1
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Tung CH, Ye F, Li WY, Nguyen TA, Lee MC, Wen T, Guo ZH, Cheng SZD, Ho RM. Directed Self-Assembly of Polystyrene-Block-Polyhedral Oligomeric Silsesquioxane Monolayer by Nano-Trench for Nanopatterning. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024:e2403581. [PMID: 39030883 DOI: 10.1002/smll.202403581] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/03/2024] [Revised: 06/25/2024] [Indexed: 07/22/2024]
Abstract
This work pioneers to combine fast self-assembly of polyhedral oligomeric silsesquioxanes (POSS) nanocage-based giant surfactants with high etching contrast and directed self-assembly for reliable long-range lateral order to create well-aligned sub-10 nm line nanopatterns via reactive ion etching (RIE). Polystyrene-block-oligo(dimethylsiloxane) substituted POSS (PS-b-oDMS7POSS) with seven oligo(dimethylsiloxane) at the corners of the POSS nanocage and one polystyrene (PS) tail is designed and synthesized as a giant surfactant with self-assembly behaviors like block copolymer (BCP). In contrast to BCP, oDMS7POSS gives a volume-persistent "nanoatom" particle with higher mobility for fast self-assembly and higher segregation strength with PS for smaller feature size. By taking advantage of directed self-assembly using nano-trench fabricated by electron beam lithography, well-ordered nanostructured monolayer with well-aligned parallel oDMS7POSS cylinders can be formed by confined self-assembly within the nano-trench. With the optimization of the RIE treatment using O2 as an etchant, the high etching contrast from the oDMS7POSS and PS gives the formation of well-defined line nanopatterns with sub-10 nm critical dimension that can serve as a mask for pattern transfer in lithography. These results demonstrate a cost-effective approach for nanopatterning by utilizing a creatively designed giant surfactant with sub-10 nm feature size and excellent etching contrast for modern lithographic applications.
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Affiliation(s)
- Cheng-Hsun Tung
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
| | - Feng Ye
- South China Advanced Institute for Soft Matter Science and Technology, School of Molecular Science and Engineering, South China University of Technology, Guangzhou, 510640, China
- Guangdong Provincial Key Laboratory of Functional and Intelligent Hybrid Materials and Devices, South China University of Technology, Guangzhou, 510640, China
| | - Wei-Yi Li
- South China Advanced Institute for Soft Matter Science and Technology, School of Molecular Science and Engineering, South China University of Technology, Guangzhou, 510640, China
- Guangdong Provincial Key Laboratory of Functional and Intelligent Hybrid Materials and Devices, South China University of Technology, Guangzhou, 510640, China
| | - The Anh Nguyen
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
- International School, Vietnam National University, Hanoi, 144 Xuan Thuy Str., Cau Giay Dist., Hanoi, Vietnam
| | - Ming-Chang Lee
- Department of Electrical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
| | - Tao Wen
- South China Advanced Institute for Soft Matter Science and Technology, School of Molecular Science and Engineering, South China University of Technology, Guangzhou, 510640, China
- Guangdong Provincial Key Laboratory of Functional and Intelligent Hybrid Materials and Devices, South China University of Technology, Guangzhou, 510640, China
| | - Zi-Hao Guo
- South China Advanced Institute for Soft Matter Science and Technology, School of Molecular Science and Engineering, South China University of Technology, Guangzhou, 510640, China
- Guangdong Provincial Key Laboratory of Functional and Intelligent Hybrid Materials and Devices, South China University of Technology, Guangzhou, 510640, China
| | - Stephen Z D Cheng
- South China Advanced Institute for Soft Matter Science and Technology, School of Molecular Science and Engineering, South China University of Technology, Guangzhou, 510640, China
- Guangdong Provincial Key Laboratory of Functional and Intelligent Hybrid Materials and Devices, South China University of Technology, Guangzhou, 510640, China
- Department of Polymer Science, School of Polymer Science and Polymer Engineering, University of Akron, Akron, OH, 44325-3909, USA
| | - Rong-Ming Ho
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan
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2
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Maekawa S, Seshimo T, Dazai T, Sato K, Hatakeyama-Sato K, Nabae Y, Hayakawa T. Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly. Nat Commun 2024; 15:5671. [PMID: 38971785 PMCID: PMC11227500 DOI: 10.1038/s41467-024-49839-0] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/31/2023] [Accepted: 06/19/2024] [Indexed: 07/08/2024] Open
Abstract
While block copolymer (BCP) lithography is theoretically capable of printing features smaller than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we report the creation of a chemically tailored, highly reliable, and practically applicable block copolymer and sub-10-nm line patterns by directed self-assembly. Polystyrene-block-[poly(glycidyl methacrylate)-random-poly(methyl methacrylate)] (PS-b-(PGMA-r-PMMA) or PS-b-PGM), which is based on PS-b-PMMA with an appropriate amount of introduced PGMA (10-33 mol%) is quantitatively post-functionalized with thiols. The use of 2,2,2-trifluoroethanethiol leads to polymers (PS-b-PGFMs) with Flory-Huggins interaction parameters (χ) that are 3.5-4.6-times higher than that of PS-b-PMMA and well-defined higher-order structures with domain spacings of less than 20 nm. This study leads to the smallest perpendicular lamellar domain size of 12.3 nm. Furthermore, thin-film lamellar domain alignment and vertical orientation are highly reliably and reproducibly obtained by directed self-assembly to yield line patterns that correspond to a 7.6 nm half-pitch size.
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Affiliation(s)
- Shinsuke Maekawa
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan
| | - Takehiro Seshimo
- Research & Development Department, Tokyo Ohka Kogyo Co., Ltd., Kanagawa, 253-0114, Japan
| | - Takahiro Dazai
- Research & Development Department, Tokyo Ohka Kogyo Co., Ltd., Kanagawa, 253-0114, Japan
| | - Kazufumi Sato
- Research & Development Department, Tokyo Ohka Kogyo Co., Ltd., Kanagawa, 253-0114, Japan
| | - Kan Hatakeyama-Sato
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan
| | - Yuta Nabae
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan
| | - Teruaki Hayakawa
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan.
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3
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Kang SB, Huang G, Singhal G, Xie D, Hsieh DH, Lee Y, Kulkarni AA, Smith JW, Chen Q, Thornton K, Sinha S, Braun PV. Highly Ordered Eutectic Mesostructures via Template-Directed Solidification within Thermally Engineered Templates. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2308720. [PMID: 38189549 DOI: 10.1002/adma.202308720] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/27/2023] [Revised: 01/03/2024] [Indexed: 01/09/2024]
Abstract
Template-directed self-assembly of solidifying eutectics results in emergence of unique microstructures due to diffusion constraints and thermal gradients imposed by the template. Here, the importance of selecting the template material based on its conductivity to control heat transfer between the template and the solidifying eutectic, and thus the thermal gradients near the solidification front, is demonstrated. Simulations elucidate the relationship between the thermal properties of the eutectic and template and the resultant microstructure. The overarching finding is that templates with low thermal conductivities are generally advantageous for forming highly organized microstructures. When electrochemically porosified silicon pillars (thermal conductivity < 0.3 Wm-1K-1) are used as the template into which an AgCl-KCl eutectic is solidified, 99% of the unit cells in the solidified structure exhibit the same pattern. In contrast, when higher thermal conductivity crystalline silicon pillars (≈100 Wm-1K-1) are utilized, the expected pattern is only present in 50% of the unit cells. The thermally engineered template results in mesostructures with tunable optical properties and reflectances nearly identical to the simulated reflectances of perfect structures, indicating highly ordered patterns are formed over large areas. This work highlights the importance of controlling heat flows in template-directed self-assembly of eutectics.
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Affiliation(s)
- Sung Bum Kang
- Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
- Materials Research Laboratory, University of Illinois, Urbana, IL, 61801, USA
| | - Guanglong Huang
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, 48109, USA
| | - Gaurav Singhal
- Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
- Materials Research Laboratory, University of Illinois, Urbana, IL, 61801, USA
| | - Dajie Xie
- Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
- Materials Research Laboratory, University of Illinois, Urbana, IL, 61801, USA
| | - Daniel H Hsieh
- Department of Mechanical Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
| | - Youngmun Lee
- Department of Mechanical Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
| | - Ashish A Kulkarni
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, 11973, USA
| | - John W Smith
- Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
- Materials Research Laboratory, University of Illinois, Urbana, IL, 61801, USA
| | - Qian Chen
- Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
- Materials Research Laboratory, University of Illinois, Urbana, IL, 61801, USA
- Department of Chemical and Biomolecular Engineering, University of Illinois, Urbana, IL, 61801, USA
- Department of Chemistry, University of Illinois, Urbana, IL, 61801, USA
- Beckman Institute for Advanced Science and Technology, University of Illinois, Urbana, IL, 61801, USA
| | - Katsuyo Thornton
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, 48109, USA
| | - Sanjiv Sinha
- Department of Mechanical Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
| | - Paul V Braun
- Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
- Materials Research Laboratory, University of Illinois, Urbana, IL, 61801, USA
- Department of Mechanical Science and Engineering, University of Illinois, Urbana, IL, 61801, USA
- Department of Chemical and Biomolecular Engineering, University of Illinois, Urbana, IL, 61801, USA
- Department of Chemistry, University of Illinois, Urbana, IL, 61801, USA
- Beckman Institute for Advanced Science and Technology, University of Illinois, Urbana, IL, 61801, USA
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4
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Inaba Y, Yanagisawa T. Droplet dynamics affecting the shape of patterns formed spontaneously by transforming UV-curable emulsions. Sci Rep 2024; 14:7102. [PMID: 38531979 DOI: 10.1038/s41598-024-57851-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/10/2023] [Accepted: 03/22/2024] [Indexed: 03/28/2024] Open
Abstract
Forming large pitch and depth patterns spontaneously based on a bottom-up approach is a challenging task but with great industrial value. It is possible to spontaneously form an uneven (concave-convex) patterns with submillimeter-to-millimeter-scale pitches and depths by the direct pattern exposure of a UV-curable oil-in-water (O/W) emulsion liquid film. UV irradiation generates a latent pattern of a cured particle aggregation in the liquid film, and an uneven structure is spontaneously formed during the subsequent drying process. This process does not require any printing and embossing plates or development process. In this report, we presented an example of unevenness formation with a maximum pattern depth of approximately 0.4 mm and a maximum pitch width of 5 mm. The patterns formed by this method have raised edges in the exposed areas and fogging in unexposed areas. The pattern shapes become conspicuous under overexposure conditions, but the formation mechanism has not yet been understood in detail and needs to be investigated. In this study, we focused on the exposure process and clarified the mechanism of pattern formation by analyzing the dynamics of emulsion droplets in the medium by an in situ microscopy observation method. As a result, we found that the fogging was mainly caused by light leakage from the exposed area, and the raised pattern edges were caused by droplets transported from the unexposed area to the exposed area. Furthermore, the convection caused by the heat generated from polymerization is a determining factor affecting all these phenomena. By controlling the pattern shape related to convection utilizing direct projection exposure, we showed an example of eliminating raised pattern edges with a height difference of approximately 0.1 mm. By devising and selecting exposure methods, we can expand the range of design applications such as interior decorative patterns.
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Affiliation(s)
- Yoshimi Inaba
- Toppan Technical Research Institute, TOPPAN Holdings Inc., Sugito, Saitama, 345-8508, Japan.
| | - Takayuki Yanagisawa
- Toppan Technical Research Institute, TOPPAN Holdings Inc., Sugito, Saitama, 345-8508, Japan
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5
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Hu XH, Zhang R, Zhang X, Wu Z, Zhou J, Li W, Xiong S. Focused solar annealing for block copolymer fast self-assembly. Heliyon 2024; 10:e24016. [PMID: 38293481 PMCID: PMC10825308 DOI: 10.1016/j.heliyon.2024.e24016] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/08/2023] [Revised: 12/23/2023] [Accepted: 01/02/2024] [Indexed: 02/01/2024] Open
Abstract
Block copolymer (BCP) self-assembly has tremendous potential applications in next-generation nanolithography. It offers significant advantages, including high resolution and cost-effectiveness, effectively overcoming the limitations associated with conventional optical lithography. In this work, we demonstrate a focused solar annealing (FSA) technique that is facile, eco-friendly, and energy-efficient for fast self-assembly of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films. The FSA principle involves utilizing a common biconvex lens to converge incident solar radiation into a high-temperature spot, which is directly used to drive the microphase separation of PS-b-PMMA thin films. As a result, PS-b-PMMA undergoes self-assembly, forming ordered nanostructures in a vertical orientation at seconds timescales on silicon substrates with a neutral layer. In addition, the FSA technique can be employed for grafting neutral polymer brushes onto the silicon substrate. Furthermore, the FSA's compatibility with graphoepitaxy-directed self-assembly (DSA) of BCP is also demonstrated in the patterning of contact holes. The results of contact hole shrinking show that contact hole prepatterns of ∼60.4 nm could be uniformly shrunk to ∼20.5 nm DSA hole patterns with a hole open yield (HOY) of 100 %. For contact hole multiplication, doublet DSA holes were successfully generated on elliptical templates, revealing an average DSA hole size of ∼21.3 nm. Most importantly, due to the direct use of solar energy, the FSA technique provides many significant advantages such as simplicity, environmental friendliness, solvent-free, low cost, and net-zero carbon emissions, and will open up a new direction for BCP lithography that is sustainable, pollution-free, and carbon-neutral.
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Affiliation(s)
- Xiao-Hua Hu
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Rui Zhang
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Xiaohui Zhang
- Department of Macromolecular Science, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Zhiyong Wu
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Jing Zhou
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Weihua Li
- Department of Macromolecular Science, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Shisheng Xiong
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
- Zhangjiang Laboratory, 100 Haike Road, Shanghai, 201204, China
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6
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Ahn J, Jang H, Jeong Y, Choi S, Ko J, Hwang SH, Jeong J, Jung YS, Park I. Illuminating Recent Progress in Nanotransfer Printing: Core Principles, Emerging Applications, and Future Perspectives. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024; 11:e2303704. [PMID: 38032705 PMCID: PMC10767444 DOI: 10.1002/advs.202303704] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/07/2023] [Revised: 08/20/2023] [Indexed: 12/01/2023]
Abstract
As the demand for diverse nanostructures in physical/chemical devices continues to rise, the development of nanotransfer printing (nTP) technology is receiving significant attention due to its exceptional throughput and ease of use. Over the past decade, researchers have attempted to enhance the diversity of materials and substrates used in transfer processes as well as to improve the resolution, reliability, and scalability of nTP. Recent research on nTP has made continuous progress, particularly using the control of the interfacial adhesion force between the donor mold, target material, and receiver substrate, and numerous practical nTP methods with niche applications have been demonstrated. This review article offers a comprehensive analysis of the chronological advancements in nTP technology and categorizes recent strategies targeted for high-yield and versatile printing based on controlling the relative adhesion force depending on interfacial layers. In detail, the advantages and challenges of various nTP approaches are discussed based on their working mechanisms, and several promising solutions to improve morphological/material diversity are presented. Furthermore, this review provides a summary of potential applications of nanostructured devices, along with perspectives on the outlook and remaining challenges, which are expected to facilitate the continued progress of nTP technology and to inspire future innovations.
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Affiliation(s)
- Junseong Ahn
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Hanhwi Jang
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Yongrok Jeong
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
- Radioisotope Research DivisionKorea Atomic Energy Research Institute (KAERI)Daejeon34057Republic of Korea
| | - Seongsu Choi
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Jiwoo Ko
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Soon Hyoung Hwang
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Jun‐Ho Jeong
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Yeon Sik Jung
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Inkyu Park
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
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7
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Cho J, Oh J, Bang J, Koh JH, Jeong HY, Chung S, Son JG. Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns. Nat Commun 2023; 14:8412. [PMID: 38110407 PMCID: PMC10728125 DOI: 10.1038/s41467-023-43766-2] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/19/2023] [Accepted: 11/18/2023] [Indexed: 12/20/2023] Open
Abstract
The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub-10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 °C) and rapid (~0.1 s) shear-rolling process that can achieve a high degree of orientation in a single process while effectively preventing film delamination, that can be applied to large-area continuous processes. By minimizing adhesion, normal forces, and ultimate shear strain of the polydimethylsiloxane pad, shearing was successfully performed without peeling up to 280 °C at which the chain mobility significantly increases. This method can be utilized for various high-χ block copolymers and surface neutralization processes. It enables the creation of block copolymer patterns with a half-pitch as small as 8 nm in a unidirectional way. Moreover, the 0.1-second rapid shear-rolling was successfully performed on long, 3-inch width polyimide flexible films to validate its potential for the roll-to-roll process.
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Affiliation(s)
- Junghyun Cho
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Jinwoo Oh
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Joona Bang
- Department of Chemical and Biological Engineering, Korea University, Seongbuk-gu, Seoul, 02841, Republic of Korea
| | - Jai Hyun Koh
- Clean Energy Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Hoon Yeub Jeong
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Seungjun Chung
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seongbuk-gu, Seoul, 02841, Republic of Korea
| | - Jeong Gon Son
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea.
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seongbuk-gu, Seoul, 02841, Republic of Korea.
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8
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Sun YS, Jian YQ, Yang ST, Chen CY, Lin JM. Morphologies of Surface Perforations and Parallel Cylinders Coexisting in Terraced Films of Block Copolymer/Homopolymer Blends with Oxygen Plasma Etching. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2023; 39:16284-16293. [PMID: 37934122 DOI: 10.1021/acs.langmuir.3c01784] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/08/2023]
Abstract
This study has demonstrated how oxygen plasma etching carves surface structures for thin films of polystyrene-block-poly(methyl methacrylate)/homopolystyrene blends. By tuning the weight-fraction ratio, blend films form perforations and cylinders on the SiOx/Si substrate. Since perforations exist only on the free surface and substrate interface, short exposure to oxygen plasma to quickly etch the PMMA component produces distorted hexagonal arrays of nanodots on the free surface. The interior of the blend films forms polygrain micro-structures composed of parallel cylinders with an in-plane random orientation. Oxygen plasma etching imposed on the fractured surfaces results in five morphologies: (i) distorted hexagonal arrays of nanoholes, (ii) layer-by-layer stacks, (iii) zigzag-like arrays, (iv) intertwined rectangular arrays of nanodots and nanoholes, and (v) intertwined parallelogram arrays of nanodots and nanoholes. The morphologies suggest synergic effects of grain orientations, stresses, spatial confinement, local segregation of chains, and etching kinetics on the terraced films with oxygen plasma etching.
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Affiliation(s)
- Ya-Sen Sun
- Department of Chemical Engineering, National Cheng Kung University, Tainan 701, Taiwan
| | - Yi-Qing Jian
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Shin-Tung Yang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Chun-Yu Chen
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Jhih-Min Lin
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
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9
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Tong H, Tanaka H. Emerging exotic compositional order on approaching low-temperature equilibrium glasses. Nat Commun 2023; 14:4614. [PMID: 37550288 PMCID: PMC10406820 DOI: 10.1038/s41467-023-40290-1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/16/2022] [Accepted: 07/21/2023] [Indexed: 08/09/2023] Open
Abstract
The ultimate fate of a glass former upon cooling has been a fundamental problem in condensed matter physics and materials science since Kauzmann. Recently, this problem has been challenged by a model with an extraordinary glass-forming ability effectively free from crystallisation and phase separation, two well-known fates of most glass formers, combined with a particle-size swap method. Thus, this system is expected to approach the ideal glass state if it exists. However, we discover exotic compositional order as the coexistence of space-spanning network-like structures formed by small-large particle connections and patches formed by medium-size particles at low temperatures. Therefore, the glass transition is accompanied unexpectedly by exotic compositional ordering inaccessible through ordinary structural or thermodynamic characterisations. Such exotic compositional ordering is found to have an unusual impact on structural relaxation dynamics. Our study thus raises fundamental questions concerning the role of unconventional structural ordering in understanding glass transition.
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Affiliation(s)
- Hua Tong
- Department of Physics, University of Science and Technology of China, Hefei, 230026, China.
- Department of Fundamental Engineering, Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8505, Japan.
| | - Hajime Tanaka
- Department of Fundamental Engineering, Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8505, Japan.
- Research Center for Advanced Science and Technology, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8904, Japan.
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10
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Chong J, Sung C, Nam KS, Kang T, Kim H, Lee H, Park H, Park S, Kang J. Highly conductive tissue-like hydrogel interface through template-directed assembly. Nat Commun 2023; 14:2206. [PMID: 37072411 PMCID: PMC10113367 DOI: 10.1038/s41467-023-37948-1] [Citation(s) in RCA: 22] [Impact Index Per Article: 22.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/28/2022] [Accepted: 04/06/2023] [Indexed: 04/20/2023] Open
Abstract
Over the past decade, conductive hydrogels have received great attention as tissue-interfacing electrodes due to their soft and tissue-like mechanical properties. However, a trade-off between robust tissue-like mechanical properties and good electrical properties has prevented the fabrication of a tough, highly conductive hydrogel and limited its use in bioelectronics. Here, we report a synthetic method for the realization of highly conductive and mechanically tough hydrogels with tissue-like modulus. We employed a template-directed assembly method, enabling the arrangement of a disorder-free, highly-conductive nanofibrous conductive network inside a highly stretchable, hydrated network. The resultant hydrogel exhibits ideal electrical and mechanical properties as a tissue-interfacing material. Furthermore, it can provide tough adhesion (800 J/m2) with diverse dynamic wet tissue after chemical activation. This hydrogel enables suture-free and adhesive-free, high-performance hydrogel bioelectronics. We successfully demonstrated ultra-low voltage neuromodulation and high-quality epicardial electrocardiogram (ECG) signal recording based on in vivo animal models. This template-directed assembly method provides a platform for hydrogel interfaces for various bioelectronic applications.
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Affiliation(s)
- Jooyeun Chong
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Changhoon Sung
- Department of Bio and Brain Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Kum Seok Nam
- Department of Bio and Brain Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Taewon Kang
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Hyunjun Kim
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Haeseung Lee
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Hyunchang Park
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Seongjun Park
- Department of Bio and Brain Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea.
- KAIST Institute for NanoCentury, Daejeon, 34141, Republic of Korea.
| | - Jiheong Kang
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea.
- KAIST Institute for NanoCentury, Daejeon, 34141, Republic of Korea.
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11
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Hung CJ, Panda AS, Lee YC, Liu SY, Lin JW, Wang HF, Avgeropoulos A, Tseng FG, Chen FR, Ho RM. Direct Visualization of the Self-Alignment Process for Nanostructured Block Copolymer Thin Films by Transmission Electron Microscopy. ACS Macro Lett 2023; 12:570-576. [PMID: 37053545 DOI: 10.1021/acsmacrolett.3c00098] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 04/15/2023]
Abstract
Herein, this work aims to directly visualize the morphological evolution of the controlled self-assembly of star-block polystyrene-block-polydimethylsiloxane (PS-b-PDMS) thin films via in situ transmission electron microscopy (TEM) observations. With an environmental chip, possessing a built-in metal wire-based microheater fabricated by the microelectromechanical system (MEMS) technique, in situ TEM observations can be conducted under low-dose conditions to investigate the development of film-spanning perpendicular cylinders in the block copolymer (BCP) thin films via a self-alignment process. Owing to the free-standing condition, a symmetric condition of the BCP thin films can be formed for thermal annealing under vacuum with neutral air surface, whereas an asymmetric condition can be formed by an air plasma treatment on one side of the thin film that creates an end-capped neutral layer. A systematic comparison of the time-resolved self-alignment process in the symmetric and asymmetric conditions can be carried out, giving comprehensive insights for the self-alignment process via the nucleation and growth mechanism.
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Affiliation(s)
- Chen-Jung Hung
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Engineering and System Science, National Tsing Hua University, Hsinchu, 30013, Taiwan
| | - Aum Sagar Panda
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yi-Chien Lee
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Shih-Yi Liu
- Department of Engineering and System Science, National Tsing Hua University, Hsinchu, 30013, Taiwan
- Department of Electron Microscopy Development and Application, Material and Chemical Research Laboratories, Industrial Technology Research Institute (ITRI), Hsinchu, 30013, Taiwan
| | - Jheng-Wei Lin
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Hsiao-Fang Wang
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Apostolos Avgeropoulos
- Department of Materials Science Engineering, University of Ioannina, University Campus, Ioannina 45110, Greece
| | - Fan-Gang Tseng
- Department of Engineering and System Science, National Tsing Hua University, Hsinchu, 30013, Taiwan
| | - Fu-Rong Chen
- Department of Engineering and System Science, National Tsing Hua University, Hsinchu, 30013, Taiwan
- Department of Materials Science and Engineering, City University of Hong Kong, Tat Chee Avenue, 518057, Hong Kong
| | - Rong-Ming Ho
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
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12
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Gröger R, Heiler T, Schimmel T, Walheim S. Tip-Induced Nanopatterning of Ultrathin Polymer Brushes. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023:e2204962. [PMID: 37026430 DOI: 10.1002/smll.202204962] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/12/2022] [Revised: 02/02/2023] [Indexed: 06/19/2023]
Abstract
Patterned, ultra-thin surface layers can serve as templates for positioning nanoparticlesor targeted self-assembly of molecular structures, for example, block-copolymers. This work investigates the high-resolution, atomic force microscopebased patterning of 2 nm thick vinyl-terminated polystyrene brush layers and evaluates the line broadening due to tip degradation. This work compares the patterning properties with those of a silane-based fluorinated self-assembled monolayer (SAM), using molecular heteropatterns generated by modified polymer blend lithography (brush/SAM-PBL). Stable line widths of 20 nm (FWHM) over lengths of over 20000 µm indicate greatly reduced tip wear, compared to expectations on uncoated SiOx surfaces. The polymer brush acts as a molecularly thin lubricating layer, thus enabling a 5000 fold increase in tip lifetime, and the brush is bonded weakly enough that it can be removed with surgical accuracy. On traditionally used SAMs, either the tip wear is very high or the molecules are not completely removed. Polymer Phase Amplified Brush Editing is presented, which uses directed self-assembly to amplify the aspect ratio of the molecular structures by a factor of 4. The structures thus amplified allow transfer into silicon/metal heterostructures, fabricating 30 nm deep, all-silicon diffraction gratings that could withstand focused high-power 405 nm laser irradiation.
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Affiliation(s)
- Roland Gröger
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology, Wolfgang-Gaede-Str. 1, D-76131, Karlsruhe, Germany
- Center for Single-Atom Technologies (C.SAT), Karlsruhe Institute of Technology, Strasse am Forum 7, D-76131, Karlsruhe, Germany
| | - Tobias Heiler
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology, Wolfgang-Gaede-Str. 1, D-76131, Karlsruhe, Germany
| | - Thomas Schimmel
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology, Wolfgang-Gaede-Str. 1, D-76131, Karlsruhe, Germany
- Center for Single-Atom Technologies (C.SAT), Karlsruhe Institute of Technology, Strasse am Forum 7, D-76131, Karlsruhe, Germany
- Institute of Nanotechnology (INT) and Karlsruhe Nano Micro Facility (KNMFi), Karlsruhe Institute of Technology, Herrmann-von-Helmholtz-Platz 1, D-76344, Eggenstein-Leopoldshafen, Germany
- Materials Research Center for Energy Systems (MZE), Karlsruhe Institute of Technology, Strasse am Forum 7, D-76131, Karlsruhe, Germany
| | - Stefan Walheim
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology, Wolfgang-Gaede-Str. 1, D-76131, Karlsruhe, Germany
- Center for Single-Atom Technologies (C.SAT), Karlsruhe Institute of Technology, Strasse am Forum 7, D-76131, Karlsruhe, Germany
- Institute of Nanotechnology (INT) and Karlsruhe Nano Micro Facility (KNMFi), Karlsruhe Institute of Technology, Herrmann-von-Helmholtz-Platz 1, D-76344, Eggenstein-Leopoldshafen, Germany
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13
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Feng H, Chae CG, Eom C, Craig GSW, Rowan SJ, Nealey PF. Synthesis and Characterization of Amine-Epoxy-Functionalized Polystyrene- block-Poly(glycidyl methacrylate) to Manage Morphology and Covarying Properties for Self-Assembly. Macromolecules 2023. [DOI: 10.1021/acs.macromol.2c02552] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/30/2023]
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14
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Hao H, Chen S, Ren J, Chen X, Nealey P. Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives. NANOTECHNOLOGY 2023; 34:205303. [PMID: 36709513 DOI: 10.1088/1361-6528/acb6df] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/07/2022] [Accepted: 01/29/2023] [Indexed: 06/18/2023]
Abstract
Polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) is one of the most widely studied block copolymers for direct self-assembly because of its excellent compatibility with traditional processes. However, pattern transfer of PS-b-PMMA block copolymers (BCPs) remains a great challenge for its applications due to the insufficient etching resolution. In this study, the effect of ionic liquid 1-hexyl-3-methylimidazolium hexafluorophosphate (HMHF) additives on the line edge roughness (LER) performances of PS-b-PMMA self-assembled patterns was studied. Trace addition of HMHF kept the photolithography compatibility of PS-b-PMMA block copolymer films, but obviously increased their Flory-Huggins interaction parameter (χ) and enabled phase separation of disordered low molecular weight BCPs. LER value was effectively decreased by blending HMHF directly with PS-b-PMMA or from a supplying top layer of polyvinylpyrrolidone containing HMHF additives. This study shows an excellent strategy to improve the deficiencies of existing block copolymers.
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Affiliation(s)
- Hongbo Hao
- College of Material Science & Engineering, Nanjing Tech University, Nanjing, 210009, Jiangsu, People's Republic of China
- Jiangsu Collaborative Innovation Center for Advanced Inorganic Function Composites, Nanjing, 210009, People's Republic of China
| | - Shuangjun Chen
- College of Material Science & Engineering, Nanjing Tech University, Nanjing, 210009, Jiangsu, People's Republic of China
- Jiangsu Collaborative Innovation Center for Advanced Inorganic Function Composites, Nanjing, 210009, People's Republic of China
| | - Jiaxing Ren
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, 60637, IL, United States of America
| | - Xuanxuan Chen
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, 60637, IL, United States of America
| | - Paul Nealey
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, 60637, IL, United States of America
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15
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Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement. Polymers (Basel) 2023; 15:polym15041035. [PMID: 36850318 PMCID: PMC9958675 DOI: 10.3390/polym15041035] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/23/2023] [Revised: 02/15/2023] [Accepted: 02/16/2023] [Indexed: 02/22/2023] Open
Abstract
Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control. It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by the width of the plateaus becomes a critical factor influencing the local morphology.
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16
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Kim DH, Kwon HG, Choi HK. Dewetting-Induced Hierarchical Self-Assembly of Block Copolymers Templated by Colloidal Crystals. Polymers (Basel) 2023; 15:polym15040897. [PMID: 36850181 PMCID: PMC9961777 DOI: 10.3390/polym15040897] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/20/2023] [Revised: 02/08/2023] [Accepted: 02/09/2023] [Indexed: 02/16/2023] Open
Abstract
Recent advances in high-performance flexible electronic devices have increased the demand for more diverse and complex nanofabrication methods; high-resolution, high-efficiency, and low-cost patterning strategies for next-generation devices are therefore required. In this study, we demonstrate the formation of dewetting-induced hierarchical patterns using two self-assembled materials: block copolymers (BCPs) and colloidal crystals. The combination of the two self-assembly methods successfully generates multiscale hierarchical patterns because the length scales of the periodic colloidal crystal structures are suitable for templating the BCP patterns. Various concentric ring patterns were observed on the templated BCP films, and a free energy model of the polymer chain was applied to explain the formation of these patterns relative to the template width. Frequently occurring spiral-defective features were also examined and found to be promoted by Y-junction defects.
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17
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Minh DN, Nguyen LAT, Nguyen QH, Vu TV, Choi J, Eom S, Kwon SJ, Kang Y. Synthesis of MAPbBr 3 -Polymer Composite Films by Photolysis of DMF: Toward Transparent and Flexible Optical Physical Unclonable Functions (PUFs) with Hierarchical Multilevel Complexity. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2208151. [PMID: 36433696 DOI: 10.1002/adma.202208151] [Citation(s) in RCA: 4] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/05/2022] [Revised: 10/24/2022] [Indexed: 06/16/2023]
Abstract
Physical entities with inherent randomness have been investigated as anti-counterfeiting labels based on physical unclonable functions (PUFs). Herein, a transparent and flexible optical PUF label associated with multilevel complexity is demonstrated by taking advantage of the optical properties of hierarchical morphologies of the composite film composed of metal halide perovskite nanoparticles (MAPbBr3 NPs) and the intrinsic spinodal-decomposition-like phase separation of polymer blend (PMMA/PS blend). Due to the combinatorial effects of the photolysis synthesis of MAPbBr3 and the thermodynamic instability of the PMMA/PS blend, randomized patterns emerge at two-level scales. These patterns are intrinsically non-deterministic, and therefore, the PUF labels from the multilevel random patterns are challenging to replicate. This is mainly attributed to random spot patterns (higher-level patterns) confined within intricate bicontinuous patterns (lower-level patterns).
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Affiliation(s)
- Duong Nguyen Minh
- Department of Chemistry, Hanyang University, Seoul, 04763, Korea
- Research Institute for Convergence of Basic Science, Hanyang University, Seoul, 04763, Korea
| | - Lan Anh Thi Nguyen
- Department of Physics, Institute for High Pressure, Hanyang University, Seoul, 04763, Korea
| | - Quynh H Nguyen
- Research Institute for Natural Sciences and Center for New Directions in Organic Synthesis (CNOS), Hanyang University, Seoul, 04763, Korea
| | - Thanh Van Vu
- Department of Chemistry, Hanyang University, Seoul, 04763, Korea
| | - Jinwoo Choi
- Department of Chemistry, Hanyang University, Seoul, 04763, Korea
| | - Sangwon Eom
- Department of Chemistry, Hanyang University, Seoul, 04763, Korea
| | - S Joon Kwon
- School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Korea
- SKKU Institute of Energy Science and Technology (SIEST), Suwon, 16419, Korea
| | - Youngjong Kang
- Department of Chemistry, Hanyang University, Seoul, 04763, Korea
- Research Institute for Natural Sciences, Hanyang University, Seoul, 04763, Korea
- Institute of Nano Science and Technology, Hanyang University, Seoul, 04763, Korea
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18
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Doerk GS, Stein A, Bae S, Noack MM, Fukuto M, Yager KG. Autonomous discovery of emergent morphologies in directed self-assembly of block copolymer blends. SCIENCE ADVANCES 2023; 9:eadd3687. [PMID: 36638174 PMCID: PMC9839324 DOI: 10.1126/sciadv.add3687] [Citation(s) in RCA: 5] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/07/2022] [Accepted: 12/12/2022] [Indexed: 06/17/2023]
Abstract
The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful approach to fabricate complex nanostructure arrays, but finding morphologies that emerge with changes in polymer architecture, composition, or assembly constraints remains daunting because of the increased dimensionality of the DSA design space. Here, we demonstrate machine-guided discovery of emergent morphologies from a cylinder/lamellae BCP blend directed by a chemical grating template, conducted without direct human intervention on a synchrotron x-ray scattering beamline. This approach maps the morphology-template phase space in a fraction of the time required by manual characterization and highlights regions deserving more detailed investigation. These studies reveal localized, template-directed partitioning of coexisting lamella- and cylinder-like subdomains at the template period length scale, manifesting as previously unknown morphologies such as aligned alternating subdomains, bilayers, or a "ladder" morphology. This work underscores the pivotal role that autonomous characterization can play in advancing the paradigm of DSA.
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Affiliation(s)
- Gregory S. Doerk
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, USA
| | - Aaron Stein
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, USA
| | - Suwon Bae
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, USA
| | - Marcus M. Noack
- The Center for Advanced Mathematics for Energy Research Applications (CAMERA), Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
| | - Masafumi Fukuto
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA
| | - Kevin G. Yager
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, USA
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19
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Lamers BAG, Fors BP, Meijer EW. Mixing discrete block co‐oligomers: When does it behave like a disperse sample? JOURNAL OF POLYMER SCIENCE 2022. [DOI: 10.1002/pol.20220689] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/29/2022]
Affiliation(s)
- Brigitte A. G. Lamers
- Institute for Complex Molecular Systems and Laboratory of Macromolecular and Organic Chemistry Eindhoven University of Technology Eindhoven The Netherlands
| | - Brett P. Fors
- Department of Chemistry and Chemical Biology Cornell University Ithaca New York USA
| | - E. W. Meijer
- Institute for Complex Molecular Systems and Laboratory of Macromolecular and Organic Chemistry Eindhoven University of Technology Eindhoven The Netherlands
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20
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Liang R, Xue Y, Fu X, Le AN, Song Q, Qiang Y, Xie Q, Dong R, Sun Z, Osuji CO, Johnson JA, Li W, Zhong M. Hierarchically engineered nanostructures from compositionally anisotropic molecular building blocks. NATURE MATERIALS 2022; 21:1434-1440. [PMID: 36357688 DOI: 10.1038/s41563-022-01393-0] [Citation(s) in RCA: 15] [Impact Index Per Article: 7.5] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/17/2021] [Accepted: 09/30/2022] [Indexed: 06/16/2023]
Abstract
The inability to synthesize hierarchical structures with independently tailored nanoscale and mesoscale features limits the discovery of next-generation multifunctional materials. Here we present a predictable molecular self-assembly strategy to craft nanostructured materials with a variety of phase-in-phase hierarchical morphologies. The compositionally anisotropic building blocks employed in the assembly process are formed by multicomponent graft block copolymers containing sequence-defined side chains. The judicious design of various structural parameters in the graft block copolymers enables broadly tunable compositions, morphologies and lattice parameters across the nanoscale and mesoscale in the assembled structures. Our strategy introduces advanced design principles for the efficient creation of complex hierarchical structures and provides a facile synthetic platform to access nanomaterials with multiple precisely integrated functionalities.
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Affiliation(s)
- Ruiqi Liang
- Department of Chemical and Environmental Engineering, Yale University, New Haven, CT, USA
| | - Yazhen Xue
- Department of Chemical and Environmental Engineering, Yale University, New Haven, CT, USA
| | - Xiaowei Fu
- Department of Chemical and Environmental Engineering, Yale University, New Haven, CT, USA
- State Key Laboratory of Polymer Materials Engineering, Polymer Research Institute of Sichuan University, Chengdu, China
| | - An N Le
- Department of Chemical and Environmental Engineering, Yale University, New Haven, CT, USA
| | - Qingliang Song
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai, China
| | - Yicheng Qiang
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai, China
| | - Qiong Xie
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai, China
| | - Ruiqi Dong
- Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, PA, USA
| | - Zehao Sun
- Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA, USA
| | - Chinedum O Osuji
- Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, PA, USA
| | - Jeremiah A Johnson
- Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA, USA.
| | - Weihua Li
- State Key Laboratory of Molecular Engineering of Polymers, Department of Macromolecular Science, Fudan University, Shanghai, China
| | - Mingjiang Zhong
- Department of Chemical and Environmental Engineering, Yale University, New Haven, CT, USA.
- Department of Chemistry, Yale University, New Haven, CT, USA.
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21
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Angelopoulou PP, Moutsios I, Manesi GM, Ivanov DA, Sakellariou G, Avgeropoulos A. Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach. Prog Polym Sci 2022. [DOI: 10.1016/j.progpolymsci.2022.101625] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/19/2022]
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22
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Zhang B, Meng L, Li Z. Study of the ordered assembly morphologies of diblock copolymers on the same substrate. RSC Adv 2022; 12:28376-28387. [PMID: 36320541 PMCID: PMC9533419 DOI: 10.1039/d2ra04803e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/01/2022] [Accepted: 09/13/2022] [Indexed: 11/05/2022] Open
Abstract
With the development of frontier technology in emerging semiconductor processes, self-assembling (SA) and directed self-assembly (DSA) of block copolymers (BCPs) have attracted great attention from scientific researchers and become promising candidates for advanced photolithography. Using an optimal coating and baking process, highly ordered assembly morphologies (e.g., cylinder and lamella) of two BCPs in thin films were obtained without an additional topcoat material layer. Moreover, the whole experimental study also provides an optimal process for integrating the two BCPs into the same topographic guiding pattern substrate fabricated by electron beam lithography (EBL) to achieve specific self-assembly. This topographic guiding substrate achieves not only lamellar micro-domains aligned perpendicular to the sidewalls of trench edges but also cylindrical micro-domains (PMMA phase in a PS matrix) aligned parallel to trench edges respectively, which provides insights and valuable information for further applications in lithography and electronic devices.
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Affiliation(s)
- Baolin Zhang
- School of Information Science and Technology, Fudan UniversityShanghai 200433China
| | - Lingkuan Meng
- Beijing Institute of Carbon-based Integrated CircuitYiyuan Cultural and Creative Industry Park, 80 Xingshikou Road, Haidian DistrictBeijing100089China
| | - Zili Li
- School of Information Science and Technology, Fudan UniversityShanghai 200433China
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23
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Lai H, Zhang X, Huang G, Liu Y, Li W, Ji S. Directed self-assembly of poly(styrene-b-vinyl acetate) block copolymers on chemical patterns for sub-10 nm nanopatterning via thermal annealing. POLYMER 2022. [DOI: 10.1016/j.polymer.2022.125277] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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24
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Panda AS, Lee YC, Hung CJ, Liu KP, Chang CY, Manesi GM, Avgeropoulos A, Tseng FG, Chen FR, Ho RM. Vacuum-Driven Orientation of Nanostructured Diblock Copolymer Thin Films. ACS NANO 2022; 16:12686-12694. [PMID: 35905494 DOI: 10.1021/acsnano.2c04368] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
This work aims to demonstrate a facile method for the controlled orientation of nanostructures of block copolymer (BCP) thin films. A simple diblock copolymer system, polystyrene-block-polydimethylsiloxane (PS-b-PDMS), is chosen to demonstrate vacuum-driven orientation for solving the notorious low-surface-energy problem of silicon-based BCP nanopatterning. By taking advantage of the pressure dependence of the surface tension of polymeric materials, a neutral air surface for the PS-b-PDMS thin film can be formed under a high vacuum degree (∼10-4 Pa), allowing the formation of the film-spanning perpendicular cylinders and lamellae upon thermal annealing. In contrast to perpendicular lamellae, a long-range lateral order for forming perpendicular cylinders can be efficiently achieved through the self-alignment mechanism for induced ordering from the top and bottom of the free-standing thin film.
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Affiliation(s)
- Aum Sagar Panda
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Yi-Chien Lee
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Chen-Jung Hung
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Kang-Ping Liu
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Cheng-Yen Chang
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Gkreti-Maria Manesi
- Department of Materials Science Engineering, University of Ioannina, University Campus, Ioannina 45110, Greece
| | - Apostolos Avgeropoulos
- Department of Materials Science Engineering, University of Ioannina, University Campus, Ioannina 45110, Greece
| | - Fan-Gang Tseng
- Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan
| | - Fu-Rong Chen
- Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan
- Department of Materials Science and Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
| | - Rong-Ming Ho
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
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25
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Hu T, Ren Y, Li W. Annihilation Kinetics of an Interacting 5/7-Dislocation Pair in the Hexagonal Cylinders of AB Diblock Copolymer. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c01403] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Tianyi Hu
- State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
| | - Yongzhi Ren
- Key Lab of In-fiber Integrated Optics, Ministry of Education, College of Physics and Optoelectronic Engineering, Harbin Engineering University, 150001 Harbin, China
| | - Weihua Li
- State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
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26
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Michman E, Oded M, Shenhar R. Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature. Polymers (Basel) 2022; 14:polym14122377. [PMID: 35745955 PMCID: PMC9231016 DOI: 10.3390/polym14122377] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/15/2022] [Revised: 06/04/2022] [Accepted: 06/07/2022] [Indexed: 02/01/2023] Open
Abstract
The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.
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Yun HS, Kim DH, Kwon HG, Choi HK. Centrifugal Force-Induced Alignment in the Self-Assembly of Block Copolymers. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c00325] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Hyun Su Yun
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Dong Hwan Kim
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Hong Gu Kwon
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Hong Kyoon Choi
- Center for Advanced Materials and Parts of Powder, Kongju National University, Cheonan 31080, Republic of Korea
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28
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Venetsanos F, Anogiannakis SD, Theodorou DN. Mixing Thermodynamics and Flory–Huggins Interaction Parameter of Polyethylene Oxide/Polyethylene Oligomeric Blends from Kirkwood–Buff Theory and Molecular Simulations. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c00642] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Fotis Venetsanos
- School of Chemical Engineering, National Technical University of Athens, 9 Heroon Polytechniou Street, Athens 15780, Greece
| | - Stefanos D. Anogiannakis
- School of Chemical Engineering, National Technical University of Athens, 9 Heroon Polytechniou Street, Athens 15780, Greece
| | - Doros N. Theodorou
- School of Chemical Engineering, National Technical University of Athens, 9 Heroon Polytechniou Street, Athens 15780, Greece
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29
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Hybrid Time-Dependent Ginzburg–Landau Simulations of Block Copolymer Nanocomposites: Nanoparticle Anisotropy. Polymers (Basel) 2022; 14:polym14091910. [PMID: 35567080 PMCID: PMC9103753 DOI: 10.3390/polym14091910] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/14/2022] [Revised: 04/27/2022] [Accepted: 05/02/2022] [Indexed: 11/16/2022] Open
Abstract
Block copolymer melts are perfect candidates to template the position of colloidal nanoparticles in the nanoscale, on top of their well-known suitability for lithography applications. This is due to their ability to self-assemble into periodic ordered structures, in which nanoparticles can segregate depending on the polymer–particle interactions, size and shape. The resulting coassembled structure can be highly ordered as a combination of both the polymeric and colloidal properties. The time-dependent Ginzburg–Landau model for the block copolymer was combined with Brownian dynamics for nanoparticles, resulting in an efficient mesoscopic model to study the complex behaviour of block copolymer nanocomposites. This review covers recent developments of the time-dependent Ginzburg–Landau/Brownian dynamics scheme. This includes efforts to parallelise the numerical scheme and applications of the model. The validity of the model is studied by comparing simulation and experimental results for isotropic nanoparticles. Extensions to simulate nonspherical and inhomogeneous nanoparticles are discussed and simulation results are discussed. The time-dependent Ginzburg–Landau/Brownian dynamics scheme is shown to be a flexible method which can account for the relatively large system sizes required to study block copolymer nanocomposite systems, while being easily extensible to simulate nonspherical nanoparticles.
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Lai H, Huang G, Tian X, Liu Y, Ji S. Engineering the domain roughness of block copolymer in directed self-assembly. POLYMER 2022. [DOI: 10.1016/j.polymer.2022.124853] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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31
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Kulkarni AA, Doerk GS. Thin film block copolymer self-assembly for nanophotonics. NANOTECHNOLOGY 2022; 33:292001. [PMID: 35358955 DOI: 10.1088/1361-6528/ac6315] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/19/2021] [Accepted: 03/31/2022] [Indexed: 06/14/2023]
Abstract
The nanophotonic engineering of light-matter interactions has profoundly changed research behind the design and fabrication of optical materials and devices. Metasurfaces-arrays of subwavelength nanostructures that interact resonantly with electromagnetic radiation-have emerged as an integral nanophotonic platform for a new generation of ultrathin lenses, displays, polarizers and other devices. Their success hinges on advances in lithography and nanofabrication in recent decades. While existing nanolithography techniques are suitable for basic research and prototyping, issues of cost, throughput, scalability, and substrate compatibility may preclude their use for many metasurface applications. Patterning via spontaneous self-assembly of block copolymer thin films offers an enticing alternative for nanophotonic manufacturing that is rapid, inexpensive, and applicable to large areas and diverse substrates. This review discusses the advantages and disadvantages of block copolymer-based nanopatterning and highlights recent progress in their use for broadband antireflection, surface enhanced Raman spectroscopy, and other nanophotonic applications. Recent advances in diversification of self-assembled block copolymer nanopatterns and improved processes for enhanced scalability of self-assembled nanopatterning using block copolymers are also discussed, with a spotlight on directions for future research that would enable a wider array of nanophotonic applications.
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Affiliation(s)
- Ashish A Kulkarni
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, United States of America
| | - Gregory S Doerk
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, United States of America
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32
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Chang CY, Manesi GM, Avgeropoulos A, Ho RM. Superlattice Structure from Self-Assembly of High-χ Block Copolymers via Chain Interdigitation. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c00358] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Cheng-Yen Chang
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan, R.O.C
| | - Gkreti-Maria Manesi
- Department of Materials Science Engineering, University of Ioannina, University Campus, Ioannina 45110, Greece
| | - Apostolos Avgeropoulos
- Department of Materials Science Engineering, University of Ioannina, University Campus, Ioannina 45110, Greece
- Faculty of Chemistry, Lomonosov Moscow State University (MSU), GSP-1, 1-3 Leninskiye Gory, 119991 14 Moscow, Russia
| | - Rong-Ming Ho
- Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan, R.O.C
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33
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Kang YH, Lee S, Choi Y, Seong WK, Han KH, Kim JH, Kim HM, Hong S, Lee SH, Ruoff RS, Kim KB, Kim SO. Large-Area Uniform 1-nm-Level Amorphous Carbon Layers from 3D Conformal Polymer Brushes. A "Next-Generation" Cu Diffusion Barrier? ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2110454. [PMID: 35085406 DOI: 10.1002/adma.202110454] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/23/2021] [Revised: 01/17/2022] [Indexed: 06/14/2023]
Abstract
A reliable method for preparing a conformal amorphous carbon (a-C) layer with a thickness of 1-nm-level, is tested as a possible Cu diffusion barrier layer for next-generation ultrahigh-density semiconductor device miniaturization. A polystyrene brush of uniform thickness is grafted onto 4-inch SiO2 /Si wafer substrates with "self-limiting" chemistry favoring such a uniform layer. UV crosslinking and subsequent carbonization transforms this polymer film into an ultrathin a-C layer without pinholes or hillocks. The uniform coating of nonplanar regions or surfaces is also possible. The Cu diffusion "blocking ability" is evaluated by time-dependent dielectric breakdown (TDDB) tests using a metal-oxide-semiconductor (MOS) capacitor structure. A 0.82 nm-thick a-C barrier gives TDDB lifetimes 3.3× longer than that obtained using the conventional 1.0 nm-thick TaNx diffusion barrier. In addition, this exceptionally uniform ultrathin polymer and a-C film layers hold promise for selective ion permeable membranes, electrically and thermally insulating films in electronics, slits of angstrom-scale thickness, and, when appropriately functionalized, as a robust ultrathin coating with many other potential applications.
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Affiliation(s)
- Yun-Ho Kang
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Sangbong Lee
- Research Institute of Advanced Materials, Department of Materials Science and Engineering, Seoul National University, Seoul, 08826, Korea
| | - Youngwoo Choi
- Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Won Kyung Seong
- Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan, 44919, Korea
| | - Kyu Hyo Han
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Jang Hwan Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Hyun-Mi Kim
- Korea Electronics Technology Institute (KETI), Gyeonggi, 13509, Korea
| | - Seungbum Hong
- Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Sun Hwa Lee
- Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan, 44919, Korea
| | - Rodney S Ruoff
- Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan, 44919, Korea
- Department of Chemistry, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Korea
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Korea
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Korea
| | - Ki-Bum Kim
- Research Institute of Advanced Materials, Department of Materials Science and Engineering, Seoul National University, Seoul, 08826, Korea
| | - Sang Ouk Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
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34
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Kim YC, Kim SY. A Single Crystal 2D Hexagonal Array in a Centimeter Scale with a Self-Directed Assembly of Diblock Copolymer Spheres. ACS NANO 2022; 16:3870-3880. [PMID: 35179365 DOI: 10.1021/acsnano.1c08862] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
The creation of a single-grain two-dimensional (2D) nanoarray over a large area (∼1 cm2) has been only realized with expensive lithographic fabrication involving a complicated multichemical process. In this work, we report the production of a highly aligned single-grain 2D crystalline nanoarray over a centimeter-scale large area with a concept of self-directed assembly (SDA) in block copolymer (BCP) thin films. No lithographic guiding pattern is employed in SDA. A sphere-forming BCP is first transformed to transient-cylinders and aligned with shear. The aligned cylinders act as a guiding pattern to restore the sphere-morphology producing a single-grain 2D crystalline array with the following solvent vapor annealing. The SDA process has two governing parameters: orientational order of guiding patterns in the first step and the lattice matching between the transient guiding cylinders and the restored spheres. The successful application of SDA yields a single-grain of 2D crystalline hexagonal nanoarray with an exceptional long-range order, which is confirmed by employing image treating algorithms and grazing incidence small-angle X-ray scattering (GISAXS) measurements. The suggested SDA strategy is found to be effective for large-scale nanopatterning with no lithographic tools.
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Affiliation(s)
- Ye Chan Kim
- School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul 08826, Republic of Korea
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology, Ulsan, 44919, Republic of Korea
| | - So Youn Kim
- School of Chemical and Biological Engineering, Institute of Chemical Processes, Seoul National University, Seoul 08826, Republic of Korea
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35
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Singh M, Agrawal A, Wu W, Masud A, Armijo E, Gonzalez D, Zhou S, Terlier T, Zhu C, Strzalka J, Matyjaszewski K, Bockstaller M, Douglas JF, Karim A. Soft-Shear-Aligned Vertically Oriented Lamellar Block Copolymers for Template-Free Sub-10 nm Patterning and Hybrid Nanostructures. ACS APPLIED MATERIALS & INTERFACES 2022; 14:12824-12835. [PMID: 35245016 DOI: 10.1021/acsami.1c23865] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
The template-free unidirectional alignment of lamellar block copolymers (l-BCPs) for sub-10 nm high-resolution patterning and hybrid multicomponent nanostructures is important for technological applications. We demonstrate a modified soft-shear-directed self-assembly (SDSA) approach for aligning pristine l-BCPs and l-BCPs with incorporated polymer-grafted nanoparticles (PGNPs), as well as the l-BCP conversion to aligned gold nanowires, and hybrid of metallic gold nanowire and dielectric silica nanoparticle in the form of line-dot nanostructures. The smallest patterns have a half-pitch as small as 9.8 nm. In all cases, soft-shear is achieved using a high-molecular-mass polymer topcoat layer, with support on a neutral bottom layer. We also show that the hybrid line-dot nanostructures have a red-shifted plasmonic response in comparison to neat gold nanowires. These template-free aligned BCPs and nanowires have potential use in nanopatterning applications, and the line-dot nanostructures should be useful in the sensing of biomolecules and other molecular species based on the plasmonic response of the nanowires.
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Affiliation(s)
- Maninderjeet Singh
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Aman Agrawal
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Wenjie Wu
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Ali Masud
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Edward Armijo
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Damian Gonzalez
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Shenghui Zhou
- Materials Science Program, University of Houston, Houston, Texas 77204, United States
| | - Tanguy Terlier
- SIMS Laboratory, Shared Equipment Authority, Rice University, Houston, Texas 77005, United States
| | - Chenhui Zhu
- Advanced Light Source, Lawrence Berkeley National Lab, Berkeley, California 94720, United States
| | - Joseph Strzalka
- X-Ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Krzysztof Matyjaszewski
- Department of Chemistry, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, United States
| | - Michael Bockstaller
- Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, United States
| | - Jack F Douglas
- Material Science and Engineering Division, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States
| | - Alamgir Karim
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
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36
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Yang GG, Choi HJ, Han KH, Kim JH, Lee CW, Jung EI, Jin HM, Kim SO. Block Copolymer Nanopatterning for Nonsemiconductor Device Applications. ACS APPLIED MATERIALS & INTERFACES 2022; 14:12011-12037. [PMID: 35230079 DOI: 10.1021/acsami.1c22836] [Citation(s) in RCA: 19] [Impact Index Per Article: 9.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Block copolymer (BCP) nanopatterning has emerged as a versatile nanoscale fabrication tool for semiconductor devices and other applications, because of its ability to organize well-defined, periodic nanostructures with a critical dimension of 5-100 nm. While the most promising application field of BCP nanopatterning has been semiconductor devices, the versatility of BCPs has also led to enormous interest from a broad spectrum of other application areas. In particular, the intrinsically low cost and straightforward processing of BCP nanopatterning have been widely recognized for their large-area parallel formation of dense nanoscale features, which clearly contrasts that of sophisticated processing steps of the typical photolithographic process, including EUV lithography. In this Review, we highlight the recent progress in the field of BCP nanopatterning for various nonsemiconductor applications. Notable examples relying on BCP nanopatterning, including nanocatalysts, sensors, optics, energy devices, membranes, surface modifications and other emerging applications, are summarized. We further discuss the current limitations of BCP nanopatterning and suggest future research directions to open up new potential application fields.
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Affiliation(s)
- Geon Gug Yang
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea
| | - Hee Jae Choi
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea
| | - Kyu Hyo Han
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea
| | - Jang Hwan Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea
| | - Chan Woo Lee
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea
| | - Edwin Ino Jung
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea
| | - Hyeong Min Jin
- Department of Organic Materials Engineering, Chungnam National University, Daejeon, 34134, Republic of Korea
| | - Sang Ouk Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea
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37
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Kang HS, Park C, Eoh H, Lee CE, Ryu DY, Kang Y, Feng X, Huh J, Thomas EL, Park C. Visualization of nonsingular defect enabling rapid control of structural color. SCIENCE ADVANCES 2022; 8:eabm5120. [PMID: 35275730 PMCID: PMC8916736 DOI: 10.1126/sciadv.abm5120] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/04/2023]
Abstract
Stimuli-interactive structural color (SC) of a block copolymer (BCP) photonic crystal (PC) uses reversible alteration of the PC using external fluids and applied forces. The origin of the diffusional pathways of a stimulating fluid into a BCP PC has not been examined. Here, we directly visualize the vertically oriented screw dislocations in a one-dimensional lamellar BCP PC that facilitate the rapid response of visible SC. To reveal the diffusional pathway of the solvent via the dislocations, BCP lamellae are swollen with an interpenetrated hydrogel network, allowing fixation of the swollen state and subsequent microscopic examination. The visualized defects are low-energy helicoidal screw dislocations having unique, nonsingular cores. Location and areal density of these dislocations are determined by periodic concentric topographic nanopatterns of the upper surface-reconstructed layer. The nonsingular nature of the interlayer connectivity in the core region demonstrates the beneficial nature of these defects on sensing dynamics.
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Affiliation(s)
- Han Sol Kang
- Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Chanho Park
- Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Hongkyu Eoh
- Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Republic of Korea
- Department of Materials Science and Engineering, Texas A&M University, College Station, TX 77843-3003, USA
| | - Chang Eun Lee
- Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Du Yeol Ryu
- Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Youngjong Kang
- Department of Chemistry, Research Institute for Natural Sciences Institute of Nano Science and Technology, Hanyang University, Seoul 04763, Republic of Korea
| | - Xuenyan Feng
- Department of Materials Science and Engineering, Texas A&M University, College Station, TX 77843-3003, USA
| | - June Huh
- Department of Chemical and Biological Engineering, Korea University, Seoul 02841, Republic of Korea
- Division of Life Sciences, Korea University, 145 Anam-Ro, Seongbuk-Gu, Seoul 02841, Republic of Korea
- Corresponding author. (C.P.); (E.L.T.); (J.H.)
| | - Edwin L. Thomas
- Department of Materials Science and Engineering, Texas A&M University, College Station, TX 77843-3003, USA
- Corresponding author. (C.P.); (E.L.T.); (J.H.)
| | - Cheolmin Park
- Department of Materials Science and Engineering, Yonsei University, Seoul 03722, Republic of Korea
- Spin Convergence Research Center, Korea Institute of Science and Technology (KIST), Seoul 02792, Republic of Korea
- Corresponding author. (C.P.); (E.L.T.); (J.H.)
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38
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Hong JW, Chang JH, Hung HH, Liao YP, Jian YQ, Chang ICY, Huang TY, Nelson A, Lin IM, Chiang YW, Sun YS. Chain Length Effects of Added Homopolymers on the Phase Behavior in Blend Films of a Symmetric, Weakly Segregated Polystyrene- block-poly(methyl methacrylate). Macromolecules 2022. [DOI: 10.1021/acs.macromol.1c02167] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Jia-Wen Hong
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Jung-Hong Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Hsiang-Ho Hung
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Yin-Ping Liao
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Yi-Qing Jian
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Iris Ching-Ya Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Tzu-Yen Huang
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Andrew Nelson
- Australian Nuclear Science and Technology Organisation, Locked Bag 2001, Kirrawee DC, NSW 2232, Australia
| | - I-Ming Lin
- Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
| | - Yeo-Wan Chiang
- Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan
| | - Ya-Sen Sun
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
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39
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Spontaneous patterning method utilizing transformation of UV-curable emulsion. Sci Rep 2022; 12:3607. [PMID: 35246577 PMCID: PMC8897442 DOI: 10.1038/s41598-022-07525-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/31/2021] [Accepted: 02/21/2022] [Indexed: 11/20/2022] Open
Abstract
A self-organizing structure is important for imparting functions and simplifying the manufacturing process. The development of spontaneous structures with a roll-to-roll process capability is a challenging task. We propose a novel patterning method utilizing the destruction of the emulsion structure. An oil-in-water (O/W) UV-curable emulsion liquid film was partially exposed to UV, resulting in aggregation and immobilization of the emulsion in the medium. Emulsion droplets in the unexposed area are coalesced by removing water. Coalesced emulsion droplets expand and spontaneously permeate into the pores formed in the aggregated structure of UV-cured emulsion particles, causing an uneven structure. An uneven pattern can be formed by direct UV exposure of the liquid film and the subsequent drying process without requiring a development process.
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40
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Zhang H, Clothier GK, Guimarães TR, Kita R, Zetterlund PB, Okamura Y. Tuning phase separation morphology in blend thin films using well-defined linear (multi)block copolymers. POLYMER 2022. [DOI: 10.1016/j.polymer.2021.124466] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
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41
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Goodson AD, Rick MS, Troxler JE, Ashbaugh HS, Albert JNL. Blending Linear and Cyclic Block Copolymers to Manipulate Nanolithographic Feature Dimensions. ACS APPLIED POLYMER MATERIALS 2022; 4:327-337. [PMID: 35059643 PMCID: PMC8762643 DOI: 10.1021/acsapm.1c01313] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 10/01/2021] [Accepted: 11/30/2021] [Indexed: 06/14/2023]
Abstract
Block copolymers (BCPs) consist of two or more covalently bound chemically distinct homopolymer blocks. These macromolecules have emerging applications in photonics, membrane separations, and nanolithography stemming from their self-assembly into regular nanoscale structures. Theory suggests that cyclic BCPs should form features up to 40% smaller than their linear analogs while also exhibiting superior thin-film stability and assembly dynamics. However, the complex syntheses required to produce cyclic polymers mean that a need for pure cyclic BCPs would present a challenge to large-scale manufacturing. Here, we employ dissipative particle dynamics simulations to probe the self-assembly behavior of cyclic/linear BCP blends, focusing on nanofeature size and interfacial width as these qualities are critical to nanopatterning applications. We find that for mixtures of symmetric cyclic and linear polymers with equivalent lengths, up to 10% synthetic impurity has a minimal impact on cyclic BCP feature dimensions and interfacial roughness. On the other hand, blending with cyclic BCPs provides a route to "fine-tune" linear BCP feature sizes. We analyze simulated blend domain spacings within the context of strong segregation theory and find significant deviations between simulation and theory that arise from molecular-level packing motifs not included in theory. These insights into blend self-assembly will assist experimentalists in rationally designing BCP materials for advanced nanolithography applications.
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Affiliation(s)
- Amy D. Goodson
- Department of Chemical and
Biomolecular Engineering, Tulane University, New Orleans, Louisiana 70118, United States
| | - Maxwell S. Rick
- Department of Chemical and
Biomolecular Engineering, Tulane University, New Orleans, Louisiana 70118, United States
| | - Jessie E. Troxler
- Department of Chemical and
Biomolecular Engineering, Tulane University, New Orleans, Louisiana 70118, United States
| | - Henry S. Ashbaugh
- Department of Chemical and
Biomolecular Engineering, Tulane University, New Orleans, Louisiana 70118, United States
| | - Julie N. L. Albert
- Department of Chemical and
Biomolecular Engineering, Tulane University, New Orleans, Louisiana 70118, United States
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42
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Lee S, Lee W, Jung HT, Ross CA. Selective Deposition of Copper on Self-Assembled Block Copolymer Surfaces via Physical Vapor Deposition. ACS APPLIED MATERIALS & INTERFACES 2021; 13:52931-52937. [PMID: 34705438 DOI: 10.1021/acsami.1c15272] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Block copolymer (BCP) self-assembly produces chemically and topographically patterned surfaces which are used to guide the formation of Cu nanostructures by exploiting differences in the mobility of vapor-deposited species on each microdomain. Cu metal films a few nm thick were deposited on three different BCP surfaces self-assembled from poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP). For PS-b-PMMA, the effects of chemical heterogeneity dominate over the effects of the 2 nm peak-to-valley topography, and sputtered Cu preferentially wets the PS block. PS-b-P2VP has greater chemical and topographical contrast and shows a wider process window for selective deposition. Cu grown by evaporation has less surface mobility, and shadowing effects are believed to dominate pattern formation. The hierarchical self-assembly process of thin metal films on BCP surfaces provides a route to fabricating heterogeneous metallic nanostructures.
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Affiliation(s)
- Sangho Lee
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Wonmoo Lee
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
| | - Hee-Tae Jung
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
| | - Caroline A Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
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43
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Hong JW, Jian YQ, Liao YP, Hung HH, Huang TY, Nelson A, Tsao IY, Wu CM, Sun YS. Distributions of Deuterated Polystyrene Chains in Perforated Layers of Blend Films of a Symmetric Polystyrene -block-poly(methyl methacrylate). LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2021; 37:13046-13058. [PMID: 34696591 DOI: 10.1021/acs.langmuir.1c02132] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
We have examined the spatial distributions of polymer chains in blend films of weakly segregated polystyrene-block-poly(methyl methacrylate) [P(S-b-MMA)] and deuterated polystyrene (dPS). By fine-tuning the composition (ϕPS+dPS = 63.8 vol %) of the total PS/dPS component and annealing temperature (230 and 270 °C), P(S-b-MMA)/dPS blend films mainly form perforated layers with a parallel orientation (hereafter PLs//). The distributions of dPS in PLs// were probed by grazing-incidence small-angle neutron scattering (GISANS) and time-of-flight neutron reflectivity (ToF-NR). GISANS and ToF-NR results offer evidence that dPS chains preferentially locate at the free surface and within the PS layers for blend films that were annealed at 230 °C. Upon annealing at 270 °C, dPS chains distribute within PS layers and perforated PMMA layers. Nevertheless, dPS chains still retain a surface preference for thin films. In contrast, such surface segregation of dPS chains is prohibited for thick films when annealed at 270 °C.
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Affiliation(s)
- Jia-Wen Hong
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Yi-Qing Jian
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Yin-Ping Liao
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Hsiang-Ho Hung
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Tzu-Yen Huang
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Andrew Nelson
- Australian Nuclear Science and Technology Organisation, Locked Bag 2001, Kirrawee DC, NSW 2232, Australia
| | - I-Yu Tsao
- Institute of Materials Science and Engineering, National Central University, Taoyuan 32001, Taiwan
| | - Chun-Ming Wu
- National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Ya-Sen Sun
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan
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44
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Schneider L, de Pablo JJ. Combining Particle-Based Simulations and Machine Learning to Understand Defect Kinetics in Thin Films of Symmetric Diblock Copolymers. Macromolecules 2021. [DOI: 10.1021/acs.macromol.1c01583] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Ludwig Schneider
- Pritzker School of Molecular Engineering, University of Chicago, 5640 Ellis Avenue, 60637 Chicago, Illinois, United States
| | - Juan J. de Pablo
- Pritzker School of Molecular Engineering, University of Chicago, 5640 Ellis Avenue, 60637 Chicago, Illinois, United States
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45
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Reddy A, Feng X, Thomas EL, Grason GM. Block Copolymers beneath the Surface: Measuring and Modeling Complex Morphology at the Subdomain Scale. Macromolecules 2021. [DOI: 10.1021/acs.macromol.1c00958] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Affiliation(s)
- Abhiram Reddy
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, Amherst, Massachusetts 01003, United States
| | - Xueyan Feng
- Department of Materials Science and Engineering, Texas A&M University, College Station, Texas 77843, United States
| | - Edwin L. Thomas
- Department of Materials Science and Engineering, Texas A&M University, College Station, Texas 77843, United States
| | - Gregory M. Grason
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, Amherst, Massachusetts 01003, United States
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46
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Hong JW, Chang JH, Chang ICY, Sun YS. Phase behavior in thin films of weakly segregated block copolymer/homopolymer blends. SOFT MATTER 2021; 17:9189-9197. [PMID: 34586138 DOI: 10.1039/d1sm01005k] [Citation(s) in RCA: 7] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
We have demonstrated the phase behavior of substrate-supported films of a symmetric weakly segregated polystyrene-block-poly (methyl methacrylate), P(S-b-MMA), block copolymer and its blends with homopolymer polystyrene (PS) at different compositions. Upon increasing the content of added PS in the blends, lamellae (L), perforated layers (PL), double gyroid (DG) and cylinders (C) are obtained in sequence for films. Among these nanodomains, PL and DG only exist in a narrow ϕPS region (ϕPS denotes the volume fraction of PS). At ϕPS = 64%, tuning film thickness and annealing temperature can produce parallel PL or DG with {121}DG lattice planes being parallel to the substrate surface. The effects of annealing temperature and film thickness on the formation of PL and DG are examined. In thin films with n ≈ 3 (n denotes the ratio of initial film thickness to inter-domain spacing), the PL phase solely exists regardless of temperature. However, for thick films with n ≈ 6 and 10, thermal annealing at the most accessible temperature produces films containing both PL and DG of various fractions, but a low temperature tends to favor a greater fraction of PL. The PL phase becomes the only discernible phase if thick films are shortly annealed at 230 °C.
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Affiliation(s)
- Jia-Wen Hong
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
| | - Jung-Hong Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
| | - Iris Ching-Ya Chang
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
| | - Ya-Sen Sun
- Department of Chemical and Materials Engineering, National Central University, Taoyuan 32001, Taiwan.
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47
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Sun J, Lee C, Osuji CO, Gopalan P. Synthesis of High Etch Contrast Poly(3-hydroxystyrene)-Based Triblock Copolymers and Self-Assembly of Sub-5 nm Features. Macromolecules 2021. [DOI: 10.1021/acs.macromol.1c01611] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Jian Sun
- Department of Materials Science and Engineering, University of Wisconsin−Madison, Madison, Wisconsin 53706, United States
| | - Changyeon Lee
- Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Chinedum O. Osuji
- Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Padma Gopalan
- Department of Materials Science and Engineering, University of Wisconsin−Madison, Madison, Wisconsin 53706, United States
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48
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Vargo E, Evans KM, Wang Q, Sattler A, Qian Y, Yao J, Xu T. Orbital Angular Momentum from Self-Assembled Concentric Nanoparticle Rings. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021; 33:e2103563. [PMID: 34418190 DOI: 10.1002/adma.202103563] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/11/2021] [Revised: 06/23/2021] [Indexed: 06/13/2023]
Abstract
Ring-shaped nanostructures can focus, filter, and manipulate electromagnetic waves, but are challenging to incorporate into devices using standard nanofabrication techniques. Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically patterned templates has successfully been used to fabricate concentric rings and spirals as etching masks. However, this method is limited by BCP phase behavior and material selection. Here, a straightforward approach to generate ring-shaped nanoparticle assemblies in thin films of supramolecular nanocomposites is demonstrated. DSA is used to guide the formation of concentric rings with radii spanning 150-1150 nm and ring widths spanning 30-60 nm. When plasmonic nanoparticles are used, ring nanodevice arrays can be fabricated in one step, and the completed devices produce high-quality orbital angular momentum (OAM). Nanocomposite DSA simplifies and streamlines nanofabrication by producing metal structures without etching or deposition steps; it also introduces interparticle coupling as a new design axis. Detailed analysis of the nanoparticle ring assemblies confirms that the supramolecular system self-regulates the spatial distribution of its components, and thus exhibits a degree of flexibility absent in DSA of BCPs alone, where structures are determined by polymer-pattern incommensurability. The present studies also provide guidelines for developing self-regulating DSA as an alternative to incommensurability-driven methods.
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Affiliation(s)
- Emma Vargo
- Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, 94720, USA
| | - Katherine M Evans
- Department of Chemistry, University of California at Berkeley, Berkeley, CA, 94720, USA
| | - Qingjun Wang
- Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, 94720, USA
| | - Andrew Sattler
- Department of Chemistry, University of California at Berkeley, Berkeley, CA, 94720, USA
| | - Yiwen Qian
- Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, 94720, USA
| | - Jie Yao
- Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, 94720, USA
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Ting Xu
- Department of Materials Science and Engineering, University of California at Berkeley, Berkeley, CA, 94720, USA
- Department of Chemistry, University of California at Berkeley, Berkeley, CA, 94720, USA
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
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49
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Toth K, Bae S, Osuji CO, Yager KG, Doerk GS. Film Thickness and Composition Effects in Symmetric Ternary Block Copolymer/Homopolymer Blend Films: Domain Spacing and Orientation. Macromolecules 2021. [DOI: 10.1021/acs.macromol.1c01032] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Kristof Toth
- Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06520, United States
| | - Suwon Bae
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Chinedum O. Osuji
- Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Kevin G. Yager
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Gregory S. Doerk
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
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50
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Hu T, Ren Y, Li W. Impact of Molecular Asymmetry of Block Copolymers on the Stability of Defects in Aligned Lamellae. Macromolecules 2021. [DOI: 10.1021/acs.macromol.1c01192] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Tianyi Hu
- State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
| | - Yongzhi Ren
- Key Lab of In-fiber Integrated Optics, Ministry of Education, College of Physics and Optoelectronic Engineering, Harbin Engineering University, 150001 Harbin, China
| | - Weihua Li
- State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200438, China
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