molecular Plus Tianjin University Tianjin P. R. China
| | - Yixuan Fan
- Department of Chemistry, School of Science, Tianjin Key Laboratory of Molecular Optoelectronic Sciences Tianjin University and Collaborative Innovation Center of Chemical Science and Engineering Tianjin P. R. China
| | - Qing Zhang
- Faculty of Science Joint School of National University of Singapore and Tianjin University International Campus of Tianjin University Binhai New City Fuzhou 350207 China
| | - Gui Yu
- Beijing National Laboratory for Molecular Sciences CAS Research/Education Center for Excellence in Molecular Sciences Institute of Chemistry Chinese Academy of Sciences Beijing P. R. China
- School of Chemical Sciences University of Chinese Academy of Sciences Beijing P. R. China
| | - Dechao Geng
- Department of Chemistry, School of Science, Tianjin Key Laboratory of Molecular Optoelectronic Sciences Tianjin University and Collaborative Innovation Center of Chemical Science and Engineering Tianjin P. R. China
| | - Wenping Hu
- Department of Chemistry, School of Science, Tianjin Key Laboratory of Molecular Optoelectronic Sciences Tianjin University and Collaborative Innovation Center of Chemical Science and Engineering Tianjin P. R. China
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27
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Cao X, Gan X, Lang H, Peng Y. Impact of the Surface and Microstructure on the Lubricative Properties of MoS 2 Aging under Different Environments. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2021; 37:2928-2941. [PMID: 33645224 DOI: 10.1021/acs.langmuir.0c03512] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/27/2023]
Abstract
Molybdenum disulfide (MoS2) with a hydrophobic property and layered structure possesses an excellent lubricative property and has been widely used as a lubricant in various areas, including satellites, aircraft, and new energy vehicles. Aging is a ubiquitous phenomenon in MoS2 and plays a key role in its tribological application for shortening its service life. The effect of the surface and microstructure on the lubricative properties of MoS2 aging under different environments, including deionized water (DI water), ultraviolet/ozone (UV/Ozone), and high-temperature, was investigated. First, the lubrication of MoS2 transiently degrades because of physical adsorption and recovers after mechanical removal. The lubrication of MoS2 also degrades slightly when its surface becomes hydrophilic, thereby enhancing the adhesion energy due to atomic oxygen interaction under UV/Ozone exposure. Second, the lubrication of MoS2 degrades irreversibly because of the formation of stripes with the destroyed structures under accelerated aging. The lubrication of MoS2 further degrades with the formation of small triangular pits under high-temperature annealing. Finally, the lubrication of MoS2 deteriorates due to the destroyed structure and complete oxidation. The severe aging of MoS2 is accompanied with large triangular pits due to anisotropic oxidation etching of MoS2. The lubrication failure of MoS2 was determined on the basis of structural defect formation and surface property degradation induced by the extent of oxygen diffusion. The enhanced out-of-plane deformation due to the reduced out-of-plane stiffness and the increased energy barriers of defects are fundamentally responsible for the lubrication degradation of MoS2 at the atomic scale. These findings can provide new insights into the atomic-scale mechanism underlying the lubrication failure of MoS2 and pave the way for the realization of MoS2-based lubrication application under various environments.
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Affiliation(s)
- Xing'an Cao
- College of Mechanical Engineering, Donghua University, Shanghai 201620, China
| | - Xuehui Gan
- Shanghai Collaborative Innovation Center for High Performance Fiber Composites, Donghua University, Shanghai 201620, China
| | - Haojie Lang
- College of Mechanical Engineering, Donghua University, Shanghai 201620, China
| | - Yitian Peng
- Shanghai Collaborative Innovation Center for High Performance Fiber Composites, Donghua University, Shanghai 201620, China
- College of Mechanical Engineering, Donghua University, Shanghai 201620, China
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28
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Han Y, Zhou J, Wang H, Gao L, Feng S, Cao K, Xu Z, Lu Y. Experimental nanomechanics of 2D materials for strain engineering. APPLIED NANOSCIENCE 2021. [DOI: 10.1007/s13204-021-01702-0] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/24/2022]
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29
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Cheng P, Moehring NK, Idrobo JC, Ivanov IN, Kidambi PR. Scalable synthesis of nanoporous atomically thin graphene membranes for dialysis and molecular separations via facile isopropanol-assisted hot lamination. NANOSCALE 2021; 13:2825-2837. [PMID: 33508042 DOI: 10.1039/d0nr07384a] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Scalable graphene synthesis and facile large-area membrane fabrication are imperative to advance nanoporous atomically thin membranes (NATMs) for molecular separations. Although chemical vapor deposition (CVD) allows for roll-to-roll high-quality monolayer graphene synthesis, facile transfer with atomically clean interfaces to porous supports for large-area NATM fabrication remains extremely challenging. Sacrificial polymer scaffolds commonly used for graphene transfer typically leave polymer residues detrimental to membrane performance and transfers without polymer scaffolds suffer from low yield resulting in high non-selective leakage through NATMs. Here, we systematically study the factors influencing graphene NATM fabrication and report on a novel roll-to-roll manufacturing compatible isopropanol-assisted hot lamination (IHL) process that enables scalable, facile and clean transfer of CVD graphene on to polycarbonate track etched (PCTE) supports with coverage ≥99.2%, while preserving support integrity/porosity. We demonstrate fully functional centimeter-scale graphene NATMs that show record high permeances (∼2-3 orders of magnitude higher) and better selectivity than commercially available state-of-the-art polymeric dialysis membranes, specifically in the 0-1000 Da range. Our work highlights a scalable approach to fabricate graphene NATMs for practical applications and is fully compatible with roll-to-roll manufacturing processes.
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Affiliation(s)
- Peifu Cheng
- Department of Chemical and Biomolecular Engineering, Vanderbilt University, Nashville, Tennessee 37212, USA.
| | - Nicole K Moehring
- Department of Chemical and Biomolecular Engineering, Vanderbilt University, Nashville, Tennessee 37212, USA. and Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, Tennessee 37212, USA
| | - Juan Carlos Idrobo
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA
| | - Ilia N Ivanov
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA
| | - Piran R Kidambi
- Department of Chemical and Biomolecular Engineering, Vanderbilt University, Nashville, Tennessee 37212, USA. and Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, Tennessee 37212, USA and Department of Mechanical Engineering, Vanderbilt University, Nashville, Tennessee 37212, USA
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30
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Quellmalz A, Wang X, Sawallich S, Uzlu B, Otto M, Wagner S, Wang Z, Prechtl M, Hartwig O, Luo S, Duesberg GS, Lemme MC, Gylfason KB, Roxhed N, Stemme G, Niklaus F. Large-area integration of two-dimensional materials and their heterostructures by wafer bonding. Nat Commun 2021; 12:917. [PMID: 33568669 PMCID: PMC7876008 DOI: 10.1038/s41467-021-21136-0] [Citation(s) in RCA: 42] [Impact Index Per Article: 14.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/14/2020] [Accepted: 01/14/2021] [Indexed: 01/31/2023] Open
Abstract
Integrating two-dimensional (2D) materials into semiconductor manufacturing lines is essential to exploit their material properties in a wide range of application areas. However, current approaches are not compatible with high-volume manufacturing on wafer level. Here, we report a generic methodology for large-area integration of 2D materials by adhesive wafer bonding. Our approach avoids manual handling and uses equipment, processes, and materials that are readily available in large-scale semiconductor manufacturing lines. We demonstrate the transfer of CVD graphene from copper foils (100-mm diameter) and molybdenum disulfide (MoS2) from SiO2/Si chips (centimeter-sized) to silicon wafers (100-mm diameter). Furthermore, we stack graphene with CVD hexagonal boron nitride and MoS2 layers to heterostructures, and fabricate encapsulated field-effect graphene devices, with high carrier mobilities of up to [Formula: see text]. Thus, our approach is suited for backend of the line integration of 2D materials on top of integrated circuits, with potential to accelerate progress in electronics, photonics, and sensing.
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Affiliation(s)
- Arne Quellmalz
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, Stockholm, Sweden.
| | - Xiaojing Wang
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, Stockholm, Sweden
| | - Simon Sawallich
- Protemics GmbH, Aachen, Germany
- Chair of Electronic Devices, Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Aachen, Germany
| | - Burkay Uzlu
- Chair of Electronic Devices, Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Aachen, Germany
- AMO GmbH, Advanced Microelectronic Center Aachen (AMICA), Aachen, Germany
| | - Martin Otto
- AMO GmbH, Advanced Microelectronic Center Aachen (AMICA), Aachen, Germany
| | - Stefan Wagner
- AMO GmbH, Advanced Microelectronic Center Aachen (AMICA), Aachen, Germany
| | - Zhenxing Wang
- AMO GmbH, Advanced Microelectronic Center Aachen (AMICA), Aachen, Germany
| | - Maximilian Prechtl
- Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, Universität der Bundeswehr München, Neubiberg, Germany
| | - Oliver Hartwig
- Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, Universität der Bundeswehr München, Neubiberg, Germany
| | - Siwei Luo
- Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, Universität der Bundeswehr München, Neubiberg, Germany
| | - Georg S Duesberg
- Institute of Physics, EIT 2, Faculty of Electrical Engineering and Information Technology, Universität der Bundeswehr München, Neubiberg, Germany
| | - Max C Lemme
- Chair of Electronic Devices, Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Aachen, Germany
- AMO GmbH, Advanced Microelectronic Center Aachen (AMICA), Aachen, Germany
| | - Kristinn B Gylfason
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, Stockholm, Sweden
| | - Niclas Roxhed
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, Stockholm, Sweden
| | - Göran Stemme
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, Stockholm, Sweden
| | - Frank Niklaus
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, Stockholm, Sweden.
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31
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Woo G, Kim HU, Yoo H, Kim T. Recyclable free-polymer transfer of nano-grain MoS 2 film onto arbitrary substrates. NANOTECHNOLOGY 2021; 32:045702. [PMID: 32998130 DOI: 10.1088/1361-6528/abbcea] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Clean transfer of transition metal dichalcogenides (TMDs) film is highly desirable, as intrinsic properties of TMDs may be degraded in a conventional wet transfer process using a polymer-based resist and toxic chemical solvent. Residues from the resists often remain on the transferred TMDs, thereby causing a significant variation in their electrical and optical characteristics. Therefore, an alternative to the conventional wet transfer method is needed-one in which no residue is left behind. Herein, we report that our molybdenum disulfide (MoS2) films synthesized by plasma-enhanced chemical vapor deposition can be easily transferred onto arbitrary substrates (such as SiO2/Si, polyimide, fluorine-doped tin oxide, and polyethersulfone) by using water alone, i.e. without residues or chemical solvents. The transferred MoS2 film retains its original morphology and physical properties, which are investigated by optical microscopy, atomic force microscopy, Raman, x-ray photoelectron spectroscopy, and surface tension analysis. Furthermore, we demonstrate multiple recycling of the resist-free transfer for the nano-grain MoS2 film. Using the proposed water-assisted and recyclable transfer, MoS2/p-doped Si wafer photodiode was fabricated, and the opto-electric properties of the photodiode were characterized to demonstrate the feasibility of the proposed method.
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Affiliation(s)
- Gunhoo Woo
- SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-do 16419, Republic of Korea
| | - Hyeong-U Kim
- SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-do 16419, Republic of Korea
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, United States of America
| | - Hocheon Yoo
- Department of Electronic Engineering, Gachon University, Seongnam, Gyeonggi-do 13120, Republic of Korea
| | - Taesung Kim
- SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University (SKKU), Suwon, Gyeonggi-do 16419, Republic of Korea
- School of Mechanical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 16419, Republic of Korea
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32
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Tsai YY, Kuo CY, Li BC, Chiu PW, Hsu KYJ. A Graphene/Polycrystalline Silicon Photodiode and Its Integration in a Photodiode-Oxide-Semiconductor Field Effect Transistor. MICROMACHINES 2020; 11:mi11060596. [PMID: 32560333 PMCID: PMC7344728 DOI: 10.3390/mi11060596] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/25/2020] [Revised: 06/13/2020] [Accepted: 06/15/2020] [Indexed: 11/16/2022]
Abstract
In recent years, the characteristics of the graphene/crystalline silicon junction have been frequently discussed in the literature, but study of the graphene/polycrystalline silicon junction and its potential applications is hardly found. The present work reports the observation of the electrical and optoelectronic characteristics of a graphene/polycrystalline silicon junction and explores one possible usage of the junction. The current–voltage curve of the junction was measured to show the typical exponential behavior that can be seen in a forward biased diode, and the photovoltage of the junction showed a logarithmic dependence on light intensity. A new phototransistor named the “photodiode–oxide–semiconductor field effect transistor (PDOSFET)” was further proposed and verified in this work. In the PDOSFET, a graphene/polycrystalline silicon photodiode was directly merged on top of the gate oxide of a conventional metal–oxide–semiconductor field effect transistor (MOSFET). The magnitude of the channel current of this phototransistor showed a logarithmic dependence on the illumination level. It is shown in this work that the PDOSFET facilitates a better pixel design in a complementary metal–oxide–semiconductor (CMOS) image sensor, especially beneficial for high dynamic range (HDR) image detection.
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33
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Choi JH, Shin DH, Inani H, Kwon MH, Mustonen K, Mangler C, Park M, Jeong H, Lee DS, Kotakoski J, Lee SW. Transformation and Evaporation of Surface Adsorbents on a Graphene "Hot Plate". ACS APPLIED MATERIALS & INTERFACES 2020; 12:26313-26319. [PMID: 32400150 PMCID: PMC7291352 DOI: 10.1021/acsami.0c02056] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/03/2020] [Accepted: 05/13/2020] [Indexed: 06/11/2023]
Abstract
Dynamic surface modification of suspended graphene at high temperatures was directly observed with in situ scanning transmission electron microscopy (STEM) measurements. The suspended graphene devices were prepared on a SiN membrane substrate with a hole so that STEM observations could be conducted during Joule heating. Current-voltage characteristics of suspended graphene devices inside the STEM chamber were measured while monitoring and controlling the temperature of graphene by estimating the electrical power of the devices. During the in situ STEM observation at high temperatures, residual hydrocarbon adsorbents that had remained on graphene effectively evaporated creating large, atomically clean graphene areas. At other places, dynamic changes in the shape, position, and orientation of adsorbents could be directly observed. The temperature of the suspended graphene sample was estimated to reach up to 2000 K during the experiment, making graphene an efficient high-temperature micrometer-sized electron-transparent hot plate for future experiments in microscopes.
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Affiliation(s)
- Jun Hee Choi
- Department of Physics, Ewha Womans University, 03760 Seoul, Korea
- Surface Technology Division, Korea Institute
of Materials Science (KIMS), 797 Changwondaero, Sungsan-Gu, Changwon, Gyeongnam 51508, Korea
| | - Dong Hoon Shin
- Department of Physics, Ewha Womans University, 03760 Seoul, Korea
| | - Heena Inani
- Faculty of Physics, University of Vienna, 1090 Vienna, Austria
| | - Min Hee Kwon
- Department of Physics, Ewha Womans University, 03760 Seoul, Korea
| | - Kimmo Mustonen
- Faculty of Physics, University of Vienna, 1090 Vienna, Austria
| | - Clemens Mangler
- Faculty of Physics, University of Vienna, 1090 Vienna, Austria
| | - Min Park
- Functional Composite Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 55324, Korea
| | - Hyunjeong Jeong
- Department of Physics, Ewha Womans University, 03760 Seoul, Korea
| | - Dong Su Lee
- Functional Composite Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 55324, Korea
| | - Jani Kotakoski
- Faculty of Physics, University of Vienna, 1090 Vienna, Austria
| | - Sang Wook Lee
- Department of Physics, Ewha Womans University, 03760 Seoul, Korea
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34
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Mustonen P, Mackenzie DMA, Lipsanen H. Review of fabrication methods of large-area transparent graphene electrodes for industry. FRONTIERS OF OPTOELECTRONICS 2020; 13:91-113. [PMID: 36641556 PMCID: PMC7362318 DOI: 10.1007/s12200-020-1011-5] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/05/2020] [Accepted: 06/05/2020] [Indexed: 05/15/2023]
Abstract
Graphene is a two-dimensional material showing excellent properties for utilization in transparent electrodes; it has low sheet resistance, high optical transmission and is flexible. Whereas the most common transparent electrode material, tin-doped indium-oxide (ITO) is brittle, less transparent and expensive, which limit its compatibility in flexible electronics as well as in low-cost devices. Here we review two large-area fabrication methods for graphene based transparent electrodes for industry: liquid exfoliation and low-pressure chemical vapor deposition (CVD). We discuss the basic methodologies behind the technologies with an emphasis on optical and electrical properties of recent results. State-of-the-art methods for liquid exfoliation have as a figure of merit an electrical and optical conductivity ratio of 43.5, slightly over the minimum required for industry of 35, while CVD reaches as high as 419.
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Affiliation(s)
- Petri Mustonen
- Department of Electronics and Nanoengineering, Aalto University, Aalto, FI-00076, Finland.
| | - David M A Mackenzie
- Department of Electronics and Nanoengineering, Aalto University, Aalto, FI-00076, Finland
| | - Harri Lipsanen
- Department of Electronics and Nanoengineering, Aalto University, Aalto, FI-00076, Finland
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35
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Qing F, Zhang Y, Niu Y, Stehle R, Chen Y, Li X. Towards large-scale graphene transfer. NANOSCALE 2020; 12:10890-10911. [PMID: 32400813 DOI: 10.1039/d0nr01198c] [Citation(s) in RCA: 29] [Impact Index Per Article: 7.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
The transfer process is crucial for obtaining high-quality graphene for its large-scale industrial application. In this review, graphene transfer methods are systematically classified along with an analysis of the contamination or impurity of graphene that is introduced during the transfer process. Two key processes are emphasized, the substrate removal process and the direct/indirect transfer of graphene. Based on the efficiency and cost factors of industrial scale production, various transfer methods are summarized and evaluated. Potential transfer technologies and future research directions for industrial application are prospected.
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Affiliation(s)
- Fangzhu Qing
- School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China. and State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China
| | - Yufeng Zhang
- School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China.
| | - Yuting Niu
- School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China.
| | - Richard Stehle
- Mechanical Engineering Department, Sichuan University - Pittsburgh Institute, Sichuan University, Jiang'an Campus, Chengdu 610207, P. R. China.
| | - Yuanfu Chen
- School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China. and State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China
| | - Xuesong Li
- School of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China. and State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, P. R. China
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36
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Lin YC, Ji HG, Chang LJ, Chang YP, Liu Z, Lee GD, Chiu PW, Ago H, Suenaga K. Scanning Moiré Fringe Method: A Superior Approach to Perceive Defects, Interfaces, and Distortion in 2D Materials. ACS NANO 2020; 14:6034-6042. [PMID: 32324376 DOI: 10.1021/acsnano.0c01729] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Scanning moiré fringe (SMF) is a widely utilized technique for the precise measurement of the strain field in semiconductor transistors and heterointerfaces. With the growing challenges of traditional chip scaling, two-dimensional (2D) materials turn out to be ideal candidates for incorporation into semiconductor devices. Therefore, a method to efficiently locate defects and grain boundaries in 2D materials is highly essential. Here, we present a demonstration of using the SMF method to locate the domain boundaries at the nearly coherent interfaces with sub-angstrom spatial resolution under submicron fields of views. The strain field of small angle grain boundary and lateral heterojunction are instantaneously found and precisely determined by a quick SMF method without any atomic resolution images.
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Affiliation(s)
- Yung-Chang Lin
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
| | - Hyun Goo Ji
- Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
| | - Li-Jen Chang
- Information and Communications Research Laboratories, Industrial Technology Research Institute, Hsinchu 31040, Taiwan
- Institute of Communication Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan
| | - Yao-Pang Chang
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Zheng Liu
- Innovative Functional Materials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Nagoya 463-8560, Japan
| | - Gun-Do Lee
- Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University, Seoul 151-742, Republic of Korea
| | - Po-Wen Chiu
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Hiroki Ago
- Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan
- Global Innovation Center (GIC), Kyushu University, Fukuoka 816-8580, Japan
| | - Kazu Suenaga
- Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8565, Japan
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37
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Shahzad K, Jia K, Zhao C, Yan X, Yadong Z, Usman M, Luo J. An Improved Rosin Transfer Process for the Reduction of Residue Particles for Graphene. NANOSCALE RESEARCH LETTERS 2020; 15:85. [PMID: 32303942 PMCID: PMC7165237 DOI: 10.1186/s11671-020-03312-1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/18/2019] [Accepted: 03/30/2020] [Indexed: 06/11/2023]
Abstract
In this work, an improved rosin transfer process is initiated. An anisole coating is introduced based on the rosin transfer process to reduce the residue particles on the surface of transferred graphene. Rosin/graphene and anisole/rosin/graphene samples are handled without baking and with baking at different temperatures, i.e., 100 °C, 150 °C, and 200 °C. Atomic force microscopy (AFM) and Raman spectroscopy are employed to characterize the surface properties of transferred graphene. The removal of the protective rosin layer and anisole/rosin layers without baking is found to be more effective and beneficial compared to the conventional PMMA transfer process. Furthermore, better results in terms of reduced surface roughness and residue particles are accomplished by introducing anisole in the improved rosin transfer process. Uniform and low sheet resistance (Rsh) is also observed across transferred graphene using this improved process.
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Affiliation(s)
- Kashif Shahzad
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029 People’s Republic of China
- School of Microelectronics, University of Chinese Academy of Sciences (UCAS), Beijing, 100049 People’s Republic of China
- National Center for Physics, Quaid-i-Azam University, Islamabad, 46000 Pakistan
| | - Kunpeng Jia
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029 People’s Republic of China
| | - Chao Zhao
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029 People’s Republic of China
- School of Microelectronics, University of Chinese Academy of Sciences (UCAS), Beijing, 100049 People’s Republic of China
| | - Xiangyu Yan
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029 People’s Republic of China
- School of Microelectronics, University of Chinese Academy of Sciences (UCAS), Beijing, 100049 People’s Republic of China
| | - Zhang Yadong
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029 People’s Republic of China
| | - Muhammad Usman
- National Center for Physics, Quaid-i-Azam University, Islamabad, 46000 Pakistan
| | - Jun Luo
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029 People’s Republic of China
- School of Microelectronics, University of Chinese Academy of Sciences (UCAS), Beijing, 100049 People’s Republic of China
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38
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Yeh CH, Liang ZY, Lin YC, Chen HC, Fan T, Ma CH, Chu YH, Suenaga K, Chiu PW. Graphene-Transition Metal Dichalcogenide Heterojunctions for Scalable and Low-Power Complementary Integrated Circuits. ACS NANO 2020; 14:985-992. [PMID: 31904930 DOI: 10.1021/acsnano.9b08288] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
The most pressing barrier for the development of advanced electronics based on two-dimensional (2D) layered semiconductors stems from the lack of site-selective synthesis of complementary n- and p-channels with low contact resistance. Here, we report an in-plane epitaxial route for the growth of interlaced 2D semiconductor monolayers using chemical vapor deposition with a gas-confined scheme, in which patterned graphene (Gr) serves as a guiding template for site-selective growth of Gr-WS2-Gr and Gr-WSe2-Gr heterostructures. The Gr/2D semiconductor interface exhibits a transparent contact with a nearly ideal pinning factor of 0.95 for the n-channel WS2 and 0.92 for the p-channel WSe2. The effective depinning of the Fermi level gives an ultralow contact resistance of 0.75 and 1.20 kΩ·μm for WS2 and WSe2, respectively. Integrated logic circuits including inverter, NAND gate, static random access memory, and five-stage ring oscillator are constructed using the complementary Gr-WS2-Gr-WSe2-Gr heterojunctions as a fundamental building block, featuring the prominent performance metrics of high operation frequency (>0.2 GHz), low-power consumption, large noise margins, and high operational stability. The technology presented here provides a speculative look at the electronic circuitry built on atomic-scale semiconductors in the near future.
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Affiliation(s)
- Chao-Hui Yeh
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Zheng-Yong Liang
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Yung-Chang Lin
- National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba 305-8565 , Japan
| | - Hsiang-Chieh Chen
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Ta Fan
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Chun-Hao Ma
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
- Department of Materials Science and Engineering , National Chiao Tung University , Hsinchu 30010 , Taiwan
| | - Ying-Hao Chu
- Department of Materials Science and Engineering , National Chiao Tung University , Hsinchu 30010 , Taiwan
| | - Kazu Suenaga
- National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba 305-8565 , Japan
| | - Po-Wen Chiu
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
- Institute of Atomic and Molecular Sciences , Academia Sinica , Taipei 10617 , Taiwan
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39
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Li Y, Li Z, Li Q, Tian M, Li C, Sun L, Wang J, Zhao X, Xu S, Yu F. Direct Synthesis of Graphene Dendrites on SiO 2/Si Substrates by Chemical Vapor Deposition. NANOSCALE RESEARCH LETTERS 2020; 15:16. [PMID: 31953629 PMCID: PMC6969107 DOI: 10.1186/s11671-020-3245-y] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/28/2019] [Accepted: 01/02/2020] [Indexed: 06/10/2023]
Abstract
The long-standing interest in graphene has recently brought graphene-derived materials including graphene hydrogel, graphene fiber and graphene paper into sharp focus. These graphene-derived materials show outstanding properties in mechanics and physics. In this paper, for the first time, we demonstrate the novel synthesis of graphene dendrites on SiO2/Si substrates by chemical vapor deposition. The tree-like graphene dendrites with well-controlled morphology can be directly grown on both the Si and the SiO2 surfaces of the substrates by using methane and hydrogen as precursors. The graphene dendrites on SiO2/Si substrates can be directly used in the fabrication of the electronic device. The conductivity and the Hall mobility of graphene dendrites are ~ 286 Scm-1 and ~ 574 cm2(Vs)-1, respectively. Young's modulus of graphene dendrites is up to 2.26 GPa. The developed method avoids the need for a metal substrate and is scalable and compatible with the existing semiconductor technology, making graphene dendrites be very promising in nanoelectronic applications.
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Affiliation(s)
- Yingxian Li
- Shandong Key Laboratory of Biophysics, Institute of Biophysics, College of Physics and Information, Dezhou University, Dezhou, 253023, People's Republic of China
- Institute of Crystal Materials, Advanced Research Center for Optics, Shandong University, Jinan, 250100, People's Republic of China
| | - Zhenhua Li
- Shandong Key Laboratory of Biophysics, Institute of Biophysics, College of Physics and Information, Dezhou University, Dezhou, 253023, People's Republic of China
| | - Qingbo Li
- Institute of Crystal Materials, Advanced Research Center for Optics, Shandong University, Jinan, 250100, People's Republic of China
| | - Meng Tian
- Shandong Key Laboratory of Biophysics, Institute of Biophysics, College of Physics and Information, Dezhou University, Dezhou, 253023, People's Republic of China
| | - Chunhui Li
- Shandong Key Laboratory of Biophysics, Institute of Biophysics, College of Physics and Information, Dezhou University, Dezhou, 253023, People's Republic of China
| | - Li Sun
- Institute of Crystal Materials, Advanced Research Center for Optics, Shandong University, Jinan, 250100, People's Republic of China
| | - Jihua Wang
- Shandong Key Laboratory of Biophysics, Institute of Biophysics, College of Physics and Information, Dezhou University, Dezhou, 253023, People's Republic of China
| | - Xian Zhao
- Institute of Crystal Materials, Advanced Research Center for Optics, Shandong University, Jinan, 250100, People's Republic of China
| | - Shicai Xu
- Shandong Key Laboratory of Biophysics, Institute of Biophysics, College of Physics and Information, Dezhou University, Dezhou, 253023, People's Republic of China.
| | - Fapeng Yu
- Institute of Crystal Materials, Advanced Research Center for Optics, Shandong University, Jinan, 250100, People's Republic of China.
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40
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Fan X, Smith AD, Forsberg F, Wagner S, Schröder S, Akbari SSA, Fischer AC, Villanueva LG, Östling M, Lemme MC, Niklaus F. Manufacture and characterization of graphene membranes with suspended silicon proof masses for MEMS and NEMS applications. MICROSYSTEMS & NANOENGINEERING 2020; 6:17. [PMID: 34567632 PMCID: PMC8433294 DOI: 10.1038/s41378-019-0128-4] [Citation(s) in RCA: 18] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/11/2019] [Revised: 10/18/2019] [Accepted: 11/28/2019] [Indexed: 05/13/2023]
Abstract
Graphene's unparalleled strength, chemical stability, ultimate surface-to-volume ratio and excellent electronic properties make it an ideal candidate as a material for membranes in micro- and nanoelectromechanical systems (MEMS and NEMS). However, the integration of graphene into MEMS or NEMS devices and suspended structures such as proof masses on graphene membranes raises several technological challenges, including collapse and rupture of the graphene. We have developed a robust route for realizing membranes made of double-layer CVD graphene and suspending large silicon proof masses on membranes with high yields. We have demonstrated the manufacture of square graphene membranes with side lengths from 7 µm to 110 µm, and suspended proof masses consisting of solid silicon cubes that are from 5 µm × 5 µm × 16.4 µm to 100 µm × 100 µm × 16.4 µm in size. Our approach is compatible with wafer-scale MEMS and semiconductor manufacturing technologies, and the manufacturing yields of the graphene membranes with suspended proof masses were >90%, with >70% of the graphene membranes having >90% graphene area without visible defects. The measured resonance frequencies of the realized structures ranged from tens to hundreds of kHz, with quality factors ranging from 63 to 148. The graphene membranes with suspended proof masses were extremely robust, and were able to withstand indentation forces from an atomic force microscope (AFM) tip of up to ~7000 nN. The proposed approach for the reliable and large-scale manufacture of graphene membranes with suspended proof masses will enable the development and study of innovative NEMS devices with new functionalities and improved performances.
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Affiliation(s)
- Xuge Fan
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
| | - Anderson D. Smith
- Division of Integrated Devices and Circuits, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-164 40 Kista, Sweden
| | - Fredrik Forsberg
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
| | - Stefan Wagner
- Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Otto-Blumenthal-Str. 25, 52074 Aachen, Germany
| | - Stephan Schröder
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
| | | | - Andreas C. Fischer
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
- Silex Microsystems AB, 175 26 Järfälla, Sweden
| | | | - Mikael Östling
- Division of Integrated Devices and Circuits, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-164 40 Kista, Sweden
| | - Max C. Lemme
- Faculty of Electrical Engineering and Information Technology, RWTH Aachen University, Otto-Blumenthal-Str. 25, 52074 Aachen, Germany
- AMO GmbH, Advanced Microelectronic Center Aachen (AMICA), Otto-Blumnethal-Str. 25, 52074 Aachen, Germany
| | - Frank Niklaus
- Division of Micro and Nanosystems, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
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41
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Fan X, Forsberg F, Smith AD, Schröder S, Wagner S, Östling M, Lemme MC, Niklaus F. Suspended Graphene Membranes with Attached Silicon Proof Masses as Piezoresistive Nanoelectromechanical Systems Accelerometers. NANO LETTERS 2019; 19:6788-6799. [PMID: 31478660 PMCID: PMC6791286 DOI: 10.1021/acs.nanolett.9b01759] [Citation(s) in RCA: 16] [Impact Index Per Article: 3.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Abstract
Graphene is an atomically thin material that features unique electrical and mechanical properties, which makes it an extremely promising material for future nanoelectromechanical systems (NEMS). Recently, basic NEMS accelerometer functionality has been demonstrated by utilizing piezoresistive graphene ribbons with suspended silicon proof masses. However, the proposed graphene ribbons have limitations regarding mechanical robustness, manufacturing yield, and the maximum measurement current that can be applied across the ribbons. Here, we report on suspended graphene membranes that are fully clamped at their circumference and have attached silicon proof masses. We demonstrate their utility as piezoresistive NEMS accelerometers, and they are found to be more robust, have longer life span and higher manufacturing yield, can withstand higher measurement currents, and are able to suspend larger silicon proof masses, as compared to the previous graphene ribbon devices. These findings are an important step toward bringing ultraminiaturized piezoresistive graphene NEMS closer toward deployment in emerging applications such as in wearable electronics, biomedical implants, and internet of things (IoT) devices.
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Affiliation(s)
- Xuge Fan
- Department
of Micro and Nanosystems, School of Electrical Engineering and Computer
Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
- E-mail: (X. F.)
| | | | - Anderson D. Smith
- Department
of Integrated Devices and Circuits, School of Electrical Engineering
and Computer Science, KTH Royal Institute
of Technology, SE-164 40 Kista, Sweden
| | - Stephan Schröder
- Department
of Micro and Nanosystems, School of Electrical Engineering and Computer
Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
| | - Stefan Wagner
- Faculty
of Electrical Engineering and Information Technology, RWTH Aachen University, Otto-Blumenthal-Strsse 25, 52074 Aachen, Germany
| | - Mikael Östling
- Department
of Integrated Devices and Circuits, School of Electrical Engineering
and Computer Science, KTH Royal Institute
of Technology, SE-164 40 Kista, Sweden
| | - Max C. Lemme
- Faculty
of Electrical Engineering and Information Technology, RWTH Aachen University, Otto-Blumenthal-Strsse 25, 52074 Aachen, Germany
- Department
of Integrated Devices and Circuits, School of Electrical Engineering
and Computer Science, KTH Royal Institute
of Technology, SE-164 40 Kista, Sweden
- E-mail: (M.C.L.)
| | - Frank Niklaus
- Department
of Micro and Nanosystems, School of Electrical Engineering and Computer
Science, KTH Royal Institute of Technology, SE-10044 Stockholm, Sweden
- E-mail: (F.N.)
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42
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Park DH, Cho YJ, Lee JH, Choi I, Jhang SH, Chung HJ. The evolution of surface cleanness and electronic properties of graphene field-effect transistors during mechanical cleaning with atomic force microscopy. NANOTECHNOLOGY 2019; 30:394003. [PMID: 31242472 DOI: 10.1088/1361-6528/ab2cf6] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
The evolution of surface cleanliness and the electronic properties-Dirac voltage(V Dirac), hysteresis and mobility (μ) of a graphene field-effect transistor (GFET)-were monitored by measuring lateral force microscopy and drain current (I D) as a function of gate voltage (V G), after mechanically cleaning the surface, scan-by-scan, with contact-mode atomic force microscopy. Both the surface cleanliness and the electronic properties evolved, showing a sudden improvement and then saturation for a mobility of around 2200 cm2 V-1 s-1. We found that the mobility suppression of the as-fabricated GFET deviated from a randomly distributed impurities model, which predicted a greater mobility than obtained from the measured V Dirac. Therefore, the substrate impurities are excluded from the origins of the extraordinary suppression of the mobility, and the possible origin will be discussed.
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Affiliation(s)
- Do-Hyun Park
- Department of Physics, Konkuk University, Seoul 05030, Republic of Korea
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43
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Fu J, Qiao Y, Song H, Xu Z, Tu J, Ba L, Lu Z. Advanced transferring of large-area freestanding graphene films by using fullerenes. NANOTECHNOLOGY 2019; 30:26LT01. [PMID: 30836332 DOI: 10.1088/1361-6528/ab0cab] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Freestanding graphene films are desired to be widely applied in biosensor fabrication due to their distinctive physical properties and improved performance. Chemical vapor deposition has been developed to efficiently fabricate large-area graphene. However, some of the fabricated graphene films might break or be contaminated in the current transferring step using polymers. A stable and high-quality transfer method is needed. Herein, we report on an advanced transfer method of large-area graphene film which uses fullerene as a supporting substrate. Unlike polymers, which are commonly eliminated by being dissolved in an organic solution, fullerene can be easily removed by evaporation in a vacuum because it has a different heat stability to graphene. By using the improved transferring method, the percentage of integrated freestanding films after transferring was increased from 60.7% to 93.4%. The vacuum is beneficial in terms of keeping the brittle freestanding films intact. Graphene films transferred using fullerene showed an advanced flatness and a simplicial elementary composition in comparison to those transferred using polymers. Even through there is trace residue, this stable allotrope of graphene is considered to have almost no impact on biomolecule sensing. These advantages make the fullerene transferring method an attractive candidate for fabricating large-area freestanding graphene films, especially for using in the field of biochemistry analysis and biosensors.
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Affiliation(s)
- Jiye Fu
- State Key Laboratory of Bioelectronics, School of Biological Science and Medical Engineering, Southeast University, Nanjing, 210096, People's Republic of China
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44
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Lee DH, Yun HD, Jung ED, Chu JH, Nam YS, Song S, Seok SH, Song MH, Kwon SY. Ultrathin Graphene Intercalation in PEDOT:PSS/Colorless Polyimide-Based Transparent Electrodes for Enhancement of Optoelectronic Performance and Operational Stability of Organic Devices. ACS APPLIED MATERIALS & INTERFACES 2019; 11:21069-21077. [PMID: 31094197 DOI: 10.1021/acsami.9b04118] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/13/2023]
Abstract
A novel flexible transparent electrode (TE) having a trilayer-stacked geometry and high optoelectronic performance and operational stability was fabricated by the spin coating method. The trilayer was composed of an ultrathin graphene (Gr) film sandwiched between a transparent and colorless polyimide (TCPI) layer and a methanesulfonic acid (MSA)-treated poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) layer containing dimethylsulfoxide and Zonyl fluorosurfactant (designated as MSA-PDZ film). The introduction of solution-processable TCPI enabled the direct formation of high-quality graphene on organic surfaces with a clean interface. Stable doping of graphene with the MSA-PDZ film enabled tuning of the inherent work function and optoelectronic properties of the PEDOT:PSS films, leading to a high figure of merit of ∼70 in the as-fabricated TEs. Particularly, from multivariate and repetitive harsh environmental tests ( T = -50 to 90 °C, over 90 RH%), the TCPI/Gr heterostructure exhibited excellent tolerance to mechanical and thermal stresses and gas barrier properties that protected the MSA-PDZ film from exposure to moisture. Owing to the synergetic effect from the TCPI/Gr/MSA-PDZ anode structure, the TCPI/Gr/MSA-PDZ-based polymer light-emitting diodes showed highly improved current and power efficiencies with maxima as high as 20.84 cd/A and 22.92 lm/W, respectively (comparable to those of indium tin oxide based PLEDs), in addition to much enhanced mechanical flexibility.
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Affiliation(s)
- Do Hee Lee
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Hyung Duk Yun
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Eui Dae Jung
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Jae Hwan Chu
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Yun Seok Nam
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Seunguk Song
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Shi-Hyun Seok
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Myoung Hoon Song
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
| | - Soon-Yong Kwon
- School of Materials Science and Engineering , Ulsan National Institute of Science and Technology (UNIST) , Ulsan 44919 , Republic of Korea
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45
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Oil boundary approach for sublimation enabled camphor mediated graphene transfer. J Colloid Interface Sci 2019; 546:11-19. [DOI: 10.1016/j.jcis.2019.03.053] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/24/2018] [Revised: 03/14/2019] [Accepted: 03/15/2019] [Indexed: 12/13/2022]
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46
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Qu J, Li BW, Shen Y, Huo S, Xu Y, Liu S, Song B, Wang H, Hu C, Feng W. Evaporable Glass-State Molecule-Assisted Transfer of Clean and Intact Graphene onto Arbitrary Substrates. ACS APPLIED MATERIALS & INTERFACES 2019; 11:16272-16279. [PMID: 31020828 DOI: 10.1021/acsami.8b21946] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Graphene and its clean transfer methods have gathered growing interest and concern in recent decades. Here, we develop a novel large-scale intact transferring technology of paraffin wax onto arbitrary substrates. The wax will then be removed by thermal evaporation, avoiding uncontrollable reactions and leaving no residues. For characterizations, we adopt Raman, FT-IR, XPS, and DRS to measure the optical reflection difference on various surfaces and the thickness of graphene accurately. All the results demonstrate transferred surfaces' cleanliness and our method's validity. This technique allows for an effective transfer of graphene and enables a wider range of applications in many fields.
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Affiliation(s)
- Jingyi Qu
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering , Tianjin University , Tianjin 300350 , P.R China
| | - Bao-Wen Li
- School of Materials Science and Engineering , Wuhan University of Technology , Wuhan 430070 , P.R China
| | - Yongtao Shen
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering , Tianjin University , Tianjin 300350 , P.R China
| | - Shuchun Huo
- State Key Laboratory of Precision Measuring Technology and Instruments , Tianjin University , Tianjin 300072 , P. R China
- Nanchang Institute for Microtechnology of Tianjin University , Tianjin 300072 , P. R China
| | - Ying Xu
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering , Tianjin University , Tianjin 300350 , P.R China
| | - Shiyuan Liu
- State Key Laboratory of Digital Manufacturing Equipment and Technology , Huazhong University of Science and Technology , Wuhan 430074 , Hubei China
| | - Baokun Song
- State Key Laboratory of Digital Manufacturing Equipment and Technology , Huazhong University of Science and Technology , Wuhan 430074 , Hubei China
| | - Hao Wang
- State Key Laboratory of Precision Measuring Technology and Instruments , Tianjin University , Tianjin 300072 , P. R China
- Nanchang Institute for Microtechnology of Tianjin University , Tianjin 300072 , P. R China
| | - Chunguang Hu
- State Key Laboratory of Precision Measuring Technology and Instruments , Tianjin University , Tianjin 300072 , P. R China
- Nanchang Institute for Microtechnology of Tianjin University , Tianjin 300072 , P. R China
| | - Wei Feng
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering , Tianjin University , Tianjin 300350 , P.R China
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47
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Yeh CH, Chen HC, Lin HC, Lin YC, Liang ZY, Chou MY, Suenaga K, Chiu PW. Ultrafast Monolayer In/Gr-WS 2-Gr Hybrid Photodetectors with High Gain. ACS NANO 2019; 13:3269-3279. [PMID: 30790512 DOI: 10.1021/acsnano.8b09032] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
One of the primary limitations of previously reported two-dimensional (2D) photodetectors is a low frequency response (≪ 1 Hz) for sensitive devices with gain. Yet, little efforts have been devoted to improve the temporal response of photodetectors while maintaining high gain and responsivity. Here, we demonstrate a gain of 6.3 × 103 electrons per photon and a responsivity of 2.6 × 103 A/W while simultaneously exhibiting an ultrafast response time of 40-65 μs in a hybrid photodetector that consists of graphene-WS2-graphene junctions covered with indium (In) adatoms atop. The resultant responsivity is 6 orders of magnitude higher than that of conventional photodetectors comprising solely of a Au-WS2-Au junction. The photogain is provided mainly by the adsorbed In adatoms, from which photogenerated electrons can be transferred to the WS2 channel, while holes remain trapped in In adatoms, leading to a photogating effect as electrons are recirculating during the residence of holes in In adatoms. At a gate voltage near the Dirac point of graphene, a detectivity of D* = 2.2 × 1012 Jones and an ON/OFF ratio of 104 are achieved. The enhanced performance of the device can be attributed partly to the transparent graphene/WS2 contact and partly to the strong capacitive coupling of the In adatoms with the WS2 channel, which enables ultrafast carrier dynamics.
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Affiliation(s)
- Chao-Hui Yeh
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Hsiang-Chieh Chen
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Ho-Chun Lin
- Institute of Atomic and Molecular Sciences, Academia Sinica , Taipei 10617 , Taiwan
- Department of Physics , National Taiwan University , Taipei 10617 , Taiwan
| | - Yung-Chang Lin
- National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba 305-8565 , Japan
| | - Zheng-Yong Liang
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Mei-Yin Chou
- Institute of Atomic and Molecular Sciences, Academia Sinica , Taipei 10617 , Taiwan
- Department of Physics , National Taiwan University , Taipei 10617 , Taiwan
| | - Kazu Suenaga
- National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba 305-8565 , Japan
| | - Po-Wen Chiu
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
- Institute of Atomic and Molecular Sciences, Academia Sinica , Taipei 10617 , Taiwan
- Frontier Research Center on Fundamental and Applied Science of Matters , National Tsing Hua University , Hsinchu 30013 , Taiwan
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48
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Current Review on Synthesis, Composites and Multifunctional Properties of Graphene. Top Curr Chem (Cham) 2019; 377:10. [DOI: 10.1007/s41061-019-0235-6] [Citation(s) in RCA: 36] [Impact Index Per Article: 7.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/18/2018] [Accepted: 02/22/2019] [Indexed: 12/30/2022]
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49
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Nayak PK. Pulsed-grown graphene for flexible transparent conductors. NANOSCALE ADVANCES 2019; 1:1215-1223. [PMID: 36133212 PMCID: PMC9419159 DOI: 10.1039/c8na00181b] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/30/2018] [Accepted: 01/01/2019] [Indexed: 06/13/2023]
Abstract
In the race to find novel transparent conductors for next-generation optoelectronic devices, graphene is supposed to be one of the leading candidates, as it has the potential to satisfy all future requirements. However, the use of graphene as a truly transparent conductor remains a great challenge because its lowest sheet resistance demonstrated so far exceeds that of the commercially available indium tin oxide. The possible cause of low conductivity lies in its intrinsic growth process, which requires further exploration. In this work, I have approached this problem by controlling graphene nucleation during the chemical vapor deposition process as well as by adopting three distinct procedures, including bis(trifluoromethanesulfonyl)amide doping, post annealing, and flattening of graphene films. Additionally, van der Waals stacked graphene layers have been prepared to reduce the sheet resistance effectively. I have demonstrated an efficient and flexible transparent conductor with the extremely low sheet resistance of 40 Ω sq-1, high transparency (T r ∼90%), and high mechanical flexibility, making it suitable for electrode materials in future optoelectronic devices.
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Affiliation(s)
- Pramoda K Nayak
- Department of Physics, Indian Institute of Technology Madras Chennai 600036 India
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50
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Sang M, Shin J, Kim K, Yu KJ. Electronic and Thermal Properties of Graphene and Recent Advances in Graphene Based Electronics Applications. NANOMATERIALS (BASEL, SWITZERLAND) 2019; 9:E374. [PMID: 30841599 PMCID: PMC6474003 DOI: 10.3390/nano9030374] [Citation(s) in RCA: 80] [Impact Index Per Article: 16.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/01/2019] [Revised: 02/19/2019] [Accepted: 02/21/2019] [Indexed: 12/18/2022]
Abstract
Recently, graphene has been extensively researched in fundamental science and engineering fields and has been developed for various electronic applications in emerging technologies owing to its outstanding material properties, including superior electronic, thermal, optical and mechanical properties. Thus, graphene has enabled substantial progress in the development of the current electronic systems. Here, we introduce the most important electronic and thermal properties of graphene, including its high conductivity, quantum Hall effect, Dirac fermions, high Seebeck coefficient and thermoelectric effects. We also present up-to-date graphene-based applications: optical devices, electronic and thermal sensors, and energy management systems. These applications pave the way for advanced biomedical engineering, reliable human therapy, and environmental protection. In this review, we show that the development of graphene suggests substantial improvements in current electronic technologies and applications in healthcare systems.
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Affiliation(s)
- Mingyu Sang
- School of Electrical & Electronic Engineering, Yonsei University, Seoul 03722, Korea.
| | - Jongwoon Shin
- School of Electrical & Electronic Engineering, Yonsei University, Seoul 03722, Korea.
| | - Kiho Kim
- School of Electrical & Electronic Engineering, Yonsei University, Seoul 03722, Korea.
| | - Ki Jun Yu
- School of Electrical & Electronic Engineering, Yonsei University, Seoul 03722, Korea.
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