Charge trap memory based on few-layer black phosphorus

Two-Dimensional Materials for Brain-Inspired Computing Hardware

Recent breakthroughs in brain-inspired computing promise to address a wide range of problems from security to healthcare. However, the current strategy of implementing artificial intelligence algorithms using conventional silicon hardware is leading to unsustainable energy consumption. Neuromorphic hardware based on electronic devices mimicking biological systems is emerging as a low-energy alternative, although further progress requires materials that can mimic biological function while maintaining scalability and speed. As a result of their diverse unique properties, atomically thin two-dimensional (2D) materials are promising building blocks for next-generation electronics including nonvolatile memory, in-memory and neuromorphic computing, and flexible edge-computing systems. Furthermore, 2D materials achieve biorealistic synaptic and neuronal responses that extend beyond conventional logic and memory systems. Here, we provide a comprehensive review of the growth, fabrication, and integration of 2D materials and van der Waals heterojunctions for neuromorphic electronic and optoelectronic devices, circuits, and systems. For each case, the relationship between physical properties and device responses is emphasized followed by a critical comparison of technologies for different applications. We conclude with a forward-looking perspective on the key remaining challenges and opportunities for neuromorphic applications that leverage the fundamental properties of 2D materials and heterojunctions.

Challenges to Optimize Charge Trapping Non-Volatile Flash Memory Cells: A Case Study of HfO2/Al2O3 Nanolaminated Stacks

The requirements for ever-increasing volumes of data storage have urged intensive studies to find feasible means to satisfy them. In the long run, new device concepts and technologies that overcome the limitations of traditional CMOS-based memory cells will be needed and adopted. In the meantime, there are still innovations within the current CMOS technology, which could be implemented to improve the data storage ability of memory cells-e.g., replacement of the current dominant floating gate non-volatile memory (NVM) by a charge trapping memory. The latter offers better operation characteristics, e.g., improved retention and endurance, lower power consumption, higher program/erase (P/E) speed and allows vertical stacking. This work provides an overview of our systematic studies of charge-trapping memory cells with a HfO2/Al2O3-based charge-trapping layer prepared by atomic layer deposition (ALD). The possibility to tailor density, energy, and spatial distributions of charge storage traps by the introduction of Al in HfO2 is demonstrated. The impact of the charge trapping layer composition, annealing process, material and thickness of tunneling oxide on the memory windows, and retention and endurance characteristics of the structures are considered. Challenges to optimizing the composition and technology of charge-trapping memory cells toward meeting the requirements for high density of trapped charge and reliable storage with a negligible loss of charges in the CTF memory cell are discussed. We also outline the perspectives and opportunities for further research and innovations enabled by charge-trapping HfO2/Al2O3-based stacks.

Recent progress in three-terminal artificial synapses based on 2D materials: from mechanisms to applications

Synapses are essential for the transmission of neural signals. Synaptic plasticity allows for changes in synaptic strength, enabling the brain to learn from experience. With the rapid development of neuromorphic electronics, tremendous efforts have been devoted to designing and fabricating electronic devices that can mimic synapse operating modes. This growing interest in the field will provide unprecedented opportunities for new hardware architectures for artificial intelligence. In this review, we focus on research of three-terminal artificial synapses based on two-dimensional (2D) materials regulated by electrical, optical and mechanical stimulation. In addition, we systematically summarize artificial synapse applications in various sensory systems, including bioplastic bionics, logical transformation, associative learning, image recognition, and multimodal pattern recognition. Finally, the current challenges and future perspectives involving integration, power consumption and functionality are outlined.

2D materials: increscent quantum flatland with immense potential for applications

Quantum flatland i.e., the family of two dimensional (2D) quantum materials has become increscent and has already encompassed elemental atomic sheets (Xenes), 2D transition metal dichalcogenides (TMDCs), 2D metal nitrides/carbides/carbonitrides (MXenes), 2D metal oxides, 2D metal phosphides, 2D metal halides, 2D mixed oxides, etc. and still new members are being explored. Owing to the occurrence of various structural phases of each 2D material and each exhibiting a unique electronic structure; bestows distinct physical and chemical properties. In the early years, world record electronic mobility and fractional quantum Hall effect of graphene attracted attention. Thanks to excellent electronic mobility, and extreme sensitivity of their electronic structures towards the adjacent environment, 2D materials have been employed as various ultrafast precision sensors such as gas/fire/light/strain sensors and in trace-level molecular detectors and disease diagnosis. 2D materials, their doped versions, and their hetero layers and hybrids have been successfully employed in electronic/photonic/optoelectronic/spintronic and straintronic chips. In recent times, quantum behavior such as the existence of a superconducting phase in moiré hetero layers, the feasibility of hyperbolic photonic metamaterials, mechanical metamaterials with negative Poisson ratio, and potential usage in second/third harmonic generation and electromagnetic shields, etc. have raised the expectations further. High surface area, excellent young's moduli, and anchoring/coupling capability bolster hopes for their usage as nanofillers in polymers, glass, and soft metals. Even though lab-scale demonstrations have been showcased, large-scale applications such as solar cells, LEDs, flat panel displays, hybrid energy storage, catalysis (including water splitting and CO2 reduction), etc. will catch up. While new members of the flatland family will be invented, new methods of large-scale synthesis of defect-free crystals will be explored and novel applications will emerge, it is expected. Achieving a high level of in-plane doping in 2D materials without adding defects is a challenge to work on. Development of understanding of inter-layer coupling and its effects on electron injection/excited state electron transfer at the 2D-2D interfaces will lead to future generation heterolayer devices and sensors.

Utilizing trapped charge at bilayer 2D MoS2/SiO2interface for memory applications

In this work we use conductive atomic force microscopy (cAFM) to study the charge injection process from a nanoscale tip to a single isolated bilayer 2D MoS₂flake. The MoS₂is exfoliated and bonded to ultra-thin SiO₂/Si substrate. Local current-voltage (IV) measurements conducted by cAFM provides insight in charge trapping/de-trapping mechanisms at the MoS₂/SiO₂interface. The MoS₂nano-flake provides an adjustable potential barrier for embedded trap sites where the charge is injected from AFM tip is confined at the interface. A window of (ΔV∼ 1.8 V) is obtain at a reading current of 2 nA between two consecutiveIVsweeps. This is a sufficient window to differentiate between the two states indicating memory behavior. Furthermore, the physics behind the charge entrapment and its contribution to the tunneling mechanisms is discussed.

Programmable black phosphorus image sensor for broadband optoelectronic edge computing

Image sensors with internal computing capability enable in-sensor computing that can significantly reduce the communication latency and power consumption for machine vision in distributed systems and robotics. Two-dimensional semiconductors have many advantages in realizing such intelligent vision sensors because of their tunable electrical and optical properties and amenability for heterogeneous integration. Here, we report a multifunctional infrared image sensor based on an array of black phosphorous programmable phototransistors (bP-PPT). By controlling the stored charges in the gate dielectric layers electrically and optically, the bP-PPT’s electrical conductance and photoresponsivity can be locally or remotely programmed with 5-bit precision to implement an in-sensor convolutional neural network (CNN). The sensor array can receive optical images transmitted over a broad spectral range in the infrared and perform inference computation to process and recognize the images with 92% accuracy. The demonstrated bP image sensor array can be scaled up to build a more complex vision-sensory neural network, which will find many promising applications for distributed and remote multispectral sensing.

2D materials represent a promising platform for machine vision and edge computing applications, although usually limited to ultraviolet and visible wavelengths. Here, the authors report the realization of a programmable image sensor based on black phosphorus, implementing multispectral imaging and analog in-memory computing functionalities in the near- to mid-infrared range.

Solid-Ionic Memory in a van der Waals Heterostructure

Defect states dominate the performance of low-dimensional nanoelectronics, which deteriorate the serviceability of devices in most cases. But in recent years, some intriguing functionalities are discovered by defect engineering. In this work, we demonstrate a bifunctional memory device of a MoS₂/BiFeO₃/SrTiO₃ van der Waals heterostructure, which can be programmed and erased by solely one kind of external stimuli (light or electrical-gate pulse) via engineering of oxygen-vacancy-based solid-ionic gating. The device shows multibit electrical memory capability (>22 bits) with a large linearly tunable dynamic range of 7.1 × 10⁶ (137 dB). Furthermore, the device can be programmed by green- and red-light illuminations and then erased by UV light pulses. Besides, the photoresponse under red-light illumination reaches a high photoresponsivity (6.7 × 10⁴ A/W) and photodetectivity (2.12 × 10¹³ Jones). These results highlighted solid-ionic memory for building up multifunctional electronic and optoelectronic devices.

Atomically sharp interface enabled ultrahigh-speed non-volatile memory devices

The development of high-performance memory devices has played a key role in the innovation of modern electronics. Non-volatile memory devices have manifested high capacity and mechanical reliability as a mainstream technology; however, their performance has been hampered by low extinction ratio and slow operational speed. Despite substantial efforts to improve these characteristics, typical write times of hundreds of micro- or milliseconds remain a few orders of magnitude longer than that of their volatile counterparts. Here we demonstrate non-volatile, floating-gate memory devices based on van der Waals heterostructures with atomically sharp interfaces between different functional elements, achieving ultrahigh-speed programming/erasing operations in the range of nanoseconds with extinction ratio up to 10¹⁰. This enhanced performance enables new device capabilities such as multi-bit storage, thus opening up applications in the realm of modern nanoelectronics and offering future fabrication guidelines for device scale up.

Ultrafast non-volatile flash memory based on van der Waals heterostructures

Flash memory has become a ubiquitous solid-state memory device widely used in portable digital devices, computers and enterprise applications. The development of the information age has demanded improvements in memory speed and retention performance. Here we demonstrate an ultrafast non-volatile flash memory based on MoS₂/hBN/multilayer graphene van der Waals heterostructures, which achieves an ultrafast writing/erasing speed of 20 ns through two-triangle-barrier modified Fowler-Nordheim tunnelling. Using detailed theoretical analysis and experimental verification, we postulate that a suitable barrier height, gate coupling ratio and clean interface are the main reasons for the breakthrough writing/erasing speed of our flash memory devices. Because of its non-volatility this ultrafast flash memory could provide the foundation for the next generation of high-speed non-volatile memory.

Emerging 2D Memory Devices for In-Memory Computing

It is predicted that the conventional von Neumann computing architecture cannot meet the demands of future data-intensive computing applications due to the bottleneck between the processing and memory units. To try to solve this problem, in-memory computing technology, where calculations are carried out in situ within each nonvolatile memory unit, has been intensively studied. Among various candidate materials, 2D layered materials have recently demonstrated many new features that have been uniquely exploited to build next-generation electronics. Here, the recent progress of 2D memory devices is reviewed for in-memory computing. For each memory configuration, their operation mechanisms and memory characteristics are described, and their pros and cons are weighed. Subsequently, their versatile applications for in-memory computing technology, including logic operations, electronic synapses, and random number generation are presented. Finally, the current challenges and potential strategies for future 2D in-memory computing systems are also discussed at the material, device, circuit, and architecture levels. It is hoped that this manuscript could give a comprehensive review of 2D memory devices and their applications in in-memory computing, and be helpful for this exciting research area.

Gate-Tunable Negative Differential Resistance Behaviors in a hBN-Encapsulated BP-MoS2 Heterojunction

Two-dimensional (2D) heterostructures show great potential in achieving negative differential resistance (NDR) effects by Esaki diodes and or resonant tunneling diodes. However, most of the reported Esaki diode-based NDR devices realized by bulk 2D films lack sufficient gate tunability, and the tuning of NDR behavior from appearing to vanishing remains elusive. Here, a gate-tunable NDR device is reported based on a vertically stacked black phosphorus (BP) and molybdenum disulfide (MoS₂) thin 2D heterojunction. At room temperature, a rectifying ratio of ∼6 orders of magnitude from a reverse rectifying diode to a forward rectifying diode by gate modulation is obtained. Through analyzing the temperature-dependent electrical properties, the tunneling mechanism at a certain gate voltage range is revealed. Moreover, the switchable and continuously gate-tunable NDR behavior is realized with a maximum peak-to-valley ratio of 1.23 at 77 K, as shown in the I_DS mappings by sweeping V_DS under different V_GS. In addition, a compact model for gate-tunable NDR behavior in 2D heterostructures is proposed. To our best knowledge, this is the first demonstration of NDR behavior in BP-MoS₂ heterostructures. Consequently, this work sheds light on the gate-tunable NDR devices and reconfigurable logic devices for realizing ternary and reconfigurable logic systems.

Design and tailoring of two-dimensional Schottky, PN and tunnelling junctions for electronics and optoelectronics

Owing to their superior carrier mobility, strong light-matter interactions, and flexibility at the atomically thin thickness, two-dimensional (2D) materials are attracting wide interest for application in electronic and optoelectronic devices, including rectifying diodes, transistors, memory, photodetectors, and light-emitting diodes. At the heart of these devices, Schottky, PN, and tunneling junctions are playing an essential role in defining device function. Intriguingly, the ultrathin thickness and unique van der Waals (vdW) interlayer coupling in 2D materials has rendered enormous opportunities for the design and tailoring of various 2D junctions, e.g. using Lego-like hetero-stacking, surface decoration, and field-effect modulation methods. Such flexibility has led to marvelous breakthroughs during the exploration of 2D electronics and optoelectronic devices. To advance further, it is imperative to provide an overview of existing strategies for the engineering of various 2D junctions for their integration in the future. Thus, in this review, we provide a comprehensive survey of previous efforts toward 2D Schottky, PN, and tunneling junctions, and the functional devices built from them. Though these junctions exhibit similar configurations, distinct strategies have been developed for their optimal figures of merit based on their working principles and functional purposes.

Recent Process of Flexible Transistor-Structured Memory

Flexible transistor-structured memory (FTSM) has attracted great attention for its important role in flexible electronics. For nonvolatile information storage, FTSMs with floating-gate, charge-trap, and ferroelectric mechanisms have been developed. By introducing an optical sensory module, FTSM can be operated by optical inputs to function as an optical memory transistor. As a special type of FTSM, transistor-structured artificial synapse emulates important functions of a biological synapse to mimic brain-inspired memory behaviors and nervous signal transmissions. This work reviews the recent development of the above mentioned FTSMs, with a focus on working mechanism and materials, and flexibility.

Tunable and nonvolatile multibit data storage memory based on MoTe2/boron nitride/graphene heterostructures through contact engineering

Heterostructures formed by stacking atomically thin two-dimensional materials are promising candidates for flash memory devices to achieve premium performances, due to the capability of effective carrier modulation and unique charge trapping behavior at the interfaces with atomic flatness. Here, we report a nonvolatile floating-gate flash memory based on MoTe₂/h-BN/graphene van der Waals heterostructure, which possesses increased data storage capacity per cell and versatile tunability. The decent memory behavior of the device is enabled by the carriers stored in the floating gate of graphene layer, which tunnel through the dielectric layer of h-BN from the channel layer of MoTe₂ under static-electrical field. Consequently, the developed memory device is capable to store 2 bits per cell by applying varied gate bias to implement multi-distinctive current levels. The device also exhibits remarkable erase/program current ratio of ∼10⁵ with 1 µs switch speed and stable retention with estimated ∼30% charge loss after 10 yr. Furthermore, the memory device can operate in both p- and n-type modes through contact engineering, offering wide adaptability for emerging applications in electronic technologies, such as neuromorphic computing, data-adaptive energy efficient memory, and complex digital circuits.

Multi-level flash memory device based on stacked anisotropic ReS2-boron nitride-graphene heterostructures

Charge-trapping memory devices based on two-dimensional (2D) material heterostructures possess an atomically thin structure and excellent charge transport capability, making them promising candidates for next-generation flash memories to achieve miniaturized size, high storage capacity, fast switch speed, and low power consumption. Here, we report a nonvolatile floating-gate memory device based on an ReS₂/boron nitride/graphene heterostructure. The implemented ReS₂ memory device displays a large memory window exceeding 100 V, leading to an ultrahigh current ratio over 10⁸ between programming and erasing states. The ReS₂ memory device also exhibits an ultrafast switch speed of 1 μs. In addition, the device can endure hundreds of switching cycles and shows stable retention characteristics with ∼40% charge remaining after 10 years. More importantly, taking advantage of its anisotropic electrical properties, a single ReS₂ flake can achieve direction-sensitive multi-level data storage to enhance the data storage density. On the basis of these characteristics, the proposed ReS₂ memory device is potentially able to serve the entire memory device hierarchy, meeting the need for scalability, capacity, speed, retention, and endurance at each level.

Ohmic contact engineering in few-layer black phosphorus: approaching the quantum limit

Achieving good quality Ohmic contacts to van der Waals materials is a challenge, since at the interface between metal and van der Waals material different conditions can occur, ranging from the presence of a large energy barrier between the two materials to the metallization of the layered material below the contacts. In black phosphorus (bP), a further challenge is its high reactivity to oxygen and moisture, since the presence of uncontrolled oxidation can substantially change the behavior of the contacts. Here we study three of the most commonly used metals as contacts to bP, chromium, titanium, and nickel, and investigate their influence on contact resistance against the variability between different flakes and different samples. We investigate the gate dependence of the current-voltage characteristics of field-effect transistors fabricated with these metals on bP, observing good linearity in the accumulation regime for all metals investigated. Using the transfer length method, from an analysis of ten devices, both at room temperature and at low temperature, Ni results to provide the lowest contact resistance to bP and minimum scattering between different devices. Moreover, we observe that our best devices approach the quantum limit for contact resistance both for Ni and for Ti contacts.

Layer-Dependent Electronic Structure Changes in Transition Metal Dichalcogenides: The Microscopic Origin

We have examined the electronic structure evolution in transition metal dichalcogenides MX₂ where M = Mo, W and X = S, Se, and Te. These are generally referred to as van der Waals materials on the one hand, yet one has band gap changes as large as 0.6 eV with thickness in some instances. This does not seem to be consistent with a description where the dominant interactions are van der Waals interactions. Mapping onto a tight binding model allows us to quantify the electronic structure changes, which are found to be dictated solely by interlayer hopping interactions. Different environments that an atom encounters could change the Madelung potential and therefore the onsite energies. This could happen while going from the monolayer to the bilayer as well as in cases where the stackings are different from what is found in 2H structures. These effects are quantitatively found to be negligible, enabling us to quantify the thickness-dependent electronic structure changes as arising from interlayer interactions alone.

Performance Limit of Monolayer WSe2 Transistors; Significantly Outperform Their MoS2 Counterpart

With the scaling limits of silicon-based MOS technology, the critical and challenging issue is to explore more and more alternative materials to improve the performance of devices. Two-dimensional (2D) semiconductor WSe₂ with a proper band gap and inherent stability under ambient conditions makes it a potential channel material for realizing new generation field-effect transistors (FETs). In light of the low on-state current of the experimental sub-10 nm 2D MoS₂ FETs, we explore the limitation of the monolayer (ML) WSe₂ device performance by using accurate ab initio quantum transport simulation. We find that the sub-10 nm 2D WSe₂ FETs apparently outperform their MoS₂ counterpart. The on-state current of the optimized p-type ML WSe₂ FETs can satisfy the criteria of the International Technology Roadmap for Semiconductors (ITRS) on both the high-performance (HP) and low-power (LP) devices until the gate length is scaled down to 2 and 3 nm, respectively. By the aid of the negative capacitance effect, even the 1 nm gate-length WSe₂ MOSFETs can satisfy both the HP and LP requirements in the ITRS 2028 completely. Remarkably, the ML WSe₂ MOSFET has the highest theoretical on-current in LP application among the examined 2D MOSFETs at the 5 nm gate length to the best of our knowledge.

Solution-processed black phosphorus nanoflakes for integrating nonvolatile resistive random access memory and the mechanism unveiled

In this study, we demonstrated the integration of black phosphorus (BP) nanoflakes in a resistive random access memory (RRAM) with a facile and complementary metal-oxide-semiconductor-compatible process. The solution-processed BP nanoflakes embedded in polystyrene (PS) as an active layer were sandwiched between aluminum electrodes (Al/BP:PS/Al). The device shows a figure of merit with typical bipolar behavior and forming-free characteristics as well as excellent memory performances such as nonvolatile, low operation voltage (1.75 V) and high ON/OFF ratio (>10²) as well as the long retention time (>1500 s). The improved device performances were attributed to the formation of effective trap sites from the hybrid structure of the active layer (BP:PS), especially the BP nanoflakes and the partly oxidized species (P _x O _y ). Moreover, the extrinsic aluminum oxide layer was observed after the device operation. The mechanism of switching behavior was further unveiled through the carrier transport models, which confirms the conductive mechanisms of space-charge-limited current and Ohmic conductance at high resistance state (HRS) and low resistance state, respectively. Additionally, in the high electric field at HRS, the transfer curve was well fitted with the Poole-Frenkel emission model, which could be attributed to the formation of the aluminum oxide layer. Accordingly, both the trapping/de-trapping of carriers and the formation/rupture of conductive filaments were introduced as transport mechanisms in our devices. Although the partial P _x O _y species on BP were inevitable during the liquid phase exfoliation process, which was regarded as the disadvantages for various applications, it turns to a key point for improving performances in memory devices. The proposed approach to integrating BP nanoflakes in the active layer of the RRAM device could pave the way for next-generation memory devices.

Recent progress in black phosphorus and black-phosphorus-analogue materials: properties, synthesis and applications

Black phosphorus (BP), a novel two-dimensional (2D) layered semiconductor material, has attracted tremendous attention since 2014 due to its prominent carrier mobility, thickness-dependent direct bandgap and in-plane anisotropic physical properties. BP has been considered as a promising material for many applications, such as in transistors, photonics, optoelectronics, sensors, batteries and catalysis. However, the development of BP was hampered by its instability under ambient conditions, as well as by the lack of methods to synthesize large-area and high quality 2D nanofilms. Recently, some BP-analogue materials such as binary phosphides (MPx), transition metal phosphorus trichalcogenides (MPX3), and 2D group V (pnictogens) and 2D group VI materials have attracted increasing interest for their unique and stable structures, and excellent physical and chemical properties. This article, which focuses on BP and BP-analogue materials, will present their crystal structure, properties, synthesis methods and applications. Also the similarity and difference between BP and BP-analogue materials will be discussed, and the presentation of the future opportunities and challenges of the materials are included at the end.

Accurate Threshold Voltage Reliability Evaluation of Thin Al2O3 Top-Gated Dielectric Black Phosphorous FETs Using Ultrafast Measurement Pulses

Few-layer black phosphorus (BP) has attracted significant interest in recent years due to electrical and photonic properties that are far superior to those of other two-dimensional layered semiconductors. The study of long term electrical stability and reliability of black phosphorus field effect transistors (BP-FETs) with technologically relevant thin, and device-selective, gate dielectrics, stressed under realistic (closer to operation) bias and measured using state-of-the-art ultrafast reliability characterization techniques, is essential for their qualification and use in different applications. In this work, air-stable BP-FETs with a thin top-gated dielectric (15 nm Al₂O₃, SiO₂ equivalent thickness of 5 nm) were fabricated and comprehensively characterized for threshold voltage ( V_th) instability under negative gate bias stress at various measurement delays ( t_m), stress biases ( V_GSTR), temperatures ( T), and stress times ( t_str) for the first time. Thin top-gated oxide enables low V_GSTR that is closer to the operating condition and ultrafast V_th measurements with low delay ( t_m = 10 μs, due to high drain current) that ensure minimal recovery. The resultant time kinetics of V_th degradation (Δ V_th) shows fast saturation at longer stress times and low-temperature activation energy. V_th instability in these top-gated devices is suggested to be dominated by hole trapping, which is modeled using first-order equations at different V_GSTR and T. It is shown that measurements using larger t_m show lower degradation magnitude that do not saturate due to recovery artifacts and give inaccurate estimation of hole trap densities. Conventional, thick, and global back-gated oxide BP-FETs were also fabricated and characterized for varying t_m (1 ms being the lowest due to a low drain current level for thick oxide), V_GSTR, and T to benchmark our top-gated results. Nonsaturating Δ V_th in the back-gated devices is shown to result from recovery artifacts due to the large t_m (1 ms and greater) values. Finally, using a V_GSTR and T-dependent first-order model, we show that the top-gated Al₂O₃ BP-FETs with scaled gate oxide thickness can match state-of-the-art Si reliability specifications at operating voltage and room/elevated temperature.

A New Memristor with 2D Ti3 C2 Tx MXene Flakes as an Artificial Bio-Synapse

Two-dimensional (2D) materials have attracted extensive research interest in academia due to their excellent electrochemical properties and broad application prospects. Among them, 2D transition metal carbides (Ti₃ C₂ T_x ) show semiconductor characteristics and are studied widely. However, there are few academic reports on the use of 2D MXene materials as memristors. In this work, reported is a memristor based on MXene Ti₃ C₂ T_x flakes. After electroforming, Al/Ti₃ C₂ T_x /Pt devices exhibit repeatable resistive switching (RS) behavior. More interestingly, the resistance of this device can be continuously modulated under the pulse sequence with 10 ns pulse width, and the pulse width of 10 ns is much lower than that in other reported work. Moreover, on the nanosecond scale, the transition from short-term plasticity to long-term plasticity is achieved. These two properties indicate that this device is favorable for ultrafast biological synapse applications and high-efficiency training of neural networks. Through the exploration of the microstructure, Ti vacancies and partial oxidation are proposed as the origins of the physical mechanism of RS behavior. This work reveals that 2D MXene Ti₃ C₂ T_x flakes have excellent potential for use in memristor devices, which may open the door for more functions and applications.

Enhanced photocatalytic properties of TiO2 nanosheets@2D layered black phosphorus composite with high stability under hydro-oxygen environment

Black phosphorus (BP) has gained great attention as a potential candidate in the photocatalytic field due to its tunable bandgap and high-mobility features, however, poor stability behavior and the high charge recombination of BP limit its practical application. In the present work, a liquid phase exfoliation method is employed to prepare layered BP. The as-prepared layered BP is decorated on TiO2 nanosheets to form a TiO2 nanosheets@BP composite, which stabilizes BP existence under a hydro-oxygen environment. Whereafter, the photocatalytic properties of the TiO2 nanosheets@BP composite towards the degradation of Rhodamine B (RhB) are proven to be greatly enhanced compared to those of pure layered BP and TiO2 nanosheets, and the photodegradation rate reached 98% after 120 minutes irradiation under UV-Vis light. It is worth mentioning that the photocatalytic cycling performance of the TiO2 nanosheets@BP composite remained at 92.5% under the irradiation of UV-Vis light after three cycles. The main reason for this lies in the fact that the formation of the TiO2 nanosheets@BP composite may favor light absorption and effectively reduce the recombination of electron-hole pairs.

Anisotropic Electron-Phonon Interactions in Angle-Resolved Raman Study of Strained Black Phosphorus

Few-layer black phosphorus (BP) with an in-plane puckered crystalline structure has attracted intense interest for strain engineering due to both its significant anisotropy in mechanical and electrical properties and its high intrinsic strain limit. Here, we investigated the phonon response of few layer BP under uniaxial tensile strain (∼7%) with in situ polarized Raman spectroscopy. Together with the first-principles density functional theory (DFT) analysis, the anisotropic Poisson's ratio in few-layer BP was verified as one of the primary factors that caused the large discrepancy in the trend of reported Raman frequency shift for strained BP, armchair (AC) direction in particular. By carefully including and excluding the anisotropic Poisson's ratio in the DFT emulations, we rebuilt both trends reported for Raman mode shifts. Furthermore, the angle-resolved Raman spectroscopy was conducted in situ under tensile strain for systematic investigation of the in-plane anisotropy of BP phonon response. The experimentally observed thickness and crystallographic orientation dependence is elaborated using DFT theory as having a strong correlation between the strain-perturbated electronic-band structure and the phonon vibration modes. This study provides insight, both experimentally and theoretically, for the complex electron-phonon interaction behavior in strained BP, which enables diverse possibilities for the strain engineering of electrical and optical properties in BP and similar two-dimensional nanomaterials.

Hole and electron trapping in HfO2/Al2O3 nanolaminated stacks for emerging non-volatile flash memories

HfO₂/Al₂O₃ nanolaminated stacks prepared by atomic layer deposition have been investigated in terms of their charge storage characteristics for possible application in charge trapping memories. It is shown that the memory window, electron and hole trapping and leakage currents depend strongly on Al₂O₃ thickness and post-deposition oxygen annealing. Depending on the Al₂O₃ thickness, post-deposition annealing in O₂ creates different electrically active defects (oxide charge and traps) in the stacks. O₂ annealing increases electron trapping, thus giving rise to a larger memory window and enhanced charge storage characteristics, i.e. 65% of charge is retained after ten years and the memory window decreases by 6% after 2.5 × 10⁴ program/erase cycles.

Strong optical force and its confinement applications based on heterogeneous phosphorene pairs

We study the plasmonic properties of face-to-face phosphorene pairs, including their optical constraints and optical gradient forces. The symmetric and anti-symmetric plasmonic modes occur due to the strong anisotropic dispersion of phosphorene. Compared with the anti-symmetric mode, the symmetric mode has a stronger optical constraint and much larger gradient force. Especially, the optical constraint of the symmetric mode can even reach as high as 96% when the two phosphorene layers are along the armchair and zigzag direction respectively. We also propose a scheme of an ultra-small phase shifter using phosphorene-based photonic devices.

Functionalization of small black phosphorus nanoparticles for targeted imaging and photothermal therapy of cancer

Black phosphorus (BP) nanomaterials have attracted extensive attention due to their unique physical, chemical, and biological properties. In this study, small BP nanoparticles were synthesized and modified with dextran and poly(ethyleneimine) for functionalization with folic acid and cyanine 7. The functionalized BP nanoparticles exhibit excellent biocompatibility, stability, and near infrared optical properties for targeted imaging of tumors through photoacoustic imaging and near-infrared fluorescence imaging. They also display high photothermal conversion efficiency for photothermal therapy of cancer. This work demonstrates the potential of functionalized small BP nanoparticles as an emerging nanotheranostic agent for the diagnosis and treatment of cancer.

Enhanced Performance of Field-Effect Transistors Based on Black Phosphorus Channels Reduced by Galvanic Corrosion of Al Overlayers

Two-dimensional (2D)-layered semiconducting materials with considerable band gaps are emerging as a new class of materials applicable to next-generation devices. Particularly, black phosphorus (BP) is considered to be very promising for next-generation 2D electrical and optical devices because of its high carrier mobility of 200-1000 cm² V^-1 s^-1 and large on/off ratio of 10⁴ to 10⁵ in field-effect transistors (FETs). However, its environmental instability in air requires fabrication processes in a glovebox filled with nitrogen or argon gas followed by encapsulation, passivation, and chemical functionalization of BP. Here, we report a new method for reduction of BP-channel devices fabricated without the use of a glovebox by galvanic corrosion of an Al overlayer. The reduction of BP induced by an anodic oxidation of Al overlayer is demonstrated through surface characterization of BP using atomic force microscopy, Raman spectroscopy, and X-ray photoemission spectroscopy along with electrical measurement of a BP-channel FET. After the deposition of an Al overlayer, the FET device shows a significantly enhanced performance, including restoration of ambipolar transport, high carrier mobility of 220 cm² V^-1 s^-1, low subthreshold swing of 0.73 V/decade, and low interface trap density of 7.8 × 10¹¹ cm^-2 eV^-1. These improvements are attributed to both the reduction of the BP channel and the formation of an Al₂O₃ interfacial layer resulting in a high- k screening effect. Moreover, ambipolar behavior of our BP-channel FET device combined with charge-trap behavior can be utilized for implementing reconfigurable memory and neuromorphic computing applications. Our study offers a simple device fabrication process for BP-channel FETs with high performance using galvanic oxidation of Al overlayers.

Plasmonics with two-dimensional semiconductors: from basic research to technological applications

Herein, we explore the main features and the prospect of plasmonics with two-dimensional semiconductors. Plasmonic modes in each class of van der Waals semiconductors have their own peculiarities, along with potential technological capabilities. Plasmons of transition-metal dichalcogenides share features typical of graphene, due to their honeycomb structure, but with damping processes dominated by intraband rather than interband transitions, unlike graphene. Spin-orbit coupling strongly affects the plasmonic spectrum of buckled honeycomb lattices (silicene and germanene), while the anisotropic lattice of phosphorene determines different propagation of plasmons along the armchair and zigzag directions. Black phosphorus is also a suitable material for ultrafast plasmonics, for which the active plasmonic response can be initiated by photoexcitation with femtosecond pulses. We also review existing applications of plasmonics with two-dimensional materials in the fields of thermoplasmonics, biosensing, and plasma-wave Terahertz detection. Finally, we consider the capabilities of van der Waals heterostructures for innovative low-loss plasmonic devices.

Synthesis of Black Phosphorus Quantum Dots with High Quantum Yield by Pulsed Laser Ablation for Cell Bioimaging

Black phosphorus quantum dots (BPQDs), with an average diameter of about 6 nm and a height of about 1.1 nm, are successfully synthesized by means of a pulsed laser ablation (PLA) method in isopropyl ether (IPE) solvent. The photoluminescence PL quantum yield of the as-prepared sample is as high as 20.7 %, which is 3 times that of BPQDs prepared by means of probe ultrasonic exfoliation (approximately 7.2 %). The stable and blue-violet PL emission of the BPQDs is observed. It can be elucidated that electrons transit from the LUMO energy level to the HOMO energy level, as well as energy levels below the HOMO (H1 and H2). In addition, BPQDs are also utilized in bioimaging in HeLa cells, showing an intense and stable PL signal and excellent biocompatibility. Hence, this work indicates that the obtained BPQDs with high quantum yield and stable PL emission have great potential for biomedical applications, including biolabeling, bioimaging, and drug delivery.

Charge-Trap Memory Based on Hybrid 0D Quantum Dot-2D WSe2 Structure

Recently, layered ultrathin 2D semiconductors, such as MoS₂ and WSe₂ are widely studied in nonvolatile memories because of their excellent electronic properties. Additionally, discrete 0D metallic nanocrystals and quantum dots (QDs) are considered to be outstanding charge-trap materials. Here, a charge-trap memory device based on a hybrid 0D CdSe QD-2D WSe₂ structure is demonstrated. Specifically, ultrathin WSe₂ is employed as the channel of the memory, and the QDs serve as the charge-trap layer. This device shows a large memory window exceeding 18 V, a high erase/program current ratio (reaching up to 10⁴ ), four-level data storage ability, stable retention property, and high endurance of more than 400 cycles. Moreover, comparative experiments are carried out to prove that the charges are trapped by the QDs embedded in the Al₂ O₃ . The combination of 2D semiconductors with 0D QDs opens up a novelty field of charge-trap memory devices.

Floating-gate controlled programmable non-volatile black phosphorus PNP junction memory

To meet the increasing requirements of minimizing circuits, the development of novel device architectures that use ultra-thin two-dimensional materials is encouraged. Here, we demonstrate a non-volatile black phosphorus (BP) PNP junction in a BP/h-BN/graphene heterostructure in which BP acts as a transport channel layer, hexagonal boron nitride (h-BN) serves as a tunnel barrier layer and graphene is the charge-trapping layer. The device architecture is designed such that only the middle part of the BP is aligned over the graphene flake, enabling the flexible tuning of the charge carriers in the BP over the graphene charge-trapping layer. Thus, the device exhibits the ability to work in two different operating modes (PNP and PP⁺P). Each operating mode can be retained well and demonstrates non-volatile behavior, and each can be programmed by using the control-gate.

Size and strain tunable band alignment of black-blue phosphorene lateral heterostructures

Single-element lateral heterostructures composed of black and blue phosphorene are not only free from lattice mismatch but also exhibit rich physical properties related to the seamlessly stitched interfaces, providing the building blocks for designing atomically thin devices. Using first-principles calculations, we investigate the influence of interface structure, size effect and strain engineering on the electronic structure, effective masses and band alignment of black-blue phosphorene lateral heterostructures. The lateral heterostructure with an octatomic-ring interface presents a strong metallic feature due to the interface states, while a metal-semiconductor transition takes place in the system with a hexatomic-ring interface upon hydrogen passivation. Following a reciprocal scaling law, the band gap is tuned in a wide energy range by synchronously increasing the widths of black and blue phosphorene or by only widening that of black phosphorene. Moreover, type-II band alignment is observed in the width ranges of 2.0-3.1 nm and 3.7-4.2 nm, out of which it is type-I. However, the band gap and effective masses show small changes if only the width of blue phosphorene is altered. When the lateral heterostructure is tensile loaded, the effective mass ratio of hole to electron is enlarged by an order of magnitude at a strain of 4% along the zigzag direction. Meanwhile, the band alignment undergoes a crossover from type-I to type-II at a strain of 2%, facilitating efficient electron-hole separation for light detection and harvesting.

Enhancement of Exciton Emission from Multilayer MoS2 at High Temperatures: Intervalley Transfer versus Interlayer Decoupling

It is very important to obtain a deeper understand of the carrier dynamics for indirect-bandgap multilayer MoS₂ and to make further improvements to the luminescence efficiency. Herein, an anomalous luminescence behavior of multilayer MoS₂ is reported, and its exciton emission is significantly enhanced at high temperatures. Temperature-dependent Raman studies and electronic structure calculations reveal that this experimental observation cannot be fully explained by a common mechanism of thermal-expansion-induced interlayer decoupling. Instead, a new model involving the intervalley transfer of thermally activated carriers from Λ/Γ point to K point is proposed to understand the high-temperature luminescence enhancement of multilayer MoS₂ . Steady-state and transient-state fluorescence measurements show that both the lifetime and intensity of the exciton emission increase relatively to increasing temperature. These two experimental evidences, as well as a calculation of carrier population, provide strong support for the proposed model.

Size modulation electronic and optical properties of phosphorene nanoribbons: DFT–BOLS approximation

DFT and BOLS approximations were carried out to study the electronic and optical properties of different sizes of black phosphorus nanoribbons (PNRs) with either zigzag- or armchair-terminated edges.