1
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Watson HY, Ruocco A, Tiberi M, Muench JE, Balci O, Shinde SM, Mignuzzi S, Pantouvaki M, Van Thourhout D, Sordan R, Tomadin A, Sorianello V, Romagnoli M, Ferrari AC. Graphene Phase Modulators Operating in the Transparency Regime. ACS NANO 2024; 18:30269-30282. [PMID: 39436682 PMCID: PMC11544935 DOI: 10.1021/acsnano.4c02292] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/18/2024] [Revised: 09/08/2024] [Accepted: 09/12/2024] [Indexed: 10/23/2024]
Abstract
Next-generation data networks need to support Tb/s rates. In-phase and quadrature (IQ) modulation combine phase and intensity information to increase the density of encoded data, reduce overall power consumption by minimizing the number of channels, and increase noise tolerance. To reduce errors when decoding the received signal, intersymbol interference must be minimized. This is achieved with pure phase modulation, where the phase of the optical signal is controlled without changing its intensity. Phase modulators are characterized by the voltage required to achieve a π phase shift, Vπ, the device length, L, and their product, VπL. To reduce power consumption, IQ modulators are needed with <1 V drive voltages and compact (sub-cm) dimensions, which translate in VπL < 1Vcm. Si and LiNbO3 (LN) IQ modulators do not currently meet these requirements because VπL > 1Vcm. Here, we report a double single-layer graphene (SLG) Mach-Zehnder modulator (MZM) with pure phase modulation in the transparency regime, where optical losses are minimized and remain constant with increasing voltage. Our device has VπL ∼ 0.3Vcm, matching state-of-the-art SLG-based MZMs and plasmonic LN MZMs, but with pure phase modulation and low insertion loss (∼5 dB), essential for IQ modulation. Our VπL is ∼5 times lower than the lowest thin-film LN MZMs and ∼3 times lower than the lowest Si MZMs. This enables devices with complementary metal-oxide semiconductor compatible VπL (<1Vcm) and smaller footprint than LN or Si MZMs, improving circuit density and reducing power consumption by 1 order of magnitude.
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Affiliation(s)
- Hannah
F. Y. Watson
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Alfonso Ruocco
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Matteo Tiberi
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Jakob E. Muench
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Osman Balci
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Sachin M. Shinde
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Sandro Mignuzzi
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | | | | | - Roman Sordan
- Politecnico
di Milano, Polo di Como,
Via Anzani 42, Como 22100, Italy
| | - Andrea Tomadin
- Dipartimento
di Fisica, Università di Pisa, Largo Bruno Pontecorvo 3, Pisa 56127, Italy
| | - Vito Sorianello
- Photonic
Networks and Technologies Lab, CNIT, Pisa 56124, Italy
| | - Marco Romagnoli
- Photonic
Networks and Technologies Lab, CNIT, Pisa 56124, Italy
| | - Andrea C. Ferrari
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
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2
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Tang X, Jiang H, Lin Z, Wang X, Wang W, Li G. Wafer-Scale Vertical 1D GaN Nanorods/2D MoS 2/PEDOT:PSS for Piezophototronic Effect-Enhanced Self-Powered Flexible Photodetectors. NANO-MICRO LETTERS 2024; 17:56. [PMID: 39497008 PMCID: PMC11534966 DOI: 10.1007/s40820-024-01553-8] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/05/2024] [Accepted: 09/29/2024] [Indexed: 11/06/2024]
Abstract
van der Waals (vdW) heterostructures constructed by low-dimensional (0D, 1D, and 2D) materials are emerging as one of the most appealing systems in next-generation flexible photodetection. Currently, hand-stacked vdW-type photodetectors are not compatible with large-area-array fabrication and show unimpressive performance in self-powered mode. Herein, vertical 1D GaN nanorods arrays (NRAs)/2D MoS2/PEDOT:PSS in wafer scale have been proposed for self-powered flexible photodetectors arrays firstly. The as-integrated device without external bias under weak UV illumination exhibits a competitive responsivity of 1.47 A W-1 and a high detectivity of 1.2 × 1011 Jones, as well as a fast response speed of 54/71 µs, thanks to the strong light absorption of GaN NRAs and the efficient photogenerated carrier separation in type-II heterojunction. Notably, the strain-tunable photodetection performances of device have been demonstrated. Impressively, the device at - 0.78% strain and zero bias reveals a significantly enhanced photoresponse with a responsivity of 2.47 A W-1, a detectivity of 2.6 × 1011 Jones, and response times of 40/45 µs, which are superior to the state-of-the-art self-powered flexible photodetectors. This work presents a valuable avenue to prepare tunable vdWs heterostructures for self-powered flexible photodetection, which performs well in flexible sensors.
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Affiliation(s)
- Xin Tang
- State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou, 510640, People's Republic of China
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640, People's Republic of China
| | - Hongsheng Jiang
- State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou, 510640, People's Republic of China
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640, People's Republic of China
| | - Zhengliang Lin
- State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou, 510640, People's Republic of China
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640, People's Republic of China
| | - Xuan Wang
- State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou, 510640, People's Republic of China
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640, People's Republic of China
| | - Wenliang Wang
- State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou, 510640, People's Republic of China.
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640, People's Republic of China.
| | - Guoqiang Li
- State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou, 510640, People's Republic of China.
- Department of Electronic Materials, School of Materials Science and Engineering, South China University of Technology, Guangzhou, 510640, People's Republic of China.
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3
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Lu M, Hui E, Brockhoff M, Träuble J, Fernandez-Villegas A, Burton OJ, Lamb J, Ward E, Woodhams PJ, Tadbier W, Läubli NF, Hofmann S, Kaminski CF, Lombardo A, Kaminski Schierle GS. Graphene Microelectrode Arrays, 4D Structured Illumination Microscopy, and a Machine Learning Spike Sorting Algorithm Permit the Analysis of Ultrastructural Neuronal Changes During Neuronal Signaling in a Model of Niemann-Pick Disease Type C. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024:e2402967. [PMID: 39340823 DOI: 10.1002/advs.202402967] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/21/2024] [Revised: 08/04/2024] [Indexed: 09/30/2024]
Abstract
Simultaneously recording network activity and ultrastructural changes of the synapse is essential for advancing understanding of the basis of neuronal functions. However, the rapid millisecond-scale fluctuations in neuronal activity and the subtle sub-diffraction resolution changes of synaptic morphology pose significant challenges to this endeavor. Here, specially designed graphene microelectrode arrays (G-MEAs) are used, which are compatible with high spatial resolution imaging across various scales as well as permit high temporal resolution electrophysiological recordings to address these challenges. Furthermore, alongside G-MEAs, an easy-to-implement machine learning algorithm is developed to efficiently process the large datasets collected from MEA recordings. It is demonstrated that the combined use of G-MEAs, machine learning (ML) spike analysis, and 4D structured illumination microscopy (SIM) enables monitoring the impact of disease progression on hippocampal neurons which are treated with an intracellular cholesterol transport inhibitor mimicking Niemann-Pick disease type C (NPC), and show that synaptic boutons, compared to untreated controls, significantly increase in size, leading to a loss in neuronal signaling capacity.
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Affiliation(s)
- Meng Lu
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Ernestine Hui
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Marius Brockhoff
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Jakob Träuble
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Ana Fernandez-Villegas
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Oliver J Burton
- Department of Engineering, University of Cambridge, 9 JJ Thomson Ave, Cambridge, CB3 0FA, UK
| | - Jacob Lamb
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Edward Ward
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Philippa J Woodhams
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Wadood Tadbier
- Department of Engineering, University of Cambridge, 9 JJ Thomson Ave, Cambridge, CB3 0FA, UK
| | - Nino F Läubli
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, 9 JJ Thomson Ave, Cambridge, CB3 0FA, UK
| | - Clemens F Kaminski
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - Antonio Lombardo
- University College London, 17-19 Gordon Street, London, WC1H 0AH, UK
| | - Gabriele S Kaminski Schierle
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
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4
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Liu B, Hou J, Wang K, Xu C, Zhang Q, Gu L, Zhou W, Li Q, Wang J, Liu H. Surface Charge Regulation of Graphene by Fluorine and Chlorine Co-Doping for Constructing Ultra-Stable and Large Energy Density Micro-Supercapacitors. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024:e2402033. [PMID: 39294103 DOI: 10.1002/advs.202402033] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/26/2024] [Revised: 04/30/2024] [Indexed: 09/20/2024]
Abstract
Settling the structure stacking of graphene (G) nanosheets to maintain the high dispersity has been an intense issue to facilitate their practical application in the microelectronics-related devices. Herein, the co-doping of the highest electronegative fluorine (F) and large atomic radius chlorine (Cl) into G via a one-step electrochemical exfoliation protocol is engineered to actualize the ultralong cycling stability for flexible micro-supercapacitors (MSCs). Density functional theoretical calculations unveiled that the F into G can form the "ionic" C─F bond to increase the repulsive force between nanosheets, and the introduction of Cl can enlarge the layer spacing of G as well as increase active sites by accumulating the charge on pore defects. The co-doping of F and Cl generates the strong synergy to achieve high reversible capacitance and sturdy structure stability for G. The as-constructed aqueous gel-based MSC exhibited the superb cycling stability for 500,000 cycles with no capacitance loss and structure stacking. Furthermore, the ionic liquid gel-based MSC demonstrated a high energy density of 113.9 mW h cm-3 under high voltage of up to 3.5 V. The current work enlightens deep insights into the design and scalable preparation of high-performance co-doped G electrode candidate in the field of flexible microelectronics.
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Affiliation(s)
- Binbin Liu
- Institute for Advanced Interdisciplinary Research (iAIR), Shandong Provincial Key Laboratory of Preparation and Measurement of Building Materials, Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, University of Jinan, Jinan, Shandong, 250022, P. R. China
- Department of Materials Science and Engineering, National University of Singapore, Singapore, 117574, Singapore
| | - Jiagang Hou
- Kyiv College at Qilu University of Technology, Qilu University of Technology, Shandong Academy of Sciences, Jinan, Shandong, 250353, P. R. China
| | - Kai Wang
- Institute for Advanced Interdisciplinary Research (iAIR), Shandong Provincial Key Laboratory of Preparation and Measurement of Building Materials, Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, University of Jinan, Jinan, Shandong, 250022, P. R. China
- Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing, 100190, P. R. China
| | - Caixia Xu
- Institute for Advanced Interdisciplinary Research (iAIR), Shandong Provincial Key Laboratory of Preparation and Measurement of Building Materials, Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, University of Jinan, Jinan, Shandong, 250022, P. R. China
| | - Qinghua Zhang
- Institute of Physics, Matter Physics, Chinese Academy of Sciences/Beijing National Laboratory for Condensed, Beijing, 100190, P. R. China
| | - Lin Gu
- Institute of Physics, Matter Physics, Chinese Academy of Sciences/Beijing National Laboratory for Condensed, Beijing, 100190, P. R. China
| | - Weijia Zhou
- Institute for Advanced Interdisciplinary Research (iAIR), Shandong Provincial Key Laboratory of Preparation and Measurement of Building Materials, Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, University of Jinan, Jinan, Shandong, 250022, P. R. China
| | - Qian Li
- Institute for Advanced Interdisciplinary Research (iAIR), Shandong Provincial Key Laboratory of Preparation and Measurement of Building Materials, Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, University of Jinan, Jinan, Shandong, 250022, P. R. China
| | - John Wang
- Department of Materials Science and Engineering, National University of Singapore, Singapore, 117574, Singapore
| | - Hong Liu
- Institute for Advanced Interdisciplinary Research (iAIR), Shandong Provincial Key Laboratory of Preparation and Measurement of Building Materials, Collaborative Innovation Center of Technology and Equipment for Biological Diagnosis and Therapy in Universities of Shandong, University of Jinan, Jinan, Shandong, 250022, P. R. China
- State Key Laboratory of Crystal Materials, Shandong University, Jinan, Shandong, 250100, P. R. China
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5
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Akhavan S, Najafabadi AT, Mignuzzi S, Jalebi MA, Ruocco A, Paradisanos I, Balci O, Andaji-Garmaroudi Z, Goykhman I, Occhipinti LG, Lidorikis E, Stranks SD, Ferrari AC. Graphene-Perovskite Fibre Photodetectors. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2400703. [PMID: 38824387 DOI: 10.1002/adma.202400703] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/14/2024] [Revised: 05/13/2024] [Indexed: 06/03/2024]
Abstract
The integration of optoelectronic devices, such as transistors and photodetectors (PDs), into wearables and textiles is of great interest for applications such as healthcare and physiological monitoring. These require flexible/wearable systems adaptable to body motions, thus materials conformable to non-planar surfaces, and able to maintain performance under mechanical distortions. Here, fibre PDs are prepared by combining rolled graphene layers and photoactive perovskites. Conductive fibres (~500 Ωcm-1) are made by rolling single-layer graphene (SLG) around silica fibres, followed by deposition of a dielectric layer (Al2O3 and parylene C), another rolled SLG as a channel, and perovskite as photoactive component. The resulting gate-tunable PD has a response time~9ms, with an external responsivity~22kAW-1 at 488nm for a 1V bias. The external responsivity is two orders of magnitude higher, and the response time one order of magnitude faster, than state-of-the-art wearable fibre-based PDs. Under bending at 4mm radius, up to~80% photocurrent is maintained. Washability tests show~72% of initial photocurrent after 30 cycles, promising for wearable applications.
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Affiliation(s)
- S Akhavan
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
| | - A Taheri Najafabadi
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
| | - S Mignuzzi
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
| | - M Abdi Jalebi
- Cavendish Laboratory, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0HE, UK
| | - A Ruocco
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
- Optical Networks Group, University College London, London, WC1E 6BT, UK
| | - I Paradisanos
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
| | - O Balci
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
| | - Z Andaji-Garmaroudi
- Cavendish Laboratory, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0HE, UK
| | - I Goykhman
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
- Technion - Israel Institute of Technology, Haifa, 3200003, Israel
| | - L G Occhipinti
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
| | - E Lidorikis
- Department of Materials Science and Engineering, University of Ioannina, Ioannina, 45110, Greece
| | - S D Stranks
- Department of Chemical Engineering and Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge, CB3 0AS, UK
| | - A C Ferrari
- Cambridge Graphene Centre, University of Cambridge, JJ Thompson Avenue, Cambridge, CB3 0FA, UK
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6
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Chakraborti H, Gorini C, Knothe A, Liu MH, Makk P, Parmentier FD, Perconte D, Richter K, Roulleau P, Sacépé B, Schönenberger C, Yang W. Electron wave and quantum optics in graphene. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2024; 36:393001. [PMID: 38697131 DOI: 10.1088/1361-648x/ad46bc] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/04/2023] [Accepted: 05/01/2024] [Indexed: 05/04/2024]
Abstract
In the last decade, graphene has become an exciting platform for electron optical experiments, in some aspects superior to conventional two-dimensional electron gases (2DEGs). A major advantage, besides the ultra-large mobilities, is the fine control over the electrostatics, which gives the possibility of realising gap-less and compact p-n interfaces with high precision. The latter host non-trivial states,e.g., snake states in moderate magnetic fields, and serve as building blocks of complex electron interferometers. Thanks to the Dirac spectrum and its non-trivial Berry phase, the internal (valley and sublattice) degrees of freedom, and the possibility to tailor the band structure using proximity effects, such interferometers open up a completely new playground based on novel device architectures. In this review, we introduce the theoretical background of graphene electron optics, fabrication methods used to realise electron-optical devices, and techniques for corresponding numerical simulations. Based on this, we give a comprehensive review of ballistic transport experiments and simple building blocks of electron optical devices both in single and bilayer graphene, highlighting the novel physics that is brought in compared to conventional 2DEGs. After describing the different magnetic field regimes in graphene p-n junctions and nanostructures, we conclude by discussing the state of the art in graphene-based Mach-Zender and Fabry-Perot interferometers.
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Affiliation(s)
| | - Cosimo Gorini
- Université Paris-Saclay, CEA, CNRS, SPEC, 91191 Gif-sur-Yvette, France
| | - Angelika Knothe
- Institut für Theoretische Physik, Universität Regensburg, D-93040 Regensburg, Germany
| | - Ming-Hao Liu
- Department of Physics and Center for Quantum Frontiers of Research and Technology (QFort), National Cheng Kung University, Tainan 70101, Taiwan
| | - Péter Makk
- Department of Physics, Institute of Physics, Budapest University of Technology and Economics, Műegyetem rkp. 3., Budapest H-1111, Hungary
- MTA-BME Correlated van der Waals Structures Momentum Research Group, Műegyetem rkp. 3., Budapest H-1111, Hungary
| | | | - David Perconte
- Université Grenoble Alpes, CNRS, Grenoble INP, Institut Néel, 38000 Grenoble, France
| | - Klaus Richter
- Institut für Theoretische Physik, Universität Regensburg, D-93040 Regensburg, Germany
| | - Preden Roulleau
- Université Paris-Saclay, CEA, CNRS, SPEC, 91191 Gif-sur-Yvette, France
| | - Benjamin Sacépé
- Université Grenoble Alpes, CNRS, Grenoble INP, Institut Néel, 38000 Grenoble, France
| | | | - Wenmin Yang
- Université Grenoble Alpes, CNRS, Grenoble INP, Institut Néel, 38000 Grenoble, France
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7
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Planillo J, Grbovic D, Alves F. Experimental demonstration of cyclotron emissions in micro-scale graphene structures. Sci Rep 2024; 14:13879. [PMID: 38880814 PMCID: PMC11180662 DOI: 10.1038/s41598-024-64051-2] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/19/2024] [Accepted: 06/04/2024] [Indexed: 06/18/2024] Open
Abstract
A solid-state implementation of a cyclotron radiation source consisting of arrays of semicircular geometries was designed, fabricated, and characterized on commercially available graphene on hBN substrates. Using a 10 µm design radius and device width, respectively, such devices were expected to emit a continuous band of radiation spanning from 3 to 6 GHz with a power 3.96 nW. A peak emission was detected at 4.15 GHz with an effective array gain of 22 dB. This is the first known experimental measurement of cyclotron radiation from a curved planar graphene geometry. With scaling, it may be possible achieve frequencies in the THz range with such a device.
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Affiliation(s)
- Jordan Planillo
- Naval Postgraduate School, Monterey, CA, USA.
- Naval Air Warfare Center Weapons Division, Point Mugu, CA, USA.
| | | | - Fabio Alves
- Naval Postgraduate School, Monterey, CA, USA
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8
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Pham PV, Mai TH, Dash SP, Biju V, Chueh YL, Jariwala D, Tung V. Transfer of 2D Films: From Imperfection to Perfection. ACS NANO 2024; 18:14841-14876. [PMID: 38810109 PMCID: PMC11171780 DOI: 10.1021/acsnano.4c00590] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/14/2024] [Revised: 04/03/2024] [Accepted: 04/12/2024] [Indexed: 05/31/2024]
Abstract
Atomically thin 2D films and their van der Waals heterostructures have demonstrated immense potential for breakthroughs and innovations in science and technology. Integrating 2D films into electronics and optoelectronics devices and their applications in electronics and optoelectronics can lead to improve device efficiencies and tunability. Consequently, there has been steady progress in large-area 2D films for both front- and back-end technologies, with a keen interest in optimizing different growth and synthetic techniques. Parallelly, a significant amount of attention has been directed toward efficient transfer techniques of 2D films on different substrates. Current methods for synthesizing 2D films often involve high-temperature synthesis, precursors, and growth stimulants with highly chemical reactivity. This limitation hinders the widespread applications of 2D films. As a result, reports concerning transfer strategies of 2D films from bare substrates to target substrates have proliferated, showcasing varying degrees of cleanliness, surface damage, and material uniformity. This review aims to evaluate, discuss, and provide an overview of the most advanced transfer methods to date, encompassing wet, dry, and quasi-dry transfer methods. The processes, mechanisms, and pros and cons of each transfer method are critically summarized. Furthermore, we discuss the feasibility of these 2D film transfer methods, concerning their applications in devices and various technology platforms.
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Affiliation(s)
- Phuong V. Pham
- Department
of Physics, National Sun Yat-sen University, Kaohsiung 80424, Taiwan
| | - The-Hung Mai
- Department
of Physics, National Sun Yat-sen University, Kaohsiung 80424, Taiwan
| | - Saroj P. Dash
- Department
of Microtechnology and Nanoscience, Chalmers
University of Technology, Gothenburg 41296, Sweden
| | - Vasudevanpillai Biju
- Research
Institute for Electronic Science, Hokkaido
University, Hokkaido 001-0020, Japan
| | - Yu-Lun Chueh
- Department
of Materials Science and Engineering, National
Tsing Hua University, Hsinchu 30013, Taiwan
| | - Deep Jariwala
- Department
of Electrical and Systems Engineering, University
of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Vincent Tung
- Department
of Chemical System Engineering, School of Engineering, The University of Tokyo, Tokyo 113-8656, Japan
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9
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Wang B, Shen L, He Y, Chen C, Yang Z, Fei L, Xu J, Li B, Lin H. Covalent Organic Framework/Graphene Hybrids: Synthesis, Properties, and Applications. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2310174. [PMID: 38126899 DOI: 10.1002/smll.202310174] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/07/2023] [Revised: 12/12/2023] [Indexed: 12/23/2023]
Abstract
To address current energy crises and environmental concerns, it is imperative to develop and design versatile porous materials ideal for water purification and energy storage. The advent of covalent organic frameworks (COFs), a revolutionary terrain of porous materials, is underscored by their superlative features such as divinable structure, adjustable aperture, and high specific surface area. However, issues like inferior electric conductivity, inaccessible active sites impede mass transfer and poor processability of bulky COFs restrict their wider application. As a herculean stride forward, COF/graphene hybrids amalgamate the strengths of their constituent components and have in consequence, enticed significant scientific intrigue. Herein, the current progress on the structure and properties of graphene-based materials and COFs are systematically outlined. Then, synthetic strategies for preparing COF/graphene hybrids, including one-pot synthesis, ex situ synthesis, and in situ growth, are comprehensively reviewed. Afterward, the pivotal attributes of COF/graphene hybrids are dissected in conjunction with their multifaceted applications spanning adsorption, separation, catalysis, sensing, and energy storage. Finally, this review is concluded by elucidating prevailing challenges and gesturing toward prospective strides within the realm of COF/graphene hybrids research.
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Affiliation(s)
- Boya Wang
- College of Geography and Environmental Sciences, Zhejiang Normal University, Jinhua, 321004, China
- Key Laboratory of Watershed Earth Surface Processes and Ecological Security, Zhejiang Normal University, Jinhua, 321004, China
| | - Liguo Shen
- College of Geography and Environmental Sciences, Zhejiang Normal University, Jinhua, 321004, China
- Key Laboratory of Watershed Earth Surface Processes and Ecological Security, Zhejiang Normal University, Jinhua, 321004, China
| | - Yabing He
- College of Chemistry and Materials Sciences, Zhejiang Normal University, Jinhua, 321004, China
| | - Cheng Chen
- College of Geography and Environmental Sciences, Zhejiang Normal University, Jinhua, 321004, China
- Key Laboratory of Watershed Earth Surface Processes and Ecological Security, Zhejiang Normal University, Jinhua, 321004, China
| | - Zhi Yang
- Department of Environmental Science, Zhejiang University, Hangzhou, Zhejiang, 310058, China
| | - Lingya Fei
- College of Geography and Environmental Sciences, Zhejiang Normal University, Jinhua, 321004, China
- Key Laboratory of Watershed Earth Surface Processes and Ecological Security, Zhejiang Normal University, Jinhua, 321004, China
| | - Jiujing Xu
- College of Geography and Environmental Sciences, Zhejiang Normal University, Jinhua, 321004, China
- Key Laboratory of Watershed Earth Surface Processes and Ecological Security, Zhejiang Normal University, Jinhua, 321004, China
| | - Bisheng Li
- College of Geography and Environmental Sciences, Zhejiang Normal University, Jinhua, 321004, China
- Key Laboratory of Watershed Earth Surface Processes and Ecological Security, Zhejiang Normal University, Jinhua, 321004, China
| | - Hongjun Lin
- College of Geography and Environmental Sciences, Zhejiang Normal University, Jinhua, 321004, China
- Key Laboratory of Watershed Earth Surface Processes and Ecological Security, Zhejiang Normal University, Jinhua, 321004, China
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10
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Zhu Y, Zhang J, Cheng T, Tang J, Duan H, Hu Z, Shao J, Wang S, Wei M, Wu H, Li A, Li S, Balci O, Shinde SM, Ramezani H, Wang L, Lin L, Ferrari AC, Yakobson BI, Peng H, Jia K, Liu Z. Controlled Growth of Single-Crystal Graphene Wafers on Twin-Boundary-Free Cu(111) Substrates. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2308802. [PMID: 37878366 DOI: 10.1002/adma.202308802] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/29/2023] [Revised: 10/05/2023] [Indexed: 10/26/2023]
Abstract
Single-crystal graphene (SCG) wafers are needed to enable mass-electronics and optoelectronics owing to their excellent properties and compatibility with silicon-based technology. Controlled synthesis of high-quality SCG wafers can be done exploiting single-crystal Cu(111) substrates as epitaxial growth substrates recently. However, current Cu(111) films prepared by magnetron sputtering on single-crystal sapphire wafers still suffer from in-plane twin boundaries, which degrade the SCG chemical vapor deposition. Here, it is shown how to eliminate twin boundaries on Cu and achieve 4 in. Cu(111) wafers with ≈95% crystallinity. The introduction of a temperature gradient on Cu films with designed texture during annealing drives abnormal grain growth across the whole Cu wafer. In-plane twin boundaries are eliminated via migration of out-of-plane grain boundaries. SCG wafers grown on the resulting single-crystal Cu(111) substrates exhibit improved crystallinity with >97% aligned graphene domains. As-synthesized SCG wafers exhibit an average carrier mobility up to 7284 cm2 V-1 s-1 at room temperature from 103 devices and a uniform sheet resistance with only 5% deviation in 4 in. region.
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Affiliation(s)
- Yeshu Zhu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Jincan Zhang
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Ting Cheng
- Department of Materials Science & NanoEngineering, Rice University, Houston, TX, 77005, USA
| | - Jilin Tang
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Hongwei Duan
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, P. R. China
| | - Zhaoning Hu
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
- School of Materials Science and Engineering, Peking University, Beijing, 100871, P. R. China
| | - Jiaxin Shao
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Shiwei Wang
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Mingyue Wei
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Haotian Wu
- School of Materials Science and Engineering, Peking University, Beijing, 100871, P. R. China
| | - Ang Li
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
- College of Science, China University of Petroleum, Beijing, 102249, P. R. China
| | - Sheng Li
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Osman Balci
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Sachin M Shinde
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Hamideh Ramezani
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Luda Wang
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, School of Integrated Circuits, Peking University, Beijing, 100871, P. R. China
| | - Li Lin
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
- School of Materials Science and Engineering, Peking University, Beijing, 100871, P. R. China
| | - Andrea C Ferrari
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Boris I Yakobson
- Department of Materials Science & NanoEngineering, Rice University, Houston, TX, 77005, USA
- Department of Chemistry, Rice University, Houston, TX, 77005, USA
| | - Hailin Peng
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Kaicheng Jia
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Zhongfan Liu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Technology Innovation Center of Graphene Metrology and Standardization for State Market Regulation, Beijing Graphene Institute, Beijing, 100095, P. R. China
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11
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Zhou W, Ma T, Tian Y, Jiang Y, Yu X. Dielectric engineered graphene transistors for high-performance near-infrared photodetection. iScience 2024; 27:109314. [PMID: 38450152 PMCID: PMC10915625 DOI: 10.1016/j.isci.2024.109314] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/15/2023] [Revised: 01/05/2024] [Accepted: 02/17/2024] [Indexed: 03/08/2024] Open
Abstract
Graphene, known for its ultrahigh carrier mobility and broadband optical absorption, holds significant potential in optoelectronics. However, the carrier mobility of graphene on silicon substrates experienced a marked decrease due to surface roughness, phonon scattering affects. Here we report carrier mobility enhancement of graphene dielectric engineering. Through the fabrication of devices utilizing Si/SiO2/Al2O3/graphene layers and subsequent electrical characterization, our findings illustrate the navigable nature of the Al2O3 dielectric layer is navigable for reducing the SiO2 phonon scattering and increasing graphene's carrier mobility by up to ∼8000 cm2V-1s-1. Furthermore, the improvement in carrier mobility of graphene has been utilized in the hybrid near-infrared photodetector, resulting in outstanding responsivity of ∼400 AW-1, detectivity of ∼2.2 ✕ 1011 Jones in the graphene/Ag2Te detector. Our study establishes pathways for the seamless integration of graphene or other 2D materials within the standard CMOS processes, thereby facilitating the fabrication of advanced optoelectronic devices.
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Affiliation(s)
- Weijian Zhou
- College of Optical and Electronic Technology, China Jiliang University, Hangzhou 310013, China
| | - Tieying Ma
- College of Optical and Electronic Technology, China Jiliang University, Hangzhou 310013, China
| | - Ye Tian
- Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123, China
| | - Yixin Jiang
- College of Optical and Electronic Technology, China Jiliang University, Hangzhou 310013, China
| | - Xuechao Yu
- Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, Jiangsu 215123, China
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12
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Chen BY, Chen BW, Uen WY, Chen C, Chuang C, Tsai DS. Magnetoresistance properties in nickel-catalyzed, air-stable, uniform, and transfer-free graphene. NANOTECHNOLOGY 2024; 35:205706. [PMID: 38286015 DOI: 10.1088/1361-6528/ad2381] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/25/2023] [Accepted: 01/29/2024] [Indexed: 01/31/2024]
Abstract
A transfer-free graphene with high magnetoresistance (MR) and air stability has been synthesized using nickel-catalyzed atmospheric pressure chemical vapor deposition. The Raman spectrum and Raman mapping reveal the monolayer structure of the transfer-free graphene, which has low defect density, high uniformity, and high coverage (>90%). The temperature-dependent (from 5 to 300 K) current-voltage (I-V) and resistance measurements are performed, showing the semiconductor properties of the transfer-free graphene. Moreover, the MR of the transfer-free graphene has been measured over a wide temperature range (5-300 K) under a magnetic field of 0 to 1 T. As a result of the Lorentz force dominating above 30 K, the transfer-free graphene exhibits positive MR values, reaching ∼8.7% at 300 K under a magnetic field (1 Tesla). On the other hand, MR values are negative below 30 K due to the predominance of the weak localization effect. Furthermore, the temperature-dependent MR values of transfer-free graphene are almost identical with and without a vacuum annealing process, indicating that there are low density of defects and impurities after graphene fabrication processes so as to apply in air-stable sensor applications. This study opens avenues to develop 2D nanomaterial-based sensors for commercial applications in future devices.
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Affiliation(s)
- Bo-Yu Chen
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
- Department of Physics, National Taiwan University, Taipei, 10617, Taiwan
| | - Bo-Wei Chen
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
| | - Wu-Yih Uen
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
| | - Chi Chen
- Research Center for Applied Science, Academia Sinica, Taipei, 11529, Taiwan
| | - Chiashain Chuang
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
- Research Center for Semiconductor Materials and Advanced Optics, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
| | - Dung-Sheng Tsai
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
- Research Center for Semiconductor Materials and Advanced Optics, Chung Yuan Christian University, Taoyuan, 32023, Taiwan
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13
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Katiyar AK, Hoang AT, Xu D, Hong J, Kim BJ, Ji S, Ahn JH. 2D Materials in Flexible Electronics: Recent Advances and Future Prospectives. Chem Rev 2024; 124:318-419. [PMID: 38055207 DOI: 10.1021/acs.chemrev.3c00302] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/07/2023]
Abstract
Flexible electronics have recently gained considerable attention due to their potential to provide new and innovative solutions to a wide range of challenges in various electronic fields. These electronics require specific material properties and performance because they need to be integrated into a variety of surfaces or folded and rolled for newly formatted electronics. Two-dimensional (2D) materials have emerged as promising candidates for flexible electronics due to their unique mechanical, electrical, and optical properties, as well as their compatibility with other materials, enabling the creation of various flexible electronic devices. This article provides a comprehensive review of the progress made in developing flexible electronic devices using 2D materials. In addition, it highlights the key aspects of materials, scalable material production, and device fabrication processes for flexible applications, along with important examples of demonstrations that achieved breakthroughs in various flexible and wearable electronic applications. Finally, we discuss the opportunities, current challenges, potential solutions, and future investigative directions about this field.
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Affiliation(s)
- Ajit Kumar Katiyar
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Anh Tuan Hoang
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Duo Xu
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Juyeong Hong
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Beom Jin Kim
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Seunghyeon Ji
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Jong-Hyun Ahn
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
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14
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Scott RJ, Valencia-Acuna P, Zhao H. Spatiotemporal Observation of Quasi-Ballistic Transport of Electrons in Graphene. ACS NANO 2023; 17:25368-25376. [PMID: 38091261 DOI: 10.1021/acsnano.3c08816] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/27/2023]
Abstract
We report spatiotemporal observations of room-temperature quasi-ballistic electron transport in graphene, which is achieved by utilizing a four-layer van der Waals heterostructure to generate free charge carriers. The heterostructure is formed by sandwiching a MoS2 and MoSe2 heterobilayer between two graphene monolayers. Transient absorption measurements reveal that the electrons and holes separated by the type-II interface between MoS2 and MoSe2 can transfer to the two graphene layers, respectively. Transient absorption microscopy measurements, with high spatial and temporal resolution, reveal that while the holes in one graphene layer undergo a classical diffusion process with a large diffusion coefficient of 65 cm2 s-1 and a charge mobility of 5000 cm2 V-1 s-1, the electrons in the other graphene layer exhibit a quasi-ballistic transport feature, with a ballistic transport time of 20 ps and a speed of 22 km s-1, respectively. The different in-plane transport properties confirm that electrons and holes move independently of each other as charge carriers. The optical generation of ballistic charge carriers suggests potential applications for such van der Waals heterostructures as optoelectronic materials.
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Affiliation(s)
- Ryan J Scott
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
| | - Pavel Valencia-Acuna
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
| | - Hui Zhao
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
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15
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Shukla G, Bisht RS, Kumar P. Predicting the miniaturization limit of vertical organic field effect transistor (VOFET) with perforated graphene as a source electrode. NANOTECHNOLOGY 2023; 35:035201. [PMID: 37820593 DOI: 10.1088/1361-6528/ad0242] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/02/2023] [Accepted: 10/11/2023] [Indexed: 10/13/2023]
Abstract
Vertical organic field effect transistors (VOFETs) are of paramount importance due to their fast switching speed, low power consumption, and higher density on a chip compared to lateral OFETs. The low charge carrier mobility in organic semiconductors and longer channel lengths in lateral OFETs lead to higher operating voltages. The channel length in VOFETs can be less than 100 nm which reduces the size of the channel and hence the operating voltages. Another important factor in the operation of VOFETs is the thickness and width of the source electrode. The channel length, source electrode thickness and width sets the miniaturization limit of the VOFETs. The graphene monolayer can be exploited as a source electrode due to its thinness, high carrier mobility, and metallic behaviors. However, for better gate modulation, perforations in the source material are desired. Here, we simulate the VOFET having perforated graphene monolayer as a source electrode and n-type organic semiconductor N, N'-dioctyl-3,4,9,10-perylenedicarboximide (PTCDI-C8) as an active channel material, while aluminum as a drain electrode to predict the best-miniaturized device. The miniaturization limit of such a VOFET has a limit to the gate opening/perforation in which the minimum source width is 10 nm, as in the sub 10 nm range graphene starts behaving like a semiconductor. The subthreshold swing, deduced from the drain current (JD) versus gate voltage (VG) graph, advocates the limit of the organic semiconductor height/channel length to 50 nm, while 50 nm for the gate.
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Affiliation(s)
- Gaurav Shukla
- Department of Physics, Indian Institute of Technology Bombay, Maharashtra, 400076, India
| | - Ramesh Singh Bisht
- Department of Physics, Indian Institute of Technology Bombay, Maharashtra, 400076, India
| | - Pramod Kumar
- Department of Physics, Indian Institute of Technology Bombay, Maharashtra, 400076, India
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16
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Izquierdo-López R, Fandan R, Boscá A, Calle F, Pedrós J. Surface-acoustic-wave-driven graphene plasmonic sensor for fingerprinting ultrathin biolayers down to the monolayer limit. Biosens Bioelectron 2023; 237:115498. [PMID: 37423065 DOI: 10.1016/j.bios.2023.115498] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/16/2023] [Revised: 05/14/2023] [Accepted: 06/23/2023] [Indexed: 07/11/2023]
Abstract
Surface plasmon polaritons in graphene can enhance the performance of mid-infrared spectroscopy, which is key for the study of both the composition and the conformation of organic molecules via their vibrational resonances. In this paper, a plasmonic biosensor using a graphene-based van der Waals heterostructure on a piezoelectric substrate is theoretically demonstrated, where far-field light is coupled to surface plasmon-phonon polaritons (SPPPs) through a surface acoustic wave (SAW). The SAW creates an electrically-controlled virtual diffraction grating, suppressing the need for patterning the 2D materials, that limits the polariton lifetime, and enabling differential measurement schemes, which increase the signal-to-noise ratio and allow a quick commutation between reference and sample signals. A transfer matrix method has been used for simulating the SPPPs propagating in the system, which are electrically tuned to interact with the vibrational resonances of the analytes. Furthermore, the analysis of the sensor response with a coupled oscillators model has proven its capability of fingerprinting ultrathin biolayers, even when the interaction is too weak to induce a Fano interference pattern, with a sensitivity down to the monolayer limit, as tested with a protein bilayer or a peptide monolayer. The proposed device paves the way for the development of advanced SAW-assisted lab-on-chip systems combining the existing SAW-mediated physical sensing and microfluidic functionalities with the chemical fingerprinting capability of this novel SAW-driven plasmonic approach.
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Affiliation(s)
- Raúl Izquierdo-López
- Instituto de Sistemas Optoelectrónicos y Microtecnología, Departamento de Ingeniería Electrónica, E.T.S.I. de Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, Madrid, 28040, Spain.
| | - Rajveer Fandan
- Instituto de Sistemas Optoelectrónicos y Microtecnología, Departamento de Ingeniería Electrónica, E.T.S.I. de Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, Madrid, 28040, Spain
| | - Alberto Boscá
- Instituto de Sistemas Optoelectrónicos y Microtecnología, Departamento de Ingeniería Electrónica, E.T.S.I. de Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, Madrid, 28040, Spain
| | - Fernando Calle
- Instituto de Sistemas Optoelectrónicos y Microtecnología, Departamento de Ingeniería Electrónica, E.T.S.I. de Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, Madrid, 28040, Spain
| | - Jorge Pedrós
- Instituto de Sistemas Optoelectrónicos y Microtecnología, Departamento de Ingeniería Electrónica, E.T.S.I. de Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, Madrid, 28040, Spain.
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17
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Thodkar K, Gramm F. Enhanced Mobility in Suspended Chemical Vapor-Deposited Graphene Field-Effect Devices in Ambient Conditions. ACS APPLIED MATERIALS & INTERFACES 2023; 15:37756-37763. [PMID: 37490848 PMCID: PMC10416145 DOI: 10.1021/acsami.3c04012] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/21/2023] [Accepted: 07/11/2023] [Indexed: 07/27/2023]
Abstract
High-field-effect mobility and the two-dimensional nature of graphene films make it an interesting material for developing sensing applications with high sensitivity and low power consumption. The chemical vapor deposition process allows for producing high-quality graphene films in a scalable manner. Considering the significant impact of the underlying substrate on the graphene device performance, methods to enhance the field-effect mobility are highly desired. This work demonstrates a simplified fabrication process to develop suspended, two-terminal chemical vapor deposition (CVD) graphene devices with enhanced field-effect mobility operating at room temperature. Enhanced hole field-effect mobility of up to ∼4.8 × 104 cm2/Vs and average hole mobility >1 × 104 cm2/Vs across all of the devices is demonstrated. A gradual increase in the width of the graphene device resulted in the increase of the full width at half-maximum (FWHM) of field-effect characteristics and a decrease in the field-effect mobility. Our work presents a simplified fabrication approach to realize high-mobility suspended CVD graphene devices, beneficial for developing CVD graphene-related applications.
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Affiliation(s)
- Kishan Thodkar
- Micro-
& Nanosystems, Department of Mechanical & Process Engineering,
Tannenstrasse 3, ETH Zurich, 8052 Zurich, Switzerland
| | - Fabian Gramm
- ScopeM,
Otto-Stern-Weg 3, ETH Zurich, 8093 Zurich, Switzerland
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18
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Hong S, Hong CU, Lee S, Jang M, Jang C, Lee Y, Widiapradja LJ, Park S, Kim K, Son YW, Yook JG, Im S. Ultrafast van der Waals diode using graphene quantum capacitance and Fermi-level depinning. SCIENCE ADVANCES 2023; 9:eadh9770. [PMID: 37467332 DOI: 10.1126/sciadv.adh9770] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/26/2023] [Accepted: 06/16/2023] [Indexed: 07/21/2023]
Abstract
Graphene, with superior electrical tunabilities, has arisen as a multifunctional insertion layer in vertically stacked devices. Although the role of graphene inserted in metal-semiconductor junctions has been well investigated in quasi-static charge transport regime, the implication of graphene insertion at ultrahigh frequencies has rarely been considered. Here, we demonstrate the diode operation of vertical Pt/n-MoSe2/graphene/Au assemblies at ~200-GHz cutoff frequency (fC). The electric charge modulation by the inserted graphene becomes essentially frozen above a few GHz frequencies due to graphene quantum capacitance-induced delay, so that the Ohmic graphene/MoSe2 junction may be transformed to a pinning-free Schottky junction. Our diodes exhibit much lower total capacitance than devices without graphene insertion, deriving an order of magnitude higher fC, which clearly demonstrates the merit of graphene at high frequencies.
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Affiliation(s)
- Sungjae Hong
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
| | - Chang-Ui Hong
- Department of Electrical Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Sol Lee
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul 03722, Republic of Korea
| | - Myeongjin Jang
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul 03722, Republic of Korea
| | - Chorom Jang
- Department of Electrical Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Yangjin Lee
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul 03722, Republic of Korea
| | - Livia Janice Widiapradja
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
| | - Sam Park
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
| | - Kwanpyo Kim
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul 03722, Republic of Korea
| | - Young-Woo Son
- School of Computational Sciences, Korea Institute for Advanced Study, Seoul 02455, Republic of Korea
| | - Jong-Gwan Yook
- Department of Electrical Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Seongil Im
- Department of Physics, Van der Waals Materials Research Center, Yonsei University, Seoul 03722, Republic of Korea
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19
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Potočnik T, Burton O, Reutzel M, Schmitt D, Bange JP, Mathias S, Geisenhof FR, Weitz RT, Xin L, Joyce HJ, Hofmann S, Alexander-Webber JA. Fast Twist Angle Mapping of Bilayer Graphene Using Spectroscopic Ellipsometric Contrast Microscopy. NANO LETTERS 2023. [PMID: 37289669 DOI: 10.1021/acs.nanolett.3c00619] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Twisted bilayer graphene provides an ideal solid-state model to explore correlated material properties and opportunities for a variety of optoelectronic applications, but reliable, fast characterization of the twist angle remains a challenge. Here we introduce spectroscopic ellipsometric contrast microscopy (SECM) as a tool for mapping twist angle disorder in optically resonant twisted bilayer graphene. We optimize the ellipsometric angles to enhance the image contrast based on measured and calculated reflection coefficients of incident light. The optical resonances associated with van Hove singularities correlate well to Raman and angle-resolved photoelectron emission spectroscopy, confirming the accuracy of SECM. The results highlight the advantages of SECM, which proves to be a fast, nondestructive method for characterization of twisted bilayer graphene over large areas, unlocking process, material, and device screening and cross-correlative measurement potential for bilayer and multilayer materials.
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Affiliation(s)
- Teja Potočnik
- Department of Engineering, University of Cambridge, 9 JJ Thompson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Oliver Burton
- Department of Engineering, University of Cambridge, 9 JJ Thompson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Marcel Reutzel
- I. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
| | - David Schmitt
- I. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
| | - Jan Philipp Bange
- I. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
| | - Stefan Mathias
- I. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
| | - Fabian R Geisenhof
- Physics of Nanosystems, Department of Physics, Ludwig-Maximilians-Universität München, Geschwister-Scholl-Platz 1, Munich 80539, Germany
| | - R Thomas Weitz
- I. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
- Physics of Nanosystems, Department of Physics, Ludwig-Maximilians-Universität München, Geschwister-Scholl-Platz 1, Munich 80539, Germany
| | - Linyuan Xin
- Department of Engineering, University of Cambridge, 9 JJ Thompson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Hannah J Joyce
- Department of Engineering, University of Cambridge, 9 JJ Thompson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, 9 JJ Thompson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Jack A Alexander-Webber
- Department of Engineering, University of Cambridge, 9 JJ Thompson Avenue, Cambridge CB3 0FA, United Kingdom
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20
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Sorianello V, Montanaro A, Giambra MA, Ligato N, Templ W, Galli P, Romagnoli M. Graphene Photonics I/Q Modulator for Advanced Modulation Formats. ACS PHOTONICS 2023; 10:1446-1453. [PMID: 37215326 PMCID: PMC10197173 DOI: 10.1021/acsphotonics.3c00015] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 01/09/2023] [Indexed: 05/24/2023]
Abstract
Starting from its classical domain of long distance links, optical communication is conquering new application areas down to chip-to-chip interconnections in response to the ever-increasing demand for higher bandwidth. The use of coherent modulation formats, typically employed in long-haul systems, is now debated to be extended to short links to increase the bandwidth density. Next-generation transceivers are targeting high bandwidth, high energy efficiency, compact footprint, and low cost. Integrated photonics is the only technology to reach this goal, and silicon photonics is expected to play the leading actor. However, silicon modulators have some limits, in terms of bandwidth and footprint. Graphene is an ideal material to be integrated with silicon photonics to meet the requirements of next generation transceivers. This material provides optimal properties: high mobility, fast carrier dynamics and ultrabroadband optical properties. Graphene photonics for direct detection systems based on binary modulation formats have been demonstrated so far, including electro-absorption modulators, phase modulators, and photodetectors. However, coherent modulation for increased data-rates has not yet been reported for graphene photonics yet. In this work, we present the first graphene photonics I/Q modulator based on four graphene on silicon electro-absorption modulators for advanced modulation formats and demonstrate quadrature phase shift keying (QPSK) modulation up to 40 Gb/s.
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Affiliation(s)
- Vito Sorianello
- Photonic
Networks and Technologies Lab − CNIT, Via G. Moruzzi 1, 56124 Pisa, Italy
| | - Alberto Montanaro
- Photonic
Networks and Technologies Lab − CNIT, Via G. Moruzzi 1, 56124 Pisa, Italy
- Tecip
Institute − Scuola Superiore Sant’Anna, Via G. Moruzzi 1, 56124 Pisa, Italy
| | | | - Nadia Ligato
- INPHOTEC,
CamGraPhIC srl, Via G.
Moruzzi 1, 56124 Pisa, Italy
| | - Wolfgang Templ
- Nokia
Bell Laboratories, Magirusstr. 10, 70469 Stuttgart, Germany
| | - Paola Galli
- Nokia
Solutions and Networks Italia, via Energy Park 14, 20871 Vimercate, Italy
| | - Marco Romagnoli
- Photonic
Networks and Technologies Lab − CNIT, Via G. Moruzzi 1, 56124 Pisa, Italy
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21
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Lanza M, Hui F, Wen C, Ferrari AC. Resistive Switching Crossbar Arrays Based on Layered Materials. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2205402. [PMID: 36094019 DOI: 10.1002/adma.202205402] [Citation(s) in RCA: 9] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/14/2022] [Revised: 08/25/2022] [Indexed: 06/15/2023]
Abstract
Resistive switching (RS) devices are metal/insulator/metal cells that can change their electrical resistance when electrical stimuli are applied between the electrodes, and they can be used to store and compute data. Planar crossbar arrays of RS devices can offer a high integration density (>108 devices mm- 2 ) and this can be further enhanced by stacking them three-dimensionally. The advantage of using layered materials (LMs) in RS devices compared to traditional phase-change materials and metal oxides is that their electrical properties can be adjusted with a higher precision. Here, the key figures-of-merit and procedures to implement LM-based RS devices are defined. LM-based RS devices fabricated using methods compatible with industry are identified and discussed. The focus is on small devices (size < 9 µm2 ) arranged in crossbar structures, since larger devices may be affected by artifacts, such as grain boundaries and flake junctions. How to enhance device performance, so to accelerate the development of this technology, is also discussed.
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Affiliation(s)
- Mario Lanza
- Physical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Fei Hui
- School of Materials Science and Engineering, The Key Laboratory of Material, Processing and Mold of the Ministry of Education, Henan Key Laboratory of Advanced, Nylon Materials and Application, Zhengzhou University, Zhengzhou, 450001, P. R. China
| | - Chao Wen
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Andrea C Ferrari
- Cambridge Graphene Centre, University of Cambridge, Cambridge, CB3 0FA, UK
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22
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Valencia-Acuna P, Rudayni F, Rijal K, Chan WL, Zhao H. Hybrid Heterostructures to Generate Long-Lived and Mobile Photocarriers in Graphene. ACS NANO 2023; 17:3939-3947. [PMID: 36795092 DOI: 10.1021/acsnano.2c12577] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
We report the generation of long-lived and highly mobile photocarriers in hybrid van der Waals heterostructures that are formed by monolayer graphene, few-layer transition metal dichalcogenides, and the organic semiconductor F8ZnPc. Samples are fabricated by dry transfer of mechanically exfoliated MoS2 or WS2 few-layer flakes on a graphene film, followed by deposition of F8ZnPc. Transient absorption microscopy measurements are performed to study the photocarrier dynamics. In heterostructures of F8ZnPc/few-layer-MoS2/graphene, electrons excited in F8ZnPc can transfer to graphene and thus be separated from the holes that reside in F8ZnPc. By increasing the thickness of MoS2, these electrons acquire long recombination lifetimes of over 100 ps and a high mobility of 2800 cm2 V-1 s-1. Graphene doping with mobile holes is also demonstrated with WS2 as the middle layers. These artificial heterostructures can improve the performance of graphene-based optoelectronic devices.
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Affiliation(s)
- Pavel Valencia-Acuna
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
| | - Fatimah Rudayni
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
- Department of Physics, Jazan University, Jazan 45142, Saudi Arabia
| | - Kushal Rijal
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
| | - Wai-Lun Chan
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
| | - Hui Zhao
- Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045, United States
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23
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Burton OJ, Winter Z, Watanabe K, Taniguchi T, Beschoten B, Stampfer C, Hofmann S. Putting High-Index Cu on the Map for High-Yield, Dry-Transferred CVD Graphene. ACS NANO 2023; 17:1229-1238. [PMID: 36594782 PMCID: PMC9878973 DOI: 10.1021/acsnano.2c09253] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/16/2022] [Accepted: 12/15/2022] [Indexed: 06/17/2023]
Abstract
Reliable, clean transfer and interfacing of 2D material layers are technologically as important as their growth. Bringing both together remains a challenge due to the vast, interconnected parameter space. We introduce a fast-screening descriptor approach to demonstrate holistic data-driven optimization across the entirety of process steps for the graphene-Cu model system. We map the crystallographic dependences of graphene chemical vapor deposition, interfacial Cu oxidation to decouple graphene, and its dry delamination across inverse pole figures. Their overlay enables us to identify hitherto unexplored (168) higher index Cu orientations as overall optimal orientations. We show the effective preparation of such Cu orientations via epitaxial close-space sublimation and achieve mechanical transfer with a very high yield (>95%) and quality of graphene domains, with room-temperature electron mobilities in the range of 40000 cm2/(V s). Our approach is readily adaptable to other descriptors and 2D material systems, and we discuss the opportunities of such a holistic optimization.
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Affiliation(s)
- Oliver J. Burton
- Department
of Engineering, University of Cambridge, CambridgeCB3 0FA, United Kingdom
| | - Zachary Winter
- 2nd
Institute of Physics A and JARA-FIT, RWTH
Aachen University, 52074Aachen, Germany
| | - Kenji Watanabe
- Research
Center for Functional Materials, National
Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki305-0044, Japan
| | - Takashi Taniguchi
- International
Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki305-0044, Japan
| | - Bernd Beschoten
- 2nd
Institute of Physics A and JARA-FIT, RWTH
Aachen University, 52074Aachen, Germany
| | - Christoph Stampfer
- 2nd
Institute of Physics A and JARA-FIT, RWTH
Aachen University, 52074Aachen, Germany
- Peter
Grünberg Institute (PGI-9), Forschungszentrum
Jülich, 52425Jülich, Germany
| | - Stephan Hofmann
- Department
of Engineering, University of Cambridge, CambridgeCB3 0FA, United Kingdom
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24
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Wang S, Liu X, Xu M, Liu L, Yang D, Zhou P. Two-dimensional devices and integration towards the silicon lines. NATURE MATERIALS 2022; 21:1225-1239. [PMID: 36284239 DOI: 10.1038/s41563-022-01383-2] [Citation(s) in RCA: 62] [Impact Index Per Article: 31.0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/08/2022] [Accepted: 09/14/2022] [Indexed: 06/16/2023]
Abstract
Despite technical efforts and upgrades, advances in complementary metal-oxide-semiconductor circuits have become unsustainable in the face of inherent silicon limits. New materials are being sought to compensate for silicon deficiencies, and two-dimensional materials are considered promising candidates due to their atomically thin structures and exotic physical properties. However, a potentially applicable method for incorporating two-dimensional materials into silicon platforms remains to be illustrated. Here we try to bridge two-dimensional materials and silicon technology, from integrated devices to monolithic 'on-silicon' (silicon as the substrate) and 'with-silicon' (silicon as a functional component) circuits, and discuss the corresponding requirements for material synthesis, device design and circuitry integration. Finally, we summarize the role played by two-dimensional materials in the silicon-dominated semiconductor industry and suggest the way forward, as well as the technologies that are expected to become mainstream in the near future.
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Affiliation(s)
- Shuiyuan Wang
- Shanghai Key Lab for Future Computing Hardware and System, School of Microelectronics, Fudan University, Shanghai, China
| | - Xiaoxian Liu
- Shanghai Key Lab for Future Computing Hardware and System, School of Microelectronics, Fudan University, Shanghai, China
| | - Mingsheng Xu
- State Key Laboratory of Silicon Materials, School of Micro-Nano Electronics & Materials Science and Engineering, Zhejiang University, Hangzhou, China
| | - Liwei Liu
- Frontier Institute of Chip and System & Qizhi Institute, Fudan University, Shanghai, China
| | - Deren Yang
- State Key Laboratory of Silicon Materials, School of Micro-Nano Electronics & Materials Science and Engineering, Zhejiang University, Hangzhou, China
| | - Peng Zhou
- Shanghai Key Lab for Future Computing Hardware and System, School of Microelectronics, Fudan University, Shanghai, China.
- Frontier Institute of Chip and System & Qizhi Institute, Fudan University, Shanghai, China.
- Hubei Yangtze Memory Laboratories, Wuhan, China.
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25
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Gao P, Yang M, Wang C, Li H, Yang B, Zheng Z, Huo N, Gao W, Luo D, Li J. Low-pressure PVD growth SnS/InSe vertical heterojunctions with type-II band alignment for typical nanoelectronics. NANOSCALE 2022; 14:14603-14612. [PMID: 36156046 DOI: 10.1039/d2nr04165k] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Two-dimensional (2D) polarization-sensitive detection as a new photoelectric application technology is extensively investigated. However, most devices are mainly based on individual anisotropic materials, which suffer from large dark current and relatively low anisotropic ratio, limiting the practical application in polarized imaging system. Herein, we design a van der Waals (vdWs) p-type SnS/n-type InSe vertical heterojunction with proposed type-II band alignment via low-pressure physical vapor deposition (LPPVD) and dry transfer method. The performance compared with the distinctive thickness of anisotropic SnS component was first studied. The fabricated device with a thick (80 nm) SnS nanosheet exhibits a larger rectification ratio exceeding 103. Moreover, the SnS/InSe heterostructure shows a broadband spectral photoresponse from 405 to 1100 nm with a significant photovoltaic effect. Due to efficient photogenerated carrier separation across the wide depletion region at zero bias, the device with thinner (12.4 nm) SnS exhibits trade-off photoresponse performance with a maximum responsivity of 215 mA W-1, an external quantum efficiency of 42.2%, specific detectivity of 1.05 × 1010 Jones, and response time of 8.6/4.2 ms under 635 nm illumination, respectively. In contrast, benefiting from the stronger in-plane anisotropic structure of thinner SnS component, the device delivers a large photocurrent anisotropic ratio of 4.6 under 635 nm illumination in a zigzag manner. Above all, our work provides a new design scheme for multifunctional optoelectronic applications based on thickness-dependent 2D vdWs heterostructures.
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Affiliation(s)
- Peng Gao
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Mengmeng Yang
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Chuanglei Wang
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Hengyi Li
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Baoxiang Yang
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Zhaoqiang Zheng
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Nengjie Huo
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Wei Gao
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
| | - Dongxiang Luo
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- Huangpu Hydrogen Innovation Center/Guangzhou Key Laboratory for Clean Energy and Materials, School of Chemistry and Chemical Engineering, Guangzhou University, Guangzhou 510006, PR China
| | - Jingbo Li
- Institute of Semiconductors, South China Normal University, Guangzhou 510631, P. R. China.
- Guangdong Provincial Key Laboratory of Chip and Integration Technology, Guangzhou 510631, China
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, P. R. China
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26
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Yang W, Hu Z, Zhang C, Guo Y, Zhao J. Screen printing preparation of high-performance flexible planar micro-supercapacitors based on MoS2 nanoparticles decorated electrochemically exfoliated graphene. Electrochim Acta 2022. [DOI: 10.1016/j.electacta.2022.141041] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
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27
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Rodríguez-Villanueva S, Mendoza F, Weiner BR, Morell G. Graphene Film Growth on Silicon Carbide by Hot Filament Chemical Vapor Deposition. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:3033. [PMID: 36080070 PMCID: PMC9458213 DOI: 10.3390/nano12173033] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/26/2022] [Revised: 08/24/2022] [Accepted: 08/27/2022] [Indexed: 06/15/2023]
Abstract
The electrical properties of graphene on dielectric substrates, such as silicon carbide (SiC), have received much attention due to their interesting applications. This work presents a method to grow graphene on a 6H-SiC substrate at a pressure of 35 Torr by using the hot filament chemical vapor deposition (HFCVD) technique. The graphene deposition was conducted in an atmosphere of methane and hydrogen at a temperature of 950 °C. The graphene films were analyzed using Raman spectroscopy, scanning electron microscopy, atomic force microscopy, energy dispersive X-ray, and X-ray photoelectron spectroscopy. Raman mapping and AFM measurements indicated that few-layer and multilayer graphene were deposited from the external carbon source depending on the growth parameter conditions. The compositional analysis confirmed the presence of graphene deposition on SiC substrates and the absence of any metal involved in the growth process.
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Affiliation(s)
- Sandra Rodríguez-Villanueva
- Department of Physics, College of Natural Science, Rio Piedras Campus, University of Puerto Rico, San Juan, PR 00925, USA
- Molecular Sciences Research Center, University of Puerto Rico, San Juan, PR 00927, USA
| | - Frank Mendoza
- Department of Physics, College of Arts and Sciences, Mayagüez Campus, University of Puerto Rico, Mayaguez, PR 00682, USA
| | - Brad R. Weiner
- Molecular Sciences Research Center, University of Puerto Rico, San Juan, PR 00927, USA
- Department of Chemistry, College of Natural Science, Rio Piedras Campus, University of Puerto Rico, San Juan, PR 00925, USA
| | - Gerardo Morell
- Department of Physics, College of Natural Science, Rio Piedras Campus, University of Puerto Rico, San Juan, PR 00925, USA
- Molecular Sciences Research Center, University of Puerto Rico, San Juan, PR 00927, USA
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28
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Zhao Y, Song Y, Hu Z, Wang W, Chang Z, Zhang Y, Lu Q, Wu H, Liao J, Zou W, Gao X, Jia K, Zhuo L, Hu J, Xie Q, Zhang R, Wang X, Sun L, Li F, Zheng L, Wang M, Yang J, Mao B, Fang T, Wang F, Zhong H, Liu W, Yan R, Yin J, Zhang Y, Wei Y, Peng H, Lin L, Liu Z. Large-area transfer of two-dimensional materials free of cracks, contamination and wrinkles via controllable conformal contact. Nat Commun 2022; 13:4409. [PMID: 35906212 PMCID: PMC9338253 DOI: 10.1038/s41467-022-31887-z] [Citation(s) in RCA: 21] [Impact Index Per Article: 10.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/19/2022] [Accepted: 07/07/2022] [Indexed: 11/29/2022] Open
Abstract
The availability of graphene and other two-dimensional (2D) materials on a wide range of substrates forms the basis for large-area applications, such as graphene integration with silicon-based technologies, which requires graphene on silicon with outperforming carrier mobilities. However, 2D materials were only produced on limited archetypal substrates by chemical vapor deposition approaches. Reliable after-growth transfer techniques, that do not produce cracks, contamination, and wrinkles, are critical for layering 2D materials onto arbitrary substrates. Here we show that, by incorporating oxhydryl groups-containing volatile molecules, the supporting films can be deformed under heat to achieve a controllable conformal contact, enabling the large-area transfer of 2D films without cracks, contamination, and wrinkles. The resulting conformity with enhanced adhesion facilitates the direct delamination of supporting films from graphene, providing ultraclean surfaces and carrier mobilities up to 1,420,000 cm2 V−1 s−1 at 4 K. Reliable transfer techniques are critical for the integration of 2D materials with arbitrary substrates. Here, the authors describe a method to transfer 4-inch and A4-sized defect-free graphene films onto rigid and flexible substrates with controllable conformal contact, leading to improved electrical properties and uniformity.
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Affiliation(s)
- Yixuan Zhao
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Yuqing Song
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China.,Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Zhaoning Hu
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Wendong Wang
- Department of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK
| | - Zhenghua Chang
- LNM, Institute of Mechanics Chinese Academy of Sciences, Beijing, P. R. China.,School of Engineering Sciences, University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Yan Zhang
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Qi Lu
- Beijing Graphene Institute, Beijing, 100095, P. R. China.,State Key Laboratory of Heavy Oil Processing, College of Science, China University of Petroleum, Beijing, 102249, P. R. China
| | - Haotian Wu
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Junhao Liao
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China.,CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Chinese Academy of Sciences, Beijing, 100190, P. R. China
| | - Wentao Zou
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Xin Gao
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China.,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
| | - Kaicheng Jia
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - La Zhuo
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Jingyi Hu
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
| | - Qin Xie
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China
| | - Rui Zhang
- Department of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK
| | - Xiaorui Wang
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Luzhao Sun
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Fangfang Li
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Liming Zheng
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Ming Wang
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Jiawei Yang
- Beijing Graphene Institute, Beijing, 100095, P. R. China.,Key Laboratory of Opto-Electronics Technology Ministry of Education College of Electronic Science and Technology Faculty of Information Technology, Beijing University of Technology, Beijing, 100190, P. R. China
| | - Boyang Mao
- Department of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK
| | - Tiantian Fang
- Beijing National Laboratory for Molecular Sciences, National Centre for Mass Spectrometry in Beijing, CAS Key Laboratory of Analytical Chemistry for Living Biosystems, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, P. R. China
| | - Fuyi Wang
- Beijing National Laboratory for Molecular Sciences, National Centre for Mass Spectrometry in Beijing, CAS Key Laboratory of Analytical Chemistry for Living Biosystems, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, P. R. China
| | - Haotian Zhong
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Wenlin Liu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Rui Yan
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Jianbo Yin
- Beijing Graphene Institute, Beijing, 100095, P. R. China
| | - Yanfeng Zhang
- School of Materials Science and Engineering, Peking University, Beijing, 100871, P. R. China
| | - Yujie Wei
- LNM, Institute of Mechanics Chinese Academy of Sciences, Beijing, P. R. China. .,School of Engineering Sciences, University of Chinese Academy of Sciences, Beijing, 100049, P. R. China.
| | - Hailin Peng
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China. .,Beijing Graphene Institute, Beijing, 100095, P. R. China. .,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China.
| | - Li Lin
- School of Materials Science and Engineering, Peking University, Beijing, 100871, P. R. China.
| | - Zhongfan Liu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China. .,Beijing Graphene Institute, Beijing, 100095, P. R. China. .,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China.
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29
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Piccinini G, Mišeikis V, Novelli P, Watanabe K, Taniguchi T, Polini M, Coletti C, Pezzini S. Moiré-Induced Transport in CVD-Based Small-Angle Twisted Bilayer Graphene. NANO LETTERS 2022; 22:5252-5259. [PMID: 35776918 PMCID: PMC9284678 DOI: 10.1021/acs.nanolett.2c01114] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
To realize the applicative potential of 2D twistronic devices, scalable synthesis and assembly techniques need to meet stringent requirements in terms of interface cleanness and twist-angle homogeneity. Here, we show that small-angle twisted bilayer graphene assembled from separated CVD-grown graphene single-crystals can ensure high-quality transport properties, determined by a device-scale-uniform moiré potential. Via low-temperature dual-gated magnetotransport, we demonstrate the hallmarks of a 2.4°-twisted superlattice, including tunable regimes of interlayer coupling, reduced Fermi velocity, large interlayer capacitance, and density-independent Brown-Zak oscillations. The observation of these moiré-induced electrical transport features establishes CVD-based twisted bilayer graphene as an alternative to "tear-and-stack" exfoliated flakes for fundamental studies, while serving as a proof-of-concept for future large-scale assembly.
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Affiliation(s)
- Giulia Piccinini
- NEST,
Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy
- Center
for Nanotechnology Innovation @NEST, Istituto
Italiano di Tecnologia, Piazza San Silvestro 12, 56127 Pisa, Italy
| | - Vaidotas Mišeikis
- Center
for Nanotechnology Innovation @NEST, Istituto
Italiano di Tecnologia, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene
Laboratories, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy
| | - Pietro Novelli
- Istituto
Italiano di Tecnologia, Via Melen 83, 16152 Genova, Italy
| | - Kenji Watanabe
- Research
Center for Functional Materials, National
Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Takashi Taniguchi
- International
Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Marco Polini
- Graphene
Laboratories, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy
- Dipartimento
di Fisica, Università di Pisa, Largo Bruno Pontecorvo 3, 56127 Pisa, Italy
| | - Camilla Coletti
- Center
for Nanotechnology Innovation @NEST, Istituto
Italiano di Tecnologia, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene
Laboratories, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy
| | - Sergio Pezzini
- NEST,
Istituto Nanoscienze-CNR and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy
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30
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Vangelidis I, Bellas DV, Suckow S, Dabos G, Castilla S, Koppens FHL, Ferrari AC, Pleros N, Lidorikis E. Unbiased Plasmonic-Assisted Integrated Graphene Photodetectors. ACS PHOTONICS 2022; 9:1992-2007. [PMID: 35726242 PMCID: PMC9204831 DOI: 10.1021/acsphotonics.2c00100] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/17/2022] [Indexed: 05/10/2023]
Abstract
Photonic integrated circuits (PICs) for next-generation optical communication interconnects and all-optical signal processing require efficient (∼A/W) and fast (≥25 Gbs-1) light detection at low (
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Affiliation(s)
- Ioannis Vangelidis
- Department
of Materials Science and Engineering, University
of Ioannina, Ioannina 45110, Greece
| | - Dimitris V. Bellas
- Department
of Materials Science and Engineering, University
of Ioannina, Ioannina 45110, Greece
- Department
of Informatics, Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Thessaloniki 57001, Greece
| | - Stephan Suckow
- AMO
GmbH, Advanced Microelectronic Center Aachen (AMICA), Otto-Blumenthal-Strasse 25, Aachen 52074, Germany
| | - George Dabos
- Department
of Informatics, Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Thessaloniki 57001, Greece
| | - Sebastián Castilla
- ICFO
- Institut de Ciències Fotòniques, The Barcelona Institute of Science and Technology, Castelldefels, Barcelona 08860, Spain
| | - Frank H. L. Koppens
- ICFO
- Institut de Ciències Fotòniques, The Barcelona Institute of Science and Technology, Castelldefels, Barcelona 08860, Spain
- ICREA
- Institució Catalana de Recerca i Estudis Avançats, Barcelona 08010, Spain
| | - Andrea C. Ferrari
- Cambridge
Graphene Centre, University of Cambridge, Cambridge CB3 0FA, U.K.
| | - Nikos Pleros
- Department
of Informatics, Center for Interdisciplinary Research and Innovation, Aristotle University of Thessaloniki, Thessaloniki 57001, Greece
| | - Elefterios Lidorikis
- Department
of Materials Science and Engineering, University
of Ioannina, Ioannina 45110, Greece
- University
Research Center of Ioannina (URCI), Institute of Materials Science
and Computing, Ioannina 45110, Greece
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31
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Huang Z, Cuniberto E, Park S, Kisslinger K, Wu Q, Taniguchi T, Watanabe K, Yager KG, Shahrjerdi D. Mechanisms of Interface Cleaning in Heterostructures Made from Polymer-Contaminated Graphene. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2201248. [PMID: 35388971 DOI: 10.1002/smll.202201248] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/25/2022] [Indexed: 06/14/2023]
Abstract
Heterostructures obtained from layered assembly of 2D materials such as graphene and hexagonal boron nitride have potential in the development of new electronic devices. Whereas various materials techniques can now produce macroscopic scale graphene, the construction of similar size heterostructures with atomically clean interfaces is still unrealized. A primary barrier has been the inability to remove polymeric residues from the interfaces that arise between layers when fabricating heterostructures. Here, the interface cleaning problem of polymer-contaminated heterostructures is experimentally studied from an energy viewpoint. With this approach, it is established that the interface cleaning mechanism involves a combination of thermally activated polymer residue mobilization and their mechanical actuation. This framework allows a systematic approach for fabricating record large-area clean heterostructures from polymer-contaminated graphene. These heterostructures provide state-of-the-art electronic performance. This study opens new strategies for the scalable production of layered materials heterostructures.
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Affiliation(s)
- Zhujun Huang
- Electrical and Computer Engineering, New York University, Brooklyn, NY, 11201, USA
| | - Edoardo Cuniberto
- Electrical and Computer Engineering, New York University, Brooklyn, NY, 11201, USA
| | - Suji Park
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, 11973, USA
| | - Kim Kisslinger
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, 11973, USA
| | - Qin Wu
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, 11973, USA
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute of Materials Science, 1-1 Namiki Tsukuba, Ibaraki, 305-0044, Japan
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute of Materials Science, 1-1 Namiki Tsukuba, Ibaraki, 305-0044, Japan
| | - Kevin G Yager
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, 11973, USA
| | - Davood Shahrjerdi
- Electrical and Computer Engineering, New York University, Brooklyn, NY, 11201, USA
- Center for Quantum Phenomena, Physics Department, New York University, New York, NY, 10003, USA
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32
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Pogna EA, Tomadin A, Balci O, Soavi G, Paradisanos I, Guizzardi M, Pedrinazzi P, Mignuzzi S, Tielrooij KJ, Polini M, Ferrari AC, Cerullo G. Electrically Tunable Nonequilibrium Optical Response of Graphene. ACS NANO 2022; 16:3613-3624. [PMID: 35188753 PMCID: PMC9098177 DOI: 10.1021/acsnano.1c04937] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/10/2021] [Accepted: 01/06/2022] [Indexed: 06/14/2023]
Abstract
The ability to tune the optical response of a material via electrostatic gating is crucial for optoelectronic applications, such as electro-optic modulators, saturable absorbers, optical limiters, photodetectors, and transparent electrodes. The band structure of single layer graphene (SLG), with zero-gap, linearly dispersive conduction and valence bands, enables an easy control of the Fermi energy, EF, and of the threshold for interband optical absorption. Here, we report the tunability of the SLG nonequilibrium optical response in the near-infrared (1000-1700 nm/0.729-1.240 eV), exploring a range of EF from -650 to 250 meV by ionic liquid gating. As EF increases from the Dirac point to the threshold for Pauli blocking of interband absorption, we observe a slow-down of the photobleaching relaxation dynamics, which we attribute to the quenching of optical phonon emission from photoexcited charge carriers. For EF exceeding the Pauli blocking threshold, photobleaching eventually turns into photoinduced absorption, because the hot electrons' excitation increases the SLG absorption. The ability to control both recovery time and sign of the nonequilibrium optical response by electrostatic gating makes SLG ideal for tunable saturable absorbers with controlled dynamics.
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Affiliation(s)
- Eva A.
A. Pogna
- NEST,
Istituto Nanoscienze-CNR and Scuola Normale Superiore, 56127 Pisa, Italy
- Dipartimento
di Fisica, Politecnico di Milano, P.zza Leonardo da Vinci 32, 20133 Milano, Italy
| | - Andrea Tomadin
- Dipartimento
di Fisica, Università di Pisa, Largo Bruno Pontecorvo 3, 56127 Pisa, Italy
| | - Osman Balci
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Giancarlo Soavi
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
- Institute
of Solid State Physics, Friedrich Schiller
University Jena, Jena 07743, Germany
| | - Ioannis Paradisanos
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Michele Guizzardi
- Dipartimento
di Fisica, Politecnico di Milano, P.zza Leonardo da Vinci 32, 20133 Milano, Italy
| | - Paolo Pedrinazzi
- L-NESS,
Department of Physics, Politecnico di Milano, Via Anzani 42, Como 22100, Italy
| | - Sandro Mignuzzi
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Klaas-Jan Tielrooij
- Catalan
Institute of Nanoscience and Nanotechnology (ICN2), BIST & CSIC, Campus UAB, Bellaterra, Barcelona 08193, Spain
| | - Marco Polini
- Dipartimento
di Fisica, Università di Pisa, Largo Bruno Pontecorvo 3, 56127 Pisa, Italy
- Istituto
Italiano di Tecnologia, Graphene Laboratories, Via Morego 30, 16163 Genova, Italy
| | - Andrea C. Ferrari
- Cambridge
Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, U.K.
| | - Giulio Cerullo
- Dipartimento
di Fisica, Politecnico di Milano, P.zza Leonardo da Vinci 32, 20133 Milano, Italy
- Istituto
di Fotonica e Nanotecnologie, Consiglio
Nazionale delle Ricerche, Piazza L. da Vinci 32, 20133 Milano, Italy
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33
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Zhao K, Wei Z, Xia J. 主族层状低维半导体的偏振光探测器. CHINESE SCIENCE BULLETIN-CHINESE 2022. [DOI: 10.1360/tb-2022-0126] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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34
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Fabrication and Characterization of Micrometer Scale Graphene Structures for Large-Scale Ultra-Thin Electronics. ELECTRONICS 2022. [DOI: 10.3390/electronics11050752] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/01/2023]
Abstract
Graphene offers many useful properties that can revolutionize modern electronic devices. Specifically, it provides high charge carrier mobility in a mechanically robust, atomically thin form factor. Many of these properties are observed in graphene which is prepared from exfoliated graphite and processed with electron beam lithography. These processes are both time intensive and cost- prohibitive for the large-scale production necessary for use in consumer electronics. This work details the processing and characterization of commercially available graphene from chemical vapor deposition (CVD) on SiO2/Si and on hBN-layered SiO2/Si wafers using conventional photolithography on the 4″ wafer standard. The findings indicate that the CVD graphene films are resilient after processing even for lengths up to 1 mm. Electrical characterization via resistance measurements and the Hall Effect at room temperature clearly indicates the influence of the substrate material on the graphene’s electrical properties. At these length scales, graphene on SiO2 resembles that of a lightly doped semiconductor in terms of its carrier density (7.8 × 1015 cm−2), yet its carrier mobility (2.6 cm2/Vs) resembles that of a metal. Graphene on hBN/SiO2 has a carrier density of 8.2 × 1012 cm−2 and carrier mobility of 2.68 × 103 cm2/Vs—comparable to existing high-mobility semiconducting materials. CVD graphene and conventional photolithography does provide a cost-effective means for producing large form-factor graphene devices for low to moderate mobility applications and eventually for large-scale monolithic graphene electronics.
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35
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Schmidt R, Carrascoso Plana F, Nemes NM, Mompeán F, García-Hernández M. Impedance Spectroscopy of Encapsulated Single Graphene Layers. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:804. [PMID: 35269292 PMCID: PMC8912308 DOI: 10.3390/nano12050804] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/01/2022] [Revised: 02/21/2022] [Accepted: 02/25/2022] [Indexed: 02/01/2023]
Abstract
In this work, we demonstrate the use of electrical impedance spectroscopy (EIS) for the disentanglement of several dielectric contributions in encapsulated single graphene layers. The dielectric data strongly vary qualitatively with the nominal graphene resistance. In the case of sufficiently low resistance of the graphene layers, the dielectric spectra are dominated by inductive contributions, which allow for disentanglement of the electrode/graphene interface resistance from the intrinsic graphene resistance by the application of an adequate equivalent circuit model. Higher resistance of the graphene layers leads to predominantly capacitive dielectric contributions, and the deconvolution is not feasible due to the experimental high frequency limit of the EIS technique.
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Affiliation(s)
- Rainer Schmidt
- Campo Moncloa, Grupo de Física de Materiales Complejos (GFMC), Dpto. de Física de Materiales, Facultad de Ciencias Físicas, Universidad Complutense de Madrid, 28040 Madrid, Spain;
- Unidad Asociada “Laboratorio de Heteroestructuras con Aplicación en Spintrónica”, UCM-CSIC, Sor Juana Ines de la Cruz, 3, Cantoblanco, 28049 Madrid, Spain
| | - Félix Carrascoso Plana
- Instituto de Ciencia de Materiales de Madrid—Consejo Superior de Investigaciones Cientificas (ICMM-CSIC), Materials Science Factory, 2D Foundry Group, Cantoblanco, 28049 Madrid, Spain; (F.C.P.); (F.M.); (M.G.-H.)
| | - Norbert Marcel Nemes
- Campo Moncloa, Grupo de Física de Materiales Complejos (GFMC), Dpto. de Física de Materiales, Facultad de Ciencias Físicas, Universidad Complutense de Madrid, 28040 Madrid, Spain;
- Unidad Asociada “Laboratorio de Heteroestructuras con Aplicación en Spintrónica”, UCM-CSIC, Sor Juana Ines de la Cruz, 3, Cantoblanco, 28049 Madrid, Spain
- Instituto de Ciencia de Materiales de Madrid—Consejo Superior de Investigaciones Cientificas (ICMM-CSIC), Materials Science Factory, 2D Foundry Group, Cantoblanco, 28049 Madrid, Spain; (F.C.P.); (F.M.); (M.G.-H.)
| | - Federico Mompeán
- Instituto de Ciencia de Materiales de Madrid—Consejo Superior de Investigaciones Cientificas (ICMM-CSIC), Materials Science Factory, 2D Foundry Group, Cantoblanco, 28049 Madrid, Spain; (F.C.P.); (F.M.); (M.G.-H.)
| | - Mar García-Hernández
- Instituto de Ciencia de Materiales de Madrid—Consejo Superior de Investigaciones Cientificas (ICMM-CSIC), Materials Science Factory, 2D Foundry Group, Cantoblanco, 28049 Madrid, Spain; (F.C.P.); (F.M.); (M.G.-H.)
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36
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Smith LW, Batey JO, Alexander-Webber JA, Hsieh YC, Fung SJ, Albrow-Owen T, Beere HE, Burton OJ, Hofmann S, Ritchie DA, Kelly M, Chen TM, Joyce HJ, Smith CG. Giant Magnetoresistance in a Chemical Vapor Deposition Graphene Constriction. ACS NANO 2022; 16:2833-2842. [PMID: 35109656 PMCID: PMC9098165 DOI: 10.1021/acsnano.1c09815] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/05/2021] [Accepted: 01/26/2022] [Indexed: 06/14/2023]
Abstract
Magnetic field-driven insulating states in graphene are associated with samples of very high quality. Here, this state is shown to exist in monolayer graphene grown by chemical vapor deposition (CVD) and wet transferred on Al2O3 without encapsulation with hexagonal boron nitride (h-BN) or other specialized fabrication techniques associated with superior devices. Two-terminal measurements are performed at low temperature using a GaAs-based multiplexer. During high-throughput testing, insulating properties are found in a 10 μm long graphene device which is 10 μm wide at one contact with an ≈440 nm wide constriction at the other. The low magnetic field mobility is ≈6000 cm2 V-1 s-1. An energy gap induced by the magnetic field opens at charge neutrality, leading to diverging resistance and current switching on the order of 104 with DC bias voltage at an approximate electric field strength of ≈0.04 V μm-1 at high magnetic field. DC source-drain bias measurements show behavior associated with tunneling through a potential barrier and a transition between direct tunneling at low bias to Fowler-Nordheim tunneling at high bias from which the tunneling region is estimated to be on the order of ≈100 nm. Transport becomes activated with temperature from which the gap size is estimated to be 2.4 to 2.8 meV at B = 10 T. Results suggest that a local electronically high quality region exists within the constriction, which dominates transport at high B, causing the device to become insulating and act as a tunnel junction. The use of wet transfer fabrication techniques of CVD material without encapsulation with h-BN and the combination with multiplexing illustrates the convenience of these scalable and reasonably simple methods to find high quality devices for fundamental physics research and with functional properties.
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Affiliation(s)
- Luke W. Smith
- Department
of Physics, Cavendish Laboratory, University
of Cambridge, Cambridge CB3 0HE, United Kingdom
- Department
of Physics, National Cheng Kung University, Tainan 701, Taiwan
| | - Jack O. Batey
- Department
of Physics, Cavendish Laboratory, University
of Cambridge, Cambridge CB3 0HE, United Kingdom
| | - Jack A. Alexander-Webber
- Electrical
Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Yu-Chiang Hsieh
- Department
of Physics, National Cheng Kung University, Tainan 701, Taiwan
| | - Shin-Jr Fung
- Department
of Physics, National Cheng Kung University, Tainan 701, Taiwan
| | - Tom Albrow-Owen
- Electrical
Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Harvey E. Beere
- Department
of Physics, Cavendish Laboratory, University
of Cambridge, Cambridge CB3 0HE, United Kingdom
| | - Oliver J. Burton
- Electrical
Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Stephan Hofmann
- Electrical
Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - David A. Ritchie
- Department
of Physics, Cavendish Laboratory, University
of Cambridge, Cambridge CB3 0HE, United Kingdom
| | - Michael Kelly
- Department
of Physics, Cavendish Laboratory, University
of Cambridge, Cambridge CB3 0HE, United Kingdom
- Electrical
Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Tse-Ming Chen
- Department
of Physics, National Cheng Kung University, Tainan 701, Taiwan
- Center
for Quantum Frontiers of Research & Technology (QFort), National Cheng Kung University, Tainan 701, Taiwan
| | - Hannah J. Joyce
- Electrical
Engineering Division, Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Charles G. Smith
- Department
of Physics, Cavendish Laboratory, University
of Cambridge, Cambridge CB3 0HE, United Kingdom
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37
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Sun L, Chen B, Wang W, Li Y, Zeng X, Liu H, Liang Y, Zhao Z, Cai A, Zhang R, Zhu Y, Wang Y, Song Y, Ding Q, Gao X, Peng H, Li Z, Lin L, Liu Z. Toward Epitaxial Growth of Misorientation-Free Graphene on Cu(111) Foils. ACS NANO 2022; 16:285-294. [PMID: 34965103 DOI: 10.1021/acsnano.1c06285] [Citation(s) in RCA: 19] [Impact Index Per Article: 9.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
The epitaxial growth of single-crystal thin films relies on the availability of a single-crystal substrate and a strong interaction between epilayer and substrate. Previous studies have reported the roles of the substrate (e.g., symmetry and lattice constant) in determining the orientations of chemical vapor deposition (CVD)-grown graphene, and Cu(111) is considered as the most promising substrate for epitaxial growth of graphene single crystals. However, the roles of gas-phase reactants and graphene-substrate interaction in determining the graphene orientation are still unclear. Here, we find that trace amounts of oxygen is capable of enhancing the interaction between graphene edges and Cu(111) substrate and, therefore, eliminating the misoriented graphene domains in the nucleation stage. A modified anomalous grain growth method is developed to improve the size of the as-obtained Cu(111) single crystal, relying on strongly textured polycrystalline Cu foils. The batch-to-batch production of A3-size (∼0.42 × 0.3 m2) single-crystal graphene films is achieved on Cu(111) foils relying on a self-designed pilot-scale CVD system. The as-grown graphene exhibits ultrahigh carrier mobilities of 68 000 cm2 V-1 s-1 at room temperature and 210 000 cm2 V-1 s-1 at 2.2 K. The findings and strategies provided in our work would accelerate the mass production of high-quality misorientation-free graphene films.
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Affiliation(s)
- Luzhao Sun
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Buhang Chen
- Beijing Graphene Institute, Beijing 100095, P. R. China
- College of Energy, Soochow Institute for Energy and Materials InnovationS (SIEMIS), Key Laboratory of Advanced Carbon Materials and Wearable Energy Technologies of Jiangsu Province, Soochow University, Suzhou 215006, P. R. China
| | - Wendong Wang
- School of Physics and Astronomy, University of Manchester, Manchester M13 9PL, United Kingdom
| | - Yanglizhi Li
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Xiongzhi Zeng
- Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, P. R. China
| | - Haiyang Liu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Yu Liang
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Zhenyong Zhao
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Ali Cai
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Rui Zhang
- School of Physics and Astronomy, University of Manchester, Manchester M13 9PL, United Kingdom
| | - Yeshu Zhu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Yuechen Wang
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Yuqing Song
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Qingjie Ding
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Xuan Gao
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Hailin Peng
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
| | - Zhenyu Li
- Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, P. R. China
| | - Li Lin
- School of Physics and Astronomy, University of Manchester, Manchester M13 9PL, United Kingdom
- Department of Materials Science and Engineering, National University of Singapore, Singapore 117575, Singapore
| | - Zhongfan Liu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, P. R. China
- Beijing Graphene Institute, Beijing 100095, P. R. China
- College of Energy, Soochow Institute for Energy and Materials InnovationS (SIEMIS), Key Laboratory of Advanced Carbon Materials and Wearable Energy Technologies of Jiangsu Province, Soochow University, Suzhou 215006, P. R. China
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38
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Effect of GNWs/NiO-WO 3/GNWs Heterostructure for NO 2 Gas Sensing at Room Temperature. SENSORS 2022; 22:s22020626. [PMID: 35062587 PMCID: PMC8779247 DOI: 10.3390/s22020626] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/01/2021] [Revised: 12/31/2021] [Accepted: 01/11/2022] [Indexed: 11/17/2022]
Abstract
Recently, as air pollution and particulate matter worsen, the importance of a platform that can monitor the air environment is emerging. Especially, among air pollutants, nitrogen dioxide (NO2) is a toxic gas that can not only generate secondary particulate matter, but can also derive numerous toxic gases. To detect such NO2 gas at low concentration, we fabricated a GNWs/NiO-WO3/GNWs heterostructure-based gas sensor using microwave plasma-enhanced chemical vapor deposition (MPECVD) and sputter, and we confirmed the NO2 detection characteristics between 10 and 50 ppm at room temperature. The morphology and carbon lattice characteristics of the sensing layer were investigated using field emission scanning electron microscopy (FESEM) and Raman spectroscopy. In the gas detection measurement, the resistance negative change according to the NO2 gas concentration was recorded. Moreover, it reacted even at low concentrations such as 5–7 ppm, and showed excellent recovery characteristics of more than 98%. Furthermore, it also showed a change in which the reactivity decreased with respect to humidity of 33% and 66%.
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Graphene Growth Directly on SiO 2/Si by Hot Filament Chemical Vapor Deposition. NANOMATERIALS 2021; 12:nano12010109. [PMID: 35010059 PMCID: PMC8746613 DOI: 10.3390/nano12010109] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 10/05/2021] [Revised: 10/21/2021] [Accepted: 10/26/2021] [Indexed: 11/17/2022]
Abstract
We report the first direct synthesis of graphene on SiO2/Si by hot-filament chemical vapor deposition. Graphene deposition was conducted at low pressures (35 Torr) with a mixture of methane/hydrogen and a substrate temperature of 970 °C followed by spontaneous cooling to room temperature. A thin copper-strip was deposited in the middle of the SiO2/Si substrate as catalytic material. Raman spectroscopy mapping and atomic force microscopy measurements indicate the growth of few-layers of graphene over the entire SiO2/Si substrate, far beyond the thin copper-strip, while X-ray photoelectron spectroscopy and energy-dispersive X-ray spectroscopy showed negligible amounts of copper next to the initially deposited strip. The scale of the graphene nanocrystal was estimated by Raman spectroscopy and scanning electron microscopy.
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40
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Gao Y, Chen J, Chen G, Fan C, Liu X. Recent Progress in the Transfer of Graphene Films and Nanostructures. SMALL METHODS 2021; 5:e2100771. [PMID: 34928026 DOI: 10.1002/smtd.202100771] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/07/2021] [Revised: 10/13/2021] [Indexed: 06/14/2023]
Abstract
The one-atom-thick graphene has excellent electronic, optical, thermal, and mechanical properties. Currently, chemical vapor deposition (CVD) graphene has received a great deal of attention because it provides access to large-area and uniform films with high-quality. This allows the fabrication of graphene based-electronics, sensors, photonics, and optoelectronics for practical applications. Zero bandgap, however, limits the application of a graphene film as electronic transistor. The most commonly used bottom-up approaches have achieved efficient tuning of the electronic bandgap by customizing well-defined graphene nanostructures. The postgrowth transfer of graphene films/nanostructures to a certain substrate is crucial in utilizing graphene in applicable devices. In this review, the basic growth mechanism of CVD graphene is first introduced. Then, recent advances in various transfer methods of as-grown graphene to target substrates are presented. The fabrication and transfer methods of graphene nanostructures are also provided, and then the transfer-related applications are summarized. At last, the challenging issues and the potential transfer-free approaches are discussed.
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Affiliation(s)
- Yanjing Gao
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Jielin Chen
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Guorui Chen
- Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Chunhai Fan
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
| | - Xiaoguo Liu
- School of Chemistry and Chemical Engineering, Frontiers Science Centre for Transformative Molecules, Shanghai Jiao Tong University, Shanghai, 200240, China
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41
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Asgari M, Riccardi E, Balci O, De Fazio D, Shinde SM, Zhang J, Mignuzzi S, Koppens FHL, Ferrari AC, Viti L, Vitiello MS. Chip-Scalable, Room-Temperature, Zero-Bias, Graphene-Based Terahertz Detectors with Nanosecond Response Time. ACS NANO 2021; 15:17966-17976. [PMID: 34706194 PMCID: PMC8613901 DOI: 10.1021/acsnano.1c06432] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/28/2021] [Accepted: 10/12/2021] [Indexed: 06/01/2023]
Abstract
The scalable synthesis and transfer of large-area graphene underpins the development of nanoscale photonic devices ideal for new applications in a variety of fields, ranging from biotechnology, to wearable sensors for healthcare and motion detection, to quantum transport, communications, and metrology. We report room-temperature zero-bias thermoelectric photodetectors, based on single- and polycrystal graphene grown by chemical vapor deposition (CVD), tunable over the whole terahertz range (0.1-10 THz) by selecting the resonance of an on-chip patterned nanoantenna. Efficient light detection with noise equivalent powers <1 nWHz-1/2 and response time ∼5 ns at room temperature are demonstrated. This combination of specifications is orders of magnitude better than any previous CVD graphene photoreceiver operating in the sub-THz and THz range. These state-of-the-art performances and the possibility of upscaling to multipixel architectures on complementary metal-oxide-semiconductor platforms are the starting points for the realization of cost-effective THz cameras in a frequency range still not covered by commercially available microbolometer arrays.
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Affiliation(s)
- Mahdi Asgari
- NEST,
CNR - Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, 56127, Pisa, Italy
| | - Elisa Riccardi
- NEST,
CNR - Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, 56127, Pisa, Italy
| | - Osman Balci
- Cambridge
Graphene Centre, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Domenico De Fazio
- ICFO-Institut
de Ciencies Fotoniques, Mediterranean Technology Park, 08860, Castelldefels, Barcelona, Spain
| | - Sachin M. Shinde
- Cambridge
Graphene Centre, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Jincan Zhang
- Cambridge
Graphene Centre, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Sandro Mignuzzi
- Cambridge
Graphene Centre, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Frank H. L. Koppens
- ICFO-Institut
de Ciencies Fotoniques, Mediterranean Technology Park, 08860, Castelldefels, Barcelona, Spain
| | - Andrea C. Ferrari
- Cambridge
Graphene Centre, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Leonardo Viti
- NEST,
CNR - Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, 56127, Pisa, Italy
| | - Miriam S. Vitiello
- NEST,
CNR - Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, 56127, Pisa, Italy
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42
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Bellani S, Bartolotta A, Agresti A, Calogero G, Grancini G, Di Carlo A, Kymakis E, Bonaccorso F. Solution-processed two-dimensional materials for next-generation photovoltaics. Chem Soc Rev 2021; 50:11870-11965. [PMID: 34494631 PMCID: PMC8559907 DOI: 10.1039/d1cs00106j] [Citation(s) in RCA: 35] [Impact Index Per Article: 11.7] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/29/2021] [Indexed: 12/12/2022]
Abstract
In the ever-increasing energy demand scenario, the development of novel photovoltaic (PV) technologies is considered to be one of the key solutions to fulfil the energy request. In this context, graphene and related two-dimensional (2D) materials (GRMs), including nonlayered 2D materials and 2D perovskites, as well as their hybrid systems, are emerging as promising candidates to drive innovation in PV technologies. The mechanical, thermal, and optoelectronic properties of GRMs can be exploited in different active components of solar cells to design next-generation devices. These components include front (transparent) and back conductive electrodes, charge transporting layers, and interconnecting/recombination layers, as well as photoactive layers. The production and processing of GRMs in the liquid phase, coupled with the ability to "on-demand" tune their optoelectronic properties exploiting wet-chemical functionalization, enable their effective integration in advanced PV devices through scalable, reliable, and inexpensive printing/coating processes. Herein, we review the progresses in the use of solution-processed 2D materials in organic solar cells, dye-sensitized solar cells, perovskite solar cells, quantum dot solar cells, and organic-inorganic hybrid solar cells, as well as in tandem systems. We first provide a brief introduction on the properties of 2D materials and their production methods by solution-processing routes. Then, we discuss the functionality of 2D materials for electrodes, photoactive layer components/additives, charge transporting layers, and interconnecting layers through figures of merit, which allow the performance of solar cells to be determined and compared with the state-of-the-art values. We finally outline the roadmap for the further exploitation of solution-processed 2D materials to boost the performance of PV devices.
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Affiliation(s)
- Sebastiano Bellani
- BeDimensional S.p.A., Via Lungotorrente Secca 30R, 16163 Genova, Italy.
- Istituto Italiano di Tecnologia, Graphene Labs, via Moreogo 30, 16163 Genova, Italy
| | - Antonino Bartolotta
- CNR-IPCF, Istituto per i Processi Chimico-Fisici, Via F. Stagno D'alcontres 37, 98158 Messina, Italy
| | - Antonio Agresti
- CHOSE - Centre for Hybrid and Organic Solar Energy, University of Rome "Tor Vergata", via del Politecnico 1, 00133 Roma, Italy
| | - Giuseppe Calogero
- CNR-IPCF, Istituto per i Processi Chimico-Fisici, Via F. Stagno D'alcontres 37, 98158 Messina, Italy
| | - Giulia Grancini
- University of Pavia and INSTM, Via Taramelli 16, 27100 Pavia, Italy
| | - Aldo Di Carlo
- CHOSE - Centre for Hybrid and Organic Solar Energy, University of Rome "Tor Vergata", via del Politecnico 1, 00133 Roma, Italy
- L.A.S.E. - Laboratory for Advanced Solar Energy, National University of Science and Technology "MISiS", 119049 Leninskiy Prosect 6, Moscow, Russia
| | - Emmanuel Kymakis
- Department of Electrical & Computer Engineering, Hellenic Mediterranean University, Estavromenos 71410 Heraklion, Crete, Greece
| | - Francesco Bonaccorso
- BeDimensional S.p.A., Via Lungotorrente Secca 30R, 16163 Genova, Italy.
- Istituto Italiano di Tecnologia, Graphene Labs, via Moreogo 30, 16163 Genova, Italy
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43
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Liu H, You CY, Li J, Galligan PR, You J, Liu Z, Cai Y, Luo Z. Synthesis of hexagonal boron nitrides by chemical vapor deposition and their use as single photon emitters. NANO MATERIALS SCIENCE 2021. [DOI: 10.1016/j.nanoms.2021.03.002] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/30/2022]
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44
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Stewart JC, Fan Y, Danial JSH, Goetz A, Prasad AS, Burton OJ, Alexander-Webber JA, Lee SF, Skoff SM, Babenko V, Hofmann S. Quantum Emitter Localization in Layer-Engineered Hexagonal Boron Nitride. ACS NANO 2021; 15:13591-13603. [PMID: 34347438 DOI: 10.1021/acsnano.1c04467] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/06/2023]
Abstract
Hexagonal boron nitride (hBN) is a promising host material for room-temperature, tunable solid-state quantum emitters. A key technological challenge is deterministic and scalable spatial emitter localization, both laterally and vertically, while maintaining the full advantages of the 2D nature of the material. Here, we demonstrate emitter localization in hBN in all three dimensions via a monolayer (ML) engineering approach. We establish pretreatment processes for hBN MLs to either fully suppress or activate emission, thereby enabling such differently treated MLs to be used as select building blocks to achieve vertical (z) emitter localization at the atomic layer level. We show that emitter bleaching of ML hBN can be suppressed by sandwiching between two protecting hBN MLs, and that such thin stacks retain opportunities for external control of emission. We exploit this to achieve lateral (x-y) emitter localization via the addition of a patterned graphene mask that quenches fluorescence. Such complete emitter site localization is highly versatile, compatible with planar, scalable processing, allowing tailored approaches to addressable emitter array designs for advanced characterization, monolithic device integration, and photonic circuits.
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Affiliation(s)
- James Callum Stewart
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Ye Fan
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
| | - John S H Danial
- The Yusuf Hamied Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, United Kingdom
| | - Alexander Goetz
- Institute of Atomic and Subatomic Physics, Vienna University of Technology, Stadionallee 2, 1020 Vienna, Austria
| | - Adarsh S Prasad
- Institute of Atomic and Subatomic Physics, Vienna University of Technology, Stadionallee 2, 1020 Vienna, Austria
| | - Oliver J Burton
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Jack A Alexander-Webber
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Steven F Lee
- The Yusuf Hamied Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, United Kingdom
| | - Sarah M Skoff
- Institute of Atomic and Subatomic Physics, Vienna University of Technology, Stadionallee 2, 1020 Vienna, Austria
| | - Vitaliy Babenko
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
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45
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Nanophotonic biosensors harnessing van der Waals materials. Nat Commun 2021; 12:3824. [PMID: 34158483 PMCID: PMC8219843 DOI: 10.1038/s41467-021-23564-4] [Citation(s) in RCA: 52] [Impact Index Per Article: 17.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/03/2020] [Accepted: 04/16/2021] [Indexed: 02/07/2023] Open
Abstract
Low-dimensional van der Waals (vdW) materials can harness tightly confined polaritonic waves to deliver unique advantages for nanophotonic biosensing. The reduced dimensionality of vdW materials, as in the case of two-dimensional graphene, can greatly enhance plasmonic field confinement, boosting sensitivity and efficiency compared to conventional nanophotonic devices that rely on surface plasmon resonance in metallic films. Furthermore, the reduction of dielectric screening in vdW materials enables electrostatic tunability of different polariton modes, including plasmons, excitons, and phonons. One-dimensional vdW materials, particularly single-walled carbon nanotubes, possess unique form factors with confined excitons to enable single-molecule detection as well as in vivo biosensing. We discuss basic sensing principles based on vdW materials, followed by technological challenges such as surface chemistry, integration, and toxicity. Finally, we highlight progress in harnessing vdW materials to demonstrate new sensing functionalities that are difficult to perform with conventional metal/dielectric sensors. This review presents an overview of scenarios where van der Waals (vdW) materials provide unique advantages for nanophotonic biosensing applications. The authors discuss basic sensing principles based on vdW materials, advantages of the reduced dimensionality as well as technological challenges.
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46
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Graphene overcoats for ultra-high storage density magnetic media. Nat Commun 2021; 12:2854. [PMID: 34001870 PMCID: PMC8129078 DOI: 10.1038/s41467-021-22687-y] [Citation(s) in RCA: 9] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/02/2019] [Accepted: 03/17/2021] [Indexed: 02/03/2023] Open
Abstract
Hard disk drives (HDDs) are used as secondary storage in digital electronic devices owing to low cost and large data storage capacity. Due to the exponentially increasing amount of data, there is a need to increase areal storage densities beyond ~1 Tb/in2. This requires the thickness of carbon overcoats (COCs) to be <2 nm. However, friction, wear, corrosion, and thermal stability are critical concerns below 2 nm, limiting current technology, and restricting COC integration with heat assisted magnetic recording technology (HAMR). Here we show that graphene-based overcoats can overcome all these limitations, and achieve two-fold reduction in friction and provide better corrosion and wear resistance than state-of-the-art COCs, while withstanding HAMR conditions. Thus, we expect that graphene overcoats may enable the development of 4-10 Tb/in2 areal density HDDs when employing suitable recording technologies, such as HAMR and HAMR+bit patterned media.
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47
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Optoelectronic mixing with high-frequency graphene transistors. Nat Commun 2021; 12:2728. [PMID: 33980859 PMCID: PMC8115296 DOI: 10.1038/s41467-021-22943-1] [Citation(s) in RCA: 7] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/13/2019] [Accepted: 03/29/2021] [Indexed: 02/03/2023] Open
Abstract
Graphene is ideally suited for optoelectronics. It offers absorption at telecom wavelengths, high-frequency operation and CMOS-compatibility. We show how high speed optoelectronic mixing can be achieved with high frequency (~20 GHz bandwidth) graphene field effect transistors (GFETs). These devices mix an electrical signal injected into the GFET gate and a modulated optical signal onto a single layer graphene (SLG) channel. The photodetection mechanism and the resulting photocurrent sign depend on the SLG Fermi level (EF). At low EF (<130 meV), a positive photocurrent is generated, while at large EF (>130 meV), a negative photobolometric current appears. This allows our devices to operate up to at least 67 GHz. Our results pave the way for GFETs optoelectronic mixers for mm-wave applications, such as telecommunications and radio/light detection and ranging (RADAR/LIDARs.).
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48
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Sun L, Wang Z, Wang Y, Zhao L, Li Y, Chen B, Huang S, Zhang S, Wang W, Pei D, Fang H, Zhong S, Liu H, Zhang J, Tong L, Chen Y, Li Z, Rümmeli MH, Novoselov KS, Peng H, Lin L, Liu Z. Hetero-site nucleation for growing twisted bilayer graphene with a wide range of twist angles. Nat Commun 2021; 12:2391. [PMID: 33888688 PMCID: PMC8062483 DOI: 10.1038/s41467-021-22533-1] [Citation(s) in RCA: 45] [Impact Index Per Article: 15.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/26/2020] [Accepted: 03/17/2021] [Indexed: 11/09/2022] Open
Abstract
Twisted bilayer graphene (tBLG) has recently attracted growing interest due to its unique twist-angle-dependent electronic properties. The preparation of high-quality large-area bilayer graphene with rich rotation angles would be important for the investigation of angle-dependent physics and applications, which, however, is still challenging. Here, we demonstrate a chemical vapor deposition (CVD) approach for growing high-quality tBLG using a hetero-site nucleation strategy, which enables the nucleation of the second layer at a different site from that of the first layer. The fraction of tBLGs in bilayer graphene domains with twist angles ranging from 0° to 30° was found to be improved to 88%, which is significantly higher than those reported previously. The hetero-site nucleation behavior was carefully investigated using an isotope-labeling technique. Furthermore, the clear Moiré patterns and ultrahigh room-temperature carrier mobility of 68,000 cm2 V-1 s-1 confirmed the high crystalline quality of our tBLG. Our study opens an avenue for the controllable growth of tBLGs for both fundamental research and practical applications.
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Affiliation(s)
- Luzhao Sun
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China.,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, People's Republic of China.,Beijing Graphene Institute, Beijing, 100095, People's Republic of China
| | - Zihao Wang
- School of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK
| | - Yuechen Wang
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China.,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, People's Republic of China
| | - Liang Zhao
- Soochow Institute for Energy and Materials Innovation, Soochow University, Suzhou, 215006, People's Republic of China
| | - Yanglizhi Li
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China.,Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, People's Republic of China.,Beijing Graphene Institute, Beijing, 100095, People's Republic of China
| | - Buhang Chen
- Beijing Graphene Institute, Beijing, 100095, People's Republic of China
| | - Shenghong Huang
- Department of Modern Mechanics, University of Science and Technology of China, Hefei, 230026, People's Republic of China.
| | - Shishu Zhang
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China
| | - Wendong Wang
- School of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK
| | - Ding Pei
- Clarendon Laboratory, Department of Physics, University of Oxford, Oxford, OX1 3PU, UK
| | - Hongwei Fang
- School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, People's Republic of China
| | - Shan Zhong
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China
| | - Haiyang Liu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China
| | - Jincan Zhang
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China.,Beijing Graphene Institute, Beijing, 100095, People's Republic of China
| | - Lianming Tong
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China
| | - Yulin Chen
- Clarendon Laboratory, Department of Physics, University of Oxford, Oxford, OX1 3PU, UK.,School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, People's Republic of China
| | - Zhenyu Li
- Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, 230026, People's Republic of China
| | - Mark H Rümmeli
- Soochow Institute for Energy and Materials Innovation, Soochow University, Suzhou, 215006, People's Republic of China
| | - Kostya S Novoselov
- School of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK
| | - Hailin Peng
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China. .,Beijing Graphene Institute, Beijing, 100095, People's Republic of China.
| | - Li Lin
- School of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK.
| | - Zhongfan Liu
- Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China. .,Beijing Graphene Institute, Beijing, 100095, People's Republic of China.
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49
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He J, Paradisanos I, Liu T, Cadore AR, Liu J, Churaev M, Wang RN, Raja AS, Javerzac-Galy C, Roelli P, Fazio DD, Rosa BLT, Tongay S, Soavi G, Ferrari AC, Kippenberg TJ. Low-Loss Integrated Nanophotonic Circuits with Layered Semiconductor Materials. NANO LETTERS 2021; 21:2709-2718. [PMID: 33754742 DOI: 10.1021/acs.nanolett.0c04149] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Monolayer transition-metal dichalcogenides with direct bandgaps are emerging candidates for optoelectronic devices, such as photodetectors, light-emitting diodes, and electro-optic modulators. Here we report a low-loss integrated platform incorporating molybdenum ditelluride monolayers with silicon nitride photonic microresonators. We achieve microresonator quality factors >3 × 106 in the telecommunication O- to E-bands. This paves the way for low-loss, hybrid photonic integrated circuits with layered semiconductors, not requiring heterogeneous wafer bonding.
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Affiliation(s)
- Jijun He
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | | | - Tianyi Liu
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Alisson R Cadore
- Cambridge Graphene Centre, University of Cambridge, Cambridge CB3 0FA, U.K
| | - Junqiu Liu
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Mikhail Churaev
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Rui Ning Wang
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Arslan S Raja
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Clément Javerzac-Galy
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Philippe Roelli
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Domenico De Fazio
- Cambridge Graphene Centre, University of Cambridge, Cambridge CB3 0FA, U.K
| | - Barbara L T Rosa
- Cambridge Graphene Centre, University of Cambridge, Cambridge CB3 0FA, U.K
| | - Sefaattin Tongay
- School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, Arizona 85287, United States
| | - Giancarlo Soavi
- Cambridge Graphene Centre, University of Cambridge, Cambridge CB3 0FA, U.K
- Institute for Solid State Physics, Friedrich-Schiller University Jena, 07743 Jena, Germany
| | - Andrea C Ferrari
- Cambridge Graphene Centre, University of Cambridge, Cambridge CB3 0FA, U.K
| | - Tobias J Kippenberg
- Institute of Physics, Swiss Federal Institute of Technology Lausanne (EPFL), CH-1015 Lausanne, Switzerland
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50
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Cai L, Yu G. Fabrication Strategies of Twisted Bilayer Graphenes and Their Unique Properties. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021; 33:e2004974. [PMID: 33615593 DOI: 10.1002/adma.202004974] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/21/2020] [Revised: 10/09/2020] [Indexed: 06/12/2023]
Abstract
Twisted bilayer graphene (tBLG) exhibits a host of innovative physical phenomena owing to the formation of moiré superlattice. Especially, the discovery of superconducting behavior has generated new interest in graphene. The growing studies of tBLG mainly focus on its physical properties, while the fabrication of high-quality tBLG is a prerequisite for achieving the desired properties due to the great dependence on the twist angle and the interfacial contact. Here, the cutting-edge preparation strategies and challenges of tBLG fabrication are reviewed. The advantages and disadvantages of chemical vapor deposition, epitaxial growth on silicon carbide, stacking monolayer graphene, and folding monolayer graphene methods for the fabrication of tBLG are analyzed in detail, providing a reference for further development of preparation methods. Moreover, the characterization methods of twist angle for the tBLG are presented. Then, the unique physicochemical properties and corresponding applications of tBLG, containing correlated insulating and superconducting states, ferromagnetic state, soliton, enhanced optical absorption, tunable bandgap, and lithium intercalation and diffusion, are described. Finally, the opportunities and challenges for fabricating high-quality and large-area tBLG are discussed, unique physical properties are displayed, and new applications inferred from its angle-dependent features are explored, thereby impelling the commercialization of tBLG from laboratory to market.
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Affiliation(s)
- Le Cai
- Beijing National Laboratory for Molecular Sciences, CAS Research/Education Center for Excellence in Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, P. R. China
- School of Chemical Sciences, University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Gui Yu
- Beijing National Laboratory for Molecular Sciences, CAS Research/Education Center for Excellence in Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, P. R. China
- School of Chemical Sciences, University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
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