Metal hierarchical patterning by direct nanoimprint lithography

Designer Metasurfaces via Nanocube Assembly at the Air-Water Interface

The advent of metasurfaces has revolutionized the design of optical instruments, and recent advancements in fabrication techniques are further accelerating their practical applications. However, conventional top-down fabrication of intricate nanostructures proves to be expensive and time-consuming, posing challenges for large-scale production. Here, we propose a cost-effective bottom-up approach to create nanostructure arrays with arbitrarily complex meta-atoms displaying single nanoparticle lateral resolution over submillimeter areas, minimizing the need for advanced and high-cost nanofabrication equipment. By utilizing air/water interface assembly, we transfer nanoparticles onto templated polydimethylsiloxane (PDMS) irrespective of nanopattern density, shape, or size. We demonstrate the robust assembly of nanocubes into meta-atoms with diverse configurations generally unachievable by conventional methods, including U, L, cross, S, T, gammadion, split-ring resonators, and Pancharatnam-Berry metasurfaces with designer optical functionalities. We also show nanocube epitaxy at near ambient temperature to transform the meta-atoms into complex continuous nanostructures that can be swiftly transferred from PDMS to various substrates via contact printing. Our approach potentially offers a large-scale manufacturing alternative to top-down fabrication for metal nanostructuring, unlocking possibilities in the realm of nanophotonics.

Global Trends in Orthopedic Biofilm Research: A Bibliometric Analysis of 1994-2022

Objective

Bibliometric analysis is commonly used to visualize the knowledge foundation, trends, and patterns in a specific scientific field by performing a quantitative evaluation of the relevant literature. The purpose of this study was to perform a bibliometric analysis of recent studies in the field of orthopedic biofilm research and identify its current trends and hotspots.

Methods

Research studies were retrieved from the Web of Science Core Collection and Scopus databases and analyzed in bibliometrix with R package (4.2.2).

Results

A total of 2426 literature were included in the study. Journal of orthopaedic research and Clinical orthopaedics and related research ranked first in terms of productivity and impact, with 57 published articles and 32 h-index, respectively. Trampuz A, Ohio State Univ and the United States ranked as the most productive authors, institutions, and countries. Biofilm formation, role of sonication, biomaterial mechanism and antibiotic loading have been investigated as the trend and hotspots in the field of orthopedic biofilm research.

Conclusion

This study provides a thorough overview of the state of the art of current orthopedic biofilm research and offers valuable insights into recent trends and hotspots in this field.

Parametric investigation of ultrashort pulsed laser surface texturing on aluminium alloy 7075 for hydrophobicity enhancement

Hydrophobicity plays a pivotal role in mitigating surface fouling, corrosion, and icing in critical marine and aerospace environments. By employing ultrafast laser texturing, the characteristic properties of a material's surface can be modified. This work investigates the potential of an advanced ultrafast laser texturing manufacturing process to enhance the hydrophobicity of aluminium alloy 7075. The surface properties were characterized using goniometry, 3D profilometry, SEM, and XPS analysis. The findings from this study show that the laser process parameters play a crucial role in the manufacturing of the required surface structures. Numerical optimization with response surface optimization was conducted to maximize the contact angle on these surfaces. The maximum water contact angle achieved was 142º, with an average height roughness (Sa) of 0.87 ± 0.075 µm, maximum height roughness (Sz) of 19.4 ± 2.12 µm, and texture aspect ratio of 0.042. This sample was manufactured with the process parameters of 3W laser power, 0.08 mm hatch distance, and a 3 mm/s scan speed. This study highlights the importance of laser process parameters in the manufacturing of the required surface structures and presents a parametric modeling approach that can be used to optimize the laser process parameters to obtain a specific surface morphology and hydrophobicity.

Supplementary Information

The online version contains supplementary material available at 10.1007/s00170-024-12971-8.

Deformation Mechanism of Aluminum, Copper, and Gold in Nanoimprint Lithography Using Molecular Dynamics Simulation

Material deformation during nanoimprinting of aluminum (Al), copper (Cu), and gold (Au) was explored through molecular dynamics simulations. A comparative understanding of the deformation behavior of three substrate materials important for design and high-resolution pattern transfer was highlighted. In this study, we analyzed three metrics, including von Mises stresses, lattice deformation, and spring-back for the chosen materials. Of the three materials, the highest average von Mises stress of 7.80 MPa was recorded for copper, while the lowest value of 4.68 MPa was computed for the gold substrate. Relatively higher von Mises stress was observed for all three materials during the mold penetration stages; however, there was a significant reduction during the mold relaxation and retrieval stages. The Polyhedral Template Matching (PTM) method was adopted for studying the lattice dislocation of the materials. Predominantly Body-Centered Cubic (BCC) structures were observed during the deformation process and the materials regained more than 50% of their original Face-Centered Cubic (FCC) structures after mold retrieval. Gold had the lowest vertical spring-back at 6.54%, whereas aluminum had the highest average spring-back at 24.5%. Of the three materials, aluminum had the lowest imprint quality due to its irregular imprint geometry and low indentation depth after the NIL process. The findings of this research lay a foundation for the design and manufacture of Nanoimprint Lithography (NIL) molds for different applications while ensuring that the replicated structures meet the desired specifications and quality standards.

Nanoparticle Imprint Lithography: From Nanoscale Metrology to Printable Metallic Grids

Large scale and low-cost nanopatterning of materials is of tremendous interest for optoelectronic devices. Nanoimprint lithography has emerged in recent years as a nanofabrication strategy that is high-throughput and has a resolution comparable to that of electron-beam lithography (EBL). It is enabled by pattern replication of an EBL master into polydimethylsiloxane (PDMS), that is then used to pattern a resist for further processing, or a sol-gel that could be calcinated into a solid material. Although the sol-gel chemistry offers a wide spectrum of material compositions, metals are still difficult to achieve. This gap could be bridged by using colloidal nanoparticles as resist, but deep understanding of the key parameters is still lacking. Here, we use supported metallic nanocubes as a model resist to gain fundamental insights into nanoparticle imprinting. We uncover the major role played by the surfactant layer trapped between nanocubes and substrate, and measure its thickness with subnanometer resolution by using gap plasmon spectroscopy as a metrology platform. This enables us to quantify the van der Waals (VDW) interactions responsible for the friction opposing the nanocube motion, and we find that these are almost in quantitative agreement with the Stokes drag acting on the nanocubes during nanoimprint, that is estimated with a simplified fluid mechanics model. These results reveal that a minimum thickness of surfactant is required, acting as a spacer layer mitigating van der Waals forces between nanocubes and the substrate. In the light of these findings we propose a general method for resist preparation to achieve optimal nanoparticle mobility and show the assembly of printable Ag and Au nanocube grids, that could enable the fabrication of low-cost transparent electrodes of high material quality upon nanocube epitaxy.

A metallic anti-biofouling surface with a hierarchical topography containing nanostructures on curved micro-riblets

Metallic surface finishes have been used in the anti-biofouling, but it is very difficult to produce surfaces with hierarchically ordered structures. In the present study, anti-biofouling metallic surfaces with nanostructures superimposed on curved micro-riblets were produced via top-down fabrication. According to the attachment theory, these surfaces feature few attachment points for organisms, the nanostructures prevent the attachment of bacteria and algal zoospores, while the micro-riblets prohibit the settlement of macrofoulers. Anodic oxidation was performed to induce superhydrophilicity. It forms a hydration layer on the surface, which physically blocks foulant adsorption along with the anti-biofouling topography. We characterized the surfaces via scanning electron and atomic force microscopy, contact-angle measurement, and wear-resistance testing. The contact angle of the hierarchical structures was less than 1°. Laboratory settlement assays verified that bacterial attachment was dramatically reduced by the nanostructures and/or the hydration layer, attributable to superhydrophilicity. The micro-riblets prohibited the settlement of macrofoulers. Over 77 days of static immersion in the sea during summer, the metallic surface showed significantly less biofouling compared to a surface painted with an anticorrosive coating.

Impact of surface topography on the bacterial attachment to micro- and nano-patterned polymer films

The development of antimicrobial surfaces has become a high priority in recent times. There are two ongoing worldwide health crises: the COVID-19 pandemic provoked by the SARS-CoV-2 virus and the antibiotic-resistant diseases provoked by bacteria resistant to antibiotic-based treatments. The need for antimicrobial surfaces against bacteria and virus is a common factor to both crises. Most extended strategies to prevent bacterial associated infections rely on chemical based-approaches based on surface coatings or biocide encapsulated agents that release chemical agents. A critical limitation of these chemistry-based strategies is their limited effectiveness in time while grows the concerns about the long-term toxicity on human beings and environment pollution. An alternative strategy to prevent bacterial attachment consists in the introduction of physical modification to the surface. Pursuing this chemistry-independent strategy, we present a fabrication process of surface topographies [one-level (micro, nano) and hierarchical (micro+nano) structures] in polypropylene (PP) substrates and discuss how wettability, topography and patterns size influence on its antibacterial properties. Using nanoimprint lithography as patterning technique, we report as best results 82 and 86% reduction in the bacterial attachment of E. coli and S. aureus for hierarchically patterned samples compared to unpatterned reference surfaces. Furthermore, we benchmark the mechanical properties of the patterned PP surfaces against commercially available antimicrobial films and provide evidence for the patterned PP films to be suitable candidates for use as antibacterial functional surfaces in a hospital environment.

Cross-Species Bioinspired Anisotropic Surfaces for Active Droplet Transportation Driven by Unidirectional Microcolumn Waves

Natural evolution has endowed diverse species with distinct geometric micro/nanostructures exhibiting admirable functions. Examples include anisotropic microgrooves/microstripes on the rice leaf surface for passive liquid directional rolling, and motile microcilia widely existed in mammals' body for active matter transportation through in situ oscillation. Till now, bionic studies have been extensively performed by imitating a single specific biologic functional system. However, bionic fabrication of devices integrating multispecies architectures is rarely reported, which may sparkle more fascinating functionalities beyond natural findings. Here, a cross-species design strategy is adopted by combining the anisotropic wettability of the rice leaf surface and the directional transportation characteristics of motile cilia. High-aspect-ratio magnetically responsive microcolumn array (HAR-MRMA) is prepared for active droplet transportation. It is found that just like the motile microcilia, the unidirectional waves are formed by the real-time reconstruction of the microcolumn array under the moving magnetic field, enabling droplet (1-6 μL) to transport along the predetermined anisotropic orbit. Meanwhile, on-demand droplet horizontal transportation on the inclined plane can be realized by the rice leaf-like anisotropic surface, showcasing active nongravity-driven droplet transportation capability of the HAR-MRMA. The directional lossless transportation of droplet holds great potential in the fields of microfluidics, chemical microreaction, and intelligent droplet control system.

Recent Progress in Simple and Cost-Effective Top-Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

The development of a simple and cost-effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho-graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost-effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion-bombardment technique was reported as a new method to create high-resolution and high-aspect-ratio structures. Recent progress in simple and cost-effective top-down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.

Direct Micromolding of Bimetals and Transparent Conducting Oxide Using Metal-TOABr Complexes as Single-Source Precursors

Patterning of metals, alloys, and conducting oxides is vitally important for many industrial applications pertaining to many technological devices. In this report, we have used the metal anion alkyl ammonium complex (M-TOABr) as a single-source precursor to obtain thin films as well as micro (μ)-patterns of bimetals (Au-Pd, Au-Pt, Au-Cu, and Pt-Pd) and conducting oxides (ITO). This complex can be easily filled inside the soft mold and converted to the desired material in a single step known as direct patterning. The as-obtained μ-pattern comprises a well-connected network of nanocrystals giving rise to metallic conductivity. These periodically aligned bimetals and transparent conducting oxide (TCO) microwires could effectively serve as electrodes as well as an electrocatalyst with the prudence of providing passage for light transmission for many functional photoelectrochemical devices. In addition, the electrochemical stability of the bimetallic film was examined by fabricating a supercapacitor device and by studying its performance.

Controlling Catalyst-Free Formation and Hole Gas Accumulation by Fabricating Si/Ge Core-Shell and Si/Ge/Si Core-Double Shell Nanowires

The catalyst-free formation of silicon (Si) and germanium (Ge) core-shell and core-double shell nanowires (NWs) was studied for use as building blocks of high electron (hole) mobility transistors (HEMTs). Vertically aligned p-type Si (p-Si)/intrinsic Ge (i-Ge) core-shell NWs and p-Si/i-Ge/p-Si core-double shell NWs with uniform diameters were formed by combining nanoimprint lithography, Bosch etching, and chemical vapor deposition. The boron (B) doping process was used to prepare p-Si NWs. The hole gas accumulation could be reliably detected from the i-Ge shell region in the p-Si/i-Ge core-shell NW and p-Si/i-Ge/p-Si core-double shell NW arrays through the Fano resonance effect, showing that core-shell NW heterostructures can suppress impurity scattering and act as high-mobility transistor channels. This provides the possibility for the future creation of vertical high-speed transistors.

All-solution-processed Si films with broadband and omnidirectional light absorption

Silicon photonic structures have attracted a great deal of attention due to their potential benefits of efficient light management in optoelectronic applications. In this paper, we demonstrate broadband optical absorption enhancement in solution-processed amorphous silicon (a-Si) by leveraging the advantages of silicon photonic structures. Graded refractive index silicon multi-layer structures are employed by modulating optical constants with simple process optimization, resulting in significantly improved reflectance over a broad range of visible wavelengths. In addition, nanopatterning flexibility of solution-processed silicon provides benefits for tailoring silicon optical properties. With the incorporation of the two-dimensional submicron pattern into silicon films, the absorptivity of silicon films improves considerably below the wavelength of the bandgap (λ ∼ 800 nm), and the limited bandwidth of absorptivity in silicon films can be extended to near-infrared wavelengths by coating with a thin gold layer. The methodology is generally applicable to a platform for improving the broadband optical absorption of photonic and optoelectronic devices.

Large area patterning of residue-free metal oxide nanostructures by liquid transfer imprint lithography

One-dimensional (1D) and three-dimensional (3D) residue-free metal oxide patterns are directly fabricated over large areas using liquid transfer imprint lithography (LTIL) with an ultraviolet-curable metal oxide precursor resist. A 1D line or pillar array of metal oxides nano-patterns without a residual layer is formed by LTIL and annealing processes. A 3D layer-by-layer nanomesh structure is successfully constructed by repeating the LTIL method without a complex etching process. In addition, it is possible to form a hierarchical structure in which zinc oxide nanowires are selectively grown on a desired zinc oxide (ZnO) seed pattern formed by LTIL via a hydrothermal method. Unlike the pattern fabricated by the conventional nanoimprint lithography method, in the case of the pattern formed by LTIL the residues accumulated between the patterns during the patterning procedure can be removed, and thus it is possible to easily form various types of nanostructures.

Robust mold fabricated by femtosecond laser pulses for continuous thermal imprinting of superhydrophobic surfaces

Superhydrophobic surfaces rely on a large number of surface micro/nano structures to increase the roughness of a material. Producing such structures is possible through a multitude of relatively slow methods; however, economic and large scale production of superhydrophobic surfaces require using a fast process on a cheap substrate. Here, we used femtosecond laser processing to fabricate micro and nanostructures on tungsten carbide that we use as a mold to thermally imprint polypropylene sheets. The fabricated tungsten carbide mold was used to imprint more than twenty superhydrophobic polypropylene sheets before mold contamination reduces the surface contact angle below 150°.Using Toluene solution, the mold is subsequently capable of being cleaned of contamination from polypropylene residue and reused for further imprinting. Ninety thermoplastic imprints were conducted using a single tungsten carbide mold with only minimal structural degradation apparent on the micro/nano structured surface.

Graphene/Ag nanoholes composites for quantitative surface-enhanced Raman scattering

Quantitative analysis is of importance for surface-enhanced Raman scattering (SERS). However, due to fluctuations in the enhancing performance of the substrates, it is difficult to obtain reliable results. In this paper, a reliable quantitative method is introduced to overcome this problem with graphene on the top of Ag nanoholes structure as SERS substrates by an internal standard method. To achieve the internal standard method, Ag nanoholes are firstly prepared by surface plasmon (SP) lithography technology. Then a monolayer graphene is transferred onto the surface of the Ag nanoholes structure. 2D Raman peak of graphene is used as an internal standard to normalize the intensity of analyte molecules. The random representative and averaged Raman intensity of different concentration of rhodamine 6G (R6G) is collected with graphene/Ag nanoholes (GE/AgNHs) structures as SERS substrates, and the corresponding normalized intensity is also calculated and discussed in details. The relative standard deviation (RSD) is reduced from 25% (Raman intensity) to 12% (normalized intensity). The quantification of R6G is demonstrated down to the detection limit of 10^-15 M.

Springtail-inspired superomniphobic surface with extreme pressure resistance

Both high static repellency and pressure resistance are critical to achieving a high-performance omniphobic surface. The cuticles of springtails have both of these features, which result from their hierarchical structure composed of primary doubly reentrant nanostructures on secondary microgrooves. Despite intensive efforts, none of the previous studies that were inspired by the springtail were able to simultaneously achieve both high static repellency and pressure resistance because of a general trade-off between these characteristics. We demonstrate for the first time a springtail-inspired superomniphobic surface displaying both features by fabricating a hierarchical system consisting of serif-T-shaped nanostructures on microscale wrinkles, overcoming previous limitations. Our biomimetic strategy yielded a surface showing high repellency to diverse liquids, from water to ethanol, with a contact angle above 150°. Simultaneously, the surface was able to endure extreme pressure resulting from the impacts of drops of water and of ethylene glycol with We >> 200, and of ethanol with We ~ 53, which is the highest pressure resistance ever reported. Overall, the omniphobicity of our springtail-inspired fabricated system was found to be superior to that of the natural springtail cuticle itself.

Top-down fabrication of shape-controlled, monodisperse nanoparticles for biomedical applications

Nanoparticles for biomedical applications are generally formed by bottom-up approaches such as self-assembly, emulsification and precipitation. But these methods usually have critical limitations in fabrication of nanoparticles with controllable morphologies and monodispersed size. Compared with bottom-up methods, top-down nanofabrication techniques offer advantages of high fidelity and high controllability. This review focuses on top-down nanofabrication techniques for engineering particles along with their biomedical applications. We present several commonly used top-down nanofabrication techniques that have the potential to fabricate nanoparticles, including photolithography, interference lithography, electron beam lithography, mold-based lithography (nanoimprint lithography and soft lithography), nanostencil lithography, and nanosphere lithography. Varieties of current and emerging applications are also covered: (i) targeting, (ii) drug and gene delivery, (iii) imaging, and (iv) therapy. Finally, a future perspective of the nanoparticles fabricated by the top-down techniques in biomedicine is also addressed.

"Nickel Nanoflowers" with Surface-Attached Fluoropolymer Networks by C,H Insertion for the Generation of Metallic Superhydrophobic Surfaces

Metallic superhydrophobic surfaces (SHSs) combine the attractive properties of metals, such as ductility, hardness, and conductivity, with the favorable wetting properties of nanostructured surfaces. Moreover, they promise additional benefits with respect to corrosion protection. For the modification of the intrinsically polar and hydrophilic surfaces of metals, a new method has been developed to deposit a long-term stable, highly hydrophobic coating, using nanostructured Ni surfaces as an example. Such substrates were chosen because the deposition of a thin Ni layer is a common choice for enhancing corrosion resistance of other metals. As the hydrophobic coating, we propose a thin film of an extremely hydrophobic fluoropolymer network. To form this network, a thin layer of a fluoropolymer precursor is deposited on the Ni substrate which includes a comonomer that is capable of C,H insertion cross-linking (CHic). Upon UV irradiation or heating, the cross-linker units become activated and the thin glassy film of the precursor is transformed into a polymer network that coats the surface conformally and permanently, as shown by extensive extraction experiments. To achieve an even higher stability, the same precursor film can also be transformed into a chemically surface-attached network by depositing a self-assembled monolayer of an alkane phosphonic acid on the Ni before coating with the precursor. During cross-linking, by the same chemical process, the growing polymer network will simultaneously attach to the alkane phosphonic acid layer at the surface of the metal. This strategy has been used to turn fractal Ni "nanoflower" surfaces grown by anisotropic electroplating into SHSs. The wetting characteristics of the obtained nanostructured metallic surfaces are studied. Additionally, the corrosion protection effect and the significant mechanical durability are demonstrated.

Large-scale fabrication of highly ordered sub-20 nm noble metal nanoparticles on silica substrates without metallic adhesion layers

Periodic noble metal nanoparticles offer a wide spectrum of applications including chemical and biological sensors, optical devices, and model catalysts due to their extraordinary properties. For sensing purposes and catalytic studies, substrates made of glass or fused-silica are normally required as supports, without the use of metallic adhesion layers. However, precise patterning of such uniform arrays of silica-supported noble metal nanoparticles, especially at sub-100 nm in diameter, is challenging without adhesion layers. In this paper, we report a robust method to large-scale fabricate highly ordered sub-20 nm noble metal nanoparticles, i.e., gold and platinum, supported on silica substrates without adhesion layers, combining displacement Talbot lithography (DTL) with dry-etching techniques. Periodic photoresist nanocolumns at diameters of ~110 nm are patterned on metal-coated oxidized silicon wafers using DTL, and subsequently transferred at a 1:1 ratio into anti-reflection layer coating (BARC) nanocolumns with the formation of nano-sharp tips, using nitrogen plasma etching. These BARC nanocolumns are then used as a mask for etching the deposited metal layer using inclined argon ion-beam etching. We find that increasing the etching time results in cone-shaped silica features with metal nanoparticles on the tips at diameters ranging from 100 nm to sub-30 nm, over large areas of 3×3 cm². Moreover, subsequent annealing these sub-30 nm metal nanoparticle arrays at high-temperature results in sub-20 nm metal nanoparticle arrays with ~10¹⁰ uniform particles.

Covalent bonding-assisted nanotransfer lithography for the fabrication of plasmonic nano-optical elements

Many high-resolution patterning techniques have been developed to realize nano- and microscale applications of electric devices, sensors, and transistors. However, conventional patterning methods based on photo or e-beam lithography are not employed to fabricate optical elements of high aspect ratio and a sub-100 nm scale due to the limit of resolution, high costs and low throughput. In this study, covalent bonding-assisted nanotransfer lithography (CBNL) was proposed to fabricate various structures of high resolution and high aspect ratio at low cost by a robust and fast chemical reaction. The proposed process is based on the formation of covalent bonds between silicon of adhesive layers on a substrate and oxygen of the deposited material on the polymer stamp. The covalent bond is strong enough to detach multiple layers from the stamp for a large area without defects. The obtained nanostructures can be used for direct application or as a hard mask for etching. Two nano-optical applications were demonstrated in this study, i.e., a meta-surface and a wire-grid polarizer. A perfect absorption meta-surface was generated by transferring subwavelength hole arrays onto a substrate without any post-processing procedures. In addition, a wire-grid polarizer with high aspect ratio (1 : 3) and 50 nm line width was prepared by the nano-transfer of materials, which were used as a hard mask for etching. Therefore, CBNL provides a means of achieving large-area nano-optical elements with a simple roll-to-plate process at low cost.

Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching

The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold. However, direct nanoimprint on the semiconductor wafer still remains a great challenge. On the other hand, considered as a competitive fabrication method for erect high-aspect 3D-MNS, metal assisted chemical etching (MacEtch) can remove the semiconductor by spontaneous corrosion reaction at the metal/semiconductor/electrolyte 3-phase interface. Moreover, it was difficult for MacEtch to fabricate multilevel or continuously curved 3D-MNS. The question of the consequences of NIL meeting the MacEtch is yet to be answered. By employing a platinum (Pt) metalized imprint mode, we demonstrated that using electrochemical nanoimprint lithography (ECNL) it was possible to fabricate not only erect 3D-MNS, but also complex 3D-MNS with multilevel stages with continuously curved surface profiles on a gallium arsenide (GaAs) wafer. A concave microlens array with an average diameter of 58.4 μm and height of 1.5 μm was obtained on a ∼1 cm²-area GaAs wafer. An 8-phase microlens array was fabricated with a minimum stage of 57 nm and machining accuracy of 2 nm, presenting an excellent optical diffraction property. Inheriting all the advantages of both NIL and MacEtch, ECNL has prospective applications in the micro/nano-fabrications of semiconductors.

Biomimetic surfaces with anisotropic sliding wetting by energy-modulation femtosecond laser irradiation for enhanced water collection

Inspired by natural rice leaf surfaces, we report a simple method to prepare three-level macrogrooves and micro/nanostructures on PDMS films by using energy-modulation femtosecond laser scanning for potential applications in water collection.

A review of metal organic resins for environmental applications

In recent years, research on metal organic frameworks (MOFs) has been extended to explore various issues regarding structural flexibility, toxicity, aqueous synthesis, biodegradability, regeneration, reuse, and easy disposal. Based on such efforts, highly-ordered porous MOF structures bound to organic resins (metal organic resins or MORs) have emerged as a new generation of materials with excellent properties feasible for diverse applications. Here, we describe the excellent features of MORs and demonstrate their potential applicability in environmental as well as other relevant fields.

2D-patterning of self-assembled silver nanoisland films

The paper is dedicated to the recently developed by the authors technique of silver nanoisland growth, allowing self-arrangement of 2D-patterns of nanoislands. The technique employs silver out-diffusion from ion-exchanged glass in the course of annealing in hydrogen. To modify the silver ion distribution in the exchanged soda-lime glass we included the thermal poling of the ion-exchanged glass with a profiled electrode as an intermediate stage of the process. The resulting consequence consists of three steps: (i) during the ion exchange of the glass in the AgxNa1-xNO3 (x = 0.01-0.15) melt we enrich the subsurface layer of the glass with silver ions; (ii) under the thermal poling, the electric field displaces these ions deeper into the glass under the 2D profiled anodic electrode, the displacement is smaller under the hollows in the electrode where the intensity of the field is minimal; (iii) annealing in a reducing atmosphere of hydrogen results in silver out-diffusion only in the regions corresponding to the electrode hollows, as a result silver forms nanoislands following the shape of the electrode. Varying the electrode and mode of processing allows governing the nanoisland size distribution and self-arrangement of the isolated single nanoislands, pairs, triples or groups of several nanoislands-so-called plasmonic molecules.

Plasmonic nanostructures for surface enhanced spectroscopic methods

The development within the last five years in the field of surface enhanced spectroscopy methods was comprehensively reviewed.

Fabrication of a nano-scale pattern with various functional materials using electrohydrodynamic lithography and functionalization

Direct patterning with inorganic based materials has been developed using electrohydrodynamic lithography. Various sizes and morphologies of inorganic patterns were successfully replicated.

Large area sub-100 nm direct nanoimprinting of palladium nanostructures

We demonstrate a simple direct nanoimprinting method for fabricating palladium nanostructures that involves in situ free radical polymerization of a resin consisting of an acrylate-based crosslinker and a palladium metal precursor.

Hierarchical Micro/Nano Structures by Combined Self-Organized Dewetting and Photopatterning of Photoresist Thin Films

Photoresists are the materials of choice for micro/nanopatterning and device fabrication but are rarely used as a self-assembly material. We report for the first time a novel interplay of self-assembly and photolithography for fabrication of hierarchical and ordered micro/nano structures. We create self-organized structures by the intensified dewetting of unstable thin (∼10 nm to 1 μm) photoresist films by annealing them in an optimal solvent and nonsolvent liquid mixture that allows spontaneous dewetting to form micro/nano smooth dome-like structures. The density, size (∼100 nm to millimeters), and curvature/contact angle of the dome/droplet structures are controlled by the film thickness, composition of the dewetting liquid, and time of annealing. Ordered dewetted structures are obtained simply by creating spatial variation of viscosity by ultraviolet exposure or by photopatterning before dewetting. Further, the structures thus fabricated are readily photopatterned again on the finer length scales after dewetting. We illustrate the approach by fabricating several three-dimensional structures of varying complexity with secondary and tertiary features.

Fabrication of Large-Area Hierarchical Structure Array Using Siliconized-Silsesquioxane as a Nanoscale Etching Barrier

A material approach to fabricate a large-area hierarchical structure array is presented. The replica molding and oxygen (O2) plasma etching processes were combined to fabricate a large-area hierarchical structure array. Liquid blends consisting of siliconized silsesquioxane acrylate (Si-SSQA), ethylene glycol dimethacrylate (EGDMA), and photoinitiator are developed as a roughness amplifying material during O2 plasma etching. Microstructures composed of the Si-SSQA/EGDMA mixtures are fabricated by replica molding. Nanoscale roughness on molded microstructures is realized by O2 etching. The nanoscale roughness on microstructures is efficiently controlled by varying the etching time and the weight ratio of Si-SSQA to EGDMA. The hierarchical structures fabricated by combining replica molding and O2 plasma etching showed superhydrophilicity with long-term stability, resulting in the formation of hydroxyl-terminated silicon oxide layer with the reorientation limit. On the other hand, the hierarchical structures modified with a perfluorinated monolayer showed superhydrophobicity. The increment of water contact angles is consistent with increment of the nano/microroughness of hierarchical structures and decrement of the top contact area of water/hierarchical structures.

Gap and channeled plasmons in tapered grooves: a review

Tapered metallic grooves have been shown to support plasmons - electromagnetically coupled oscillations of free electrons at metal-dielectric interfaces - across a variety of configurations and V-like profiles. Such plasmons may be divided into two categories: gap-surface plasmons (GSPs) that are confined laterally between the tapered groove sidewalls and propagate either along the groove axis or normal to the planar surface, and channeled plasmon polaritons (CPPs) that occupy the tapered groove profile and propagate exclusively along the groove axis. Both GSPs and CPPs exhibit an assortment of unique properties that are highly suited to a broad range of cutting-edge nanoplasmonic technologies, including ultracompact photonic circuits, quantum-optics components, enhanced lab-on-a-chip devices, efficient light-absorbing surfaces and advanced optical filters, while additionally affording a niche platform to explore the fundamental science of plasmon excitations and their interactions. In this Review, we provide a research status update of plasmons in tapered grooves, starting with a presentation of the theory and important features of GSPs and CPPs, and follow with an overview of the broad range of applications they enable or improve. We cover the techniques that can fabricate tapered groove structures, in particular highlighting wafer-scale production methods, and outline the various photon- and electron-based approaches that can be used to launch and study GSPs and CPPs. We conclude with a discussion of the challenges that remain for further developing plasmonic tapered-groove devices, and consider the future directions offered by this select yet potentially far-reaching topic area.

Nanostructures: a platform for brain repair and augmentation

Nanoscale structures have been at the core of research efforts dealing with integration of nanotechnology into novel electronic devices for the last decade. Because the size of nanomaterials is of the same order of magnitude as biomolecules, these materials are valuable tools for nanoscale manipulation in a broad range of neurobiological systems. For instance, the unique electrical and optical properties of nanowires, nanotubes, and nanocables with vertical orientation, assembled in nanoscale arrays, have been used in many device applications such as sensors that hold the potential to augment brain functions. However, the challenge in creating nanowires/nanotubes or nanocables array-based sensors lies in making individual electrical connections fitting both the features of the brain and of the nanostructures. This review discusses two of the most important applications of nanostructures in neuroscience. First, the current approaches to create nanowires and nanocable structures are reviewed to critically evaluate their potential for developing unique nanostructure based sensors to improve recording and device performance to reduce noise and the detrimental effect of the interface on the tissue. Second, the implementation of nanomaterials in neurobiological and medical applications will be considered from the brain augmentation perspective. Novel applications for diagnosis and treatment of brain diseases such as multiple sclerosis, meningitis, stroke, epilepsy, Alzheimer's disease, schizophrenia, and autism will be considered. Because the blood brain barrier (BBB) has a defensive mechanism in preventing nanomaterials arrival to the brain, various strategies to help them to pass through the BBB will be discussed. Finally, the implementation of nanomaterials in neurobiological applications is addressed from the brain repair/augmentation perspective. These nanostructures at the interface between nanotechnology and neuroscience will play a pivotal role not only in addressing the multitude of brain disorders but also to repair or augment brain functions.

Metallic resist for phase-change lithography

Currently, the most widely used photoresists in optical lithography are organic-based resists. The major limitations of such resists include the photon accumulation severely affects the quality of photolithography patterns and the size of the pattern is constrained by the diffraction limit. Phase-change lithography, which uses semiconductor-based resists such as chalcogenide Ge₂Sb₂Te₅ films, was developed to overcome these limitations. Here, instead of chalcogenide, we propose a metallic resist composed of Mg₅₈Cu₂₉Y₁₃ alloy films, which exhibits a considerable difference in etching rate between amorphous and crystalline states. Furthermore, the heat distribution in Mg₅₈Cu₂₉Y₁₃ thin film is better and can be more easily controlled than that in Ge₂Sb₂Te₅ during exposure. We succeeded in fabricating both continuous and discrete patterns on Mg₅₈Cu₂₉Y₁₃ thin films via laser irradiation and wet etching. Our results demonstrate that a metallic resist of Mg₅₈Cu₂₉Y₁₃ is suitable for phase change lithography, and this type of resist has potential due to its outstanding characteristics.

Solution processed sun baked electrode material for flexible supercapacitors

Pd hexadecylthiolate decomposes under sunlight leading to a conducting nanocrystalline Pd–carbon composite. Thus formed films serve as supercapacitor electrodes. The organic precursor enables the fabrication of micro-supercapacitors using e-beam lithography.

Large area defrosting windows based on electrothermal heating of highly conducting and transmitting Ag wire mesh

Low power electrothermal heating behavior of junctionless transparent Ag mesh is explored for large area defrosting application.

Large area, facile oxide nanofabrication via step-and-flash imprint lithography of metal-organic hybrid resins

Step-and-flash imprint lithography (S-FIL) is a wafer-scale, high-resolution nanoimprint technique capable of expansion of nanoscale patterns via serial patterning of imprint fields. While S-FIL patterning of organic resins is well known, patterning of metal-organic resins followed by calcination to form structured oxide films remains relatively unexplored. However, with calcination shrinkage, there is tremendous potential utility in easing accessibility of arbitrary nanostructures at 20 nm resolution and below. However, barriers to commercial adoption exist due to difficulties in formulating polymerizable oxide precursors with good dispensability, long shelf life, and resistance to auto-homopolymerization. Here we propose a solution to these issues in the form of a versatile resin formulation scheme that is applicable to a host of functional oxides (Al2O3, HfO2, TiO2, ZrO2, Ta2O5, and Nb2O5). This scheme utilizes a reaction of metal alkoxides with 2-(methacryloyloxy)ethyl acetoacetate (MAEAA), a polymerizable chelating agent. Formation of these inorganic coordination complexes enables remarkable resistance to auto-homopolymerization, greatly improving dispensability and shelf life, thus enabling full scale-up of this facile nanofabrication approach. Results include successively imprinted fields consisting of 100 nm linewidth gratings. Isothermal calcination of these structures resulted in corresponding shrinkage of 75-80% without loss of mechanical integrity or aspect ratio, resulting in 20 nm linewidth oxide nanostructures.

Flexible palladium-based H2 sensor with fast response and low leakage detection by nanoimprint lithography

Flexible palladium-based H2 sensors have a great potential in advanced sensing applications, as they offer advantages such as light weight, space conservation, and mechanical durability. Despite these advantages, the paucity of such sensors is due to the fact that they are difficult to fabricate while maintaining excellent sensing performance. Here, we demonstrate, using direct nanoimprint lithography of palladium, the fabrication of a flexible, durable, and fast responsive H2 sensor that is capable of detecting H2 gas concentration as low as 50 ppm. High resolution and high throughput patterning of palladium gratings over a 2 cm × 1 cm area on a rigid substrate was achieved by heat-treating nanoimprinted palladium benzyl mercaptide at 250 °C for 1 h. The flexible and robust H2 sensing device was fabricated by subsequent transfer nanoimprinting of these gratings into a polycarbonate film at its glass transition temperature. This technique produces flexible H2 sensors with improved durability, sensitivity, and response time in comparison to palladium thin films. At ambient pressure and temperature, the device showed a fast response time of 18 s at a H2 concentration of 3500 ppm. At 50 ppm concentration, the response time was found to be 57 s. The flexibility of the sensor does not appear to compromise its performance.

Fabrication of Ultrafine Soft-Matter Arrays by Selective Contact Thermochemical Reaction

Patterning of functional soft matters at different length scales is important for diverse research fields including cell biology, tissue engineering and medicinal science and the development of optics and electronics. Here we have further improved a simple but very efficient method, selective contact thermochemical reaction (SCTR), for patterning soft matters over large area with a sub-100 nm resolution. By selecting contact between different precursors through a topographically patterned PDMS stamp and subsequently any heating way for thermalchemical reaction, thermal-related soft matters can be patterned to form controllable micro or nano structures, even three-dimensional structures. The fine tunability and controllability of as-prepared micro and nano structures demonstrate this versatile approach a far wide range of uses than the merely academic.