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Xie X, Ding J, Wu B, Li S, Chen J, He J, Liu Z, Wang JT, Liu Y. Anomalous Phonon Behavior and Tunable Exciton Emissions: Insights into Pressure-Driven Dynamics in Silicon Phosphide. NANO LETTERS 2024; 24:8189-8197. [PMID: 38904278 DOI: 10.1021/acs.nanolett.4c02250] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/22/2024]
Abstract
IV-V two-dimensional materials have emerged as key contenders for polarization-sensitive and angle-resolved devices, given their inherent anisotropic physical properties. While these materials exhibit intriguing high-pressure quasi-particle behavior and phase transition, the evolution of quasi-particles and their interactions under external pressure remain elusive. Here, employing a diamond anvil cell and spectroscopic measurements coupled with first-principles calculations, we unveil rarely observed pressure-induced phonon-phonon coupling in layered SiP flakes. This coupling manifests as an anomalous phonon hardening behavior for the A1 mode within a broad wavenumber phonon softening region. Furthermore, we demonstrate the effective tuning of exciton emissions in SiP flakes under pressure, revealing a remarkable 63% enhancement in the degree of polarization (DOP) within the pressure range of 0-3.5 GPa. These findings contribute to our understanding of high-pressure phonon evolution in SiP materials and offer a strategic approach to manipulate the anisotropic performance of in-plane anisotropic 2D materials.
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Affiliation(s)
- Xing Xie
- Institute of Quantum Physics, School of Physics, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
- State Key Laboratory of Precision Manufacturing for Extreme Service Performance, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
| | - Junnan Ding
- Institute of Quantum Physics, School of Physics, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
- State Key Laboratory of Precision Manufacturing for Extreme Service Performance, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
| | - Biao Wu
- Institute of Quantum Physics, School of Physics, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
- State Key Laboratory of Precision Manufacturing for Extreme Service Performance, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
| | - Shaofei Li
- Institute of Quantum Physics, School of Physics, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
| | - Junying Chen
- Institute of Quantum Physics, School of Physics, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
- State Key Laboratory of Precision Manufacturing for Extreme Service Performance, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
| | - Jun He
- Institute of Quantum Physics, School of Physics, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
| | - Zongwen Liu
- School of Chemical and Biomolecular Engineering, The University of Sydney, Sydney, NSW 2006, Australia
- The University of Sydney Nano Institute, The University of Sydney, Sydney, NSW 2006, Australia
| | - Jian-Tao Wang
- Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, People's Republic of China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China
- Songshan Lake Materials Laboratory, Dongguan, Guangdong 523808, People's Republic of China
| | - Yanping Liu
- Institute of Quantum Physics, School of Physics, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
- State Key Laboratory of Precision Manufacturing for Extreme Service Performance, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, People's Republic of China
- Shenzhen Research Institute of Central South University, Shenzhen 518000, People's Republic of China
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2
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Ağırcan H, Convertino D, Rossi A, Martini L, Pace S, Mishra N, Küster K, Starke U, Kartal Şireli G, Coletti C, Forti S. Determination and investigation of defect domains in multi-shape monolayer tungsten disulfide. NANOSCALE ADVANCES 2024; 6:2850-2859. [PMID: 38817435 PMCID: PMC11134227 DOI: 10.1039/d4na00125g] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/09/2024] [Accepted: 04/15/2024] [Indexed: 06/01/2024]
Abstract
Single-layer tungsten disulfide (WS2) is among the most widely investigated two-dimensional materials. Synthesizing it over large areas would enable the exploitation of its appealing optical and electronic properties in industrial applications. However, defects of different nature, concentration and distribution profoundly affect the optical as well as the electronic properties of this crystal. Controlling the defect density distribution can be an effective way to tailor the local dielectric environment and therefore the electronic properties of the system. In this work we investigate the defects in single-layer WS2, grown in different shapes by liquid phase chemical vapor deposition, where the concentration of certain defect species can be controlled by the growth conditions. The properties of the material are surveyed by means of optical spectroscopy, photoelectron spectroscopy and Kelvin probe force microscopy. We determine the chemical nature of the defects and study their influence on the optical and electronic properties of WS2. This work contributes to the understanding of the microscopic nature of the intrinsic defects in WS2, helping the development of defect-based technologies which rely on the control and engineering of defects in dielectric 2D crystals.
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Affiliation(s)
- H Ağırcan
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
- Department of Metallurgical & Materials Engineering Istanbul Technical University 34469 Maslak Istanbul Turkey
| | - D Convertino
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
| | - A Rossi
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
- Graphene Labs, Istituto Italiano di Tecnologia Via Morego 30 16163 Genova Italy
| | - L Martini
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
| | - S Pace
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
- Graphene Labs, Istituto Italiano di Tecnologia Via Morego 30 16163 Genova Italy
| | - N Mishra
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
- Graphene Labs, Istituto Italiano di Tecnologia Via Morego 30 16163 Genova Italy
| | - K Küster
- Max-Planck-Institut für Festkörperforschung Heisenbergstr. 1 70569 Stuttgart Germany
| | - U Starke
- Max-Planck-Institut für Festkörperforschung Heisenbergstr. 1 70569 Stuttgart Germany
| | - G Kartal Şireli
- Department of Metallurgical & Materials Engineering Istanbul Technical University 34469 Maslak Istanbul Turkey
| | - C Coletti
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
- Graphene Labs, Istituto Italiano di Tecnologia Via Morego 30 16163 Genova Italy
| | - S Forti
- Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 I-56127 Pisa Italy
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3
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Malik S, Zhao Y, He Y, Zhao X, Li H, Yi W, Occhipinti LG, Wang M, Akhavan S. Spray-lithography of hybrid graphene-perovskite paper-based photodetectors for sustainable electronics. NANOTECHNOLOGY 2024; 35:325301. [PMID: 38640909 DOI: 10.1088/1361-6528/ad40b6] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/15/2024] [Accepted: 04/18/2024] [Indexed: 04/21/2024]
Abstract
Paper is an ideal substrate for the development of flexible and environmentally sustainable ubiquitous electronic systems. When combined with nanomaterial-based devices, it can be harnessed for various Internet-of-Things applications, ranging from wearable electronics to smart packaging. However, paper remains a challenging substrate for electronics due to its rough and porous nature. In addition, the absence of established fabrication methods is impeding its utilization in wearable applications. Unlike other paper-based electronics with added layers, in this study, we present a scalable spray-lithography on a commercial paper substrate. We present a non-vacuum spray-lithography of chemical vapor deposition (CVD) single-layer graphene (SLG), carbon nanotubes (CNTs) and perovskite quantum dots (QDs) on a paper substrate. This approach combines the advantages of two large-area techniques: CVD and spray-coating. The first technique allows for the growth of SLG, while the second enables the spray coating of a mask to pattern CVD SLG, electrodes (CNTs), and photoactive (QDs) layers. We harness the advantages of perovskite QDs in photodetection, leveraging their strong absorption coefficients. Integrating them with the graphene enhances the photoconductive gain mechanism, leading to high external responsivity. The presented device shows high external responsivity of ∼520 A W-1at 405 nm at <1 V bias due to the photoconductive gain mechanism. The prepared paper-based photodetectors (PDs) achieve an external responsivity of 520 A W-1under 405 nm illumination at <1 V operating voltage. To the best of our knowledge, our devices have the highest external responsivity among paper-based PDs. By fabricating arrays of PDs on a paper substrate in the air, this work highlights the potential of this scalable approach for enabling ubiquitous electronics on paper.
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Affiliation(s)
- Sunaan Malik
- Institute for Materials Discovery, University College London, London, United Kingdom
| | - Yining Zhao
- Institute for Materials Discovery, University College London, London, United Kingdom
| | - Yutong He
- Institute for Materials Discovery, University College London, London, United Kingdom
| | - Xinyu Zhao
- Institute for Materials Discovery, University College London, London, United Kingdom
| | - Hongyu Li
- Institute for Materials Discovery, University College London, London, United Kingdom
| | - Wentian Yi
- Cambridge Graphene Centre, University of Cambridge, Cambridge, United Kingdom
| | - Luigi G Occhipinti
- Cambridge Graphene Centre, University of Cambridge, Cambridge, United Kingdom
| | - Mingqing Wang
- Institute for Materials Discovery, University College London, London, United Kingdom
| | - Shahab Akhavan
- Institute for Materials Discovery, University College London, London, United Kingdom
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Chen L, Hu K, Lu M, Chen Z, Chen X, Zhou T, Liu X, Yin W, Casiraghi C, Song X. Wearable Sensors for Breath Monitoring Based on Water-Based Hexagonal Boron Nitride Inks Made with Supramolecular Functionalization. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2312621. [PMID: 38168037 DOI: 10.1002/adma.202312621] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/23/2023] [Indexed: 01/05/2024]
Abstract
Wearable humidity sensors are attracting strong attention as they allow for real-time and continuous monitoring of important physiological information by enabling activity tracking as well as air quality assessment. Amongst 2Dimensional (2D) materials, graphene oxide (GO) is very attractive for humidity sensing due to its tuneable surface chemistry, high surface area, processability in water, and easy integration onto flexible substrates. However, strong hysteresis, low sensitivity, and cross-sensitivity issues limit the use of GO in practical applications, where continuous monitoring is preferred. Herein, a wearable and wireless impedance-based humidity sensor made with pyrene-functionalized hexagonal boron nitride (h-BN) nanosheets is demonstrated. The device shows enhanced sensitivity towards relative humidity (RH) (>1010 Ohms/%RH in the range from 5% to 100% RH), fast response (0.1 ms), no appreciable hysteresis, and no cross-sensitivity with temperature in the range of 25-60 °C. The h-BN-based sensor is able to monitor the whole breathing cycle process of exhaling and inhaling, hence enabling to record in real-time the subtlest changes of respiratory signals associated with different daily activities as well as various symptoms of flu, without requiring any direct contact with the individual.
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Affiliation(s)
- Liming Chen
- Department of Chemistry, University of Manchester, Manchester, M13 9PL, UK
- Department of Electrical and Electronic Engineering, University of Manchester, Manchester, M13 9PL, UK
| | - Kui Hu
- Department of Chemistry, University of Manchester, Manchester, M13 9PL, UK
| | - Mingyang Lu
- Department of Electrical and Electronic Engineering, University of Manchester, Manchester, M13 9PL, UK
| | - Ziqi Chen
- Department of Electrical and Electronic Engineering, University of Manchester, Manchester, M13 9PL, UK
| | - Xiwen Chen
- College of Energy, Soochow Institute for Energy and Materials InnovationS (SIEMIS), Jiangsu Provincial Key Laboratory for Advanced Carbon Materials and Wearable Energy Technologies, Soochow University, Suzhou, 215006, P. R. China
| | - Tianqi Zhou
- Department of Electrical and Electronic Engineering, University of Manchester, Manchester, M13 9PL, UK
| | - Xuqing Liu
- Department of Materials Science, University of Manchester, Manchester, M13 9PL, UK
| | - Wuliang Yin
- Department of Electrical and Electronic Engineering, University of Manchester, Manchester, M13 9PL, UK
| | - Cinzia Casiraghi
- Department of Chemistry, University of Manchester, Manchester, M13 9PL, UK
| | - Xiuju Song
- Department of Chemistry, University of Manchester, Manchester, M13 9PL, UK
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5
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Liu A, Zhang X, Liu Z, Li Y, Peng X, Li X, Qin Y, Hu C, Qiu Y, Jiang H, Wang Y, Li Y, Tang J, Liu J, Guo H, Deng T, Peng S, Tian H, Ren TL. The Roadmap of 2D Materials and Devices Toward Chips. NANO-MICRO LETTERS 2024; 16:119. [PMID: 38363512 PMCID: PMC10873265 DOI: 10.1007/s40820-023-01273-5] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/30/2023] [Accepted: 10/30/2023] [Indexed: 02/17/2024]
Abstract
Due to the constraints imposed by physical effects and performance degradation, silicon-based chip technology is facing certain limitations in sustaining the advancement of Moore's law. Two-dimensional (2D) materials have emerged as highly promising candidates for the post-Moore era, offering significant potential in domains such as integrated circuits and next-generation computing. Here, in this review, the progress of 2D semiconductors in process engineering and various electronic applications are summarized. A careful introduction of material synthesis, transistor engineering focused on device configuration, dielectric engineering, contact engineering, and material integration are given first. Then 2D transistors for certain electronic applications including digital and analog circuits, heterogeneous integration chips, and sensing circuits are discussed. Moreover, several promising applications (artificial intelligence chips and quantum chips) based on specific mechanism devices are introduced. Finally, the challenges for 2D materials encountered in achieving circuit-level or system-level applications are analyzed, and potential development pathways or roadmaps are further speculated and outlooked.
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Affiliation(s)
- Anhan Liu
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China
| | - Xiaowei Zhang
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China
| | - Ziyu Liu
- School of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Yuning Li
- School of Electronic and Information Engineering, Beijing Jiaotong University, Beijing, 100044, People's Republic of China
| | - Xueyang Peng
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China
- School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Xin Li
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Yue Qin
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Chen Hu
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China
- School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Yanqing Qiu
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China
- School of Integrated Circuits, University of Chinese Academy of Sciences, Beijing, 100049, People's Republic of China
| | - Han Jiang
- School of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Yang Wang
- School of Microelectronics, Fudan University, Shanghai, 200433, People's Republic of China
| | - Yifan Li
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China
| | - Jun Tang
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Jun Liu
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China
| | - Hao Guo
- State Key Laboratory of Dynamic Measurement Technology, Shanxi Province Key Laboratory of Quantum Sensing and Precision Measurement, North University of China, Taiyuan, 030051, People's Republic of China.
| | - Tao Deng
- School of Electronic and Information Engineering, Beijing Jiaotong University, Beijing, 100044, People's Republic of China.
| | - Songang Peng
- High-Frequency High-Voltage Device and Integrated Circuits R&D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, People's Republic of China.
- IMECAS-HKUST-Joint Laboratory of Microelectronics, Beijing, 100029, People's Republic of China.
| | - He Tian
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China.
| | - Tian-Ling Ren
- School of Integrated Circuits and Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100049, People's Republic of China.
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6
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Jeon Y, Kim S, Seo J, Yoo H. Contributions of Light to Novel Logic Concepts Using Optoelectronic Materials. SMALL METHODS 2024; 8:e2300391. [PMID: 37231569 DOI: 10.1002/smtd.202300391] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/24/2023] [Revised: 04/29/2023] [Indexed: 05/27/2023]
Abstract
Instead of the current method of transmitting voltage or current signals in electronic circuit operation, light offers an alternative to conventional logic, allowing for the implementation of new logic concepts through interaction with light. This manuscript examines the use of light in implementing new logic concepts as an alternative to traditional logic circuits and as a future technology. This article provides an overview of how to implement logic operations using light rather than voltage or current signals using optoelectronic materials such as 2D materials, metal-oxides, carbon structures, polymers, small molecules, and perovskites. This review covers the various technologies and applications of using light to dope devices, implement logic gates, control logic circuits, and generate light as an output signal. Recent research on logic and the use of light to implement new functions is summarized. This review also highlights the potential of optoelectronic logic for future technological advancements.
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Affiliation(s)
- Yunchae Jeon
- Department of Electronic Engineering, Gachon University, 1342 Seongnam-daero, Seongnam, 13120, Republic of Korea
| | - Somi Kim
- Department of Electronic Engineering, Gachon University, 1342 Seongnam-daero, Seongnam, 13120, Republic of Korea
| | - Juhyung Seo
- Department of Electronic Engineering, Gachon University, 1342 Seongnam-daero, Seongnam, 13120, Republic of Korea
| | - Hocheon Yoo
- Department of Electronic Engineering, Gachon University, 1342 Seongnam-daero, Seongnam, 13120, Republic of Korea
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7
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Torkashvand Z, Shayeganfar F, Ramazani A. Nanomaterials Based Micro/Nanoelectromechanical System (MEMS and NEMS) Devices. MICROMACHINES 2024; 15:175. [PMID: 38398905 PMCID: PMC10890696 DOI: 10.3390/mi15020175] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/04/2023] [Revised: 12/27/2023] [Accepted: 12/28/2023] [Indexed: 02/25/2024]
Abstract
The micro- and nanoelectromechanical system (MEMS and NEMS) devices based on two-dimensional (2D) materials reveal novel functionalities and higher sensitivity compared to their silicon-base counterparts. Unique properties of 2D materials boost the demand for 2D material-based nanoelectromechanical devices and sensing. During the last decades, using suspended 2D membranes integrated with MEMS and NEMS emerged high-performance sensitivities in mass and gas sensors, accelerometers, pressure sensors, and microphones. Actively sensing minute changes in the surrounding environment is provided by means of MEMS/NEMS sensors, such as sensing in passive modes of small changes in momentum, temperature, and strain. In this review, we discuss the materials preparation methods, electronic, optical, and mechanical properties of 2D materials used in NEMS and MEMS devices, fabrication routes besides device operation principles.
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Affiliation(s)
- Ziba Torkashvand
- Department of Physics and Energy Engineering, Amirkabir University of Technology, Tehran 15875-4413, Iran; (Z.T.); (F.S.)
| | - Farzaneh Shayeganfar
- Department of Physics and Energy Engineering, Amirkabir University of Technology, Tehran 15875-4413, Iran; (Z.T.); (F.S.)
| | - Ali Ramazani
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
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8
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Katiyar AK, Hoang AT, Xu D, Hong J, Kim BJ, Ji S, Ahn JH. 2D Materials in Flexible Electronics: Recent Advances and Future Prospectives. Chem Rev 2024; 124:318-419. [PMID: 38055207 DOI: 10.1021/acs.chemrev.3c00302] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/07/2023]
Abstract
Flexible electronics have recently gained considerable attention due to their potential to provide new and innovative solutions to a wide range of challenges in various electronic fields. These electronics require specific material properties and performance because they need to be integrated into a variety of surfaces or folded and rolled for newly formatted electronics. Two-dimensional (2D) materials have emerged as promising candidates for flexible electronics due to their unique mechanical, electrical, and optical properties, as well as their compatibility with other materials, enabling the creation of various flexible electronic devices. This article provides a comprehensive review of the progress made in developing flexible electronic devices using 2D materials. In addition, it highlights the key aspects of materials, scalable material production, and device fabrication processes for flexible applications, along with important examples of demonstrations that achieved breakthroughs in various flexible and wearable electronic applications. Finally, we discuss the opportunities, current challenges, potential solutions, and future investigative directions about this field.
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Affiliation(s)
- Ajit Kumar Katiyar
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Anh Tuan Hoang
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Duo Xu
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Juyeong Hong
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Beom Jin Kim
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Seunghyeon Ji
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
| | - Jong-Hyun Ahn
- School of Electrical and Electronic Engineering, Yonsei University, Seoul 03722, Republic of Korea
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9
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Liao L, Kovalska E, Regner J, Song Q, Sofer Z. Two-Dimensional Van Der Waals Thin Film and Device. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2303638. [PMID: 37731156 DOI: 10.1002/smll.202303638] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/30/2023] [Revised: 08/07/2023] [Indexed: 09/22/2023]
Abstract
In the rapidly evolving field of thin-film electronics, the emergence of large-area flexible and wearable devices has been a significant milestone. Although organic semiconductor thin films, which can be manufactured through solution processing, have been identified, their utility is often undermined by their poor stability and low carrier mobility under ambient conditions. However, inorganic nanomaterials can be solution-processed and demonstrate outstanding intrinsic properties and structural stability. In particular, a series of two-dimensional (2D) nanosheet/nanoparticle materials have been shown to form stable colloids in their respective solvents. However, the integration of these 2D nanomaterials into continuous large-area thin with precise control of layer thickness and lattice orientation still remains a significant challenge. This review paper undertakes a detailed analysis of van der Waals thin films, derived from 2D materials, in the advancement of thin-film electronics and optoelectronic devices. The superior intrinsic properties and structural stability of inorganic nanomaterials are highlighted, which can be solution-processed and underscor the importance of solution-based processing, establishing it as a cornerstone strategy for scalable electronic and optoelectronic applications. A comprehensive exploration of the challenges and opportunities associated with the utilization of 2D materials for the next generation of thin-film electronics and optoelectronic devices is presented.
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Affiliation(s)
- Liping Liao
- Department of Inorganic Chemistry, University of Chemistry and Technology, Technicka 5, Prague, 166 28, Czech Republic
| | - Evgeniya Kovalska
- Faculty of Environment, Science and Economy, Department of Engineering, Exeter, EX4 4QF, UK
| | - Jakub Regner
- Department of Inorganic Chemistry, University of Chemistry and Technology, Technicka 5, Prague, 166 28, Czech Republic
| | - Qunliang Song
- School of Materials and Energy, Southwest University, Chongqing, 400715, P. R. China
| | - Zdeněk Sofer
- Department of Inorganic Chemistry, University of Chemistry and Technology, Technicka 5, Prague, 166 28, Czech Republic
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10
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Xia Y, Chen X, Wei J, Wang S, Chen S, Wu S, Ji M, Sun Z, Xu Z, Bao W, Zhou P. 12-inch growth of uniform MoS 2 monolayer for integrated circuit manufacture. NATURE MATERIALS 2023; 22:1324-1331. [PMID: 37770676 DOI: 10.1038/s41563-023-01671-5] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/13/2022] [Accepted: 08/23/2023] [Indexed: 09/30/2023]
Abstract
Two-dimensional (2D) semiconductors, such as transition metal dichalcogenides, provide an opportunity for beyond-silicon exploration. However, the lab to fab transition of 2D semiconductors is still in its preliminary stages, and it has been challenging to meet manufacturing standards of stability and repeatability. Thus, there is a natural eagerness to grow wafer-level, high-quality films with industrially acceptable scale-cost-performance metrics. Here we report an improved chemical vapour deposition synthesis method in which the controlled release of precursors and substrates predeposited with amorphous Al2O3 ensure the uniform synthesis of monolayer MoS2 as large as 12 inches while also enabling fast and non-toxic growth to reduce manufacturing costs. Transistor arrays were fabricated to further confirm the high quality of the film and its integrated circuit application potential. This work achieves the co-optimization of scale-cost-performance metrics and lays the foundation for advancing the integration of 2D semiconductors in industry-standard pilot lines.
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Affiliation(s)
- Yin Xia
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Xinyu Chen
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Jinchen Wei
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Shuiyuan Wang
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Shiyou Chen
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Simin Wu
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai, China
| | - Minbiao Ji
- State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai, China
| | - Zhengzong Sun
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China
| | - Zihan Xu
- Shenzhen SixCarbon Technology, Shenzhen, China.
| | - Wenzhong Bao
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China.
| | - Peng Zhou
- State Key Laboratory of ASIC and System, School of Microelectronics, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, China.
- Shanghai Center of Brain-inspired Intelligent Materials and Devices, East China Normal University, Shanghai, China.
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11
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Mawlong LPL, Hoang AT, Chintalapalli J, Ji S, Lee K, Kim K, Ahn JH. Reduced Defect Density in MOCVD-Grown MoS 2 by Manipulating the Precursor Phase. ACS APPLIED MATERIALS & INTERFACES 2023; 15:47359-47367. [PMID: 37756669 DOI: 10.1021/acsami.3c09027] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/29/2023]
Abstract
Advancements in the synthesis of large-area, high-quality two-dimensional transition metal dichalcogenides such as MoS2 play a crucial role in the development of future electronic and optoelectronic devices. The presence of defects formed by sulfur vacancies in MoS2 results in low photoluminescence emission and imparts high n-type doping behavior, thus substantially affecting material quality. Herein, we report a new method in which single-phase (liquid) precursors are used for the metal-organic chemical vapor deposition (MOCVD) growth of a MoS2 film. Furthermore, we fabricated a high-performance photodetector (PD) and achieved improved photoresponsivity and faster photoresponse in the spectral range 405-637 nm compared to those of PDs fabricated by the conventional MOCVD method. In addition, the fabricated MoS2 thin film showed a threshold voltage shift in the positive gate bias direction owing to the reduced number of S vacancy defects in the MoS2 lattice. Thus, our method significantly improved the synthesis of monolayer MoS2 and can expand the application scope of high-quality, atomically thin materials in large-scale electronic and optoelectronic devices.
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Affiliation(s)
- Larionette P L Mawlong
- School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seoul 03722, Republic of Korea
| | - Anh Tuan Hoang
- School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seoul 03722, Republic of Korea
| | - Jyothi Chintalapalli
- School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seoul 03722, Republic of Korea
| | - Seunghyeon Ji
- School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seoul 03722, Republic of Korea
| | - Kihyun Lee
- Department of Physics, Yonsei University, 50 Yonsei-ro, Seoul 03722, Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), 50 Yonsei-ro, Seoul 03722, Republic of Korea
| | - Kwanpyo Kim
- Department of Physics, Yonsei University, 50 Yonsei-ro, Seoul 03722, Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), 50 Yonsei-ro, Seoul 03722, Republic of Korea
| | - Jong-Hyun Ahn
- School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seoul 03722, Republic of Korea
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12
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Tang J, Wang Q, Tian J, Li X, Li N, Peng Y, Li X, Zhao Y, He C, Wu S, Li J, Guo Y, Huang B, Chu Y, Ji Y, Shang D, Du L, Yang R, Yang W, Bai X, Shi D, Zhang G. Low power flexible monolayer MoS 2 integrated circuits. Nat Commun 2023; 14:3633. [PMID: 37336907 DOI: 10.1038/s41467-023-39390-9] [Citation(s) in RCA: 9] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/12/2022] [Accepted: 06/09/2023] [Indexed: 06/21/2023] Open
Abstract
Monolayer molybdenum disulfide (ML-MoS2) is an emergent two-dimensional (2D) semiconductor holding potential for flexible integrated circuits (ICs). The most important demands for the application of such ML-MoS2 ICs are low power consumption and high performance. However, these are currently challenging to satisfy due to limitations in the material quality and device fabrication technology. In this work, we develop an ultra-thin high-κ dielectric/metal gate fabrication technique for the realization of thin film transistors based on high-quality wafer scale ML-MoS2 on both rigid and flexible substrates. The rigid devices can be operated in the deep-subthreshold regime with low power consumption and show negligible hysteresis, sharp subthreshold slope, high current density, and ultra-low leakage currents. Moreover, we realize fully functional large-scale flexible ICs operating at voltages below 1 V. Our process could represent a key step towards using energy-efficient flexible ML-MoS2 ICs in portable, wearable, and implantable electronics.
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Affiliation(s)
- Jian Tang
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Qinqin Wang
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Jinpeng Tian
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Xiaomei Li
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
- Shanghai Key Laboratory of Multidimensional Information Processing, East China Normal University, Shanghai, China
| | - Na Li
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- Songshan Lake Materials Laboratory, Dongguan, 523808, China
| | - Yalin Peng
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Xiuzhen Li
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Yanchong Zhao
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Congli He
- Institute of Advanced Materials, Beijing Normal University, Beijing, 100875, China
| | - Shuyu Wu
- Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
| | - Jiawei Li
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Yutuo Guo
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Biying Huang
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Yanbang Chu
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Yiru Ji
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Dashan Shang
- Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
| | - Luojun Du
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Rong Yang
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- Songshan Lake Materials Laboratory, Dongguan, 523808, China
| | - Wei Yang
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
- Songshan Lake Materials Laboratory, Dongguan, 523808, China
| | - Xuedong Bai
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Dongxia Shi
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China
| | - Guangyu Zhang
- Beijing National Laboratory for Condensed Matter Physics and Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China.
- School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100190, China.
- Songshan Lake Materials Laboratory, Dongguan, 523808, China.
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13
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Song Z, Zhou S, Qin Y, Xia X, Sun Y, Han G, Shu T, Hu L, Zhang Q. Flexible and Wearable Biosensors for Monitoring Health Conditions. BIOSENSORS 2023; 13:630. [PMID: 37366995 DOI: 10.3390/bios13060630] [Citation(s) in RCA: 7] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/25/2023] [Revised: 05/22/2023] [Accepted: 06/01/2023] [Indexed: 06/28/2023]
Abstract
Flexible and wearable biosensors have received tremendous attention over the past decade owing to their great potential applications in the field of health and medicine. Wearable biosensors serve as an ideal platform for real-time and continuous health monitoring, which exhibit unique properties such as self-powered, lightweight, low cost, high flexibility, detection convenience, and great conformability. This review introduces the recent research progress in wearable biosensors. First of all, the biological fluids often detected by wearable biosensors are proposed. Then, the existing micro-nanofabrication technologies and basic characteristics of wearable biosensors are summarized. Then, their application manners and information processing are also highlighted in the paper. Massive cutting-edge research examples are introduced such as wearable physiological pressure sensors, wearable sweat sensors, and wearable self-powered biosensors. As a significant content, the detection mechanism of these sensors was detailed with examples to help readers understand this area. Finally, the current challenges and future perspectives are proposed to push this research area forward and expand practical applications in the future.
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Affiliation(s)
- Zhimin Song
- Department of Anesthesiology, The Second Hospital of Jilin University, Changchun 130041, China
| | - Shu Zhou
- Department of Anesthesiology, Jilin Cancer Hospital, Changchun 130021, China
| | - Yanxia Qin
- State Key Laboratory of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
| | - Xiangjiao Xia
- State Key Laboratory of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
| | - Yanping Sun
- School of Biomedical Engineering, Guangdong Laboratory of Artificial Intelligence and Digital Economy (SZ), Shenzhen Key Laboratory for Nano-Biosensing Technology, International Health Science Innovation Center, Research Center for Biosensor and Nanotheranostic, Health Science Center, Shenzhen University, Shenzhen 518060, China
| | - Guanghong Han
- Department of Oral Geriatrics, Hospital of Stomatology, Jilin University, Changchun 130021, China
| | - Tong Shu
- School of Biomedical Engineering, Guangdong Laboratory of Artificial Intelligence and Digital Economy (SZ), Shenzhen Key Laboratory for Nano-Biosensing Technology, International Health Science Innovation Center, Research Center for Biosensor and Nanotheranostic, Health Science Center, Shenzhen University, Shenzhen 518060, China
| | - Liang Hu
- State Key Laboratory of Radiation Medicine and Protection, School for Radiological and Interdisciplinary Sciences (RAD-X) and Collaborative Innovation Center of Radiation Medicine of Jiangsu Higher Education Institutions, Soochow University, Suzhou 215123, China
| | - Qiang Zhang
- State Key Laboratory of Electroanalytical Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
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14
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Yang S, Liu K, Xu Y, Liu L, Li H, Zhai T. Gate Dielectrics Integration for 2D Electronics: Challenges, Advances, and Outlook. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2207901. [PMID: 36226584 DOI: 10.1002/adma.202207901] [Citation(s) in RCA: 5] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/30/2022] [Revised: 09/28/2022] [Indexed: 05/05/2023]
Abstract
2D semiconductors have emerged both as an ideal platform for fundamental studies and as promising channel materials in beyond-silicon field-effect-transistors due to their outstanding electrical properties and exceptional tunability via external field. However, the lack of proper dielectrics for 2D semiconductors has become a major roadblock for their further development toward practical applications. The prominent issues between conventional 3D dielectrics and 2D semiconductors arise from the integration and interface quality, where defect states and imperfections lead to dramatic deterioration of device performance. In this review article, the root causes of such issues are briefly analyzed and recent advances on some possible solutions, including various approaches of adapting conventional dielectrics to 2D semiconductors, and the development of novel dielectrics with van der Waals surface toward high-performance 2D electronics are summarized. Then, in the perspective, the requirements of ideal dielectrics for state-of-the-art 2D devices are outlined and an outlook for their future development is provided.
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Affiliation(s)
- Sijie Yang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Kailang Liu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Yongshan Xu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Lixin Liu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Huiqiao Li
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
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15
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Meng Y, Li X, Kang X, Li W, Wang W, Lai Z, Wang W, Quan Q, Bu X, Yip S, Xie P, Chen D, Li D, Wang F, Yeung CF, Lan C, Liu C, Shen L, Lu Y, Chen F, Wong CY, Ho JC. Van der Waals nanomesh electronics on arbitrary surfaces. Nat Commun 2023; 14:2431. [PMID: 37105992 PMCID: PMC10140039 DOI: 10.1038/s41467-023-38090-8] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/09/2022] [Accepted: 04/14/2023] [Indexed: 04/29/2023] Open
Abstract
Chemical bonds, including covalent and ionic bonds, endow semiconductors with stable electronic configurations but also impose constraints on their synthesis and lattice-mismatched heteroepitaxy. Here, the unique multi-scale van der Waals (vdWs) interactions are explored in one-dimensional tellurium (Te) systems to overcome these restrictions, enabled by the vdWs bonds between Te atomic chains and the spontaneous misfit relaxation at quasi-vdWs interfaces. Wafer-scale Te vdWs nanomeshes composed of self-welding Te nanowires are laterally vapor grown on arbitrary surfaces at a low temperature of 100 °C, bringing greater integration freedoms for enhanced device functionality and broad applicability. The prepared Te vdWs nanomeshes can be patterned at the microscale and exhibit high field-effect hole mobility of 145 cm2/Vs, ultrafast photoresponse below 3 μs in paper-based infrared photodetectors, as well as controllable electronic structure in mixed-dimensional heterojunctions. All these device metrics of Te vdWs nanomesh electronics are promising to meet emerging technological demands.
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Affiliation(s)
- You Meng
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
- State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Xiaocui Li
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
- Department of Mechanical Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Xiaolin Kang
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Wanpeng Li
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Wei Wang
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
- State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Zhengxun Lai
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Weijun Wang
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Quan Quan
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Xiuming Bu
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - SenPo Yip
- Institute for Materials Chemistry and Engineering, Kyushu University, Fukuoka, 816-8580, Japan
| | - Pengshan Xie
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Dong Chen
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Dengji Li
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Fei Wang
- State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130021, China.
| | - Chi-Fung Yeung
- Department of Chemistry, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Changyong Lan
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 610054, P. R. China
| | - Chuntai Liu
- Key Laboratory of Advanced Materials Processing & Mold (Zhengzhou University), Ministry of Education, Zhengzhou, 450002, P.R. China
| | - Lifan Shen
- College of Microelectronics and Key Laboratory of Optoelectronics Technology, Faculty of Information Technology, Beijing University of Technology, Beijing, 100124, P.R. China
| | - Yang Lu
- Department of Mechanical Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Furong Chen
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR
| | - Chun-Yuen Wong
- State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR.
- Department of Chemistry, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR.
| | - Johnny C Ho
- Department of Materials Science and Engineering, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR.
- State Key Laboratory of Terahertz and Millimeter Waves, City University of Hong Kong, Kowloon, 999077, Hong Kong SAR.
- Institute for Materials Chemistry and Engineering, Kyushu University, Fukuoka, 816-8580, Japan.
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16
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Ferrera M, Sharma A, Milekhin I, Pan Y, Convertino D, Pace S, Orlandini G, Peci E, Ramò L, Magnozzi M, Coletti C, Salvan G, Zahn DRT, Canepa M, Bisio F. Local dielectric function of hBN-encapsulated WS 2flakes grown by chemical vapor deposition. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2023; 35:274001. [PMID: 36996840 DOI: 10.1088/1361-648x/acc918] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/30/2022] [Accepted: 03/30/2023] [Indexed: 06/19/2023]
Abstract
Hexagonal boron nitride (hBN), sometimes referred to as white graphene, receives growing interest in the scientific community, especially when combined into van der Waals (vdW) homo- and heterostacks, in which novel and interesting phenomena may arise. hBN is also commonly used in combination with two-dimensional (2D) semiconducting transition metal dichalcogenides (TMDCs). The realization of hBN-encapsulated TMDC homo- and heterostacks can indeed offer opportunities to investigate and compare TMDC excitonic properties in various stacking configurations. In this work, we investigate the optical response at the micrometric scale of mono- and homo-bilayer WS2grown by chemical vapor deposition and encapsulated between two single layers of hBN. Imaging spectroscopic ellipsometry is exploited to extract the local dielectric functions across one single WS2flake and detect the evolution of excitonic spectral features from monolayer to bilayer regions. Exciton energies undergo a redshift by passing from hBN-encapsulated single layer to homo-bilayer WS2, as also confirmed by photoluminescence spectra. Our results can provide a reference for the study of the dielectric properties of more complex systems where hBN is combined with other 2D vdW materials into heterostructures and are stimulating towards the investigation of the optical response of other technologically-relevant heterostacks.
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Affiliation(s)
- Marzia Ferrera
- OptMatLab, Physics Department, Università di Genova, via Dodecaneso 33, 16146 Genova, Italy
- Istituto Italiano di Tecnologia, via Morego 30, 16163 Genova, Italy
| | - Apoorva Sharma
- Semiconductor Physics, Chemnitz University of Technology, D-09107 Chemnitz, Germany
| | - Ilya Milekhin
- Semiconductor Physics, Chemnitz University of Technology, D-09107 Chemnitz, Germany
- Center for Materials, Architectures and Integration of Nanomembranes (MAIN), Chemnitz University of Technology, D-09107 Chemnitz, Germany
| | - Yang Pan
- Semiconductor Physics, Chemnitz University of Technology, D-09107 Chemnitz, Germany
- Center for Materials, Architectures and Integration of Nanomembranes (MAIN), Chemnitz University of Technology, D-09107 Chemnitz, Germany
| | - Domenica Convertino
- Center for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
| | - Simona Pace
- Center for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163 Genova, Italy
| | - Giorgio Orlandini
- Center for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
| | - Ermes Peci
- OptMatLab, Physics Department, Università di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Lorenzo Ramò
- OptMatLab, Physics Department, Università di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Michele Magnozzi
- OptMatLab, Physics Department, Università di Genova, via Dodecaneso 33, 16146 Genova, Italy
- INFN, Sezione di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Camilla Coletti
- Center for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163 Genova, Italy
| | - Georgeta Salvan
- Semiconductor Physics, Chemnitz University of Technology, D-09107 Chemnitz, Germany
| | - Dietrich R T Zahn
- Semiconductor Physics, Chemnitz University of Technology, D-09107 Chemnitz, Germany
- Center for Materials, Architectures and Integration of Nanomembranes (MAIN), Chemnitz University of Technology, D-09107 Chemnitz, Germany
| | - Maurizio Canepa
- OptMatLab, Physics Department, Università di Genova, via Dodecaneso 33, 16146 Genova, Italy
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17
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Liu Y, Zhu H, Xing L, Bu Q, Ren D, Sun B. Recent advances in inkjet-printing technologies for flexible/wearable electronics. NANOSCALE 2023; 15:6025-6051. [PMID: 36892458 DOI: 10.1039/d2nr05649f] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
The rapid development of flexible/wearable electronics requires novel fabricating strategies. Among the state-of-the-art techniques, inkjet printing has aroused considerable interest due to the possibility of large-scale fabricating flexible electronic devices with good reliability, high time efficiency, a low manufacturing cost, and so on. In this review, based on the working principle, recent advances in the inkjet printing technology in the field of flexible/wearable electronics are summarized, including flexible supercapacitors, transistors, sensors, thermoelectric generators, wearable fabric, and for radio frequency identification. In addition, some current challenges and future opportunities in this area are also addressed. We hope this review article can give positive suggestions to the researchers in the area of flexible electronics.
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Affiliation(s)
- Yu Liu
- College of Electronics and Information, Qingdao University, Qingdao 266071, PR. China.
| | - Hongze Zhu
- College of Physics, Qingdao University, Qingdao 266071, PR China
| | - Lei Xing
- College of Electronics and Information, Qingdao University, Qingdao 266071, PR. China.
| | - Qingkai Bu
- College of Computer Science and Technology, Qingdao University, Qingdao 266071, PR. China
- Weihai Innovation Research Institute of Qingdao University, Weihai 264200, PR. China
| | - Dayong Ren
- State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, PR. China.
| | - Bin Sun
- College of Electronics and Information, Qingdao University, Qingdao 266071, PR. China.
- Weihai Innovation Research Institute of Qingdao University, Weihai 264200, PR. China
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18
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Kassem O, Pimpolari L, Dun C, Polyushkin DK, Zarattini M, Dimaggio E, Chen L, Basso G, Parenti F, Urban JJ, Mueller T, Fiori G, Casiraghi C. Water-based 2-dimensional anatase TiO 2 inks for printed diodes and transistors. NANOSCALE 2023; 15:5689-5695. [PMID: 36880645 PMCID: PMC10035403 DOI: 10.1039/d2nr05786g] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 10/18/2022] [Accepted: 02/03/2023] [Indexed: 06/18/2023]
Abstract
2-Dimensional (2D) materials are attracting strong interest in printed electronics because of their unique properties and easy processability, enabling the fabrication of devices with low cost and mass scalable methods such as inkjet printing. For the fabrication of fully printed devices, it is of fundamental importance to develop a printable dielectric ink, providing good insulation and the ability to withstand large electric fields. Hexagonal boron nitride (h-BN) is typically used as a dielectric in printed devices. However, the h-BN film thickness is usually above 1 μm, hence limiting the use of h-BN in low-voltage applications. Furthermore, the h-BN ink is composed of nanosheets with broad lateral size and thickness distributions, due to the use of liquid-phase exfoliation (LPE). In this work, we investigate anatase TiO2 nanosheets (TiO2-NS), produced by a mass scalable bottom-up approach. We formulate the TiO2-NS into a water-based and printable solvent and demonstrate the use of the material with sub-micron thickness in printed diodes and transistors, hence validating the strong potential of TiO2-NS as a dielectric for printed electronics.
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Affiliation(s)
- Omar Kassem
- Department of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL UK.
| | - Lorenzo Pimpolari
- Dipartimento di Ingegneria dell'Informazione, Università di Pisa, Pisa 56122, Italy
| | - Chaochao Dun
- The Molecular Foundry, Lawrence Berkeley National Laboratory Berkeley, Berkeley, CA, 94720, USA
| | - Dmitry K Polyushkin
- Institute of Photonics, Vienna University of Technology, Vienna, 1040, Austria
| | - Marco Zarattini
- Department of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL UK.
| | - Elisabetta Dimaggio
- Dipartimento di Ingegneria dell'Informazione, Università di Pisa, Pisa 56122, Italy
| | - Liming Chen
- Department of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL UK.
| | - Giovanni Basso
- Dipartimento di Ingegneria dell'Informazione, Università di Pisa, Pisa 56122, Italy
| | - Federico Parenti
- Dipartimento di Ingegneria dell'Informazione, Università di Pisa, Pisa 56122, Italy
| | - Jeffrey J Urban
- The Molecular Foundry, Lawrence Berkeley National Laboratory Berkeley, Berkeley, CA, 94720, USA
| | - Thomas Mueller
- Institute of Photonics, Vienna University of Technology, Vienna, 1040, Austria
| | - Gianluca Fiori
- Dipartimento di Ingegneria dell'Informazione, Università di Pisa, Pisa 56122, Italy
| | - Cinzia Casiraghi
- Department of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL UK.
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19
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Batool S, Idrees M, Han ST, Roy VAL, Zhou Y. Electrical Contacts With 2D Materials: Current Developments and Future Prospects. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023; 19:e2206550. [PMID: 36587964 DOI: 10.1002/smll.202206550] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/24/2022] [Revised: 12/07/2022] [Indexed: 06/17/2023]
Abstract
Current electrical contact models are occasionally insufficient at the nanoscale owing to the wide variations in outcomes between 2D mono and multi-layered and bulk materials that result from their distinctive electrostatics and geometries. Contrarily, devices based on 2D semiconductors present a significant challenge due to the requirement for electrical contact with resistances close to the quantum limit. The next generation of low-power devices is already hindered by the lack of high-quality and low-contact-resistance contacts on 2D materials. The physics and materials science of electrical contact resistance in 2D materials-based nanoelectronics, interface configurations, charge injection mechanisms, and numerical modeling of electrical contacts, as well as the most pressing issues that need to be resolved in the field of research and development, will all be covered in this review.
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Affiliation(s)
- Saima Batool
- Institute for Advanced Study, Shenzhen University, Shenzhen, 518060, P. R. China
| | - Muhammad Idrees
- Additive Manufacturing Institute, College of Mechatronics and Control Engineering, Shenzhen University, Shenzhen, 518060, P. R. China
| | - Su-Ting Han
- College of Electronics Science & Technology, Shenzhen University, Shenzhen, 518060, P. R. China
| | - Vellaisamy A L Roy
- James Watt School of Engineering, University of Glasgow, Glasgow, G12 8QQ, UK
| | - Ye Zhou
- Institute for Advanced Study, Shenzhen University, Shenzhen, 518060, P. R. China
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20
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Khan MA, Ramzan F, Ali M, Zubair M, Mehmood MQ, Massoud Y. Emerging Two-Dimensional Materials-Based Electrochemical Sensors for Human Health and Environment Applications. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:nano13040780. [PMID: 36839148 PMCID: PMC9964193 DOI: 10.3390/nano13040780] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/31/2022] [Revised: 02/14/2023] [Accepted: 02/14/2023] [Indexed: 05/27/2023]
Abstract
Two-dimensional materials (2DMs) have been vastly studied for various electrochemical sensors. Among these, the sensors that are directly related to human life and health are extremely important. Owing to their exclusive properties, 2DMs are vastly studied for electrochemical sensing. Here we have provided a selective overview of 2DMs-based electrochemical sensors that directly affect human life and health. We have explored graphene and its derivatives, transition metal dichalcogenide and MXenes-based electrochemical sensors for applications such as glucose detection in human blood, detection of nitrates and nitrites, and sensing of pesticides. We believe that the areas discussed here are extremely important and we have summarized the prominent reports on these significant areas together. We believe that our work will be able to provide guidelines for the evolution of electrochemical sensors in the future.
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21
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Chen X, Wang X, Pang Y, Bao G, Jiang J, Yang P, Chen Y, Rao T, Liao W. Printed Electronics Based on 2D Material Inks: Preparation, Properties, and Applications toward Memristors. SMALL METHODS 2023; 7:e2201156. [PMID: 36610015 DOI: 10.1002/smtd.202201156] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/05/2022] [Revised: 12/07/2022] [Indexed: 06/17/2023]
Abstract
Printed electronics, which fabricate electrical components and circuits on various substrates by leveraging functional inks and advanced printing technologies, have recently attracted tremendous attention due to their capability of large-scale, high-speed, and cost-effective manufacturing and also their great potential in flexible and wearable devices. To further achieve multifunctional, practical, and commercial applications, various printing technologies toward smarter pattern-design, higher resolution, greater production flexibility, and novel ink formulations toward multi-functionalities and high quality have been insensitively investigated. 2D materials, possessing atomically thin thickness, unique properties and excellent solution-processable ability, hold great potential for high-quality inks. Besides, the great variety of 2D materials ranging from metals, semiconductors to insulators offers great freedom to formulate versatile inks to construct various printed electronics. Here, a detailed review of the progress on 2D material inks formulation and its printed applications has been provided, specifically with an emphasis on emerging printed memristors. Finally, the challenges facing the field and prospects of 2D material inks and printed electronics are discussed.
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Affiliation(s)
- Xiaopei Chen
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Xiongfeng Wang
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Yudong Pang
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Guocheng Bao
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Jie Jiang
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Peng Yang
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
- College of Integrated Circuits and Optoelectronic Chips, Shenzhen Technology University, Shenzhen, 518118, China
| | - Yuankang Chen
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Tingke Rao
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
| | - Wugang Liao
- College of Electronics and Information Engineering, Shenzhen University, Shenzhen, 518060, China
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22
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Li W, Xu M, Gao J, Zhang X, Huang H, Zhao R, Zhu X, Yang Y, Luo L, Chen M, Ji H, Zheng L, Wang X, Huang W. Large-Scale Ultra-Robust MoS 2 Patterns Directly Synthesized on Polymer Substrate for Flexible Sensing Electronics. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2207447. [PMID: 36353895 DOI: 10.1002/adma.202207447] [Citation(s) in RCA: 14] [Impact Index Per Article: 14.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/15/2022] [Revised: 11/02/2022] [Indexed: 06/16/2023]
Abstract
Synthesis of large-area patterned MoS2 is considered the principle base for realizing high-performance MoS2 -based flexible electronic devices. Patterning and transferring MoS2 films to target flexible substrates, however, require conventional multi-step photolithography patterning and transferring process, despite tremendous progress in the facilitation of practical applications. Herein, an approach to directly synthesize large-scale MoS2 patterns that combines inkjet printing and thermal annealing is reported. An optimal precursor ink is prepared that can deposit arbitrary patterns on polyimide films. By introducing a gas atmosphere of argon/hydrogen (Ar/H2 ), thermal treatment at 350 °C enables an in situ decomposition and crystallization in the patterned precursors and, consequently, results in the formation of MoS2 . Without complicated processes, patterned MoS2 is obtained directly on polymer substrate, exhibiting superior mechanical flexibility and durability (≈2% variation in resistance over 10,000 bending cycles), as well as excellent chemical stability, which is attributed to the generated continuous and thin microstructures, as well as their strong adhesion with the substrate. As a step further, this approach is employed to manufacture various flexible sensing devices that are insensitive to body motions and moisture, including temperature sensors and biopotential sensing systems for real-time, continuously monitoring skin temperature, electrocardiography, and electromyography signals.
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Affiliation(s)
- Weiwei Li
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Manzhang Xu
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Jiuwei Gao
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Xiaoshan Zhang
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - He Huang
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Ruoqing Zhao
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Xigang Zhu
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Yabao Yang
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Lei Luo
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Mengdi Chen
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Hongjia Ji
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Lu Zheng
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
| | - Xuewen Wang
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Key Laboratory of Flexible Electronics of Zhejiang Province, Ningbo Institute of Northwestern Polytechnical University, 218 Qingyi Road, Ningbo, 315103, China
| | - Wei Huang
- Frontiers Science Center for Flexible Electronics (FSCFE) & Shaanxi Institute of Flexible Electronics (SIFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- Shaanxi Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- MIIT Key Laboratory of Flexible Electronics (KLoFE), Northwestern Polytechnical University (NPU), 127 West Youyi Road, Xi'an, 710072, China
- State Key Laboratory of Organic Electronics and Information Displays, Institute of Advanced Materials (IAM), Nanjing University of Posts & Telecommunications, Nanjing, 210023, China
- Key Laboratory of Flexible Electronics(KLoFE)and Institute of Advanced Materials (IAM), Nanjing Tech University (NanjingTech), Nanjing, 211800, China
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23
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Silvestre GH, de Lima FC, Bernardes JS, Fazzio A, Miwa RH. Nanoscale structural and electronic properties of cellulose/graphene interfaces. Phys Chem Chem Phys 2023; 25:1161-1168. [PMID: 36519443 DOI: 10.1039/d2cp04146d] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/05/2022]
Abstract
The development of electronic devices based on the functionalization of (nano)cellulose platforms relies upon an atomistic understanding of the structural and electronic properties of a combined system, cellulose/functional element. In this work, we present a theoretical study of the nanocellulose/graphene interfaces (nCL/G) based on first-principles calculations. We find that the binding energies of both hydrophobic/G (nCLphob/G) and hydrophilic/G (nCLphil/G) interfaces are primarily dictated by the van der Waals interactions, and are comparable with those of their 2D interface counterparts. We verify that the energetic preference of nCLphob/G has been reinforced by the inclusion of an aqueous medium via an implicit solvation model. Further structural characterization was carried out using a set of simulations of the carbon K-edge X-ray absorption spectra to identify and distinguish the key absorption features of the nCLphob/G and nCLphil/G interfaces. The electronic structure calculations reveal that the linear energy bands of graphene lie in the band gap of the nCL sheet, while depletion/accumulation charge density regions are observed. We show that external agents, i.e., electric field and mechanical strain, allow for tunability of the Dirac cone and charge density at the interface. The control/maintenance of the Dirac cone states in nCL/G is an important feature for the development of electronic devices based on cellulosic platforms.
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Affiliation(s)
- G H Silvestre
- Instituto de Física, Universidade Federal de Uberlândia, 38400-902, Uberlândia, MG, Brazil.
| | - F Crasto de Lima
- Ilum School of Science, Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, SP, 13083-970, Brazil.
| | - J S Bernardes
- Brazilian Nanotechnology National Laboratory, Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, SP, 13083-970, Brazil.,Universidade Federal do ABC (UFABC), 09210-580 Santo André, São Paulo, Brazil
| | - A Fazzio
- Ilum School of Science, Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, SP, 13083-970, Brazil. .,Universidade Federal do ABC (UFABC), 09210-580 Santo André, São Paulo, Brazil
| | - R H Miwa
- Instituto de Física, Universidade Federal de Uberlândia, 38400-902, Uberlândia, MG, Brazil.
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24
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Zhang P, Fu Y, Zhang X, Zhang X, Li BW, Nan CW. Flexible high-performance microcapacitors enabled by all-printed two-dimensional nanosheets. Sci Bull (Beijing) 2022; 67:2541-2549. [PMID: 36604032 DOI: 10.1016/j.scib.2022.12.003] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/13/2022] [Revised: 10/20/2022] [Accepted: 11/22/2022] [Indexed: 12/10/2022]
Abstract
Chemically exfoliated nanosheets have exhibited great potential for applications in various electronic devices. Solution-based processing strategies such as inkjet printing provide a low-cost, environmentally friendly, and scalable route for the fabrication of flexible devices based on functional inks of two-dimensional nanosheets. In this study, chemically exfoliated high-k perovskite nanosheets (i.e., Ca2Nb3O10 and Ca2NaNb4O13) are well dispersed in appropriate solvents to prepare printable inks, and then, a series of microcapacitors with Ag and graphene electrodes are printed. The resulting microcapacitors, Ag/Ca2Nb3O10/Ag, graphene/Ca2Nb3O10/graphene, and graphene/Ca2NaNb4O13/graphene, demonstrate high capacitance densities of 20, 80, and 150 nF/cm2 and high dielectric constants of 26, 110, and 200, respectively. Such dielectric enhancement in the microcapacitors with graphene electrodes is possibly attributed to the dielectric/graphene interface. In addition, these microcapacitors also exhibit good insulating performance with a moderate electrical breakdown strength of approximately 1 MV/cm, excellent flexibility, and thermal stability up to 200 ℃. This work demonstrates the potential of high-k perovskite nanosheets for additive manufacturing of flexible high-performance dielectric capacitors.
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Affiliation(s)
- Pengxiang Zhang
- Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061, China
| | - Yushui Fu
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Center of Smart Materials and Devices, Wuhan University of Technology, Wuhan 430070, China
| | - Xin Zhang
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Center of Smart Materials and Devices, Wuhan University of Technology, Wuhan 430070, China
| | - Xihua Zhang
- Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061, China
| | - Bao-Wen Li
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Center of Smart Materials and Devices, Wuhan University of Technology, Wuhan 430070, China; State Key Laboratory of Silicate Materials for Architectures, School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China.
| | - Ce-Wen Nan
- State Key Lab of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
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25
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Can TTT, Choi WS. Stacked printed MoS 2 and Ag electrodes using electrohydrodynamic jet printing for thin-film transistors. Sci Rep 2022; 12:22469. [PMID: 36577868 PMCID: PMC9797473 DOI: 10.1038/s41598-022-27072-3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/16/2022] [Accepted: 12/23/2022] [Indexed: 12/29/2022] Open
Abstract
Transition metal dichalcogenide-based thin-film transistors (TFTs) have drawn intense research attention, but they suffer from high cost of materials and complex methods. Directly printed transistors have been in the limelight due to low cost and an environmentally friendly technique. An electrohydrodynamic (EHD) jet printing technique was employed to pattern both MoS2 active layer and Ag source and drain (S/D) electrodes. Printed MoS2 lines were patterned on a silicon wafer using a precursor solution and simple annealing, and the patterns were transferred on other SiO2 substrates for TFT fabrication. On top of the patterned MoS2, Ag paste was also patterned for S/D electrodes using EHD jet printing. The printed TFTs had a high on-off current ratio exceeding 105, low subthreshold slope, and better hysteresis behavior after transferring MoS2 patterns. This result could be important for practical TFT applications and could be extended to other 2D materials.
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Affiliation(s)
- Thi Thu Thuy Can
- grid.412238.e0000 0004 0532 7053School of Electronics and Display Engineering, Hoseo University, Asan, 31499 Korea ,grid.440774.40000 0004 0451 8149Present Address: Faculty of Physics, Hanoi National University of Education, Hanoi, Vietnam
| | - Woon-Seop Choi
- grid.412238.e0000 0004 0532 7053School of Electronics and Display Engineering, Hoseo University, Asan, 31499 Korea
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26
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Grillo A, Peng Z, Pelella A, Di Bartolomeo A, Casiraghi C. Etch and Print: Graphene-Based Diodes for Silicon Technology. ACS NANO 2022; 17:1533-1540. [PMID: 36475589 PMCID: PMC9878974 DOI: 10.1021/acsnano.2c10684] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 10/26/2022] [Accepted: 11/29/2022] [Indexed: 06/17/2023]
Abstract
The graphene-silicon junction is one of the simplest conceivable interfaces in graphene-integrated semiconductor technology that can lead to the development of future generation of electronic and optoelectronic devices. However, graphene's integration is currently expensive and time-consuming and shows several challenges in terms of large-scale device fabrication, effectively preventing the possibility of implementing this technology into industrial processes. Here, we show a simple and cost-effective fabrication technique, based on inkjet printing, for the realization of printed graphene-silicon rectifying devices. The printed graphene-silicon diodes show an ON/OFF ratio higher than 3 orders of magnitude and a significant photovoltaic effect, resulting in a fill factor of ∼40% and a photocurrent efficiency of ∼2%, making the devices suitable for both electronic and optoelectronic applications. Finally, we demonstrate large-area pixeled photodetectors and compatibility with back-end-of-line fabrication processes.
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Affiliation(s)
- Alessandro Grillo
- Department
of Chemistry, University of Manchester, ManchesterM13 9PL, United Kingdom
| | - Zixing Peng
- Department
of Chemistry, University of Manchester, ManchesterM13 9PL, United Kingdom
| | - Aniello Pelella
- Physics
Department “E. R. Caianiello”, University of Salerno, via Giovanni Paolo II n. 132, Fisciano84084, Salerno, Italy
| | - Antonio Di Bartolomeo
- Physics
Department “E. R. Caianiello”, University of Salerno, via Giovanni Paolo II n. 132, Fisciano84084, Salerno, Italy
| | - Cinzia Casiraghi
- Department
of Chemistry, University of Manchester, ManchesterM13 9PL, United Kingdom
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27
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Liu S, Wang J, Shao J, Ouyang D, Zhang W, Liu S, Li Y, Zhai T. Nanopatterning Technologies of 2D Materials for Integrated Electronic and Optoelectronic Devices. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2200734. [PMID: 35501143 DOI: 10.1002/adma.202200734] [Citation(s) in RCA: 12] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/23/2022] [Revised: 04/12/2022] [Indexed: 06/14/2023]
Abstract
With the reduction of feature size and increase of integration density, traditional 3D semiconductors are unable to meet the future requirements of chip integration. The current semiconductor fabrication technologies are approaching their physical limits based on Moore's law. 2D materials such as graphene, transitional metal dichalcogenides, etc., are of great promise for future memory, logic, and photonic devices due to their unique and excellent properties. To prompt 2D materials and devices from the laboratory research stage to the industrial integrated circuit-level, it is necessary to develop advanced nanopatterning methods to obtain high-quality, wafer-scale, and patterned 2D products. Herein, the recent development of nanopatterning technologies, particularly toward realizing large-scale practical application of 2D materials is reviewed. Based on the technological progress, the unique requirement and advances of the 2D integration process for logic, memory, and optoelectronic devices are further summarized. Finally, the opportunities and challenges of nanopatterning technologies of 2D materials for future integrated chip devices are prospected.
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Affiliation(s)
- Shenghong Liu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Jing Wang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Jiefan Shao
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Decai Ouyang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Wenjing Zhang
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen, 518060, P. R. China
| | - Shiyuan Liu
- State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Yuan Li
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
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28
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Li L, Yu X, Lin Z, Cai Z, Cao Y, Kong W, Xiang Z, Gu Z, Xing X, Duan X, Song Y. Interface Capture Effect Printing Atomic-Thick 2D Semiconductor Thin Films. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2207392. [PMID: 36128664 DOI: 10.1002/adma.202207392] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/13/2022] [Revised: 09/17/2022] [Indexed: 06/15/2023]
Abstract
2D semiconductor crystals offer the opportunity to further extend Moore's law to the atomic scale. For practical and low-cost electronic applications, directly printing devices on substrates is advantageous compared to conventional microfabrication techniques that utilize expensive photolithography, etching, and vacuum-metallization processes. However, the currently printed 2D transistors are plagued by unsatisfactory electrical performance, thick semiconductor layers, and low device density. Herein, a facile and scalable 2D semiconductor printing strategy is demonstrated utilizing the interface capture effect and hyperdispersed 2D nanosheet ink to fabricate high-quality and atomic-thick semiconductor thin-film arrays without additional surfactants. Printed robust thin-film transistors using 2D semiconductors (e.g., MoS2 ) and 2D conductive electrodes (e.g., graphene) exhibit high electrical performance, including a carrier mobility of up to 6.7 cm2 V-1 s-1 and an on/off ratio of 2 × 106 at 25 °C. As a proof of concept, 2D transistors are printed with a density of ≈47 000 devices per square centimeter. In addition, this method can be applied to many other 2D materials, such as NbSe2 , Bi2 Se3 , and black phosphorus, for printing diverse high-quality thin films. Thus, the strategy of printable 2D thin-film transistors provides a scalable pathway for the facile manufacturing of high-performance electronics at an affordable cost.
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Affiliation(s)
- Lihong Li
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
- Micro/nano Circuit Printing Preparation Laboratory, Zhongguancun Open Laboratory, Zhongguancun Science Park, Beijing, 100190, P. R. China
| | - Xiaoxia Yu
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
- Micro/nano Circuit Printing Preparation Laboratory, Zhongguancun Open Laboratory, Zhongguancun Science Park, Beijing, 100190, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100190, P. R. China
| | - Zhaoyang Lin
- Department of Chemistry, Tsinghua University, Beijing, 100084, P. R. China
| | - Zhenren Cai
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
- Micro/nano Circuit Printing Preparation Laboratory, Zhongguancun Open Laboratory, Zhongguancun Science Park, Beijing, 100190, P. R. China
| | - Yawei Cao
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
- Micro/nano Circuit Printing Preparation Laboratory, Zhongguancun Open Laboratory, Zhongguancun Science Park, Beijing, 100190, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100190, P. R. China
| | - Wei Kong
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
- Micro/nano Circuit Printing Preparation Laboratory, Zhongguancun Open Laboratory, Zhongguancun Science Park, Beijing, 100190, P. R. China
- Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100190, P. R. China
| | - Zhongyuan Xiang
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
- Micro/nano Circuit Printing Preparation Laboratory, Zhongguancun Open Laboratory, Zhongguancun Science Park, Beijing, 100190, P. R. China
| | - Zhengkun Gu
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
- Micro/nano Circuit Printing Preparation Laboratory, Zhongguancun Open Laboratory, Zhongguancun Science Park, Beijing, 100190, P. R. China
| | - Xianran Xing
- Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100190, P. R. China
| | - Xiangfeng Duan
- Department of Chemistry and Biochemistry, University of California, Los Angeles, Los Angeles, CA, 90095, USA
| | - Yanlin Song
- Key Laboratory of Green Printing, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences (ICCAS), Beijing, 100190, P. R. China
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Zheng W, Saiz F, Shen Y, Zhu K, Liu Y, McAleese C, Conran B, Wang X, Lanza M. Defect-Free Metal Deposition on 2D Materials via Inkjet Printing Technology. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2104138. [PMID: 34734445 DOI: 10.1002/adma.202104138] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/31/2021] [Revised: 10/30/2021] [Indexed: 06/13/2023]
Abstract
2D materials have many outstanding properties that make them attractive for the fabrication of electronic devices, such as high conductivity, flexibility, and transparency. However, integrating 2D materials in commercial devices and circuits is challenging because their structure and properties can be damaged during the fabrication process. Recent studies have demonstrated that standard metal deposition techniques (like electron beam evaporation and sputtering) significantly damage the atomic structure of 2D materials. Here it is shown that the deposition of metal via inkjet printing technology does not produce any observable damage in the atomic structure of ultrathin 2D materials, and it can keep a sharp interface. These conclusions are supported by abundant data obtained via atomistic simulations, transmission electron microscopy, nanochemical metrology, and device characterization in a probe station. The results are important for the understanding of inkjet printing technology applied to 2D materials, and they could contribute to the better design and optimization of electronic devices and circuits.
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Affiliation(s)
- Wenwen Zheng
- Institute of Functional Nano and Soft Materials (FUNSOM), Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, 199 Ren-Ai Road, Suzhou, 215123, China
| | - Fernan Saiz
- Institute of Material Science and Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
| | - Yaqing Shen
- Institute of Functional Nano and Soft Materials (FUNSOM), Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, 199 Ren-Ai Road, Suzhou, 215123, China
| | - Kaichen Zhu
- MIND, Department of Electronic and Biomedical Engineering, Universitat de Barcelona, Martí i Franquès 1, Barcelona, E-08028, Spain
| | - Yingwen Liu
- Institute of Functional Nano and Soft Materials (FUNSOM), Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, 199 Ren-Ai Road, Suzhou, 215123, China
| | - Clifford McAleese
- Aixtron Ltd, Anderson Road, Buckingway Business Park, Swavesy, CB24 4FQ, UK
| | - Ben Conran
- Aixtron Ltd, Anderson Road, Buckingway Business Park, Swavesy, CB24 4FQ, UK
| | - Xiaochen Wang
- Aixtron Ltd, Anderson Road, Buckingway Business Park, Swavesy, CB24 4FQ, UK
| | - Mario Lanza
- Institute of Material Science and Engineering, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Saudi Arabia
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30
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Zhang X, Zhang Y, Yu H, Zhao H, Cao Z, Zhang Z, Zhang Y. Van der Waals-Interface-Dominated All-2D Electronics. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022:e2207966. [PMID: 36353883 DOI: 10.1002/adma.202207966] [Citation(s) in RCA: 14] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/31/2022] [Revised: 11/06/2022] [Indexed: 06/16/2023]
Abstract
The interface is the device. As the feature size rapidly shrinks, silicon-based electronic devices are facing multiple challenges of material performance decrease and interface quality degradation. Ultrathin 2D materials are considered as potential candidates in future electronics by their atomically flat surfaces and excellent immunity to short-channel effects. Moreover, due to naturally terminated surfaces and weak van der Waals (vdW) interactions between layers, 2D materials can be freely stacked without the lattice matching limit to form high-quality heterostructure interfaces with arbitrary components and twist angles. Controlled interlayer band alignment and optimized interfacial carrier behavior allow all-2D electronics based on 2D vdW interfaces to exhibit more comprehensive functionality and better performance. Especially, achieving the same computing capacity of multiple conventional devices with small footprint all-2D devices is considered to be the key development direction of future electronics. Herein, the unique properties of all-2D vdW interfaces and their construction methods are systematically reviewed and the main performance contributions of different vdW interfaces in 2D electronics are summarized, respectively. Finally, the recent progress and challenges for all-2D vdW electronics are discussed, and how to improve the compatibility of 2D material devices with silicon-based industrial technology is pointed out as a critical challenge.
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Affiliation(s)
- Xiankun Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
| | - Yanzhe Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
| | - Huihui Yu
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
| | - Hang Zhao
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
| | - Zhihong Cao
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
| | - Zheng Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
| | - Yue Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing, 100083, P. R. China
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31
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Cho K, Lee T, Chung S. Inkjet printing of two-dimensional van der Waals materials: a new route towards emerging electronic device applications. NANOSCALE HORIZONS 2022; 7:1161-1176. [PMID: 35894100 DOI: 10.1039/d2nh00162d] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Two-dimensional (2D) van der Waals (vdW) materials are considered one of the most promising candidates to realize emerging electrical applications. Although until recently, much effort has been dedicated to demonstrating high-performance single 2D vdW devices, associated with rapid progress in 2D vdW materials, demands for their large-scale practical applications have noticeably increased from a manufacturing perspective. Drop-on-demand inkjet printing can be the most feasible solution by exploiting the advantages of layered 2D contacts and advanced 2D vdW ink formulations. This review presents recent achievements in inkjet-printed 2D vdW material-based device applications. A brief introduction to 2D vdW materials and inkjet printing principles, followed by various ink formulation methods, is first presented. Then, the state-of-the-art inkjet-printed 2D vdW device applications and their remaining technical issues are highlighted. Finally, prospects and challenges to be overcome to demonstrate fully inkjet-printed, high-performance 2D vdW devices are also discussed.
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Affiliation(s)
- Kyungjune Cho
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, Korea.
| | - Takhee Lee
- Department of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul 08826, Korea
| | - Seungjun Chung
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, Korea.
- KHU-KIST Department of Converging Science and Technology, Kyung Hee University, Seoul, 02447, Korea
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32
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Kaur H, Coleman JN. Liquid-Phase Exfoliation of Nonlayered Non-Van-Der-Waals Crystals into Nanoplatelets. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2202164. [PMID: 35470487 DOI: 10.1002/adma.202202164] [Citation(s) in RCA: 24] [Impact Index Per Article: 12.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/08/2022] [Revised: 04/07/2022] [Indexed: 05/28/2023]
Abstract
For nearly 15 years, researchers have been using liquid-phase exfoliation (LPE) to produce 2D nanosheets from layered crystals. This has yielded multiple 2D materials in a solution-processable form whose utility has been demonstrated in multiple applications. It was believed that the exfoliation of such materials is enabled by the very large bonding anisotropy of layered materials where the strength of intralayer chemical bonds is very much larger than that of interlayer van der Waals bonds. However, over the last five years, a number of papers have raised questions about our understanding of exfoliation by describing the LPE of nonlayered materials. These results are extremely surprising because, as no van der Waals gap is present to provide an easily cleaved direction, the exfoliation of such compounds requires the breaking of only chemical bonds. Here the progress in this unexpected new research area is examined. The structure and properties of nanoplatelets produced by LPE of nonlayered materials are reviewed. A number of unexplained trends are found, not least the preponderance of isotropic materials that have been exfoliated to give high-aspect-ratio nanoplatelets. Finally, the applications potential of this new class of 2D materials are considered.
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Affiliation(s)
- Harneet Kaur
- School of Physics, CRANN & AMBER Research Centres, Trinity College Dublin, Dublin, D02 PN40, Ireland
| | - Jonathan N Coleman
- School of Physics, CRANN & AMBER Research Centres, Trinity College Dublin, Dublin, D02 PN40, Ireland
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33
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Veerapandian S, Kim W, Kim J, Jo Y, Jung S, Jeong U. Printable inks and deformable electronic array devices. NANOSCALE HORIZONS 2022; 7:663-681. [PMID: 35660837 DOI: 10.1039/d2nh00089j] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Deformable printed electronic array devices are expected to revolutionize next-generation electronics. However, although remarkable technological advances in printable inks and deformable electronic array devices have recently been achieved, technical challenges remain to commercialize these technologies. In this review article a brief introduction to printing methods highlighting significant research studies on ink formation for conductors, semiconductors, and insulators is provided, and the structural design and successful printing strategies of deformable electronic array devices are described. Successful device demonstrations are presented in the applications of passive- and active-matrix array devices. Finally, perspectives and technological challenges to be achieved are pointed out to print practically available deformable devices.
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Affiliation(s)
- Selvaraj Veerapandian
- Department of Materials Science and Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea.
| | - Woojo Kim
- Department of Convergence IT Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Jaehyun Kim
- Department of Materials Science and Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea.
| | - Youngmin Jo
- Department of Convergence IT Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Sungjune Jung
- Department of Materials Science and Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea.
- Department of Convergence IT Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea
| | - Unyong Jeong
- Department of Materials Science and Engineering, Pohang University of Science and Technology, 77 Cheongam-Ro, Nam-Gu, Pohang 37673, Republic of Korea.
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Abstract
Molecular doping is an excellent instrument to modify the electronic properties of two−dimensional materials. In our work, the structure and electronic properties of the adsorption systems of g−ZnO adsorbed by organic molecules (including Tetracyanoethylene (TCNE), Tetracyanoquinodimethane (TCNQ), and Tetrahydrofulvalene (TTF)) were investigated computationally using Density Functional Theory (DFT). The results showed that the TCNE and TCNQ, as electron receptors, doped the LUMO energy level above the valence band maximum (VBM) of the g−ZnO band structure, demonstrating effective p−type doping. The n−type doping of g−ZnO was obtained that the TTF molecules, as electron donors, doped the HOMO energy level below the conduction band minimum (CBM) of the band structure for g−ZnO. In addition, the TCNE, TCNQ, and TTF breathed additional holes or electrons into the monolayer g−ZnO, creating surface dipole moments between the g−ZnO and organic molecules, which caused work function to be adjustable, ranging from 3.871 eV to 5.260 eV. Our results prove that organic molecular doping was instrumental in improving the performance of g−ZnO−based nano−electronic devices, providing theoretical support for the fabrication of p−doping or n−doping nano−semiconductor components. The tunable range of field emission capability of g−ZnO−based electronic devices was also extended.
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35
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Jeong I, Cho K, Yun S, Shin J, Kim J, Kim GT, Lee T, Chung S. Tailoring the Electrical Characteristics of MoS 2 FETs through Controllable Surface Charge Transfer Doping Using Selective Inkjet Printing. ACS NANO 2022; 16:6215-6223. [PMID: 35377600 DOI: 10.1021/acsnano.2c00021] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Surface charge transfer doping (SCTD) has been regarded as an effective approach to tailor the electrical characteristics of atomically thin transition metal dichalcogenides (TMDs) in a nondestructive manner due to their two-dimensional nature. However, the difficulty of achieving rationally controlled SCTD on TMDs via conventional doping methods, such as solution immersion and dopant vaporization, has impeded the realization of practical optoelectronic and electronic devices. Here, we demonstrate controllable SCTD of molybdenum disulfide (MoS2) field-effect transistors using inkjet-printed benzyl viologen (BV) as an n-type dopant. By adjusting the BV concentration and the areal coverage of inkjet-printed BV dopants, controllable SCTD results in BV-doped MoS2 FETs with elaborately tailored electrical performance. Specifically, the suggested solvent system creates well-defined droplets of BV ink having a volume of ∼2 pL, which allows the high spatial selectivity of SCTD onto the MoS2 channels by depositing the BV dopant on demand. Our inkjet-printed SCTD method provides a feasible solution for achieving controllable doping to modulate the electrical and optical performances of TMD-based devices.
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Affiliation(s)
- Inho Jeong
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, Korea
- School of Electrical Engineering, Korea University, Seoul 02841, Korea
| | - Kyungjune Cho
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, Korea
| | - Seobin Yun
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, Korea
| | - Jiwon Shin
- Department of Physics and Astronomy and Institute of Applied Physics, Seoul National University, Seoul 08826, Korea
| | - Jaeyoung Kim
- Department of Physics and Astronomy and Institute of Applied Physics, Seoul National University, Seoul 08826, Korea
| | - Gyu Tae Kim
- School of Electrical Engineering, Korea University, Seoul 02841, Korea
| | - Takhee Lee
- Department of Physics and Astronomy and Institute of Applied Physics, Seoul National University, Seoul 08826, Korea
| | - Seungjun Chung
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, Korea
- KHU-KIST Department of Converging Science and Technology, Kyung Hee University, Seoul 02447, Korea
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36
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Chen F, Luo Y, Liu X, Zheng Y, Han Y, Yang D, Wu S. 2D Molybdenum Sulfide-Based Materials for Photo-Excited Antibacterial Application. Adv Healthc Mater 2022; 11:e2200360. [PMID: 35385610 DOI: 10.1002/adhm.202200360] [Citation(s) in RCA: 9] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/08/2022] [Indexed: 01/01/2023]
Abstract
Bacterial infections have seriously threatened human health and the abuse of natural or artificial antibiotics leads to bacterial resistance, so development of a new generation of antibacterial agents and treatment methods is urgent. 2D molybdenum sulfide (MoS2 ) has good biocompatibility, high specific surface area to facilitate surface modification and drug loading, adjustable energy bandgap, and high near-infrared photothermal conversion efficiency (PCE), so it is often used for antibacterial application through its photothermal or photodynamic effects. This review comprehensively summarizes and discusses the fabrication processes, structural characteristics, antibacterial performance, and the corresponding mechanisms of MoS2 -based materials as well as their representative antibacterial applications. In addition, the outlooks on the remaining challenges that should be addressed in the field of MoS2 are also proposed.
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Affiliation(s)
- Fangqian Chen
- Biomedical Materials Engineering Research Center Collaborative Innovation Center for Advanced Organic Chemical Materials Co‐constructed by the Province and Ministry Hubei Key Laboratory of Polymer Materials Ministry‐of‐Education Key Laboratory for the Green Preparation and Application of Functional Materials School of Materials Science and Engineering Hubei University Wuhan 430062 China
| | - Yue Luo
- Biomedical Materials Engineering Research Center Collaborative Innovation Center for Advanced Organic Chemical Materials Co‐constructed by the Province and Ministry Hubei Key Laboratory of Polymer Materials Ministry‐of‐Education Key Laboratory for the Green Preparation and Application of Functional Materials School of Materials Science and Engineering Hubei University Wuhan 430062 China
| | - Xiangmei Liu
- Biomedical Materials Engineering Research Center Collaborative Innovation Center for Advanced Organic Chemical Materials Co‐constructed by the Province and Ministry Hubei Key Laboratory of Polymer Materials Ministry‐of‐Education Key Laboratory for the Green Preparation and Application of Functional Materials School of Materials Science and Engineering Hubei University Wuhan 430062 China
| | - Yufeng Zheng
- School of Materials Science & Engineering Peking University Beijing 100871 China
| | - Yong Han
- State Key Laboratory for Mechanical Behavior of Materials School of Materials Science and Engineering Xi'an Jiaotong University Xi'an Shanxi 710049 China
| | - Dapeng Yang
- College of Chemical Engineering and Materials Science Quanzhou Normal University Quanzhou Fujian Province 362000 China
| | - Shuilin Wu
- School of Materials Science & Engineering Peking University Beijing 100871 China
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37
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Optical Response of CVD-Grown ML-WS2 Flakes on an Ultra-Dense Au NP Plasmonic Array. CHEMOSENSORS 2022. [DOI: 10.3390/chemosensors10030120] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/04/2023]
Abstract
The combination of metallic nanostructures with two-dimensional transition metal dichalcogenides is an efficient way to make the optical properties of the latter more appealing for opto-electronic applications. In this work, we investigate the optical properties of monolayer WS2 flakes grown by chemical vapour deposition and transferred onto a densely-packed array of plasmonic Au nanoparticles (NPs). The optical response was measured as a function of the thickness of a dielectric spacer intercalated between the two materials and of the system temperature, in the 75–350 K range. We show that a weak interaction is established between WS2 and Au NPs, leading to temperature- and spacer-thickness-dependent coupling between the localized surface plasmon resonance of Au NPs and the WS2 exciton. We suggest that the closely-packed morphology of the plasmonic array promotes a high confinement of the electromagnetic field in regions inaccessible by the WS2 deposited on top. This allows the achievement of direct contact between WS2 and Au while preserving a strong connotation of the properties of the two materials also in the hybrid system.
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38
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Low Power Consumption Gate-Tunable WSe2/SnSe2 Van Der Waals Tunnel Field-Effect Transistor. ELECTRONICS 2022. [DOI: 10.3390/electronics11050833] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/04/2023]
Abstract
Two-dimensional (2D) transition-metal dichalcogenides (TMDCs) have attracted attention as promising next-generation electronic devices and sensors. In this study, we fabricated a novel nanoelectronic device based on a black-phosphorus-gated WSe2/SnSe2 van der Waals (vdW) tunnel field-effect transistor (TFET), where hexagonal boron nitride (h-BN) was used as the gate insulator. We performed morphological, electrical, and optoelectronic characterizations. The p-WSe2/n-SnSe2 heterostructure-based TFET exhibited p-type behavior with a good dependence on the gate voltage. The TFET device showed a trend toward negative differential resistance (NDR) originating from band-to-band tunneling, which can be tuned by applying a gate voltage. The optoelectronic performance of the TFET device was low, with a maximum photoresponsivity of 11 mA W−1, owing to the large device length. The results obtained herein promote the integration of black phosphorus into low-energy-consumption 2D vdW TFETs.
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39
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Yang S, Luo P, Wang F, Liu T, Zhao Y, Ma Y, Li H, Zhai T. Van der Waals Epitaxy of Bi 2 Te 2 Se/Bi 2 O 2 Se Vertical Heterojunction for High Performance Photodetector. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2105211. [PMID: 34850539 DOI: 10.1002/smll.202105211] [Citation(s) in RCA: 8] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/28/2021] [Revised: 10/18/2021] [Indexed: 06/13/2023]
Abstract
Bismuth oxyselenide (Bi2 O2 Se) has emerged as a promising candidate for electronic and optoelectronic applications due to its outstanding electron mobility and ambient stability. However, high dark current and relatively slow photoresponse that originate from high charge carrier concentration as well as bolometric effect in Bi2 O2 Se inhibit further improvement of Bi2 O2 Se based photodetectors. Here, a one-step van der Waals (vdW) epitaxy synthesis of Bi2 Te2 Se/Bi2 O2 Se vertical heterojunction with type-II band alignment and high-quality interface is demonstrated. The crystal quality and uniformity of the heterojunction are supported by Raman, transmission electron microscopy and energy dispersive spectroscopy results. A photodetector based on Bi2 Te2 Se/Bi2 O2 Se heterojunction demonstrates steady photoresponse over a large wavelength range (532-1456 nm), with a high specific responsivity of 2.21 × 103 A W-1 at 532 nm and fast response speed of 50 ms. Moreover, field effect regulation allows for further improvement of the photoresponse performance of the heterojunction field effect transistor device, where the responsivity can be increased to 3.34 × 103 A W-1 with a 60 V gate voltage. Overall, the one-step vdW epitaxy process is a promising and convenient route towards constructing high quality Bi2 O2 Se based heterojunction for improving its photodetection performance.
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Affiliation(s)
- Sijie Yang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Peng Luo
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Fakun Wang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Teng Liu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Yinghe Zhao
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Ying Ma
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Huiqiao Li
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
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Ciampalini G, Fabbri F, Menichetti G, Buoni L, Pace S, Mišeikis V, Pitanti A, Pisignano D, Coletti C, Tredicucci A, Roddaro S. Unexpected Electron Transport Suppression in a Heterostructured Graphene-MoS 2 Multiple Field-Effect Transistor Architecture. ACS NANO 2022; 16:1291-1300. [PMID: 34939407 PMCID: PMC8793137 DOI: 10.1021/acsnano.1c09131] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 10/15/2021] [Accepted: 12/17/2021] [Indexed: 06/14/2023]
Abstract
We demonstrate a graphene-MoS2 architecture integrating multiple field-effect transistors (FETs), and we independently probe and correlate the conducting properties of van der Waals coupled graphene-MoS2 contacts with those of the MoS2 channels. Devices are fabricated starting from high-quality single-crystal monolayers grown by chemical vapor deposition. The heterojunction was investigated by scanning Raman and photoluminescence spectroscopies. Moreover, transconductance curves of MoS2 are compared with the current-voltage characteristics of graphene contact stripes, revealing a significant suppression of transport on the n-side of the transconductance curve. On the basis of ab initio modeling, the effect is understood in terms of trapping by sulfur vacancies, which counterintuitively depends on the field effect, even though the graphene contact layer is positioned between the backgate and the MoS2 channel.
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Affiliation(s)
- Gaia Ciampalini
- Dipartimento
di Fisica “E. Fermi”, Università
di Pisa, Largo B. Pontecorvo 3, I-56127 Pisa, Italy
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, I-16 163 Genova, Italy
- NEST,
CNR—Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Filippo Fabbri
- NEST,
CNR—Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Guido Menichetti
- Dipartimento
di Fisica “E. Fermi”, Università
di Pisa, Largo B. Pontecorvo 3, I-56127 Pisa, Italy
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, I-16 163 Genova, Italy
| | - Luca Buoni
- Dipartimento
di Fisica “E. Fermi”, Università
di Pisa, Largo B. Pontecorvo 3, I-56127 Pisa, Italy
| | - Simona Pace
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, I-16 163 Genova, Italy
- Center
for Nanotechnology Innovation @NEST, Istituto
Italiano di Tecnologia, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Vaidotas Mišeikis
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, I-16 163 Genova, Italy
- Center
for Nanotechnology Innovation @NEST, Istituto
Italiano di Tecnologia, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Alessandro Pitanti
- NEST,
CNR—Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Dario Pisignano
- Dipartimento
di Fisica “E. Fermi”, Università
di Pisa, Largo B. Pontecorvo 3, I-56127 Pisa, Italy
- NEST,
CNR—Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Camilla Coletti
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, I-16 163 Genova, Italy
- Center
for Nanotechnology Innovation @NEST, Istituto
Italiano di Tecnologia, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Alessandro Tredicucci
- Dipartimento
di Fisica “E. Fermi”, Università
di Pisa, Largo B. Pontecorvo 3, I-56127 Pisa, Italy
- NEST,
CNR—Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, I-56 127 Pisa, Italy
| | - Stefano Roddaro
- Dipartimento
di Fisica “E. Fermi”, Università
di Pisa, Largo B. Pontecorvo 3, I-56127 Pisa, Italy
- NEST,
CNR—Istituto Nanoscienze and Scuola Normale Superiore, Piazza San Silvestro 12, I-56 127 Pisa, Italy
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41
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Mechanical sensors based on two-dimensional materials: Sensing mechanisms, structural designs and wearable applications. iScience 2022; 25:103728. [PMID: 35072014 PMCID: PMC8762477 DOI: 10.1016/j.isci.2021.103728] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022] Open
Abstract
Compared with bulk materials, atomically thin two-dimensional (2D) crystals possess a range of unique mechanical properties, including relatively high in-plane stiffness and large bending flexibility. The atomic 2D building blocks can be reassembled into precisely designed heterogeneous composite structures of various geometries with customized mechanical sensing behaviors. Due to their small specific density, high flexibility, and environmental adaptability, mechanical sensors based on 2D materials can conform to soft and curved surfaces, thus providing suitable solutions for functional applications in future wearable devices. In this review, we summarize the latest developments in mechanical sensors based on 2D materials from the perspective of function-oriented applications. First, typical mechanical sensing mechanisms are introduced. Second, we attempt to establish a correspondence between typical structure designs and the performance/multi-functions of the devices. Afterward, several particularly promising areas for potential applications are discussed, following which we present perspectives on current challenges and future opportunities
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42
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Yang P, Li J, Lee SW, Fan HJ. Printed Zinc Paper Batteries. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2022; 9:e2103894. [PMID: 34741445 PMCID: PMC8760176 DOI: 10.1002/advs.202103894] [Citation(s) in RCA: 10] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/04/2021] [Revised: 09/19/2021] [Indexed: 05/04/2023]
Abstract
Paper electronics offer an environmentally sustainable option for flexible and wearable systems and perfectly fit the available printing technologies for high manufacturing efficiency. As the heart of energy-consuming devices, paper-based batteries are required to be compatible with printing processes with high fidelity. Herein, hydrogel reinforced cellulose paper (HCP) is designed to serve as the separator and solid electrolyte for paper batteries. The HCP can sustain higher strain than pristine papers and are biodegradable in natural environment within four weeks. Zinc-metal (Ni and Mn) batteries printed on the HCP present remarkable volumetric energy density of ≈26 mWh cm-3 , and also demonstrate the feature of cuttability and compatibility with flexible circuits and devices. As a result, self-powered electronic system could be constructed by integrating printed paper batteries with solar cells and light-emitting diodes. The result highlights the feasibility of hydrogel reinforced paper for ubiquitous flexible and eco-friendly electronics.
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Affiliation(s)
- Peihua Yang
- School of Physical and Mathematical SciencesNanyang Technological UniversitySingapore637371Singapore
| | - Jia Li
- Rolls‐Royce@NTU Corporate LabNanyang Technological UniversitySingapore639798Singapore
| | - Seok Woo Lee
- Rolls‐Royce@NTU Corporate LabNanyang Technological UniversitySingapore639798Singapore
- School of Electrical and Electronic EngineeringNanyang Technological UniversitySingapore639798Singapore
| | - Hong Jin Fan
- School of Physical and Mathematical SciencesNanyang Technological UniversitySingapore637371Singapore
- Innovative Centre for Flexible Devices (iFLEX)Nanyang Technological UniversitySingapore639798Singapore
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43
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Jun HY, Kim SJ, Choi CH. Ink Formulation and Printing Parameters for Inkjet Printing of Two Dimensional Materials: A Mini Review. NANOMATERIALS (BASEL, SWITZERLAND) 2021; 11:3441. [PMID: 34947790 PMCID: PMC8706674 DOI: 10.3390/nano11123441] [Citation(s) in RCA: 11] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/24/2021] [Revised: 12/15/2021] [Accepted: 12/16/2021] [Indexed: 01/02/2023]
Abstract
Inkjet printing of two-dimensional (2D) material has been a center of interest for wearable electronics and has become a promising platform for next-generation technologies. Despite the enormous progress made in printed 2D materials, there are still challenges in finding the optimal printing conditions involving the ink formulation and printing parameters. Adequate ink formulation and printing parameters for target 2D materials rely on empirical studies and repeated trials. Therefore, it is essential to compile promising strategies for ink formulation and printing parameters. In this context, this review discusses the optimal ink formulations to prepare stable ink and steady ink jetting and then explores the critical printing parameters for fabricating printed 2D materials of a high quality. The summary and future prospects for inkjet-printed 2D materials are also addressed.
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Affiliation(s)
- Ho-Young Jun
- Department of Chemical Engineering, Gyeongsang National University, Jinju 52828, Korea;
| | - Se-Jung Kim
- School of Chemical Engineering, Jeonbuk National University, Jeonju 54896, Korea;
| | - Chang-Ho Choi
- Department of Chemical Engineering, Gyeongsang National University, Jinju 52828, Korea;
- Department of Materials Engineering and Convergence Technology, Gyeongsang National University, Jinju 52828, Korea
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44
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Bushra KA, Prasad KS. Paper-based field-effect transistor sensors. Talanta 2021; 239:123085. [PMID: 34890939 DOI: 10.1016/j.talanta.2021.123085] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/28/2021] [Revised: 11/07/2021] [Accepted: 11/16/2021] [Indexed: 01/10/2023]
Abstract
The present scenario in the world largely demands affordable, fast, recyclable, and flexible electronic devices for bio sensing. Varieties of paper-based devices such as microfluidics paper electrodes, paper diodes, and paper-based transistors etc. have been developed and validated. Most of the fabrication techniques published so far have focused on economic, environment-friendly straightforward methods to develop paper-based field-effect transistors (PFET) sensors, additionally, explored their applications. The synthetic-free, mechanically flexible, biocompatible, and signal amplification capability render PFET based sensors for wearable device makers. Modified organic/inorganic PFETs identify target analytes based on the electrical signal and endow them as perfect transducers. In the field of PFET bio sensing technology, numerous challenges are needed to be discussed to proceed forward in biomedical and other analytical applications. Realizing biologically or chemically modified PFET having an exceptional signal to noise ratio, specificity, with rapid detection ability is challenging. This review recapitulates the fabrication techniques, performances of various PFET sensors, and summarizes the report by concluding remarks including the limitations of the existing PFET based sensors and the future holds in regards to the sustainable nature of PFET.
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Affiliation(s)
- K Ayshathil Bushra
- Nanomaterial Research Laboratory (NMRL), Nano Division, Yenepoya Research Centre, Yenepoya University, Deralakatte, Mangalore, 575018, India.
| | - K Sudhakara Prasad
- Nanomaterial Research Laboratory (NMRL), Nano Division, Yenepoya Research Centre, Yenepoya University, Deralakatte, Mangalore, 575018, India; Centre for Nutrition Studies, Yenepoya (Deemed to Be University), Deralakatte, Mangalore, 575 018, India.
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45
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Seravalli L, Bosi M, Fiorenza P, Panasci SE, Orsi D, Rotunno E, Cristofolini L, Rossi F, Giannazzo F, Fabbri F. Gold nanoparticle assisted synthesis of MoS 2 monolayers by chemical vapor deposition. NANOSCALE ADVANCES 2021; 3:4826-4833. [PMID: 36134320 PMCID: PMC9418562 DOI: 10.1039/d1na00367d] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/18/2021] [Accepted: 06/30/2021] [Indexed: 06/16/2023]
Abstract
The use of metal nanoparticles is an established paradigm for the synthesis of semiconducting one-dimensional nanostructures. In this work we study their effect on the synthesis of two-dimensional semiconducting materials, by using gold nanoparticles for chemical vapor deposition growth of two-dimensional molybdenum disulfide (MoS2). In comparison with the standard method, the employment of gold nanoparticles allows us to obtain large monolayer MoS2 flakes, up to 20 μm in lateral size, even if they are affected by the localized overgrowth of MoS2 bilayer and trilayer islands. Important modifications of the optical and electronic properties of MoS2 triangular domains are reported, where the photoluminescence intensity of the A exciton is strongly quenched and a shift to a positive threshold voltage in back-gated field effect transistors is observed. These results indicate that the use of gold nanoparticles influences the flake growth and properties, indicating a method for possible localized synthesis of two-dimensional materials, improving the lateral size of monolayers and modifying their properties.
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Affiliation(s)
- L Seravalli
- Institute for Materials for Electronics and Magnetism (IMEM-CNR) Parco Area delle Scienze 37/a 43124 Parma Italy
| | - M Bosi
- Institute for Materials for Electronics and Magnetism (IMEM-CNR) Parco Area delle Scienze 37/a 43124 Parma Italy
| | - P Fiorenza
- Institute for Microelectronics and Microsystems (CNR-IMM) Z. I. VIII Strada 5 95121 Catania Italy
| | - S E Panasci
- Institute for Microelectronics and Microsystems (CNR-IMM) Z. I. VIII Strada 5 95121 Catania Italy
| | - D Orsi
- Department of Mathematical, Physical and Computer Sciences, University of Parma Parco Area delle Scienze 7/a 43124 Parma Italy
| | - E Rotunno
- Istituto Nanoscienze-CNR via G Campi 213/a 41125 Modena Italy
| | - L Cristofolini
- Department of Mathematical, Physical and Computer Sciences, University of Parma Parco Area delle Scienze 7/a 43124 Parma Italy
| | - F Rossi
- Institute for Materials for Electronics and Magnetism (IMEM-CNR) Parco Area delle Scienze 37/a 43124 Parma Italy
| | - F Giannazzo
- Institute for Microelectronics and Microsystems (CNR-IMM) Z. I. VIII Strada 5 95121 Catania Italy
| | - F Fabbri
- NEST, Istituto Nanoscienze - CNR, Scuola Normale Superiore Piazza San Silvestro 12 56127 Pisa Italy
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46
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Liang K, Li D, Ren H, Zhao M, Wang H, Ding M, Xu G, Zhao X, Long S, Zhu S, Sheng P, Li W, Lin X, Zhu B. Fully Printed High-Performance n-Type Metal Oxide Thin-Film Transistors Utilizing Coffee-Ring Effect. NANO-MICRO LETTERS 2021; 13:164. [PMID: 34342729 PMCID: PMC8333237 DOI: 10.1007/s40820-021-00694-4] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/25/2021] [Accepted: 07/13/2021] [Indexed: 06/13/2023]
Abstract
Metal oxide thin-films transistors (TFTs) produced from solution-based printing techniques can lead to large-area electronics with low cost. However, the performance of current printed devices is inferior to those from vacuum-based methods due to poor film uniformity induced by the "coffee-ring" effect. Here, we report a novel approach to print high-performance indium tin oxide (ITO)-based TFTs and logic inverters by taking advantage of such notorious effect. ITO has high electrical conductivity and is generally used as an electrode material. However, by reducing the film thickness down to nanometers scale, the carrier concentration of ITO can be effectively reduced to enable new applications as active channels in transistors. The ultrathin (~10-nm-thick) ITO film in the center of the coffee-ring worked as semiconducting channels, while the thick ITO ridges (>18-nm-thick) served as the contact electrodes. The fully inkjet-printed ITO TFTs exhibited a high saturation mobility of 34.9 cm2 V-1 s-1 and a low subthreshold swing of 105 mV dec-1. In addition, the devices exhibited excellent electrical stability under positive bias illumination stress (PBIS, ΔVth = 0.31 V) and negative bias illuminaiton stress (NBIS, ΔVth = -0.29 V) after 10,000 s voltage bias tests. More remarkably, fully printed n-type metal-oxide-semiconductor (NMOS) inverter based on ITO TFTs exhibited an extremely high gain of 181 at a low-supply voltage of 3 V, promising for advanced electronics applications.
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Affiliation(s)
- Kun Liang
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
- Zhejiang University, Hangzhou, 310027, China
| | - Dingwei Li
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
- Zhejiang University, Hangzhou, 310027, China
| | - Huihui Ren
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
- Zhejiang University, Hangzhou, 310027, China
| | - Momo Zhao
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
- Key Laboratory of Wide Band Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xian, 710071, China
| | - Hong Wang
- Key Laboratory of Wide Band Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xian, 710071, China
| | - Mengfan Ding
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, China
| | - Guangwei Xu
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, China
| | - Xiaolong Zhao
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, China
| | - Shibing Long
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, China
| | - Siyuan Zhu
- Instrumentation and Service Center for Physical Sciences, Westlake University, Hangzhou, 310024, China
| | - Pei Sheng
- Instrumentation and Service Center for Physical Sciences, Westlake University, Hangzhou, 310024, China
| | - Wenbin Li
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou, 310024, China
| | - Xiao Lin
- School of Science, Westlake University, Hangzhou, 310024, China
| | - Bowen Zhu
- Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, Hangzhou, 310024, China.
- Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou, 310024, China.
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47
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Magnozzi M, Pflug T, Ferrera M, Pace S, Ramó L, Olbrich M, Canepa P, Ağircan H, Horn A, Forti S, Cavalleri O, Coletti C, Bisio F, Canepa M. Local Optical Properties in CVD-Grown Monolayer WS 2 Flakes. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2021; 125:16059-16065. [PMID: 34484552 PMCID: PMC8411805 DOI: 10.1021/acs.jpcc.1c04287] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/14/2021] [Revised: 06/25/2021] [Indexed: 06/10/2023]
Abstract
Excitons dominate the light absorption and re-emission spectra of monolayer transition-metal dichalcogenides (TMD). Microscopic investigations of the excitonic response in TMD almost invariably extract information from the radiative recombination step, which only constitutes one part of the picture. Here, by exploiting imaging spectroscopic ellipsometry (ISE), we investigate the spatial dependence of the dielectric function of chemical vapor deposition (CVD)-grown WS2 flakes with a microscopic lateral resolution, thus providing information about the spatially varying, exciton-induced light absorption in the monolayer WS2. Comparing the ISE results with imaging photoluminescence spectroscopy data, the presence of several correlated features was observed, along with the unexpected existence of a few uncorrelated characteristics. The latter demonstrates that the exciton-induced absorption and emission features are not always proportional at the microscopic scale. Microstructural modulations across the flakes, having a different influence on the absorption and re-emission of light, are deemed responsible for the effect.
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Affiliation(s)
- Michele Magnozzi
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
- Istituto
Nazionale di Fisica Nucleare, Sezione di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Theo Pflug
- Laserinstitut
Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany
- Technische
Universität Chemnitz, Reichenhainer Str. 70, 09126 Chemnitz, Germany
| | - Marzia Ferrera
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Simona Pace
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy
| | - Lorenzo Ramó
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Markus Olbrich
- Laserinstitut
Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany
| | - Paolo Canepa
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Hasret Ağircan
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Engineering
Department, Istanbul Technical University, Maslak 34467, Istanbul, Turkey
| | - Alexander Horn
- Laserinstitut
Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany
| | - Stiven Forti
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
| | - Ornella Cavalleri
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
| | - Camilla Coletti
- Center
for Nanotechnology Innovation IIT@NEST, Piazza San Silvestro 12, 56127 Pisa, Italy
- Graphene
Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy
| | | | - Maurizio Canepa
- OptMatLab,
Dipartimento di Fisica, Università
di Genova, via Dodecaneso 33, 16146 Genova, Italy
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48
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Realization and training of an inverter-based printed neuromorphic computing system. Sci Rep 2021; 11:9554. [PMID: 33953238 PMCID: PMC8099883 DOI: 10.1038/s41598-021-88396-0] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/21/2020] [Accepted: 04/05/2021] [Indexed: 11/08/2022] Open
Abstract
Emerging applications in soft robotics, wearables, smart consumer products or IoT-devices benefit from soft materials, flexible substrates in conjunction with electronic functionality. Due to high production costs and conformity restrictions, rigid silicon technologies do not meet application requirements in these new domains. However, whenever signal processing becomes too comprehensive, silicon technology must be used for the high-performance computing unit. At the same time, designing everything in flexible or printed electronics using conventional digital logic is not feasible yet due to the limitations of printed technologies in terms of performance, power and integration density. We propose to rather use the strengths of neuromorphic computing architectures consisting in their homogeneous topologies, few building blocks and analog signal processing to be mapped to an inkjet-printed hardware architecture. It has remained a challenge to demonstrate non-linear elements besides weighted aggregation. We demonstrate in this work printed hardware building blocks such as inverter-based comprehensive weight representation and resistive crossbars as well as printed transistor-based activation functions. In addition, we present a learning algorithm developed to train the proposed printed NCS architecture based on specific requirements and constraints of the technology.
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49
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A Review of RFID Sensors, the New Frontier of Internet of Things. SENSORS 2021; 21:s21093138. [PMID: 33946500 PMCID: PMC8124958 DOI: 10.3390/s21093138] [Citation(s) in RCA: 17] [Impact Index Per Article: 5.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/09/2021] [Revised: 03/28/2021] [Accepted: 03/30/2021] [Indexed: 11/17/2022]
Abstract
A review of technological solutions for RFID sensing and their current or envisioned applications is presented. The fundamentals of the wireless sensing technology are summarized in the first part of the work, and the benefits of adopting RFID sensors for replacing standard sensor-equipped Wi-Fi nodes are discussed. Emphasis is put on the absence of batteries and the lower cost of RFID sensors with respect to other sensor solutions available on the market. RFID sensors are critically compared by separating them into chipped and chipless configurations. Both categories are further analyzed with reference to their working mechanism (electronic, electromagnetic, and acoustic). RFID sensing through chip-equipped tags is now a mature technological solution, which is continuously increasing its presence on the market and in several applicative scenarios. On the other hand, chipless RFID sensing represents a relatively new concept, which could become a disruptive solution in the market, but further research in this field is necessary for customizing its employment in specific scenarios. The benefits and limitations of several tag configurations are shown and discussed. A summary of the most suitable applicative scenarios for RFID sensors are finally illustrated. Finally, a look at some sensing solutions available on the market are described and compared.
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50
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Liu Y, Gu F. A wafer-scale synthesis of monolayer MoS 2 and their field-effect transistors toward practical applications. NANOSCALE ADVANCES 2021; 3:2117-2138. [PMID: 36133770 PMCID: PMC9419721 DOI: 10.1039/d0na01043j] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/14/2020] [Accepted: 02/17/2021] [Indexed: 05/11/2023]
Abstract
Molybdenum disulfide (MoS2) has attracted considerable research interest as a promising candidate for downscaling integrated electronics due to the special two-dimensional structure and unique physicochemical properties. However, it is still challenging to achieve large-area MoS2 monolayers with desired material quality and electrical properties to fulfill the requirement for practical applications. Recently, a variety of investigations have focused on wafer-scale monolayer MoS2 synthesis with high-quality. The 2D MoS2 field-effect transistor (MoS2-FET) array with different configurations utilizes the high-quality MoS2 film as channels and exhibits favorable performance. In this review, we illustrated the latest research advances in wafer-scale monolayer MoS2 synthesis by different methods, including Au-assisted exfoliation, CVD, thin film sulfurization, MOCVD, ALD, VLS method, and the thermolysis of thiosalts. Then, an overview of MoS2-FET developments was provided based on large-area MoS2 film with different device configurations and performances. The different applications of MoS2-FET in logic circuits, basic memory devices, and integrated photodetectors were also summarized. Lastly, we considered the perspective and challenges based on wafer-scale monolayer MoS2 synthesis and MoS2-FET for developing practical applications in next-generation integrated electronics and flexible optoelectronics.
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Affiliation(s)
- Yuchun Liu
- Laboratory of Integrated Opto-Mechanics and Electronics, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology Shanghai 200093 China
| | - Fuxing Gu
- Laboratory of Integrated Opto-Mechanics and Electronics, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology Shanghai 200093 China
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