Building Semipermeable Films One Monomer at a Time: Structural Advantages via Molecular Layer Deposition vs Interfacial Polymerization

Molecular layer deposition (MLD) provides the opportunity to perform condensation polymerization one vaporized monomer at a time for the creation of precise, selective nanofilms for desalination membranes. Here, we compare the structure, chemistry, and morphology of two types of commercial interfacial polymerzation (IP) membranes with lab-made MLD films. M-phenylenediamine (MPD) and trimesoyl chloride (TMC) produced a cross-linked, aromatic polyamide often used in reverse osmosis membranes at MLD growth rates of 2.9 Å/cycle at 115 °C. Likewise, piperazine (PIP) and TMC formed polypiperazine amide, a common selective layer in nanofiltration membranes, with MLD growth rates of 1.5 Å/cycle at 115 °C. Ellipsometry and X-ray reflectivity results suggest that the surface of the MLD films is comprised of polymer segments roughly two monomers in length, which are connected at one end to the cross-linked bulk layer. As a result of this structure as well as the triple-functionality of TMC, MPD-TMC had a temperature window of stable growth rate from 115 to 150 °C, which is unlike any non-cross-linked MLD chemistries reported in the literature. Compared to IP films, corresponding MLD films were denser and morphologically conformal, which suggests a reduction in void volumes; this explains the high degree of salt rejection and reduced flux previously observed for exceptionally thin MPD-TMC MLD membranes. Using X-ray photoelectron spectroscopy and infrared spectroscopy, MLD PIP-TMC films evidenced a completely cross-linked internal structure, which lacked amine and carboxyl groups, pointing to a hydrophobic bulk structure, ideal for optimized water flux. Grazing-incidence wide-angle X-ray scattering showed broad features in each polyamide with d-spacings of 5.0 Å in PIP-TMC compared to that of 3.8 Å in MPD-TMC. While MLD and IP films were structurally identical to PIP-TMC, MPD-TMC IP films had a structure that may have been altered by post-treatment compared to MLD films. These results provide foundational insights into the MLD process, structure-performance relationships, and membrane fabrication.

Fluids and Electrolytes under Confinement in Single-Digit Nanopores

Confined fluids and electrolyte solutions in nanopores exhibit rich and surprising physics and chemistry that impact the mass transport and energy efficiency in many important natural systems and industrial applications. Existing theories often fail to predict the exotic effects observed in the narrowest of such pores, called single-digit nanopores (SDNs), which have diameters or conduit widths of less than 10 nm, and have only recently become accessible for experimental measurements. What SDNs reveal has been surprising, including a rapidly increasing number of examples such as extraordinarily fast water transport, distorted fluid-phase boundaries, strong ion-correlation and quantum effects, and dielectric anomalies that are not observed in larger pores. Exploiting these effects presents myriad opportunities in both basic and applied research that stand to impact a host of new technologies at the water-energy nexus, from new membranes for precise separations and water purification to new gas permeable materials for water electrolyzers and energy-storage devices. SDNs also present unique opportunities to achieve ultrasensitive and selective chemical sensing at the single-ion and single-molecule limit. In this review article, we summarize the progress on nanofluidics of SDNs, with a focus on the confinement effects that arise in these extremely narrow nanopores. The recent development of precision model systems, transformative experimental tools, and multiscale theories that have played enabling roles in advancing this frontier are reviewed. We also identify new knowledge gaps in our understanding of nanofluidic transport and provide an outlook for the future challenges and opportunities at this rapidly advancing frontier.

Microfabrication of functional polyimide films and microstructures for flexible MEMS applications

Polyimides are widely used in the MEMS and flexible electronics fields due to their combined physicochemical properties, including high thermal stability, mechanical strength, and chemical resistance values. In the past decade, rapid progress has been made in the microfabrication of polyimides. However, enabling technologies, such as laser-induced graphene on polyimide, photosensitive polyimide micropatterning, and 3D polyimide microstructure assembly, have not been reviewed from the perspective of polyimide microfabrication. The aims of this review are to systematically discuss polyimide microfabrication techniques, which cover film formation, material conversion, micropatterning, 3D microfabrication, and their applications. With an emphasis on polyimide-based flexible MEMS devices, we discuss the remaining technological challenges in polyimide fabrication and possible technological innovations in this field.

Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor

Trimethylaluminum is the most used aluminum precursor in atomic and molecular layer deposition (ALD/MLD). It provides high growth-per-cycle (GPC), is highly reactive and is relatively low cost. However, in the deposition of hybrid alucone films, TMA tends to infiltrate into the films requiring very long purge steps and thereby limiting the deposition rate (nm s^-1) of the process. From our previous studies, we know that dimethylaluminum isopropoxide (DMAI) could be a potential candidate to substitute TMA in alucone depositions as it does not seem to infiltrate into the films. In this study, we perform a more detailed investigation of MLD of alucone on an atmospheric pressure spatial MLD system using DMAI as the aluminum precursor. The effect of deposition temperature and reactant purge times on the overall GPC has been investigated and a decreasing GPC with increasing deposition temperature and increasing EG purge time has been observed. Furthermore, the DMAI alucone films have been compared for their chemical environment and degradation with the films prepared using TMA and EG, showing striking similarities between the two. The results demonstrate that DMAI can be used as an alternative precursor to TMA for MLD of alucone films and this work can be used as a guide for designing efficient MLD processes in the future.

In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

Organic thin films formed by molecular layer deposition (MLD) are important for next-generation electronics, energy storage, photoresists, protective barriers and other applications. This study uses in situ ellipsometry and quartz crystal microbalance to explore growth initiation and growth rate evolution during MLD of polyurea using aromatic p-phenylene diisocyanate (PDIC) or aliphatic 1,6-hexamethylene diisocyanate (HDIC) combined with ethylenediamine (ED) or 1,6-hexanediamine (HD) co-reactants. During the first 10-20 cycles of growth, we show the growth rate can increase and/or decrease substantially depending on the substrate as well as the flexibility, length, and structure of the isocyanate and amine reactants used. The transition from initial to steady growth is attributed to a change in active surface site density as the growth proceeds, where the number of sites is determined by a balance between steric effects that block active sites, double reactions that consume multiple active sites, and precursor physisorption and sub-surface diffusion that create new active sites, where the extent of each mechanism depends on the precursors and deposition conditions. Results shown here provide useful insight into mechanisms needed to control growth of ultra-thin organic films for advanced applications.

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films

Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics, but it is also recognized as a promising fabrication strategy for various alkali-metal-based thin films in emerging energy technologies, the spearhead application being the Li-ion battery. Since the pioneering work in 2009 for Li-containing thin films, the field has been rapidly growing and also widened from lithium to other alkali metals. Moreover, alkali-metal-based metal-organic thin films have been successfully grown by combining molecular layer deposition (MLD) cycles of the organic molecules with the ALD cycles of the alkali metal precursor. The current literature describes already around 100 ALD and ALD/MLD processes for alkali-metal-bearing materials. Interestingly, some of these materials cannot even be made by any other synthesis route. In this review, our intention is to present the current state of research in the field by (i) summarizing the ALD and ALD/MLD processes so far developed for the different alkali metals, (ii) highlighting the most intriguing thin-film materials obtained thereof, and (iii) addressing both the advantages and limitations of ALD and MLD in the application space of these materials. Finally, (iv) a brief outlook for the future perspectives and challenges of the field is given.

About the importance of purge time in molecular layer deposition of alucone films

The deposition rate and properties of MLD films are for a large part determined by what happens during the reactant exposure step. In some cases, however, the purge step is of equal importance, for example in MLD of alucone using trimethylaluminum (TMA) and ethylene glycol (EG). We show that infiltration of TMA into the alucone film followed by its continuous outgassing during the subsequent EG exposure step can lead to undesired CVD effects. To avoid the CVD effects, very long TMA purge times are required which in turn significantly impact the obtainable deposition rates. We also developed a kinetic model that correlates process parameters like reactant partial pressures, exposure times, purge time and deposition temperature to the CVD component in the film growth. We observed that the overall GPC decreases exponentially with TMA purge time attributed to the decreasing CVD component and after a long enough purge time reaches a steady-state value of growth only due to the MLD component. It was also observed that the CVD contributions reduced with decreasing partial pressure of TMA and increasing deposition temperature. With an intention to improve the outgassing efficiency of TMA, the influence of purge gas flow on the CVD growth component is also briefly discussed. Moreover, to mitigate the problem of infiltration, we show that a bulkier substitute of TMA like dimethylaluminum isopropoxide (DMAI) shows no infiltration and can improve the alucone deposition rate by at least an order of magnitude.

Bridging the Synthesis Gap: Ionic Liquids Enable Solvent-Mediated Reaction in Vapor-Phase Deposition

Molecular layer deposition (MLD) is an attractive, vapor-phase deposition method for applications requiring ultrathin organic materials, such as photolithography, lithium batteries, and microelectronics. By using sequential self-limiting surface reactions, MLD offers excellent control over thickness and conformality, but there are also challenges such as a limited range of possible film compositions and long deposition times. In this study, we introduce a modified technique, termed ionic liquid assisted MLD (IL-MLD), that can overcome these barriers. By performing the surface reactions inside of an ultrathin layer of a compatible ionic liquid (IL), solvent effects are replicated inside a vacuum system, broadening the possible reactions to a much wider suite of chemistries. Using this strategy, the MLD of polyetherketoneketone, an industrially and research-relevant, high-performance thermoplastic, is reported. With this proof-of-concept, we demonstrate that IL-MLD can enable the synthesis of polymers via solvent- or catalyst-mediated reactions and establish an approach that may allow solution chemistries to be accessed in other vapor deposition techniques as well.

Gas Phase Organic Functionalization of SiO2 with Propanoyl Chloride

The reaction mechanism of propanoyl chloride (C₂H₅COCl) with -SiOH-terminated SiO₂ films was studied using in situ surface infrared spectroscopy. We show that this surface functionalization reaction is temperature dependent. At 230 °C, C₂H₅COCl reacts with isolated surface -SiOH groups to form the expected ester linkage. Surprisingly, as the temperature is lowered to 70 °C, the ketone groups are transformed into the enol tautomer, but if the temperature is increased back to the starting exposure temperature of 230 °C, the ketone tautomer is not recovered, indicating that the enol form is thermally stable over a wide range of temperatures. Further, the enol form is directly formed after exposure of a SiO₂ surface to C₂H₅COCl at 70 °C. We speculate that the enol form, which is energetically unfavorable, is stabilized because of hydrogen bonding with adjacent enol groups or through hydrogen bonding with unreacted surface -SiOH groups. The surface coverage of hydrocarbon molecules is calculated as ∼6 × 10¹² cm^-2, assuming each reacted -SiOH group contributes to one hydrocarbon linkage on the surface. At a substrate temperature of 70 °C, the enol form is unreactive with H₂O, and H₂O molecules simply physisorb on the surface. At higher temperatures, H₂O converts the ketone to the enol tautomer and reacts with Si-O-Si bridges, forming more -SiOH reactive sites. The overall hydrocarbon coverage on the surface can then be further increased through cycling H₂O and C₂H₅COCl doses.

Molecular Layer Deposition Using Ring-Opening Reactions: Molecular Modeling of the Film Growth and the Effects of Hydrogen Peroxide

Novel coating materials are constantly needed for current and future applications in the area of microelectronics, biocompatible materials, and energy-related devices. Molecular layer deposition (MLD) is answering this cry and is an increasingly important coating method for organic and hybrid organic-inorganic thin films. In this study, we have focused on hybrid inorganic-organic coatings, based on trimethylaluminum, monofunctional aromatic precursors, and ring-opening reactions with ozone. We present the MLD processes, where the films are produced with trimethylaluminum, one of the three aromatic precursors (phenol, 3-(trifluoromethyl)phenol, and 2-fluoro-4-(trifluoromethyl)benzaldehyde), ozone, and the fourth precursor, hydrogen peroxide. According to the in situ Fourier-transform infrared spectroscopy measurements, the hydrogen peroxide reacts with the surface carboxylic acid group, forming a peroxyacid structure (C(O)-O-OH), in the case of all three processes. In addition, molecular modeling for the processes with three different aromatic precursors was carried out. When combining these modeling results with the experimental research data, new interesting aspects of the film growth, reactions, and properties are exploited.

The transformation behaviour of "alucones", deposited by molecular layer deposition, in nanoporous Al2O3 layers

Nanoporous alumina films can be synthesized from hybrid organic-inorganic "alucone" films deposited by molecular layer deposition (MLD) by wet etching in deionized water or calcination in air at 500 °C. This transformation process was systematically investigated for two alucone chemistries based on ethylene glycol (EG) and glycerol (GL). Ellipsometric porosimetry (EP) was used for the characterization of the porous alumina structures that are formed as a result of the treatments. Etching in deionized water transforms both EG- and GL-alucones into porous alumina with a porosity of about 40%, albeit with a different pore structure: cylindrical pores for EG-alucones and ink-bottle structures for GL-alucones. Calcination in air up to 500 °C only successfully transformed EG-alucones into porous alumina if the chosen heating and cooling rate was lower than 200 °C h-1. Below this ramp rate, a relationship between the resulting porosity and the ramp rate was found. At the lowest investigated ramp rate of 20 °C h-1, the highest porosity of 36% was achieved. For this treatment type, the pore shape was of the ink-bottle type for all investigated ramp rates with narrow 1 nm-sized pores. Infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy revealed that the final chemistry of the porous structures was slightly different for both treatments due to trace amounts of carbon left behind by water etching. This suggests that the internal surface of the porous structure has a different termination depending on the chosen treatment. The precise thickness control and conformal nature inherent to MLD combined with the wet and heat treatments enables the coating of complex 3D structures with a porous alumina film with a well-defined thickness and pore structure.

Slot waveguide ring resonators coated by an atomic layer deposited organic/inorganic nanolaminate

In this study, slot waveguide ring resonators patterned on a silicon-on-insulator (SOI) wafer and coated with an atomic layer deposited nanolaminate consisting of alternating layers of tantalum pentoxide and polyimide were fabricated and characterized. To the best of our knowledge, this is the first demonstration of atomic layer deposition (ALD) of organic materials in waveguiding applications. In our nanolaminate ring resonators, the optical power is not only confined in the narrow central air slot but also in several parallel sub-10 nm wide vertical polyimide slots. This indicates that the mode profiles in the silicon slot waveguide can be accurately tuned by the ALD method. Our results show that ALD of organic and inorganic materials can be combined with conventional silicon waveguide fabrication techniques to create slot waveguide ring resonators with varying mode profiles. This can potentially open new possibilities for various photonic applications, such as optical sensing and all-optical signal processing.

Tunable optical properties of hybrid inorganic-organic [(TiO2)m(Ti-O-C6H4-O-)k]n superlattice thin films

A combined atomic layer deposition (ALD) and molecular layer deposition (MLD) process was developed to fabricate inorganic-organic [(TiO2)m(Ti-O-C6H4-O-)k]n thin films from TiCl4, water and hydroquinone (HQ) precursors, and in particular, superlattice structures where single-molecular organic layers (k = 1) are periodically sandwiched between thicker TiO2 layers (m > 1). The incorporation of organic layers was found to systematically blue-shift the optical band gap of TiO2 with decreasing superlattice period and--most importantly--to sensitize the TiO2 layers to visible light over a considerable part of the visible range below 700 nm, a fact that could be of substantial interest for photocatalysis and solar cell applications.

Spectroscopic investigation of different concentrations of the vapour deposited copper phthalocyanine as a "guest" in polyimide matrix

Nanocomposite layers 250 nm copper phthalocyanine/polyimide prepared by simultaneous vapour deposition of three different sources were studied. Different concentrations of copper phthalocyanine as a "guest" in polyimide matrix as a function of conditions of the preparation have been determined by FTIR (Fourier Transform Infrared) and UV-VIS (Ultraviolet-Visible) spectroscopies. The aim was to estimate the possibility of the spectroscopic methods for quantitative determination of the "guest" and compare with the quality of the polyimide thin films in relation to the "guest" concentration. The band at 1334 cm(-1) has been used for quantitative estimation of "guest" in polyimide matrix. The concentrations of the copper phthalocyanine less than 20% require curve fitting techniques with Fourier self deconvolution. The relationship between "guest" concentrations and degree of imidization, as well as the electronic UV-VIS spectra are discussed in relation to the composition, imidization degree and the two crystallographic modification of the embedded chromophore.

Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques

Molecular layer deposition (MLD) of the hafnium alkoxide polymer known as "hafnicone" was grown using sequential exposures of tetrakis(dimethylamido) hafnium (TDMAH) and ethylene glycol (EG) as the reactants. In situ quartz crystal microbalance (QCM) experiments demonstrated self-limiting reactions and linear growth versus the number of TDMAH/EG reaction cycles. Ex situ X-ray reflectivity (XRR) analysis confirmed linear growth and measured the density of the hafnicone films. The hafnicone growth rates were temperature-dependent and decreased from 1.2 Å per cycle at 105 °C to 0.4 Å per cycle at 205 °C. The measured density was ∼3.0 g/cm(3) for the hafnicone films at all temperatures. Transmission electron microscopy images revealed very uniform and conformal hafnicone films. The XRR studies also showed that the hafnicone films were very stable with time. Nanoindentation measurements determined that the elastic modulus and hardness of the hafnicone films were 47 ± 2 and 2.6 ± 0.2 GPa, respectively. HfO2/hafnicone nanolaminate films also were fabricated using HfO2 atomic layer deposition (ALD) and hafnicone MLD at 145 °C. The in situ QCM measurements revealed that HfO2 ALD nucleation on the hafnicone MLD surface required at least 18 TDMAH/H2O cycles. Hafnicone alloys were also fabricated by combining HfO2 ALD and hafnicone MLD at 145 °C. The composition of the hafnicone alloy was varied by adjusting the relative number of TDMAH/H2O ALD cycles and TDMAH/EG MLD cycles in the reaction sequence. The electron density changed continuously from 8.2 × 10(23) e(-)/cm(3) for pure hafnicone MLD films to 2.4 × 10(24) e(-)/cm(3) for pure HfO2 ALD films. These hafnicone films and the HfO2/hafnicone nanolaminates and alloys may be useful for flexible thin-film devices.

Enhanced photoelectrochemical water splitting performance of TiO2 nanotube arrays coated with an ultrathin nitrogen-doped carbon film by molecular layer deposition

Vertically oriented TiO2 nanotube arrays (TNTAs) were conformally coated with an ultrathin nitrogen-doped (N-doped) carbon film via the carbonization of a polyimide film deposited by molecular layer deposition and simultaneously hydrogenated, thereby creating a core/shell nanostructure with a precisely controllable shell thickness. The core/shell nanostructure provides a larger heterojunction interface to substantially reduce the recombination of photogenerated electron-hole pairs, and hydrogenation enhances solar absorption of TNTAs. In addition, the N-doped carbon film coating acts as a high catalytic active surface for oxygen evolution reaction, as well as a protective film to prevent hydrogen-treated TiO2 nanotube oxidation by electrolyte or air. As a result, the N-doped carbon film coated TNTAs displayed remarkably improved photocurrent and photostability. The TNTAs with a N-doped carbon film of ∼ 1 nm produces a current density of 3.6 mA cm(-2) at 0 V vs. Ag/AgCl under the illumination of AM 1.5 G (100 mW cm(-2)), which represents one of the highest values achieved with modified TNTAs. Therefore, we propose that ultrathin N-doped carbon film coating on materials is a viable approach to enhance their PEC water splitting performance.

Organic and inorganic-organic thin film structures by molecular layer deposition: A review

The possibility to deposit purely organic and hybrid inorganic-organic materials in a way parallel to the state-of-the-art gas-phase deposition method of inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorganics, the emerging molecular layer deposition (MLD) technique for organic constituents can be employed to fabricate high-quality thin films and coatings with thickness and composition control on the molecular scale, even on complex three-dimensional structures. Moreover, by combining the two techniques, ALD and MLD, fundamentally new types of inorganic-organic hybrid materials can be produced. In this review article, we first describe the basic concepts regarding the MLD and ALD/MLD processes, followed by a comprehensive review of the various precursors and precursor pairs so far employed in these processes. Finally, we discuss the first proof-of-concept experiments in which the newly developed MLD and ALD/MLD processes are exploited to fabricate novel multilayer and nanostructure architectures by combining different inorganic, organic and hybrid material layers into on-demand designed mixtures, superlattices and nanolaminates, and employing new innovative nanotemplates or post-deposition treatments to, e.g., selectively decompose parts of the structure. Such layer-engineered and/or nanostructured hybrid materials with exciting combinations of functional properties hold great promise for high-end technological applications.

Uniform and Conformal Carbon Nanofilms Produced Based on Molecular Layer Deposition

Continuous and uniform carbon nanofilms (CNFs) are prepared by pyrolysis of polyimide films which are produced by molecular layer deposition (MLD). The film thickness can be easily controlled at nanometer scale by altering the cycle numbers. During the annealing process at 600 °C, the polyimide film is subject to shrinkage of 70% in thickness. The obtained CNFs do not exhibit a well-graphitized structure due to the low calcination temperature. No clear pore structures are observed in the produced films. CNFs grown on a glass substrate with a thickness of about 1.4 nm shows almost 98% optical transmittance in the visible spectrum range. Au nanoparticles coated with CNFs are produced by this method. Carbon nanotubes with uniform wall thickness are obtained using anodic aluminum oxide as a template by depositing polyimide films into its pores. Our results demonstrate that this method is very effective to coat conformal and uniform CNFs on various substrates, such as nanoparticles and porous templates, to produce functional composite nanomaterials.

ALD/MLD of novel layer-engineered Zn-based inorganic-organic hybrid thin films using heterobifunctional 4-aminophenol as an organic precursor

Here we present novel hybrid inorganic-organic thin films of the (-Zn-O-C(6)H(4)-NH-)(n) type deposited in an atomic/molecular layer-by-layer manner through sequential gas-surface reactions of separately introduced inorganic (diethyl zinc) and organic (4-aminophenol) precursor pulses. The organic precursor employed is heterobifunctional (containing both hydroxyl and amino groups) and possesses a rigid benzene backbone; these precursor characteristics are believed to suppress the unwanted double surface reactions and promote the ideal growth mechanism such that the film thickness is linearly controlled by the number of deposition cycles. The appreciably high growth rate of ~1.1 Å per cycle is found to remain constant in the deposition temperature range of 140-200 °C, but in practice our atomic/molecular layer deposition (ALD/MLD) process yields high-quality, uniform, smooth and relatively air-stable films even in a much wider temperature range from 140 up to 330 °C. The refractive index of the films is ~1.94 ± 0.01 independent of the deposition temperature and the density ranges within 1.5-1.7 g cm(-3).

Oligomer orientation in vapor-molecular-layer-deposited alkyl-aromatic polyamide films

The surface-limited molecular-layer deposition of alkyl-aromatic polyamide films using sequential doses of 1,4-butane diamine (BDA) and terephthaloyl dichloride (TDC) is characterized using in situ quartz crystal microbalance and ex situ spectroscopy analysis. For the first time, near-edge X-ray absorption fine structure (NEXAFS) spectroscopy is used to offer insight into molecular orientation in films deposited via molecular-layer deposition (MLD). The results show that the oligomer units are lying nearly parallel to the surface, which differs from the linear vertical growth mode often used to illustrate film growth.

Fabrication of a new type of organic-inorganic hybrid superlattice films combined with titanium oxide and polydiacetylene

We fabricated a new organic-inorganic hybrid superlattice film using molecular layer deposition [MLD] combined with atomic layer deposition [ALD]. In the molecular layer deposition process, polydiacetylene [PDA] layers were grown by repeated sequential adsorption of titanium tetrachloride and 2,4-hexadiyne-1,6-diol with ultraviolet polymerization under a substrate temperature of 100°C. Titanium oxide [TiO2] inorganic layers were deposited at the same temperatures with alternating surface-saturating reactions of titanium tetrachloride and water. Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of the nanohybrid films. The transmission electron microscopy analysis of the titanium oxide cross-linked polydiacetylene [TiOPDA]-TiO2 thin films confirmed the MLD growth rate and showed that the films are amorphous superlattices. Composition and polymerization of the films were confirmed by infrared spectroscopy. The TiOPDA-TiO2 nanohybrid superlattice films exhibited good thermal and mechanical stabilities.PACS: 81.07.Pr, organic-inorganic hybrid nanostructures; 82.35.-x, polymerization; 81.15.-z, film deposition; 81.15.Gh, chemical vapor deposition (including plasma enhanced CVD, MOCVD, ALD, etc.).

Molecular layer deposition of aluminum alkoxide polymer films using trimethylaluminum and glycidol

Molecular layer deposition (MLD) of aluminum alkoxide polymer films was examined using trimethlyaluminum (TMA) and glycidol (GLY) as the reactants. Glycidol is a high vapor pressure heterobifunctional reactant with both hydroxyl and epoxy chemical functionalites. These two different functionalities help avoid "double reactions" that are common with homobifuctional reactants. A variety of techniques, including in situ Fourier transform infrared (FTIR) spectroscopy and quartz crystal microbalance (QCM) measurements, were employed to study the film growth. FTIR measurements at 100 and 125 °C observed the selective reaction of the GLY hydroxyl group with the AlCH(3) surface species during GLY exposure. Epoxy ring-opening and methyl transfer from TMA to the surface epoxy species were then monitored during TMA exposure. This epoxy ring-opening reaction is dependent on strong Lewis acid-base interactions between aluminum and oxygen. The QCM experiments observed linear growth with self-limiting surface reactions at 100-175 °C under certain growth conditions. With a sufficient purge time of 20 s after TMA and GLY exposures at 125 °C, the mass gain per cycle (MGPC) was 19.8 ng/cm(2)-cycle. The individual mass gains after the TMA and GLY exposures were also consistent with a TMA/GLY stoichiometry of 4:3 in the MLD film. This TMA/GLY stoichiometry suggests the presence of Al(2)O(2) dimeric core species. The MLD films resulting from these TMA and GLY exposures also evolved with annealing temperature to form thinner conformal porous films with increased density. Non-self-limiting growth was a problem at shorter purge times and lower temperatures. With shorter purge times of 10 s at 125 °C, the MPGC increased dramatically to 134 ng/cm(2)-cycle. The individual mass gains after the TMA and GLY exposures in the CVD regime were consistent with a TMA/GLY stoichiometry of 1:1. The MGPC decreased progressively versus purge time. This behavior was attributed to the removal of reactants that could lead to CVD and the instability of the surface species after the reactant exposures. These results reveal that the TMA and GLY reaction displays much complexity and must be carefully controlled to be a useful MLD process.

Local electrical modification of a conductivity-switching polyimide film formed by molecular layer deposition

The electrical modification of a conductivity-switching polyimide film via molecular layer deposition (MLD) is studied for ultrahigh density data storage based on a scanning probe microscope (SPM). A PMDA-ODA (PMDA = 1, 2, 3, 5-benzenetetracarboxylic anhydride, ODA = 4, 4-oxydianiline) film as a recording medium is uniformly formed from a self-assembled monolayer on a Au surface by MLD. It is demonstrated that the conductivity of the film can be changed by applying a voltage between a SPM probe and the film. This conductivity-switching phenomenon is discussed by the molecular orbital approach and considered to be caused by the charge transfer effect or carrier trapping effect of PMDA-ODA.

Molecular layer deposition of thiol-ene multilayers on semiconductor surfaces

The fabrication of organic thin films with controlled chemical structure in the vertical direction (parallel to surface normal) is important for many practical and technological applications in organic electronics, chemical-resistant films, and biocompatible materials, among others. In order to achieve composition control in the z-direction, molecular layer deposition (MLD: covalent layer-by-layer assembly) of thin, organic films on silicon, silicon oxide, and germanium surfaces was carried out, using the well-established UV-induced thiol-ene reaction. Through successive contact of an interface with dithiol and diene molecules under UV irradiation for short periods (approximately 30 min, room temperature), well-defined thin films can be obtained. Linear increases in film thickness with respect to layer number were obtained for shorter aliphatic dienes and dithiols (C < or = 8), but with longer molecules and with aromatic substrates a self-limiting situation sets in whereby both ends of the molecule react with the surface, arresting film growth. The functionalized interfaces were characterized by ellipsometry, X-ray photoelectronic spectroscopy, and atomic force microscopy.

Carrier-envelope phase stabilization of a multi-millijoule, regenerative-amplifier-based chirped-pulse smplifier system

This article reports on the successful stabilization of the carrier-envelope phase of a 1-kHz laser system that includes a large grating stretcher, a regenerative amplifier, a multipass amplifier and a grating compressor. Phase stability for pulse energies up to 6 mJ is demonstrated using electronic feedback to the oscillator locking electronics as well as feedback via an acousto-optic programmable dispersive filter.

Angled sidewalls in silicon slot waveguides: conformal filling and mode properties

Effect of angled sidewalls on the filling and properties of silicon slot waveguides is discussed. We demonstrate complete filling of slot waveguide structures with oxide material systems using the atomic layer deposition technique and discuss use of various slot filling materials. Properties of the optical modes in angled-sidewall slot waveguides are studied. Enhanced vertical confinement is obtained with certain waveguide parameters. The reduced effective mode area enhances e.g. nonlinear effects in the waveguide. We discuss the use of atomic layer deposition in realization of filled slot waveguides optimized for all-optical functionalities.

Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers

The fabrication of many devices in modern technology requires techniques for growing thin films. As devices miniaturize, manufacturers will need to control thin film growth at the atomic level. Because many devices have challenging morphologies, thin films must be able to coat conformally on structures with high aspect ratios. Techniques based on atomic layer deposition (ALD), a special type of chemical vapor deposition, allow for the growth of ultra-thin and conformal films of inorganic materials using sequential, self-limiting reactions. Molecular layer deposition (MLD) methods extend this strategy to include organic and hybrid organic-inorganic polymeric materials. In this Account, we provide an overview of the surface chemistry for the MLD of organic and hybrid organic-inorganic polymers and examine a variety of surface chemistry strategies for growing polymer thin films. Previously, surface chemistry for the MLD of organic polymers such as polyamides and polyimides has used two-step AB reaction cycles using homo-bifunctional reactants. However, these reagents can react twice and eliminate active sites on the growing polymer surface. To avoid this problem, we can employ alternative precursors for MLD based on hetero-bifunctional reactants and ring-opening reactions. We can also use surface activation or protected chemical functional groups. In addition, we can combine the reactants for ALD and MLD to grow hybrid organic-inorganic polymers that should display interesting properties. For example, using trimethylaluminum (TMA) and various diols as reactants, we can achieve the MLD of alucone organic-inorganic polymers. We can alter the chemical and physical properties of these organic-inorganic polymers by varying the organic constituent in the diol or blending the alucone MLD films with purely inorganic ALD films to build a nanocomposite or nanolaminate. The combination of ALD and MLD reactants enlarges the number of possible sequential self-limiting surface reactions for film growth. Extensions to three-step ABC reaction cycles also offer many advantages to avoid the use of homo-bifunctional reactants and incorporate new functionality in the thin film. The advances in ALD have helped technological development in many areas, including semiconductor processing and magnetic disk-drive manufacturing. We expect that the advances in MLD will lead to innovations in polymeric thin-film products. Although there are remaining challenges, effective surface chemistry strategies are being developed for MLD that offer the opportunity for future advances in materials and device fabrication.

Multifunctional 3D nanoarchitectures for energy storage and conversion

The design and fabrication of three-dimensional multifunctional architectures from the appropriate nanoscale building blocks, including the strategic use of void space and deliberate disorder as design components, permits a re-examination of devices that produce or store energy as discussed in this critical review. The appropriate electronic, ionic, and electrochemical requirements for such devices may now be assembled into nanoarchitectures on the bench-top through the synthesis of low density, ultraporous nanoarchitectures that meld high surface area for heterogeneous reactions with a continuous, porous network for rapid molecular flux. Such nanoarchitectures amplify the nature of electrified interfaces and challenge the standard ways in which electrochemically active materials are both understood and used for energy storage. An architectural viewpoint provides a powerful metaphor to guide chemists and materials scientists in the design of energy-storing nanoarchitectures that depart from the hegemony of periodicity and order with the promise--and demonstration--of even higher performance (265 references).

General assembly method for linear metal nanoparticle chains embedded in nanotubes

We demonstrate a flexible assembly method for producing linear metal nanoparticle chains embedded in nanotubes. The chain formation is based on the Rayleigh instability after annealing metal nanowires confined in nanotubes. Beginning with metal nanowires from arbitrary synthesis methods, atomic layer deposition (ALD) was applied to coat the wires first with a sacrificial layer then with a shell layer. Subsequently, the sacrificial layer was removed leading to confined wires in nanotubes with a free volume. Finally, embedded nanoparticle chains were produced inducing the Rayleigh instability by annealing the confined nanowires. This method is quite general not only for different metals but also for different shell materials. We are able to tune the particle spacing and diameter, the shape of the nanochains, the tube diameter and the shell thickness by ALD significantly.

Molecular layer deposition of poly(p-phenylene terephthalamide) films using terephthaloyl chloride and p-phenylenediamine

Ultrathin polymer films can be fabricated using the gas-phase method known as molecular layer deposition. This process typically uses bifunctional monomers in a sequential, self-limiting reaction sequence to grow conformal polymer films with molecular layer control. In this study, terephthaloyl chloride (TC) and p-phenylenediamine (PD) were used as the bifunctional monomers to deposit poly(p-phenylene terephthalamide) (PPTA) thin films. 3-Aminopropyl trimethoxysilane or ethanolamine was used to prepare amine-terminated surfaces prior to the PPTA MLD. The surface chemistry and growth rate during PPTA MLD at 145 degrees C were studied using in situ transmission Fourier transform infrared (FTIR) spectroscopy experiments on high surface area powders of SiO2 particles. PPTA MLD thin film growth at 145 degrees C was also examined using in situ transmission FTIR experiments on flat KBr substrates with an amine-terminated Al2O3 ALD overlayer. The integrated absorbances of the N-H and amide I stretching vibrations were measured and used to estimate the thin film thickness. X-ray reflectivity (XRR) experiments were also employed to measure the film thickness after PPTA MLD at 145 degrees C and 180 degrees C. The experiments revealed that the TC and PD reactions displayed self-limiting surface chemistry. The surface species alternated with sequential TC and PD exposures and the PPTA MLD films grew continuously. However, the growth rates per MLD cycle at 145 degrees C were less than expectations based on the size of the molecules involved in the reaction chemistry and were variable between 0.5 and 4.0 A per TC/PD reaction cycle. The lower growth rates are explained by the growth of a limited number of polymer chains on the substrate. The variability in the growth rate is attributed to the difficulties with the bifunctional monomer precursors. Alternative surface chemistries for polymer MLD are proposed that would avoid the use of bifunctional monomers.