1
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Kawabata S, Seki R, Watanabe T, Ohba T. Degradation of Graphene in High- and Low-Humidity Air, and Vacuum Conditions at 300-500 K. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:166. [PMID: 38251131 PMCID: PMC10820515 DOI: 10.3390/nano14020166] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/14/2023] [Revised: 01/05/2024] [Accepted: 01/10/2024] [Indexed: 01/23/2024]
Abstract
Graphene is a fundamental unit of carbon materials and, thus, primary sp2-bonded carbon material. Graphene is, however, easily broken macroscopically despite high mechanical strength, although its natural degradation has rarely been considered. In this work, we evaluate the natural degradation of two-layer graphene in vacuo, in low-humidity air, and in high-humidity air at 300, 400, 450, and 500 K. Over 1000 days of degradation at 300 K, the graphene structure was highly maintained in vacuo, whereas the layer number of graphene tended to decrease in high- and low-humidity air. Water was slightly reacted/chemisorbed on graphene to form surface oxygen groups at 300 K. At 450 and 500 K, graphene was moderately volatilized in vacuo and was obviously oxidized in high- and low-humidity air. Surprisingly, the oxidation of graphene was more suppressed in the high-humidity air than in the low-humidity air, indicating that water worked as an anti-oxidizer of graphene by preventing the chemisorption of oxygen on the graphene surface.
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Affiliation(s)
| | | | | | - Tomonori Ohba
- Graduate School of Science, Chiba University, 1-33 Yayoi, Inage, Chiba 263-8522, Japan
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2
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Li X, Shi JQ, Page AJ. Discovery of Graphene Growth Alloy Catalysts Using High-Throughput Machine Learning. NANO LETTERS 2023; 23:9796-9802. [PMID: 37890870 PMCID: PMC10636790 DOI: 10.1021/acs.nanolett.3c02496] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/05/2023] [Revised: 10/05/2023] [Indexed: 10/29/2023]
Abstract
Despite today's commercial-scale graphene production using chemical vapor deposition (CVD), the growth of high-quality single-layer graphene with controlled morphology and crystallinity remains challenging. Considerable effort is still spent on designing improved CVD catalysts for producing high-quality graphene. Conventionally, however, catalyst design has been pursued using empirical intuition or trial-and-error approaches. Here, we combine high-throughput density functional theory and machine learning to identify new prospective transition metal alloy catalysts that exhibit performance comparable to that of established graphene catalysts, such as Ni(111) and Cu(111). The alloys identified through this process generally consist of combinations of early- and late-transition metals, and a majority are alloys of Ni or Cu. Nevertheless, in many cases, these conventional catalyst metals are combined with unconventional partners, such as Zr, Hf, and Nb. The approach presented here therefore highlights an important new approach for identifying novel catalyst materials for the CVD growth of low-dimensional nanomaterials.
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Affiliation(s)
- Xinyu Li
- School
of Information and Physical Sciences, The
University of Newcastle, Callaghan, New South Wales 2308, Australia
- Australian
Institute for Machine Learning, The University
of Adelaide, Adelaide, South Australia 5000, Australia
| | - Javen Qinfeng Shi
- Australian
Institute for Machine Learning, The University
of Adelaide, Adelaide, South Australia 5000, Australia
| | - Alister J. Page
- Discipline
of Chemistry, School of Environmental and Life Sciences, The University of Newcastle, Callaghan, New South Wales 2308, Australia
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3
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Zatko V, Dubois SMM, Godel F, Galbiati M, Peiro J, Sander A, Carretero C, Vecchiola A, Collin S, Bouzehouane K, Servet B, Petroff F, Charlier JC, Martin MB, Dlubak B, Seneor P. Almost Perfect Spin Filtering in Graphene-Based Magnetic Tunnel Junctions. ACS NANO 2022; 16:14007-14016. [PMID: 36068013 PMCID: PMC9527810 DOI: 10.1021/acsnano.2c03625] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/13/2022] [Accepted: 07/14/2022] [Indexed: 06/15/2023]
Abstract
We report on large spin-filtering effects in epitaxial graphene-based spin valves, strongly enhanced in our specific multilayer case. Our results were obtained by the effective association of chemical vapor deposited (CVD) multilayer graphene with a high quality epitaxial Ni(111) ferromagnetic spin source. We highlight that the Ni(111) spin source electrode crystallinity and metallic state are preserved and stabilized by multilayer graphene CVD growth. Complete nanometric spin valve junctions are fabricated using a local probe indentation process, and spin properties are extracted from the graphene-protected ferromagnetic electrode through the use of a reference Al2O3/Co spin analyzer. Strikingly, spin-transport measurements in these structures give rise to large negative tunnel magneto-resistance TMR = -160%, pointing to a particularly large spin polarization for the Ni(111)/Gr interface PNi/Gr, evaluated up to -98%. We then discuss an emerging physical picture of graphene-ferromagnet systems, sustained both by experimental data and ab initio calculations, intimately combining efficient spin filtering effects arising (i) from the bulk band structure of the graphene layers purifying the extracted spin direction, (ii) from the hybridization effects modulating the amplitude of spin polarized scattering states over the first few graphene layers at the interface, and (iii) from the epitaxial interfacial matching of the graphene layers with the spin-polarized Ni surface selecting well-defined spin polarized channels. Importantly, these main spin selection effects are shown to be either cooperating or competing, explaining why our transport results were not observed before. Overall, this study unveils a path to harness the full potential of low Resitance.Area (RA) graphene interfaces in efficient spin-based devices.
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Affiliation(s)
- Victor Zatko
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Simon M.-M. Dubois
- Institute
of Condensed Matter and Nanosciences (IMCN), Université Catholique de Louvain (UCLouvain), B-1348 Louvain-la-Neuve, Belgium
| | - Florian Godel
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Marta Galbiati
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Julian Peiro
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Anke Sander
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Cécile Carretero
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Aymeric Vecchiola
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Sophie Collin
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Karim Bouzehouane
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Bernard Servet
- Thales
Research and Technology, 1 avenue Augustin Fresnel, 91767 Palaiseau, France
| | - Frédéric Petroff
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Jean-Christophe Charlier
- Institute
of Condensed Matter and Nanosciences (IMCN), Université Catholique de Louvain (UCLouvain), B-1348 Louvain-la-Neuve, Belgium
| | - Marie-Blandine Martin
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Bruno Dlubak
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
| | - Pierre Seneor
- Unité
Mixte de Physique, CNRS, Thales, Université
Paris-Saclay, 91767 Palaiseau, France
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4
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Martin P, Dlubak B, Mattana R, Seneor P, Martin MB, Henner T, Godel F, Sander A, Collin S, Chen L, Suffit S, Mallet F, Lafarge P, Della Rocca ML, Droghetti A, Barraud C. Combined spin filtering actions in hybrid magnetic junctions based on organic chains covalently attached to graphene. NANOSCALE 2022; 14:12692-12702. [PMID: 35993375 DOI: 10.1039/d2nr01917e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
We present a bias-controlled spin-filtering mechanism in spin-valves including a hybrid organic chain/graphene interface. Wet growth conditions of oligomeric molecular chains would usually lead, during standard CMOS-compatible fabrication processes, to the quenching of spintronics properties of metallic spin sources due to oxidation. We demonstrate by X-ray photoelectron spectroscopy that the use of a protective graphene layer fully preserves the metallic character of the ferromagnetic surface and thus its capability to deliver spin polarized currents. We focus here on a small aromatic chain of controllable lengths, formed by nitrobenzene monomers and derived from the commercial 4-nitrobenzene diazonium tetrafluoroborate, covalently attached to the graphene passivated spin sources thanks to electroreduction. A unique bias dependent switch of the spin signal is then observed in complete spin valve devices, from minority to majority spin carriers filtering. First-principles calculations are used to highlight the key role played by the spin-dependent hybridization of electronic states present at the different interfaces. Our work is a first step towards the exploration of spin transport using different functional molecular chains. It opens the perspective of atomic tailoring of magnetic junction devices towards spin and quantum transport control, thanks to the flexibility of ambient electrochemical surface functionalization processes.
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Affiliation(s)
- Pascal Martin
- Université Paris Cité, Laboratoire ITODYS, CNRS, UMR 7086, 75013 Paris, France
| | - Bruno Dlubak
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France.
| | - Richard Mattana
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France.
| | - Pierre Seneor
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France.
| | - Marie-Blandine Martin
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France.
| | - Théo Henner
- Université Paris Cité, Laboratoire Matériaux et Phénomènes Quantiques, CNRS, UMR 7162, 75013 Paris, France.
| | - Florian Godel
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France.
| | - Anke Sander
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France.
| | - Sophie Collin
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France.
| | - Linsai Chen
- Université Paris Cité, Laboratoire ITODYS, CNRS, UMR 7086, 75013 Paris, France
| | - Stéphan Suffit
- Université Paris Cité, Laboratoire Matériaux et Phénomènes Quantiques, CNRS, UMR 7162, 75013 Paris, France.
| | - François Mallet
- Université Paris Cité, Laboratoire Matériaux et Phénomènes Quantiques, CNRS, UMR 7162, 75013 Paris, France.
| | - Philippe Lafarge
- Université Paris Cité, Laboratoire Matériaux et Phénomènes Quantiques, CNRS, UMR 7162, 75013 Paris, France.
| | - Maria Luisa Della Rocca
- Université Paris Cité, Laboratoire Matériaux et Phénomènes Quantiques, CNRS, UMR 7162, 75013 Paris, France.
| | | | - Clément Barraud
- Université Paris Cité, Laboratoire Matériaux et Phénomènes Quantiques, CNRS, UMR 7162, 75013 Paris, France.
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5
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Two-dimensional materials prospects for non-volatile spintronic memories. Nature 2022; 606:663-673. [PMID: 35732761 DOI: 10.1038/s41586-022-04768-0] [Citation(s) in RCA: 70] [Impact Index Per Article: 35.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/07/2020] [Accepted: 04/19/2022] [Indexed: 01/12/2023]
Abstract
Non-volatile magnetic random-access memories (MRAMs), such as spin-transfer torque MRAM and next-generation spin-orbit torque MRAM, are emerging as key to enabling low-power technologies, which are expected to spread over large markets from embedded memories to the Internet of Things. Concurrently, the development and performances of devices based on two-dimensional van der Waals heterostructures bring ultracompact multilayer compounds with unprecedented material-engineering capabilities. Here we provide an overview of the current developments and challenges in regard to MRAM, and then outline the opportunities that can arise by incorporating two-dimensional material technologies. We highlight the fundamental properties of atomically smooth interfaces, the reduced material intermixing, the crystal symmetries and the proximity effects as the key drivers for possible disruptive improvements for MRAM at advanced technology nodes.
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6
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Pourmadadi M, Soleimani Dinani H, Saeidi Tabar F, Khassi K, Janfaza S, Tasnim N, Hoorfar M. Properties and Applications of Graphene and Its Derivatives in Biosensors for Cancer Detection: A Comprehensive Review. BIOSENSORS 2022; 12:bios12050269. [PMID: 35624570 PMCID: PMC9138779 DOI: 10.3390/bios12050269] [Citation(s) in RCA: 15] [Impact Index Per Article: 7.5] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/10/2022] [Revised: 04/11/2022] [Accepted: 04/14/2022] [Indexed: 05/09/2023]
Abstract
Cancer is one of the deadliest diseases worldwide, and there is a critical need for diagnostic platforms for applications in early cancer detection. The diagnosis of cancer can be made by identifying abnormal cell characteristics such as functional changes, a number of vital proteins in the body, abnormal genetic mutations and structural changes, and so on. Identifying biomarker candidates such as DNA, RNA, mRNA, aptamers, metabolomic biomolecules, enzymes, and proteins is one of the most important challenges. In order to eliminate such challenges, emerging biomarkers can be identified by designing a suitable biosensor. One of the most powerful technologies in development is biosensor technology based on nanostructures. Recently, graphene and its derivatives have been used for diverse diagnostic and therapeutic approaches. Graphene-based biosensors have exhibited significant performance with excellent sensitivity, selectivity, stability, and a wide detection range. In this review, the principle of technology, advances, and challenges in graphene-based biosensors such as field-effect transistors (FET), fluorescence sensors, SPR biosensors, and electrochemical biosensors to detect different cancer cells is systematically discussed. Additionally, we provide an outlook on the properties, applications, and challenges of graphene and its derivatives, such as Graphene Oxide (GO), Reduced Graphene Oxide (RGO), and Graphene Quantum Dots (GQDs), in early cancer detection by nanobiosensors.
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Affiliation(s)
- Mehrab Pourmadadi
- School of Chemical Engineering, College of Engineering, University of Tehran, Tehran 1417935840, Iran; (M.P.); (F.S.T.)
| | - Homayoon Soleimani Dinani
- Department of Electrical and Computer Engineering, Missouri University of Science and Technology, Rolla, MO 65409, USA;
| | - Fatemeh Saeidi Tabar
- School of Chemical Engineering, College of Engineering, University of Tehran, Tehran 1417935840, Iran; (M.P.); (F.S.T.)
| | - Kajal Khassi
- Department of Textile Engineering, Isfahan University of Technology, Isfahan 8415683111, Iran;
| | - Sajjad Janfaza
- School of Engineering, University of British Columbia, Kelowna, BC V1V 1V7, Canada; (S.J.); (N.T.)
| | - Nishat Tasnim
- School of Engineering, University of British Columbia, Kelowna, BC V1V 1V7, Canada; (S.J.); (N.T.)
- School of Engineering and Computer Science, University of Victoria, Victoria, BC V8W 2Y2, Canada
| | - Mina Hoorfar
- School of Engineering, University of British Columbia, Kelowna, BC V1V 1V7, Canada; (S.J.); (N.T.)
- School of Engineering and Computer Science, University of Victoria, Victoria, BC V8W 2Y2, Canada
- Correspondence:
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7
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Toko K, Murata H. Layer exchange synthesis of multilayer graphene. NANOTECHNOLOGY 2021; 32:472005. [PMID: 34384058 DOI: 10.1088/1361-6528/ac1d05] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/31/2021] [Accepted: 08/11/2021] [Indexed: 06/13/2023]
Abstract
Low-temperature synthesis of multilayer graphene (MLG) on arbitrary substrates is the key to incorporating MLG-based functional thin films, including transparent electrodes, low-resistance wiring, heat spreaders, and battery anodes in advanced electronic devices. This paper reviews the synthesis of MLG via the layer exchange (LE) phenomenon between carbon and metal from its mechanism to the possibility of device applications. The mechanism of LE is completely different from that of conventional MLG precipitation methods using metals, and the resulting MLG exhibits unique features. Modulation of metal species and growth conditions enables synthesis of high-quality MLG over a wide range of growth temperatures (350 °C-1000 °C) and MLG thicknesses (5-500 nm). Device applications are discussed based on the high electrical conductivity (2700 S cm-1) of MLG and anode operation in Li-ion batteries. Finally, we discuss the future challenges of LE for MLG and its application to flexible devices.
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Affiliation(s)
- Kaoru Toko
- Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
| | - Hiromasa Murata
- Device Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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8
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Sun Y, Niu G, Ren W, Meng X, Zhao J, Luo W, Ye ZG, Xie YH. Hybrid System Combining Two-Dimensional Materials and Ferroelectrics and Its Application in Photodetection. ACS NANO 2021; 15:10982-11013. [PMID: 34184877 DOI: 10.1021/acsnano.1c01735] [Citation(s) in RCA: 27] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Photodetectors are one of the most important components for a future "Internet-of-Things" information society. Compared to the mainstream semiconductor-based photodetectors, emerging devices based on two-dimensional (2D) materials and ferroelectrics as well as their hybrid systems have been extensively studied in recent decades due to their outstanding performances and related interesting physical, electrical, and optoelectronic phenomena. In this paper, we review the photodetection based on 2D materials and ferroelectric hybrid systems. The fundamentals of 2D and ferroelectric materials as well as the interaction in the hybrid system will be introduced. Ferroelectricity modulated optoelectronic properties in the hybrid system will be discussed in detail. After the basics and figures of merit of photodetectors are summarized, the 2D-ferroelectrics devices with different structures including p-n diodes, Schottky diodes, and field-effect transistors will be reviewed and compared. The polarization of ferroelectrics offers the possibility of the modulation and enhancement of the photodetection in the hybrid detectors, which will be discussed in depth. Finally, the challenges and perspectives of the photodetectors based on 2D ferroelectrics will be proposed. This Review outlines the important aspects of the recent development of the hybrid system of 2D and ferroelectric materials, which could interact with each other and thus lead to photodetectors with higher performances. Such a Review will be helpful for the research of emerging physical phenomena and for the design of multifunctional nanoscale electronic and optoelectronic devices.
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Affiliation(s)
- Yanxiao Sun
- Electronic Materials Research Laboratory Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, No. 28, Xianning West Road, Xi'an 710049, Shaanxi, P. R. China
| | - Gang Niu
- Electronic Materials Research Laboratory Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, No. 28, Xianning West Road, Xi'an 710049, Shaanxi, P. R. China
| | - Wei Ren
- Electronic Materials Research Laboratory Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, No. 28, Xianning West Road, Xi'an 710049, Shaanxi, P. R. China
| | - Xiangjian Meng
- National Laboratory for Infrared Physics Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, P. R. China
| | - Jinyan Zhao
- Electronic Materials Research Laboratory Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, No. 28, Xianning West Road, Xi'an 710049, Shaanxi, P. R. China
| | - Wenbo Luo
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 611731, P. R. China
| | - Zuo-Guang Ye
- Department of Chemistry and 4D Laboratories, Simon Fraser University, Burnaby V5A 1S6, British Columbia, Canada
| | - Ya-Hong Xie
- Department of Materials Science and Engineering, University of California Los Angeles, Los Angeles 90024, California, United States
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9
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Shazni Mohammad
Haniff MA, Zainal Ariffin NH, Ooi PC, Mohd Razip Wee MF, Mohamed MA, Hamzah AA, Syono MI, Hashim AM. Practical Route for the Low-Temperature Growth of Large-Area Bilayer Graphene on Polycrystalline Nickel by Cold-Wall Chemical Vapor Deposition. ACS OMEGA 2021; 6:12143-12154. [PMID: 34056368 PMCID: PMC8154121 DOI: 10.1021/acsomega.1c00841] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/16/2021] [Accepted: 04/06/2021] [Indexed: 06/06/2023]
Abstract
We report a practical chemical vapor deposition (CVD) route to produce bilayer graphene on a polycrystalline Ni film from liquid benzene (C6H6) source at a temperature as low as 400 °C in a vertical cold-wall reaction chamber. The low activation energy of C6H6 and the low solubility of carbon in Ni at such a low temperature play a key role in enabling the growth of large-area bilayer graphene in a controlled manner by a Ni surface-mediated reaction. All experiments performed using this method are reproducible with growth capabilities up to an 8 in. wafer-scale substrate. Raman spectra analysis, high-resolution transmission electron microscopy, and selective area electron diffraction studies confirm the growth of Bernal-stacked bilayer graphene with good uniformity over large areas. Electrical characterization studies indicate that the bilayer graphene behaves much like a semiconductor with predominant p-type doping. These findings provide important insights into the wafer-scale fabrication of low-temperature CVD bilayer graphene for next-generation nanoelectronics.
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Affiliation(s)
| | - Nur Hamizah Zainal Ariffin
- Advanced
Devices Lab, MIMOS Berhad, Technology Park Malaysia, Kuala Lumpur 57000, Malaysia
- Advanced
Devices and Materials Engineering Research Lab, Department of Electronic
Systems Engineering, Malaysia-Japan International Institute of Technology, Universiti Teknologi Malaysia, Kuala Lumpur 54100, Malaysia
| | - Poh Choon Ooi
- Institute
of Microengineering and Nanoelectronics, Universiti Kebangsaan Malaysia, Bangi 43600, Malaysia
| | | | - Mohd Ambri Mohamed
- Institute
of Microengineering and Nanoelectronics, Universiti Kebangsaan Malaysia, Bangi 43600, Malaysia
| | - Azrul Azlan Hamzah
- Institute
of Microengineering and Nanoelectronics, Universiti Kebangsaan Malaysia, Bangi 43600, Malaysia
| | - Mohd Ismahadi Syono
- Advanced
Devices Lab, MIMOS Berhad, Technology Park Malaysia, Kuala Lumpur 57000, Malaysia
| | - Abdul Manaf Hashim
- Advanced
Devices and Materials Engineering Research Lab, Department of Electronic
Systems Engineering, Malaysia-Japan International Institute of Technology, Universiti Teknologi Malaysia, Kuala Lumpur 54100, Malaysia
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10
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Zatko V, Dubois SMM, Godel F, Carrétéro C, Sander A, Collin S, Galbiati M, Peiro J, Panciera F, Patriarche G, Brus P, Servet B, Charlier JC, Martin MB, Dlubak B, Seneor P. Band-Gap Landscape Engineering in Large-Scale 2D Semiconductor van der Waals Heterostructures. ACS NANO 2021; 15:7279-7289. [PMID: 33755422 DOI: 10.1021/acsnano.1c00544] [Citation(s) in RCA: 14] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
We present a growth process relying on pulsed laser deposition for the elaboration of complex van der Waals heterostructures on large scales, at a 400 °C CMOS-compatible temperature. Illustratively, we define a multilayer quantum well geometry through successive in situ growths, leading to WSe2 being encapsulated into WS2 layers. The structural constitution of the quantum well geometry is confirmed by Raman spectroscopy combined with transmission electron microscopy. The large-scale high homogeneity of the resulting 2D van der Waals heterostructure is also validated by macro- and microscale Raman mappings. We illustrate the benefit of this integrative in situ approach by showing the structural preservation of even the most fragile 2D layers once encapsulated in a van der Waals heterostructure. Finally, we fabricate a vertical tunneling device based on these large-scale layers and discuss the clear signature of electronic transport controlled by the quantum well configuration with ab initio calculations in support. The flexibility of this direct growth approach, with multilayer stacks being built in a single run, allows for the definition of complex 2D heterostructures barely accessible with usual exfoliation or transfer techniques of 2D materials. Reminiscent of the III-V semiconductors' successful exploitation, our approach unlocks virtually infinite combinations of large 2D material families in any complex van der Waals heterostructure design.
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Affiliation(s)
- Victor Zatko
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Simon Mutien-Marie Dubois
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
- Institute of Condensed Matter and Nanosciences (IMCN), Université Catholique de Louvain, B-1348 Louvain-la-Neuve, Belgium
| | - Florian Godel
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Cécile Carrétéro
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Anke Sander
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Sophie Collin
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Marta Galbiati
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Julian Peiro
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Federico Panciera
- Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, 91120 Palaiseau, France
| | - Gilles Patriarche
- Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, 91120 Palaiseau, France
| | - Pierre Brus
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
- Thales Research and Technology, 1 Avenue Augustin Fresnel, 91767 Palaiseau, France
| | - Bernard Servet
- Thales Research and Technology, 1 Avenue Augustin Fresnel, 91767 Palaiseau, France
| | - Jean-Christophe Charlier
- Institute of Condensed Matter and Nanosciences (IMCN), Université Catholique de Louvain, B-1348 Louvain-la-Neuve, Belgium
| | - Marie-Blandine Martin
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Bruno Dlubak
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
| | - Pierre Seneor
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767 Palaiseau, France
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11
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Meng L, Lu J, Bai Y, Liu L, Tang J, Zhang X. Graphene adlayer growth between nonepitaxial graphene and the Ni(111) substrate: a theoretical study. Phys Chem Chem Phys 2021; 23:2222-2228. [PMID: 33439169 DOI: 10.1039/d0cp04667a] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/22/2022]
Abstract
Understanding the fundamentals of chemical vapor deposition bilayer graphene growth is crucial for its synthesis. By employing density functional theory calculations and classical molecular dynamics simulations, we have investigated the evolution of carbon structures and the kinetics of the adlayer graphene nucleation between the graphene top layer (GTL) and the Ni(111) substrate. Compared to the epitaxial GTL, the weaker interaction between the nonepitaxial GTL and the Ni(111) substrate makes the nucleation of the adlayer more favorable. Furthermore, the defects involving in the adlayer graphene are easier to be healed by adopting the nonepitaxial GTL. Our results agree well with the experimental observation and demonstrate that the adlayer graphene with a high quality can be grown underneath the nonepitaxial GTL on Ni-like substrates.
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Affiliation(s)
- Lijuan Meng
- Department of Physics, Yancheng Institute of Technology, Yancheng, Jiangsu 224051, China
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12
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Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition. Catalysts 2020. [DOI: 10.3390/catal10111305] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022] Open
Abstract
Chemical vapor deposition is the most promising technique for the mass production of high-quality graphene, in which the metal substrate plays a crucial role in the catalytic decomposition of the carbon source, assisting the attachment of the active carbon species, and regulating the structure of the graphene film. Due to some drawbacks of single metal substrates, alloy substrates have gradually attracted attention owing to their complementarity in the catalytic growth of graphene. In this review, we focus on the rational design of binary alloys, such as Cu/Ni, Ni/Mo, and Cu/Si, to control the layer numbers and growth rate of graphene. By analyzing the elementary steps of graphene growth, general principles are summarized in terms of the catalytic activity, metal–carbon interactions, carbon solubility, and mutual miscibility. Several challenges in this field are also put forward to inspire the novel design of alloy catalysts and the synthesis of graphene films bearing desirable properties.
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13
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Zietz O, Olson S, Coyne B, Liu Y, Jiao J. Characterization and Manipulation of Carbon Precursor Species during Plasma Enhanced Chemical Vapor Deposition of Graphene. NANOMATERIALS 2020; 10:nano10112235. [PMID: 33187078 PMCID: PMC7696751 DOI: 10.3390/nano10112235] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/28/2020] [Revised: 11/05/2020] [Accepted: 11/09/2020] [Indexed: 11/25/2022]
Abstract
To develop a synthesis technique providing enhanced control of graphene film quality and uniformity, a systematic characterization and manipulation of hydrocarbon precursors generated during plasma enhanced chemical vapor deposition of graphene is presented. Remote ionization of acetylene is observed to generate a variety of neutral and ionized hydrocarbon precursors, while in situ manipulation of the size and reactivity of carbon species permitted to interact with the growth catalyst enables control of the resultant graphene morphology. Selective screening of high energy hydrocarbon ions coupled with a multistage bias growth regime results in the production of 90% few-to-monolayer graphene on 50 nm Ni/Cu alloy catalysts at 500 °C. Additionally, synthesis with low power secondary ionization processes is performed and reveals further control during the growth, enabling a 50% reduction in average defect densities throughout the film. Mass spectrometry and UV-Vis spectroscopy monitoring of the reaction environment in conjunction with Raman characterization of the synthesized graphene films facilitates correlation of the carbon species permitted to reach the catalyst surface to the ultimate quality, layer number, and uniformity of the graphene film. These findings reveal a robust technique to control graphene synthesis pathways during plasma enhanced chemical vapor deposition.
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Affiliation(s)
- Otto Zietz
- Department of Mechanical and Materials Engineering, Portland State University, 1930 SW 4th Ave, Portland, OR 97201, USA; (O.Z.); (S.O.); (B.C.)
| | - Samuel Olson
- Department of Mechanical and Materials Engineering, Portland State University, 1930 SW 4th Ave, Portland, OR 97201, USA; (O.Z.); (S.O.); (B.C.)
| | - Brendan Coyne
- Department of Mechanical and Materials Engineering, Portland State University, 1930 SW 4th Ave, Portland, OR 97201, USA; (O.Z.); (S.O.); (B.C.)
| | - Yilian Liu
- Department of Physics, Reed College, 3203 SE Woodstock Blvd., Portland, OR 97202, USA;
| | - Jun Jiao
- Department of Mechanical and Materials Engineering, Portland State University, 1930 SW 4th Ave, Portland, OR 97201, USA; (O.Z.); (S.O.); (B.C.)
- Correspondence:
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14
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Piquemal-Banci M, Galceran R, Dubois SMM, Zatko V, Galbiati M, Godel F, Martin MB, Weatherup RS, Petroff F, Fert A, Charlier JC, Robertson J, Hofmann S, Dlubak B, Seneor P. Spin filtering by proximity effects at hybridized interfaces in spin-valves with 2D graphene barriers. Nat Commun 2020; 11:5670. [PMID: 33168805 PMCID: PMC7652852 DOI: 10.1038/s41467-020-19420-6] [Citation(s) in RCA: 21] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/30/2019] [Accepted: 10/12/2020] [Indexed: 11/09/2022] Open
Abstract
We report on spin transport in state-of-the-art epitaxial monolayer graphene based 2D-magnetic tunnel junctions (2D-MTJs). In our measurements, supported by ab-initio calculations, the strength of interaction between ferromagnetic electrodes and graphene monolayers is shown to fundamentally control the resulting spin signal. In particular, by switching the graphene/ferromagnet interaction, spin transport reveals magneto-resistance signal MR > 80% in junctions with low resistance × area products. Descriptions based only on a simple K-point filtering picture (i.e. MR increase with the number of layers) are not sufficient to predict the behavior of our devices. We emphasize that hybridization effects need to be taken into account to fully grasp the spin properties (such as spin dependent density of states) when 2D materials are used as ultimately thin interfaces. While this is only a first demonstration, we thus introduce the fruitful potential of spin manipulation by proximity effect at the hybridized 2D material / ferromagnet interface for 2D-MTJs.
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Affiliation(s)
- Maëlis Piquemal-Banci
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
| | - Regina Galceran
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
| | - Simon M-M Dubois
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
- Institute of Condensed Matter and Nanosciences (IMCN), Université Catholique de Louvain, B-1348, Louvain-la-Neuve, Belgium
| | - Victor Zatko
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
| | - Marta Galbiati
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
| | - Florian Godel
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
| | - Marie-Blandine Martin
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
- Department of Engineering, University of Cambridge, Cambridge, CB21PZ, UK
| | - Robert S Weatherup
- School of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL, UK
- University of Manchester at Harwell, Diamond Light Source, Didcot, Oxfordshire, OX11 0DE, UK
| | - Frédéric Petroff
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
| | - Albert Fert
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France
| | - Jean-Christophe Charlier
- Institute of Condensed Matter and Nanosciences (IMCN), Université Catholique de Louvain, B-1348, Louvain-la-Neuve, Belgium
| | - John Robertson
- Department of Engineering, University of Cambridge, Cambridge, CB21PZ, UK
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, Cambridge, CB21PZ, UK
| | - Bruno Dlubak
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France.
| | - Pierre Seneor
- Unité Mixte de Physique, CNRS, Thales, Université Paris-Saclay, 91767, Palaiseau, France.
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15
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Al-Hilfi SH, Derby B, Martin PA, Whitehead JC. Chemical vapour deposition of graphene on copper-nickel alloys: the simulation of a thermodynamic and kinetic approach. NANOSCALE 2020; 12:15283-15294. [PMID: 32647854 DOI: 10.1039/d0nr00302f] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Chemical vapour deposition (CVD) of graphene on transition metals is generally believed to be the fabrication route best suited for the production of high-quality large-area graphene sheets. The mechanism of CVD graphene growth is governed by interactions in both the gas phase and at the surface. Here we present a simulation of the CVD graphene growth mechanism which includes thermodynamics, gas phase kinetics and the surface reaction in a sequential manner. The thermodynamic simulation shows that the deposition driving force is the greatest for high carbon to hydrogen ratios and reaches a maximum at around 850 °C. No graphene growth is observed below this temperature. The surface kinetic model also shows that below this temperature, the carbon surface concentration is less than the solubility limit, thus no film can grow. The effect of the reaction chamber geometry on the product concentrations was clear from the gas phase decomposition reactions. The gas residence times studied here (around 0.07 s) show that the optimum gas phase composition is far from that expected at thermodynamic equilibrium. The surface kinetics of CH4 reactions on Ni, Cu and Cu-Ni surfaces shows good agreement with the experimental results for different growth pressures (0.1 to 0.7 mbar), temperatures (600 to 1200 °C) and different Ni thicknesses (25-500 μm). Also, the model works well when substrates with various C solubilities are used. The thermodynamic and kinetic models described here can be used for the design of improved reactors to optimise the production of graphene with differing qualities, either single or multi-layer and sizes. More importantly, the transfer to a continuous process with a moving substrate should also be possible using the model if it is extended from 2D to 3D.
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Affiliation(s)
- Samir H Al-Hilfi
- School of Applied Sciences, University of Technology, Baghdad, Iraq.
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16
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Rahman MZ, Kibria MG, Mullins CB. Metal-free photocatalysts for hydrogen evolution. Chem Soc Rev 2020; 49:1887-1931. [DOI: 10.1039/c9cs00313d] [Citation(s) in RCA: 231] [Impact Index Per Article: 57.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/22/2022]
Abstract
This article provides a comprehensive review of the latest progress, challenges and recommended future research related to metal-free photocatalysts for hydrogen productionviawater-splitting.
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Affiliation(s)
- Mohammad Ziaur Rahman
- John J. Mcketta Department of Chemical Engineering and Department of Chemistry
- The University of Texas at Austin
- Austin
- USA
| | - Md Golam Kibria
- Department of Chemical and Petroleum Engineering
- University of Calgary
- 2500 University Drive
- NW Calgary
- Canada
| | - Charles Buddie Mullins
- John J. Mcketta Department of Chemical Engineering and Department of Chemistry
- The University of Texas at Austin
- Austin
- USA
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17
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Nagai Y, Sugime H, Noda S. 1.5 Minute-synthesis of continuous graphene films by chemical vapor deposition on Cu foils rolled in three dimensions. Chem Eng Sci 2019. [DOI: 10.1016/j.ces.2019.02.038] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/27/2022]
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18
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Wang R, Purdie DG, Fan Y, Massabuau FCP, Braeuninger-Weimer P, Burton OJ, Blume R, Schloegl R, Lombardo A, Weatherup RS, Hofmann S. A Peeling Approach for Integrated Manufacturing of Large Monolayer h-BN Crystals. ACS NANO 2019; 13:2114-2126. [PMID: 30642169 DOI: 10.1021/acsnano.8b08712] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Hexagonal boron nitride (h-BN) is the only known material aside from graphite with a structure composed of simple, stable, noncorrugated atomically thin layers. While historically used as a lubricant in powder form, h-BN layers have become particularly attractive as an ultimately thin insulator, barrier, or encapsulant. Practically all emerging electronic and photonic device concepts currently rely on h-BN exfoliated from small bulk crystallites, which limits device dimensions and process scalability. We here focus on a systematic understanding of Pt-catalyzed h-BN crystal formation, in order to address this integration challenge for monolayer h-BN via an integrated chemical vapor deposition (CVD) process that enables h-BN crystal domain sizes exceeding 0.5 mm and a merged, continuous layer in a growth time of less than 45 min. The process makes use of commercial, reusable Pt foils and allows a delamination process for easy and clean h-BN layer transfer. We demonstrate sequential pick-up for the assembly of graphene/h-BN heterostructures with atomic layer precision, while minimizing interfacial contamination. The approach can be readily combined with other layered materials and enables the integration of CVD h-BN into high-quality, reliable 2D material device layer stacks.
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Affiliation(s)
- Ruizhi Wang
- Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
| | - David G Purdie
- Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
- Cambridge Graphene Centre , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
| | - Ye Fan
- Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
| | - Fabien C-P Massabuau
- Department of Materials Science and Metallurgy , University of Cambridge , 27 Charles Babbage Road , Cambridge CB3 0FA , United Kingdom
| | - Philipp Braeuninger-Weimer
- Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
| | - Oliver J Burton
- Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
| | - Raoul Blume
- Helmholtz-Zentrum Berlin für Materialen und Energie , D-12489 Berlin , Germany
| | | | - Antonio Lombardo
- Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
- Cambridge Graphene Centre , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
| | - Robert S Weatherup
- School of Chemistry , University of Manchester , Oxford Road , Manchester M13 9PL , U.K
- University of Manchester at Harwell, Diamond Light Source , Didcot , Oxfordshire OX11 0DE , U.K
| | - Stephan Hofmann
- Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge CB3 0FA , United Kingdom
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19
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Rao R, Pint CL, Islam AE, Weatherup RS, Hofmann S, Meshot ER, Wu F, Zhou C, Dee N, Amama PB, Carpena-Nuñez J, Shi W, Plata DL, Penev ES, Yakobson BI, Balbuena PB, Bichara C, Futaba DN, Noda S, Shin H, Kim KS, Simard B, Mirri F, Pasquali M, Fornasiero F, Kauppinen EI, Arnold M, Cola BA, Nikolaev P, Arepalli S, Cheng HM, Zakharov DN, Stach EA, Zhang J, Wei F, Terrones M, Geohegan DB, Maruyama B, Maruyama S, Li Y, Adams WW, Hart AJ. Carbon Nanotubes and Related Nanomaterials: Critical Advances and Challenges for Synthesis toward Mainstream Commercial Applications. ACS NANO 2018; 12:11756-11784. [PMID: 30516055 DOI: 10.1021/acsnano.8b06511] [Citation(s) in RCA: 177] [Impact Index Per Article: 29.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/12/2023]
Abstract
Advances in the synthesis and scalable manufacturing of single-walled carbon nanotubes (SWCNTs) remain critical to realizing many important commercial applications. Here we review recent breakthroughs in the synthesis of SWCNTs and highlight key ongoing research areas and challenges. A few key applications that capitalize on the properties of SWCNTs are also reviewed with respect to the recent synthesis breakthroughs and ways in which synthesis science can enable advances in these applications. While the primary focus of this review is on the science framework of SWCNT growth, we draw connections to mechanisms underlying the synthesis of other 1D and 2D materials such as boron nitride nanotubes and graphene.
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Affiliation(s)
- Rahul Rao
- Materials and Manufacturing Directorate, Air Force Research Laboratory , Wright Patterson Air Force Base , Dayton , Ohio 45433 , United States
- UES Inc. , Dayton , Ohio 45433 , United States
| | - Cary L Pint
- Department of Mechanical Engineering , Vanderbilt University , Nashville , Tennessee 37235 United States
| | - Ahmad E Islam
- Materials and Manufacturing Directorate, Air Force Research Laboratory , Wright Patterson Air Force Base , Dayton , Ohio 45433 , United States
- UES Inc. , Dayton , Ohio 45433 , United States
| | - Robert S Weatherup
- School of Chemistry , University of Manchester , Oxford Road , Manchester M13 9PL , U.K
- University of Manchester at Harwell, Diamond Light Source, Didcot , Oxfordshire OX11 0DE , U.K
| | - Stephan Hofmann
- Department of Engineering , University of Cambridge , Cambridge CB3 0FA , U.K
| | - Eric R Meshot
- Physical and Life Sciences Directorate , Lawrence Livermore National Laboratory , Livermore , California 94550 United States
| | - Fanqi Wu
- Ming-Hsieh Department of Electrical Engineering , University of Southern California , Los Angeles , California 90089 , United States
| | - Chongwu Zhou
- Ming-Hsieh Department of Electrical Engineering , University of Southern California , Los Angeles , California 90089 , United States
| | - Nicholas Dee
- Department of Mechanical Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Placidus B Amama
- Tim Taylor Department of Chemical Engineering , Kansas State University , Manhattan , Kansas 66506 , United States
| | - Jennifer Carpena-Nuñez
- Materials and Manufacturing Directorate, Air Force Research Laboratory , Wright Patterson Air Force Base , Dayton , Ohio 45433 , United States
- UES Inc. , Dayton , Ohio 45433 , United States
| | - Wenbo Shi
- Department of Chemical and Environmental Engineering , Yale University , New Haven , Connecticut 06520 , United States
| | - Desiree L Plata
- Department of Civil and Environmental Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
| | - Evgeni S Penev
- Department of Materials Science and NanoEngineering , Rice University , Houston , Texas 77005 , United States
| | - Boris I Yakobson
- Department of Materials Science and NanoEngineering , Rice University , Houston , Texas 77005 , United States
| | - Perla B Balbuena
- Department of Chemical Engineering, Department of Materials Science and Engineering, Department of Chemistry , Texas A&M University , College Station , Texas 77843 , United States
| | - Christophe Bichara
- Aix-Marseille University and CNRS , CINaM UMR 7325 , 13288 Marseille , France
| | - Don N Futaba
- Nanotube Research Center , National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba 305-8565 , Japan
| | - Suguru Noda
- Department of Applied Chemistry and Waseda Research Institute for Science and Engineering , Waseda University , 3-4-1 Okubo , Shinjuku-ku, Tokyo 169-8555 , Japan
| | - Homin Shin
- Security and Disruptive Technologies Research Centre, Emerging Technologies Division , National Research Council Canada , Ottawa , Ontario K1A 0R6 , Canada
| | - Keun Su Kim
- Security and Disruptive Technologies Research Centre, Emerging Technologies Division , National Research Council Canada , Ottawa , Ontario K1A 0R6 , Canada
| | - Benoit Simard
- Security and Disruptive Technologies Research Centre, Emerging Technologies Division , National Research Council Canada , Ottawa , Ontario K1A 0R6 , Canada
| | - Francesca Mirri
- Department of Materials Science and NanoEngineering , Rice University , Houston , Texas 77005 , United States
| | - Matteo Pasquali
- Department of Materials Science and NanoEngineering , Rice University , Houston , Texas 77005 , United States
| | - Francesco Fornasiero
- Physical and Life Sciences Directorate , Lawrence Livermore National Laboratory , Livermore , California 94550 United States
| | - Esko I Kauppinen
- Department of Applied Physics , Aalto University School of Science , P.O. Box 15100 , FI-00076 Espoo , Finland
| | - Michael Arnold
- Department of Materials Science and Engineering University of Wisconsin-Madison , Madison , Wisconsin 53706 , United States
| | - Baratunde A Cola
- George W. Woodruff School of Mechanical Engineering and School of Materials Science and Engineering , Georgia Institute of Technology , Atlanta , Georgia 30332 , United States
| | - Pavel Nikolaev
- Materials and Manufacturing Directorate, Air Force Research Laboratory , Wright Patterson Air Force Base , Dayton , Ohio 45433 , United States
- UES Inc. , Dayton , Ohio 45433 , United States
| | - Sivaram Arepalli
- Department of Materials Science and NanoEngineering , Rice University , Houston , Texas 77005 , United States
| | - Hui-Ming Cheng
- Tsinghua-Berkeley Shenzhen Institute , Tsinghua University , Shenzhen 518055 , China
- Shenyang National Laboratory for Materials Science , Institute of Metal Research, Chinese Academy of Sciences , Shenyang 110016 , China
| | - Dmitri N Zakharov
- Center for Functional Nanomaterials , Brookhaven National Laboratory , Upton , New York 11973 , United States
| | - Eric A Stach
- Department of Materials Science and Engineering , University of Pennsylvania , Philadelphia , Pennsylvania 19104 , United States
| | - Jin Zhang
- College of Chemistry and Molecular Engineering , Peking University , Beijing 100871 , China
| | - Fei Wei
- Beijing Key Laboratory of Green Chemical Reaction Engineering and Technology, Department of Chemical Engineering , Tsinghua University , Beijing 100084 , China
| | - Mauricio Terrones
- Department of Physics and Center for Two-Dimensional and Layered Materials , The Pennsylvania State University , University Park , Pennsylvania 16802 , United States
| | - David B Geohegan
- Center for Nanophase Materials Sciences , Oak Ridge National Laboratory , Oak Ridge , Tennessee 37831 , United States
| | - Benji Maruyama
- Materials and Manufacturing Directorate, Air Force Research Laboratory , Wright Patterson Air Force Base , Dayton , Ohio 45433 , United States
| | - Shigeo Maruyama
- Department of Mechanical Engineering , The University of Tokyo , 7-3-1 Hongo , Bunkyo-ku , Tokyo 113-8656 , Japan
| | - Yan Li
- College of Chemistry and Molecular Engineering , Peking University , Beijing 100871 , China
| | - W Wade Adams
- Department of Materials Science and NanoEngineering , Rice University , Houston , Texas 77005 , United States
| | - A John Hart
- Department of Mechanical Engineering , Massachusetts Institute of Technology , Cambridge , Massachusetts 02139 , United States
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20
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21
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Gao J, Xu Z, Chen S, Bharathi MS, Zhang YW. Computational Understanding of the Growth of 2D Materials. ADVANCED THEORY AND SIMULATIONS 2018. [DOI: 10.1002/adts.201800085] [Citation(s) in RCA: 22] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/03/2023]
Affiliation(s)
- Junfeng Gao
- Institute of High Performance Computing; A*STAR Singapore 138632 Singapore
| | - Ziwei Xu
- School of Materials Science & Engineering; Jiangsu University; Zhenjiang 212013 China
| | - Shuai Chen
- Institute of High Performance Computing; A*STAR Singapore 138632 Singapore
| | | | - Yong-Wei Zhang
- Institute of High Performance Computing; A*STAR Singapore 138632 Singapore
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22
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Cho S, Jung I, Jang HJ, Liu L, Park S. Bimetallic junction mediated synthesis of multilayer graphene edges towards ultrahigh capacity for lithium ion batteries. NANOSCALE 2018; 10:5214-5220. [PMID: 29497714 DOI: 10.1039/c7nr08109j] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
In this work, we report on a novel strategy to synthesize high-density graphene edges on a vertically-aligned nanorod array substrate based on multiple segmented Ni-Au units. The growth of graphene layers on Ni and Au was performed by chemical vapor deposition (CVD) leading to the effective generation of edge-rich multilayer graphene due to the distinct carbon solubility. The composite material was applied as an anode in a lithium ion battery (LIB) whose discharging capacity was found to closely depend on the total number of Ni-Au junctions within the vertical nanorods. Graphene deposited on the 19-junction composite Ni-(Au-Ni)9 exhibited an ultrahigh capacity of 86.3 μAh cm-2 at 50 μA cm-2 which was much higher than graphene deposited on 1-junction, 2-junction and pure Ni nanorods. This ultrahigh capacity was mainly ascribed to the generation of high-density graphene edges engineered by the bimetallic junction. The proposed strategy opens new appealing routes to synthesize high-density graphene edges using bimetallic junctions, which is promising for increasing the performance of LIBs and other electrochemical energy systems (supercapacitors, fuel cells, etc.).
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Affiliation(s)
- Sanghyun Cho
- Department of Chemistry and Department of Energy Science, Sungkyunkwan University, Suwon 440-746, South Korea.
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23
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Rameshan R, Vonk V, Franz D, Drnec J, Penner S, Garhofer A, Mittendorfer F, Stierle A, Klötzer B. Role of Precursor Carbides for Graphene Growth on Ni(111). Sci Rep 2018; 8:2662. [PMID: 29422517 PMCID: PMC5805774 DOI: 10.1038/s41598-018-20777-4] [Citation(s) in RCA: 13] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/15/2017] [Accepted: 01/23/2018] [Indexed: 11/13/2022] Open
Abstract
Surface X-ray Diffraction was used to study the transformation of a carbon-supersaturated carbidic precursor toward a complete single layer of graphene in the temperature region below 703 K without carbon supply from the gas phase. The excess carbon beyond the 0.45 monolayers of C atoms within a single Ni2C layer is accompanied by sharpened reflections of the |4772| superstructure, along with ring-like diffraction features resulting from non-coincidence rotated Ni2C-type domains. A dynamic Ni2C reordering process, accompanied by slow carbon loss to subsurface regions, is proposed to increase the Ni2C 2D carbide long-range order via ripening toward coherent domains, and to increase the local supersaturation of near-surface dissolved carbon required for spontaneous graphene nucleation and growth. Upon transformation, the intensities of the surface carbide reflections and of specific powder-like diffraction rings vanish. The associated change of the specular X-ray reflectivity allows to quantify a single, fully surface-covering layer of graphene (2 ML C) without diffraction contributions of rotated domains. The simultaneous presence of top-fcc and bridge-top configurations of graphene explains the crystal truncation rod data of the graphene-covered surface. Structure determination of the |4772| precursor surface-carbide using density functional theory is in perfect agreement with the experimentally derived X-ray structure factors.
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Affiliation(s)
- Raffael Rameshan
- Institute of Physical Chemistry, University of Innsbruck, Innrain 52c, A-6020, Innsbruck, Austria
- Department of Inorganic Chemistry, Fritz-Haber-Institute of the Max-Planck-Society, Faradayweg 4-6, D-14195, Berlin, Germany
| | - Vedran Vonk
- Deutsches Elektronen-Synchrotron (DESY), D-22607, Hamburg, Germany
| | - Dirk Franz
- Deutsches Elektronen-Synchrotron (DESY), D-22607, Hamburg, Germany
- Fachbereich Physik, Universität Hamburg, D-22607, Hamburg, Germany
| | - Jakub Drnec
- ESRF-The European Synchrotron, Avenue des Martyrs 71, 38000, Grenoble, France
| | - Simon Penner
- Institute of Physical Chemistry, University of Innsbruck, Innrain 52c, A-6020, Innsbruck, Austria
| | - Andreas Garhofer
- Institut für Angewandte Physik, Center for Computational Materials Science, Technische Universität Wien, Wiedner Hauptstrasse 8-10, A-1040, Wien, Austria
| | - Florian Mittendorfer
- Institut für Angewandte Physik, Center for Computational Materials Science, Technische Universität Wien, Wiedner Hauptstrasse 8-10, A-1040, Wien, Austria
| | - Andreas Stierle
- Deutsches Elektronen-Synchrotron (DESY), D-22607, Hamburg, Germany
- Fachbereich Physik, Universität Hamburg, D-22607, Hamburg, Germany
| | - Bernhard Klötzer
- Institute of Physical Chemistry, University of Innsbruck, Innrain 52c, A-6020, Innsbruck, Austria.
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24
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McLean B, Eveleens CA, Mitchell I, Webber GB, Page AJ. Catalytic CVD synthesis of boron nitride and carbon nanomaterials - synergies between experiment and theory. Phys Chem Chem Phys 2018; 19:26466-26494. [PMID: 28849841 DOI: 10.1039/c7cp03835f] [Citation(s) in RCA: 22] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Low-dimensional carbon and boron nitride nanomaterials - hexagonal boron nitride, graphene, boron nitride nanotubes and carbon nanotubes - remain at the forefront of advanced materials research. Catalytic chemical vapour deposition has become an invaluable technique for reliably and cost-effectively synthesising these materials. In this review, we will emphasise how a synergy between experimental and theoretical methods has enhanced the understanding and optimisation of this synthetic technique. This review examines recent advances in the application of CVD to synthesising boron nitride and carbon nanomaterials and highlights where, in many cases, molecular simulations and quantum chemistry have provided key insights complementary to experimental investigation. This synergy is particularly prominent in the field of carbon nanotube and graphene CVD synthesis, and we propose here it will be the key to future advances in optimisation of CVD synthesis of boron nitride nanomaterials, boron nitride - carbon composite materials, and other nanomaterials generally.
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Affiliation(s)
- Ben McLean
- School of Environmental & Life Sciences, The University of Newcastle, Callaghan NSW 2308, Australia.
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25
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Panchal V, Yang Y, Cheng G, Hu J, Kruskopf M, Liu CI, Rigosi AF, Melios C, Hight Walker AR, Newell DB, Kazakova O, Elmquist RE. Confocal laser scanning microscopy for rapid optical characterization of graphene. COMMUNICATIONS PHYSICS 2018; 1:10.1038/s42005-018-0084-6. [PMID: 31093580 PMCID: PMC6512973 DOI: 10.1038/s42005-018-0084-6] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/29/2018] [Accepted: 10/16/2018] [Indexed: 05/29/2023]
Abstract
Two-dimensional (2D) materials such as graphene have become the focus of extensive research efforts in condensed matter physics. They provide opportunities for both fundamental research and applications across a wide range of industries. Ideally, characterization of graphene requires non-invasive techniques with single-atomic-layer thickness resolution and nanometer lateral resolution. Moreover, commercial application of graphene requires fast and large-area scanning capability. We demonstrate the optimized balance of image resolution and acquisition time of non-invasive confocal laser scanning microscopy (CLSM), rendering it an indispensable tool for rapid analysis of mass-produced graphene. It is powerful for analysis of 1-5 layers of exfoliated graphene on Si/SiO2, and allows us to distinguish the interfacial layer and 1-3 layers of epitaxial graphene on SiC substrates. Furthermore, CLSM shows excellent correlation with conventional optical microscopy, atomic force microscopy, Kelvin probe force microscopy, conductive atomic force microscopy, scanning electron microscopy and Raman mapping.
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Affiliation(s)
- Vishal Panchal
- National Physical Laboratory, Hampton Road, Teddington TW11 0LW, UK
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Yanfei Yang
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - Guangjun Cheng
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Jiuning Hu
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Mattias Kruskopf
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Chieh-I Liu
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 106, Taiwan
| | - Albert F Rigosi
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Christos Melios
- National Physical Laboratory, Hampton Road, Teddington TW11 0LW, UK
| | | | - David B Newell
- National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Olga Kazakova
- National Physical Laboratory, Hampton Road, Teddington TW11 0LW, UK
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26
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Sugime H, D'Arsié L, Esconjauregui S, Zhong G, Wu X, Hildebrandt E, Sezen H, Amati M, Gregoratti L, Weatherup RS, Robertson J. Low temperature growth of fully covered single-layer graphene using a CoCu catalyst. NANOSCALE 2017; 9:14467-14475. [PMID: 28926077 DOI: 10.1039/c7nr02553j] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
A bimetallic CoCu alloy thin-film catalyst is developed that enables the growth of uniform, high-quality graphene at 750 °C in 3 min by chemical vapour deposition. The growth outcome is found to vary significantly as the Cu concentration is varied, with ∼1 at% Cu added to Co yielding complete coverage single-layer graphene growth for the conditions used. The suppression of multilayer formation is attributable to Cu decoration of high reactivity sites on the Co surface which otherwise serve as preferential nucleation sites for multilayer graphene. X-ray photoemission spectroscopy shows that Co and Cu form an alloy at high temperatures, which has a drastically lower carbon solubility, as determined by using the calculated Co-Cu-C ternary phase diagram. Raman spectroscopy confirms the high quality (ID/IG < 0.05) and spatial uniformity of the single-layer graphene. The rational design of a bimetallic catalyst highlights the potential of catalyst alloying for producing two-dimensional materials with tailored properties.
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Affiliation(s)
- Hisashi Sugime
- Waseda Institute for Advanced Study, Waseda University, Tokyo 169-8050, Japan. and Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK
| | - Lorenzo D'Arsié
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK
| | | | - Guofang Zhong
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK
| | - Xingyi Wu
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK
| | - Eugen Hildebrandt
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK
| | - Hikmet Sezen
- Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park, S.S. 14 km 163.5, 34149, Trieste, Italy
| | - Matteo Amati
- Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park, S.S. 14 km 163.5, 34149, Trieste, Italy
| | - Luca Gregoratti
- Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park, S.S. 14 km 163.5, 34149, Trieste, Italy
| | - Robert S Weatherup
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK
| | - John Robertson
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK
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27
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Schwarz D, Noda Y, Klouda J, Schwarzová-Pecková K, Tarábek J, Rybáček J, Janoušek J, Simon F, Opanasenko MV, Čejka J, Acharjya A, Schmidt J, Selve S, Reiter-Scherer V, Severin N, Rabe JP, Ecorchard P, He J, Polozij M, Nachtigall P, Bojdys MJ. Twinned Growth of Metal-Free, Triazine-Based Photocatalyst Films as Mixed-Dimensional (2D/3D) van der Waals Heterostructures. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2017; 29:1703399. [PMID: 28859235 DOI: 10.1002/adma.201703399] [Citation(s) in RCA: 30] [Impact Index Per Article: 4.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/18/2017] [Revised: 07/31/2017] [Indexed: 06/07/2023]
Abstract
Design and synthesis of ordered, metal-free layered materials is intrinsically difficult due to the limitations of vapor deposition processes that are used in their making. Mixed-dimensional (2D/3D) metal-free van der Waals (vdW) heterostructures based on triazine (C3 N3 ) linkers grow as large area, transparent yellow-orange membranes on copper surfaces from solution. The membranes have an indirect band gap (Eg,opt = 1.91 eV, Eg,elec = 1.84 eV) and are moderately porous (124 m2 g-1 ). The material consists of a crystalline 2D phase that is fully sp2 hybridized and provides structural stability, and an amorphous, porous phase with mixed sp2 -sp hybridization. Interestingly, this 2D/3D vdW heterostructure grows in a twinned mechanism from a one-pot reaction mixture: unprecedented for metal-free frameworks and a direct consequence of on-catalyst synthesis. Thanks to the efficient type I heterojunction, electron transfer processes are fundamentally improved and hence, the material is capable of metal-free, light-induced hydrogen evolution from water without the need for a noble metal cocatalyst (34 µmol h-1 g-1 without Pt). The results highlight that twinned growth mechanisms are observed in the realm of "wet" chemistry, and that they can be used to fabricate otherwise challenging 2D/3D vdW heterostructures with composite properties.
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Affiliation(s)
- Dana Schwarz
- Faculty of Science, Department of Organic Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
| | - Yu Noda
- Faculty of Science, Department of Organic Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
- Institute of Organic Chemistry and Biochemistry of the CAS, Flemingovo nám. 2, 166 10, Prague 6, Czech Republic
| | - Jan Klouda
- Faculty of Science, Department of Analytical Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
| | - Karolina Schwarzová-Pecková
- Faculty of Science, Department of Analytical Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
| | - Ján Tarábek
- Institute of Organic Chemistry and Biochemistry of the CAS, Flemingovo nám. 2, 166 10, Prague 6, Czech Republic
| | - Jiří Rybáček
- Institute of Organic Chemistry and Biochemistry of the CAS, Flemingovo nám. 2, 166 10, Prague 6, Czech Republic
| | - Jiří Janoušek
- Institute of Organic Chemistry and Biochemistry of the CAS, Flemingovo nám. 2, 166 10, Prague 6, Czech Republic
- Faculty of Chemical Engineering, Department of Analytical Chemistry, University of Chemistry and Technology Prague, Technická 3, 160 00, Prague 6, Czech Republic
| | - Frank Simon
- Leibniz Institute of Polymer Research Dresden, Hohe Str. 6, 01069, Dresden, Germany
| | - Maksym V Opanasenko
- J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 2155/3, 182 00, Prague 8, Czech Republic
| | - Jiří Čejka
- J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 2155/3, 182 00, Prague 8, Czech Republic
| | - Amitava Acharjya
- Technische Universität Berlin, Institute of Chemistry, Hardenbergstr. 40, 10623, Berlin, Germany
| | - Johannes Schmidt
- Technische Universität Berlin, Institute of Chemistry, Hardenbergstr. 40, 10623, Berlin, Germany
| | - Sören Selve
- Technische Universität Berlin, Institute of Chemistry, Hardenbergstr. 40, 10623, Berlin, Germany
| | - Valentin Reiter-Scherer
- Humboldt-Universität zu Berlin, Department of Physics, Physics of Macromolecules, Newtonstr. 15, 12489, Berlin, Germany
| | - Nikolai Severin
- Humboldt-Universität zu Berlin, Department of Physics, Physics of Macromolecules, Newtonstr. 15, 12489, Berlin, Germany
| | - Jürgen P Rabe
- Humboldt-Universität zu Berlin, Department of Physics, Physics of Macromolecules, Newtonstr. 15, 12489, Berlin, Germany
| | - Petra Ecorchard
- Materials Chemistry Department, Institute of Inorganic Chemistry AS CR, v.v.i., 250 68, Řež, Czech Republic
| | - Junjie He
- Faculty of Science, Department of Physical and Macromolecular Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
| | - Miroslav Polozij
- Faculty of Science, Department of Physical and Macromolecular Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
| | - Petr Nachtigall
- Faculty of Science, Department of Physical and Macromolecular Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
| | - Michael J Bojdys
- Faculty of Science, Department of Organic Chemistry, Charles University, Hlavova 8, 128 43, Prague 2, Czech Republic
- Institute of Organic Chemistry and Biochemistry of the CAS, Flemingovo nám. 2, 166 10, Prague 6, Czech Republic
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28
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Caneva S, Martin MB, D'Arsié L, Aria AI, Sezen H, Amati M, Gregoratti L, Sugime H, Esconjauregui S, Robertson J, Hofmann S, Weatherup RS. From Growth Surface to Device Interface: Preserving Metallic Fe under Monolayer Hexagonal Boron Nitride. ACS APPLIED MATERIALS & INTERFACES 2017; 9:29973-29981. [PMID: 28782356 DOI: 10.1021/acsami.7b08717] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
We investigate the interfacial chemistry between Fe catalyst foils and monolayer hexagonal boron nitride (h-BN) following chemical vapor deposition and during subsequent atmospheric exposure, using scanning electron microscopy, X-ray photoemission spectroscopy, and scanning photoelectron microscopy. We show that regions of the Fe surface covered by h-BN remain in a metallic state during exposure to moist air for ∼40 h at room temperature. This protection is attributed to the strong interfacial interaction between h-BN and Fe, which prevents the rapid intercalation of oxidizing species. Local Fe oxidation is observed on bare Fe regions and close to defects in the h-BN film (e.g., domain boundaries, wrinkles, and edges), which over the longer-term provide pathways for slow bulk oxidation of Fe. We further confirm that the interface between h-BN and metallic Fe can be recovered by vacuum annealing at ∼600 °C, although this is accompanied by the creation of defects within the h-BN film. We discuss the importance of these findings in the context of integrated manufacturing and transfer-free device integration of h-BN, particularly for technologically important applications where h-BN has potential as a tunnel barrier such as magnetic tunnel junctions.
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Affiliation(s)
- Sabina Caneva
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
| | - Marie-Blandine Martin
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
| | - Lorenzo D'Arsié
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
| | - Adrianus I Aria
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
- Surface Engineering and Nanotechnology Institute, Cranfield University , College Road, MK43 0AL Cranfield, U.K
| | - Hikmet Sezen
- Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park , S.S. 14 km 163.5, 34149 Trieste, Italy
| | - Matteo Amati
- Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park , S.S. 14 km 163.5, 34149 Trieste, Italy
| | - Luca Gregoratti
- Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park , S.S. 14 km 163.5, 34149 Trieste, Italy
| | - Hisashi Sugime
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
| | - Santiago Esconjauregui
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
| | - John Robertson
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
| | - Robert S Weatherup
- Department of Engineering, University of Cambridge , JJ Thomson Avenue, CB3 0FA Cambridge, U.K
- Materials Sciences Division, Lawrence Berkeley National Laboratory , 1 Cyclotron Road, Berkeley, California 94720, United States
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29
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Yuan K, Zhong JQ, Sun S, Ren Y, Zhang JL, Chen W. Reactive Intermediates or Inert Graphene? Temperature- and Pressure-Determined Evolution of Carbon in the CH4–Ni(111) System. ACS Catal 2017. [DOI: 10.1021/acscatal.7b01880] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Kaidi Yuan
- National University of Singapore (Suzhou) Research Institute, 377 Linquan Street, Suzhou Industrial
Park, Jiangsu 215123, People’s Republic of China
- Department
of Physics, National University of Singapore, 2 Science Drive 3, 117542 Singapore
| | - Jian-Qiang Zhong
- Center
for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Shuo Sun
- Department
of Physics, National University of Singapore, 2 Science Drive 3, 117542 Singapore
| | - Yinjuan Ren
- Department
of Chemistry, National University of Singapore, 3 Science Drive 3, 117543 Singapore
| | - Jia Lin Zhang
- Department
of Chemistry, National University of Singapore, 3 Science Drive 3, 117543 Singapore
| | - Wei Chen
- National University of Singapore (Suzhou) Research Institute, 377 Linquan Street, Suzhou Industrial
Park, Jiangsu 215123, People’s Republic of China
- Department
of Physics, National University of Singapore, 2 Science Drive 3, 117542 Singapore
- Department
of Chemistry, National University of Singapore, 3 Science Drive 3, 117543 Singapore
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30
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Nagai Y, Okawa A, Minamide T, Hasegawa K, Sugime H, Noda S. Ten-Second Epitaxy of Cu on Repeatedly Used Sapphire for Practical Production of High-Quality Graphene. ACS OMEGA 2017; 2:3354-3362. [PMID: 31457659 PMCID: PMC6641493 DOI: 10.1021/acsomega.7b00509] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 04/25/2017] [Accepted: 06/21/2017] [Indexed: 06/10/2023]
Abstract
Epitaxial copper (Cu) films yield graphene with superior quality but at high cost. We report 1-3 μm thick epitaxial Cu films prepared on c plane sapphire substrates in 10-30 s, which is much faster than that of the typical sputtering method. Such rapid deposition is realized by vapor deposition using a Cu source heated to 1700-1800 °C, which is much higher than its melting point of 1085 °C. Continuous graphene films, either bilayer or single-layer, are obtained on the epitaxial Cu by chemical vapor deposition and transferred to carrier substrates. The sapphire substrates can be reused five to six times maintaining the quality of the epitaxial Cu films and graphene. The mechanisms and requirements are discussed for such quick epitaxy of Cu on reused sapphire, which will enable high-quality graphene production at lower cost.
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Affiliation(s)
- Yukuya Nagai
- Department
of Applied Chemistry and Research Institute for Science
and Engineering, Waseda University, Tokyo 169-8555, Japan
| | - Asahi Okawa
- Department
of Applied Chemistry and Research Institute for Science
and Engineering, Waseda University, Tokyo 169-8555, Japan
| | - Taisuke Minamide
- Department
of Applied Chemistry and Research Institute for Science
and Engineering, Waseda University, Tokyo 169-8555, Japan
| | - Kei Hasegawa
- Department
of Applied Chemistry and Research Institute for Science
and Engineering, Waseda University, Tokyo 169-8555, Japan
| | - Hisashi Sugime
- Waseda
Institute for Advanced Study, Waseda University, Tokyo 169-8050, Japan
| | - Suguru Noda
- Department
of Applied Chemistry and Research Institute for Science
and Engineering, Waseda University, Tokyo 169-8555, Japan
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31
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Abstract
AbstractDue to the unique properties of graphene, single layer, bilayer or even few layer graphene peeled off from bulk graphite cannot meet the need of practical applications. Large size graphene with quality comparable to mechanically exfoliated graphene has been synthesized by chemical vapor deposition (CVD). The main development and the key issues in controllable chemical vapor deposition of graphene has been briefly discussed in this chapter. Various strategies for graphene layer number and stacking control, large size single crystal graphene domains on copper, graphene direct growth on dielectric substrates, and doping of graphene have been demonstrated. The methods summarized here will provide guidance on how to synthesize other two-dimensional materials beyond graphene.
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32
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Gan W, Han N, Yang C, Wu P, Liu Q, Zhu W, Chen S, Wu C, Habib M, Sang Y, Muhammad Z, Zhao J, Song L. A Ternary Alloy Substrate to Synthesize Monolayer Graphene with Liquid Carbon Precursor. ACS NANO 2017; 11:1371-1379. [PMID: 28085266 DOI: 10.1021/acsnano.6b06144] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Here we demonstrate a ternary Cu2NiZn alloy substrate for controllably synthesizing monolayer graphene using a liquid carbon precursor cyclohexane via a facile CVD route. In contrast with elemental metal or bimetal substrates, the alloy-induced synergistic effects that provide an ideal metallic platform for much easier dehydrogenation of hydrocarbon molecules, more reasonable strength of adsorption energy of carbon monomer on surface and lower formation energies of carbon chains, largely renders the success growth of monolayer graphene with higher electrical mobility and lower defects. The growth mechanism is systemically investigated by our DFT calculations. This study provides a selective route for realizing high-quality graphene monolayer via a scalable synthetic method by using economic liquid carbon supplies and multialloy metal substrates.
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Affiliation(s)
- Wei Gan
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Nannan Han
- Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology , Ministry of Education, Dalian 116024, PR China
| | - Chao Yang
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Peng Wu
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Qin Liu
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Wen Zhu
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Shuangming Chen
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Chuanqiang Wu
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Muhammad Habib
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Yuan Sang
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Zahir Muhammad
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
| | - Jijun Zhao
- Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology , Ministry of Education, Dalian 116024, PR China
| | - Li Song
- National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China , Hefei, Anhui 230029, PR China
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33
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Braeuninger-Weimer P, Brennan B, Pollard AJ, Hofmann S. Understanding and Controlling Cu-Catalyzed Graphene Nucleation: The Role of Impurities, Roughness, and Oxygen Scavenging. CHEMISTRY OF MATERIALS : A PUBLICATION OF THE AMERICAN CHEMICAL SOCIETY 2016; 28:8905-8915. [PMID: 28133416 PMCID: PMC5261424 DOI: 10.1021/acs.chemmater.6b03241] [Citation(s) in RCA: 18] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/04/2016] [Revised: 11/21/2016] [Indexed: 05/08/2023]
Abstract
The mechanism by which Cu catalyst pretreatments control graphene nucleation density in scalable chemical vapor deposition (CVD) is systematically explored. The intrinsic and extrinsic carbon contamination in the Cu foil is identified by time-of-flight secondary ion mass spectrometry as a major factor influencing graphene nucleation and growth. By selectively oxidizing the backside of the Cu foil prior to graphene growth, a drastic reduction of the graphene nucleation density by 6 orders of magnitude can be obtained. This approach decouples surface roughness effects and at the same time allows us to trace the scavenging effect of oxygen on deleterious carbon impurities as it permeates through the Cu bulk. Parallels to well-known processes in Cu metallurgy are discussed. We also put into context the relative effectiveness and underlying mechanisms of the most widely used Cu pretreatments, including wet etching and electropolishing, allowing a rationalization of current literature and determination of the relevant parameter space for graphene growth. Taking into account the wider CVD growth parameter space, guidelines are discussed for high-throughput manufacturing of "electronic-quality" monolayer graphene films with domain size exceeding 1 mm, suitable for emerging industrial applications, such as electronics and photonics.
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Affiliation(s)
| | - Barry Brennan
- National
Physical Laboratory, Hampton Rd, Teddington, Middlesex TW11 0LW, United Kingdom
| | - Andrew J. Pollard
- National
Physical Laboratory, Hampton Rd, Teddington, Middlesex TW11 0LW, United Kingdom
| | - Stephan Hofmann
- Department
of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
- E-mail:
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34
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Wang R, Whelan PR, Braeuninger-Weimer P, Tappertzhofen S, Alexander-Webber JA, Van Veldhoven ZA, Kidambi PR, Jessen BS, Booth T, Bøggild P, Hofmann S. Catalyst Interface Engineering for Improved 2D Film Lift-Off and Transfer. ACS APPLIED MATERIALS & INTERFACES 2016; 8:33072-33082. [PMID: 27934130 PMCID: PMC5249221 DOI: 10.1021/acsami.6b11685] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.9] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/14/2016] [Accepted: 11/10/2016] [Indexed: 05/26/2023]
Abstract
The mechanisms by which chemical vapor deposited (CVD) graphene and hexagonal boron nitride (h-BN) films can be released from a growth catalyst, such as widely used copper (Cu) foil, are systematically explored as a basis for an improved lift-off transfer. We show how intercalation processes allow the local Cu oxidation at the interface followed by selective oxide dissolution, which gently releases the 2D material (2DM) film. Interfacial composition change and selective dissolution can thereby be achieved in a single step or split into two individual process steps. We demonstrate that this method is not only highly versatile but also yields graphene and h-BN films of high quality regarding surface contamination, layer coherence, defects, and electronic properties, without requiring additional post-transfer annealing. We highlight how such transfers rely on targeted corrosion at the catalyst interface and discuss this in context of the wider CVD growth and 2DM transfer literature, thereby fostering an improved general understanding of widely used transfer processes, which is essential to numerous other applications.
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Affiliation(s)
- Ruizhi Wang
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Patrick R. Whelan
- Center for Nanostructured Graphene (CNG),
DTU Nanotech, Technical University of Denmark, DK-2800, Kongens
Lyngby, Denmark
| | | | - Stefan Tappertzhofen
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | | | - Zenas A. Van Veldhoven
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
- Cambridge Graphene Centre, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
| | - Piran R. Kidambi
- Department of Mechanical Engineering, Massachusetts
Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Bjarke S. Jessen
- Center for Nanostructured Graphene (CNG),
DTU Nanotech, Technical University of Denmark, DK-2800, Kongens
Lyngby, Denmark
| | - Timothy Booth
- Center for Nanostructured Graphene (CNG),
DTU Nanotech, Technical University of Denmark, DK-2800, Kongens
Lyngby, Denmark
| | - Peter Bøggild
- Center for Nanostructured Graphene (CNG),
DTU Nanotech, Technical University of Denmark, DK-2800, Kongens
Lyngby, Denmark
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
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35
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Weatherup RS, Shahani AJ, Wang ZJ, Mingard K, Pollard AJ, Willinger MG, Schloegl R, Voorhees PW, Hofmann S. In Situ Graphene Growth Dynamics on Polycrystalline Catalyst Foils. NANO LETTERS 2016; 16:6196-6206. [PMID: 27576749 PMCID: PMC5064306 DOI: 10.1021/acs.nanolett.6b02459] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/08/2023]
Abstract
The dynamics of graphene growth on polycrystalline Pt foils during chemical vapor deposition (CVD) are investigated using in situ scanning electron microscopy and complementary structural characterization of the catalyst with electron backscatter diffraction. A general growth model is outlined that considers precursor dissociation, mass transport, and attachment to the edge of a growing domain. We thereby analyze graphene growth dynamics at different length scales and reveal that the rate-limiting step varies throughout the process and across different regions of the catalyst surface, including different facets of an individual graphene domain. The facets that define the domain shapes lie normal to slow growth directions, which are determined by the interfacial mobility when attachment to domain edges is rate-limiting, as well as anisotropy in surface diffusion as diffusion becomes rate-limiting. Our observations and analysis thus reveal that the structure of CVD graphene films is intimately linked to that of the underlying polycrystalline catalyst, with both interfacial mobility and diffusional anisotropy depending on the presence of step edges and grain boundaries. The growth model developed serves as a general framework for understanding and optimizing the growth of 2D materials on polycrystalline catalysts.
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Affiliation(s)
- Robert S. Weatherup
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
- Materials Sciences Division, Lawrence Berkeley
National Laboratory, 1 Cyclotron Road, Berkeley California 94720, United States
- E-mail:
| | - Ashwin J. Shahani
- Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, Illinois 60208, United States
| | - Zhu-Jun Wang
- Fritz Haber Institute, Faradayweg 4-6, D-14195 Berlin, Germany
| | - Ken Mingard
- National Physical
Laboratory, Hampton Road, Teddington, Middlesex TW11 0LW, United Kingdom
| | - Andrew J. Pollard
- National Physical
Laboratory, Hampton Road, Teddington, Middlesex TW11 0LW, United Kingdom
| | | | - Robert Schloegl
- Fritz Haber Institute, Faradayweg 4-6, D-14195 Berlin, Germany
| | - Peter W. Voorhees
- Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, Illinois 60208, United States
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
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36
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Bayer BC, Bosworth DA, Michaelis FB, Blume R, Habler G, Abart R, Weatherup R, Kidambi PR, Baumberg JJ, Knop-Gericke A, Schloegl R, Baehtz C, Barber ZH, Meyer JC, Hofmann S. In Situ Observations of Phase Transitions in Metastable Nickel (Carbide)/Carbon Nanocomposites. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2016; 120:22571-22584. [PMID: 27746852 PMCID: PMC5056405 DOI: 10.1021/acs.jpcc.6b01555] [Citation(s) in RCA: 26] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/15/2016] [Revised: 09/02/2016] [Indexed: 06/01/2023]
Abstract
Nanocomposite thin films comprised of metastable metal carbides in a carbon matrix have a wide variety of applications ranging from hard coatings to magnetics and energy storage and conversion. While their deposition using nonequilibrium techniques is established, the understanding of the dynamic evolution of such metastable nanocomposites under thermal equilibrium conditions at elevated temperatures during processing and during device operation remains limited. Here, we investigate sputter-deposited nanocomposites of metastable nickel carbide (Ni3C) nanocrystals in an amorphous carbon (a-C) matrix during thermal postdeposition processing via complementary in situ X-ray diffractometry, in situ Raman spectroscopy, and in situ X-ray photoelectron spectroscopy. At low annealing temperatures (300 °C) we observe isothermal Ni3C decomposition into face-centered-cubic Ni and amorphous carbon, however, without changes to the initial finely structured nanocomposite morphology. Only for higher temperatures (400-800 °C) Ni-catalyzed isothermal graphitization of the amorphous carbon matrix sets in, which we link to bulk-diffusion-mediated phase separation of the nanocomposite into coarser Ni and graphite grains. Upon natural cooling, only minimal precipitation of additional carbon from the Ni is observed, showing that even for highly carbon saturated systems precipitation upon cooling can be kinetically quenched. Our findings demonstrate that phase transformations of the filler and morphology modifications of the nanocomposite can be decoupled, which is advantageous from a manufacturing perspective. Our in situ study also identifies the high carbon content of the Ni filler crystallites at all stages of processing as the key hallmark feature of such metal-carbon nanocomposites that governs their entire thermal evolution. In a wider context, we also discuss our findings with regard to the much debated potential role of metastable Ni3C as a catalyst phase in graphene and carbon nanotube growth.
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Affiliation(s)
- Bernhard C. Bayer
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
- Faculty of Physics and Department of
Lithospheric Research, University of Vienna, 1010 Vienna, Austria
| | - David A. Bosworth
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
| | - F. Benjamin Michaelis
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
| | - Raoul Blume
- Helmholtz-Zentrum
Berlin für Materialien und Energie, 14109 Berlin, Germany
| | - Gerlinde Habler
- Faculty of Physics and Department of
Lithospheric Research, University of Vienna, 1010 Vienna, Austria
| | - Rainer Abart
- Faculty of Physics and Department of
Lithospheric Research, University of Vienna, 1010 Vienna, Austria
| | - Robert
S. Weatherup
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
| | - Piran R. Kidambi
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
| | - Jeremy J. Baumberg
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
| | - Axel Knop-Gericke
- Fritz-Haber-Institut
der Max-Planck-Gesellschaft, 14195 Berlin, Germany
| | - Robert Schloegl
- Fritz-Haber-Institut
der Max-Planck-Gesellschaft, 14195 Berlin, Germany
| | - Carsten Baehtz
- Institute
of Radiation Physics, Helmholtz-Zentrum
Dresden−Rossendorf, 01314 Dresden, Germany
| | - Zoe H. Barber
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
| | - Jannik C. Meyer
- Faculty of Physics and Department of
Lithospheric Research, University of Vienna, 1010 Vienna, Austria
| | - Stephan Hofmann
- Department of Engineering, Department of Materials Science and Metallurgy, and Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom
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37
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Yang Y, Fu Q, Wei W, Bao X. Segregation growth of epitaxial graphene overlayers on Ni(111). Sci Bull (Beijing) 2016. [DOI: 10.1007/s11434-016-1169-9] [Citation(s) in RCA: 13] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
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38
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Liu J, Zheng Q, Goodman MD, Zhu H, Kim J, Krueger NA, Ning H, Huang X, Liu J, Terrones M, Braun PV. Graphene Sandwiched Mesostructured Li-Ion Battery Electrodes. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2016; 28:7696-7702. [PMID: 27383465 DOI: 10.1002/adma.201600829] [Citation(s) in RCA: 34] [Impact Index Per Article: 4.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/11/2016] [Revised: 05/10/2016] [Indexed: 06/06/2023]
Abstract
A deterministic graphene-sandwiched Li-ion battery electrode consisting of an integrated 3D mesostructure of electrochemically active materials and graphene is presented. As demonstrations, electrodes with active nanomaterials that coat (V2 O5 @graphene@V2 O5 cathode) or are coated by (graphene@Si@graphene anode) graphene are fabricated. These electrodes exhibit high capacities and ultralong cycle lives (the cathode can be cycled over 2000 times with minimal capacity fade).
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Affiliation(s)
- Jinyun Liu
- Research Center for Biomimetic Functional Materials and Sensing Devices, Institute of Intelligent Machines, Chinese Academy of Sciences, Hefei, Anhui, 230031, P. R. China
- Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, 61801, USA
| | - Qiye Zheng
- Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, 61801, USA
| | - Matthew D Goodman
- Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, 61801, USA
| | - Haoyue Zhu
- Department of Chemistry, Pennsylvania State University, University Park, PA, 16802, USA
| | - Jinwoo Kim
- Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, 61801, USA
| | - Neil A Krueger
- Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, 61801, USA
| | - Hailong Ning
- Xerion Advanced Battery Corp, Champaign, IL, 61820, USA
| | - Xingjiu Huang
- Research Center for Biomimetic Functional Materials and Sensing Devices, Institute of Intelligent Machines, Chinese Academy of Sciences, Hefei, Anhui, 230031, P. R. China
| | - Jinhuai Liu
- Research Center for Biomimetic Functional Materials and Sensing Devices, Institute of Intelligent Machines, Chinese Academy of Sciences, Hefei, Anhui, 230031, P. R. China
| | - Mauricio Terrones
- Department of Chemistry, Pennsylvania State University, University Park, PA, 16802, USA
| | - Paul V Braun
- Department of Materials Science and Engineering, Frederick Seitz Materials Research Laboratory, Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign, Urbana, IL, 61801, USA.
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39
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Wafer-scale fabrication and growth dynamics of suspended graphene nanoribbon arrays. Nat Commun 2016; 7:11797. [PMID: 27250877 PMCID: PMC4895714 DOI: 10.1038/ncomms11797] [Citation(s) in RCA: 36] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/04/2016] [Accepted: 04/28/2016] [Indexed: 11/09/2022] Open
Abstract
Adding a mechanical degree of freedom to the electrical and optical properties of atomically thin materials can provide an excellent platform to investigate various optoelectrical physics and devices with mechanical motion interaction. The large scale fabrication of such atomically thin materials with suspended structures remains a challenge. Here we demonstrate the wafer-scale bottom–up synthesis of suspended graphene nanoribbon arrays (over 1,000,000 graphene nanoribbons in 2 × 2 cm2 substrate) with a very high yield (over 98%). Polarized Raman measurements reveal graphene nanoribbons in the array can have relatively uniform-edge structures with near zigzag orientation dominant. A promising growth model of suspended graphene nanoribbons is also established through a comprehensive study that combined experiments, molecular dynamics simulations and theoretical calculations with a phase-diagram analysis. We believe that our results can contribute to pushing the study of graphene nanoribbons into a new stage related to the optoelectrical physics and industrial applications. Shaping atomically thin materials in suspended structures may provide a viable platform for nanoscale mechanical oscillators. Here, the authors demonstrate wafer-scale, high-yield synthesis of suspended graphene nanoribbon arrays using a bottom-up approach and shed light into their growth dynamics.
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40
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Weatherup RS, Eren B, Hao Y, Bluhm H, Salmeron MB. Graphene Membranes for Atmospheric Pressure Photoelectron Spectroscopy. J Phys Chem Lett 2016; 7:1622-1627. [PMID: 27082434 DOI: 10.1021/acs.jpclett.6b00640] [Citation(s) in RCA: 30] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
Atmospheric pressure X-ray photoelectron spectroscopy (XPS) is demonstrated using single-layer graphene membranes as photoelectron-transparent barriers that sustain pressure differences in excess of 6 orders of magnitude. The graphene serves as a support for catalyst nanoparticles under atmospheric pressure reaction conditions (up to 1.5 bar), where XPS allows the oxidation state of Cu nanoparticles and gas phase species to be simultaneously probed. We thereby observe that the Cu(2+) oxidation state is stable in O2 (1 bar) but is spontaneously reduced under vacuum. We further demonstrate the detection of various gas-phase species (Ar, CO, CO2, N2, O2) in the pressure range 10-1500 mbar including species with low photoionization cross sections (He, H2). Pressure-dependent changes in the apparent binding energies of gas-phase species are observed, attributable to changes in work function of the metal-coated grids supporting the graphene. We expect atmospheric pressure XPS based on this graphene membrane approach to be a valuable tool for studying nanoparticle catalysis.
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Affiliation(s)
| | | | | | | | - Miquel B Salmeron
- Department of Materials Science and Engineering, University of California , Berkeley, California 94720-1760, United States
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41
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Caneva S, Weatherup R, Bayer BC, Blume R, Cabrero-Vilatela A, Braeuninger-Weimer P, Martin MB, Wang R, Baehtz C, Schloegl R, Meyer JC, Hofmann S. Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD. NANO LETTERS 2016; 16:1250-61. [PMID: 26756610 PMCID: PMC4751513 DOI: 10.1021/acs.nanolett.5b04586] [Citation(s) in RCA: 53] [Impact Index Per Article: 6.6] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/10/2015] [Revised: 01/08/2016] [Indexed: 05/23/2023]
Abstract
Highly controlled Fe-catalyzed growth of monolayer hexagonal boron nitride (h-BN) films is demonstrated by the dissolution of nitrogen into the catalyst bulk via NH3 exposure prior to the actual growth step. This "pre-filling" of the catalyst bulk reservoir allows us to control and limit the uptake of B and N species during borazine exposure and thereby to control the incubation time and h-BN growth kinetics while also limiting the contribution of uncontrolled precipitation-driven h-BN growth during cooling. Using in situ X-ray diffraction and in situ X-ray photoelectron spectroscopy combined with systematic growth calibrations, we develop an understanding and framework for engineering the catalyst bulk reservoir to optimize the growth process, which is also relevant to other 2D materials and their heterostructures.
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Affiliation(s)
- Sabina Caneva
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Robert
S. Weatherup
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
- Materials
Sciences Division, Lawrence Berkeley National
Laboratory, 1 Cyclotron
Road, Berkeley, California 94720, United States
| | - Bernhard C. Bayer
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
- Faculty of Physics, University of Vienna, Boltzmanngasse 5, A-1090 Vienna, Austria
| | - Raoul Blume
- Helmholtz-Zentrum Berlin für Materialen und Energie, D-12489 Berlin, Germany
| | - Andrea Cabrero-Vilatela
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Philipp Braeuninger-Weimer
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Marie-Blandine Martin
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Ruizhi Wang
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
| | - Carsten Baehtz
- Institute of Radiation Physics, Helmholtz-Zentrum Dresden-Rossendorf, 01314 Dresden, Germany
| | | | - Jannik C. Meyer
- Faculty of Physics, University of Vienna, Boltzmanngasse 5, A-1090 Vienna, Austria
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, JJ Thomson Avenue, CB3 0FA Cambridge, United Kingdom
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42
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Aria A, Kidambi PR, Weatherup RS, Xiao L, Williams JA, Hofmann S. Time Evolution of the Wettability of Supported Graphene under Ambient Air Exposure. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2016; 120:2215-2224. [PMID: 26900413 PMCID: PMC4754094 DOI: 10.1021/acs.jpcc.5b10492] [Citation(s) in RCA: 25] [Impact Index Per Article: 3.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/26/2015] [Revised: 01/07/2016] [Indexed: 05/08/2023]
Abstract
The wettability of graphene is both fundamental and crucial for interfacing in most applications, but a detailed understanding of its time evolution remains elusive. Here we systematically investigate the wettability of metal-supported, chemical vapor deposited graphene films as a function of ambient air exposure time using water and various other test liquids with widely different surface tensions. The wettability of graphene is not constant, but varies with substrate interactions and air exposure time. The substrate interactions affect the initial graphene wettability, where, for instance, water contact angles of ∼85 and ∼61° were measured for Ni and Cu supported graphene, respectively, after just minutes of air exposure. Analysis of the surface free energy components indicates that the substrate interactions strongly influence the Lewis acid-base component of supported graphene, which is considerably weaker for Ni supported graphene than for Cu supported graphene, suggesting that the classical van der Waals interaction theory alone is insufficient to describe the wettability of graphene. For prolonged air exposure, the effect of physisorption of airborne contaminants becomes increasingly dominant, resulting in an increase of water contact angle that follows a universal linear-logarithmic relationship with exposure time, until saturating at a maximum value of 92-98°. The adsorbed contaminants render all supported graphene samples increasingly nonpolar, although their total surface free energy decreases only by 10-16% to about 37-41 mJ/m2. Our finding shows that failure to account for the air exposure time may lead to widely different wettability values and contradicting arguments about the wetting transparency of graphene.
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Affiliation(s)
- Adrianus
I. Aria
- Division of Electrical
Engineering and Division of Mechanics, Materials
and Design, Department of Engineering, University of Cambridge, Cambridge, United Kingdom CB2 1PZ
| | - Piran R. Kidambi
- Division of Electrical
Engineering and Division of Mechanics, Materials
and Design, Department of Engineering, University of Cambridge, Cambridge, United Kingdom CB2 1PZ
- Department
of Mechanical Engineering, Massachusetts
Institute of Technology, Cambridge, Massachusetts 02139-4307, United States
| | - Robert S. Weatherup
- Division of Electrical
Engineering and Division of Mechanics, Materials
and Design, Department of Engineering, University of Cambridge, Cambridge, United Kingdom CB2 1PZ
- Materials
Sciences Division, Lawrence Berkeley National
Laboratory, Berkeley, California 94720, United States
| | - Long Xiao
- Division of Electrical
Engineering and Division of Mechanics, Materials
and Design, Department of Engineering, University of Cambridge, Cambridge, United Kingdom CB2 1PZ
| | - John A. Williams
- Division of Electrical
Engineering and Division of Mechanics, Materials
and Design, Department of Engineering, University of Cambridge, Cambridge, United Kingdom CB2 1PZ
| | - Stephan Hofmann
- Division of Electrical
Engineering and Division of Mechanics, Materials
and Design, Department of Engineering, University of Cambridge, Cambridge, United Kingdom CB2 1PZ
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43
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Cabrero-Vilatela A, Weatherup RS, Braeuninger-Weimer P, Caneva S, Hofmann S. Towards a general growth model for graphene CVD on transition metal catalysts. NANOSCALE 2016; 8:2149-58. [PMID: 26730836 PMCID: PMC4755235 DOI: 10.1039/c5nr06873h] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.9] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/05/2015] [Accepted: 12/18/2015] [Indexed: 05/08/2023]
Abstract
The chemical vapour deposition (CVD) of graphene on three polycrystalline transition metal catalysts, Co, Ni and Cu, is systematically compared and a first-order growth model is proposed which can serve as a reference to optimize graphene growth on any elemental or alloy catalyst system. Simple thermodynamic considerations of carbon solubility are insufficient to capture even basic growth behaviour on these most commonly used catalyst materials, and it is shown that kinetic aspects such as carbon permeation have to be taken into account. Key CVD process parameters are discussed in this context and the results are anticipated to be highly useful for the design of future strategies for integrated graphene manufacture.
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Affiliation(s)
| | - Robert S Weatherup
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
| | | | - Sabina Caneva
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
| | - Stephan Hofmann
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
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44
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D'Arsié L, Esconjauregui S, Weatherup RS, Wu X, Arter WE, Sugime H, Cepek C, Robertson J. Stable, efficient p-type doping of graphene by nitric acid. RSC Adv 2016. [DOI: 10.1039/c6ra23727d] [Citation(s) in RCA: 54] [Impact Index Per Article: 6.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/17/2022] Open
Abstract
We systematically dope monolayer graphene with different concentrations of nitric acid over a range of temperatures, and analyze the variation of sheet resistance under vacuum annealing up to 300 °C.
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Affiliation(s)
- Lorenzo D'Arsié
- Department of Engineering
- University of Cambridge
- Cambridge CB3 0FA
- UK
| | | | | | - Xingyi Wu
- Department of Engineering
- University of Cambridge
- Cambridge CB3 0FA
- UK
| | - William E. Arter
- Department of Engineering
- University of Cambridge
- Cambridge CB3 0FA
- UK
| | - Hisashi Sugime
- Department of Engineering
- University of Cambridge
- Cambridge CB3 0FA
- UK
| | - Cinzia Cepek
- Istituto Officina dei Materiali-CNR
- Laboratorio TASC
- Trieste I-34149
- Italy
| | - John Robertson
- Department of Engineering
- University of Cambridge
- Cambridge CB3 0FA
- UK
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45
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Shi L, Chen K, Du R, Bachmatiuk A, Rümmeli MH, Priydarshi MK, Zhang Y, Manivannan A, Liu Z. Direct Synthesis of Few-Layer Graphene on NaCl Crystals. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2015; 11:6302-6308. [PMID: 26524105 DOI: 10.1002/smll.201502013] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/08/2015] [Revised: 09/28/2015] [Indexed: 06/05/2023]
Abstract
Chemical vapor deposition is used to synthesize few-layer graphene on micro crystalline sodium chloride (NaCl) powder. The water-soluble nature of NaCl makes it convenient to produce free standing graphene layers via a facile and low-cost approach. Unlike traditional metal-catalyzed or oxygen-aided growth, the micron-size NaCl crystal planes play an important role in the nucleation and growth of few-layer graphene. Moreover, the possibility of synthesizing cuboidal graphene is also demonstrated in the present approach for the first time. Raman spectroscopy, optical microscopy, scanning electron microscopy, transmission electron microscopy, and atomic force microscopy are used to evaluate the quality and structure of the few-layer graphene along with cuboidal graphene obtained in this process. The few-layer graphene synthesized using the present method has an adsorption ability for anionic and cationic dye molecules in water. The present synthesis method may pave a facile way for manufacturing few-layer graphene on a large scale.
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Affiliation(s)
- Liurong Shi
- Center for Nanochemistry (CNC), Beijing National Laboratory for Molecular Sciences, State Key Laboratory for Structural Chemistry of Unstable and Stable Species, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Ke Chen
- Center for Nanochemistry (CNC), Beijing National Laboratory for Molecular Sciences, State Key Laboratory for Structural Chemistry of Unstable and Stable Species, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Ran Du
- Center for Nanochemistry (CNC), Beijing National Laboratory for Molecular Sciences, State Key Laboratory for Structural Chemistry of Unstable and Stable Species, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Alicja Bachmatiuk
- Centre of Polymer and Carbon Materials, Polish Academy of Sciences, M. Curie-Sklodowskiej 34, Zabrze, 41-819, Poland
| | - Mark Hermann Rümmeli
- Department of Energy Science, Sungkyunkwan University, Suwon, 440-746, Republic of Korea
- Department of Physics, Sungkyunkwan University, Suwon, 440-746, Republic of Korea
| | - Manish Kumar Priydarshi
- Center for Nanochemistry (CNC), Beijing National Laboratory for Molecular Sciences, State Key Laboratory for Structural Chemistry of Unstable and Stable Species, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
| | - Yanfeng Zhang
- Center for Nanochemistry (CNC), Beijing National Laboratory for Molecular Sciences, State Key Laboratory for Structural Chemistry of Unstable and Stable Species, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
- Department of Materials Science and Engineering, College of Engineering, Peking University, Beijing, 100871, P. R. China
| | - Ayyakkannu Manivannan
- Department of Aerospace and Mechanical Engineering, West Virginia University, Morgantown, WV, 26507, USA
- US Department of Energy, NETL, Morgantown, WV, 26507, USA
| | - Zhongfan Liu
- Center for Nanochemistry (CNC), Beijing National Laboratory for Molecular Sciences, State Key Laboratory for Structural Chemistry of Unstable and Stable Species, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, P. R. China
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46
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Weatherup RS, D’Arsié L, Cabrero-Vilatela A, Caneva S, Blume R, Robertson J, Schloegl R, Hofmann S. Long-Term Passivation of Strongly Interacting Metals with Single-Layer Graphene. J Am Chem Soc 2015; 137:14358-66. [PMID: 26499041 PMCID: PMC4682849 DOI: 10.1021/jacs.5b08729] [Citation(s) in RCA: 117] [Impact Index Per Article: 13.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/17/2015] [Indexed: 12/21/2022]
Abstract
The long-term (>18 months) protection of Ni surfaces against oxidation under atmospheric conditions is demonstrated by coverage with single-layer graphene, formed by chemical vapor deposition. In situ, depth-resolved X-ray photoelectron spectroscopy of various graphene-coated transition metals reveals that a strong graphene-metal interaction is of key importance in achieving this long-term protection. This strong interaction prevents the rapid intercalation of oxidizing species at the graphene-metal interface and thus suppresses oxidation of the substrate surface. Furthermore, the ability of the substrate to locally form a passivating oxide close to defects or damaged regions in the graphene overlayer is critical in plugging these defects and preventing oxidation from proceeding through the bulk of the substrate. We thus provide a clear rationale for understanding the extent to which two-dimensional materials can protect different substrates and highlight the key implications for applications of these materials as barrier layers to prevent oxidation.
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Affiliation(s)
- Robert S. Weatherup
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
- Materials Sciences Division, Lawrence Berkeley
National Laboratory, Berkeley, California 94720, United States
| | - Lorenzo D’Arsié
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | | | - Sabina Caneva
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | - Raoul Blume
- Helmholtz-Zentrum Berlin für Materialien
und Energie, D-12489 Berlin, Germany
| | - John Robertson
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | | | - Stephan Hofmann
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
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47
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Velasco‐Velez JJ, Pfeifer V, Hävecker M, Weatherup RS, Arrigo R, Chuang C, Stotz E, Weinberg G, Salmeron M, Schlögl R, Knop‐Gericke A. Photoelektronenspektroskopie an der Graphen‐Flüssigelektrolyt‐Grenzfläche zur Bestimmung der elektronischen Struktur eines elektrochemisch abgeschiedenen Cobalt/Graphen‐Elektrokatalysators. Angew Chem Int Ed Engl 2015. [DOI: 10.1002/ange.201506044] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
Affiliation(s)
- Juan J. Velasco‐Velez
- Max‐Planck‐Institut für Chemische Energiekonversion, Mülheim 45470 (Deutschland)
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Deutschland)
| | - Verena Pfeifer
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Deutschland)
| | - Michael Hävecker
- Max‐Planck‐Institut für Chemische Energiekonversion, Mülheim 45470 (Deutschland)
- Helmholtz‐Zentrum Berlin für Materialien und Energie, BESSY II, Berlin 12489 (Deutschland)
| | - Robert S. Weatherup
- Engineering Department, University of Cambridge, Cambridge CB3 0FA (Großbritannien)
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley 94720 (USA)
| | - Rosa Arrigo
- Diamond Light Source, Oxfordshire OX11 0QX (Großbritannien)
| | | | - Eugen Stotz
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Deutschland)
| | - Gisela Weinberg
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Deutschland)
| | - Miquel Salmeron
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley 94720 (USA)
| | - Robert Schlögl
- Max‐Planck‐Institut für Chemische Energiekonversion, Mülheim 45470 (Deutschland)
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Deutschland)
| | - Axel Knop‐Gericke
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Deutschland)
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Velasco‐Velez JJ, Pfeifer V, Hävecker M, Weatherup RS, Arrigo R, Chuang C, Stotz E, Weinberg G, Salmeron M, Schlögl R, Knop‐Gericke A. Photoelectron Spectroscopy at the Graphene–Liquid Interface Reveals the Electronic Structure of an Electrodeposited Cobalt/Graphene Electrocatalyst. Angew Chem Int Ed Engl 2015; 54:14554-8. [DOI: 10.1002/anie.201506044] [Citation(s) in RCA: 106] [Impact Index Per Article: 11.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/01/2015] [Revised: 07/17/2015] [Indexed: 01/08/2023]
Affiliation(s)
- Juan J. Velasco‐Velez
- Max Planck Institute for Chemical Energy Conversion, Mülheim 45470 (Germany)
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Germany)
| | - Verena Pfeifer
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Germany)
| | - Michael Hävecker
- Max Planck Institute for Chemical Energy Conversion, Mülheim 45470 (Germany)
- Helmholtz‐Center Berlin for Materials and Energy, BESSY II, Berlin 12489 (Germany)
| | - Robert S. Weatherup
- Engineering Department, University of Cambridge, Cambridge CB3 0FA (UK)
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley 94720 (USA)
| | - Rosa Arrigo
- Diamond Light Source, Oxfordshire OX11 0QX (UK)
| | | | - Eugen Stotz
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Germany)
| | - Gisela Weinberg
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Germany)
| | - Miquel Salmeron
- Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley 94720 (USA)
| | - Robert Schlögl
- Max Planck Institute for Chemical Energy Conversion, Mülheim 45470 (Germany)
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Germany)
| | - Axel Knop‐Gericke
- Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, Berlin 14195 (Germany)
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49
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Li J, Wang G, Geng H, Zhu H, Zhang M, Di Z, Liu X, Chu PK, Wang X. CVD Growth of Graphene on NiTi Alloy for Enhanced Biological Activity. ACS APPLIED MATERIALS & INTERFACES 2015; 7:19876-19881. [PMID: 26323051 DOI: 10.1021/acsami.5b06639] [Citation(s) in RCA: 27] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
From the perspective of surface modification of biomaterials, graphene is very promising because of its unique physical and chemical properties. Herein, we report direct in situ fabrication of graphene on nitinol (NiTi) shape memory alloy by chemical vapor deposition (CVD) and investigate both the growth mechanism as well as surface bioactivity of the modified alloy. Growth of the graphene layer is independent of Ni but is rather correlated with the formation of the TiC phase on the surface. Graphene nucleates and grows on this carbide layer during exposure to CH4. The graphene layer is observed to promote the osteogenesis differentiation of mesenchymal stem cells and surface bioactivity. The use of graphene as a bioactive layer is a viable approach to improving the surface properties of NiTi-based dental and orthopedic implants and components.
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Affiliation(s)
- Jinhua Li
- University of Chinese Academy of Sciences , Beijing 100049, China
| | - Gang Wang
- School of Physical Science and Technology, Lanzhou University , Lanzhou 730000, China
| | - Hao Geng
- University of Chinese Academy of Sciences , Beijing 100049, China
| | | | | | | | | | - Paul K Chu
- Department of Physics and Materials Science, City University of Hong Kong , Tat Chee Avenue, Kowloon, Hong Kong China
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Hofmann S, Braeuninger-Weimer P, Weatherup RS. CVD-Enabled Graphene Manufacture and Technology. J Phys Chem Lett 2015; 6:2714-21. [PMID: 26240694 PMCID: PMC4519978 DOI: 10.1021/acs.jpclett.5b01052] [Citation(s) in RCA: 19] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/20/2015] [Accepted: 06/24/2015] [Indexed: 05/08/2023]
Abstract
Integrated manufacturing is arguably the most challenging task in the development of technology based on graphene and other 2D materials, particularly with regard to the industrial demand for “electronic-grade” large-area films. In order to control the structure and properties of these materials at the monolayer level, their nucleation, growth and interfacing needs to be understood to a level of unprecedented detail compared to existing thin film or bulk materials. Chemical vapor deposition (CVD) has emerged as the most versatile and promising technique to develop graphene and 2D material films into industrial device materials and this Perspective outlines recent progress, trends, and emerging CVD processing pathways. A key focus is the emerging understanding of the underlying growth mechanisms, in particular on the role of the required catalytic growth substrate, which brings together the latest progress in the fields of heterogeneous catalysis and classic crystal/thin-film growth.
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Affiliation(s)
- Stephan Hofmann
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
| | | | - Robert S. Weatherup
- Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom
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