1
|
Mauri A, Kiefer P, Neidinger P, Messer T, Bojanowski NM, Yang L, Walden S, Unterreiner AN, Barner-Kowollik C, Wegener M, Wenzel W, Kozlowska M. Two- and three-photon processes during photopolymerization in 3D laser printing. Chem Sci 2024:d4sc03527e. [PMID: 39129779 PMCID: PMC11309088 DOI: 10.1039/d4sc03527e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/29/2024] [Accepted: 07/12/2024] [Indexed: 08/13/2024] Open
Abstract
The performance of a photoinitiator is key to control efficiency and resolution in 3D laser nanoprinting. Upon light absorption, a cascade of competing photophysical processes leads to photochemical reactions toward radical formation that initiates free radical polymerization (FRP). Here, we investigate 7-diethylamino-3-thenoylcoumarin (DETC), belonging to an efficient and frequently used class of photoinitiators in 3D laser printing, and explain the molecular bases of FRP initiation upon DETC photoactivation. Depending on the presence of a co-initiator, DETC causes radical generation either upon two-photon- or three-photon excitation, but the mechanism for these processes is not well understood so far. Here, we show that the unique three-photon based radical formation by DETC, in the absence of a co-initiator, results from its excitation to highly excited triplet states. They allow a hydrogen-atom transfer reaction from the pentaerythritol triacrylate (PETA) monomer to DETC, enabling the formation of the reactive PETA alkyl radical, which initiates FRP. The formation of active DETC radicals is demonstrated to be less spontaneous. In contrast, photoinitiation in the presence of an onium salt co-initiator proceeds via intermolecular electron transfer after the photosensitization of the photoinitiator to the lowest triplet excited state. Our quantum mechanical calculations demonstrate photophysical processes upon the multiphoton activation of DETC and explain different reactions for the radical formation upon DETC photoactivation. This investigation for the first time describes possible pathways of FRP initiation in 3D laser nanoprinting and permits further rational design of efficient photoinitiators to increase the speed and sensitivity of 3D laser nanoprinting.
Collapse
Affiliation(s)
- Anna Mauri
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - Pascal Kiefer
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - Philipp Neidinger
- Institute of Physical Chemistry (IPC), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
- School of Chemistry and Physics, Centre for Materials Science, Queensland University of Technology (QUT) 2 George Street Brisbane QLD 4000 Australia
| | - Tobias Messer
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - N Maximilian Bojanowski
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - Liang Yang
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - Sarah Walden
- School of Chemistry and Physics, Centre for Materials Science, Queensland University of Technology (QUT) 2 George Street Brisbane QLD 4000 Australia
| | - Andreas-Neil Unterreiner
- Institute of Physical Chemistry (IPC), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - Christopher Barner-Kowollik
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
- School of Chemistry and Physics, Centre for Materials Science, Queensland University of Technology (QUT) 2 George Street Brisbane QLD 4000 Australia
| | - Martin Wegener
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - Wolfgang Wenzel
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| | - Mariana Kozlowska
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Kaiserstraße 12 76131 Karlsruhe Germany
| |
Collapse
|
2
|
Islam S, Klar TA. Stimulated Emission Depletion Inspired Sub-100 nm Structuring of Epoxides Using 2-Chlorothioxanthone as Photosensitizer. ACS OMEGA 2024; 9:19203-19208. [PMID: 38708223 PMCID: PMC11064169 DOI: 10.1021/acsomega.4c00031] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/02/2024] [Revised: 03/01/2024] [Accepted: 04/05/2024] [Indexed: 05/07/2024]
Abstract
Until very recently, the enhancement of multiphoton-based optical lithography by stimulated emission depletion (STED) inspired techniques was limited mostly to (meth)acrylates. Epoxides, which play an important role in semiconductor clean-room technology, were basically excluded from capitalizing on STED-inspired lithography, and if they were successfully used in STED-inspired lithography, the achievable structure sizes remained at 125 nm and above. We now found that using 2-chlorothioxanthone (CTX) as a sensitizer for a sulfonium salt acting as the photoinitiator allows for shrinking the structure size down to 83 nm. Compared to the previously used sensitizer 2-isopropylthioxanthone, the triplet lifetime of CTX within the epoxide monomers is supposed to be prolonged by 40%, which renders an optical depletion via excited triplet state absorption more efficient, leading to a sub-100 nm structuring capability.
Collapse
Affiliation(s)
- Sourav Islam
- Institute of Applied Physics, Johannes Kepler University Linz, 4040 Linz, Austria
| | - Thomas A. Klar
- Institute of Applied Physics, Johannes Kepler University Linz, 4040 Linz, Austria
| |
Collapse
|
3
|
Guan L, Cao C, Liu X, Liu Q, Qiu Y, Wang X, Yang Z, Lai H, Sun Q, Ding C, Zhu D, Kuang C, Liu X. Light and matter co-confined multi-photon lithography. Nat Commun 2024; 15:2387. [PMID: 38493192 PMCID: PMC10944545 DOI: 10.1038/s41467-024-46743-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/12/2023] [Accepted: 03/08/2024] [Indexed: 03/18/2024] Open
Abstract
Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low cost and more accessible than conventional lithography. A major challenge for multi-photon lithography is to achieve ultra-high precision and desirable lateral resolution due to the inevitable optical diffraction barrier and proximity effect. Here, we show a strategy, light and matter co-confined multi-photon lithography, to overcome the issues via combining photo-inhibition and chemical quenchers. We deeply explore the quenching mechanism and photoinhibition mechanism for light and matter co-confined multiphoton lithography. Besides, mathematical modeling helps us better understand that the synergy of quencher and photo-inhibition can gain a narrowest distribution of free radicals. By using light and matter co-confined multiphoton lithography, we gain a 30 nm critical dimension and 100 nm lateral resolution, which further decrease the gap with conventional lithography.
Collapse
Affiliation(s)
- Lingling Guan
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Chun Cao
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China.
- School of Mechanical Engineering, Hangzhou Dianzi University, 310018, Hangzhou, China.
| | - Xi Liu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Qiulan Liu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Yiwei Qiu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Xiaobing Wang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Zhenyao Yang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Huiying Lai
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Qiuyuan Sun
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Chenliang Ding
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Dazhao Zhu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, 311121, Hangzhou, China
| | - Cuifang Kuang
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China.
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, 311200, Hangzhou, China.
| | - Xu Liu
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, 310027, Hangzhou, China.
- ZJU-Hangzhou Global Scientific and Technological Innovation Center, 311200, Hangzhou, China.
| |
Collapse
|
4
|
Zhao M, Wen J, Hu Q, Wei X, Zhong YW, Ruan H, Gu M. A 3D nanoscale optical disk memory with petabit capacity. Nature 2024; 626:772-778. [PMID: 38383625 DOI: 10.1038/s41586-023-06980-y] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/29/2023] [Accepted: 12/14/2023] [Indexed: 02/23/2024]
Abstract
High-capacity storage technologies are needed to meet our ever-growing data demands1,2. However, data centres based on major storage technologies such as semiconductor flash devices and hard disk drives have high energy burdens, high operation costs and short lifespans2,3. Optical data storage (ODS) presents a promising solution for cost-effective long-term archival data storage. Nonetheless, ODS has been limited by its low capacity and the challenge of increasing its areal density4,5. Here, to address these issues, we increase the capacity of ODS to the petabit level by extending the planar recording architecture to three dimensions with hundreds of layers, meanwhile breaking the optical diffraction limit barrier of the recorded spots. We develop an optical recording medium based on a photoresist film doped with aggregation-induced emission dye, which can be optically stimulated by femtosecond laser beams. This film is highly transparent and uniform, and the aggregation-induced emission phenomenon provides the storage mechanism. It can also be inhibited by another deactivating beam, resulting in a recording spot with a super-resolution scale. This technology makes it possible to achieve exabit-level storage by stacking nanoscale disks into arrays, which is essential in big data centres with limited space.
Collapse
Affiliation(s)
- Miao Zhao
- Photonic Integrated Circuits Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
| | - Jing Wen
- Engineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai, China.
| | - Qiao Hu
- Photonic Integrated Circuits Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
| | - Xunbin Wei
- Biomedical Engineering Department, Peking University, Beijing, China
- School of Biomedical Engineering, Anhui Medical University, Hefei, China
| | - Yu-Wu Zhong
- Key Laboratory of Photochemistry, Beijing National Laboratory for Molecular Sciences, CAS Research Education Center for Excellence in Molecular Science, Institute of Chemistry, Chinese Academy of Sciences, Beijing, China
| | - Hao Ruan
- Photonic Integrated Circuits Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China.
| | - Min Gu
- Institute of Photonic Chips, University of Shanghai for Science and Technology, Shanghai, China.
- Zhangjiang Laboratory, Shanghai, China.
| |
Collapse
|
5
|
Monge R, Delord T, Meriles CA. Reversible optical data storage below the diffraction limit. NATURE NANOTECHNOLOGY 2024; 19:202-207. [PMID: 38049596 DOI: 10.1038/s41565-023-01542-9] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/31/2022] [Accepted: 09/18/2023] [Indexed: 12/06/2023]
Abstract
Colour centres in wide-bandgap semiconductors feature metastable charge states that can be interconverted with the help of optical excitation at select wavelengths. The distinct fluorescence and spin properties in each of these states have been exploited to show storage of classical information in three dimensions, but the memory capacity of these platforms has been thus far limited by optical diffraction. Here we leverage local heterogeneity in the optical transitions of colour centres in diamond (nitrogen vacancies) to demonstrate selective charge state control of individual point defects sharing the same diffraction-limited volume. Further, we apply this approach to dense colour centre ensembles, and show rewritable, multiplexed data storage with an areal density of 21 Gb inch-2 at cryogenic temperatures. These results highlight the advantages for developing alternative optical storage device concepts that can lead to increased storage capacity and reduced energy consumption per operation.
Collapse
Affiliation(s)
- Richard Monge
- Department of Physics, City College of New York, CUNY, New York, NY, USA
- Graduate Center, CUNY, New York, NY, USA
| | - Tom Delord
- Department of Physics, City College of New York, CUNY, New York, NY, USA
| | - Carlos A Meriles
- Department of Physics, City College of New York, CUNY, New York, NY, USA.
- Graduate Center, CUNY, New York, NY, USA.
| |
Collapse
|
6
|
Islam S, Sangermano M, Klar TA. STED-Inspired Cationic Photoinhibition Lithography. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2023; 127:18736-18744. [PMID: 37752901 PMCID: PMC10518867 DOI: 10.1021/acs.jpcc.3c04394] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/29/2023] [Revised: 08/17/2023] [Indexed: 09/28/2023]
Abstract
Direct laser writing by two-photon lithography has been enhanced substantially during the past two decades by techniques borrowed from stimulated emission depletion (STED) microscopy. However, STED-inspired lithography was so far limited to radical polymerizations, mostly to acrylates and methacrylates. Cationic polymers did not derive benefits from this technique. Specifically, epoxide polymerization, which plays a paramount role in semiconductor clean-room technology, has not yet been reported with a second, depleting laser focus in the outer rim of the point spread function. We now found that using a thioxanthone as a sensitizer and sulfonium or iodonium salts as photoinitiators enables at least partial optical on/off switching of two-photon polymerization and, in the case of the sulfonium salt, allows for writing epoxy lines with widths shrunk by approx. two-thirds compared to lines written with two-photon polymerization alone.
Collapse
Affiliation(s)
- Sourav Islam
- Institute
of Applied Physics, Johannes Kepler University
Linz, 4040 Linz, Austria
| | - Marco Sangermano
- Department
of Applied Science and Technology, Politecnico
Di Torino, 10124 Torino, Italy
| | - Thomas A. Klar
- Institute
of Applied Physics, Johannes Kepler University
Linz, 4040 Linz, Austria
| |
Collapse
|
7
|
Gvindzhiliia G, Sivun D, Naderer C, Jacak J, Klar TA. Low-Fluorescence Starter for Optical 3D Lithography of Sub-40 nm Structures. ACS APPLIED OPTICAL MATERIALS 2023; 1:945-951. [PMID: 37255503 PMCID: PMC10226181 DOI: 10.1021/acsaom.3c00031] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/24/2023] [Accepted: 04/26/2023] [Indexed: 06/01/2023]
Abstract
Stimulated emission depletion (STED) has been used to break the diffraction limit in fluorescence microscopy. Inspired by this success, similar methods were used to reduce the structure size in three-dimensional, subdiffractional optical lithography. So far, only a very limited number of radical polymerization starters proved to be suitable for STED-inspired lithography. In this contribution, we introduce the starter Michler's ethyl ketone (MEK), which has not been used so far for STED-inspired lithography. In contrast to the commonly used 7-diethylamino-3-thenoylcoumarin (DETC), nanostructures written with MEK show low autofluorescence in the visible range. Therefore, MEK is promising for being used as a starter for protein or cell scaffolds in physiological research because the autofluorescence of DETC so far excluded the use of the green emission channel in multicolor fluorescence or confocal microscopy. In turn, because of the weak transitions of MEK in the visible spectrum, STED, in its original sense, cannot be applied to deplete MEK in the outer rim of the point spread function. However, a 660 nm laser can be used for depletion because this wavelength is well within the absorption spectrum of transient states, possibly of triplet states. We show that polymerization can be fully stopped by applying transient state absorption at 660 nm and that structure sizes down to approx. 40 nm in the lateral and axial directions can be achieved, which means 1/20 of the optical wavelength used for writing.
Collapse
Affiliation(s)
- Georgii Gvindzhiliia
- Institute
of Applied Physics, Johannes Kepler University
Linz, 4040 Linz, Austria
| | - Dmitry Sivun
- Department
of Medical Engineering, University of Applied
Sciences Upper Austria, 4020 Linz, Austria
| | - Christoph Naderer
- Department
of Medical Engineering, University of Applied
Sciences Upper Austria, 4020 Linz, Austria
| | - Jaroslaw Jacak
- Department
of Medical Engineering, University of Applied
Sciences Upper Austria, 4020 Linz, Austria
| | - Thomas A. Klar
- Institute
of Applied Physics, Johannes Kepler University
Linz, 4040 Linz, Austria
| |
Collapse
|
8
|
Johnson JE, Chen Y, Xu X. Model for polymerization and self-deactivation in two-photon nanolithography. OPTICS EXPRESS 2022; 30:26824-26840. [PMID: 36236867 DOI: 10.1364/oe.461969] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/24/2022] [Accepted: 06/23/2022] [Indexed: 06/16/2023]
Abstract
A mathematical model is developed to describe the photochemical processes in two-photon nanolithography, including two-step absorption leading to initiation and self-deactivation of the photoinitiator by laser irradiance, polymer chain propagation, termination, inhibition, and inhibitor and photoinitiator diffusion. This model is solved numerically to obtain the concentrations of the reaction species as a function of time and space as a laser beam is scanned through a volume of photoresist, from which a voxel size or linewidth is determined. The most impactful process parameters are determined by fitting the model to experimentally measured linewidths for a range of laser powers and scanning speeds, while also obtaining effective nonlinearities that are similar to previously measured values. The effects and sensitivities of the different process parameters are examined. It is shown that the photopolymerization process is dominated by diffusion of photoinitiators and oxygen inhibitors, and that self-deactivation can lead to higher effective nonlinearities in two-photon nanolithography.
Collapse
|
9
|
Cao C, Qiu Y, Guan L, Wei Z, Yang Z, Zhan L, Zhu D, Ding C, Shen X, Xia X, Kuang C, Liu X. Dip-In Photoresist for Photoinhibited Two-Photon Lithography to Realize High-Precision Direct Laser Writing on Wafer. ACS APPLIED MATERIALS & INTERFACES 2022; 14:31332-31342. [PMID: 35786857 DOI: 10.1021/acsami.2c08063] [Citation(s) in RCA: 7] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
For decades, photoinhibited two-photon lithography (PI-TPL) has been continually developed and applied into versatile nanofabrication. However, ultrahigh precision fabrication on wafer by PI-TPL remains challenging, due to the lack of a refractive index (n) matched photoresist (Rim-P) with effective photoinhibition capacity for dip-in mode. In this paper, various Rim-P are developed and then screened for their applications in PI-TPL. In addition, different lithography methods (in terms of oil-mode and dip-in mode) are analyzed by use of optical simulations combined with experiments. Remarkably, one type of Rim-P (n = 1.518) shows effective photoinhibition capacity, which represents an outstanding breakthrough in the field of PI-TPL. In contrast to photoresist with an unsuitable refractive index, optical aberrations are almost completely eliminated in the dip-in mode by using the Rim-P. Consequently, features with a minimum critical dimension as small as 39 nm are successfully achieved on wafer by dip-in PI-TPL, which paves the way for subdiffraction silicon-based chip manufacturing by PI-TPL. Moreover, through a combination of the Rim-P and dip-in mode, the ability to achieve tall and high-precision three-dimensional nanostructures is no longer problematic.
Collapse
Affiliation(s)
- Chun Cao
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Yiwei Qiu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Lingling Guan
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Zhen Wei
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Zhenyao Yang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Lanxin Zhan
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Dazhao Zhu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Chenliang Ding
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Xiaoming Shen
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Xianmeng Xia
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
| | - Cuifang Kuang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
- State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, China
| | - Xu Liu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, China
- State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, China
| |
Collapse
|
10
|
Wloka T, Gottschaldt M, Schubert US. From Light to Structure: Photo Initiators for Radical Two-Photon Polymerization. Chemistry 2022; 28:e202104191. [PMID: 35202499 PMCID: PMC9324900 DOI: 10.1002/chem.202104191] [Citation(s) in RCA: 11] [Impact Index Per Article: 5.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/22/2021] [Indexed: 11/06/2022]
Abstract
Two-photon polymerization (2PP) represents a powerful technique for the fabrication of precise three-dimensional structures on a micro- and nanometer scale for various applications. While many review articles are focusing on the used polymeric materials and their application in 2PP, in this review the class of two-photon photo initiators (2PI) used for radical polymerization is discussed in detail. Because the demand for highly efficient 2PI has increased in the last decades, different approaches in designing new efficient 2PIs occurred. This review summarizes the 2PIs known in literature and discusses their absorption behavior under one- and two-photon absorption (2PA) conditions, their two-photon cross sections (σTPA ) as well as their efficiency under 2PP conditions. Here, the photo initiators are grouped depending on their chromophore system (D-π-A-π-D, D-π-D, etc.). Their polymerization efficiencies are evaluated by fabrication windows (FW) depending on different laser intensities and writing speeds.
Collapse
Affiliation(s)
- Thomas Wloka
- Laboratory of Organic and Macromolecular Chemistry (IOMC), Friedrich Schiller Universität Jena, Humboldtstraße 10, 07743, Jena, Germany.,Jena Center for Soft Matter (JCSM), Friedrich Schiller Universität Jena, Philosophenweg 7, 07743, Jena, Germany
| | - Michael Gottschaldt
- Laboratory of Organic and Macromolecular Chemistry (IOMC), Friedrich Schiller Universität Jena, Humboldtstraße 10, 07743, Jena, Germany.,Jena Center for Soft Matter (JCSM), Friedrich Schiller Universität Jena, Philosophenweg 7, 07743, Jena, Germany
| | - Ulrich S Schubert
- Laboratory of Organic and Macromolecular Chemistry (IOMC), Friedrich Schiller Universität Jena, Humboldtstraße 10, 07743, Jena, Germany.,Jena Center for Soft Matter (JCSM), Friedrich Schiller Universität Jena, Philosophenweg 7, 07743, Jena, Germany
| |
Collapse
|
11
|
Liaros N, Gutierrez Razo SA, Thum MD, Ogden HM, Zeppuhar AN, Wolf S, Baldacchini T, Kelley MJ, Petersen JS, Falvey DE, Mullin AS, Fourkas JT. Elucidating complex triplet-state dynamics in the model system isopropylthioxanthone. iScience 2022; 25:103600. [PMID: 35005547 PMCID: PMC8717599 DOI: 10.1016/j.isci.2021.103600] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/01/2021] [Revised: 11/10/2021] [Accepted: 12/03/2021] [Indexed: 11/19/2022] Open
Abstract
We introduce techniques for probing the dynamics of triplet states. We employ these tools, along with conventional techniques, to develop a detailed understanding of a complex chemical system: a negative-tone, radical photoresist for multiphoton absorption polymerization in which isopropylthioxanthone (ITX) is the photoinitiator. This work reveals that the same color of light used for the 2-photon excitation of ITX, leading to population of the triplet manifold through intersystem crossing, also depletes this triplet population via linear absorption followed by reverse intersystem crossing (RISC). Using spectroscopic tools and kinetic modeling, we identify the reactive triplet state and a non-reactive reservoir triplet state. We present compelling evidence that the deactivation channel involves RISC from an excited triplet state to a highly vibrationally excited level of the electronic ground state. The work described here offers the enticing possibility of understanding, and ultimately controlling, the photochemistry and photophysics of a broad range of triplet processes.
Collapse
Affiliation(s)
- Nikolaos Liaros
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
| | | | - Matthew D. Thum
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
| | - Hannah M. Ogden
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
| | - Andrea N. Zeppuhar
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
| | - Steven Wolf
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
| | | | | | - John S. Petersen
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
- imec, Kapeldreef 75, 3001 Leuven, Belgium
| | - Daniel E. Falvey
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
| | - Amy S. Mullin
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
| | - John T. Fourkas
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA
- Institute for Physical Science & Technology, University of Maryland, College Park, MD 20742, USA
- Maryland Quantum Materials Center, University of Maryland, College Park, MD 20742, USA
- Maryland NanoCenter, University of Maryland, College Park, MD 20742, USA
- Corresponding author
| |
Collapse
|
12
|
Zhou D, Zhu LW, Wu BH, Xu ZK, Wan LS. End-functionalized polymers by controlled/living radical polymerizations: synthesis and applications. Polym Chem 2022. [DOI: 10.1039/d1py01252e] [Citation(s) in RCA: 9] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/25/2022]
Abstract
This review focuses on end-functionalized polymers synthesized by controlled/living radical polymerizations and the applications in fields including bioconjugate formation, surface modification, topology construction, and self-assembly.
Collapse
Affiliation(s)
- Di Zhou
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, MOE Engineering Research Center of Membrane and Water Treatment Technology, and Key Laboratory of Adsorption and Separation Materials & Technologies of Zhejiang Province, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China
| | - Liang-Wei Zhu
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, MOE Engineering Research Center of Membrane and Water Treatment Technology, and Key Laboratory of Adsorption and Separation Materials & Technologies of Zhejiang Province, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China
| | - Bai-Heng Wu
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, MOE Engineering Research Center of Membrane and Water Treatment Technology, and Key Laboratory of Adsorption and Separation Materials & Technologies of Zhejiang Province, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China
| | - Zhi-Kang Xu
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, MOE Engineering Research Center of Membrane and Water Treatment Technology, and Key Laboratory of Adsorption and Separation Materials & Technologies of Zhejiang Province, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China
| | - Ling-Shu Wan
- MOE Key Laboratory of Macromolecular Synthesis and Functionalization, MOE Engineering Research Center of Membrane and Water Treatment Technology, and Key Laboratory of Adsorption and Separation Materials & Technologies of Zhejiang Province, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China
| |
Collapse
|
13
|
Surdo S, Duocastella M, Diaspro A. Nanopatterning with Photonic Nanojets: Review and Perspectives in Biomedical Research. MICROMACHINES 2021; 12:256. [PMID: 33802351 PMCID: PMC8000863 DOI: 10.3390/mi12030256] [Citation(s) in RCA: 14] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/05/2021] [Revised: 02/26/2021] [Accepted: 02/26/2021] [Indexed: 12/21/2022]
Abstract
Nanostructured surfaces and devices offer astounding possibilities for biomedical research, including cellular and molecular biology, diagnostics, and therapeutics. However, the wide implementation of these systems is currently limited by the lack of cost-effective and easy-to-use nanopatterning tools. A promising solution is to use optical methods based on photonic nanojets, namely, needle-like beams featuring a nanometric width. In this review, we survey the physics, engineering strategies, and recent implementations of photonic nanojets for high-throughput generation of arbitrary nanopatterns, along with applications in optics, electronics, mechanics, and biosensing. An outlook of the potential impact of nanopatterning technologies based on photonic nanojets in several relevant biomedical areas is also provided.
Collapse
Affiliation(s)
- Salvatore Surdo
- Nanoscopy, Istituto Italiano di Tecnologia, Via Enrico Melen 83, Building B, 16152 Genoa, Italy
| | - Martí Duocastella
- Nanoscopy, Istituto Italiano di Tecnologia, Via Enrico Melen 83, Building B, 16152 Genoa, Italy
- Department of Applied Physics, University of Barcelona, C/Martí i Franquès 1, 08028 Barcelona, Spain
| | - Alberto Diaspro
- Nanoscopy, Istituto Italiano di Tecnologia, Via Enrico Melen 83, Building B, 16152 Genoa, Italy
- Department of Physics, University of Genoa, Via Dodecaneso 33, 16146 Genova, Italy
| |
Collapse
|
14
|
Lamon S, Wu Y, Zhang Q, Liu X, Gu M. Nanoscale optical writing through upconversion resonance energy transfer. SCIENCE ADVANCES 2021; 7:eabe2209. [PMID: 33627427 PMCID: PMC7904262 DOI: 10.1126/sciadv.abe2209] [Citation(s) in RCA: 17] [Impact Index Per Article: 5.7] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/07/2020] [Accepted: 01/05/2021] [Indexed: 05/28/2023]
Abstract
Nanoscale optical writing using far-field super-resolution methods provides an unprecedented approach for high-capacity data storage. However, current nanoscale optical writing methods typically rely on photoinitiation and photoinhibition with high beam intensity, high energy consumption, and short device life span. We demonstrate a simple and broadly applicable method based on resonance energy transfer from lanthanide-doped upconversion nanoparticles to graphene oxide for nanoscale optical writing. The transfer of high-energy quanta from upconversion nanoparticles induces a localized chemical reduction in graphene oxide flakes for optical writing, with a lateral feature size of ~50 nm (1/20th of the wavelength) under an inhibition intensity of 11.25 MW cm-2 Upconversion resonance energy transfer may enable next-generation optical data storage with high capacity and low energy consumption, while offering a powerful tool for energy-efficient nanofabrication of flexible electronic devices.
Collapse
Affiliation(s)
- S Lamon
- Centre for Artificial-Intelligence Nanophotonics, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
- Laboratory of Artificial-Intelligence Nanophotonics, School of Science, RMIT University, Melbourne 3001, Australia
| | - Y Wu
- Department of Chemistry, National University of Singapore, Singapore 117543, Singapore
| | - Q Zhang
- Centre for Artificial-Intelligence Nanophotonics, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
| | - X Liu
- Department of Chemistry, National University of Singapore, Singapore 117543, Singapore
- The N.1 Institute for Health, National University of Singapore, Singapore 117456, Singapore
| | - M Gu
- Centre for Artificial-Intelligence Nanophotonics, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
- Laboratory of Artificial-Intelligence Nanophotonics, School of Science, RMIT University, Melbourne 3001, Australia
| |
Collapse
|
15
|
Encoding kirigami bi-materials to morph on target in response to temperature. Sci Rep 2019; 9:19499. [PMID: 31862936 PMCID: PMC6925198 DOI: 10.1038/s41598-019-56118-2] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/10/2019] [Accepted: 12/04/2019] [Indexed: 11/12/2022] Open
Abstract
Shape morphing in response to an environmental stimulus, such as temperature, light, and chemical cues, is currently pursued in synthetic analogs for manifold applications in engineering, architecture, and beyond. Existing strategies mostly resort to active, namely smart or field responsive, materials, which undergo a change of their physical properties when subjected to an external stimulus. Their ability for shape morphing is intrinsic to the atomic/molecular structure as well as the mechanochemical interactions of their constituents. Programming shape changes with active materials require manipulation of their composition through chemical synthesis. Here, we demonstrate that a pair of off-the-shelf passive solids, such as wood and silicone rubber, can be topologically arranged in a kirigami bi-material to shape-morph on target in response to a temperature stimulus. A coherent framework is introduced to enable the optimal orchestration of bi-material units that can engage temperature to collectively deploy into a geometrically rich set of periodic and aperiodic shapes that can shape-match a predefined target. The results highlight reversible morphing by mechanics and geometry, thus contributing to relax the dependence of current strategies on material chemistry and fabrication.
Collapse
|
16
|
Zhang Y, Wu C, Song Y, Si K, Zheng Y, Hu L, Chen J, Tang L, Gong W. Machine learning based adaptive optics for doughnut-shaped beam. OPTICS EXPRESS 2019; 27:16871-16881. [PMID: 31252906 DOI: 10.1364/oe.27.016871] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/14/2019] [Accepted: 05/20/2019] [Indexed: 06/09/2023]
Abstract
The doughnut-shaped beam has been widely applied in the field of super-resolution microscopic imaging, micro-nanostructure lithography, ultra-high-density storage, and laser trapping. However, how to maintain the doughnut-shaped focus inside the scattering medium becomes a challenge, due to the wavefront aberrations. Here we demonstrate a machine learning based adaptive optics method to recover the doughnut-shaped focus with high speed. In our method, the relationship between the distorted doughnut-shaped intensity point spread function and the coefficients of the first 15 Zernike modes for phase correction is established. Experimental results show that the wavefront aberration with 101,784 optical control elements can be predicted within ~17 ms even using a personal computer, and 97.5% correction accuracy can be achieved in 200 repeated tests. Besides, we successfully apply this method in the scanning microscopy theoretically. With a large number of optical control elements and fast operation speed, our method may pave the way for many important applications in bioimaging, such as deep tissue stimulated emission depletion (STED) microscopy.
Collapse
|
17
|
Brigo L, Schmidt JEM, Gandin A, Michieli N, Colombo P, Brusatin G. 3D Nanofabrication of SiOC Ceramic Structures. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2018; 5:1800937. [PMID: 30581702 PMCID: PMC6299732 DOI: 10.1002/advs.201800937] [Citation(s) in RCA: 22] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/16/2018] [Revised: 08/14/2018] [Indexed: 05/08/2023]
Abstract
Shaping ceramic materials at the nanoscale in 3D is a phenomenal engineering challenge, that can offer new opportunities in a number of industrial applications, including metamaterials, nano-electromechanical systems, photonic crystals, and damage-tolerant lightweight materials. 3D fabrication of sub-micrometer ceramic structures can be performed by two-photon laser writing of a preceramic polymer. However, polymer conversion to a fully ceramic material has proven so far unfeasible, due to lack of suitable precursors, printing complexity, and high shrinkage during ceramic conversion. Here, it is shown that this goal can be achieved through an appropriate engineering of both the material and the printing process, enabling the fabrication of preceramic 3D shapes and their transformation into dense and crack-free SiOC ceramic components with highly complex, 3D sub-micrometer architectures. This method allows for the manufacturing of components with any 3D specific geometry with fine details down to 450 nm, rapidly printing structures up to 100 µm in height that can be converted into ceramic objects possessing sub-micrometer features, offering unprecedented opportunities in different application fields.
Collapse
Affiliation(s)
- Laura Brigo
- Department of Industrial EngineeringUniversity of PadovaVia Marzolo 935131PadovaItaly
- INSTM Padova RUVia Marzolo 935131PadovaItaly
| | | | - Alessandro Gandin
- Department of Industrial EngineeringUniversity of PadovaVia Marzolo 935131PadovaItaly
- INSTM Padova RUVia Marzolo 935131PadovaItaly
| | - Niccolò Michieli
- Department of PhysicsUniversity of PadovaVia Marzolo 835131PadovaItaly
| | - Paolo Colombo
- Department of Industrial EngineeringUniversity of PadovaVia Marzolo 935131PadovaItaly
- INSTM Padova RUVia Marzolo 935131PadovaItaly
- Department of Materials Science and EngineeringThe Pennsylvania State UniversityUniversity ParkPA16802USA
| | - Giovanna Brusatin
- Department of Industrial EngineeringUniversity of PadovaVia Marzolo 935131PadovaItaly
- INSTM Padova RUVia Marzolo 935131PadovaItaly
| |
Collapse
|
18
|
In-situ photoinduced formation of self–assembled Ag NPs using POSS-TX as nano-photoinitiator in PEGMEA/PEGDA polymer matrix and creating self-wrinkled pattern. J Photochem Photobiol A Chem 2018. [DOI: 10.1016/j.jphotochem.2018.03.024] [Citation(s) in RCA: 14] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
|
19
|
Hu Q, Sun XZ, Parmenter CDJ, Fay MW, Smith EF, Rance GA, He Y, Zhang F, Liu Y, Irvine D, Tuck C, Hague R, Wildman R. Additive manufacture of complex 3D Au-containing nanocomposites by simultaneous two-photon polymerisation and photoreduction. Sci Rep 2017; 7:17150. [PMID: 29215026 PMCID: PMC5719407 DOI: 10.1038/s41598-017-17391-1] [Citation(s) in RCA: 35] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/01/2017] [Accepted: 11/19/2017] [Indexed: 11/10/2022] Open
Abstract
The fabrication of complex three-dimensional gold-containing nanocomposite structures by simultaneous two-photon polymerisation and photoreduction is demonstrated. Increased salt delivers reduced feature sizes down to line widths as small as 78 nm, a level of structural intricacy that represents a significant advance in fabrication complexity. The development of a general methodology to efficiently mix pentaerythritol triacrylate (PETA) with gold chloride hydrate (HAuCl4∙3H2O) is reported, where the gold salt concentration is adjustable on demand from zero to 20 wt%. For the first-time 7-Diethylamino-3-thenoylcoumarin (DETC) is used as the photoinitiator. Only 0.5 wt% of DETC was required to promote both polymerisation and photoreduction of up to 20 wt% of gold salt. This efficiency is the highest reported for Au-containing composite fabrication by two-photon lithography. Transmission Electron Microscopy (TEM) analysis confirmed the presence of small metallic nanoparticles (5.4 ± 1.4 nm for long axis / 3.7 ± 0.9 nm for short axis) embedded within the polymer matrix, whilst X-ray Photoelectron Spectroscopy (XPS) confirmed that they exist in the zero valent oxidation state. UV-vis spectroscopy defined that they exhibit the property of localised surface plasmon resonance (LSPR). The capability demonstrated in this study opens up new avenues for a range of applications, including plasmonics, metamaterials, flexible electronics and biosensors.
Collapse
Affiliation(s)
- Qin Hu
- Centre for Additive Manufacturing, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom.
| | - Xue-Zhong Sun
- School of Chemistry, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Christopher D J Parmenter
- Nanoscale and Microscale Research Centre, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Michael W Fay
- Nanoscale and Microscale Research Centre, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Emily F Smith
- Nanoscale and Microscale Research Centre, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Graham A Rance
- Nanoscale and Microscale Research Centre, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Yinfeng He
- Centre for Additive Manufacturing, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Fan Zhang
- Centre for Additive Manufacturing, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Yaan Liu
- Centre for Additive Manufacturing, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Derek Irvine
- Department of Chemical and Environmental Engineering, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Christopher Tuck
- Centre for Additive Manufacturing, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Richard Hague
- Centre for Additive Manufacturing, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom
| | - Ricky Wildman
- Centre for Additive Manufacturing, Faculty of Engineering, The University of Nottingham, University Park, Nottingham, NG7 2RD, United Kingdom.
| |
Collapse
|
20
|
Teodori L, Crupi A, Costa A, Diaspro A, Melzer S, Tarnok A. Three-dimensional imaging technologies: a priority for the advancement of tissue engineering and a challenge for the imaging community. JOURNAL OF BIOPHOTONICS 2017; 10:24-45. [PMID: 27110674 DOI: 10.1002/jbio.201600049] [Citation(s) in RCA: 32] [Impact Index Per Article: 4.6] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/17/2016] [Revised: 04/04/2016] [Accepted: 04/05/2016] [Indexed: 06/05/2023]
Abstract
Tissue engineering/regenerative medicine (TERM) is an interdisciplinary field that applies the principle of engineering and life sciences to restore/replace damaged tissues/organs with in vitro artificially-created ones. Research on TERM quickly moves forward. Today newest technologies and discoveries, such as 3D-/bio-printing, allow in vitro fabrication of ex-novo made tissues/organs, opening the door to wide and probably never-ending application possibilities, from organ transplant to drug discovery, high content screening and replacement of laboratory animals. Imaging techniques are fundamental tools for the characterization of tissue engineering (TE) products at any stage, from biomaterial/scaffold to construct/organ analysis. Indeed, tissue engineers need versatile imaging methods capable of monitoring not only morphological but also functional and molecular features, allowing three-dimensional (3D) and time-lapse in vivo analysis, in a non-destructive, quantitative, multidimensional analysis of TE constructs, to analyze their pre-implantation quality assessment and their fate after implantation. This review focuses on the newest developments in imaging technologies and applications in the context of requirements of the different steps of the TERM field, describing strengths and weaknesses of the current imaging approaches.
Collapse
Affiliation(s)
- Laura Teodori
- Diagnostics and Metrology Laboratory FSN-TECFIS-DIM ENEA CR Frascati, Via Enrico Fermi 44, 00044, Rome, Italy
| | - Annunziata Crupi
- Diagnostics and Metrology Laboratory FSN-TECFIS-DIM ENEA CR Frascati, Via Enrico Fermi 44, 00044, Rome, Italy
- Fondazione San Raffaele, S.S. Ceglie San Michele km 1200, 72013, Ceglie Messapica, Italy
| | - Alessandra Costa
- University of Pittsburgh McGowan Institute, 3550 Terrace St 5606, Pittsburgh, PA 15261, USA
| | - Alberto Diaspro
- Department of Nanophysics, Istituto Italiano di Tecnologia, Genova, Italy
- Dipartimento di Fisica, Università degli Studi di Genova, Genova, Italy
- Nikon Imaging Center, Genova, Italy, www.nic.iit.it
| | - Susanne Melzer
- Sächsische Inkubator für klinische Translation (SIKT), University of Leipzig, Philipp-Rosenthal-Straße 55, 04103, Leipzig, Germany
- Department of Pediatric Cardiology, HELIOS Heart Center Leipzig, University of Leipzig, Strümpellstraße 39, 04289, Leipzig, Germany
| | - Attila Tarnok
- Sächsische Inkubator für klinische Translation (SIKT), University of Leipzig, Philipp-Rosenthal-Straße 55, 04103, Leipzig, Germany
- Department of Pediatric Cardiology, HELIOS Heart Center Leipzig, University of Leipzig, Strümpellstraße 39, 04289, Leipzig, Germany
| |
Collapse
|
21
|
de Miguel G, Duocastella M, Vicidomini G, Diaspro A. λ/20 axial control in 2.5D polymerized structures fabricated with DLW lithography. OPTICS EXPRESS 2015; 23:24850-24858. [PMID: 26406685 DOI: 10.1364/oe.23.024850] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
An astonishing λ/20 height control is accomplished in 2.5D photopolymerized structures by taking advantage of the induced expansion of the resin. Our nanofabrication method is a one-pot approach with two processing steps: (i) regular 2.5D photopolymerization of the resin monomer by using multiphoton direct laser writing (DLW) lithography and (ii) spatially-selective irradiation of the photopolymerized features before development resulting in a nanometer-controlled height increase of the structure. The UV-visible-NIR sub-wavelength axial feature size (~40 nm) of this method allows fabricating devices with applications in multiple technological fields such as nanoelectronics and photonics.
Collapse
|
22
|
Abstract
Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength. At the same time, the physics and chemistry involved in employing light or particles with short wavelengths present great challenges. A new class of approaches to photolithography on the nanoscale involves the use of photoresists that can be activated with one colour of visible or near-ultraviolet light and deactivated with a second colour. Such methods hold the promise of attaining lithographic resolution that rivals or even exceeds that currently sought by industry, while at the same time using wavelengths of light that are inexpensive to produce and can be manipulated readily. The physical chemistry of 2-colour photolithography is a rich area of science that is only now beginning to be explored.
Collapse
Affiliation(s)
- John T Fourkas
- Department of Chemistry & Biochemistry, University of Maryland, College Park, MD 20742, USA.
| | | |
Collapse
|
23
|
Bianchini P, Peres C, Oneto M, Galiani S, Vicidomini G, Diaspro A. STED nanoscopy: a glimpse into the future. Cell Tissue Res 2015; 360:143-50. [PMID: 25743695 PMCID: PMC4379395 DOI: 10.1007/s00441-015-2146-3] [Citation(s) in RCA: 59] [Impact Index Per Article: 6.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/29/2015] [Accepted: 02/02/2015] [Indexed: 11/30/2022]
Abstract
The well-known saying of “Seeing is believing” became even more apt in biology when stimulated emission depletion (STED) nanoscopy was introduced in 1994 by the Nobel laureate S. Hell and coworkers. We presently stand at a juncture. Nanoscopy represented a revolution in fluorescence microscopy but now is a mature technique applied to many branches of biology, physics, chemistry, and materials science. We are currently looking ahead to the next generation of optical nanoscopes, to the new key player that will arise in the forthcoming years. This article gives an overview of the various cutting-edge implementations of STED nanoscopy and tries to shine a light into the future: imaging everything faster with unprecedented sensitivity and label-free.
Collapse
Affiliation(s)
- Paolo Bianchini
- Nanoscopy, Nanophysics, Istituto Italiano di Tecnologia, Via Morego 30, 16163, Genova, Italy,
| | | | | | | | | | | |
Collapse
|
24
|
Ross CA, Berggren KK, Cheng JY, Jung YS, Chang JB. Three-dimensional nanofabrication by block copolymer self-assembly. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2014; 26:4386-4396. [PMID: 24706521 DOI: 10.1002/adma.201400386] [Citation(s) in RCA: 60] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/24/2014] [Revised: 02/20/2014] [Indexed: 06/03/2023]
Abstract
Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of semiconductor devices, membranes, and other structures, taking advantage of microphase separation to produce well-organized nanostructures with periods of a few nm and above. However, the inherently three-dimensional structure of block copolymer microdomains could enable them to make 3D devices and structures directly, which could lead to efficient fabrication of complex heterogeneous structures. This article reviews recent progress in developing 3D nanofabrication processes based on block copolymers.
Collapse
Affiliation(s)
- Caroline A Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | | | | | | | | |
Collapse
|
25
|
Thiel M, Ott J, Radke A, Kaschke J, Wegener M. Dip-in depletion optical lithography of three-dimensional chiral polarizers. OPTICS LETTERS 2013; 38:4252-4255. [PMID: 24321972 DOI: 10.1364/ol.38.004252] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/03/2023]
Abstract
We combine the concepts of dip-in and stimulated-emission-depletion-inspired optical lithography for the first time to fabricate three-dimensional (3D) nanostructures for photonics. For depletion of the photoinitiator ITX we employ a fiber-coupled laser diode at 639 nm wavelength. To demonstrate the performance of the experimental setup, we have fabricated 3D chiral layer-by-layer twisted woodpile structures with a lattice constant reduced by more than a factor of 2 compared to earlier results. The fabricated chiral photonic crystals serve as dual-band polarizers for circular polarization at visible and telecom wavelengths. Spectroscopic measurements agree well with scattering-matrix calculations.
Collapse
|